CN101993632A - Ink composition - Google Patents

Ink composition Download PDF

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Publication number
CN101993632A
CN101993632A CN2010102552431A CN201010255243A CN101993632A CN 101993632 A CN101993632 A CN 101993632A CN 2010102552431 A CN2010102552431 A CN 2010102552431A CN 201010255243 A CN201010255243 A CN 201010255243A CN 101993632 A CN101993632 A CN 101993632A
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CN
China
Prior art keywords
amino
phenol
ink composite
methyl
aforementioned
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Pending
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CN2010102552431A
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Chinese (zh)
Inventor
金炳厚
李命洙
申承协
宋晙溶
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Dongjin Semichem Co Ltd
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Dongjin Semichem Co Ltd
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Publication of CN101993632A publication Critical patent/CN101993632A/en
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/033Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent

Abstract

The present invention relates to an ink composition; more particularly, the present invention relates to an ink composition comprising a) a polymer resin, b) a thickener, and c) an organic solvent, wherein the ink composition further comprises d) a silane coupling agent as an acid resistance enhancer. The ink composition of the present invention can prevent acid attack to protect a fine pattern, improve the precision of the fine pattern and a thin film, and reduce a defective rate, thereby improving yield and improving process efficiency when forming a pattern on a substrate by an imprinting method or a roll printing method.

Description

Ink composite
Technical field
The present invention relates to ink composite; relate in particular to a kind of such ink composite: it is using impression (イ Application プ リ Application ト; Imprint) method or roll marks (ロ one Le プ リ Application ト; when Roll Print) pattern of the substrate of method forms; protect fine pattern by the attack that suppresses acid; promote the precision of fine pattern and film, reduce fraction defective, the efficient that can make yield improve and improve operation thus.
Background technology
Usually, the operation that is applicable to information storage, Miniature Sensor, optical crystal and optical element, fine electronic mechanical organ, display element, indicating meter and semi-conductive formation fine pattern is to have adopted the method for utilizing light to form the photolithography (Photolithography) of fine pattern.
Recently, replace the operation of new generation of complicated photolithography operation to rise.As representative example, can enumerate roll marks operation etc.The roll marks operation is, blanket (blanket) and stereotype (cliche) that use is made with inorganics and polymer, replace in the existing photolithography resolution masks when forming pattern, used, pattern directly is transferred on the substrate that expectation forms fine pattern, form pattern.Such roll printing method is by using the blanket made from inorganics and polymer, alignment (align) and release property have been improved, and productivity and working efficiency have been improved by the use heat curing process, in addition, can significantly reduce needs in the photolithography through such as various operations such as exposure, development operation and complicated procedures of forming of carrying out and the subsidiary operation expense that is produced thus can be used as replacement scheme so be suggested.
As such roll printing method, korean patent application 2006-0005482 number (the open communique of patent application 10-2007-76292 number) discloses about the roll marks device and has utilized this device to make the method for display unit.Aforementioned documents is pointed out, roll printing method also can be applicable to FED (Field Emission Display, field-emitter display), organic EL (Electro Luminescent, electroluminescent), PDP (Plasma Display Panel, Plasmia indicating panel) device, and point out that manufacturing process becomes simply, even disclose the precision that also can guarantee pattern after the printing repeatedly.
The ink composite that is applicable to the roll marks operation can roughly be divided into compositions of thermosetting resin and Photocurable resin composition.In order to use compositions of thermosetting resin, compositions of thermosetting resin to be heated on one side specific temperature with on guarantee flowability, on one side form film or fine pattern with the blanket of inorganics and polymer manufacturing, so because utilized high temperature to guarantee that within the short period of time film or fine pattern are easy by pressurization.In addition, Photocurable resin composition then is the mode that forms film or fine pattern under the nitrogen atmosphere that does not have oxygen by rayed.This mode is by causing the crosslinked of Photocurable resin composition, the precision that can promote film or fine pattern.
