CN102081236A - Optical processing device in laser annealing equipment - Google Patents
Optical processing device in laser annealing equipment Download PDFInfo
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- CN102081236A CN102081236A CN 201110030445 CN201110030445A CN102081236A CN 102081236 A CN102081236 A CN 102081236A CN 201110030445 CN201110030445 CN 201110030445 CN 201110030445 A CN201110030445 A CN 201110030445A CN 102081236 A CN102081236 A CN 102081236A
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Abstract
The invention relates to development of an optical processing device in laser annealing equipment, and the device can also be applied to other relevant fields. The optical processing device is characterized in that two replaceable assemblies and an iris diaphragm are combined, multiple sets of systems can be used for each assembly, and the first replaceable assembly and the iris diaphragm can be controlled together by a computer. By replacing the two assemblies and regulating a lens position in the first replaceable assembly and the iris diaphragm, users can autonomously select the shapes of faculae as a rectangle or square and carry out grading and continuous regulation on the sizes of the faculae in a larger range so that production efficiency is improved, and the stability and the usability of the whole system are also improved.
Description
Technical field
The invention belongs to the optical processing system in a kind of laser annealing apparatus, particularly relate to the design and the specific embodiments of governing loop in this optical processing system.
Background technology
In economic globalization, informationalized today, the IC industry influences the strategy of national economy, politics and national defense safety beyond doubt must strive industry.At present, world IC equipment industry has become the driving force and the important component part of IC industry.In the past few decades, More's law is followed in the integrated circuit manufacturing, has experienced growth at full speed.The scaled down made of integrated circuit but, the very big difficulty and the challenge that have also brought very small dimensions technology aspect.
In the nano-scale CMOS device, the inhibition short-channel effect of becoming a partner of super shallow and low-resistivity obtains the important effect of better device performance play more and more.Because the restriction of OXIDATION ENHANCED DIFFUSION and instantaneous enhancing diffusion and solid solubility, traditional rapid thermal annealing (RTA) has been difficult to satisfy the requirement of 32nm and following each technology node.In order to address this problem, some new annealing technologies of big quantity research substitute RTA at present, as: flash light annealing (Flash Lamp Annealing or FLA), the annealing of solid phase laser pulse (Solid-PhaseLaser Spike Anneal ing or LSA), liquid laser pulse annealing (Liquid-Phase LaserThermal Process or LTP), and low temperature solid phase epitaxy (Solid-Phase EpitaxialRecrystallization or SPER) etc.Wherein, laser annealing technology has demonstrated good application prospects.
Because the laser pulse annealing device substitutes RTA equipment at last, the production that becomes the super shallow PN junction of 32nm and following each technology node device from now on is with the annealing equipment, and research laser pulse annealing device and technology have very strong actual application prospect.
Again because used light source is generally excimer laser or other have the laser instrument of higher-wattage in the laser annealing apparatus, and its beam quality of this LASER Light Source is undesirable, generally can not be directly used in laser annealing.For example the hot spot of excimer laser is generally circle, and the energy distribution in cross section is inhomogeneous, the sharpness at edge is also not enough, so before projecting work surface, must carry out steps such as beam shaping, homogenize, edge treated, projection to it by an optical system.As seen, the optical system in the laser annealing apparatus has key effect for whole annealing system, and a good optical system not only can improve the quality and the stability of laser annealing, can also strengthen the applicability and the adjustability of annealing device simultaneously.
Summary of the invention
According to an aspect of the present invention, provide a kind of optical processing system that is used for laser annealing, it is characterized in that comprising:
Beam-expanding system is used for the laser beam from a light source is expanded bundle;
The homogenize system is used to make the beam energy of described beam-expanding system output even;
The edge treated system is used to obtain the hot spot of required clear-cut margin;
Optical projection system is used for the hot spot of homogenize is projected machined surface.
Description of drawings
Fig. 1 has shown laser annealing apparatus optical system principle schematic according to an embodiment of the invention.
Fig. 2 A-2D has shown array of spherical lenses synoptic diagram according to an embodiment of the invention.
Fig. 3 A and 3B have shown iris synoptic diagram according to an embodiment of the invention.
Fig. 4 is the optical system synoptic diagram according to a preferred embodiment of the present invention.
Fig. 5 is that spherical mirror array position according to an embodiment of the invention concerns synoptic diagram.
Fig. 6 A-6D is the structural representation of two kinds of optional embodiment in addition of first replaceable component.
Fig. 7 A and 7B have shown the computer artificial result synoptic diagram of embodiments of the invention.
