CN102033650A - Method for performing laser etching on silver paste indium tin oxide film - Google Patents
Method for performing laser etching on silver paste indium tin oxide film Download PDFInfo
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- CN102033650A CN102033650A CN 201010299955 CN201010299955A CN102033650A CN 102033650 A CN102033650 A CN 102033650A CN 201010299955 CN201010299955 CN 201010299955 CN 201010299955 A CN201010299955 A CN 201010299955A CN 102033650 A CN102033650 A CN 102033650A
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Abstract
The invention relates to a method for performing laser etching on a silver paste indium tin oxide (ITO) film and belongs to the technical field of laser etching. The method comprises the following steps of: firstly, greatly cutting a substrate to achieve a dimension meeting the requirement, pre-baking to guarantee that the expansion rate of the substrate is in a normal range, performing screen printing of silver paste, and curing in a baking oven to make the silver paste attached to the substrate; secondly, performing laser etching, performing screen printing of protective films on two sides to prevent an ITO area from being scratched and a non-ITO area from being contaminated, performing infrared curing on patterns and protective films on the substrate, and performing screen printing of insulating oil; and finally, curing the insulating oil, binding upper and lower layers of the substrate together through screen printing of glue, performing infrared curing and adhering. Due to the adoption of the method, the cost of multi-touch products can be reduced, and the requirements on design structure and yield can be met.
Description
Technical field
The present invention relates to a kind of method of laser-induced thermal etching silver slurry ito thin film, belong to the laser etching technology field.
Background technology
Because the development of multi-point touch technology, traditional typography structurally is difficult to satisfy our demand.Our traditional laser-induced thermal etching mainly is the non-visible area of ITO of etching glass or film, and multi-point touch product visible area also needs to carry out etching, and will guarantee the outward appearance yields of the integrality of base material with the assurance product.Traditional way is that ITO unnecessary on the material is removed by the mode of acid etching, stays pattern, forms the loop at the printed silver slurry, and concrete technological process as shown in Figure 1.
Laser-induced thermal etching now is very general in the application of touch-screen industry, and for example, we are common, and four lines screen uses laser-induced thermal etching usually at the non-visible area of film, is not very high to the accuracy requirement of laser-induced thermal etching, and precision ± 0.1 millimeter just can be satisfied; Many use etching metal films formation ITO (are writing a Chinese character in simplified form of Indium Tin Oxide in the capacitance plate now, Chinese is indium tin oxide) (Flexible Printed Circuit writes a Chinese character in simplified form with FPC, but Chinese is flexibility printed circuit version) connecting line, technology more complicated, and cost is very high; Laser-induced thermal etching and acid etching technology are all being used in the multi-point electric resistance screen is produced, but the laser-induced thermal etching here is the etching to ITO, carry out the printing of silver slurry behind the pattern forming of ITO again.At present a lot of four-wire ohms screen factory also on original Equipment Foundations, carries out the research and development and the sample preparation of multi-point electric resistance screen and capacitance plate, and the mode of printing is used in the generation of silver slurry pattern.
Summary of the invention
The invention provides a kind of silver slurry printing of carrying out earlier, after carry out the method for the etched laser-induced thermal etching silver of laser pattern slurry ito thin film.
The present invention is adopted following technical scheme by its technical matters of solution:
A kind of method of laser-induced thermal etching silver slurry ito thin film may further comprise the steps:
(1) sheet cuts base material to satisfactory size, preliminary drying with the expansion and contraction that guarantees base material in normal range, silk-screen silver slurry, then curing oven sticks on the base material silver slurry;
(2) laser-induced thermal etching, silk-screen two surface protective films prevent that the ITO zone from scratching and stain in non-ITO zone, pattern on the infrared curing base material and diaphragm, then silk-screen insulating oil;
(3) solidify insulating oil, silk-screen glue is bonded together the base material levels, and then infrared curing changes then and fits.
The precision of described laser-induced thermal etching is at ± 10 micron orders.
The mode of inflated with nitrogen or the mode that vacuumizes are adopted in described laser-induced thermal etching, prevent the oxidation in air of silver slurry.
The print thickness of silver slurry was below 9 microns when described silk-screen silver was starched.
Beneficial effect of the present invention is as follows:
1, the present invention is first printed silver slurry on ITO, uses the laser machine to carve the pattern of our needs according to our dry ecthing drawing then.
2, traditional dry ecthing is etching ITO, not etching silver slurry, and the pattern printing of silver slurry is got on; Laser-induced thermal etching of the present invention is the ITO conductive layer of etching glass and film not only, also the silver slurry pattern of etch printing on ITO.
3, adopt the method for the present invention's proposition, not only can reduce the cost of multi-point touch product, project organization and yield can be met.