For existing TFT type liquid crystal display device, organic tft type liquid crystal display device, OLED type liquid crystal display device, the film that is used for the liquid crystal display device of flexible display panel commonly used etc. or the formation of fine pattern, it is appropriate using roll printing method.But; roll marks must be excellent with the initial rerum natura of ink composite in these occasions; particularly when being used to form the etching work procedure of tft array; do not allow the generation of following situation: on the interface of metal level that must be protected and ink composite; cause etching by soaking into of strong acid, cause pattern bad.But, in existing roll marks operation, after pattern transfer, at low temperatures after the heating, in Wet-type etching or dry-etching operation, because soaking into of strong acid and can not to form the precision of the fine pattern part of metal level or fine pattern bad; If heating at high temperature, because the thickness of fine pattern reduces, the problem of existence is: the fine pattern of the metal level that must be protected when Wet-type etching or dry-etching will disappear.
Patent documentation 1: korean patent application 2006-0005482 number (the open communique of patent application 10-2007-76292 number)
Summary of the invention
The problem that invention will solve
Therefore, in order to solve foregoing prior art problems, the purpose of this invention is to provide the pattern formation method of the substrate of a kind of ink composite and this ink composite of use.This ink composite is by adding the silane coupling agent as the acid resistance toughener; in the pattern of the substrate that adopts stamped method or roll printing method forms; suppress the attack of acid and protect fine pattern; promote the precision of fine pattern and film; reduce fraction defective, can improve the efficient of yield and raising operation thus.
Be used to solve the means of problem
In order to reach aforementioned purpose, the invention provides a kind of ink composite, comprise a) macromolecule resin, b) tackifier and c) organic solvent, it is characterized in that, as the acid resistance toughener, also comprise d) silane coupling agent.
Preferably, as the d of acid resistance toughener) silane coupling agent contains with the amount of 0.01~10 weight %.
In addition, the present invention also provides the pattern formation method of the substrate that uses aforementioned ink composite.
Preferably, aforementioned pattern formation method is used stamped method or roll printing method.
In addition, the invention provides the substrate that has by the formed pattern of aforesaid pattern formation method.
The effect of invention
Ink composite of the present invention; by adding silane coupling agent as the acid resistance toughener; in the pattern of the substrate that has used stamped method or roll printing method forms; suppress the attack of acid and protect fine pattern; promote the precision of fine pattern and film; reduce fraction defective, the efficient that can improve yield thus and improve operation.
Description of drawings
Fig. 1 is the following optical microscope photograph that obtains: use the ink composite of making according to embodiments of the invention 1 to form after the fine pattern, heat-treat operation, after impregnated in strong acid, clean with distilled water, observe its surface then.
Fig. 2 is the following optical microscope photograph that obtains: use the ink composite of making according to embodiments of the invention 2 to form after the fine pattern, heat-treat operation, after impregnated in strong acid, clean with distilled water, observe its surface then.
Fig. 3 is the following optical microscope photograph that obtains: use the ink composite of making according to comparative example 1 to form after the fine pattern, heat-treat operation, after impregnated in strong acid, clean with distilled water, observe its surface then.
Fig. 4 is the following optical microscope photograph that obtains: use the ink composite of making according to comparative example 2 to form after the fine pattern, heat-treat operation, after impregnated in strong acid, clean with distilled water, observe its surface then.
Embodiment
Below describe the present invention in detail.
Ink composite of the present invention comprises a) macromolecule resin, b) tackifier and c) organic solvent, it is characterized in that, as the acid resistance toughener, also comprise d) silane coupling agent.
In ink composite of the present invention, aforementioned a) macromolecule resin can use the novolac resin that uses in the common ink composite, acrylic resin etc.Aforementioned novolac resin can use by making meta-cresol, p-cresol, 2,3,5-pseudocuminol, 2, and 3-dimethylbenzene, 3, aromatic alcohols such as 5-dimethylbenzene and formaldehyde or Paraformaldehyde 96 react and the synthetic polymer that obtains.In addition, aforementioned acrylic resin can use polymerizations such as unsaturated carboxylic acid, aromatic monomer, Acrylic Acid Monomers and the material that obtains.
