CN101963698A - Micro-mechanical space optical modulator - Google Patents

Micro-mechanical space optical modulator Download PDF

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Publication number
CN101963698A
CN101963698A CN 201010500828 CN201010500828A CN101963698A CN 101963698 A CN101963698 A CN 101963698A CN 201010500828 CN201010500828 CN 201010500828 CN 201010500828 A CN201010500828 A CN 201010500828A CN 101963698 A CN101963698 A CN 101963698A
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anchor point
insulation course
device layer
mirror
district
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CN101963698B (en
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李晓莹
靳倩
孙瑞康
乔大勇
燕斌
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Nantong Jiangzhong Photoelectricity Co., Ltd.
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Northwestern Polytechnical University
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Abstract

The invention discloses a micro-mechanical space optical modulator, belonging to the fields of micro-opto-electric-mechanic system technology and communication technology. The optical modulator comprises an optical grating with adjustable period and a micro-torsion mirror, wherein the optical grating with the adjustable period sequentially comprises an optical grating device layer 6 and an optical grating insulating layer 5 from top to bottom; the micro-torsion mirror sequentially comprises a micro-torsion mirror device layer 3, a micro-torsion mirror insulating layer 2 and a micro-torsion mirror base layer 1; and the optical grating with the adjustable period is combined with the micro-torsion mirror into a whole by bonding through the optical grating insulating layer 5 and the micro-torsion mirror device layer 3. The micro-mechanical space optical modulator has the beneficial effects that the micro-torsion mirror is integrated with the optical grating with the adjustable period, so that the functions of an optical switch and an optical attenuator are realized at the same time; the selection of a plurality of optical channels can be realized by the torsion of the micro-torsion mirror, so that the number of light path switching elements can be reduced, and the stability and the response speed of the light path can be improved; and the micro-mechanical space optical modulator can accurately control the optical attenuation when realizing the optical attenuation function.

Description

A kind of micromechanics spatial light modulator
Affiliated field:
The present invention relates to a kind of micromechanics spatial light modulator, be used for photoswitch and variable optical attenuator, belong to Micro-Opto-Electro-Mechanical Systems technology and optical communication technique field.
Background technology:
Fibre Optical Communication Technology has developed into the netted dense wave division multipurpose (DMDW) of multi-wavelength from the point-to-point Optical Time Division Multiplexing (OTMD) of single wavelength at present, it has made full use of the huge transmission capacity of optical fiber, will become the core technology of setting up high reliability of future generation, vast capacity, hypervelocity information network.Photoswitch and variable optical attenuator are two kinds of Primary Components setting up all-optical network: photoswitch (optical switch) is mainly used in the switching that realizes light path; Variable optical attenuator (variable optical attenuator, VOA) realize in good time control by decay to light signal to transmitting optical power, be mainly used in the luminous power balance of channel in the dwdm system, realize flat gain, dynamic gain balance and through-put power balance.
Traditional photoswitch and variable optical attenuator be as the element that separates, and need electrical-optical-electric transfer process, and deficiency such as have that volume is big, cost is high, low-response, integrated level are low has limited the application of these elements in optical-fiber network.MEMS technology and IC technology are compatible mutually, have that cost is low, volume is little, in light weight, high integration, dirigibility, intelligent characteristics, are widely used in optical communication field.In recent years, the dissimilar spatial light modulator that has photoswitch and variable optical attenuator function concurrently based on the MEMS technology has appearred in the world.1999, scientific research personnel such as U.S. C.R.Giles develop a kind of photoswitch and optical attenuation integrated optic modulator (A Silicon Mems Optical Switch Attenuator and Its Use in Lightwave Subsystems that is used for single input/single output optical fibre passage, Journal of Selected topics in Quantum Electronics, Vol.5, pp:18~25,1999).This device adopts the fast gate-type anti-dazzling screen of static driven that light is carried out controlled blocking, thereby reaches the light variable attenuation; When transmission light is all blocked by anti-dazzling screen, promptly realize closing of optical-fibre channel, play the effect of photoswitch.Similarly, in patent Swith/Variable Optical Attenuator (US2004/0165813A1), mentioned the photomodulator of a kind of 2 * 2 photoswitches/optical attenuation function, this device adopts two shutter shielding plates to be arranged in the optical-fibre channel both sides, control separately realizes light path switching and optical attenuation regulating action respectively.Except fast gate-type photoswitch/optical attenuation integrated optic modulator, Nabeel A.Riza proposes the integrated spatial light modulator of a kind of micro mirror array formula 2 * 2 photoswitches/optical attenuation (Versatile Multi-Wavelength Fiber-Optic Switch and Attenuator Structures Using Mirror Manipulations, Optics Communications, Vol.169, pp:233~244), two rotatable minute surfaces are set in the middle of each optical-fibre channel, when specular working during, can realize the photoswitch effect at the digital modulation state; When specular working during at the analog-modulated state, can by minute surface block the control channel light-inletting quantity, thereby realize the optical attenuation effect.
