CN102081253B - Color filter and method for manufacturing test pattern - Google Patents
Color filter and method for manufacturing test pattern Download PDFInfo
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- CN102081253B CN102081253B CN 200910225000 CN200910225000A CN102081253B CN 102081253 B CN102081253 B CN 102081253B CN 200910225000 CN200910225000 CN 200910225000 CN 200910225000 A CN200910225000 A CN 200910225000A CN 102081253 B CN102081253 B CN 102081253B
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Abstract
The invention provides a color filter. The color filter comprises a black matrix pattern and a plurality of color filter patterns, wherein a plurality of openings are formed on the black matrix pattern; each color filter pattern is provided with a main body part and an extrusion part; the main body part is position in one of the openings, while the extrusion part is connected to the main body part and covers on the black matrix pattern; and the extrusion part of each color filter pattern is directly contacted with the extrusion part of one adjacent color filter pattern so as to define a contact surface when the adjacent color filter pattern is made of a different material, and the contact surface is not parallel to the covered top surface of the black matrix pattern.
Description
Technical field
The invention relates to the method for making of a kind of colored filter and test pattern, and particularly relevant for the method for making of a kind of the second best in quality colored filter and test pattern.
Background technology
The color plane display is used recently widely.Along with the improvement of Driving technique, make it have low consumption of electric power, slim, the advantages such as amount is light, low voltage drive.At present, the color plane display has been applied in widely and has shot with video-corder on projector, mobile computer, desktop display and the various projector equipment.
Generally speaking, the color plane display mainly is the effect that is reached colouring by a colored filter.Mainly comprise black matrix pattern and color filter patterns etc. on the colored filter.The setting of black matrix pattern can also prevent that except separating the color filter patterns the locational light of thin film transistor (TFT) in the flat-panel screens, character line and bit line from leaking (Light leakage) phenomenon.The at present black employed material of matrix pattern mainly is divided into two large classes, and one is for example chromium metal (Chromium, Cr) of metal species, and another is resene.Wherein, although have good shaded effect with the black matrix pattern of chromium metal material, based on environmental requirement, the chromium metal is not used gradually.
The black matrix pattern of resene is except environmental protection comparatively, and the processing procedure of its processing procedure and follow-up formation red, green, blue color photoresistance is similar, and has quite high practicality.But because the effect that light covers is relatively poor, resin bed must have thicker thickness, for example just can reach between 1.2 μ m to 1.5 μ m.As the black matrix pattern on the colored filter, meeting is so that significant fluctuating situation appears in the surface of colored filter with so thick resin bed.Therefore, the both alignment layers that is formed on the colored filter has the inhomogeneous situation of orientation easily, and electrode layer also often has the phenomenon of broken string and cause display quality not good.
Summary of the invention
The invention provides a kind of colored filter, the fluctuating between the adjacent color filter patterns is comparatively mild.
The invention provides a kind of method for making of test pattern, make the milder colored filter of surface undulation to obtain suitable process conditions by test pattern.
The present invention proposes a kind of colored filter, and it comprises black matrix pattern and an a plurality of color filter patterns.Black matrix pattern has a plurality of openings.Each color filter patterns has a main part and a teat.Main body section is in one of them opening, and teat is connected in main part and be covered on the black matrix pattern, wherein directly the teat of adjacent one of them color filter patterns of contact is defining a surface of contact in adjacent color filter patterns during as unlike material for the teat of each color filter patterns, and surface of contact is not parallel with the capped top surface of black matrix pattern.
In one embodiment of this invention, above-mentioned black matrix pattern comprises many horizontal lines and many ordinates, and horizontal line and ordinate cross opening.The teat of each color filter patterns for example is covered in wherein on the ordinate, or wherein on horizontal line.
In one embodiment of this invention, above-mentioned teat comprises a plurality of outstanding patterns.
In one embodiment of this invention, above-mentioned colored filter also comprises an electrode layer, and it covers black matrix pattern and color filter patterns, and on the teat that is in contact with one another, electrode layer is continuous.
In one embodiment of this invention, above-mentioned black matrix pattern is a resin black matrix.
In one embodiment of this invention, the thickness of above-mentioned color filter patterns is essentially 1.2 μ m-2.0 μ m.
