CN102117725B - Multi-stage depressed collector with lining grid and manufacturing method and application thereof - Google Patents
Multi-stage depressed collector with lining grid and manufacturing method and application thereof Download PDFInfo
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- CN102117725B CN102117725B CN 200910244510 CN200910244510A CN102117725B CN 102117725 B CN102117725 B CN 102117725B CN 200910244510 CN200910244510 CN 200910244510 CN 200910244510 A CN200910244510 A CN 200910244510A CN 102117725 B CN102117725 B CN 102117725B
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Abstract
The invention relates to a multi-stage depressed collector with a lining grid, which is designed based on the principle that a metal grid is embedded in the inner surface of the multi-stage depressed collector in order to suppress the emission of secondary electrons, wherein the metal grid is made of nickel, molybdenum, tungsten, oxygen-free copper or stainless steel and is 0.1-0.3 mm in thickness, and the mesh density ranges from 50 to 200 meshes. The manufacturing method of the collector comprises the step of punching or curling a plane metal grid. In the invention, the emission of secondary electrons is suppressed and the efficiency of the multi-stage depressed collector is improved by using a method of embedding the metal grid in the inner surface of the electrode of the multi-stage depressed collector.
Description
Technical field
The present invention relates to a kind of multi-level depressurization collector with the liner aperture plate.
The invention still further relates to the preparation method of above-mentioned multi-level depressurization collector.
The invention still further relates to the application of above-mentioned multi-level depressurization collector.
Background technology
Travelling wave tube is one of the important member of the family of microwave electron tube, and it is to utilize electromagnetic wave to occur to interact and amplify electromagnetic device at interaction region and the electron beam of travelling wave tube.Travelling wave tube generally comprises electron gun, magnetic focusing system, slow wave structure, delivery of energy device, single-stage or five parts of multi-level depressurization collector and forms.Wherein, multi-level depressurization collector is the critical component of all kinds of travelling wave tube and some klystron, and its effect is the remaining kinetic energy that is recovered in through in the electron beam after the notes-Bo mutual effect, thereby greatly improves the gross efficiency of device.
Because the bandwidth of travelling wave tube, and power efficiency is all higher, therefore has in fields such as electronic countermeasures, electronic warfare, radar, meteorological observation and space measurement and satellite communications widely and uses.In general, various application are not quite similar to the requirement of the devices such as travelling wave tube.But generally speaking, higher power and the efficient of Geng Gao are the common trend that various application present.Particularly for the space travelling wave tube of space measurement and satellite communication, because the finiteness of energy supply, the efficient that improves travelling wave tube becomes the travelling wave tube R﹠D and production and at first wants problems of concern.
As everyone knows, multi-level depressurization collector can improve the efficient of travelling wave tube equal vacuum electronic device greatly.Certainly, the concept of multi-level depressurization collector has just proposed as far back as eighties of last century the forties, but has just obtained after the sixties to use more widely in eighties of last century.At the end of last century, some report or papers about multi-level depressurization collector have been delivered successively abroad.In this period, multi-level depressurization collector has obtained to use widely, so that the overall efficiency of travelling wave tube is brought up to 40%-55% from original 20%-30%.After beginning this century, because travelling wave tube demonstrates great potential in the space uses, in order further to improve the efficient of travelling wave tube, the research of multi-level depressurization collector has been entered into a new climax.
Take a broad view of the research for multi-level depressurization collector, comprised at least two aspects.The work of first aspect is by computer simulation, determines best collector configuration and collecting pole structure.For the work of this respect, U.S. NASA Lewis Research Center has published more document.In the correlative study in early days, external research unit generally all uses the special-purpose software of oneself to carry out the work, and domesticly can only the dependence experience carry out conceptual design.Through development for many years, external software such as Egun, Tau and domestic software TWTCAD can carry out the designing and calculating of depressed collector, but all also there is such-and-such shortcoming in these softwares.Because this is little with relation of the present invention on the one hand, therefore do not discussing in detail.
The work of second aspect is to seek the less electrode material of secondary electron yield by various research meanses.This was had a large amount of work abroad, but the research of carrying out at home seldom.External achievement in research roughly can be summarized as follows:
1) can slightly reduce the secondary electron yield of electrode by sputtering method at oxygen-free copper electrode preparation ramet film, thereby improve the efficient of multi-level depressurization collector.
2) utilize Bombardment of ion beam oxygen-free copper electrode, can etch scraggly lines at the oxygen-free copper electrode, thereby reduce secondary electron yield, and improve the efficient of multi-level depressurization collector.
3) directly adopt through surface treatment or not surface treatedly have the pyrolytic graphite of anisotropic properties as electrode.Because the secondary electron yield of this material itself is more much smaller than oxygen-free copper, therefore can effectively improve the efficient of multi-level depressurization collector.