Mostly the existing formula photoswitch/optical attenuation spatial light modulator that blocks is to adopt many devices hyperchannel to realize, so number of channels has been subjected to certain restriction, if adopt single device to realize that then port number is less; Simultaneously, many devices hyperchannel can cause that the number of elements that light path is switched increases, thereby reduces the stability and the response speed of light path, and Polarization Dependent Loss also can be bigger simultaneously; Adopt single device to be difficult to realize synchronously photoswitch and optical attenuation effect, be unfavorable for its scale application.
Summary of the invention:
The objective of the invention is to propose a kind of photoswitch and optical attenuator are integrated in micromechanics spatial light modulator all over the body, this structure can realize the double action of photoswitch and optical attenuation simultaneously, and can realize the programming Control to photoswitch and variable optical attenuator.
Technical scheme of the present invention is:
Consult Fig. 1, a kind of micromechanics spatial light modulator comprises one-period tunable gratings and a torsional micro-mirror, and described cycle tunable gratings comprises grating device layer 6 and grating insulation course 5 from top to bottom successively; Described torsional micro-mirror comprises torsional micro-mirror device layer 3, torsional micro-mirror insulation course 2 and torsional micro-mirror basalis 1 from top to bottom successively; Cycle tunable gratings and torsional micro-mirror are one by grating insulation course 5 and torsional micro-mirror device layer 3 bondings;
Consult Fig. 2, comprise moving part disconnected from each other and fixed part on the torsional micro-mirror device layer 3: moving part and fixed part are separated by device layer insulation tank 31, moving part comprises minute surface 32, torsion beam 33, device layer anchor point district I 34, and minute surface 32 is connected with the device layer anchor point district I 34 of both sides respectively by the torsion beam 33 at two ends; And fixed part be arranged in moving part around, comprise that device layer pad hole 38, drive unit I 35, device layer have pad hole 1 side anchor point district 36, device layer landless hole 1 side anchor point to distinguish 37;
Consult Fig. 3, have insulation course insulation tank 21, insulation course anchor point district I 22, insulation course that pad hole 1 side anchor point district 23, insulation course landless hole 1 side anchor point district 24, drive unit insulation layer I 27, insulation course pad hole 26 are arranged on the torsional micro-mirror insulation course 2, they have with device layer insulation tank 31, device layer anchor point district I 34, device layer that pad hole 1 side anchor point distinguishes 36 respectively, device layer landless hole 1 side anchor point distinguishes 37, drive unit I 35, device layer pad hole 38 are corresponding; In addition, also have an insulation course cavity I 25 to be positioned at the below of minute surface 32 and torsion beam 33;
Consult Fig. 4, include the square back of the body of basalis chamber 12 and basalis pad hole 14 on the torsional micro-mirror basalis 1, the square back of the body of basalis chamber 12 is corresponding with the position of insulation course cavity I 25, it makes minute surface 32 form with torsion beam 33 and suspends, and basalis pad hole 14 is corresponding consistent with the position shape in device layer pad hole 38 and insulation course pad hole 26;
Consult Fig. 5, grating insulation course 5 makes grating device layer 6 and torsional micro-mirror device layer 3 realize electrical isolation, grating insulation course 5 comprises that insulation course anchor point district II 52, insulation course anchor point tie-beam 53, insulation course do not have the side anchor point of driving district 54 and drive unit insulation layer II 55, and described insulation course anchor point district II 52 and insulation course anchor point tie-beam 53 are corresponding with device layer anchor point district I 34 and torsion beam 33 respectively; Described insulation course anchor point district II 52 is connected by insulation course anchor point tie-beam 53 with drive unit insulation layer II 55; Insulation course does not have and drives side anchor point district 54 and separate with drive unit insulation layer II 55, between formation insulation course cavity II 51; Insulation course does not have the side anchor point of driving district 54 and drive unit insulation layer II 55 is positioned on the minute surface 32;
Consult Fig. 6, grating device floor 6 comprises that drive unit II 61, some parallel gratings strips 62, grating link beam 63, device layer anchor point district II 64, device layer anchor point tie-beam 65, device layer do not have the side anchor point of driving district 66; Described device layer anchor point district II 64, device layer anchor point tie-beam 65, drive unit II 61, device layer do not have and drive side anchor point district 66 and do not have the side anchor point of driving with insulation course anchor point district II 52, insulation course anchor point tie-beam 53, drive unit insulation layer II 55 and insulation course respectively and distinguish 54 corresponding; Two adjacent gratings strips 62 connect by grating link beam 63; The driving force that drive unit II 61 provides makes gratings strips 62 produce x to displacement; Described gratings strips 62 and grating link beam 63 are suspended on the insulation course cavity II 51.
Described drive unit I 35 and drive unit II 61 can adopt multiple type of drive, as Electromagnetic Drive, static broach driving, electrostatic plates driving, Piezoelectric Driving and hot type of drive etc.
Consult Figure 12, also can have on the described minute surface 32 one with the corresponding minute surface cavity 310 of insulation course cavity II 51.