In one embodiment of this invention, above-mentioned colored filter more comprises a both alignment layers, and it covers black matrix pattern and color filter patterns.
The present invention also proposes a kind of method for making of test pattern.At first, form a black matrix pattern, and black matrix pattern has equally spaced a plurality of opening.Then, on black matrix pattern, form one first photoresist layer.Take one first light shield as cover curtain, patterning the first photoresist layer.The first light shield has a plurality of the first mask pattern, and corresponding to the part opening, wherein the width of the first mask pattern is different, to form corresponding a plurality of the first test patterns.Then, on black matrix pattern and the first test pattern, form one second photoresist layer.And, take one second light shield as cover curtain, patterning the second photoresist layer.The second light shield has a plurality of the second mask pattern corresponding to another part opening, and the width difference of the second mask pattern is to form a plurality of the second test patterns adjacent to the first test pattern.
In one embodiment of this invention, the first above-mentioned photoresist layer is different from the material of the second photoresist layer.
In one embodiment of this invention, the first above-mentioned photoresist layer is wherein one of a red photoresistance material layer, a blue light resistance material layer or a green photoresistance material layer, and the second photoresist layer is another one.
In one embodiment of this invention, the method for making of above-mentioned test pattern more comprises the width of adjusting the first mask pattern and the width of the second mask pattern, so that one of them first test pattern directly contacts one of them second test pattern on black matrix pattern.
In one embodiment of this invention, the method for making of above-mentioned test pattern more comprises the process conditions of adjusting patterning process, so that one of them first test pattern directly one of them second test pattern of contact is defining a surface of contact on black matrix pattern, and surface of contact is not parallel with the capped top surface of black matrix pattern.
Based on above-mentioned, the present invention finds suitable process conditions to make colored filter by the making of test pattern.In the colored filter, adjacent color filter patterns can directly contact and not overlap and make the surface undulation of colored filter comparatively mild.So other rete on the color filter patterns can have preferable quality and reliability.That is to say that colored filter of the present invention is superior in quality and reliability is good.
For above-mentioned feature and advantage of the present invention can be become apparent, embodiment cited below particularly, and cooperate appended graphic being described in detail below.
Description of drawings
Fig. 1 illustrates on the colored filter for one embodiment of the invention and looks synoptic diagram.
Fig. 2 is the diagrammatic cross-section that the colored filter of Fig. 1 illustrates along hatching line I-I '.
Fig. 3 illustrates on the colored filter for another embodiment of the present invention and looks synoptic diagram.
Fig. 4 illustrates as looking synoptic diagram on the colored filter of another embodiment of the present invention.
Fig. 5-Fig. 8 illustrates the test pattern method for making into one embodiment of the invention.
Fig. 9 illustrates on the test pattern for one embodiment of the invention and looks synoptic diagram.
Embodiment
Fig. 1 illustrates on the colored filter for one embodiment of the invention and looks synoptic diagram, and the diagrammatic cross-section that Fig. 2 is the colored filter of Fig. 1 to be illustrated along hatching line I-I '.Please be simultaneously with reference to Fig. 1, colored filter 100 comprises black matrix pattern 110 and an a plurality of color filter patterns 120.Black matrix pattern 110 has a plurality of openings 112.Each color filter patterns 120 is arranged in one of them opening 112 at least.In the present embodiment, black matrix pattern 110 for example comprises many horizontal lines 114 and many ordinates 116, and horizontal line 114 and ordinate 116 cross opening 112.That is to say that black matrix pattern 110 is latticed design.
In the present embodiment, black matrix pattern 110 is a resin black matrix.In order to reach good shaded effect, the thickness of black matrix pattern 110 must have certain thickness.In addition, the thickness of color filter patterns 120 is essentially 1.2 μ m-2.0 μ m.In order to reach good filter effect, color filter patterns 120 must partly be overlapped on the black matrix pattern 110.Therefore, the surface of colored filter 100 has significant fluctuations easily.For instance, in black matrix pattern 110 and color filter patterns 120 overlappings place, the surface undulation of colored filter 100 changes consistent with the thickness of color filter patterns 120 at least or approximate.Such surface undulation is unfavorable for subsequent components or the making of rete, also can affect subsequent components or the quality of rete.
