CN101955156A - Technology of method for preparing high purity diborane by way of adsorption, separation and purification - Google Patents
Technology of method for preparing high purity diborane by way of adsorption, separation and purification Download PDFInfo
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- CN101955156A CN101955156A CN 201010192538 CN201010192538A CN101955156A CN 101955156 A CN101955156 A CN 101955156A CN 201010192538 CN201010192538 CN 201010192538 CN 201010192538 A CN201010192538 A CN 201010192538A CN 101955156 A CN101955156 A CN 101955156A
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- diborane
- technology
- high purity
- adsorption
- purification
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Abstract
The invention discloses a technology of a method for preparing high purity diborane by way of adsorption, separation and purification, which is formed mainly by using a coarse B2H6 (diborane) cylinder, a dryer, an adsorber, a vacuum pump, a tail gas absorber and a product collector which are integrated by connecting pipes according to the system functions thereof. The technology of the invention is an ideal high purity diborane preparation technology, and has the advantages of reasonable design and convenient use.
Description
Affiliated technical field
The present invention relates to a kind of alkanes Chemicals-high-purity diborane preparation method's Technology, particularly a kind of fractionation by adsorption purification mode prepares the Technology of high-purity diborane method, is suitable for the synthetic diborane of chemical industry.
Background technology
At present, at present, microelectronics is the main foundation stone of modern information technologies and military technique, is to promote one of scientific-technical progress, industry development, economic liftoff and social progressive key factor.Unicircuit is the core of microelectronics, and its developmental level and industry size have become the important symbol of weighing a national economic strength.Electronics special gas (as diborane), especially high pure electronic gas are the important factors of restriction IC reliability and yield rate as this new class of electronics chemical materials.Along with the develop rapidly of electronic information technology, integrated level is more and more higher, and 5N level (99.999%) has been brought up in the purity requirement of basic raw material (as diborane), even more than the 7N, therefore preparing high pure electronic special gas technology more seems extremely urgent.The technology of preparing of diborane is imperfect as yet, the making method complex process, difficult the grasp, the product of producing still can not satisfy the needs of associated electrical product comprehensively, and of poor quality, problem is many, can only be used to make the product of low specification, therefore, brought bigger trouble to the user, this situation has seriously restricted development of electronic technology.
Summary of the invention
Problem to be solved by this invention is, overcomes the deficiencies in the prior art, provides a kind of fractionation by adsorption purification mode to prepare the Technology of high-purity diborane method.This technology not only technology is reasonable, and preparation is simple, and good product quality, and the diborane purity of production is up to more than the 5N (99.999%), and has solved problem of environmental pollution.
The technical solution used in the present invention is: thick B
2H
6(diborane) gas cylinder, moisture eliminator, adsorber, vacuum pump, tail gas absorber, product collector are assembled into one by connection line by its system function and constitute.
The present invention adopts fractionation by adsorption purification mode to produce the processing method of high-purity diborane.
Mainly be to supply with thick diborane continuously by apparatus of the present invention that diborane takes place, according to the foreign matter content of rough diborane, the way that adopts cryogenic absorption, desorption by heating is with B
2H
6In CH
4, CO
2Deng removing, prepare high-purity diborane, form finished product through liquefaction, carburetion system.
Its advantage is the product yield height, purity height (99.0%-99.9%), and the few and separate easily of impurity except that product itself, does not have other harmful, deleterious by products, operate more conveniently yet, is the desirable technique that high-purity diborane prepares.
The invention has the beneficial effects as follows, reasonable in design, easy to use, be ideal diborane fabricating technology.
Description of drawings
The present invention is further described below in conjunction with drawings and Examples.
Fig. 1 is a structural representation of the present invention.
Accompanying drawing number is: 1, thick B
2H
6(diborane) gas cylinder, 2, moisture eliminator, 3, adsorber, 4, vacuum pump, 5, tail gas absorber, 6, the product collector, 7, connection line.
Embodiment
With reference to Fig. 1, thick B
2H
6(diborane) gas cylinder (1), moisture eliminator (2), adsorber (3), vacuum pump (4), tail gas absorber (5), product collector (6) are assembled into one by connection line (7) by its system function and constitute.
The present invention adopts fractionation by adsorption purification mode to produce the processing method of high-purity diborane.
Mainly be to supply with thick diborane continuously by apparatus of the present invention that diborane takes place, according to the foreign matter content of rough diborane, the way that adopts cryogenic absorption, desorption by heating is with B
2H
6In CH
4, CO
2Deng removing, prepare high-purity diborane, form finished product through liquefaction, carburetion system.
Its advantage is the product yield height, purity height (99.0%-99.9%), and the few and separate easily of impurity except that product itself, does not have other harmful, deleterious by products, operate more conveniently yet, is the desirable technique that high-purity diborane prepares.
Claims (1)
1. a fractionation by adsorption purification mode prepares the Technology of high-purity diborane method, it is characterized in that: thick B
2H
6(diborane) gas cylinder, moisture eliminator, adsorber, vacuum pump, tail gas absorber, product collector are assembled into one by connection line by its system function and constitute.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010192538 CN101955156A (en) | 2010-06-07 | 2010-06-07 | Technology of method for preparing high purity diborane by way of adsorption, separation and purification |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010192538 CN101955156A (en) | 2010-06-07 | 2010-06-07 | Technology of method for preparing high purity diborane by way of adsorption, separation and purification |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101955156A true CN101955156A (en) | 2011-01-26 |
Family
ID=43482785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010192538 Pending CN101955156A (en) | 2010-06-07 | 2010-06-07 | Technology of method for preparing high purity diborane by way of adsorption, separation and purification |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101955156A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104086576A (en) * | 2014-07-18 | 2014-10-08 | 上海格物致知医药科技有限公司 | Preparation method of high purity borane gas and application of borane gas |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1309619A (en) * | 1998-04-09 | 2001-08-22 | Uhp材料有限公司 | Preparation and purification of diborane |
-
2010
- 2010-06-07 CN CN 201010192538 patent/CN101955156A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1309619A (en) * | 1998-04-09 | 2001-08-22 | Uhp材料有限公司 | Preparation and purification of diborane |
Non-Patent Citations (1)
| Title |
|---|
| 《低温与特气》 19861231 张锦葵 高纯乙硼烷的研制 40-42，39 1 , 第1期 2 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104086576A (en) * | 2014-07-18 | 2014-10-08 | 上海格物致知医药科技有限公司 | Preparation method of high purity borane gas and application of borane gas |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20110126 |