CN101942230A - Preparation method of cationized silicon dioxide dispersion - Google Patents
Preparation method of cationized silicon dioxide dispersion Download PDFInfo
- Publication number
- CN101942230A CN101942230A CN2010102586283A CN201010258628A CN101942230A CN 101942230 A CN101942230 A CN 101942230A CN 2010102586283 A CN2010102586283 A CN 2010102586283A CN 201010258628 A CN201010258628 A CN 201010258628A CN 101942230 A CN101942230 A CN 101942230A
- Authority
- CN
- China
- Prior art keywords
- preparation
- amino
- silica
- cationization
- replace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5218—Macromolecular coatings characterised by inorganic additives, e.g. pigments, clays
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Silicon Compounds (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
Abstract
The invention relates to a preparation method of cationized silicon dioxide dispersion. The preparation method comprises the following steps: dispersing silicon dioxide in solution by using trivalent aluminum compound to form a predispersion, and modifying the surface of silicon dioxide by using at least one amido organosilane to form the cationized silicon dioxide dispersion. The method simplifies the preparation process of the cationized silicon dioxide dispersion, and the cationized silicon dioxide dispersion has high storage stability in a wide pH value range. In addition, the invention also relates to a recording medium for ink jet printing, which comprises the cationized silicon dioxide dispersion in the ink absorption layer.
Description
Technical field
The present invention relates to a kind of preparation method of cationization silica dispersion, the preparation method of the cationization silica dispersion in particularly a kind of ink absorbing layer that can be applied in the spray ink Printing recording medium.
Background technology
Along with the arrival in computer multi-media epoch, high-resolution digital camera, desktop inkjet printers, and high-quality photo-printer having is come in modern handle official bussiness and the family on a large scale.This just impels print media market to be grown up fast and develop.Special quality when spray ink Printing is more and more higher, and when the image of printing was enough to compare favourably with traditional photo, photo prints had become out and out customer need, has replaced the mode of developing and printing of traditional photo with ink-jetting style output photo part.Such technology and the good interaction between demand have not only promoted the sound development of whole market, and manufacturer has also obtained more competent development space therein.
Aspect the media technology development, the coating structure of ink-jet printing media has experienced swelling type, pore type, casting and has been coated with type, four developmental stage of microporous type structure, casting is coated with type and the microporous type structure is fast-developing in recent years coating technology, in photo field ink-jet output to replace conventional silver halide printing paper for pursuing one's goal the effect that the microporous type medium is exported near photo the most.
The microporous type structure adopts RC paper substrate, polyester film as base material, ink absorbing layer thickness is 20-30um based on silica system, based on alumina system is 35-40um, contain a large amount of nano level inorganic particles in the ink absorbing layer, particle is so little, and even they less than visible optical wavelength 1/2nd and become transparent.The microporous type medium has kept the gloss and the smoothness of silver salt printing paper, and ink absorbing layer presents the favous hole of the class that can accept printing ink, does not therefore have basic conflict between blotting speed and waterproof.The microporous type ink absorbing layer can reach very high blotting speed, basic wink-dry, and the coatingsurface height is smooth, so the gain of the point of ink dot and sharpness can accurately control, and the image quality quality is near the level of conventional silver halide printing paper.
The microporous type medium generally adopts the aluminum oxide of submicron order or fumed silica dispersion liquid as mineral dye, disperseing particle diameter D50 only is about 160nm even littler, after adding high molecular polymer, in film process, form imperceptible inorganic-organic composite particles.Under scanning electronic microscope, can be observed the hole that a large amount of micropores and sub-micro hole are formed, these holes mostly are communicating aperture, because these holes, visually present the gloss of continuous high light less than the human eye resolving power.And the swelling type is smooth successive polymeric film, and the microscopic morphology under 20000 times of scanning electronic microscope is completely different.
U.S. Patent number is that US 4780356 has described the glue application layer that is made of such as the bonding porous silica of polyvinyl alcohol water soluble adhesive.The particulate volume of voids is 0.05-3.00cc/g, and granularity is 0.1-5 μ m, and pore dimension is 1-500nm.But silica dioxide granule shows as electronegativity, for obtaining the good glue application layer of image water-repellancy, must do cation-modified processing to dispersed silicon dioxide.Patent application DE 10020346 has described a kind of recording sheet for ink jet printing, and it contains the primary particle diameter that the prepares silicon-dioxide less than 20nm in gas phase, and wherein the surface of silicon-dioxide is by positively charged with the processing of aluminum chloride hydrocarbon complex.