The weight-average molecular weight of aforementioned macromolecule resin is preferably 2000~100000, and more preferably 2000~45000.
With respect to ink composite of the present invention, aforementioned macromolecule resin preferably contains with the amount of 5~45% weight, and more preferably the amount with 7~30% weight contains.If in aforementioned range, can improve the effect and the pattern transfer rate of pattern supporter so, the efficient that makes yield improve and improve operation.
In addition, in ink composite of the present invention, aforementioned b) tackifier can make the pattern of ink composite form performance to keep excellently.
Concrete example as aforementioned tackifier, can use be selected from the group that following material forms more than a kind: tetramethylolmethane, methyl gallate, Tenox PG, Progallin LA, Stabilizer GA 8, N-methyl p-aminophenol sulfate, Hydrphenacetamine Hydrochloride, 1-(3-hydroxyphenyl) piperazine, 4-bromo-2-(5-isoxazolyl) phenol, 4-(imidazoles-1-yl) phenol, apigenin, 2-(4,5-dihydro-1H-imidazoles-2-yl) phenol, 3-(4,5-dihydro-1H-imidazoles-2-yl) phenol, 4-(4,5-dihydro-1H-imidazoles-2-yl) phenol, 4-nitro-2-(1H-pyrazole-3-yl) phenol, 2-(2-hydroxyphenyl)-1H-benzoglyoxaline, 4-(4-methyl-4,5-dihydro-1H-imidazoles-2-yl) phenol, 1-amino-beta naphthal hydrochloride, 2,4-diaminophenol dihydrochloride, the 2-acetoamidophenol, the 2-amino-3-nitro phenol, 2-amino-4-chloro-5-nitrophenols, 2-amino-5-nitrophenols, 3-amino-beta naphthal, 3-methoxyl group Hydrphenacetamine Hydrochloride, 4,7-dimethoxy-1, the 10-phenanthroline, 4-amino-1-naphtholate hydrochlorate, 4-amino-3-chlorophenate hydrochlorate, 4-amino-phenol hydrochloride, 4-trityl phenol, 8-amino-beta naphthal, Biochanin A, chloranil, pentabromophenol, the quercetin dihydrate, fisetin, 1,3,5-trimethylammonium-2,4,6-three (3,5-di-t-butyl-4-hydroxybenzene methyl) benzene, three (3,5-di-t-butyl-4-hydroxybenzene methyl) isocyanuric acid ester, octadecyl-3-(3, the 5-di-tert-butyl-hydroxy phenyl) propionic ester, 2,5-two (1, the 1-dimethyl propyl)-1, the 4-Benzenediol, 1,1,3-three-(2-methyl-4-hydroxyl-5-tert-butyl-phenyl) butane, triethylene glycol-two (3-tertiary butyl-4-hydroxy-5-aminomethyl phenyl) propionic ester, 2,2-methylene-bis (4-methyl-6-(1-methylcyclohexyl)-phenol), and three (2, the 4-di-tert-butyl-phenyl) phosphoric acid ester.
Preferably, aforementioned tackifier are involved with the amount of 5~45 weight % in ink composite of the present invention; More preferably, involved with the amount of 7~30 weight %.If in aforementioned range, the effect of promoting the precision of pattern on the substrate of needs formation fine pattern is played at live width and the line interval by keeping certain pattern so.
In addition, in ink composite of the present invention, aforementioned c) organic solvent preferably uses: can be easy to the composition dissolved organic solvent that uses in the ink composite of the present invention.
