CN101972608A - Cleanout fluid and method for cleaning secondary reverse osmosis water-preparing device by utilizing same - Google Patents
Cleanout fluid and method for cleaning secondary reverse osmosis water-preparing device by utilizing same Download PDFInfo
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- CN101972608A CN101972608A CN 201010542928 CN201010542928A CN101972608A CN 101972608 A CN101972608 A CN 101972608A CN 201010542928 CN201010542928 CN 201010542928 CN 201010542928 A CN201010542928 A CN 201010542928A CN 101972608 A CN101972608 A CN 101972608A
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- reverse osmosis
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Abstract
The invention relates to a cleanout fluid and a method for cleaning a secondary reverse osmosis water-preparing device by utilizing the same. The cleanout fluid is prepared by the following steps: adding sodium tripolyphosphate with the concentration of 2% into sodium dodecyl benzene sulfonate (SDBS), and then adding purified water until the volume of the mixture is 200L. The method for cleaning the secondary reverse osmosis water-preparing device by utilizing the cleanout fluid comprises the following steps: pumping clean reverse osmosis product water without free chlorine into a pressure vessel by utilizing a pump; pumping the prepared cleanout fluid into the pressure vessel, and carrying out circulative cleaning; after the circulative cleaning is finished, reserving the cleanout fluid in the pressure vessel so as to soak the pressure vessel; and after finishing soaking the pressure vessel, discharging the cleanout fluid, pumping the reverse osmosis product water without free chlorine into the pressure vessel, continuing to clean the pressure vessel, and finishing the cleaning process until the discharge water body is clean and has no foam. After the cleanout fluid provided by the invention is adopted to clean the secondary reverse osmosis water-preparing device, the primary fresh water flow rate reaches above 100LPM/h, the secondary flow rate reaches 70LPM/h, the pressure of the primary fresh water and concentrated water is below 1MPa, the conductivity is restored to be about 0.25mu m/cm, the purified water yield reaches 4t per hour, and the secondary reverse osmosis operation is restored to be normal.
Description
Technical field
The present invention relates to a kind of cleaning fluid that is used for the two-pass reverse osmosis water making device; The invention still further relates to the method for utilizing this cleaning fluid that the two-pass reverse osmosis water making device is cleaned.
Background technology
The two-pass reverse osmosis water making device is that membrane separation technique---the equipment of high-purity water is made in counter-infiltration in employing.The aperture of this reverse osmosis membrane＜10 * 10
-1Mm (10A), its separate object is that ion range and the molecular weight in the former water is the organic matter of hundreds of, connecting bacterium can both be rejected as an outsider.The aperture of reverse osmosis membrane is minimum brings certain degree of difficulty for two-pass reverse osmosis plant maintenance and maintenance.
The main impurity that exists has following two kinds in the two-pass reverse osmosis water making device:
One, the fouling of inorganic matter
In water, there is Ca
2+, Mg
2+, Ba
2+, Sr
2+, CO
3 2-, SO
4 2-, PO
4 3-, SiO
2Plasma.Be can not cause the inorganic matter fouling under general situation, but in counter-infiltration system, because source water generally concentrates 4 times, and pH also is greatly improved, therefore difficult dissolved substances will deposit, and forms hard scale on the film surface, causes system pressure rising, aquifer yield to descend, the serious damage that also can cause the film surface reduces system's salt rejection rate.
Two, colloid, particle deposition
It is that more common counter-infiltration system pollutes that colloid, particle pollute.There are particles such as the oxide of foundry loam, colloid silicon, metal and organic matter in the water in a large number, in the counter-infiltration system preliminary treatment, these pollution sources in the water of source can be controlled to a certain degree, do not cause that short-term operation affects to system.But, all can cause the pollution of system's colloid, particle owing to system moves reasons such as the preliminary treatment treatment effect is undesirable, preliminary treatment backwash regular job not thorough, operating personnel is not in place for a long time.
