CN102102170B - Method for preparing color-changing film - Google Patents
Method for preparing color-changing film Download PDFInfo
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- CN102102170B CN102102170B CN 200910311706 CN200910311706A CN102102170B CN 102102170 B CN102102170 B CN 102102170B CN 200910311706 CN200910311706 CN 200910311706 CN 200910311706 A CN200910311706 A CN 200910311706A CN 102102170 B CN102102170 B CN 102102170B
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- optically variable
- preparation
- variable films
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- film
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Abstract
The invention relates to a method for preparing a color-changing film, which comprises the following steps of: providing a substrate; putting the substrate into a vacuum coating cavity, and coating a nitride film on the surface of the substrate; taking the substrate coated with the film out of the vacuum coating cavity, putting into a high temperature furnace and performing pyrolysis; and taking the substrate subjected to pyrolysis out of the high temperature furnace, and cooling. Through the steps of coating the nitride film on the surface of the substrate and performing high temperature pyrolysis, the coated nitride film can present different colors at different observation angles, and the preparation process is simple.
Description
Technical field
The present invention relates to a kind of preparation method of optically variable films.
Background technology
At present, optically variable films is widely used in various fields, as is applied to the shell of electronic product so that the color of the shell of electronic product can change with the variation of angle.Current, the method for making optically variable films mainly is evaporation.Particularly, the rete that replaces by on substrate, plating successively the high low-refraction of multilayer, therefore more complicated on processing procedure.If the film thickness monitoring of a skim bad wherein in the process of plated film will make the color changeable effect of film not good.
Summary of the invention
In view of this, be necessary to provide the preparation method of the simple optically variable films of a kind of preparation process.
A kind of preparation method of optically variable films, it comprises the steps: to provide a substrate; Described substrate is put into the vacuum plating chamber, at the plated surface last layer nitrided film of described substrate; Substrate behind the plated film is taken out from the vacuum plating chamber, put into High Temperature Furnaces Heating Apparatus and carry out thermo-cracking; Substrate after the thermo-cracking is taken out from High Temperature Furnaces Heating Apparatus, cool off, obtaining this optically variable films, and this optically variable films presents distinct colors in different viewing angles.Wherein, the temperature of carrying out thermo-cracking in High Temperature Furnaces Heating Apparatus is 200～500 ℃, and the pressure that carries out thermo-cracking in High Temperature Furnaces Heating Apparatus is 10
-2～10
-4Torr, reaching the time of carrying out thermo-cracking in High Temperature Furnaces Heating Apparatus is 10 minutes～2 hours.
The preparation method of optically variable films of the present invention, by after described substrate plating one deck nitrided film, the step of adding again one high temperature pyrolysis just can make the nitrided film that plates present distinct colors in different viewing angles, and preparation process is simple.
Description of drawings
Fig. 1 is preparation method's the schema of the optically variable films of better embodiment of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail.
See also Fig. 1, the preparation method 100 of a kind of optically variable films that provides for embodiment of the present invention, it comprises the steps:
S1 a: substrate is provided.Concrete, described substrate is stainless steel substrate.
S2: described substrate is put into the vacuum plating chamber adopt dc magnetron sputtering method to carry out sputter, make the plated surface last layer nitrided film of described substrate, such as TiN film or TiCN film.Concrete, the vacuum pressure in the described vacuum plating chamber is 3 * 10
-3Torr(holder, wherein 1Torr=133.3Pa), as target, the power of ion bombardment source is 220W with titanium (Ti), electric current is 2～15A.The time of vacuum splashing and plating is 1 hour.If described nitrided film is the TiN film, then the thickness of described TiN film is 400～600nm.With argon gas (Ar) and nitrogen (N
2) mixed gas as working gas, described argon gas (Ar) and nitrogen (N
2) ratio can be 2:1,5:1 or 8:1.If described nitrided film is the TiCN film, then the thickness of described TiCN film is 300～400nm, with argon gas (Ar), nitrogen (N
2) and acetylene (C
2H
2) mixed gas as working gas, described argon gas (Ar), nitrogen (N
2) and acetylene (C
2H
2) ratio be 2:1:0.5.No matter be from the front this moment or the color of side observation stainless steel substrate upper film is all intense violet color.Be appreciated that the method that also can use evaporation carries out plated film.
S3: the substrate that will plate film takes out from the vacuum plating chamber, puts into High Temperature Furnaces Heating Apparatus, carries out thermo-cracking.Concrete, the temperature in the High Temperature Furnaces Heating Apparatus is 200～500 ℃, and the time of thermo-cracking is 10 minutes～2 hours, and pressure is 10
-2～10
-4Torr.Preferably, the temperature in the High Temperature Furnaces Heating Apparatus is 250 ℃, and the time of thermo-cracking is 10 minutes.
S4: the substrate after the thermo-cracking is taken out from High Temperature Furnaces Heating Apparatus, cool off.At this moment, the color of seeing described substrate upper film from the front is that the ocean is blue, if described substrate inclination 20～55 degree observations can be seen that the monoblock substrate becomes again intense violet color.
The preparation method of optically variable films of the present invention, by after described substrate plating one deck nitrided film, the step of adding again one high temperature pyrolysis just can make the nitrided film that plates present distinct colors in different viewing angles, and preparation process is simple.
Be understandable that, for the person of ordinary skill of the art, can make other various corresponding changes and distortion by technical conceive according to the present invention, and all these change the protection domain that all should belong to claim of the present invention with distortion.