As concrete example, aforementioned organic solvent can separately or mix more than 2 kinds and use following material: vinyl cyanide, acetonitrile, glycerol, methyl-sulphoxide, Nitromethane 99Min., dimethyl formamide, phenol, N-Methyl pyrrolidone, pyridine perfluor tributylamine, perfluorodecalin, 2-butanone, ethylene carbonate; Alcohols such as the condenses of methyl alcohol, ethanol, ethylene glycol, triethylene glycol, TEG, propylene glycol, propylene glycol and ethylene glycol, Diethylene Glycol, butyleneglycol, benzylalcohol, hexanol, vinyl carbinol; Texacar PC, tetrahydrofuran (THF), anisole, 1, ethers such as 4-diox, 1-methoxyl group-2-propyl alcohol, dibutyl ether, hexichol phenolic ether; Ester classes such as ethyl acetate, methyl acetate, propyl acetate, butylacetate, ethyl propionate, ethyl ester, butyl ester, 2-hydroxy-methyl isobutyl acid, 2-methoxyl group-1-methylethyl ester, 2-methyl cellosolve acetic ester, cellosolvo acetic ester; Ethylene glycol alkyl oxide acetate esters such as Ethylene Glycol Methyl ether acetic acid ester, ethylene glycol monoethyl ether acetate; Ethylene glycol alkyl oxide propionic acid esters such as Ethylene Glycol Methyl ether propionic ester, glycol ethyl ether propionic ester; Ethylene glycol monoalkyl ether classes such as Ethylene Glycol Methyl ether, glycol ethyl ether; Diethylene Glycol alkyl ethers such as diethylene glycol monomethyl ether, TC, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether; Propylene glycol alkyl ether acetic acid ester classes such as methyl proxitol acetate, propylene glycol ethyl ether acetic ester, propylene glycol propyl ether acetic ester; Propylene glycol alkyl ether propionic acid esters such as methyl proxitol propionic ester, propylene glycol ethyl ether propionic ester, propylene glycol propyl ether propionic ester; Propylene-glycol monoalky lether classes such as methyl proxitol, propylene glycol ethyl ether, propylene glycol propyl ether, propylene glycol butyl ether; Dipropylene glycol alkyl ethers such as dipropylene glycol dimethyl ether, dipropylene glycol Anaesthetie Ether; Butyleneglycol monoalkyl ethers such as butyleneglycol monomethyl ether, butyleneglycol list ethyl ether; And dibutylene glycol alkyl ether such as dibutylene glycol dimethyl ether, dibutylene glycol Anaesthetie Ether etc.Especially, as aforementioned organic solvent, because the solvent phase that is mixed with two or more is for using single solvent can improve the performance of silane coupling agent described later more, so better to pattern transfer during the solvent that is mixed with two or more.
With respect to ink composite, aforementioned organic solvent preferably contains with the amount of 50~89.99 weight %; More preferably the amount with 60~80 weight % contains.If in aforementioned range, can improve the efficient of solvability and operation so simultaneously.
In addition, ink composite of the present invention comprises the d as the acid resistance toughener) silane coupling agent.Aforementioned d) silane coupling agent makes and has the tolerance of tolerance strong acid in the process of carrying out etching work procedure when the pattern of substrate forms, so can protect metal level, makes the precision of pattern improve, and makes fraction defective reduce.Concrete example as silane coupling agent, can use be selected from the group that following material forms more than a kind: Union carbide A-162, γ-glycidoxy propyl group methyldiethoxysilane, γ-glycidoxy propyl-triethoxysilicane, N-(2-amino-ethyl)-3-aminopropyltriethoxywerene werene, two-(triethoxysilylpropyltetrasulfide) tetrasulfide, two-(triethoxysilylpropyltetrasulfide) disulphide, γ-An Jibingjisanyiyangjiguiwan, vinyltriethoxysilane, 3-isocyanate group propyl-triethoxysilicane, β-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane, γ-glycidoxypropyltrime,hoxysilane, γ-methacryloxypropyl trimethoxy silane, N-phenyl-gamma-amino propyl trimethoxy silicane, N-(2-amino-ethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-amino-ethyl)-3-TSL 8330, the 3-r-chloropropyl trimethoxyl silane, 3-sulfydryl propyl group methyl dimethoxysilane, the sulfydryl propyl trimethoxy silicane, the gamma-amino propyl trimethoxy silicane, vinyltrimethoxy silane, propyl trimethoxy silicane, γ-acryloxy propyl trimethoxy silicane, octyltri-ethoxysilane, the 3-chloropropyl triethoxysilane, vinyl-three-(2-methoxy ethoxy) silane, 3-sulfydryl propyl-triethoxysilicane, γ-urea groups propyl trimethoxy silicane, the 3-chloropropylmethyldimethoxysilane, the vinyl methyldiethoxysilane, the vinyl methyl dimethoxysilane, and Octadecane base Trimethoxy silane.
