CN102034657A - Work transporting cart, work processing system, gas feeding system and gas feeding method - Google Patents

Work transporting cart, work processing system, gas feeding system and gas feeding method Download PDF

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Publication number
CN102034657A
CN102034657A CN201010505841XA CN201010505841A CN102034657A CN 102034657 A CN102034657 A CN 102034657A CN 201010505841X A CN201010505841X A CN 201010505841XA CN 201010505841 A CN201010505841 A CN 201010505841A CN 102034657 A CN102034657 A CN 102034657A
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CN
China
Prior art keywords
supply
stream
gas
air inlet
valve
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Pending
Application number
CN201010505841XA
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Chinese (zh)
Inventor
惠上寿雄
奥田雅海
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Chugai Ro Co Ltd
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Chugai Ro Co Ltd
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Filing date
Publication date
Priority claimed from JP2009232542A external-priority patent/JP2011079625A/en
Priority claimed from JP2009232540A external-priority patent/JP4801195B2/en
Application filed by Chugai Ro Co Ltd filed Critical Chugai Ro Co Ltd
Publication of CN102034657A publication Critical patent/CN102034657A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/38Exhausting, degassing, filling, or cleaning vessels
    • H01J9/395Filling vessels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/46Machines having sequentially arranged operating stations
    • H01J9/48Machines having sequentially arranged operating stations with automatic transfer of workpieces between operating stations

Abstract

A work processing system comprises a gas-consuming device (11). Buffer tanks (13, 14) for storing gases are arranged on a work transporting cart (1) running circularly on a closed rail, and couplers (16, 17) are arranged on the gas inlet channels (22, 23) which supply gas for the buffer tanks (13, 14). Each time when the work transporting cart (1) runs on each rail (R) for one cycle, external feeding channels (29, 30) connect with the couplers (16, 17) and charge the buffer tanks (13, 14) with the amount of gas enough for the work transporting cart (1) to run one cycle, so that gas can be easily used at a low cost.

Description

Workpiece handling chassis and Work-piece processing system and gas supply system and gas supply method
Technical field
The present invention relates to a kind of workpiece handling chassis and Work-piece processing system and gas supply system and gas supply method that workpiece (object of institute's desire processing) is carried.
Background technology
For example, in the manufacturing of flat-panel display panel, as patent documentation 1~patent documentation 3 is put down in writing, use the workpiece handling chassis, this workpiece handling chassis to a plurality of glass substrates (workpiece) keep with along track in heating furnace in the process to the inner space vacuum draw of glass substrate, and enclose luminous gas.The workpiece handling chassis is included in the cylinder that adopted in the vacuum draw operation of glass substrate and utilizes the air compression swelling to guarantee that bubble-tight air presses chuck etc., and is respectively equipped with to make and is used for compressed-air actuated air compressor that it is driven.Press in the chuck at air, when in compressed air, having sneaked into draining (Japanese: in the time of De レ Application), have the situation of its function of infringement, thereby need the compressed air of low dew point.Therefore, on the workpiece handling chassis of flat-panel display panel manufacturing usefulness, be mounted with the air compressor that comprises large-sized drying machines (low dew point drying machine).
Like this, if air compressor is loaded into the workpiece handling chassis, then and the space between other charging appliances diminish, thereby have the such problem of maintainability that diminishes.In addition, if air compressor is loaded in each workpiece handling chassis, equipment cost is increased.And, large-sized drying machines since for draining discharges compressed air all the time, therefore work off and on for replenishing compressed air, constantly consume.
In the Work inspection device of patent documentation 4, the falsework of being carried comprises and utilizes compressed air to open and close the chuck that workpiece is controlled, and be provided with coupling in the compressed-air actuated stream of falsework.Thereby Work inspection device makes chuck opening-closing by on the stop position of falsework pipeline being connected with supply or discharges compressed air with coupling.
Yet, in the manufacturing equipment (Work-piece processing system) of the flat plate panel of patent documentation 1~patent documentation 3, because the workpiece handling chassis expends compressed air when moving in heating furnace, therefore, can't as the Work inspection device of patent documentation 4, pipeline be connected with conveying trolley to supply compressed air from the outside.
In addition, the workpiece handling chassis of manufacturing that is used for flat-panel display panel is as patent documentation 1~patent documentation 3 is put down in writing, also be mounted with counter plate and enclose the gas bomb of luminous gas, when the residual pressure of gas bomb reduces, need manually to change, but the operation of manually changing heavy gas bomb is very big burden to these gas bombs.In the production equipment that uses many workpiece handling chassis, need the gas bomb of many replacing usefulness, must the gas bomb of One's name is legion be managed.
In the manufacturing equipment of flat-panel display panel, in the supply pipe arrangement of the luminous gas of workpiece handling chassis, coupling is set, if the coupling with outside stream on the assigned position in equipment is connected with the coupling of workpiece handling chassis with the supply luminous gas, then can not need on each workpiece handling chassis, load gas bomb.
Yet under the situation that adopts coupling, the extraneous gas that is present in the open section of coupling still remains in coupling inside when coupling is connected, and is blended in the luminous gas of being supplied.In flat-panel display panel, even in luminous gas, sneak into a little air, luminescent properties is significantly reduced, thus the function of infringement product.
Patent documentation 1: the Japan Patent spy opens the 2002-173331 communique
Patent documentation 2: the Japan Patent spy opens the 2002-324486 communique
Patent documentation 3: the Japan Patent spy opens the 2005-216830 communique
Patent documentation 4: Japanese patent laid-open 11-295060 communique
Summary of the invention
Based on the problems referred to above, problem of the present invention provide a kind of can be cheap and workpiece handling chassis using gases easily and use the Work-piece processing system of this workpiece handling chassis, also provide simultaneously a kind of can under the prerequisite that air is sneaked into from external system separable, that connect supply gas to the gas supply system of the demand stream of demand supply gas and gas supply method and can be under the prerequisite that air is sneaked into to the Work-piece processing system of the workpiece handling chassis supply gas of spent gas.
For solving the problems of the technologies described above, workpiece handling chassis of the present invention have equipment, the stored-gas of spent gas surge tank, can be to the air inlet stream of above-mentioned surge tank supply gas and the coupling of being located at above-mentioned air inlet stream.