Claims (12)
1. the preparation method of an optically variable films, it comprises the steps: to provide a substrate; Described substrate is put into the vacuum plating chamber, at the plated surface last layer nitrided film of described substrate; Substrate behind the plated film is taken out from the vacuum plating chamber, put into High Temperature Furnaces Heating Apparatus and carry out thermo-cracking; Substrate after the thermo-cracking is taken out from High Temperature Furnaces Heating Apparatus, cool off, obtaining this optically variable films, and this optically variable films presents distinct colors in different viewing angles, the temperature of wherein carrying out thermo-cracking in High Temperature Furnaces Heating Apparatus is 200～500 ℃, and the pressure that carries out thermo-cracking in High Temperature Furnaces Heating Apparatus is 10
-2～10
-4Torr, reaching the time of carrying out thermo-cracking in High Temperature Furnaces Heating Apparatus is 10 minutes～2 hours.
2. the preparation method of optically variable films as claimed in claim 1 is characterized in that, described substrate is stainless steel substrate.
3. the preparation method of optically variable films as claimed in claim 1 is characterized in that, described film coating method is dc magnetron sputtering method.
4. the preparation method of optically variable films as claimed in claim 3 is characterized in that, the vacuum pressure in the described vacuum plating chamber is 3 * 10
-3Torr, as target, the power of ion bombardment source is 220W with titanium, and electric current is 2～15A, and the time of vacuum splashing and plating is 1 hour.
5. the preparation method of optically variable films as claimed in claim 4 is characterized in that, the nitrided film that plates on the described substrate is the TiN film, and thicknesses of layers is 400～600nm.
6. the preparation method of optically variable films as claimed in claim 5 is characterized in that, when described substrate is carried out vacuum plating, with the mixed gas of argon gas and nitrogen as working gas.
7. the preparation method of optically variable films as claimed in claim 6 is characterized in that, the ratio of described argon gas and nitrogen is 2:1.
8. the preparation method of optically variable films as claimed in claim 6 is characterized in that, the ratio of described argon gas and nitrogen is 5:1.
9. the preparation method of optically variable films as claimed in claim 6 is characterized in that, the ratio of described argon gas and nitrogen is 8:1.
10. the preparation method of optically variable films as claimed in claim 4 is characterized in that, the nitrided film that plates on the described substrate is the TiCN film, and thicknesses of layers is 300～400nm.
11. the preparation method of optically variable films as claimed in claim 10 is characterized in that, when described substrate is carried out vacuum plating, with the mixed gas of argon gas, nitrogen and acetylene as working gas.
12. the preparation method of optically variable films as claimed in claim 11 is characterized in that, the ratio of described argon gas, nitrogen and acetylene is 2:1:0.5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200910311706 CN102102170B (en) | 2009-12-17 | 2009-12-17 | Method for preparing color-changing film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200910311706 CN102102170B (en) | 2009-12-17 | 2009-12-17 | Method for preparing color-changing film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102102170A CN102102170A (en) | 2011-06-22 |
| CN102102170B true CN102102170B (en) | 2013-09-18 |
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ID=44155233
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|---|---|---|---|
| CN 200910311706 Expired - Fee Related CN102102170B (en) | 2009-12-17 | 2009-12-17 | Method for preparing color-changing film |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104975258A (en) * | 2015-03-28 | 2015-10-14 | 桐城市新丰彩印包装有限公司 | Preparing technology for color changing film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201204624Y (en) * | 2008-04-03 | 2009-03-04 | 中兴通讯股份有限公司 | Color-changing mobile phone case |
| CN101450577A (en) * | 2007-11-29 | 2009-06-10 | 比亚迪股份有限公司 | Method for forming multi-color cladding coat |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19501640C2 (en) * | 1995-01-20 | 1999-07-01 | Schott Glas | Recyclable screens for cathode ray tubes with an adjustable spectral transmission curve made of glass and process for their production |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101450577A (en) * | 2007-11-29 | 2009-06-10 | 比亚迪股份有限公司 | Method for forming multi-color cladding coat |
| CN201204624Y (en) * | 2008-04-03 | 2009-03-04 | 中兴通讯股份有限公司 | Color-changing mobile phone case |
Non-Patent Citations (7)
| Title |
|---|
| JP平8-253348A 1996.10.01 |
| PCVD法TiN、TiCN涂层工艺研究;任志华等;《青岛化工学院报》;19931231;第14卷(第4期);第59页第2.1.3节至第60页3 结论之前的部分 * |
| V.Valvoda等.X-ray analysis of heating-treated titanium nitride films.《Thin Solid Films》.1989,第170卷(第2期),第201页倒数第8行至第202页表2). |
| X-ray analysis of heating-treated titanium nitride films;V.Valvoda等;《Thin Solid Films》;19890315;第170卷(第2期);第201页倒数第8行至第202页表2) * |
| 任志华等.PCVD法TiN、TiCN涂层工艺研究.《青岛化工学院报》.1993,第14卷(第4期),第59页第2.1.3节至第60页3 结论之前的部分. |
| 氮流量对磁控溅射法制备氮化钛薄膜光学性能的影响;黄佳木等;《光学学报》;20050930;第25卷(第9期);第1294页左栏 2.1薄膜制备部分，右栏表1 * |
| 黄佳木等.氮流量对磁控溅射法制备氮化钛薄膜光学性能的影响.《光学学报》.2005,第25卷(第9期),第1294页左栏 2.1薄膜制备部分，右栏表1. |
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| CN102102170A (en) | 2011-06-22 |
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