So present embodiment proposes the design that each color filter patterns 120 has a main part 122 and a teat 124.Main part 122 is arranged in one of them opening 112, and teat 124 is connected in main part 122 and be covered on the black matrix pattern 110.In addition, the teat 124 of each color filter patterns 120 directly contacts the teat 124 of one of them adjacent color filter patterns 120.Particularly, when adjacent color filter patterns 120 was unlike material, contacted teat 124 defined a surface of contact 126.Particularly, the teat 122 of each color filter patterns 120 for example is covered in wherein on the ordinate 114.
Please refer to Fig. 2, colored filter 100 also comprises a substrate 102, and black matrix pattern 110 and color filter patterns 120 are to be disposed on the substrate 102.In the color filter patterns 120 of present embodiment, teat 124 is extended and the black matrix pattern 110 of covering part to black matrix pattern 110 by main part 122.
It is worth mentioning that if adjacent teat 124 covers each other, then surface of contact 126 is parallel with the top surface 114 that black matrix pattern 110 is capped.Such configuration relation meeting is unfavorable for quality and the reliability of subsequent film so that the surface undulation of colored filter 100 aggravates.Therefore, the surface of contact 126 of present embodiment is not parallel with the top surface 114 that black matrix pattern 110 is capped.Thus, adjacent color filter patterns 120 is direct contact but does not cover so that the fluctuating on colored filter 100 surfaces is comparatively mild each other.Therefore, present embodiment is designed with quality and the reliability that helps improve subsequent film.
In detail, colored filter 100 also comprises an electrode layer 130, and it covers black matrix pattern 110 and color filter patterns 120.It is worth mentioning that the design of teat 124 has been arranged, colored filter 100 has the milder surface of fluctuating.So on the teat 124 that is in contact with one another, electrode layer 130 is continuous.That is to say that the design of present embodiment helps avoid electrode layer 130 and breaks because of too significant surface undulation.
In addition, colored filter 100 also comprises a both alignment layers 140, and it covers black matrix pattern 110 and color filter patterns 120.Similarly, the design of present embodiment is because adjacent teat 124 contacts with each other, and both alignment layers 140 can be formed on the comparatively mild surface of fluctuating.Thus, the orientation effect that provides in each zone of both alignment layers 140 can be comparatively even.
The continuity that being designed with of teat 124 helps to improve electrode layer 130 also can increase the homogeneity of both alignment layers 140.So colored filter 100 has good quality.In the present embodiment, teat 124 is to be arranged at main part 122 both sides and to cover on the ordinate 116 of black matrix pattern 110.But, in other embodiments, teat 124 can arrange according to other mode.
Fig. 3 illustrates on the colored filter for another embodiment of the present invention and looks synoptic diagram.Please refer to Fig. 3, colored filter 200 all comprises black matrix pattern 110 and color filter patterns 120 with aforesaid colored filter 100.In the present embodiment, the color filter patterns 120 of colored filter 200 more comprises the teat 224 that is covered on the horizontal line 114.Each color filter patterns 120 can directly contact horizontal adjacent colored filter 120, also can directly contact vertically adjacent colored filter 120.In addition, in the present embodiment, vertically adjacent color filter patterns 120 for example is made by identical material, so teat 224 can be one-body molded with main part 122.Vertically adjacent color filter patterns 120 also can be formed in one and undefinedly goes out surface of contact.
Under such design, on electrode layer (not illustrating) was disposed at color filter patterns 120 and black matrix pattern 110, electrode layer (not illustrating) was laterally and all be not easy the problem of broken string vertically.Similarly, when disposing both alignment layers (not illustrating) on the colored filter 200, the orientation homogeneity of both alignment layers (not illustrating) can further promote.In other words, the surface undulation of colored filter 200 makes colored filter 200 have better quality comparatively gently.
It is worth mentioning that in other embodiments, colored filter 200 also can only have the design of teat 224.The present invention does not limit the allocation position of teat, does not cover each other with regard to spirit according to the invention as long as adjacent color filter patterns 120 contacts with each other in black matrix pattern 110.