In the present invention, with respect to ink composite of the present invention, the content of aforementioned silane coupling agent preferably uses with the amount of 0.01~10.0 weight %; More preferably use with the amount of 0.1~3.0 weight %.Under the situation of aforementioned silane coupling agent less than 0.01 weight %, acid resistance reduces; Surpassing under the situation of 10.0 weight %, the problem of existence is: become seriously with the swelling phenomenon of roller (as an example, blanket), activity time is elongated, and the time that forms fine pattern increases, and the precision of fine pattern reduces.
The ink composite of the present invention that comprises foregoing composition can optionally use tensio-active agent, adaptation increase and decrease agent or visual compound.
By the use of silane coupling agent, aforementioned surfactants can be brought into play such effect: prevent oozing of issuable ink material to dye and impression (ホ Yi ル Trace), guarantee perfect coating.
For aforementioned surfactants, can use silicon is the tensio-active agent of fluorine series such as tensio-active agent or perfluoroalkyl oligopolymer, and its content is 0.01~3 weight % with respect to ink composite, preferably uses 0.1~1.5 weight %.
The use of aforementioned adaptation increase and decrease agent is in order to improve the driving fit performance for lower membrane.It is linking agent that aforementioned adaptation increase and decrease agent can be used common trimeric cyanamide.As trimeric cyanamide is linking agent, methylolurea alkyl ether that can use the condensation product of condensation product, trimeric cyanamide and the formaldehyde of urea and formaldehyde, is obtained by alcohol or melamine methylol alkyl ether etc.
Particularly, the condensation product as aforementioned urea and formaldehyde can use monomethylol urea, dimethylolurea etc.As the condensation product of aforementioned trimeric cyanamide and formaldehyde, can use hexamethylolmelamine, in addition, also can use the part condensation product of trimeric cyanamide and formaldehyde.In addition, as aforementioned methylolurea alkyl ether, it is to make methylol and alcohols reaction partly or completely and obtain on the condensation product of urea and formaldehyde; As its concrete example, can use monomethyl urea methyl ether, dimethyl urea methyl ether etc.As aforesaid melamine methylol alkyl ether, it is to make the reaction of some or all of methylol and alcohols and obtain on the condensation product of trimeric cyanamide and formaldehyde; As its concrete example, can use hexamethylolmelamine hexamethyl ether, hexamethylolmelamine six butyl ethers etc.In addition, can also use the compound etc. of the structure that the hydrogen atom of amino of compound, the trimeric cyanamide of the structure that the hydrogen atom of the amino of trimeric cyanamide replaced by hydroxymethyl and methoxymethyl replaced by butoxymethyl and methoxymethyl.Especially preferably use the melamine methylol alkyl ether.
If use aforementioned adaptation increase and decrease agent, its content is for preferably to use with the amount of 0.01~5 weight %; More preferably, use with the amount of 0.5~2.5 weight %.If within aforementioned range, ink composite of the present invention has excellent adaptation for the substrate of below.
In addition, as visual compound, can guarantee the visuality of ink composite by using dyestuff, pigment or light-sensitive compound, and visual compound can realize excellent pattern transfer printing performance by being dissolved in the macromolecule resin, and can bring into play and guarantee that expect and bonding force substrate easily.As visual compound, can use separately or mix and use following diazido based compound: by make that trihydroxybenzophenone and 2-diazo-1-naphthol-5-sulfonic acid carry out that esterification prepares 2,3,4-trihydroxybenzophenone-1,2-naphthoquinones diazido-5-sulphonate, by make that tetrahydroxybenzophenone and 2-diazo-1-naphthol-5-sulfonic acid carry out that esterification prepares 2,3,4,4-tetrahydroxybenzophenone-1,2-naphthoquinones diazido-5-sulphonate.
