CN102109413B - 均匀度测量系统与方法 - Google Patents
均匀度测量系统与方法 Download PDFInfo
- Publication number
- CN102109413B CN102109413B CN2009103120451A CN200910312045A CN102109413B CN 102109413 B CN102109413 B CN 102109413B CN 2009103120451 A CN2009103120451 A CN 2009103120451A CN 200910312045 A CN200910312045 A CN 200910312045A CN 102109413 B CN102109413 B CN 102109413B
- Authority
- CN
- China
- Prior art keywords
- image processor
- processor
- uniformity coefficient
- image
- collective optics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0285—Testing optical properties by measuring material or chromatic transmission properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/04—Optical benches therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Description
Claims (10)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009103120451A CN102109413B (zh) | 2009-12-23 | 2009-12-23 | 均匀度测量系统与方法 |
US12/849,756 US20110149066A1 (en) | 2009-12-23 | 2010-08-03 | Method and system for evaluating light uniformity through an optical lens |
EP10186678A EP2339317A3 (en) | 2009-12-23 | 2010-10-06 | Method and System for Evaluating Light Uniformity Through an Optical Lens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009103120451A CN102109413B (zh) | 2009-12-23 | 2009-12-23 | 均匀度测量系统与方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102109413A CN102109413A (zh) | 2011-06-29 |
CN102109413B true CN102109413B (zh) | 2012-06-13 |
Family
ID=43803955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009103120451A Expired - Fee Related CN102109413B (zh) | 2009-12-23 | 2009-12-23 | 均匀度测量系统与方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20110149066A1 (zh) |
EP (1) | EP2339317A3 (zh) |
CN (1) | CN102109413B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103472430B (zh) * | 2013-09-02 | 2015-11-18 | 中国科学院电工研究所 | 太阳模拟器辐照不均匀度和不稳定度测试系统 |
CN107356413B (zh) * | 2017-08-28 | 2024-03-26 | 广东工业大学 | 菲涅尔镜检测装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW463955U (en) * | 2001-03-26 | 2001-11-11 | Prokia Technology Co Ltd | Light-collection module with high light-collection efficiency and the display device comprising this module |
WO2009028332A1 (ja) * | 2007-08-27 | 2009-03-05 | Nikon Corporation | 波面収差計測装置および方法、並びに波面収差調整方法 |
WO2009066599A1 (ja) * | 2007-11-21 | 2009-05-28 | Tokyo Institute Of Technology | 収差測定方法及びその装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04113243A (ja) * | 1990-09-03 | 1992-04-14 | Toshiba Corp | レンズ検査装置 |
JP3201872B2 (ja) * | 1993-05-14 | 2001-08-27 | 富士写真フイルム株式会社 | レンズ検査装置 |
US6195159B1 (en) * | 1998-12-30 | 2001-02-27 | Agfa Corporation | Lens testing system |
JP2003075295A (ja) * | 2001-09-03 | 2003-03-12 | Seiko Epson Corp | レンズの評価方法およびレンズ評価装置 |
JP2005064887A (ja) * | 2003-08-13 | 2005-03-10 | Sankyo Seiki Mfg Co Ltd | カメラおよびカメラ付き携帯機器 |
CN101221088B (zh) * | 2007-01-10 | 2011-11-30 | 鸿富锦精密工业(深圳)有限公司 | 镜片光穿透率检测装置及镜片组装设备 |
US8116624B1 (en) * | 2007-01-29 | 2012-02-14 | Cirrex Systems Llc | Method and system for evaluating an optical device |
CN101650258B (zh) * | 2008-08-14 | 2012-03-14 | 鸿富锦精密工业(深圳)有限公司 | 镜头模组检测装置 |
CN102103034B (zh) * | 2009-12-21 | 2012-08-22 | 富士迈半导体精密工业(上海)有限公司 | 光学特性测量系统与方法 |
-
2009
- 2009-12-23 CN CN2009103120451A patent/CN102109413B/zh not_active Expired - Fee Related
-
2010
- 2010-08-03 US US12/849,756 patent/US20110149066A1/en not_active Abandoned
- 2010-10-06 EP EP10186678A patent/EP2339317A3/en not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW463955U (en) * | 2001-03-26 | 2001-11-11 | Prokia Technology Co Ltd | Light-collection module with high light-collection efficiency and the display device comprising this module |
WO2009028332A1 (ja) * | 2007-08-27 | 2009-03-05 | Nikon Corporation | 波面収差計測装置および方法、並びに波面収差調整方法 |
WO2009066599A1 (ja) * | 2007-11-21 | 2009-05-28 | Tokyo Institute Of Technology | 収差測定方法及びその装置 |
Also Published As
Publication number | Publication date |
---|---|
CN102109413A (zh) | 2011-06-29 |
US20110149066A1 (en) | 2011-06-23 |
EP2339317A3 (en) | 2011-07-20 |
EP2339317A2 (en) | 2011-06-29 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201600 Shanghai City, Songjiang District Songjiang Industrial Zone West science and Technology Industrial Park No. 500 Wen Ji Lu Patentee after: Foxsemicon Semiconductor Precision (Shanghai) Inc. Patentee after: Foxsemicon Integrated Technology Inc. Address before: 201600 Shanghai City, Songjiang District Songjiang Industrial Zone West science and Technology Industrial Park No. 500 Wen Ji Lu Patentee before: Foxsemicon Semiconductor Precision (Shanghai) Inc. Patentee before: Foxsemicon Integrated Technology Inc. |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120613 Termination date: 20131223 |