Fig. 4 illustrates as looking synoptic diagram on the colored filter of another embodiment of the present invention.Please refer to Fig. 4, colored filter 300 is roughly the same with the colored filter 200 of Fig. 3.But, teat 320 comprises a plurality of outstanding patterns 324 in the colored filter 300.That is to say that the teat 320 of present embodiment is not that single pattern consists of but is made of a plurality of pattern.Such design can more effectively be promoted the orientation homogeneity of both alignment layers (not illustrating).Certainly, the continuity of electrode layer (not illustrating) also is not easy influenced, that is is not easy the problem generation of broken string.
In the above-mentioned colored filter 100,200 and 300, color filter patterns 120 is with redness, green or blue photoresist forms through the micro-photographing process patterning.Different photoresists have different exposure susceptibility.Therefore, the color filter patterns 120 of different colours is contacted with each other but do not overlap, adopt possibly specific process conditions.The present invention proposes a kind of method for making of test pattern then, to obtain suitable process conditions.
Fig. 5-Fig. 8 illustrates the test pattern method for making into one embodiment of the invention, and Fig. 9 illustrates on the test pattern for one embodiment of the invention and looks synoptic diagram.At first, please refer to Fig. 5, form a black matrix pattern 510 in substrate 502, and black matrix pattern 510 has equally spaced a plurality of opening 512.The method for making of present embodiment is in order to obtain suitable process conditions to make above-mentioned colored filter 100,200 and 300.Therefore, for example the black matrix pattern 110 with above-mentioned is identical for the size design of black matrix pattern 510.
Then, please simultaneously with reference to Fig. 6 and Fig. 7, on black matrix pattern 510, form one first photoresist layer 520 '.The first photoresist layer 520 ' is wherein one of a red photoresistance material layer, a blue light resistance material layer or a green photoresistance material layer.
In addition, take one first light shield 610 as cover curtain, patterning the first photoresist layer 520 '.It is worth mentioning that the first light shield 610 has a plurality of the first mask pattern 612, it is corresponding to part opening 512, and the width W 1 of the first mask pattern 612 is different separately.Can be patterned into corresponding a plurality of the first test patterns 520 via the first photoresist layer 520 ' after the micro-photographing process steps such as exposure, development.At this moment, the width of the first test pattern 520 can be different with the wide variety of the first mask pattern 612.Therefore, each first test pattern 520 is covered in the first teat 520W that deceives on the matrix pattern 510 and also has different in width.
Afterwards, please simultaneously with reference to Fig. 7 and Fig. 8, on black matrix pattern 510 and the first test pattern 520, form one second photoresist layer 530 '.And, take one second light shield 620 as cover curtain, patterning the second photoresist layer 530 ' and form a plurality of the second test patterns 530 adjacent to the first test pattern 520.The second light shield 620 has a plurality of the second mask pattern 622 corresponding to another part opening 512, and the width of the second mask pattern 622 is different.So the second teat 530W that the second test pattern 530 is covered in black matrix pattern 510 also has different width.In addition, the second photoresist layer 530 ' of present embodiment is wherein another one of a red photoresistance material layer, a blue light resistance material layer or a green photoresistance material layer.That is to say that the first test pattern 520 is different from the material of the second test pattern 530.
Please then with reference to Fig. 9, can make the test pattern 500 that illustrates such as Fig. 9 according to above-mentioned making step.In above-mentioned fabrication steps, the first mask pattern 612 has respectively different width W 1 and the second mask pattern 622 also has respectively different width W 2.So, above the black matrix pattern 510 of specific dimensions design, have different gap a-e between the first test pattern 520 and the second test pattern 530.
Particularly, the making side of present embodiment also comprises the width W 1 of adjusting the first mask pattern 612 and the width W 2 of the second mask pattern 622, so that one of them first test pattern 520 directly contact but one of them second test pattern 530 that do not overlap on black matrix pattern 510.That is to say that present embodiment will be found out gap a-e by the making of test pattern 500 and be reduced into 0 process conditions.It is worth mentioning that the first photoresist layer 520 ' and the second photoresist layer 530 ' are different photoresist layers, so both are different for the susceptibility of step of exposure in the micro-photographing process.Therefore, the size of gap a-e also can be by the control of the process conditions of patterning process, and for example the length of time shutter is adjusted.