4) directly adopt high-density isotropic graphite as electrode.Whether the secondary performance of high-density isotropic graphite then has much relations through surface treatment with it.For there not being surface treated high-density isotropic graphite, although the emission ratio of its true secondary electron is lower than oxygen-free copper, directly the reflection coefficient of reflection electronic is still larger.And for the high-density isotropic graphite electrode of crossing through Bombardment of ion beam, then the emission ratio of true secondary electron or reflection electronic coefficient are all much smaller than oxygen-free copper.In addition, graphite material produces a large amount of small graphite granules easily in the procedures such as processing, and these graphite granules can cause the faults such as travelling wave tube decreasing insulating.When especially the intensity of graphite material and density were all relatively poor, this problem was even more serious.
Table 1 has provided the secondary electron yield of oxygen-free copper and pyrolytic graphite, and table 2 has provided the secondary electron yield of high-density isotropic graphite.
Table 1: the secondary electron yield of oxygen-free copper and pyrolytic graphite (empirical value)
(the δ in the table 1: the true secondary electron yield of electronics during perpendicular to surperficial incident; π: the reflection electronic emission ratio of electronics during perpendicular to surperficial incident)
Table 2: the secondary electron yield (empirical value) that covers carbon oxygen-free copper and high-density isotropic graphite
(the δ in the table 2: the true secondary electron yield of electronics during perpendicular to surperficial incident; π: the reflection electronic emission ratio of electronics during perpendicular to surperficial incident)
By top summary as can be known, if pyrolytic graphite or high-density isotropic graphite are as electrode, in in conjunction with appropriate surface-treated situation, the secondary electron yield of electrode can be more much smaller than oxygen-free copper, thereby effectively improve the efficient of multi-level depressurization collector.Yet the pyrolytic graphite that uses in multi-level depressurization collector or high-density isotropic graphite need special method Apparatus and method for flow process, and have had not yet to see report.
Summary of the invention
The object of the present invention is to provide a kind of multi-level depressurization collector with the liner aperture plate.
Another purpose of the present invention is to provide the preparation method of above-mentioned multi-level depressurization collector.
For achieving the above object, multi-level depressurization collector with the liner aperture plate provided by the invention, that inner surface lining at multi-level depressurization collector has metal grid mesh, to suppress the principle design of secondary, metal grid mesh material wherein is nickel, molybdenum, tungsten, oxygen-free copper or stainless steel etc., the thickness of metal grid mesh is 0.1～0.3mm, and mesh density is 50～200 orders.
The above-mentioned method with metal grid mesh in the multi-level depressurization collector of liner aperture plate of preparation provided by the invention is prepared from the planar metal aperture plate with punching press or volume pressure mode.
Planar metal aperture plate of the present invention can also form with metal wire knitted such as nickel, molybdenum, tungsten, oxygen-free copper or stainless steels.
Planar metal aperture plate of the present invention can also process through electric discharge machining method, electron beam process method or laser processing with metal formings such as nickel, molybdenum, tungsten, oxygen-free copper or stainless steels.
Planar metal aperture plate of the present invention can also be prepared from by electric casting or casting with materials such as nickel, molybdenum, tungsten, oxygen-free copper or stainless steels.
Planar metal aperture plate of the present invention can also process through electric discharge machining method, electron beam process method or laser processing with the metal foil cylinder of nickel, molybdenum, tungsten, oxygen-free copper or the stainless steel system of waiting for bus.
Multi-level depressurization collector with the liner aperture plate of the present invention can be applied in the electron tubes such as the travelling wave tube that uses this collector or klystron.
The present invention adopts the method at the electrode inner surface lining metal grid mesh of multi-level depressurization collector, has suppressed the emission of secondary electron, has improved the efficient of multi-level depressurization collector.
Description of drawings
Fig. 1 is structural representation of the present invention, and wherein a is that master of the present invention looks generalized section, and b is schematic side view.
Embodiment
The present invention proposes the electrode structure at the inner inner liner metal net of metal electrode.Because for commaterial, thick poor surface second electron emission coefficiency is less than smooth surface.The present invention has adhered to one deck planar metal aperture plate at the electrode inner surface of smooth multi-level depressurization collector, its effect has been equivalent to obtain have the electrode inner surface of hole spill looks, make the electrode inner surface be formed into the comparatively roughness of rule, thereby can effectively reduce secondary electron yield.
Main technical schemes of the present invention is at multi-level depressurization collector inner surface lining metal grid mesh, to suppress secondary.As shown in Figure 1, the inner surface lining at known multi-level depressurization collector 1 has metal grid mesh 2.