Description of drawings
Fig. 1 is traditional flow process sketch.
Fig. 2 is a flow process sketch of the present invention.
The final pattern that Fig. 3 obtains for laser-induced thermal etching, wherein 1, silver slurry ITO zone; 2, ITO zone.
Embodiment
Below in conjunction with accompanying drawing the present invention is described in further details.
As shown in Figure 2, a kind of method of laser-induced thermal etching silver slurry ito thin film may further comprise the steps: at first, sheet cuts base material to satisfactory size, preliminary drying with the expansion and contraction that guarantees base material in normal range, silk-screen silver slurry, then curing oven sticks on the base material silver slurry; Secondly, laser-induced thermal etching, silk-screen two surface protective films prevent that the ITO zone from scratching and stain in non-ITO zone, pattern on the infrared curing base material and diaphragm, then silk-screen insulating oil; At last, solidify insulating oil, silk-screen glue is bonded together the base material levels, and then infrared curing changes then and fits.
The drawing that laser-induced thermal etching can provide according to us, etching is disconnected together with silver slurry and ITO, obtains the pattern of our needs.Use laser-induced thermal etching only to need one or two electronic charts just passable, lacked one even two steel meshes than traditional typography, thereby saved production cost greatly, and free from environmental pollution.Because the procurement cycle of steel mesh will be grown than common half tone, has also shortened the sample presentation cycle so to a certain extent.The most important thing is to solve to a certain extent the problem of the narrower client's sample of our fringe region.Figure below is the simple contrast of typography and laser-induced thermal etching technology one.
| Typography | Laser-induced thermal etching technology | |
| Half tone | One or two woven wires | One or two dry corrosion needle drawings |
| Cycle | 4 to 5 days | One day |
| The live width spacing | About the 150-70 micron | About the 150-50 micron |
| Yield | Generally | High |
| Pollute | Have | Do not have |
The precision of laser-induced thermal etching is at ± 10 micron orders.The mode of inflated with nitrogen or the mode that vacuumizes are adopted in laser-induced thermal etching, prevent the oxidation in air of silver slurry.The present invention is elder generation's silk-screen silver slurry on the ITO layer, and our common silver slurry of silver slurry use is just passable.The print thickness of silver slurry is below 9 microns during silk-screen silver slurry.
Technological process of the present invention is oversimplified, and has reduced our process expense, helps the raising of our yield.The technology of using is mainly used silk screen printing now.For the quality of printing, the difference on effect that different boards, cutter, half tone and silver slurry print is very big.If print now 0.1 millimeter silver slurry fine rule, common silver slurry cannot, main cause: the one, the common silver slurry that we use now is too rare, holds to cause adjacent silver slurry line line very much; The 2nd, silver slurry particle is bigger, influences spillage speed, causes the phenomenon that breaks.Need use special-purpose silver slurry so we print the silver slurry cabling of hachure, its principal feature: viscosity is bigger than common silver slurry, and silver slurry particle is less or the like than common silver slurry comparatively speaking, but price is also more somewhat expensive comparatively speaking.Half tone preferably uses the polyester woven wire, mainly contains 325 orders now, 400 orders, half tone specifications such as 500 orders, one of 325 the most cheap purpose steel mesh are 2000rmb nearly, is 4～5 five times of a pull spring net price, increases along with the increase price of polyester woven wire mesh is close to into multiple.The cutter price is not very expensive, but the press quality that its hardness and quality of balance are starched silver has a significant impact.The a lot of parameters of board directly influence the quality of silver slurry.
As shown in Figure 3, for adopting the good pattern of the final etching of this method.Among the figure in the ab zone be we touch-screen ITO zone, be the visible area of touch-screen, be that silver is starched regional in the zone of decision in outside the ab zone and the AB zone among the figure, i.e. the non-viewing area of touch-screen.
Claims (4)
1. the method for laser-induced thermal etching silver slurry ito thin film, its feature may further comprise the steps:
(1) sheet cuts base material to satisfactory size, preliminary drying with the expansion and contraction that guarantees base material in normal range, silk-screen silver slurry, then curing oven sticks on the base material silver slurry;
(2) laser-induced thermal etching, silk-screen two surface protective films prevent that the ITO zone from scratching and stain in non-ITO zone, pattern on the infrared curing base material and diaphragm, then silk-screen insulating oil;
(3) solidify insulating oil, silk-screen glue is bonded together the base material levels, and then infrared curing changes then and fits.
2. the method for a kind of laser-induced thermal etching silver slurry ito thin film according to claim 1, the precision that it is characterized in that described laser-induced thermal etching is at ± 10 micron orders.