According to said structure, by will being stored temporarily in the surge tank, thereby can be provided at the gas that is consumed in carrying, the processing work process via the gas that the coupling supply obtains.In addition,, equipment cost and management cost are reduced, the useful space of workpiece handling chassis is increased owing to compressor, the such gas supply source of gas bomb need be set on each workpiece handling chassis.In addition owing to utilize the coupling make-up gas simply that just is connected with gas supply source, so can be in the circulation of each manufacturing process make-up gas continually.By this, do not need to increase gas pressure to increase the amount of stored gas yet, therefore surge tank has not been required high resistance to pressure even the capacity of surge tank is little.
In addition, in workpiece handling chassis of the present invention, also can between the said equipment that expends gas and above-mentioned surge tank, have adjuster.
According to said structure, by the pressure of surge tank being controlled, thereby the working pressure of gas can be fixed than the working pressure height of gas.
In addition, in workpiece handling chassis of the present invention, can also in above-mentioned air inlet stream, be provided with in unidirectional valve and the open and close valve at least any one.
According to said structure, under the state that coupling is separated, surge tank gas can not spill via the air inlet stream.
In addition, first form of Work-piece processing system of the present invention is to make the rail bar cocycle of workpiece handling chassis in sealing, above-mentioned workpiece handling chassis have spent gas equipment, accommodate the surge tank of gas, to the air inlet stream of above-mentioned surge tank supply gas and the coupling of being located at above-mentioned air inlet stream, thereby be provided with on the position that above-mentioned workpiece handling chassis is stopped on the above-mentioned rail bar supply stream is connected supply station to above-mentioned surge tank supply gas with above-mentioned coupling.
According to said structure, on the supply station since till will resting on the supply station next time the gas storage of institute's consumption in the surge tank of each workpiece handling chassis, therefore can be when the workpiece handling chassis moves spent gas.
In addition, gas supply system of the present invention has: the air inlet stream, and this air inlet stream is connected with demand stream to demand place supply gas via intake valve, and comprises the air inlet coupling; The supply stream, this supply stream is connected with gas supply source via supply valve, and comprises the supply coupling that can combine with above-mentioned air inlet coupling; And exhaust flow path, this exhaust flow path is connected with above-mentioned air inlet stream or above-mentioned supply stream via vent valve, under the state of closing above-mentioned intake valve and above-mentioned supply valve, above-mentioned air inlet coupling is combined with above-mentioned supply coupling, and the processing of at least once taking a breath, this ventilation is handled and is closed above-mentioned supply valve after the supply gas by open above-mentioned supply valve under closing the state of above-mentioned vent valve in to above-mentioned air inlet stream and above-mentioned supply stream, close above-mentioned vent valve after the gas by opening above-mentioned vent valve in giving off above-mentioned air inlet stream and above-mentioned supply stream, open above-mentioned supply valve and above-mentioned intake valve and come the demand stream supply gas.
According to said structure, can be in once ventilation be handled with the ratio reduction of the amount of the air in air inlet stream and the above-mentioned supply stream to equate with the ratio of the pressure of the pressure (for example atmospheric pressure) of vent valve opposition side and gas source.Since if carry out aforesaid operations repeatedly, the amount of the air in air inlet stream and the above-mentioned supply stream can be reduced to below the limit amount of expectation, therefore can be to demand stream supply gas under the prerequisite of not sneaking into the air that goes beyond the limit.
In addition, in gas supply system of the present invention, above-mentioned exhaust flow path is connected via above-mentioned vent valve above-mentioned air inlet stream or above-mentioned supply stream with vacuum source.
According to said structure, because just the mixed volume of the air in air inlet stream and the above-mentioned supply stream can be reduced with the bigger ratio suitable with the ratio of the pressure of gas source with the vacuum pressure of vacuum source in ventilation is once handled, therefore the number of times of ventilation processing is less also can.
In addition, in gas supply system of the present invention, also can before carrying out above-mentioned ventilation processing, open above-mentioned vent valve to give off the gas in above-mentioned air inlet stream and the above-mentioned supply stream.
According to said structure, because before the gas in supply air inlet stream and above-mentioned supply stream, at first to inner air vacuum suction, therefore, be reduced to for mixed volume below the limit amount of expectation air, can utilize ventilation to handle to reduce the total amount of the gas that gives off from exhaust flow path, thereby reduce the loss of the gas of being supplied.
In addition, gas supply method of the present invention is via vent valve exhaust flow path and air inlet stream to be connected with in the supply stream any one, wherein, above-mentioned air inlet stream is connected with demand stream to demand place supply gas via intake valve, and comprise the air inlet coupling, above-mentioned supply stream is connected with gas supply source via supply valve, and comprise the supply coupling that can combine with above-mentioned air inlet coupling, under the state of closing above-mentioned intake valve and above-mentioned supply valve, above-mentioned air inlet coupling is combined with above-mentioned supply coupling, and the processing of at least once taking a breath, this ventilation is handled and is closed above-mentioned supply valve after the supply gas by open above-mentioned supply valve under closing the state of above-mentioned vent valve in to above-mentioned air inlet stream and above-mentioned supply stream, close above-mentioned vent valve after the gas by opening above-mentioned vent valve in giving off above-mentioned air inlet stream and above-mentioned supply stream, open above-mentioned supply valve and above-mentioned intake valve and come method the demand stream supply gas.
According to said method, by the processing of taking a breath repeatedly the amount of the air in air inlet stream and the above-mentioned supply stream is reduced to below the limit amount of expectation, and can be to demand stream supply gas under the situation of the air of not sneaking into the amount of going beyond the limit.