Embodiment
The objective of the invention is to propose a kind of optical processing system that is used for laser annealing apparatus, wherein in traditional optical system, add the scalable link, make shape, area and the energy density scalable of the laser facula in the annealing device, expanded the applicable situation of laser annealing apparatus, only just can anneal to the material of difformity and area effectively with an equipment, not only make cost reduction, easy and simple to handle, also help probing into annealing process.
Consult Fig. 1, the optical processing system of laser annealing apparatus according to an embodiment of the invention comprises Ultra-Violet Laser light source 101 and the subsequent optical system that the laser beam of sending from light source is handled.
According to a specific embodiment of the present invention, above-mentioned Ultra-Violet Laser light source can be excimer laser, also can be NdYAG (frequency multiplication is to 266nm) laser instrument.
According to a specific embodiment of the present invention, the light beam that described Ultra-Violet Laser light source sends for the collimation or the angle of divergence less than 1 °, have higher energy density to satisfy the requirement of laser annealing.
According to one embodiment of present invention, described subsequent optical system can comprise:
Beam-expanding system, homogenize system, edge treated system, optical projection system.
Beam-expanding system comprises lens 102,103.According to a specific embodiment of the present invention, lens 102,103 all are spherical convex lens, so just become an inverted Kepler telescope system; According to another specific embodiment of the present invention, lens 102 are the sphere concavees lens, and lens 103 are spherical convex lens, so just constitute an inverted Galileo telescope system.What show among Fig. 1 is the previous case.In order to reduce spherical aberration, preferably use plano-convex lens, and the direction that is provided with of lens is had certain requirement.
The homogenize system comprises part 104,105A, 105B; Part 104 is array of spherical lenses, plays the effect of cutting apart light beam; Part 105A and 105B are spherical convex lens, and both form a zoom system, pancreatic system, and focal length is adjustable continuously within the specific limits.The concrete structure of above-mentioned array of spherical lenses 104 according to an embodiment of the invention such as Fig. 2, wherein Fig. 2 A is its front view, Fig. 2 B is its side view, the sphere infinitesimal of array of spherical lenses is two-dimensional matrix and arranges shown in Fig. 2 A, the one side of each spherical microlens is a square-shaped planar, and another side is a sphere; Fig. 2 C and 2D are its enlarged diagram, and wherein Fig. 2 C is a front view, and Fig. 2 D is a side view.
The edge treated system comprises: iris 106, the shape and size of iris 106 can be controlled, can regulate the clear aperture of beam cross section X, Y both direction by regulating device.Concrete structure according to the iris 106 of a specific embodiment of the present invention is seen Fig. 3 A and 3B, and Fig. 3 A is a front view, and Fig. 3 B is a side view, label 301 is a governor motion, and 302 is window, and 303 is column, 304 is effective clear aperture, and 305 is rule, and 306 is the edge of a knife.Can regulate the position of the edge of a knife 306 by governor motion 301, and then change effective clear aperture 304.
Optical projection system comprises spherical convex lens 107A, sphere concavees lens 107B, spherical convex lens 107C, circular dull and stereotyped 107D, and they have formed an imaging system jointly, and has predetermined enlargement ratio.For the aberration that makes this imaging system minimum, design this imaging system by using Aberration Theory with corresponding optical design software, can design the imaging system (its specific design process is ripe method) of various different parameters, thereby the homogenize face of the logical light mouth of iris is imaged onto required machined surface 108 undistortedly, keeps all even edges sharp keen of beam cross section energy.In order to make that finally to be used to the beam cross section size stepping processed adjustable, by designing the above-mentioned imaging and projecting systems of the different enlargement ratios of many covers, and, can make that beam cross section size stepping is adjustable by replacing them.
Imaging surface 108 after the process optical projection system projection shown in Fig. 1 that is to say work surface.This lip-deep hot spot character satisfies the requirement of laser annealing.After the optical processing of the light beam that laser light source sends through above-mentioned expansion bundle, homogenize, edge treated, this four systems of projection, satisfied the requirement of laser annealing when arriving machined surface 108 to hot spot homogeneity, clear-cut margin degree etc.
Shown in the embodiment of Fig. 1, in the optical system of the present invention, the laser that sends from light source 101 enters the homogenize system through the expansion bundle of beam-expanding system.104 pairs of incident beams of array of spherical lenses in the homogenize system are cut apart, and the beamlet after respectively cutting apart is assembled effective clear aperture 304 planes that are superimposed on iris 106 again through above-mentioned zoom system, pancreatic system 105A, 105B, and the beam energy on this plane is even.This plane also is a work surface 108 through follow-up optical projection system projection imaging to imaging surface simultaneously.