Consult Fig. 7, the principle of work of this micromechanics spatial light modulator is as follows: optical channel series 7 is arranged above the micromechanics spatial light modulator, original state has a branch of light to incide at a certain angle on the grating device layer 6, and through grating diffration, light beam will enter optical channel I 71 at a certain angle; When applying electric signal on drive unit I 35, minute surface 32 will produce certain reversing, and supposes to have reversed the θ angle, has reversed the θ angle thereby drive the cycle tunable gratings that is positioned on the minute surface 32; Consult Fig. 8, constant when the light path of incident ray, and minute surface 32 has taken place to reverse, and then the light path of diffraction light also will take place to reverse accordingly, and this moment, diffraction light entered optical channel II 72, and promptly 72 photoswitches are opened, and other photoswitch is closed.Like this, utilize the selection that promptly can realize light path of reversing of torsional micro-mirror, realized the effect of photoswitch,, thereby can realize the selection of multiplexer channel because the windup-degree of torsional micro-mirror can carry out accurate programming Control.
The dutycycle of cycle tunable gratings changes, and will produce influence greatly to its optical diffraction performance, and the diffraction efficiency on the different diffraction level is inferior can go out by the following formula Theoretical Calculation:
η k = { sin ( 2 kπ · DC ) 2 kπ } 2 + { [ 1 - cos ( 2 kπ · DC ) ] 2 kπ } 2
η 0 = 1 - Σ k = 1 + ∞ η k
The dutycycle of DC indication cycle tunable gratings wherein, k be the order of diffraction time (k=± 1, ± 2, ± 3...), η kThe diffraction efficiency of representing the k order diffraction, η 0Represent the 0th grade diffraction efficiency.By formula as can be known: when the dutycycle of cycle tunable gratings changed, the light intensity of its diffraction lights at different levels all can change; Here utilize 0 order diffraction light to analyze, Figure 9 shows that the intensity efficiency of 0 grade of cycle tunable gratings diffraction and the relation curve of dutycycle.This characteristic according to the cycle tunable gratings, can realize the effect of optical attenuator, promptly when on drive unit II 61, applying certain driving voltage, certain change will take place in cycle tunable gratings dutycycle, this moment, the light intensity of diffraction light also will change along with the change of dutycycle, that is to say the light intensity that enters optical channel has been carried out decay to a certain degree, consult Figure 10, when the cycle, the tunable gratings dutycycle changed, the light intensity that enters among Fig. 7 among the optical channel I 71 can be decayed; Simultaneously, because the voltage that is applied and the change of dutycycle have relation one to one, and being light intensity, the change of dutycycle and diffraction of light efficient has certain corresponding relation, therefore control puts on the driving voltage on the drive unit II 61, promptly can realize the strictness control of light intensity attenuation amount.Certainly, in Fig. 8, when minute surface 32 drives that the cycle, tunable gratings was reversed, simultaneously can apply electric signal on drive unit II 61, thereby can regulate the light intensity attenuation amount that enters optical channel II 72, promptly this micromechanics spatial light modulator can realize the gating of any passage and the effect of controlling the light intensity attenuation amount of any optical channel.
In addition, this micromechanics spatial light modulation also has a kind of transmissive operation mode, consult Figure 11 and Figure 12, if one and insulation course cavity II 51 corresponding minute surface cavities 310 are arranged on the minute surface 32, then this mechanical space photomodulator not only can be operated in above-mentioned reflective-mode, can also be operated in transmission mode, it is the below that light beam can incide this device by the gap of gratings strips 62, according to above-mentioned principle of work, this device also can be realized the effect of photoswitch and optical attenuation to the optical channel of below.
Beneficial effect of the present invention is:
1, realizing that photoswitch does the time spent, utilizing reversing of torsional micro-mirror to realize selection, thereby reduced the number of elements that light path is switched, improving stability of layout and response speed, also reducing the difficulty of light path debugging on the other hand a plurality of optical channels; Can accurately carry out channel selecting by programming simultaneously.
2, do the time spent at the realization optical attenuation, can accurately control light decrement.
3, type of drive is versatile and flexible, can Electromagnetic Drive, static driven, Piezoelectric Driving and heat drives, and strengthened the dirigibility that device uses greatly.
4, this micromechanics spatial light modulator is integrated in one torsional micro-mirror and cycle tunable gratings, can realize the effect of photoswitch and optical attenuator simultaneously, can utilize the bulk silicon technological processing and manufacturing, and cost is low, can produce in batches.