In addition, second form of Work-piece processing system of the present invention comprises: the workpiece handling chassis, this workpiece handling chassis have spent gas the demand device, be connected with the demand stream and comprise the air inlet stream of air inlet coupling to the demand stream of the demand device provisioning gas and via intake valve, and above-mentioned workpiece handling chassis to workpiece keep with on the rail bar of sealing around mobile; And supply station, this supply station is located at the stop position of above-mentioned workpiece handling chassis and is had the supply stream, this supply stream is connected with gas supply source via supply valve and comprises the supply coupling that can combine with above-mentioned air inlet coupling, exhaust flow path is connected with above-mentioned air inlet stream or above-mentioned supply stream via vent valve, under the state of closing above-mentioned intake valve and above-mentioned supply valve, above-mentioned air inlet coupling is combined with above-mentioned supply coupling, and the processing of at least once taking a breath, above-mentioned ventilation is handled and is closed above-mentioned supply valve after the supply gas by open above-mentioned supply valve under closing the state of above-mentioned vent valve in to above-mentioned air inlet stream and above-mentioned supply stream, close above-mentioned vent valve after the gas by opening above-mentioned vent valve in giving off above-mentioned air inlet stream and above-mentioned supply stream, thereby open above-mentioned supply valve and above-mentioned intake valve the demand stream supply gas.
According to said structure, can be from the supply station to demand stream supply gas around the workpiece handling chassis that moves.At this moment, handle the back by the separation of coupling, the air discharging that connection will enter air inlet stream and above-mentioned supply stream owing to take a breath, therefore, air can not sneaked in the gas of being supplied.
In addition, in Work-piece processing system of the present invention, the demand stream can also have the surge tank of stored-gas.
According to said structure, can be when the workpiece handling chassis moves on away from the position in supply station spent gas.
According to the present invention, because the surge tank that gas is stored is set on the workpiece handling chassis, and can be by the coupling that is easy to separate, connect continually to the surge tank make-up gas, therefore need be on the workpiece handling chassis such gas manufacturing installation and the such gases at high pressure source of supply of gas bomb of machine for loading and compressing.By this, can reduce the equipment cost and the operating cost of Work-piece processing system.In addition, by carrying out repeatedly the exhaust of adopting air inlet stream that coupling separates, connects and the gas in the above-mentioned supply stream to give off the ventilation processing of residual air, the amount that remains in the air in air inlet stream and the above-mentioned supply stream is reduced to below the limit amount of expectation, can not make the air of the amount of going beyond the limit sneak into the demand stream, can be from the gas supply source of separable, the outside that connects to demand stream supply gas.
Description of drawings
Fig. 1 is the layout of the flat-panel display panel manufacturing equipment of first embodiment of the invention.
Fig. 2 is the panel conveying trolley of Fig. 1 and the schematic diagram in supply station.
Fig. 3 is the panel conveying trolley of flat-panel display panel manufacturing equipment of second embodiment of the invention and the schematic diagram in supply station.
Fig. 4 is the panel conveying trolley of flat-panel display panel manufacturing equipment of third embodiment of the invention and the schematic diagram in supply station.
Fig. 5 is the layout of the flat-panel display panel manufacturing equipment of four embodiment of the invention.
Fig. 6 is the panel conveying trolley of Fig. 5 and the schematic diagram of enclosing the station.
Fig. 7 is the panel conveying trolley and the schematic diagram of enclosing the station of the flat-panel display panel manufacturing equipment of fifth embodiment of the invention.
Fig. 8 is the panel conveying trolley and the schematic diagram of enclosing the station of the flat-panel display panel manufacturing equipment of sixth embodiment of the invention.
Fig. 9 is the panel conveying trolley and the schematic diagram of enclosing the station of the flat-panel display panel manufacturing equipment of seventh embodiment of the invention.
Figure 10 is the layout of the flat-panel display panel manufacturing equipment of eighth embodiment of the invention.
Figure 11 is the panel conveying trolley of Figure 10 and the schematic diagram in supply station.
(symbol description)
1,1a, 1b workpiece handling chassis
2 rail bars
9,9a, 9b supply station
11 heads (expending the equipment of gas)
12 vacuum pumps
13 gas buffer jars
14 air cushioning jars
16,17 couplings
18,19 unidirectional valves
20,21 intake valves (Japanese: gone into man's cap used in ancient times)
22,23 air inlet streams
24,25 adjusters
27 gas bombs
28 low dew point air compressors
29,30 supply streams
31,32 cylinders
33,34 couplings
35 adjusters
36,37 supply valves
40,42 vent valves
41 vacuum pumps
51,51a, 51b, 51c, 51d workpiece handling chassis
52 rail bars
54,54a, 54b, 54c, 54d enclose the station
60 heads
61 vacuum pumps (vacuum source)
62 distribute control device (demand device)
63 demand streams
64 intake valves
65 air inlet streams
66 adjusters
67 air inlet couplings
69,70 gas bombs (air supply source)
71,72 unidirectional valves
73,74 supply valves
75 supply couplings
76 supply streams
77 vent valves
78 exhaust flow paths
79 unidirectional valves
84 supply stations
85,86 demand streams
87,88 intake valves
89,90 adjusters
91,92 surge tanks
P glass substrate (workpiece)
The R track
Embodiment
Below, with reference to accompanying drawing embodiments of the present invention are described.Fig. 1 is the layout of the flat-panel display panel manufacturing equipment (Work-piece processing system) of first embodiment of the invention.A plurality of workpiece handling chassis 1 that move glass substrate (workpiece) back that this flat-panel display panel manufacturing equipment is used the loading flat-panel display panel are in rail bar 2 cocycles of closure.
Rail bar 2 is by constituting toward road and loop and conveyer T, wherein, toward the road and the loop constitute by the track R of linearity respectively, conveyer T is located at toward the road and the two ends in loop, and workpiece handling chassis 1 is moved from switching to the loop toward the road or switching to toward the road from the loop.
Extending to the glass substrate heating and to the heating furnace 3 of inner space vacuum suction being used for of rail bar 2 toward the major part on road.After heating furnace 3, be provided with the inclosure station 4 of luminous gas being enclosed glass substrate.
The loop of rail bar 2 is provided with sealing station 5, discharge point 6, pulls out station 7, loading depot 8 and supply station 9, wherein, 5 sealings of sealing station are blast pipe (Japanese: チ Star プ pipe) to the stream that glass substrate carries out vacuum exhaust and inclosure luminous gas, discharge point 6 takes off glass substrate from workpiece handling chassis 1, pulling out station 7 pulls out workpiece handling chassis 1 for keeping in repair, loading depot 8 is stacked in glass substrate on the workpiece handling chassis 1, the 9 pairs of workpiece handling chassis in supply station, 1 supply luminous gas and compressed air.