Fig. 4 has shown a preferred embodiment of the present invention.
Consult Fig. 4, the used LASER Light Source 401 of this laser anneal device is a ultraviolet laser, this laser instrument can be excimer laser, it also can be NdYAG (frequency multiplication is to 266nm) laser instrument, the laser beam that requires this laser instrument to send simultaneously is a collimation (angle of divergence is less than 1 °), and has high energy density to satisfy the requirement of annealing to energy.
Because existing ultraviolet laser output beam energy distribution on the cross section is inhomogeneous, light spot shape, size, edge character all do not meet the needs of laser annealing yet, so need a special optical system that it is improved.
Above-described optical system comprises beam-expanding system, homogenize system, edge treated system, optical projection system.Consult Fig. 4, in the above-mentioned optical system, beam-expanding system comprises spherical convex lens 402,403.The homogenize system comprises two parts, the one, cut apart the assembly of light beam, and comprise identical two array of spherical lenses 404A of parameter and 404B; Another is first replaceable component shown in the figure, and it comprises two spherical convex lens 405A and 405B.Aforesaid edge treated system comprises iris 406, its structure such as Fig. 3.Optical projection system comprises two parts, the one, and the assembly of turnover light path, promptly plane mirror 407; Another is second replaceable component shown in the figure, and it comprises spherical convex lens 408A and 408C, sphere concavees lens 408B and flat-plate lens 408D; Whole second replaceable component is exactly an imaging system in fact.
Two replaceable components among Fig. 4 in frame of broken lines, all the other elements all are designed to integral type, promptly are arranged in common mechanical base, in case assembling is finished, position relation each other is also promptly fixing, can't change.Two replaceable components cooperate with pedestal by certain physical construction, and the interface of replaceable component and outside pedestal is standardized, regulate, realize function of the present invention so that install.
Above-mentioned beam-expanding system directly places after the light source 401, between the two apart from not limiting.According to a specific embodiment of the present invention, beam-expanding system comprises two spherical convex lens 402,403, and both form an inverted Kepler telescope system: lens 402 and 403 focal position overlap.In order to reduce spherical aberration, spherical lens is designed to plano-convex, the arranged direction to them has certain requirement simultaneously, and arranged direction is as shown in Figure 4.According to another specific embodiment of the present invention, lens 402 and 403 also can be designed to an inverted Galileo telescope system, and promptly lens 402,403 also can be respectively sphere concavees lens and spherical convex lens.
Collimated light beam is by 402 confocal position that are gathered in lens 402 and 403, after again scioptics 403 obtain the collimated light beam that bores enlarge.After beam-expanding system the homogenize system, but between the two apart from not limiting.
In the above-mentioned homogenize system, array of spherical lenses 404A and 404B are the array of spherical lenses of same parameter specification, and its synoptic diagram is referring to Fig. 2; In order to improve the homogenize effect, arranged two identical array of spherical lenses before and after this preferred embodiment, and between the two apart from certain requirement is arranged, consult shown in Figure 5.Lens 405A, 405B in the system of homogenize simultaneously are spherical convex lens, both constitute first replaceable component, they also are zoom links simultaneously, by regulating the mutual alignment relation of lens 405A and 405B, can change the focal length of whole first replaceable component.Above-described lens 405A and 405B place first replaceable component, both are positioned in the mechanism of similar leading screw together with mirror holder separately, therefore both relative positions can be regulated arbitrarily, to realize the function of focusing continuously, make the focal plane of this first replaceable component and effective clear aperture 304 planes overlapping of iris 406 (Fig. 3 is seen in its structural representation) simultaneously.
Collimated light beam is undertaken after light beam cuts apart by above-mentioned array of spherical lenses 404A, 404B, produces the directional light of all directions in certain deviation angular range.What produce respectively organizes each point that directional light converges at its focal plane through the spherical convex lens 405A in first replaceable component, 405B, and the light beam of respectively cutting apart is able to overlapping, makes that the energy even in above-mentioned focal plane distributes.