Patent application WO0020221 has described the reaction of fumed silica and Wickenol CPS 325, then, improved silica is admixed to the ink absorbing layer of the nanoporous recording medium that is used for spray ink Printing.Yet the shortcoming that described method of modifying shows need in the modification procedure to be the Wickenol CPS 325 of high quantity.Speed of reaction is low, and the dispersion that obtains is because of the high storage stability that shows difference of its salts contg, i.e. dispersion cohesion and precipitating easily, or form a kind of hard dense deposit.And in actual applications, the stationary phase that requires dispersion usually was above 1 month.And this dispersion is gel when high pH value, can only just can use when low pH value.
Patent application US 6964992 has described a kind of spray ink Printing recording medium, and containing specific surface area in the ink absorbing layer is 180-210M
2The fumed silica dispersion of/g is done modification with at least a silane that contains amino and is handled.The shortcoming of above-mentioned method of modifying is more to need to be controlled between the 3.5-4.0 with acid with between the dispersion pH value control 2-6.And dispersion acid amount is big more, and required boron compound dosage of crosslinking agent is just big more.
Patent application EP 04105031 has described the surface modifying method of nano-stephanoporate silicon dioxide, wherein by with for example reaction product processing of Wickenol CPS 325 and at least a amino-organosilanes of trivalent aluminum compound, with the fumed silica modification.Then, the nano-stephanoporate silicon dioxide of modification is admixed to the ink absorbing layer of the nanoporous recording medium that is used for spray ink Printing.The advantage of described method of modifying is that the storage stability of dispersion improves, and the picture quality of recording medium also improves to some extent.Yet, the shortcoming of described method of modifying is to consider the trivalent aluminum compound of being added in the reaction process and the ratio of two kinds of components of amino-organosilanes, the mol ratio of trivalent aluminum compound and amino-organosilanes need be controlled between the 0.1-2.0, and the ratio between aluminium atomicity and the Siliciumatom number is very important to the product structure that reaction is generated.When trivalent aluminum compound (as Wickenol CPS 325) is as if direct and amino-organosilanes reaction in addition, has the undissolvable very high-molecular weight of part aluminium by product and form.If the control production of by-products need increase step in the preparation feedback process, for example make earlier amino-organosilanes in solution with CO
2Reaction forms the organosilane ammonium.
Summary of the invention
An object of the present invention is to provide a kind of preparation method of cationization silica dispersion.The objective of the invention is to be achieved through the following technical solutions:
A kind of preparation method of cationization silica dispersion is characterized in that: silicon-dioxide is scattered in the solution with trivalent aluminum compound earlier, forms predispersion, adopts at least a amino-organosilanes to add dispersion then and carries out surface modification.
A kind of optimal technical scheme is characterized in that described trivalent aluminum compound is the mixture of one or more arbitrary proportions of aluminum chloride, aluminum nitrate, aluminum acetate, al formate, Wickenol CPS 325, nitric hydrate aluminium, polymerize aluminum chloride or polymerization aluminum nitrate.
A kind of optimal technical scheme is characterized in that described amino-organosilanes has the knot of formula (1)
Structure:
R wherein
1, R
2, R
3The alkyl that contains 1 to 6 carbon atom of representing hydrogen, hydroxyl independently, do not replace or replacing, the aryl that does not replace or replace, the alkoxyl group that contains 1 to 6 carbon atom that does not replace or replace or the aryloxy that does not replace or replace, condition is R
1, R
2, R
3At least contain an alkoxy base that contains 1 to 6 carbon atom that does not replace or replace; R
4Expression contains one primary, the second month in a season or the amino substituent organic moiety of uncle at least.
A kind of optimal technical scheme, it is characterized in that described amino-organosilanes is selected from the 3-TSL 8330, the 3-aminopropyltriethoxywerene werene, N-phenyl-γ-An Bingjisanjiayangjiguiwan, N-phenyl-γ-An Bingjisanyiyangjiguiwan, (N, N-dimethyl-3-aminopropyl) Trimethoxy silane, (N, N-dimethyl-3-aminopropyl) triethoxyl silane, N-ethyl-ammonia isobutyl-Trimethoxy silane, N-ethyl-ammonia isobutyl-triethoxyl silane, 3-piperazinyl propyl group methyl dimethoxysilane, 3-piperazinyl propyl group methyldiethoxysilane, N-(2-amino-ethyl)-3-TSL 8330, N-(2-amino-ethyl)-3-aminopropyltriethoxywerene werene, N-(2-amino-ethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-amino-ethyl)-3-aminopropyl methyldiethoxysilane, the mixture of one or more arbitrary proportions of γ-divinyl triammonium base propyl trimethoxy silicane or γ-divinyl triammonium base propyl-triethoxysilicane.