Because the first test pattern 520 and the second test pattern 530 be different materials, the first test pattern 520 directly contacts but second test pattern 530 that do not overlap can define not the parallel surface of contact of top surface that is capped with black matrix pattern 510.That is to say, once find such process conditions, just can be applied to above-mentioned colored filter 100,200 and 300 making.
In sum, color filter patterns of the present invention directly contacts on black matrix but does not overlap.In the zone that color filter patterns contacts with each other, the surface undulation of colored filter is less.So, be not easy to produce the problem of broken string when forming electrode layer.The situation that also is not easy the orientation inequality when in addition, forming both alignment layers occurs.In addition, the test pattern method for making that proposes of the present invention photoresistance that can test unlike material can form the color filter patterns that contacts with each other under which kind of condition.
Although the present invention with embodiment openly as above; so it is not to limit the present invention; have in the technical field under any and usually know the knowledgeable; without departing from the spirit and scope of the present invention; when doing a little change and retouching, so protection scope of the present invention is as the criterion when looking aforesaid the claim scope person of defining.
Claims (5)
1. the method for making of a test pattern is characterized in that, comprising:
Form a black matrix pattern, this black matrix pattern has equally spaced a plurality of opening;
On this black matrix pattern, form one first photoresist layer;
Take one first light shield as the cover curtain, this first photoresist layer of patterning, this first light shield has a plurality of the first mask pattern, and corresponding to those openings of part, wherein the width of those the first mask pattern is different, to form corresponding a plurality of the first test patterns;
On this black matrix pattern and those the first test patterns, form one second photoresist layer;
Take one second light shield as the cover curtain, this the second photoresist layer of patterning, this second light shield has a plurality of the second mask pattern corresponding to another those openings of part, and the width difference of those the second mask pattern is to form a plurality of the second test patterns adjacent to those the first test patterns; And
Adjusting process conditions, is 0 process conditions thereby find out described the first test pattern and described the second test pattern gap.
2. the method for making of test pattern as claimed in claim 1 is characterized in that, this first photoresist layer is different from the material of this second photoresist layer.
3. the method for making of test pattern as claimed in claim 1 is characterized in that, this first photoresist layer is wherein one of a red photoresistance material layer, a blue light resistance material layer or a green photoresistance material layer, and this second photoresist layer is another one.
4. the method for making of test pattern as claimed in claim 1, it is characterized in that, adjust process conditions and comprise the width of adjusting those the first mask pattern and the width of those the second mask pattern, so that wherein this first test pattern directly contacts wherein this second test pattern on this black matrix pattern.
5. the method for making of test pattern as claimed in claim 1, it is characterized in that, adjust process conditions and comprise the process conditions of adjusting patterning process, so that wherein this first test pattern on this black matrix pattern directly contact wherein this second test pattern to define a surface of contact, this surface of contact is not parallel with the top surface that this black matrix pattern is capped, and the process conditions of wherein adjusting patterning process comprises the length of adjusting the time shutter.
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| CN103257475B (en) * | 2013-04-25 | 2016-04-13 | 京东方科技集团股份有限公司 | The preparation method of a kind of color membrane substrates, color membrane substrates and display device |
| CN103777399B (en) * | 2013-12-27 | 2016-09-14 | 京东方科技集团股份有限公司 | Color membrane substrates and display device |
| TWI623792B (en) * | 2017-08-07 | 2018-05-11 | 友達光電股份有限公司 | Display panel |
| CN111338119B (en) * | 2018-12-19 | 2023-01-03 | 上海仪电显示材料有限公司 | Color filter substrate and chromaticity measuring method |
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Effective date of registration: 20230619 Address after: Lake 558, Fen Hu Town, Wujiang District, Jiangsu, Suzhou Patentee after: Wujiang FenHu technology entrepreneurship Service Co.,Ltd. Address before: 215217, No. 88, Tung Hing Road, Tongli District, Wujiang Economic Development Zone, Suzhou, Jiangsu Patentee before: CPTW (WUJIANG) Co.,Ltd. Patentee before: Chunghwa Picture Tubes, Ltd. |