Workpiece handling chassis 1 reduced representation that will stop in gas supply station 9 among Fig. 2.Workpiece handling chassis 1 has at the receiving space on top: a plurality of retaining members 10, and 10 couples of glass substrate P of these retaining members keep; And a plurality of heads (expending the equipment of gas) 11, these heads 11 are used for each glass substrate P vacuum draw and seal luminous gas and include chuck and the cylinder that utilizes air pressure to move.
In addition, workpiece handling chassis 1 has in the mechanical space of bottom: vacuum pump 12, this vacuum pump 12 are used for head 11 vacuum draves; Gas buffer jar 13, this gas buffer jar 13 stores luminous gas; Air cushioning jar 14, this air cushioning jar 14 stores compressed air; Distribute control device 15, distribute control device 15 with vacuum pump 12, gas buffer jar 13 and air cushioning jar 14 according to the rules program be connected with the inscape of head 11.
Gas buffer jar 13 and air cushioning jar 14 comprise former coupling 16,17 respectively endways, and are connected with the air inlet stream 22,23 that is provided with unidirectional valve 18,19 and intake valve 20,21. Coupling 16,17 is fixed on the bottom surface of workpiece handling chassis 1 down.In addition, gas buffer jar 13 and air cushioning jar 14 are respectively via 24,25 pairs of distribution control device 15 supply gas of adjuster and compressed air.
Unidirectional valve 18,19 and intake valve 20,21 are used to make compressed air and luminous gas can not spill via air inlet stream 22,23 from gas buffer jar 13 and air cushioning jar 14, as long as sealing ability is enough, also can adopt wherein any one party.In addition, unidirectional valve 18,19 and intake valve 20,21 can also be built in the coupling 16,17.
In addition, workpiece handling chassis 1 has the location that is made of two cylinders and accommodates member 26 in the bottom surface.The location is accommodated 26 pairs of not shown carrying bars of member and is accommodated, and also can be used for the driving for workpiece handling chassis 1.
Supply station 9 comprises the gas bomb 27 and the low dew point air compressor 28 of luminous gas, and has air inlet stream 22,23 supply luminous gas and the compressed-air actuated supply streams 29,30 that are used for from gas bomb 27 and 28 pairs of workpiece handling chassis 1 of low dew point air compressor.Thereby be provided with the formpiston coupling 33,34 that utilizes cylinder 31,32 liftings to combine with coupling 16,17 at supply stream 29,30 front ends.In addition, gas bomb 27 and low dew point air compressor 28 also can be arranged on the position away from supply station 9, utilize pipe arrangement to supply station 9 supply luminous gas and Compressed Gas.
Be provided with adjuster 35 and supply valve 36 in supply stream 29, having only just can be via the luminous gas of 29 pairs of air inlet streams of supply stream, 22 supply authorized pressures when coupling 16 combines with coupling 33.Supply stream 30 has supply valve 37, and having only just can be to air inlet stream 23 supply compressed air when coupling 34 combines with coupling 17.
In addition, thus supply station 9 has and utilizes cylinder 38 liftings that the align member 39 that member 26 carries out fastening is accommodated in the location of workpiece handling chassis 1.
In the flat-panel display panel manufacturing equipment of present embodiment, workpiece handling chassis 1 whenever moves at rail bar 2 and will stop in a week on the supply station 9, by coupling 33,34 is combined with coupling 16,17, thereby supply stream 29,30 is connected with air inlet stream 22,23, supply luminous gas with authorized pressure to gas buffer jar 13, and supply compressed air to air cushioning jar 14 with authorized pressure.
Certainly, thus a plurality of supply stations 9 also can be set on all rail bars 2 replenishes compressed air to air cushioning jar 14 at twice.In addition, under the less situation of the consumption of compressed air and luminous gas, also compressed air and luminous gas can once come to replenish many weeks.
For the gas buffer jar 13 supply luminous gas to workpiece handling chassis 1, when when coupling 33 is connected with coupling 16, air is closed between the intake valve and supply valve 36 of air inlet stream 22 and supply stream 29.When opening intake valve 20 and supply valve 36 and come gas buffer jar 13 supply luminous gas, above-mentioned air flows into surge tank 13, and mixes with the luminous gas of being supplied in gas buffer jar 13.Therefore, comparatively it is desirable to, reduce intake valve 20 and the space between the supply valve 36 of air inlet stream 22 and supply stream 29 so that the air capacity that air inlet stream 22 and supply stream 29 are surrounded is enough little with respect to the amount of the luminous gas of once supplying.And even more ideal is, valve is built in coupling 16 and the coupling 33, and when coupling 16 separated with coupling 33, air can not enter air inlet stream 22 and supply stream 29.
In addition, supply station 9 utilizes 39 pairs of align members to accommodate the location of member 26 fastenings carrying out workpiece handling chassis 1, but comparatively it is desirable to, and coupling 16,17 or coupling 33,34 also comprise automatic core-adjusting mechanism.
As long as gas buffer jar 13 and air cushioning jar 14 can be supplied the luminous gas and the compressed air of the amount that is consumed in the manufacturing process of workpiece handling chassis 1 display floater between mobile one-period on rail bar 2.Therefore, gas buffer jar 13 and air cushioning jar 14 can not be capacious also or the surge tank of high pressure.In addition, because gas buffer jar 13 and air cushioning jar 14 do not need to be used for the motor of compressed gas supplying and luminous gas, so the consumed power of workpiece handling chassis 1 is little.In addition, because the gas buffer jar 13 and the air cushioning jar 14 of workpiece handling chassis 1 do not have actuating unit, so maintenance frequency also can be lower.
Fig. 3 represents the workpiece handling chassis 1a and the supply station 9a of the flat-panel display panel manufacturing equipment of second embodiment of the invention.The workpiece handling chassis 1a of present embodiment structurally only is connected with vacuum pump 12 via vent valve 40 at the air inlet stream 22 of gas buffer jar 13, and this puts different with first execution mode.Therefore, for the inscape mark identical symbol identical with first execution mode, the repetitive description thereof will be omitted.