If use aforementioned visual compound, preferably its content uses with the amount of 0.001~3.0 weight % with respect to ink composite of the present invention, more preferably uses with the amount of 0.001~2.0 weight %.
The ink composite of the present invention that includes foregoing composition, can utilize known common impression operation (as an example, the open communique of korean patent application 10-2005-0019557 number) or the roll marks operation (as an example, the open communique of korean patent application 10-2007-0076292 number) is applied to the formation of pattern, thereby on substrate, forms pattern.
As concrete example, by being coated with such as the thickness of appropriate means such as spin coating, roller coat and slot coated with 0.5~10 μ m, then, in the impression operation, after its polymeric silicon die with the pattern with shape that expectation forms is contacted, with pattern transfer to such as on the substrates such as silicon substrate, ceramic substrate, metal level, macromolecule layer; In the roll marks operation, the stereotype of using the pattern with shape that expectation forms is with after polymeric silicon contacts, with pattern transfer to such as on the substrates such as silicon substrate, ceramic substrate, metal level, macromolecule layer.
Next, can carry out the photocuring operation, perhaps carry out the thermofixation operation of under 90~200 ℃ temperature, heat-treating, perhaps carry out photocuring operation and thermofixation operation simultaneously by using ultraviolet ray.The purpose of heat-treating operation is an evaporating solvent under the condition of the solids component in pyrolysis oil ink composition not.Usually, preferably make the concentration of solvent minimize, preferably proceed to the thickness of staying the ink film on the substrate till below the 10 μ m by heat treatment step.Above-mentioned operation has increased cementability and the chemical resistant properties between ink film and the substrate.For the substrate of finishing above-mentioned operation, use etching solution or gaseous plasma to handle, to handle the exposed substrate position, at this moment, the not exposure portion of substrate is protected by ink film.After treatment substrate in this way, remove ink film by utilizing suitable stripper, can on substrate, form the fine circuits pattern.
Below, in order to understand the present invention, enumerate preferred embodiment, but following embodiment only illustrating the present invention, scope of the present invention is not subjected to the qualification of following embodiment.
Embodiment
Embodiment 1
Mix the ink composite for preparing embodiment 1~2 and comparative example 1~2 according to composition shown in the following table 1 and composition homogeneous.The unit of following table 1 is a weight part.The macromolecule resin that uses in the following table 1 is that weight-average molecular weight is 20000 novolac resin, tackifier are Tenox PGs, organic solvent is a methyl alcohol, silane coupling agent is a Union carbide A-162, tensio-active agent is that silicon is tensio-active agent, and adaptation increase and decrease agent is a hexamethylolmelamine hexamethyl ether.
Table 1
Project Embodiment 1 Embodiment 2 Comparative example 1 Comparative example 2
Macromolecule resin 15.0 15.0 15.0 15.0
Tackifier 5.0 5.0 5.0 5.0
Organic solvent 76.8 73.9 76.9 61.9
Silane coupling agent 0.1 3.0 0 15.0
Tensio-active agent 0.1 0.1 0.1 0.1
Adaptation increase and decrease agent 3.0 3.0 3.0 3.0
Use is according to the embodiment 1~2 of aforementioned table 1 preparation and the ink composite of comparative example 1~2, and profit is carried out the evaluation of rerum natura in the following method.
1) fine pattern transferring rate
The ink composite of previous embodiment 1~2 and comparative example 1~2 is coated on the polymeric silicon that does not have pattern.After the time in 10 seconds of seasoning, along with polymeric silicon by stereotype, fine pattern is transferred on the substrate that needs to form, the transferring rate of pattern is as shown in table 2 below.According to the formation situation of pattern in 100 grid that are of a size of 1 * 1mm, the pattern transfer rate is represented as 0~100%.