Description of drawings:
Fig. 1 is the structural representation of this micromechanics spatial light modulator
Fig. 2 is torsional micro-mirror device layer 3 structural representations in this micromechanics spatial light modulator
Fig. 3 is torsional micro-mirror insulation course 2 structural representations in this micromechanics spatial light modulator
Fig. 4 is torsional micro-mirror basalis 1 structural representation in this micromechanics spatial light modulator
Fig. 5 is grating insulation course 5 structural representations in this micromechanics spatial light modulator
Fig. 6 is grating device layer 6 structural representation in this micromechanics spatial light modulator
A certain moment light path synoptic diagram when Fig. 7 is this micromechanics spatial light modulator work
The light path synoptic diagram of Fig. 8 during for the reversing minute surface and reverse the θ angle of this micromechanics spatial light modulator
Fig. 9 is the diffraction efficiency of 0 grade of cycle tunable gratings diffraction and the graph of relation of dutycycle
Figure 10 for this micromechanics spatial light modulator cycle, the tunable gratings dutycycle changed the time the light path synoptic diagram
Structural representation when Figure 11 is operated in transmission mode for this micromechanics spatial light modulator
Torsional micro-mirror device layer 3 structural representations when Figure 12 is operated in transmission mode for this micromechanics spatial light modulator
Figure 13 is the micromechanics spatial light modulator synoptic diagram based on the static broach driving among the embodiment 1
Figure 14 is torsional micro-mirror device layer 3 structural representations in the micromechanics spatial light modulator among the embodiment 1
Figure 15 is the partial enlarged drawing of frame structure among Figure 14
Figure 16 is torsional micro-mirror insulation course 2 structural representations in the micromechanics spatial light modulator among the embodiment 1
Figure 17 is torsional micro-mirror basalis 1 structural representation in the micromechanics spatial light modulator among the embodiment 1
Figure 18 is grating insulation course 5 structural representations in the micromechanics spatial light modulator among the embodiment 1
Figure 19 is grating device layer 6 structural representation in the micromechanics spatial light modulator among the embodiment 1
Figure 20 is the partial enlarged drawing of frame structure among Figure 19
Figure 21 is the micromechanics spatial light modulator synoptic diagram among the embodiment 2
Figure 22 is torsional micro-mirror device layer 3 structural representations in the micromechanics spatial light modulator among the embodiment 2
Figure 23 is torsional micro-mirror insulation course 2 structural representations in the micromechanics spatial light modulator among the embodiment 2
Figure 24 is torsional micro-mirror basalis 1 structural representation in the micromechanics spatial light modulator among the embodiment 2
Figure 25 is grating insulation course 5 structural representations in the micromechanics spatial light modulator among the embodiment 2
Figure 26 is grating device layer 6 structural representation in the micromechanics spatial light modulator among the embodiment 2
Figure 27 is electrode basement layer 4 structural representation in the micromechanics spatial light modulator among the embodiment 2
Wherein: 1---the torsional micro-mirror basalis; 2---the torsional micro-mirror insulation course; 3---the torsional micro-mirror device layer; 4---the electrode basement layer; 5---the grating insulation course; 6---the grating device layer; 7---optical channel series; 71---optical channel I; 72---optical channel II; 11---the basalis broach; 12---the square back of the body of basalis chamber; 13---the basalis insulation tank; 14---basalis pad hole; 21---the insulation course insulation tank; 22---insulation course anchor point district I; 23---insulation course has 1 side anchor point district, pad hole; 24---insulation course landless hole 1 side anchor point district; 25---insulation course cavity I; 26---insulation course pad hole; 27---drive unit insulation layer I; 30---fixed fingers I; 31---the device layer insulation tank; 32---minute surface; 33---torsion beam; 34---device layer anchor point district I; 35---drive unit I; 36---device layer has 1 side anchor point district, pad hole; 37---device layer landless hole 1 side anchor point district; 38---device layer pad hole; 39---movable comb I; 310---the minute surface cavity; 41---top electrode; 42---bottom electrode; 43---the electrode insulation groove; 44---the electrode pad hole; 51---insulation course cavity II; 52---insulation course anchor point district II; 53---insulation course anchor point tie-beam; 54---insulation course does not have the side anchor point of driving district; 55---drive unit insulation layer II; 59---insulation course has the side anchor point of driving district; 61---drive unit II; 62---gratings strips; 63---grating link beam; 64---device layer anchor point district II; 65---device layer anchor point tie-beam; 66---device layer does not have the side anchor point of driving district; 67---device layer has the side anchor point of driving district; 68---movable comb II; 69---fixed fingers II; 610---heat drives beam; 611---drive the link beam.
Embodiment:
Consult Figure 13~Figure 27, describe with regard to embodiments of the present invention, need to prove each figure just the expression of summary constitute basic configuration relation between each key element of the present invention, the present invention not only is confined to the example of accompanying drawing, and multiple selection mode can be arranged.
Embodiment 1
Present embodiment is the micromechanics spatial light modulator that a static broach drives.