The present invention at the concrete grammar of multi-level depressurization collector inner surface lining metal grid mesh is:
Choose from the market nickel, molybdenum, tungsten, oxygen-free copper or stainless finished product planar metal aperture plate, thickness is 0.1～0.3mm, and mesh density is 50～200 orders; The inner surface configuration required according to multi-level depressurization collector, the design diel strikes out concrete mesh piece with above-mentioned planar metal aperture plate; Above-mentioned steps make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
Can also choose with diameter is the finished product plane aperture plate product of 0.1～0.3mm nickel wire, molybdenum filament, tungsten filament or stainless steel wire braiding, and its mesh density is 50～200 orders.
Result of use of the present invention shows that behind the electrode liner nickel screen of certain three grades of depressed collector, the collection efficiency of collector has improved more than two percentage points.
Claims (7)
1. method for preparing with metal grid mesh in the multi-level depressurization collector of liner aperture plate, the inner surface configuration required according to multi-level depressurization collector strikes out concrete mesh piece with nickel, molybdenum, tungsten, oxygen-free copper or stainless planar metal aperture plate; Above step make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
2. method for preparing with metal grid mesh in the multi-level depressurization collector of liner aperture plate, the inner surface configuration required according to multi-level depressurization collector becomes concrete mesh piece with nickel, molybdenum, tungsten, oxygen-free copper or stainless metal wire knitted; Above step make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
3. method for preparing with metal grid mesh in the multi-level depressurization collector of liner aperture plate, the inner surface configuration required according to multi-level depressurization collector is processed into concrete mesh piece with nickel, molybdenum, tungsten, oxygen-free copper or stainless metal forming through electric discharge machining method, electron beam process method or laser processing; Above-mentioned steps make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
4. method for preparing with metal grid mesh in the multi-level depressurization collector of liner aperture plate, the inner surface configuration required according to multi-level depressurization collector made method with nickel, molybdenum, tungsten, oxygen-free copper or stainless metal material by electroforming and is prepared into concrete mesh piece; Above step make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
5. method for preparing with metal grid mesh in the multi-level depressurization collector of liner aperture plate, the inner surface configuration required according to multi-level depressurization collector is prepared into concrete mesh piece with nickel, molybdenum, tungsten, oxygen-free copper or stainless metal material by casting; Above step make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
6. method for preparing with metal grid mesh in the multi-level depressurization collector of liner aperture plate, the inner surface configuration required according to multi-level depressurization collector is processed into concrete mesh piece with the nickel of car system, molybdenum, tungsten, oxygen-free copper or stainless metal foil cylinder through electric discharge machining method, electron beam process method or laser processing; Above step make as the metal grid mesh lining of liner in the inner surface of level depressed collector, be welded and fixed between the two and be integrated.
The described multi-level depressurization collector with the liner aperture plate of claim 1 in electron tube as the application of travelling wave tube or klystron.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200910244510 CN102117725B (en) | 2009-12-30 | 2009-12-30 | Multi-stage depressed collector with lining grid and manufacturing method and application thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN 200910244510 CN102117725B (en) | 2009-12-30 | 2009-12-30 | Multi-stage depressed collector with lining grid and manufacturing method and application thereof |
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| CN102117725A CN102117725A (en) | 2011-07-06 |
| CN102117725B true CN102117725B (en) | 2013-03-20 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103065906B (en) * | 2012-12-18 | 2015-04-22 | 中国人民解放军国防科学技术大学 | Preparation method for carbon fiber annular cathode |
| CN103681174B (en) * | 2013-10-31 | 2016-06-29 | 中国科学院电子学研究所 | A kind of flat multi-level depressurization collector |
| CN105047506B (en) * | 2015-08-12 | 2017-05-31 | 安徽华东光电技术研究所 | Collector for high-power traveling wave tube |
| CN109585239B (en) * | 2018-11-06 | 2020-10-27 | 西安交通大学 | Mo electrode surface treatment method with low secondary electron yield |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4527092A (en) * | 1983-09-30 | 1985-07-02 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Multistage spent particle collector and a method for making same |
| CN2497326Y (en) * | 2001-08-29 | 2002-06-26 | 黄子瀚 | Rapid radon monitoring instrument |
| CN101447384A (en) * | 2008-12-29 | 2009-06-03 | 电子科技大学 | Multi-level depressurization collector for traveling wave tube |
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- 2009-12-30 CN CN 200910244510 patent/CN102117725B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4527092A (en) * | 1983-09-30 | 1985-07-02 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Multistage spent particle collector and a method for making same |
| CN2497326Y (en) * | 2001-08-29 | 2002-06-26 | 黄子瀚 | Rapid radon monitoring instrument |
| CN101447384A (en) * | 2008-12-29 | 2009-06-03 | 电子科技大学 | Multi-level depressurization collector for traveling wave tube |
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| CN102117725A (en) | 2011-07-06 |
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