A kind of optimal technical scheme, the amount that it is characterized in that described trivalent aluminum compound is 1 to 10 weight % with respect to the amount of silicon-dioxide.
A kind of optimal technical scheme, the amount that it is characterized in that described amino-organosilanes is 5 to 20 weight % with respect to the amount of silicon-dioxide.
A kind of optimal technical scheme is characterized in that described silicon-dioxide is fumed silica.
A kind of optimal technical scheme, the primary particle diameter that it is characterized in that described fumed silica is 1-100nm.
A kind of optimal technical scheme, the aggregate particle size that it is characterized in that described fumed silica is between the 100-500nm.
A kind of optimal technical scheme, the specific surface area BET that it is characterized in that described fumed silica is 90-400m
2Between/the g.
Synthetic silica can be by wet method and gas phase manufactured.The commercialization kind of wet method silicon-dioxide roughly has: (1) precipitated silica (precipitated silica): water glass and sulfuric acid are reacted under alkaline condition, silica dioxide granule is assembled and precipitation, its granular size constantly increases, through filtration, cleaning, drying, grinding and classification processing, make finished product then.The precipitated silica surface is slightly acidic, and particle diameter does not generally wait from 1～50 μ m, and specific surface area is from 30～800m
2/ g, precipitated silica have inner porousness, and the oil-absorption(number) height is 175～320ml/100g, and the surface comprises 5～8/nm of silicon hydroxyl groups
2, the silicon hydroxyl is given the precipitated silica water-wet behavior.Precipitator method titanium dioxide cost is low, and the product with different specific surface areas, pore volume, pore size distribution all has merchandise sales, as the Nipsil of TOSOH SILICA CORP. (Japan) and the Tokusil of K.K.TOKUYAMA (day Bender mountain).(2) gel method silicon-dioxide (silica gel): gel method silicon-dioxide can react under acidic conditions by water glass and sulfuric acid to be made, in this method, little silica dioxide granule is dissolved in ageing process to be fallen, and between the bigger primary granule of other volume, precipitate once more, thereby primary granule is bonded with each other together, therefore, structure clearly primary granule disappears, and forms to have internal void structure harder agglomerated particle relatively.Being purchased product has the Nipgel of TOSOH SILICA CORP. (Japan), the Syloid of Grace Davision, Sylojet etc.(3) silicon sol (silica gel): silicon sol is the dispersion of ultramicron in water of silicic acid, and the preparation method has ion exchange method (Bird method), silica flour one one-step hydrolysis method, silane hydrolyzate method (Stober method) etc.The silicon sol low cost of manufacture of Bird legal system, but purity difference, surface hydroxyl hyperactivity, the about 5/nm of silicon hydroxy density
2, easy and tackiness agent, dispersion agent or other component generation reunion reaction in the use.The product that is purchased of silicon sol has Japanese Nissan Chemical Industries, the Snowtex of Ltd., the Ludox of U.S. Du pont etc.
Corresponding with wet method, the gas-phase reaction for preparing fumed silica by flame pyrolysis also is called as dry method.In this method, hydrogen and oxygen are mixed with certain proportion pass through SiCl
4Container is taken SiCl out of
4Steam, ignition generates water, water vapour makes SiCl
4Generate smoke-like SiO at vapor phase hydrolysis
2The primary nano-scale particle that high-temp combustion produces does not exist with independent primary particle, and they are formed the catenate aggregate by rapid sintering together.Through further cooling, aggregate by hydrogen bond action and other weak magnetism for example the Van der Waals force effect form larger sized agglomerate.Agglomerate can be broken for aggregate again in dispersion process, but under common dispersion condition, aggregate can not be broken up into independently primary particle.Usually, the specific surface area of fumed silica is big more, and its agglomeration degree is just big more.The manufacturer of fumed silica is by German Degussa, Wacker, U.S. Cabot, and several companies control world market such as Japanese Tokuyama (moral mountain).Domestic manufacturers' Guangzhou Ji must the time also begin to supply the fumed silica of plurality of specifications.The average 1nm of wetting ability fumed silica
22～3 silicon hydroxyls are arranged, and hydrophobic fumed silica is in process of production through handle obtaining a hydrophobic surface, in this process, and silicon hydroxyl generation graft reaction and reduce average 1nm
21 silicon hydroxyl is arranged, and what indivedual modification degree were high only remains 0.5.