Consult Figure 13, this micromechanics spatial light modulator is made up of one-period tunable gratings and a torsional micro-mirror, and described cycle tunable gratings comprises grating device layer 6 and grating insulation course 5 from top to bottom successively; Described torsional micro-mirror comprises torsional micro-mirror device layer 3, torsional micro-mirror insulation course 2 and torsional micro-mirror basalis I from top to bottom successively; Cycle tunable gratings and torsional micro-mirror are one by grating insulation course 5 and torsional micro-mirror device layer 3 bondings;
Consult Figure 14 and Figure 15, comprise moving part disconnected from each other and fixed part on the torsional micro-mirror device layer 3, moving part and fixed part are separated by device layer insulation tank 31, moving part comprises minute surface 32, torsion beam 33, device layer anchor point district I 34, minute surface 32 is connected with the device layer anchor point district I 34 of both sides respectively by the torsion beam 33 at two ends, drive unit I 35 adopts the static broach driver, two groups of movable comb I 39 are distributed in the both sides of minute surface 32, and be attached thereto and be integral, also have the minute surface cavity 310 on the minute surface 32 in addition; And fixed part be arranged in moving part around, two groups of fixed fingers I 30, device layer pad hole 38, the device layer that comprises drive unit I 35 has 1 side anchor point district, pad hole 36, device layer landless hole 1 side anchor point to distinguish 37;
Consult Figure 16, have insulation course insulation tank 21, insulation course anchor point district I 22, insulation course that pad hole 1 side anchor point district 23, insulation course landless hole 1 side anchor point district 24, insulation course pad hole 26 are arranged on the torsional micro-mirror insulation course 2, they have with device layer insulation tank 31, device layer anchor point district I 34, device layer that pad hole 1 side anchor point distinguishes 36 respectively, device layer landless hole 1 side anchor point distinguishes 37, device layer pad hole 38 is corresponding; In addition, also have an insulation course cavity I 25 to be positioned at the below of minute surface 32 and torsion beam 33;
Consult Figure 17, include the square back of the body of basalis chamber 12 on the torsional micro-mirror basalis 1, it is corresponding with insulation course cavity I 25, minute surface 32 is formed with torsion beam 33 to suspend, basalis pad hole 14, it is corresponding consistent with the position shape in device layer pad hole 38 and insulation course pad hole 26, also has in addition and two groups of corresponding consistent basalis broach 11 of two groups of fixed fingers I 30 shaped positions of drive unit I 35, and basalis insulation tank 13 can make two groups of basalis broach 11 realize electric isolation;
Consult Figure 18, grating insulation course 5 makes grating device layer 6 and torsional micro-mirror device layer 3 realize electrical isolation, grating insulation course 5 comprises that insulation course anchor point district II 52, insulation course anchor point tie-beam 53, insulation course do not have the side anchor point of driving district 54 and insulation course has the side anchor point of driving district 59, and described insulation course anchor point district II 52 and insulation course anchor point tie-beam 53 are corresponding with device layer anchor point district I 34 and torsion beam 33 respectively; Described insulation course anchor point district II 52 and insulation course have the side anchor point of driving to distinguish 59 to be connected by insulation course anchor point tie-beam 53; Insulation course does not have and drives side anchor point district 54 and have the side anchor point of driving to distinguish 59 with insulation course to separate, between formation insulation course cavity II 51; Insulation course does not have the side anchor point of driving district 54 and insulation course has the side anchor point of driving district 59 all to be positioned on the minute surface 32;
Consult Figure 19 and Figure 20, also be provided with moving part and fixed part on the grating device layer 6, wherein moving part comprises the movable comb II 68 of 6 parallel gratings strips 62, grating link beam 63, drive unit II 61; And fixed part comprises that fixed fingers II 69, the device layer of drive unit II 61 have the side anchor point of driving district 67, device layer not to have the side anchor point of driving district 66, device layer anchor point tie-beam 65, device layer anchor point district II 64; Described device layer anchor point district II 64, device layer anchor point tie-beam 65, device layer have drive side anchor point district 67, device layer do not have the side anchor point of driving district 66 respectively with insulation course anchor point district II 52, insulation course anchor point tie-beam 53, insulation course have the side anchor point of driving distinguish 59 and insulation course do not have driving 1 side anchor point and distinguish 54 corresponding; Two adjacent gratings strips 62 connect by grating link beam 63; The driving force that drive unit II 61 provides make gratings strips 62 along x to displacement; Described gratings strips 62 and grating link beam 63 are suspended on the insulation course cavity II 51.
The course of work of above-mentioned micromechanics spatial light modulator is as follows: torsional micro-mirror device layer 3 and torsional micro-mirror basalis 1 and grating device layer 6 can apply signal, and torsional micro-mirror insulation course 2 and grating insulation course 5 can not apply signal.Be specially: when loading direct current on device layer anchor point district I 34 and the basalis broach 11, because the effect of electrostatic force, torsional micro-mirror will produce to reverse and reach balance, owing to designed basalis insulation tank 13, on the basalis that basalis pad hole 14 1 sides are being arranged, load the direct current signal DC1 of 60V, and during device layer anchor point district I 34 ground connection, because the movable comb I 39 of device layer anchor point district I 34 and minute surface 32 and drive unit I 35 is communicated with, therefore movable comb I 39 and torsional micro-mirror have the fixed fingers of basalis pad hole 14 1 sides just to form the dislocation broach, because the effect of electrostatic force, torsional micro-mirror will produce counterclockwise reversing, this moment, torsional micro-mirror was operated in the static drive mode, in the certain angle scope, the torsional micro-mirror minute surface can remain on any rotation angle position; At this moment, minute surface 32 has had after certain initial corner, on device layer anchor point district I 34, apply the AC signal AC1 of 30sin (3000 π t), remove the direct current signal DC1 on the torsional micro-mirror basalis 1 simultaneously, minute surface 32 will be done the sine sweep vibration so, and this moment, torsional micro-mirror was operated in the mode of dynamic driving.In like manner, apply direct current signal DC1 on the basalis that is not having basalis pad hole 14 1 sides, during simultaneously with device layer anchor point district I 34 ground connection, torsional micro-mirror will produce clockwise and reverse, thereby has realized reversing of both direction.If on the movable comb I 39 of drive unit I 35, apply voltage, then can make torsional micro-mirror be operated in the equilibrium position; The minute surface cavity 310 of design can make this micromechanics spatial light modulator be operated in transmission and reflective-mode simultaneously, thereby can select the optical channel of micromechanics spatial light modulator above and below simultaneously, make this micromechanics spatial light modulator realize the effect of photoswitch.
