CN102051621A - Chemical polishing solution for titanium and titanium alloy - Google Patents
Chemical polishing solution for titanium and titanium alloy Download PDFInfo
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- CN102051621A CN102051621A CN2009102370708A CN200910237070A CN102051621A CN 102051621 A CN102051621 A CN 102051621A CN 2009102370708 A CN2009102370708 A CN 2009102370708A CN 200910237070 A CN200910237070 A CN 200910237070A CN 102051621 A CN102051621 A CN 102051621A
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- titanium
- chemical polishing
- titanium alloy
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- 238000005498 polishing Methods 0.000 title claims abstract description 38
- 239000010936 titanium Substances 0.000 title claims abstract description 33
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 239000000126 substance Substances 0.000 title claims abstract description 31
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 31
- 229910001069 Ti alloy Inorganic materials 0.000 title claims abstract description 27
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims abstract description 22
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 12
- 239000004310 lactic acid Substances 0.000 claims abstract description 11
- 235000014655 lactic acid Nutrition 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 9
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 abstract description 11
- 239000002184 metal Substances 0.000 abstract description 11
- 239000011159 matrix material Substances 0.000 abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000005530 etching Methods 0.000 abstract description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 abstract 2
- 239000000523 sample Substances 0.000 description 25
- 239000000243 solution Substances 0.000 description 11
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 10
- 230000007797 corrosion Effects 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 230000004044 response Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 239000006101 laboratory sample Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910000883 Ti6Al4V Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 201000004624 Dermatitis Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 208000003251 Pruritus Diseases 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 230000007815 allergy Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000002929 anti-fatigue Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000010734 process oil Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
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- ing And Chemical Polishing (AREA)
Abstract
The invention relates to chemical polishing solution for titanium and titanium alloy, and belongs to a chemical formula. The chemical polishing solution consists of ammonium fluoride, lactic acid, nitric acid and water, wherein the content of the ammonium fluoride is 60 to 300g/L, the volume ratio of the lactic acid (the content is 85 to 90 percent) is 65 to 91 percent, and the volume ratio of the nitric acid (the content is 65 to 68 percent) is 9 to 35 percent. The solution has the characteristics that the reaction velocity is easy to control, the etching rate difference between different phases or between grains can be reduced, the titanium metal matrix is effectively protected, and the like. The chemical polishing solution for the titanium and the titanium alloy is simple and convenience and has the advantages of high efficiency, low cost, good surface quality and the like.
Description
Technical field
The present invention relates to a kind of chemical polishing soln that is used for titanium or titanium alloy, belong to a kind of chemical formulation.
Background technology
The titanium or titanium alloy metal has light weight, high strength, excellent erosion resistance, and can not produce characteristic such as allergy for human body skin, therefore is applied in various fields widely.Titanium or titanium alloy has characteristics such as high relative intensity (tension stress/density), high-tensile, antifatigue, impact resistance and high heat impedance on mechanical characteristics, therefore be widely used on space industry, sports equipment, attachments of a bicycle, golf club, glasses and other the multinomial civilian goods.Secondly, titanium and alloy thereof can not make human body skin produce irritated reflection, therefore can replace to cause skin to itch or the nickel or the Nikel alloy products of dermatitis in the past.In addition, titanium or titanium alloy can be applicable to medical device, as tweezers, and can be used as the material of organism implant, as skeletal fixation plate, screw and vertebra support cages etc.But because the cutting ability of titanium or titanium alloy is poor, easily oxidation of surface is often adopted methods such as mechanical polishing method, electropolishing method and chemical polishing to carry out surface finishing and is handled.There is the dead angle that can't polish in the mechanical polishing method labor intensive for on-plane surface; Electropolishing method complex process, influence factor be many, be difficult to grasp; And advantage such as that chemical polishing has is easy, polishing efficiency is high, processing is meticulous, surface quality is good is subjected to widespread use always.
The polishing fluid of the chemical polishing of known titanium or titanium alloy mainly adopts hydrofluoric acid and other chemical substance directly to dispose, and utilize hydrofluoric acid, sulfuric acid, 40% acetic acid and the nitric acid that are disclosed as russian patent SU1715887 polish with the ratio institute blended aqueous solution of 25-28%: 40-45%: 2-5%: 25-30%.In addition, pine tail intelligence fortunately waits the people to disclose a kind of two-section type chemical polishing at Japanese Patent JP4088178, be earlier Ti product to be heated to 50 ℃ of polishings of carrying out first section in the mixing solutions (blending ratio is 1: 1: 2) of hydrofluoric acid, acetic acid and phosphoric acid, then finish second section polishing with 7: 1 blending ratio mixing hydrogen peroxide and hydrofluoric acid again.Because hydrofluoric acid is more intense to the corrosive nature of titanium, it is violent directly to dispose solution reaction, and solubleness is wayward, often causes the infringement of titanium metal matrix corrosion, surface easily to inhale consequences such as hydrogen.Particularly for heterogeneous titanium alloy, since the alloy material microcosmic surface not between the homophase or crystal grain and intergranular etch rate variant, present chemical brightening solution surfacing effect is not good enough, not between the homophase or crystal grain and intergranular etching difference arrive sometimes more than the 5 μ m.
