CN101994110A - Surface chemical oxidation method of metal parts having high silicon content - Google Patents
Surface chemical oxidation method of metal parts having high silicon content Download PDFInfo
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- CN101994110A CN101994110A CN2009101027405A CN200910102740A CN101994110A CN 101994110 A CN101994110 A CN 101994110A CN 2009101027405 A CN2009101027405 A CN 2009101027405A CN 200910102740 A CN200910102740 A CN 200910102740A CN 101994110 A CN101994110 A CN 101994110A
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- silicon content
- high silicon
- metal parts
- naoh
- chemical oxidation
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Abstract
The invention provides a surface chemical oxidation method of metal parts having high silicon content. The metal parts having the high silicon content are placed in a process groove containing solution prepared by NaOH and NaNO solution to be treated for 25-30 min at the temperature of 128-134 DEG C, wherein the proportion of NaOH is 500-800g/L and the proportion of NaNO is 150-300g/L; and after the treatment, the surfaces of the parts are in reddish brown, and the corrosion resistance of the surfaces of the parts subject to copper sulfate test is up to 20-60s.
Description
Technical field
The present invention relates to a kind of surface treatment method of metal part, specifically is to steel part, a kind of chemical oxidation method that uses when particularly the higher material of si content carries out surface treatment.
Background technology
When metal part was carried out surface treatment, the chemical oxidation method that is adopted was that metal part is immersed in the dense lotus property sodium solution at present, and oxide treatment under 130～145 ℃ high temperature makes the metal part surface form the martial ethiops film.When the high metal part of si content adopted aforesaid method to carry out chemical oxidation, the solidity to corrosion of the oxide film that piece surface forms was lower, generally only reaches 10 seconds, and the highest have only 15 seconds, can not meet the demands.
Summary of the invention
The objective of the invention is to overcome the deficiency in the prior art, a kind of surface chemistry method for oxidation of high silicon content metal part is provided.
The present invention is achieved in that the high silicon content metal part put into technology groove by the preparation of the solution of NaOH and NaNO, and the ratio of NaOH is 500～800g/L, and the ratio of NaNO is 150～300g/L, handles 25～30 minutes under 128～134 ℃ of temperature.
After above processing, the surface of part is reddish-brown, and through copper sulfate test, its surperficial solidity to corrosion reaches 20～60 seconds, can meet the demands fully.
Embodiment:
Embodiment 1:
The 65Si2MnWA metal part of high silicon content is put into the technology groove of preparing by the solution of NaOH and NaNO, the ratio of NaOH is 500～800g/L, the ratio of NaNO is 150～300g/L, under 128～134 ℃ of temperature, handled 30 minutes, the surface of part is reddish-brown after the oxidation, through copper sulfate test, its surperficial solidity to corrosion reaches 60 seconds.
Embodiment 2:
The 60Si2Mn metal part of high silicon content is put into the technology groove of preparing by the solution of NaOH and NaNO, the ratio of NaOH is 500～800g/L, the ratio of NaNO is 150～300g/L, under 128～134 ℃ of temperature, handled 25 minutes, the surface of part is reddish-brown after the oxidation, through copper sulfate test, its surperficial solidity to corrosion reaches 30 seconds.
Claims (2)
1. the surface chemistry method for oxidation of a high silicon content metal part is characterized in that: the high silicon content metal part is put into the technology groove of being prepared by the solution of NaOH and NaNO, handled 25～30 minutes under 128～134 ℃ of temperature.
2. the surface chemistry method for oxidation of high silicon content metal part according to claim 1 is characterized in that: the ratio of NaOH is 500～800g/L, and the ratio of NaNO is 150～300g/L.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009101027405A CN101994110A (en) | 2009-08-18 | 2009-08-18 | Surface chemical oxidation method of metal parts having high silicon content |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009101027405A CN101994110A (en) | 2009-08-18 | 2009-08-18 | Surface chemical oxidation method of metal parts having high silicon content |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101994110A true CN101994110A (en) | 2011-03-30 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101027405A Pending CN101994110A (en) | 2009-08-18 | 2009-08-18 | Surface chemical oxidation method of metal parts having high silicon content |
Country Status (1)
| Country | Link |
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| CN (1) | CN101994110A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103060790A (en) * | 2011-10-20 | 2013-04-24 | 贵州红林机械有限公司 | Surface chemical oxidation method of metal parts with high silicon content |
| CN105401198A (en) * | 2015-11-03 | 2016-03-16 | 江苏奇纳新材料科技有限公司 | Processing method for corrosion resistant alloy anode surface film formation |
-
2009
- 2009-08-18 CN CN2009101027405A patent/CN101994110A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103060790A (en) * | 2011-10-20 | 2013-04-24 | 贵州红林机械有限公司 | Surface chemical oxidation method of metal parts with high silicon content |
| CN105401198A (en) * | 2015-11-03 | 2016-03-16 | 江苏奇纳新材料科技有限公司 | Processing method for corrosion resistant alloy anode surface film formation |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20110330 |