3. the method for a kind of laser-induced thermal etching silver slurry ito thin film according to claim 1 is characterized in that the mode of described laser-induced thermal etching employing inflated with nitrogen or the mode that vacuumizes, and prevents the oxidation in air of silver slurry.
4. the method for a kind of laser-induced thermal etching silver slurry ito thin film according to claim 1, the print thickness that it is characterized in that silver slurry when described silk-screen silver is starched is below 9 microns.
Priority Applications (1)
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| CN 201010299955 CN102033650B (en) | 2010-09-29 | 2010-09-29 | Method for performing laser etching on silver paste indium tin oxide film |
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| CN 201010299955 CN102033650B (en) | 2010-09-29 | 2010-09-29 | Method for performing laser etching on silver paste indium tin oxide film |
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| CN102033650A true CN102033650A (en) | 2011-04-27 |
| CN102033650B CN102033650B (en) | 2012-12-19 |
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Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102205468A (en) * | 2011-05-18 | 2011-10-05 | 苏州德龙激光有限公司 | Device and method for etching silver syrup on electronic product |
| CN102221936A (en) * | 2011-07-19 | 2011-10-19 | 信利半导体有限公司 | Manufacture method for ITO (Indium Tin Oxides) silver paste wiring |
| CN102331878A (en) * | 2011-09-15 | 2012-01-25 | 天津市中环高科技有限公司 | Anti-oxidation method of touch screen silver wires |
| CN102541380A (en) * | 2011-12-22 | 2012-07-04 | 南京点面光电有限公司 | Novel method for manufacturing capacitive screen sensor |
| CN102528296A (en) * | 2012-01-06 | 2012-07-04 | 武汉吉事达激光技术有限公司 | Laser etching method for ITO (Indium Tin Oxide) silver paste |
| CN102902389A (en) * | 2011-07-27 | 2013-01-30 | 比亚迪股份有限公司 | Method for manufacturing touch sensor |
| CN103091692A (en) * | 2013-01-10 | 2013-05-08 | 同济大学 | Impedance type nickel film heatmeter based on laser etching method and manufacturing method thereof |
| CN103310903A (en) * | 2012-03-08 | 2013-09-18 | 深圳欧菲光科技股份有限公司 | Ito film etching method |
| CN103914195A (en) * | 2013-01-09 | 2014-07-09 | 苏州市健邦触摸屏技术有限公司 | Manufacturing process for forming of capacitive touch screen circuit |
| CN104216577A (en) * | 2013-05-29 | 2014-12-17 | 比亚迪股份有限公司 | Method for manufacturing capacitive screen |
| CN105426014A (en) * | 2015-12-31 | 2016-03-23 | 东莞市平波电子有限公司 | GF single-layer multi-touch frameless touch screen and preparation process thereof |
| CN105511681A (en) * | 2015-12-31 | 2016-04-20 | 东莞市平波电子有限公司 | GG monolayer multipoint borderless touch screen and preparation process thereof |
| CN105677079A (en) * | 2015-12-30 | 2016-06-15 | 重庆松录科技有限公司 | Method for manufacturing touch screen |
| CN106378533A (en) * | 2016-09-20 | 2017-02-08 | 武汉吉事达科技股份有限公司 | Silver paste laser etched pattern splicing method |
| CN107329606A (en) * | 2017-05-24 | 2017-11-07 | 连城县中触电子有限公司 | A kind of laser silver paste processing method |
| CN107491228A (en) * | 2017-05-24 | 2017-12-19 | 连城县中触电子有限公司 | A kind of large scale capacitance plate and its processing technology |
| CN107718917A (en) * | 2017-10-30 | 2018-02-23 | 无锡变格新材料科技有限公司 | The touch screen silver wire technology that a kind of silk-screen printing and laser printing are combined |
| CN108170309A (en) * | 2017-12-26 | 2018-06-15 | 张家港康得新光电材料有限公司 | Touch screen laser joint patterning and its etching wiring method |
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| CN201576266U (en) * | 2009-11-27 | 2010-09-08 | 介面光电股份有限公司 | Circuit structure and touch panel of transparent conductive plate |
| CN101842767A (en) * | 2007-10-31 | 2010-09-22 | 日本写真印刷株式会社 | Protective panel with touch input function of electronic device display window and electronic device |
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| CN101842767A (en) * | 2007-10-31 | 2010-09-22 | 日本写真印刷株式会社 | Protective panel with touch input function of electronic device display window and electronic device |
| CN101639737A (en) * | 2008-07-28 | 2010-02-03 | 深圳市德普特光电显示技术有限公司 | Touch screen and manufacturing method thereof |