In the adjustment process of above-mentioned first replaceable component, the hot spot at place, focal plane remains square, and promptly the size on X, the Y two-dimensional direction changes simultaneously.In practicality, can be designed to many covers to first replaceable component, lens wherein also can close for set of cylindrical lenses, consult shown in Figure 6: wherein 601,602,603,604,605,606 all is cylindrical convex lens.6-1A and 6-1B are the situations of not focusing, and they are respectively side view and vertical view under this situation; 6-2A and 6-2B are the situations of adjustable focus, and they are respectively side view and vertical view under this situation.Like this, by selecting the first different replaceable components, the uniform light spots of focal plane also can be a rectangle, and adjustable respectively on X, Y two-dimensional direction.
Comprise an iris 406 in the above-mentioned edge treated system, its effective clear aperture plane is positioned at the place, focal plane of aforementioned first replaceable component, its structural representation is consulted Fig. 3: the position that can change the edge of a knife 306 by regulating device 301 from two dimensions of X, Y, thereby change the size of effective clear aperture 304, the spot size that makes itself and homogenize system obtain adapts, the edge of a knife 306 plays the effect of edge treated simultaneously, obtains the hot spot of required clear-cut margin.
Because the adjusting of the adjusting of lens position and iris size should be adaptive mutually in above-mentioned first replaceable component, so the whole continuous focusing process of unified control that uses a computer.
And then optical projection system after the edge treated system.One is the effect that the plane completely reflecting mirror of arranging at 45 ° of inclination angles 407 plays the turnover light path in the optical projection system.The design of this kind light path makes layout more compactness and science, also can make cooperating of optical system and laser annealing apparatus other system better.
Light path is through entering second replaceable component in the optical projection system after 90 ° of turnovers of plane mirror 407.The effect of whole optical projection system is to make the uniform light spots that effective clear aperture 304 places obtain in the iris 406 project work surface 409, so require optical projection system to keep preceding plane system to obtain the good character of hot spot as far as possible.
In fact, second replaceable component in the optical projection system is designed to an imaging system, and it makes the thing at effective clear aperture 304 places become real image at work surface 409 places.In order to keep the character of hot spot, second replaceable component that is designed to has less aberration.This second replaceable component is made up of a plurality of spherical lenses, has taken all factors into consideration factors such as bore, enlargement ratio, work distance, aberration, lens numbers during design, is met designing requirement and various aspects of performance relative equilibrium design proposal.At last, parallel flat 408D plays the effect of isolating and protecting.
Above-mentioned second replaceable component is designed to many covers, respectively corresponding each different enlargement ratio, and every grip assembly all is connected convenient the replacement by standard interface with outside pedestal.Second replaceable component shown in Fig. 4 only is the feasible scheme of a cover wherein.For simplicity and stability, inner each lens position of every grip assembly is in a single day fixing, then can't regulate.By replacing this assembly, can be adjustable so that finally process the spot size stepping of usefulness.
The non-uniform laser beam that LASER Light Source is sent, when a logical polishing optical system arrived work surface, character was greatly improved, its Computer Simulation effect that is shown in Figure 7.
To sum up, by replacing first replaceable component and second replaceable component, and regulate the relative position relation of lens in first replaceable component and the clear aperture of adjustable diaphragm, can be so that the shape and size of hot spot be adjustable in a bigger scope during laser annealing, greatly improve annealing efficiency, be more convenient for the research of annealing process, rule.
Claims (10)
1. the optical processing system that is used for laser annealing is characterized in that comprising:
Beam-expanding system is used for the laser beam from a light source (101) is expanded bundle;
The homogenize system is used to make the beam energy of described beam-expanding system output even;
The edge treated system is used to obtain the hot spot of required clear-cut margin;
Optical projection system is used for the hot spot of homogenize is projected machined surface (108).
2. according to the optical processing system that is used for laser annealing of claim 1, it is characterized in that:
Described beam-expanding system bag comprises a kind of in the inverted Galileo telescope of an inverted Kepler telescope system and the system.
3. according to the optical processing system that is used for laser annealing of claim 1, it is characterized in that:
The array of spherical lenses of placing before and after described homogenize system comprises two,
First replaceable component after described array of spherical lenses of placing before and after two, described first replaceable component comprise a kind of from multiaspect spherical lens or cylindrical lens.
4. according to the optical processing system that is used for laser annealing of claim 3, it is characterized in that:
Described optical projection system comprises the assembly of a turnover light path
One second replaceable component,
Wherein second replaceable component is an imaging system.
5. according to the optical processing system that is used for laser annealing of claim 4, it is characterized in that:
Described edge treated system comprises an iris;
The flat-plate lens that comprises one protection and buffer action of described imaging system.
6. according to any one the optical processing system that is used for laser annealing among the claim 1-5, it is characterized in that further comprising:
A ultraviolet source.