In the present embodiment, when supplying luminous gas to the gas buffer jar 13 of workpiece handling chassis 1, with coupling 33 with after coupling 16 is connected, before the supply valve 36 of the intake valve 20 of opening air inlet stream 22 and supply stream 29, open vent valve 40 earlier, by utilizing vacuum pump 12 that the air of the inside of air inlet stream 22 is discharged, thereby can not make air entrained gas surge tank 13.
In addition, Fig. 4 represents the workpiece handling chassis 1b and the supply station 9b of the flat-panel display panel manufacturing equipment of third embodiment of the invention.The structure of present embodiment is provided with vacuum pump 41 and makes vacuum pump 41 be connected different with first execution mode on this aspect via vent valve 42 with supply stream 29 at supply station 9b.At this, for the inscape mark identical symbol identical with first execution mode, the repetitive description thereof will be omitted.
Above-mentioned vacuum pump 41 is also the same with second execution mode, at the coupling 33 that will supply stream 29 with after the coupling 16 of air inlet stream 22 is connected, before opening 36 pairs of gas buffer jars of intake valve 20 and supply valve, 13 supply luminous gas, open the inner vacuum suction of vent valve 42, thereby can not make air sneak into luminous gas air inlet stream 22 and supply stream 29.
In the present embodiment, different with second execution mode, because for inner vacuum suction to air inlet stream 22 and supply stream 29, do not adopt the vacuum pump 12 of being located at each workpiece handling chassis 1b, and special-purpose vacuum pump 41 is set on the 9b of supply station, therefore, thus realize that high vacuum can prevent higher level that air from sneaking into luminous gas.
Fig. 5 is the layout of the flat-panel display panel manufacturing equipment (Work-piece processing system) of four embodiment of the invention.A plurality of workpiece handling chassis 51 that move glass substrate (workpiece) back that this flat-panel display panel manufacturing equipment is used the loading flat-panel display panel are in rail bar 52 cocycles of closure.
Rail bar 52 is by constituting toward road and loop and conveyer T, wherein, past road and loop are made of the track R of linearity respectively, and conveyer T is located at toward the road and the two ends in loop, and workpiece handling chassis 51 is moved from switching to the loop toward the road or switching to past road from the loop.Extending to the glass substrate heating and to the heating furnace 53 of inner space vacuum suction being used for of rail bar 52 toward the major part on road.After heating furnace 53, be provided with the inclosure station 54 of luminous gas being enclosed glass substrate.The loop of rail bar 52 is provided with sealing station 55, discharge point 56, pulls out station 57 and loading depot 58, wherein, it is blast pipe with the stream of enclosing luminous gas that 55 sealings of sealing station are used for glass substrate is carried out vacuum exhaust, discharge point 56 takes off glass substrate from workpiece handling chassis 51, pull out station 57 and for keeping in repair workpiece handling chassis 51 is pulled out, loading depot 58 is stacked in glass substrate on the workpiece handling chassis 51.
Workpiece handling chassis 51 reduced representations that stop on the station 54 will enclosed among Fig. 6.Workpiece handling chassis 51 has in the receiving space on top: a plurality of retaining members 59, and 59 couples of glass substrate P of these retaining members keep; And a plurality of heads 60, these heads 60 are used for each glass substrate P vacuum draw and enclose luminous gas.
In addition, workpiece handling chassis 51 comprises in the mechanical space of bottom: vacuum pump 61, this vacuum pump 61 are used for head 60 vacuum draves; Distribute control device (demand device) 62, this distributions control device 62 is built-in with program according to the rules and supplies a plurality of valves of luminous gas to each head 60, and consumes luminous gas with head 60 one.Distribute control device 62 to be connected with the demand stream 63 that is used to supply luminous gas, be connected with discerptible air inlet stream 65 via intake valve 64 at demand stream 63.Demand stream 63 is provided with the adjuster 66 that luminous gas is reduced pressure, and is provided with the air inlet coupling 67 of former at the end of air inlet stream 65.Air inlet coupling 67 is fixed on the bottom surface of workpiece handling chassis 51 down.
In addition, workpiece handling chassis 51 has the location that is made of two cylinders and accommodates member 68 in the bottom surface.The location is accommodated 68 pairs of not shown carrying bars of member and is accommodated, and also can be used for the driving for workpiece handling chassis 51.
Enclose the gas bomb (gas supply source) 69,70 that station 54 has different types of luminous gas.Gas bomb 69,70 is connected with supply stream 76 endways via unidirectional valve 71,72 and supply valve 73,74, and this supply stream 76 is provided with the supply coupling 75 of the formpiston that can be connected with the air inlet coupling 67 of workpiece handling chassis 51.Exhaust flow path 78 is connected with supply stream 76 via vent valve 77.Exhaust flow path 78 has unidirectional valve 79, and the one end is towards atmosphere opening.Supply coupling 75 is liftably kept by cylinder 80, and along with the action of cylinder 80, combines with air inlet coupling 67 and separates.
In addition, thus enclosing station 54 has by making cylinder 81 liftings accommodate the align member 82 that member 68 carries out fastening to the location of workpiece handling chassis 51.
In the flat-panel display panel manufacturing equipment of present embodiment, when workpiece handling chassis 51 stops at when enclosing station 54, combine with air inlet coupling 67 by supplying coupling 75, thereby supply stream 76 is connected with air inlet stream 65, and luminous gas is supplied to distribution control device 62 via demand stream 63 from gas bomb 69 or gas bomb 70.Distribute control device 62 to supply luminous gas to each head 60, and luminous gas is enclosed glass substrate P according to program.Below, to the step of luminous gas when gas bomb 69 is supplied to demand stream 63 is elaborated.
At first, under the state of the intake valve 64 of closing air inlet stream 65, the supply valve 73,74 of supplying stream 76 and vent valve 77, utilize cylinder 80 will supply coupling 75 and combine, and air inlet stream 65 is connected with supply stream 76 with air inlet coupling 67.By this, the inner space of air inlet stream 65 and supply stream 76 becomes the enclosure space of isolating with extraneous gas.At this moment, have the air of atmospheric pressure (0.1MPa) in the inner space of air inlet stream 65 and supply stream 76.