All are normal for operation of two-pass reverse osmosis water making device and system water quality, about the one-level pure water conductivity 3 μ m/cm that produce, about secondary pure water conductivity 0.25 μ m/cm, one-level fresh-water flow 100LPM/h, secondary fresh-water flow 70LPM/h, go out pure water amount 4T/h, about fresh water, dense water pressure 0.5MPa.After using half a year, pure water water quality begins slowly to descend, the one-level pure water conductivity rises to 8～9 μ m/cm about by 3 μ m/cm, the secondary pure water conductivity also reaches about 0.7～0.8 μ m/cm, and especially one-level pure water water yield reduces, and reduces to 70LPM/h by 100LPM/h, the interior pressure increases, increase to 1.1～1.3MPa by 0.5MPa, at this situation, currently used is that 2% citric acid cleaning fluid and sodium phosphate trimer add STPDNa-EDTA 0.8% cleaning fluid and handle.Earlier with preceding kind of cleaning fluid processing, DeGrain, pure water water quality variation gradually after several days, the equipment life cycle after the cleaning shortens, and drops to January from March.After use second kind of cleaning fluid treatment facility again instead, effect is the same with first kind of cleaning fluid, equipment operation condition does not have and is clearly better.Because each cleaning performance is poor, the equipment life cycle is shorter and shorter, drops to from two months to use the two weeks must cleaning equipment.
Problem for the solution water yield descends has also adopted to drinking water and has heated, and accelerates flow velocity to improve the output method by improving water temperature, and after employing the method, pure water output reaches 4T/h rapidly, satisfies the needs of production water supply in following period of time.But the long new problem that occurred again of time one, it is pure water output no change, but the further variation of pure water water quality of making, the one-level pure water conductivity reaches 12～14 μ m/cm, make the secondary pure water conductivity also high to about the 1.0 μ m/cm, two-pass reverse osmosis inside is detected, found that one section reverse osmosis membrane of one-level has leakage phenomenon in the many places.
By analysis, the aperture of long-play reverse osmosis membrane changed and causes the aperture to increase after drinking water was heated, make reverse osmosis membrane effectively not remove metal ion, greatly reduce the quality of purified water. this shows, inapplicablely provide the output and the quality of purified water to the drinking water the method for heating.
Summary of the invention
The method that the technical problem to be solved in the present invention provides a kind of cleaning fluid and utilizes cleaning fluid that the two-pass reverse osmosis water making device is cleaned, after adopting this cleaning fluid that two-pass reverse osmosis equipment is cleaned, the equipment water yield reaches maximization, and the cleaning frequency is prolonged.
The object of the present invention is achieved like this: a kind of two-pass reverse osmosis water making device cleaning fluid, with neopelex 1.6-2Kg, sodium phosphate trimer 1.5-.3Kg is assigned to 100L with purified water, obtains cleaning fluid.
The method of utilizing cleaning fluid that the two-pass reverse osmosis water making device is cleaned:
(1) with pump counter-infiltration product water clean, no free chlorine is squeezed in the two-pass reverse osmosis water making device pressure vessel;
(2) cleaning fluid for preparing is squeezed into wash cycles in the pressure vessel;
(3) after wash cycles is finished cleaning fluid is retained in the pressure vessel, pressure vessel is soaked;
(4) after pressure leaching vessel finished and finishes, the discharging cleaning fluid was squeezed in the pressure vessel counter-infiltration product water of no free chlorine and continuous wash, to water body cleaning, the non-foam of discharging, finished cleaning process.
Rinse liquid temperature 40 is ℃ during wash cycles, pH value 10.
Beneficial effect of the present invention is as follows:
After adopting cleaning fluid provided by the invention that the two-pass reverse osmosis water making device is cleaned, the one-level fresh-water flow reaches more than the 100LPM/h, and two_stage flow reaches 70LPM/h.One-level fresh water, dense water pressure are lower than 1MPa, and electrical conductivity returns to about 0.25 μ m/cm, are purified into the water yield and per hour reach 4T, and the two-pass reverse osmosis restoring running is normal.
Adopt method provided by the invention to see Table one with adopting present conventional method cleaning performance contrast:
Cleaning performance table of comparisons table one
The specific embodiment
Embodiment:
The cleaning fluid preparation: 1.6-2Kg dissolves with purified water with neopelex, and sodium phosphate trimer 1.5-3Kg is added, and is assigned to 100L with purified water, obtains cleaning fluid.