Table 2
Distinguish Embodiment 1 Embodiment 2 Comparative example 1 Comparative example 2
The pattern transfer rate 98 97 95 92
Shown in the table 2, can confirm as described above: according to the ink composite of embodiments of the invention 1 and embodiment 2, the pattern transfer rate is more than 97%, and it is excellent comparing with comparative example.
2) acid resistance evaluation
The ink composite of previous embodiment 1~2 and comparative example 1~2 is coated on the polymeric silicon that does not have pattern.After the seasoning certain hour, along with polymeric silicon passes through stereotype, fine pattern is transferred on the substrate that needs to form.Substrate 3 minutes the time of thermal treatment under 150 ℃ high temperature that transfer printing is had fine pattern, impregnated in 40 ℃ of strong acid 1 minute time then, clean with distilled water then, confirm pattern part by opticmicroscope afterwards, its result is shown in respectively in Fig. 1~4.
Shown in Fig. 1~4, the metal level that is formed with fine pattern according to embodiments of the invention 1 (Fig. 1) and embodiment 2 (Fig. 2), under the effect of strong acid, live width does not change, and can confirm: this is can make that fine pattern is accurate to form and the ink composite of acid resistance excellence.In contrast, comparative example 1 and 2 situation then can be confirmed: it is formed with the metal level of fine pattern, and under the effect of strong acid, line width variation is very big, and pattern forms and be inaccurate.

Claims (10)

1. ink composite comprises a) macromolecule resin, b) tackifier and c) organic solvent, it is characterized in that,
As the acid resistance toughener, also comprise d) silane coupling agent.
2. ink composite according to claim 1 is characterized in that aforementioned ink composite comprises the d of 0.01~10 weight %) silane coupling agent.
3. ink composite according to claim 1, it is characterized in that, aforementioned d) silane coupling agent be selected from the group that following material forms more than a kind: Union carbide A-162, γ-glycidoxy propyl group methyldiethoxysilane, γ-glycidoxy propyl-triethoxysilicane, N-(2-amino-ethyl)-3-aminopropyltriethoxywerene werene, two-(triethoxysilylpropyltetrasulfide) tetrasulfide, two-(triethoxysilylpropyltetrasulfide) disulphide, γ-An Jibingjisanyiyangjiguiwan, vinyltriethoxysilane, 3-isocyanate group propyl-triethoxysilicane, β-(3, the 4-epoxycyclohexyl) ethyl trimethoxy silane, γ-glycidoxypropyltrime,hoxysilane, γ-methacryloxypropyl trimethoxy silane, N-phenyl-gamma-amino propyl trimethoxy silicane, N-(2-amino-ethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-amino-ethyl)-3-TSL 8330, the 3-r-chloropropyl trimethoxyl silane, 3-sulfydryl propyl group methyl dimethoxysilane, the sulfydryl propyl trimethoxy silicane, the gamma-amino propyl trimethoxy silicane, vinyltrimethoxy silane, propyl trimethoxy silicane, γ-acryloxy propyl trimethoxy silicane, octyltri-ethoxysilane, the 3-chloropropyl triethoxysilane, vinyl-three-(2-methoxy ethoxy) silane, 3-sulfydryl propyl-triethoxysilicane, γ-urea groups propyl trimethoxy silicane, the 3-chloropropylmethyldimethoxysilane, the vinyl methyldiethoxysilane, the vinyl methyl dimethoxysilane, and Octadecane base Trimethoxy silane.
4. ink composite according to claim 1 is characterized in that, aforementioned ink composite comprises:
A) macromolecule resin 5~45 weight %;
B) tackifier 5~45 weight %;
C) organic solvent 50~89.99 weight %.
5. ink composite according to claim 1 is characterized in that, aforementioned a) macromolecule resin is: weight-average molecular weight is 2000~100000 novolac resin or acrylic resin.