Then, open the supply valve 73 that supply stream 76 is connected with gas bomb 69.From gas bomb 69, supply for example luminous gas of the pressure of 8MPa.Like this, be in the inner space of air inlet stream 65 and supply stream 76 that to be full of air and the dividing potential drop that dividing potential drop is 0.1MPa be the state of the luminous gas of 7.9MPa.That is to say, in the luminous gas of the air inlet stream 65 and the inside of supply stream 76, sneak into 1.25% air.Supply valve 73 has been kept make air inlet stream 65 and supply stream 76 in be pressed onto the open mode that reaches the 8Mpa required time after, close supply valve 73 once more, thereby air inlet stream 65 and supply stream 76 opened with gas bomb in 69,70 minutes.At this, unidirectional valve 71 prevents that the air of the inside of air inlet stream 65 and supply stream 76 from flowing backwards towards gas bomb 69 sides after pressing and being raised to 8MPa in air inlet stream 65 and supply stream 76.
Therefore, under the state of closing intake valve 64 and supply valve 73,74, open vent valve 77, thereby utilize self pressure that the luminous gas of air inlet stream 65 and supply stream 76 inside is discharged.After the internal drop of vent valve 77 having been opened air inlet stream 65 and supply stream 76 is low to moderate general atmospheric required time, close vent valve 77 once more.At this moment, residual in the inner space of air inlet stream 65 and supply stream 76 have an atmospheric luminous gas of sneaking into 1.25% air.At this moment, the air dividing potential drop in air inlet stream 65 and the supply stream 76 is 1.25kPa.In addition, at this, unidirectional valve 79 prevents the extraneous gas refluence and enters to supply stream 76.
In the present invention, the vent valve 77 of opening that will be carried out after opening 73 pairs of air inlet streams of supply valve 65 and supply stream 76 supply luminous gas is called ventilation processing (Japanese: パ one ジ Application グ processing) with a series of processing that the luminous gas of air inlet stream 65 and supply stream 76 inside is discharged.In the present embodiment, handle, thereby make the differential pressure drop of the air of sneaking into luminous gas of air inlet stream 65 and supply stream 76 inside be low to moderate 0.2Pa by carrying out three above-mentioned ventilations repeatedly.
Carrying out after three ventilations handle, when opening supply valve 73 once more and come inner space supply luminous gas to air inlet stream 65 and supply stream 76, the incorporation rate of the air of the luminous gas of air inlet stream 65 and supply stream 76 inside is about 0.024PPM.Like this, after the processing of taking a breath repeatedly improves the purity of the air inlet stream 65 and the luminous gas of supply stream 76 inside, come demand stream 63 supply luminous gas by opening intake valve 64, thereby can prevent that supply is sneaked into the luminous gas that allows the air more than the limit and produced substandard products to glass substrate P.
The concentration (or dividing potential drop) of air of sneaking into the luminous gas of air inlet stream 65 and supply stream 76 inside is whenever once taken a breath and is just handled the ratio minimizing that equates with ratio (0.1/8) from the pressure (atmospheric pressure) of the supply pressure (8MPa) of the luminous gas of gas bomb 69 and exhaust flow path 78.In the present embodiment, when the purity of desired luminous gas not simultaneously, also can correspondingly adjust the number of times of taking a breath repeatedly and handling.
In addition, enclose station 54 and utilize 82 pairs of align members to accommodate the location of member 68 fastenings carrying out workpiece handling chassis 51, but comparatively it is desirable to, air inlet coupling 67 or supply coupling 75 also comprise automatic core-adjusting mechanism.In addition, air inlet coupling 67 and supply coupling 75 can be provided with any posture in any position, for example, and can be with the side of air inlet coupling 67 lateral supports at workpiece handling chassis 51.
Fig. 7 represents the workpiece handling chassis 51a and the inclosure station 54a of the flat-panel display panel manufacturing equipment of fifth embodiment of the invention.In addition, explanation after this, the identical symbol of inscape mark for identical with the execution mode of previous illustrated mistake does not carry out the explanation of repetition repeatedly.
In the 54a of the inclosure station of present embodiment, exhaust flow path 78 is provided with vacuum pump (vacuum source) 83 endways, and the gas in the exhaust flow path 78 can be evacuated to for example vacuum of 1kPa.In addition, the workpiece handling chassis 51a of present embodiment is and the identical structure of the 4th execution mode.
In the present embodiment, in order to supply luminous gas to workpiece handling chassis 51 from enclosing station 54a, in the time will supplying stream 76 and be connected with air inlet stream 65, carrying out before above-mentioned ventilation handles, under supply valve 73,74 closing state, opening vent valve 77 intake valve 64 of air inlet stream 65 and vent valve 77 and supply stream 76.By this, after the inner space that utilizes vacuum pump 83 with air inlet stream 65 and supply stream 76 is vented to vacuum, close vent valve 77 once more, thereby the air inlet stream 65 and the pressure of the air of the inner space of supply stream 76 are controlled to be the state of about 1kPa.By this, in initial ventilation was handled, the incorporation rate of the air when opening supply valve 73 and coming air inlet stream 65 and supply stream 76 supply luminous gas significantly was reduced to 125PPM.
Owing to discharge in the operation of air inlet stream 65 and supply stream 76 gas inside at the vent valve 77 of opening that ventilation is after this handled, vacuum pump 83 is also via 78 pairs of air inlet streams of exhaust flow path 65 and supply stream 76 vacuum draves, therefore, the differential pressure drop of the air inlet stream 65 and the air of supply stream 76 inside can be low to moderate 0.125Pa.Therefore, when then opening supply valve 73 and come air inlet stream 65 and supply stream 76 supply luminous gas, the air concentration in the luminous gas of air inlet stream 65 and supply stream 76 inside is reduced to 0.016PPM.Therefore, in the present embodiment, as long as once take a breath handle just the air concentration in the luminous gas of air inlet stream 65 and supply stream 76 inside can be reduced to the 4th execution mode in carry out three ventilations and handle after roughly the same degree.
In addition, in the present embodiment, the air inlet stream 65 before the concentration (or dividing potential drop) of sneaking into the air in the luminous gas of air inlet stream 65 and supply stream 76 inside is handled by ventilation and the vacuum draw of supply stream 76 and reduce with the ratio that equates with the ratio of vacuum pressures of atmospheric pressure and vacuum pump 83, utilizing once ventilation just to handle can be with the ratio minimizing that with pressure from the supply pressure (8MPa) of the luminous gas of gas bomb 69 and exhaust flow path 78 is and the ratio (0.001/8) of the vacuum pressure (1kPa) of vacuum pump 83 equates.Consequently, in the present embodiment, the amount to the luminous gas of airborne release in ventilation is handled also can be seldom.