Summary of the invention
The object of the present invention is to provide a kind of chemical polishing soln of titanium or titanium alloy, this solution has speed of response and is easy to control, reduces not between the homophase or crystal grain and intergranular etch rate difference, effectively protects characteristics such as titanium metal matrix.
For achieving the above object, the present invention takes following technical scheme:
A kind of chemical polishing soln of titanium or titanium alloy, it consists of Neutral ammonium fluoride, lactic acid, nitric acid, and wherein the content of Neutral ammonium fluoride is that the volume ratio of 60-300g/L, lactic acid is that the volume ratio of 65-91%, nitric acid is 9-35%.
A kind of optimized technical scheme is characterized in that: the content of described lactic acid is 85-90%, and the content of described nitric acid is 65-68%.
A kind of using method of chemical polishing soln of titanium or titanium alloy comprises the steps: the titanium or titanium alloy surface is carried out oil removing, washing earlier, at room temperature puts into chemical polishing soln then, takes out behind the certain hour and washes, dries, and obtains polishing sample.
A kind of optimized technical scheme is characterized in that: described room temperature is 15-35 ℃.
The invention has the advantages that:
1, titanium or titanium alloy chemical polishing soln provided by the invention has speed of response and is easy to control, reduces not between the homophase or crystal grain and intergranular etch rate difference, and surface quality is good, effectively protect characteristics such as titanium metal matrix.
2, titanium or titanium alloy chemical polishing soln provided by the invention has easy, efficient, low cost and other advantages.
The present invention will be further described below by embodiment, but and do not mean that limiting the scope of the invention.
Embodiment
Embodiment 1
Put chemical polishing soln by following set of dispense:
The content of Neutral ammonium fluoride: 60g/L;
The volume ratio of lactic acid (content is 85-90%): 91%;
The volume ratio of nitric acid (content is 65-68%): 9%.
To be of a size of the pure titanium plate of 20mm * 20mm * 3mm is laboratory sample, and surfaceness is 2.1-1.8 μ m, earlier with the pure titanium metal sample process oil removing (solution: 40g/L NaOH, 45g/L Na for preparing
3PO
4, 30g/L Na
2CO
375 ℃ of temperature, time 10min), after clear water rinsing etc. handles, then sample be impregnated in the above-mentioned chemical polishing soln, under the room temperature (15 ℃), take out sample washing earlier oven dry again after 6 minutes and 12 minutes respectively, then obtain polishing sample, two kinds of sample surfaces of this gained are all smooth, are silver gray, the appearance of intergranular or grain shape does not appear in light.
The sample average depth of corrosion of taking out after 6 minutes is 15.2 μ m, and the sample average depth of corrosion of taking out in 12 minutes is 17.3 μ m, as seen; the sample erosion rate is slow after 6 minutes; matrix corrosion is lighter, and the ie in solution speed of response is easy to control, and can effectively protect the titanium metal matrix.
Embodiment 2
Put chemical polishing soln by following set of dispense:
The content of Neutral ammonium fluoride: 160g/L;
The volume ratio of lactic acid (content is 85-90%): 80%;
The volume ratio of nitric acid (content is 65-68%): 20%.
Titanium alloy rod with the Ti-6Al-4V that is of a size of φ 15mm * 30mm is a laboratory sample, and surfaceness is 2.5-2.0 μ m, earlier with the titanium alloy metal sample of preparation through oil removing (solution: 40g/L NaOH, 45g/L Na
3PO
4, 30g/L Na
2CO
375 ℃ of temperature, time 10min), after clear water rinsing etc. handles, sample be impregnated in the above-mentioned chemical polishing soln then, under the room temperature (25 ℃), take out sample washing earlier oven dry again after 3 minutes and 8 minutes respectively, then obtain polishing sample, two kinds of equal smooth surfaces of sample of this gained are smooth, show mirror-like, be silvery white in color, have good gloss, the appearance of intergranular or grain shape do not occur.
The sample average depth of corrosion of taking out in 3 minutes is 21.4 μ m, and the sample average depth of corrosion of taking out in 8 minutes is 26.2 μ m, as seen; the sample erosion rate is slow after 3 minutes; matrix corrosion is lighter, and the ie in solution speed of response is easy to control, and has effectively protected the titanium metal matrix.