7. according to the optical processing system that is used for laser annealing of claim 3, it is characterized in that:
Described two array of spherical lenses in the described homogenize system meet predetermined distance relation, thereby make between the two distance greater than the focal length of single spherical lens in the previous array and less than the focal length sum of single spherical lens in the focal length of single spherical lens in preceding an array and back an array.
8. according to the optical processing system that is used for laser annealing of claim 6, it is characterized in that:
Described ultraviolet source is a kind of through in the NdYAG laser instrument of frequency multiplication and the excimer laser.
9. the optical processing system that is used for laser annealing according to claim 3 it is characterized in that described first replaceable component can replace, and the position can be regulated between its interior lens by certain mechanism.
10. the optical processing system that is used for laser annealing according to claim 5 is characterized in that
Governing loop in described first replaceable component is unified control, cooperatively interacts;
Described second replaceable component is an imaging system, and has less aberration, and this component design becomes many covers to replace being used for simultaneously, and every grip assembly has different enlargement ratios;
Effective clear aperture of described iris is positioned on the back focal plane of described first replaceable component, and immobilizes;
Described first and second replaceable components all have the external interface of standard, so that be connected with outside pedestal.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103551731A (en) * | 2013-10-21 | 2014-02-05 | 上海集成电路研发中心有限公司 | Rotatable homogenizer, laser application light path and laser annealing equipment |
| CN103901615A (en) * | 2014-03-14 | 2014-07-02 | 北京理工大学 | Foveated imaging optical system |
| US8780446B2 (en) | 2012-12-17 | 2014-07-15 | Industrial Technology Research Institute | Beam generating apparatus |
| CN108680060A (en) * | 2018-04-03 | 2018-10-19 | 北京环境特性研究所 | A kind of laser infrared complex target simulator, equipment and system |
| CN109343226A (en) * | 2018-11-22 | 2019-02-15 | 常州英诺激光科技有限公司 | A kind of optical system that laser facula is converted to uniform alignment hot spot |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1658022A (en) * | 2004-01-27 | 2005-08-24 | 株式会社液晶先端技术开发中心 | Light application apparatus, crystallization apparatus and optical modulation element assembly |
| CN1983513A (en) * | 2005-12-16 | 2007-06-20 | 株式会社液晶先端技术开发中心 | Laser crystallization apparatus and crystallization method |
| CN101208778A (en) * | 2005-09-14 | 2008-06-25 | 株式会社Ihi | Laser annealing method and device |
| US20080230723A1 (en) * | 2003-04-24 | 2008-09-25 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device |
| WO2009150733A1 (en) * | 2008-06-12 | 2009-12-17 | 株式会社Ihi | Laser annealing method and laser annealing apparatus |
-
2011
- 2011-01-27 CN CN 201110030445 patent/CN102081236A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080230723A1 (en) * | 2003-04-24 | 2008-09-25 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device |
| CN1658022A (en) * | 2004-01-27 | 2005-08-24 | 株式会社液晶先端技术开发中心 | Light application apparatus, crystallization apparatus and optical modulation element assembly |
| CN101208778A (en) * | 2005-09-14 | 2008-06-25 | 株式会社Ihi | Laser annealing method and device |
| CN1983513A (en) * | 2005-12-16 | 2007-06-20 | 株式会社液晶先端技术开发中心 | Laser crystallization apparatus and crystallization method |
| WO2009150733A1 (en) * | 2008-06-12 | 2009-12-17 | 株式会社Ihi | Laser annealing method and laser annealing apparatus |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8780446B2 (en) | 2012-12-17 | 2014-07-15 | Industrial Technology Research Institute | Beam generating apparatus |
| CN103551731A (en) * | 2013-10-21 | 2014-02-05 | 上海集成电路研发中心有限公司 | Rotatable homogenizer, laser application light path and laser annealing equipment |
| CN103901615A (en) * | 2014-03-14 | 2014-07-02 | 北京理工大学 | Foveated imaging optical system |
| CN103901615B (en) * | 2014-03-14 | 2016-05-25 | 北京理工大学 | Little recessed imaging optical system |
| CN108680060A (en) * | 2018-04-03 | 2018-10-19 | 北京环境特性研究所 | A kind of laser infrared complex target simulator, equipment and system |
| CN109343226A (en) * | 2018-11-22 | 2019-02-15 | 常州英诺激光科技有限公司 | A kind of optical system that laser facula is converted to uniform alignment hot spot |
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Application publication date: 20110601 |