In addition, luminous gas is discharged in atmosphere when not ideal, also the discharge gas of vacuum pump 83 can be delivered to exhaust gas treatment device when thinking.
Fig. 8 represents the workpiece handling chassis 51b and the inclosure station 54b of the flat-panel display panel manufacturing equipment of sixth embodiment of the invention.In the present embodiment, vent valve 77 is not connected with supply stream 76 with exhaust flow path 78, but is connected with air inlet stream 65.
In the present embodiment, luminous gas is the same with the 4th execution mode to the supply of workpiece handling chassis 51b from enclosing station 54b, at first opening supply valve 73 or supply valve 74 comes air inlet stream 65 and supply stream 76 supply luminous gas, carry out repeatedly after closing supply valve 73,74, opening vent valve 77, after the interior pressure with air inlet stream 65 and supply stream 76 is decompressed to atmospheric pressure, close vent valve 77 such ventilations and handle.After this, come demand stream 63 supply luminous gas, thereby the air incorporation rate that can will be supplied in the luminous gas of demand stream 63 is reduced to below the desired value by opening supply valve 73 or supply valve 74 and intake valve 64.
Fig. 9 represents the workpiece handling chassis 51c and the inclosure station 54c of the flat-panel display panel manufacturing equipment of seventh embodiment of the invention.In the present embodiment, exhaust flow path 78 with for the suction portion that is installed in the vacuum pump 61 of workpiece handling chassis 51 via 60 couples of glass substrate P of each head vacuum draw (Japanese: inhale い Write body) is connected, can be to the inner space vacuum draw of air inlet stream 65 and supply stream 76.In addition, the structure of inclosure station 54c is identical with the inclosure station 54b of the 6th execution mode.
In the present embodiment, the same with the 5th execution mode, by to air inlet stream 65 and supply stream 76 gas inside vacuum draves, be reduced to the below horizontal of expectation thereby utilize the ventilation of less number of times to handle the air concentration that just can will sneak in the luminous gas.Certainly, the number of times that required ventilation is handled can be different number of times according to the pressure of gas bomb 69,70 and the exhaust capacity of vacuum pump 61.
Figure 10 represents the overall structure of the flat-panel display panel manufacturing equipment of eighth embodiment of the invention.The inclosure station 54d of present embodiment does not have gas bomb, thereby does not supply the ability of luminous gas.On the contrary, in the present embodiment, on the rail bar in loading depot 58 downstreams, be provided with supply station 84 to workpiece handling chassis 51d supply luminous gas.
Figure 11 represents the workpiece handling chassis 51d of present embodiment and the details in supply station 84.Supply station 84 comprises gas bomb 69,70, supply stream 76 and the exhaust flow path 78 with the 4th execution mode same structure.The workpiece handling chassis 51d of present embodiment has distributing two demand streams 85,86 of control device 62 supply luminous gas, and demand stream 85,86 is connected with air inlet stream 65 respectively via intake valve 87,88.In addition, demand stream 85,86 has surge tank 91,92 in the upstream of adjuster 89,90.
In the present embodiment, on supply station 84, will be stored in the surge tank 91 of demand stream 85, will be stored in the surge tank 92 of demand stream 86 by the luminous gas that gas bomb 70 supplies obtain by the luminous gas that gas bomb 69 supplies obtain.At this moment, in the present embodiment, opening intake valve 87,88 with before supplying luminous gas, also carry out the ventilation identical repeatedly and handle, thereby make the air that remains in air inlet stream 65 and supply stream 76 inside or fully reduce by the concentration of the luminous gas (impure gas) that does not obtain as that gas bomb 70 or gas bomb 69 supplies of target with the 4th execution mode.
In addition, when from gas bomb 69,70 supply luminous gas, the interior pressure of surge tank 91,92 is 8MPa for the supply pressure from gas bomb 69,70.Workpiece handling chassis 51d advances along rail bar 52, and when arriving inclosure station 54d, the luminous gas that will be stored in surge tank 91,92 with adjuster 89,90 is decompressed to for example 0.2MPa, thereby is supplied to the inner space of the glass substrate P behind vacuum draw.
Because workpiece handling chassis 51d whenever moves a week at rail bar 52 and will supply luminous gas on supply station 84, therefore, as long as in surge tank 91,92, store the luminous gas that moves the amount that is consumed between the week at rail bar 52.Surge tank 91,92 is for example when storing luminous gas, so long as the volume more than 1/40 of the volume summation of the entire inner space of the glass substrate P that workpiece handling chassis 51d can load gets final product with 40 times pressure of the pressure that is supplied to glass substrate P.
In addition, the structure of present embodiment both can be deformed into as the 6th execution mode exhaust flow path 78 had been connected with air inlet stream 65, in addition, also can be deformed into from exhaust flow path 78 as the 5th execution mode or the 7th execution mode and carry out vacuum exhaust.
And, under the situation of the workpiece handling chassis 51d that comprises surge tank 91,92 in employing, the inclosure station 54d that workpiece handling chassis 51d is stopped can not to be set, but during moving on the rail bar 52, to supply luminous gas glass substrate P at workpiece handling chassis 51d.By this, no longer become bottleneck (Japanese: ボ ト Le ネ Star Network), the output of flat-panel display panel manufacturing equipment integral body is improved owing to enclose the dwell time of the workpiece handling chassis 51d at 54d place, station.

Claims (14)

1. workpiece handling chassis is characterized in that having:
The equipment of spent gas;
The surge tank of stored-gas;
Can be to the air inlet stream of described surge tank supply gas; And
Be located at the coupling of described air inlet stream.
2. workpiece handling chassis as claimed in claim 1 is characterized in that, has adjuster between described equipment that expends gas and described surge tank.
3. workpiece handling chassis as claimed in claim 1 or 2 is characterized in that, in described air inlet stream, be provided with in unidirectional valve and the open and close valve at least any one.