If on the movable comb II 68 of device layer anchor point district II 64 and drive unit II 61, apply electric signal, will produce electrostatic force between the broach, thereby make gratings strips 62 and grating link beam 63 under the drive of movable comb 68, produce distortion, reached the purpose that changes the grating cycle, and the grating cyclomorphosis must cause the dutycycle of cycle tunable gratings to change, thereby can play the effect of optical attenuator.Owing to designed grating insulation course 5, can make grating device layer 6 and torsional micro-mirror device layer 3 realize electrical isolation, the photoswitch pattern that is operated in that promptly this micromechanics spatial light modulator can be single, the perhaps single optical attenuator pattern that is operated in, two functions can also be mixed and use, promptly can play the effect of any damping capacity of any optical channel of control.
Embodiment 2
Consult Figure 21, the micromechanics spatial light modulator mountain one-period tunable gratings of present embodiment and a torsional micro-mirror are formed, and wherein torsional micro-mirror adopts electrostatic plates as driving, and the cycle tunable gratings then adopts hot drive form.Described cycle tunable gratings comprises grating device layer 6 and grating insulation course 5 from top to bottom successively; Described torsional micro-mirror comprises torsional micro-mirror device layer 3, torsional micro-mirror insulation course 2 and torsional micro-mirror basalis 1 from top to bottom successively; Cycle tunable gratings and torsional micro-mirror are one by grating insulation course 5 and torsional micro-mirror device layer 3 bondings; While bonding one deck electrode basement layer 4 below torsional micro-mirror basalis 1;
Consult Figure 22, comprise moving part disconnected from each other and fixed part on the torsional micro-mirror device layer 3, moving part and fixed part are separated by device layer insulation tank 31, moving part comprises minute surface 32, torsion beam 33, device layer anchor point district I 34, and minute surface 32 is connected with the device layer anchor point district I 34 of both sides respectively by the torsion beam 33 at two ends; And fixed part be arranged in moving part around, comprise that device layer pad hole 38, device layer have pad hole 1 side anchor point district 36, device layer landless hole 1 side anchor point to distinguish 37;
Consult Figure 23, have insulation course insulation tank 21, insulation course anchor point district I 22, insulation course that pad hole 1 side anchor point district 23, insulation course landless hole 1 side anchor point district 24, insulation course pad hole 26 are arranged on the torsional micro-mirror insulation course 2, they have with device layer insulation tank 31, device layer anchor point district I 34, device layer that pad hole 1 side anchor point distinguishes 36 respectively, device layer landless hole 1 side anchor point distinguishes 37, device layer pad hole 38 is corresponding; In addition, also have an insulation course cavity I 25 to be positioned at the below of minute surface 32 and torsion beam 33, this cavity I 25 fuses with insulation course insulation tank 21;
Consult Figure 24, include the square back of the body of basalis chamber 12 on the torsional micro-mirror basalis 1, it is corresponding with insulation course cavity I 25 positions, minute surface 32 is formed with torsion beam 33 to suspend, basalis pad hole 14, it is corresponding consistent with the position shape in device layer pad hole 38 and insulation course pad hole 26, and basalis insulation tank 13 can make basalis realize the electricity isolation;
Consult Figure 25, grating insulation course 5 makes grating device layer 6 and torsional micro-mirror device layer 3 realize electrical isolation, grating insulation course 5 comprises that insulation course anchor point district II 52, insulation course anchor point tie-beam 53, insulation course do not have 54 and two the discrete insulation courses in the side anchor point of driving district the side anchor point of driving district 59 is arranged, and described insulation course anchor point district II 52 is corresponding with device layer anchor point district I 34; Described insulation course anchor point district II 52 and one of them insulation course have the side anchor point of driving to distinguish 59 to be connected by insulation course anchor point tie-beam 53; Insulation course does not have and drives side anchor point district 54 and have the side anchor point of driving to distinguish 59 with insulation course to separate, between formation insulation course cavity II 51; Insulation course does not have the side anchor point of driving district 54 and insulation course has the side anchor point of driving district 59 all to be positioned on the minute surface 32;
Consult Figure 26, grating device layer 6 is provided with moving part and fixed part, and wherein moving part comprises that the heat of drive unit II 61 drives 610,6 parallel gratings strips 62 of beam, grating link beam 63, is used to connect gratings strips 62 and the hot driving link beam 611 that drives beam 610; And fixed part comprises that device layer anchor point district II 64, device layer anchor point tie-beam 65, device layer do not have 66 and two the discrete device layers in the side anchor point of driving district the side anchor point of driving district 67 is arranged; Described device layer anchor point district II 64, device layer anchor point tie-beam 65, device layer do not have the side anchor point of driving district 66 and device layer has the side anchor point of driving district 67 not have the side anchor point of driving district 54 with insulation course anchor point district II 52, insulation course anchor point tie-beam 53, insulation course respectively and insulation course has the side anchor point of driving district 59 corresponding; Two adjacent gratings strips 62 connect by grating link beam 63; The driving force that drive unit II 61 provides makes gratings strips 62 produce x to displacement; Described gratings strips 62, grating link beam 63, heat drive beam 610 and drive link beam 611 and is suspended on the insulation course cavity II 51.