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Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102205468A (en) * | 2011-05-18 | 2011-10-05 | 苏州德龙激光有限公司 | Device and method for etching silver syrup on electronic product |
| CN102221936A (en) * | 2011-07-19 | 2011-10-19 | 信利半导体有限公司 | Manufacture method for ITO (Indium Tin Oxides) silver paste wiring |
| CN102902389A (en) * | 2011-07-27 | 2013-01-30 | 比亚迪股份有限公司 | Method for manufacturing touch sensor |
| CN102902389B (en) * | 2011-07-27 | 2016-04-20 | 深圳市比亚迪电子部品件有限公司 | A kind of method for making of touch sensor |
| CN102331878A (en) * | 2011-09-15 | 2012-01-25 | 天津市中环高科技有限公司 | Anti-oxidation method of touch screen silver wires |
| CN102331878B (en) * | 2011-09-15 | 2013-08-14 | 天津市中环高科技有限公司 | Anti-oxidation method of touch screen silver wires |
| CN102541380A (en) * | 2011-12-22 | 2012-07-04 | 南京点面光电有限公司 | Novel method for manufacturing capacitive screen sensor |
| CN102528296A (en) * | 2012-01-06 | 2012-07-04 | 武汉吉事达激光技术有限公司 | Laser etching method for ITO (Indium Tin Oxide) silver paste |
| CN103310903B (en) * | 2012-03-08 | 2016-01-20 | 深圳欧菲光科技股份有限公司 | Ito thin film engraving method |
| CN103310903A (en) * | 2012-03-08 | 2013-09-18 | 深圳欧菲光科技股份有限公司 | Ito film etching method |
| CN103914195A (en) * | 2013-01-09 | 2014-07-09 | 苏州市健邦触摸屏技术有限公司 | Manufacturing process for forming of capacitive touch screen circuit |
| CN103091692A (en) * | 2013-01-10 | 2013-05-08 | 同济大学 | Impedance type nickel film heatmeter based on laser etching method and manufacturing method thereof |
| CN103091692B (en) * | 2013-01-10 | 2015-08-19 | 同济大学 | Based on the impedance type nickel film calorimeter and preparation method thereof of laser etching method |
| CN104216577A (en) * | 2013-05-29 | 2014-12-17 | 比亚迪股份有限公司 | Method for manufacturing capacitive screen |
| CN105677079A (en) * | 2015-12-30 | 2016-06-15 | 重庆松录科技有限公司 | Method for manufacturing touch screen |
| CN105426014A (en) * | 2015-12-31 | 2016-03-23 | 东莞市平波电子有限公司 | GF single-layer multi-touch frameless touch screen and preparation process thereof |
| CN105511681A (en) * | 2015-12-31 | 2016-04-20 | 东莞市平波电子有限公司 | GG monolayer multipoint borderless touch screen and preparation process thereof |
| CN106378533A (en) * | 2016-09-20 | 2017-02-08 | 武汉吉事达科技股份有限公司 | Silver paste laser etched pattern splicing method |
| CN107329606A (en) * | 2017-05-24 | 2017-11-07 | 连城县中触电子有限公司 | A kind of laser silver paste processing method |
| CN107491228A (en) * | 2017-05-24 | 2017-12-19 | 连城县中触电子有限公司 | A kind of large scale capacitance plate and its processing technology |
| CN107718917A (en) * | 2017-10-30 | 2018-02-23 | 无锡变格新材料科技有限公司 | The touch screen silver wire technology that a kind of silk-screen printing and laser printing are combined |
| CN107718917B (en) * | 2017-10-30 | 2019-08-13 | 无锡变格新材料科技有限公司 | The touch screen silver wire technique that a kind of silk-screen printing and laser printing combine |
| CN108170309A (en) * | 2017-12-26 | 2018-06-15 | 张家港康得新光电材料有限公司 | Touch screen laser joint patterning and its etching wiring method |
| CN108170309B (en) * | 2017-12-26 | 2021-10-26 | 张家港康得新光电材料有限公司 | Laser splicing pattern structure of touch screen and etching wiring method thereof |
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Application publication date: 20110427 Assignee: NANJING DOTS INTELLIGENT TECHNOLOGY CO., LTD. Assignor: Nanjing Dianmian Photoelectricity Co., Ltd. Contract record no.: 2015320000033 Denomination of invention: Method for performing laser etching on silver paste indium tin oxide film Granted publication date: 20121219 License type: Exclusive License Record date: 20150212 |
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Effective date of registration: 20160129 Address after: 210000 Jiangsu city in Nanjing Province Economic Development Zone Jiangning Road No. 9 building A2 week Patentee after: NANJING DOTS INTELLIGENT TECHNOLOGY CO., LTD. Address before: 211100 No. 189 Yan Hu Road, Jiangning Economic Development Zone, Jiangsu, Nanjing, China Patentee before: Nanjing Dianmian Photoelectricity Co., Ltd. |
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