Fumed silica is suitable for forming the high three-dimensional structure of porosity, and its mechanism still imperfectly understands.But infer relevant than complicated chain-like structure with significant thixotropic behavior with its agglomerate or aggregate.Thixotropic behavior comes from a large amount of activity hydroxy effect in surface.After among fumed silica is distributed to liquid, these silicon oh groups can directly or by intermolecular ground connection in the liquid interact.Because the magnetism of hydrogen bond action causes the formation of reversible, tridimensional network, thereby makes ink absorbing layer keep high porosity in drying process.
Fumed silica primary granule itself is not a porous, yet agglomerate and aggregate are porous, and owing to this reason can the big quantity of fluid of rapid absorption.Primary granule has the size between 1nm to 100nm, and the preferred size between 1nm to 30nm is particularly preferably in the size between the 5nm to 20nm.The agglomerate of fumed silica has the size greater than 100nm usually in dispersion, the particle of preferred size between 100nm to 500nm, the special particle of preferred size between 120nm to 250nm.Fumed silica has at 20m
2/ g and 400m
2Specific surface area between the/g is preferably at 40m
2/ g and 400m
2Specific surface area between the/g particularly preferably is at 90m
2/ g and 380m
2Specific surface area between the/g.Specific surface area is determined by the BET isothermal method.The BET method is the method for surface-area that is used for being in by the gas adsorption measurement material of powder type, wherein determines specific surface area by adsorption isothermal line.
The fumed silica dispersion of non-modified, PH demonstrates the surface of negative charge between 3.8～10 the time, and this is to lose proton by the silicon oh group that is present in silica sphere to cause.For electronegative tinting material is fixed, the surface of silicon-dioxide must modification become positive charge character.
With regard to purpose of the present invention, fumed silica is considered to cationization under following situation: fumed silica is by physical adsorption or surperficial method for coating, thereby make net charge that silica sphere contains for just, perhaps, the Zeta electric potential that the silica dispersion particle records between pH value 3～7 is for just.Preferably, clean positive charge is provided by surperficial method for coating, and is further preferred, and clean positive charge provides by being connected the lip-deep functional group of fumed silica, further preferred, this functional group is connected in silica sphere by covalent linkage or hydrogen bond key.This functional group directly key is connected on the silicon-dioxide, perhaps is connected in silica sphere by organic or inorganic chemical part key.This kind key connects and to significantly reduce functional group from silica sphere diffusion, wash-out or separate, thereby improves the electrostatic repulsion between the improved silica dispersion granule, demonstrates good storage stability.Among the present invention, Zeta electric potential is interpreted as the electromotive force on the interior shear surface of the silica dioxide granule/electrolyte electrochemical bilayer in the dispersion.Zeta electric potential depends in part on grain type, for example the type of silicon-dioxide, aluminum oxide, mixed oxide particle.The importance value relevant with Zeta electric potential is particulate iso-electric point (IEP).It is 0 o'clock pH value that IEP has provided Zeta electric potential, and the IEP of silicon-dioxide is lower than PH 3.8.When the PH of unmodified silica dispersions greater than 3.8 the time, Zeta electric potential is a negative value.By modification, introduce clean positive charge at silica particles, IEP is moved to high pH value district, by the clean positive charge quantity that contains of control silica sphere, the silica sphere after the modification, between pH value 3.0-7.0 Zeta electric potential be on the occasion of.
In the preparation of the silicon-dioxide of this surface modification, fumed silica is joined under high shear rate in the solution that is mainly water-based, deionized water is preferred for preparing the described solution that is mainly water-based.Can add a certain proportion of water-miscible organic solvent, so-called water-miscible organic solvent refers in particular to solubleness in the water at normal temperature and is 10% or higher solvent.Consider environmental protection and processibility, example comprises alcohols such as methyl alcohol, ethanol, propyl alcohol, Virahol, butanols, isopropylcarbinol, sec-butyl alcohol, the trimethyl carbinol, hexalin; Polyalcohols such as ethylene glycol, sulfo-glycol, propylene glycol, glycol ether and glycerine; Alcohol ethers and derivative such as ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monobutyl ether, diethylene glycol monomethyl ether, dipropylene glycol monomethyl ether, glycol diacetate; Ketone such as acetone, methylethylketone; Amides such as methane amide, 2-Pyrrolidone, N-Methyl pyrrolidone, N, dinethylformamide, N,N-dimethylacetamide; Amine solvent such as thanomin, diethanolamine, trolamine, N methyldiethanol amine, morpholine, quadrol, diethylenetriamine.These solvents can be used alone or as a mixture.