Consult Figure 27, electrode insulation groove 43 on the electrode basement layer 4 and basalis insulation tank 13 correspondences, it is divided into top electrode 41 and bottom electrode 42 two parts with electrode basement layer 4, and the electrode pad hole 44 on the electrode basement layer 4 is corresponding with basalis pad hole 14.
When applying electric signal on device layer anchor point district I 34 and the electrode basement floor 4, because the effect of electrostatic force, torsional micro-mirror will produce to reverse and reach balance: when applying voltage on device layer anchor point district I 34 and top electrode 41, torsional micro-mirror will reverse counterclockwise; When on device layer anchor point district I 34 and bottom electrode 42, applying voltage, torsional micro-mirror will reverse clockwise, thereby realized reversing of both direction, the optical channel of micromechanics spatial light modulator top has been selected, made this micromechanics spatial light modulator realize the effect of photoswitch.
Power up the generation electric potential difference if having the side anchor point of driving to distinguish on 67 at two discrete device layers, then the heat of drive unit II 61 drives beam 610 and will produce distortion, link beam 611 drives beam 610 with heat and gratings strips 62 fuses and drive, therefore the distortion of heat driving beam 610 will make driving link beam 611 produce displacement, thereby drive gratings strips 62 and produce x to displacement, realized the cycle adjustable function of grating, and the grating cyclomorphosis must cause the dutycycle of grating to change, thereby can play the effect of optical attenuator.Owing to designed grating insulation course 5, can make grating device layer 6 and torsional micro-mirror device layer 3 realize electrical isolation, the photoswitch pattern that is operated in that promptly this micromechanics spatial light modulator can be single, the perhaps single optical attenuator pattern that is operated in, two functions can also be mixed and use, promptly can play the effect of any damping capacity of any optical channel of control.

Claims (4)

1. a micromechanics spatial light modulator is characterized in that, comprises one-period tunable gratings and a torsional micro-mirror, and described cycle tunable gratings comprises grating device layer (6) and grating insulation course (5) from top to bottom successively; Described torsional micro-mirror comprises torsional micro-mirror device layer (3), torsional micro-mirror insulation course (2) and torsional micro-mirror basalis (1) from top to bottom successively; Cycle tunable gratings and torsional micro-mirror are one by grating insulation course (5) and torsional micro-mirror device layer (3) bonding; Comprise moving part disconnected from each other and fixed part on the described torsional micro-mirror device layer (3): moving part and fixed part are separated by device layer insulation tank (31), moving part comprises minute surface (32), torsion beam (33), device layer anchor point district I (34), and minute surface (32) is connected with the device layer anchor point district I (34) of both sides respectively by the torsion beam 3 (3) at two ends; And fixed part be arranged in moving part around, comprise that device layer pad hole (38), drive unit I (35), device layer have pad hole 1 side anchor point district (36), device layer landless hole 1 side anchor point to distinguish (37);
Have insulation course insulation tank (21), insulation course anchor point district I (22), insulation course that 1 side anchor point district, pad hole (23), insulation course landless hole 1 side anchor point district (24), drive unit insulation layer I (27), insulation course pad hole (26) are arranged on the described torsional micro-mirror insulation course (2), they have with device layer insulation tank (31), device layer anchor point district I (34), device layer respectively, and 1 side anchor point district, pad hole (36), device layer landless hole 1 side anchor point are distinguished (37), drive unit I (35), device layer pad hole (38) is corresponding; In addition, also have an insulation course cavity I (25) to be positioned at the below of minute surface (32) and torsion beam (33);
Include the square back of the body of basalis chamber (12) and basalis pad hole (14) on the described torsional micro-mirror basalis (1), the square back of the body of basalis chamber (12) is corresponding with insulation course cavity I (25) position, it makes minute surface (32) form with torsion beam (33) and suspends, and basalis pad hole (14) is corresponding consistent with the position shape in device layer pad hole (38) and insulation course pad hole (26);