4. Work-piece processing system, it makes the rail bar cocycle of workpiece handling chassis in sealing, it is characterized in that,
The surge tank that described workpiece handling chassis has the equipment of spent gas, accommodate gas, can be to the air inlet stream of described surge tank supply gas and the coupling of being located at described air inlet stream,
On the position that described workpiece handling chassis is stopped on the described rail bar, the supply station is set, thereby this supply station will be supplied stream and be connected described surge tank supply gas with described coupling.
5. gas supply system, it has: the air inlet stream, this air inlet stream is connected with demand stream to demand place supply gas via intake valve, and comprises the air inlet coupling;
The supply stream, this supply stream is connected with gas supply source via supply valve, and comprises the supply coupling that can combine with described air inlet coupling; And
Exhaust flow path, this exhaust flow path is connected with described air inlet stream or described supply stream via vent valve,
Under the state of closing described intake valve and described supply valve, described air inlet coupling is combined with described supply coupling,
At least once the processing of taking a breath, this ventilation is handled and is closed described supply valve after the supply gas by open described supply valve under closing the state of described vent valve in to described air inlet stream and described supply stream, close described vent valve after the gas by opening described vent valve in giving off described air inlet stream and described supply stream
Opening described supply valve and described intake valve comes described demand stream supply gas.
6. gas supply system as claimed in claim 5 is characterized in that, described exhaust flow path is connected described air inlet stream or described supply stream via described vent valve with vacuum source.
7. gas supply system as claimed in claim 6 is characterized in that, before carrying out described ventilation processing, opens vent valve to give off the gas in described air inlet stream and the described supply stream.
8. a gas supply method is characterized in that,
Via vent valve exhaust flow path and air inlet stream are connected with in the supply stream any one, wherein, described air inlet stream is connected with demand stream to demand place supply gas via intake valve, and comprise the air inlet coupling, described supply stream is connected with gas supply source via supply valve, and comprise the supply coupling that can combine with described air inlet coupling
Under the state of closing described intake valve and described supply valve, described air inlet coupling is combined with described supply coupling,
At least once the processing of taking a breath, this ventilation is handled and is closed described supply valve after the supply gas by open described supply valve under closing the state of described vent valve in to described air inlet stream and described supply stream, close described vent valve after the gas by opening described vent valve in giving off described air inlet stream and described supply stream
Opening described supply valve and described intake valve comes described demand stream supply gas.
9. gas supply method as claimed in claim 8 is characterized in that, by described vent valve to described air inlet stream or described supply stream vacuum draw.
10. gas supply method as claimed in claim 9 is characterized in that, before carrying out described ventilation processing, opens described vent valve to give off the gas in described air inlet stream and the described supply stream.
11. a Work-piece processing system is characterized in that, comprising:
The workpiece handling chassis, this workpiece handling chassis have spent gas the demand device, be connected with described demand stream and comprise the air inlet stream of air inlet coupling to the demand stream of described demand device provisioning gas and via intake valve, and described workpiece handling chassis to workpiece keep with on the rail bar of sealing around mobile; And
Supply station, this supply station are located at the stop position of described workpiece handling chassis and are had the supply stream, and described supply stream is connected with gas supply source via supply valve and comprises the supply coupling that can combine with described air inlet coupling,
Exhaust flow path is connected with described air inlet stream or described supply stream via vent valve,
Under the state of closing described intake valve and described supply valve, described air inlet coupling is combined with described supply coupling,
At least once the processing of taking a breath, described ventilation is handled and is closed described supply valve after the supply gas by open described supply valve under closing the state of described vent valve in to described air inlet stream and described supply stream, close described vent valve after the gas by opening described vent valve in giving off described air inlet stream and described supply stream
Thereby open described supply valve and described intake valve to described demand stream supply gas.
12. Work-piece processing system as claimed in claim 11 is characterized in that, described exhaust flow path is connected described air inlet stream or described supply stream by described vent valve with vacuum source.
13. Work-piece processing system as claimed in claim 12 is characterized in that, before carrying out described ventilation processing, opens described vent valve to give off the gas in described air inlet stream and the described supply stream.
14., it is characterized in that described demand stream has the surge tank of stored-gas as each described Work-piece processing system in the claim 11 to 13.
CN201010505841XA 2009-10-06 2010-09-29 Work transporting cart, work processing system, gas feeding system and gas feeding method Pending CN102034657A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009-232542 2009-10-06
JP2009-232540 2009-10-06
JP2009232542A JP2011079625A (en) 2009-10-06 2009-10-06 Workpiece carrying carriage and workpiece processing system
JP2009232540A JP4801195B2 (en) 2009-10-06 2009-10-06 Gas supply system, gas supply method, and workpiece machining system

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104044009A (en) * 2013-03-12 2014-09-17 鸿富锦精密电子(成都)有限公司 Air feeding system for trolley
TWI547341B (en) * 2013-02-21 2016-09-01 Hon Hai Prec Ind Co Ltd Trolley gas supply system
CN112660690A (en) * 2019-10-16 2021-04-16 大阳日酸株式会社 Automatic conveying system and automatic conveying method
CN117416742A (en) * 2023-12-18 2024-01-19 四川新途流体控制技术有限公司 Full-automatic gas cylinder filling, transporting and transporting system and method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI547341B (en) * 2013-02-21 2016-09-01 Hon Hai Prec Ind Co Ltd Trolley gas supply system
CN104044009A (en) * 2013-03-12 2014-09-17 鸿富锦精密电子(成都)有限公司 Air feeding system for trolley
CN104044009B (en) * 2013-03-12 2016-08-03 鸿富锦精密电子(成都)有限公司 The air supply system of chassis
CN112660690A (en) * 2019-10-16 2021-04-16 大阳日酸株式会社 Automatic conveying system and automatic conveying method
CN112660690B (en) * 2019-10-16 2022-09-23 大阳日酸株式会社 Automatic conveying system and automatic conveying method
CN117416742A (en) * 2023-12-18 2024-01-19 四川新途流体控制技术有限公司 Full-automatic gas cylinder filling, transporting and transporting system and method
CN117416742B (en) * 2023-12-18 2024-03-12 四川新途流体控制技术有限公司 Full-automatic gas cylinder filling, transporting and transporting system and method

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Application publication date: 20110427