Cleaning process:
(1) with pump counter-infiltration product water clean, no free chlorine is squeezed in the pressure vessel;
(2) cleaning fluid for preparing is squeezed into wash cycles in the pressure vessel, scavenging period is 1-2 hour, and the control rinse liquid temperature is 40 degrees centigrade, pH value 10;
(3) after wash cycles is finished cleaning fluid is retained in the pressure vessel, pressure vessel is soaked, soak time is half an hour;
(4) after pressure leaching vessel finished and finishes, the discharging cleaning fluid was squeezed in the pressure vessel counter-infiltration product water of no free chlorine and continuous wash, and scavenging period is 2 hours, up to the water body cleaning, the non-foam that cause discharge, finished cleaning process.
Claims (3)
1. two-pass reverse osmosis water making device cleaning fluid, it is characterized in that: with neopelex 1.6-2Kg, sodium phosphate trimer 1.5-3Kg is assigned to 100L with purified water, obtains cleaning fluid.
2. utilize the described cleaning fluid of claim 1 to the method that the two-pass reverse osmosis water making device cleans, it is characterized in that:
(1) with pump counter-infiltration product water clean, no free chlorine is squeezed in the two-pass reverse osmosis water making device pressure vessel;
(2) cleaning fluid for preparing is squeezed into wash cycles in the pressure vessel;
(3) after wash cycles is finished cleaning fluid is retained in the pressure vessel, pressure vessel is soaked;
(4) after pressure leaching vessel finished and finishes, the discharging cleaning fluid was squeezed in the pressure vessel counter-infiltration product water of no free chlorine and continuous wash, to water body cleaning, the non-foam of discharging, finished cleaning process.
3. the method that the two-pass reverse osmosis water making device is cleaned according to claim 2 is characterized in that: during wash cycles rinse liquid temperature 40 for ℃, pH value 10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010542928 CN101972608A (en) | 2010-11-15 | 2010-11-15 | Cleanout fluid and method for cleaning secondary reverse osmosis water-preparing device by utilizing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010542928 CN101972608A (en) | 2010-11-15 | 2010-11-15 | Cleanout fluid and method for cleaning secondary reverse osmosis water-preparing device by utilizing same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101972608A true CN101972608A (en) | 2011-02-16 |
Family
ID=43572534
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010542928 Pending CN101972608A (en) | 2010-11-15 | 2010-11-15 | Cleanout fluid and method for cleaning secondary reverse osmosis water-preparing device by utilizing same |
Country Status (1)
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102327742A (en) * | 2011-07-14 | 2012-01-25 | 太仓市金鹿电镀有限公司 | Method for cleaning microorganic colloid contaminant on ultrafiltration membrane |
| CN106630324A (en) * | 2016-12-06 | 2017-05-10 | 苏州赛斯德工程设备有限公司 | Central water purification equipment and membrane system cleaning method thereof |
| CN110937656A (en) * | 2019-10-17 | 2020-03-31 | 珠海市江河海水处理科技股份有限公司 | Full-automatic electroplating nickel wastewater zero-discharge equipment and operation method thereof |
-
2010
- 2010-11-15 CN CN 201010542928 patent/CN101972608A/en active Pending
Non-Patent Citations (1)
| Title |
|---|
| 《净水技术》 20021231 何建军 反渗透系统的污染及清洗 23-25 1－3 第21卷, 第2期 2 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102327742A (en) * | 2011-07-14 | 2012-01-25 | 太仓市金鹿电镀有限公司 | Method for cleaning microorganic colloid contaminant on ultrafiltration membrane |
| CN102327742B (en) * | 2011-07-14 | 2013-07-10 | 太仓市金鹿电镀有限公司 | Method for cleaning microorganic colloid contaminant on ultrafiltration membrane |
| CN106630324A (en) * | 2016-12-06 | 2017-05-10 | 苏州赛斯德工程设备有限公司 | Central water purification equipment and membrane system cleaning method thereof |
| CN110937656A (en) * | 2019-10-17 | 2020-03-31 | 珠海市江河海水处理科技股份有限公司 | Full-automatic electroplating nickel wastewater zero-discharge equipment and operation method thereof |
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| PB01 | Publication | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110216 |