Described grating insulation course (5) makes grating device layer (6) and torsional micro-mirror device layer (3) realize electrical isolation, grating insulation course (5) comprises that insulation course anchor point district II (52), insulation course anchor point tie-beam (53), insulation course do not have the side anchor point of driving district (54) and drive unit insulation layer II (55), and described insulation course anchor point district II (52) and insulation course anchor point tie-beam (53) are corresponding with device layer anchor point district I (34) and torsion beam (33) respectively; Described insulation course anchor point district II (52) is connected by insulation course anchor point tie-beam (53) with drive unit insulation layer II (55); Insulation course does not have and drives side anchor point district (54) and separates with drive unit insulation layer II (55), between formation insulation course cavity II (51); Insulation course does not have the side anchor point of driving district (54) and drive unit insulation layer II (55) is positioned on the minute surface (32);
Described grating device floor 6 comprises that drive unit II (61), some parallel gratings strips (62), grating link beam (63), device layer anchor point district II (64), device layer anchor point tie-beam (65), device layer do not have the side anchor point of driving district (66); Described device layer anchor point district II (64), device layer anchor point tie-beam (65), drive unit II (61), device layer do not have and drive side anchor point district (66) and do not have driving 1 side anchor point with insulation course anchor point district II (52), insulation course anchor point tie-beam (53), drive unit insulation layer II (55) and insulation course respectively to distinguish (54) corresponding; Adjacent two gratings strips (62) connect by grating link beam (63); The driving force that drive unit II (61) provides makes gratings strips (62) produce x to displacement; Described gratings strips (62) and grating link beam (63) are suspended on the insulation course cavity II (51).
2. a micromechanics spatial light modulator as claimed in claim 1 is characterized in that, have on the described minute surface (32) one with the corresponding minute surface cavity (310) of insulation course cavity II (51).
3. a micromechanics spatial light modulator as claimed in claim 1 or 2 is characterized in that, the type of drive of described drive unit I (35) is that static broach driving, electrostatic plates driving, Piezoelectric Driving, Electromagnetic Drive or heat drive.
4. a micromechanics spatial light modulator as claimed in claim 1 or 2 is characterized in that, the type of drive of described drive unit II (61) is that static broach driving, electrostatic plates driving, Piezoelectric Driving, Electromagnetic Drive or heat drive.
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CN102243369A (en) * 2011-04-18 2011-11-16 上海丽恒光微电子科技有限公司 MEMS (Micro-electromechanical System) light valve, display device and formation method of MEMS light valve
CN102963857A (en) * 2012-10-17 2013-03-13 东南大学 Micro electro mechanical (MEM) comb tooth mechanism capable of modulating backlash under electromagnetic drive
CN104614551A (en) * 2015-01-27 2015-05-13 浙江大学 Combined optical grating micromechanical acceleration sensor and acceleration measurement method thereof
CN104749768A (en) * 2015-01-15 2015-07-01 深圳市盛喜路科技有限公司 Hybrid drive MEMS tunable optical driver
CN108873313A (en) * 2017-05-10 2018-11-23 上海新微技术研发中心有限公司 Microelectromechanical optical phase modulator
CN113218982A (en) * 2021-05-14 2021-08-06 东南大学 In-situ mechanical test chip and preparation method thereof
CN114911051A (en) * 2022-04-22 2022-08-16 北京理工大学 Low-temperature-drift electrostatic MEMS (micro-electromechanical system) micro-mirror and implementation method thereof

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CN102243369A (en) * 2011-04-18 2011-11-16 上海丽恒光微电子科技有限公司 MEMS (Micro-electromechanical System) light valve, display device and formation method of MEMS light valve
CN102963857A (en) * 2012-10-17 2013-03-13 东南大学 Micro electro mechanical (MEM) comb tooth mechanism capable of modulating backlash under electromagnetic drive
CN102963857B (en) * 2012-10-17 2015-04-15 东南大学 Micro electro mechanical (MEM) comb tooth mechanism capable of modulating backlash under electromagnetic drive
CN104749768A (en) * 2015-01-15 2015-07-01 深圳市盛喜路科技有限公司 Hybrid drive MEMS tunable optical driver
CN104614551A (en) * 2015-01-27 2015-05-13 浙江大学 Combined optical grating micromechanical acceleration sensor and acceleration measurement method thereof
CN104614551B (en) * 2015-01-27 2018-04-10 浙江大学 Combine grating micro-machine acceleration transducer and its method for measuring acceleration
CN108873313A (en) * 2017-05-10 2018-11-23 上海新微技术研发中心有限公司 Microelectromechanical optical phase modulator
CN113218982A (en) * 2021-05-14 2021-08-06 东南大学 In-situ mechanical test chip and preparation method thereof
CN113218982B (en) * 2021-05-14 2023-01-03 东南大学 In-situ mechanical test chip and preparation method thereof
CN114911051A (en) * 2022-04-22 2022-08-16 北京理工大学 Low-temperature-drift electrostatic MEMS (micro-electromechanical system) micro-mirror and implementation method thereof

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