Embodiment 3
Put chemical polishing soln by following set of dispense:
The content of Neutral ammonium fluoride: 300g/L;
The volume ratio of lactic acid (content is 85-90%): 65%;
The volume ratio of nitric acid (content is 65-68%): 35%.
Titanium alloy with the Ti-6Al-4V of 20mm * 20mm * 3mm is a laboratory sample, and surfaceness is 2.8-2.1 μ m, earlier with the titanium alloy metal sample of preparation through oil removing (solution: 40g/L NaOH, 45g/L Na
3PO
4, 30g/L Na
2CO
375 ℃ of temperature, time 10min), after clear water rinsing etc. handles, then sample be impregnated in the above-mentioned chemical polishing soln, under the room temperature (35 ℃), take out sample washing earlier oven dry again after 2 minutes and 12 minutes respectively, then obtain polishing sample, two kinds of equal surfacings of sample of this gained are silvery white in color, brightness is higher, the appearance of intergranular or grain shape do not occur.
The sample average depth of corrosion of taking out in 2 minutes is 26.8 μ m, and the sample average depth of corrosion of taking out in 12 minutes is 32.3 μ m, as seen; the sample erosion rate is slow after 2 minutes; solution is lighter to matrix corrosion, and the ie in solution speed of response is easy to control, and can effectively protect the titanium metal matrix.
Above embodiment is the detailed description that the present invention is done.Notice that these embodiments are not in order to limit the present invention,,, should be considered as within protection scope of the present invention not deviating from the improvement of being made under the situation of the present invention and replenishing for those skilled in the art.
Claims (4)
1. the chemical polishing soln of a titanium or titanium alloy, it consists of Neutral ammonium fluoride, lactic acid, nitric acid, and wherein the content of Neutral ammonium fluoride is that the volume ratio of 60-300g/L, lactic acid is that the volume ratio of 65-91%, nitric acid is 9-35%.
2. the chemical polishing soln of titanium or titanium alloy according to claim 1, it is characterized in that: the content of described lactic acid is 85-90%, the content of described nitric acid is 65-68%.
3. the using method of the chemical polishing soln of claim 1 or 2 described titanium or titanium alloy, comprise the steps: the titanium or titanium alloy surface is carried out oil removing, washing earlier, at room temperature put into above-mentioned chemical polishing soln then, take out behind the certain hour, wash again, dry, obtain polishing sample.
4. the using method of the chemical polishing soln of titanium or titanium alloy according to claim 2, it is characterized in that: described room temperature is 15-35 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102370708A CN102051621A (en) | 2009-11-03 | 2009-11-03 | Chemical polishing solution for titanium and titanium alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102370708A CN102051621A (en) | 2009-11-03 | 2009-11-03 | Chemical polishing solution for titanium and titanium alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102051621A true CN102051621A (en) | 2011-05-11 |
Family
ID=43956409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009102370708A Pending CN102051621A (en) | 2009-11-03 | 2009-11-03 | Chemical polishing solution for titanium and titanium alloy |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102051621A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104562058A (en) * | 2014-12-23 | 2015-04-29 | 北京有色金属研究总院 | Solution for deashing and processing surface of silicon aluminum composite material |
| CN105297026A (en) * | 2015-12-04 | 2016-02-03 | 南华大学 | Chemical polishing solution for titanium alloy |
| CN106917128A (en) * | 2017-03-10 | 2017-07-04 | 北京工业大学 | A kind of tin molybdenum codope titanium dioxide nanotube array electrode and preparation method |
| CN108611643A (en) * | 2018-04-24 | 2018-10-02 | 东北大学 | A kind of chemical polishing solution and polishing method of the special-shaped titanium alloy of laser gain material manufacture |
-
2009
- 2009-11-03 CN CN2009102370708A patent/CN102051621A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104562058A (en) * | 2014-12-23 | 2015-04-29 | 北京有色金属研究总院 | Solution for deashing and processing surface of silicon aluminum composite material |
| CN105297026A (en) * | 2015-12-04 | 2016-02-03 | 南华大学 | Chemical polishing solution for titanium alloy |
| CN106917128A (en) * | 2017-03-10 | 2017-07-04 | 北京工业大学 | A kind of tin molybdenum codope titanium dioxide nanotube array electrode and preparation method |
| CN106917128B (en) * | 2017-03-10 | 2019-10-15 | 北京工业大学 | A tin-molybdenum co-doped titania nanotube array electrode and its preparation method |
| CN108611643A (en) * | 2018-04-24 | 2018-10-02 | 东北大学 | A kind of chemical polishing solution and polishing method of the special-shaped titanium alloy of laser gain material manufacture |
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| PB01 | Publication | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
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Application publication date: 20110511 |