6. ink composite according to claim 1, it is characterized in that, aforementioned b) tackifier be selected from the group that following material forms more than a kind: tetramethylolmethane, methyl gallate, Tenox PG, Progallin LA, Stabilizer GA 8, N-methyl p-aminophenol sulfate, Hydrphenacetamine Hydrochloride, 1-(3-hydroxyphenyl) piperazine, 4-bromo-2-(5-isoxazolyl) phenol, 4-(imidazoles-1-yl) phenol, apigenin, 2-(4,5-dihydro-1H-imidazoles-2-yl) phenol, 3-(4,5-dihydro-1H-imidazoles-2-yl) phenol, 4-(4,5-dihydro-1H-imidazoles-2-yl) phenol, 4-nitro-2-(1H-pyrazole-3-yl) phenol, 2-(2-hydroxyphenyl)-1H-benzoglyoxaline, 4-(4-methyl-4,5-dihydro-1H-imidazoles-2-yl) phenol, 1-amino-beta naphthal hydrochloride, 2,4--amino-phenol dihydrochloride, the 2-acetoamidophenol, the 2-amino-3-nitro phenol, 2-amino-4-chloro-5-nitrophenols, 2-amino-5-nitrophenols, 3-amino-beta naphthal, 3-methoxyl group Hydrphenacetamine Hydrochloride, 4,7-dimethoxy-1, the 10-phenanthroline, 4-amino-1-naphtholate hydrochlorate, 4-amino-3-chlorophenate hydrochlorate, 4-amino-phenol hydrochloride, 4-trityl phenol, 8-amino-beta naphthal, Biochanin A, chloranil, pentabromophenol, the quercetin dihydrate, fisetin, 1,3,5-trimethylammonium-2,4,6-three (3,5-di-t-butyl-4-hydroxybenzene methyl) benzene, three (3,5-di-t-butyl-4-hydroxybenzene methyl) isocyanuric acid ester, octadecyl-3-(3, the 5-di-tert-butyl-hydroxy phenyl) propionic ester, 2,5-two (1, the 1-dimethyl propyl)-1, the 4-Benzenediol, 1,1,3-three-(2-methyl-4-hydroxyl-5-tert-butyl-phenyl) butane, triethylene glycol-two (3-tertiary butyl-4-hydroxy-5-aminomethyl phenyl) propionic ester, 2,2-methylene-bis (4-methyl-6-(1-methylcyclohexyl)-phenol), and three (2, the 4-di-tert-butyl-phenyl) phosphoric acid ester.
7. composition according to claim 1 is characterized in that, aforementioned ink composite also further contains tensio-active agent, adaptation increase and decrease agent or visual compound.
8. the pattern formation method of a substrate is characterized in that, has used any described ink composite in the claim 1~7.
9. the pattern formation method of substrate according to claim 8 is characterized in that, aforementioned pattern formation method is used stamped method or roll printing method.
10. a substrate is characterized in that, has the pattern that forms by claim 8 or 9 described pattern formation methods.
CN2010102552431A 2009-08-17 2010-08-13 Ink composition Pending CN101993632A (en)

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CN113480890A (en) * 2021-07-06 2021-10-08 Oppo广东移动通信有限公司 Silk-screen printing ink and preparation method thereof, shell and manufacturing method thereof, and electronic equipment
CN114690296A (en) * 2020-12-29 2022-07-01 恩希爱(杭州)薄膜有限公司 Retroreflective sheet and preparation method thereof

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US9868868B2 (en) 2014-03-06 2018-01-16 Lg Chem, Ltd. Offset printing composition, printing method using same, and pattern comprising offset printing composition

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CN101276158A (en) * 2007-03-30 2008-10-01 株式会社瑞萨科技 Method of forming resist pattern and semiconductor device manufactured with the same
CN101457050A (en) * 2007-12-13 2009-06-17 乐金显示有限公司 Ink combination and method for forming patterns using the ink combination
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CN101276158A (en) * 2007-03-30 2008-10-01 株式会社瑞萨科技 Method of forming resist pattern and semiconductor device manufactured with the same
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