In the present invention, can earlier trivalent aluminum compound be dissolved in the solution.Trivalent aluminum compound is one or more mixtures of aluminum chloride, aluminum nitrate, aluminum acetate, al formate, Wickenol CPS 325, nitric hydrate aluminium, polymerize aluminum chloride, polymerization aluminum nitrate.Trivalent aluminum compound is chosen in certain solubility or this material as aqueous dispersions in the water, solubleness is preferably greater than 0.1g/ (100g water), more preferably greater than 0.4g/ (100g water).
The add-on of trivalent aluminum compound, preferably the amount with respect to silicon-dioxide is 0.2 to 15 weight %, and is further preferred 0.5% to 10%, more preferably 1% to 10%.The trivalent aluminum compound add-on very little, silicon-dioxide is difficult to disperse, the poor stability of dispersion.The trivalent aluminum compound add-on is too big, is applied to ink-jet coating liquid, and viscosity was too big after dispersion was mixed with tackiness agent.
In the present invention, trivalent aluminum compound is connected in silica sphere by physical adsorption or inorganic chemistry part key, has improved the stability of dispersion.
In the present invention, for improving pre-dispersed property, can add a certain amount of mineral acid or organic acid when adding trivalent aluminum compound or after adding silicon-dioxide, example comprises mineral acid such as sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid; Organic acid such as acetate, formic acid, oxalic acid, thionamic acid.
In the present invention, described fumed silica is scattered in trivalent aluminum compound earlier and forms predispersion in the solution, and the pH value of its predispersion is between 1-3.
Amino-organosilanes of the present invention, in modifying process with the surface silanol group generation condensation reaction of silicon-dioxide, thereby form the surface modification that aminosilane coats.When amino-organosilanes contained two or more alkoxyl group, the condensation reaction between the aminosilane took place simultaneously, thereby forms three-dimensional cross-linked aminosilane coating layer.Can also use the condensation product of amino-organosilanes to replace the monomer amino-organosilanes.Condensation reaction can take place between identical or different amino-organosilanes.
Modifying process can carry out in suitable liquid medium, for example is mainly the solution of water-based.If implement modifying process with high-shear, then reaction product is evenly distributed on the surface of silicon-dioxide.The rheological behavior of modification dispersion in addition, improves.
The modification degree depends on the add-on of amino-organosilanes.The amount of amino-organosilanes is with respect to preferred 1 to the 30 weight % of the amount of silicon-dioxide, further preferred 2 to 25 weight %, more preferably 5 to 20 weight %.The amino-organosilanes add-on very little, the modification degree is low excessively, the clean positive charge that silica sphere contains very little, dispersion stability is poor, and is used for the spray ink Printing recording medium, the waterproof ability of print image and anti-spreading and sinking in are oozed ability.Add-on is too big, and the cost of modification is too high, and the stability of dispersion reduces on the contrary.
The cationization silica dispersion of the present invention's preparation demonstrates good storage stability in very wide PH scope, and pH value changes between 3.0-7.0, and described dispersion room temperature is placed and do not formed precipitation at least 48 hours, and remarkable change does not take place its viscosity.In fact, described dispersion is placed a week even was not observed precipitation in one month and changes with significant viscosity.
Cationization silica dispersion prepared in accordance with the present invention can be used to prepare the coating fluid of spray ink Printing with the ink absorbing layer of recording medium.Tinting material in the ink for ink-jet print (dyestuff or pigment) usually comprises can ionizable group, as SO
3H, COOH, PO
3H
2Deng, thereby increase the solubleness of dyestuff or improve the dispersing of pigments performance.Thereby after these group disassociations, tinting material is electronegative in being mainly the ink of water-based, can and be fixed by the positive surface charge electrostatic attraction of cation-modified silicon-dioxide.
Cationization silica dispersion prepared in accordance with the present invention mixes with adhesive solvent, adds auxiliary agents such as laking agent, tensio-active agent, linking agent, water-resisting agent again, makes the coating fluid of ink absorbing layer.At last, coating fluid is coated on the plastic-coated paper-based, drying obtains the waterproof glossy ink-jet printing media.For different fumed silica (particularly its specific surface area) and trivalent aluminum compound and at least a amino-organosilanes, the ratio between tackiness agent and the silicon-dioxide, and the amount of linking agent, each ink absorbing layer can be different.
Can be applied on the carrier by the coating solution of multiple suitable method described ink absorbing layer.Common coating process for example comprises, the curtain coating that falls, extrusion coated, airblade coating, scraper coating, the coating of Meyer rod etc.
The advantage of technical solution of the present invention is to disperse easily in the modifying process, various composition consumptions only need be considered the ratio with silicon-dioxide, need not to consider two kinds of proportional relationship of all ingredients of trivalent aluminum compound and amino-organosilanes, the influence of the by product that produces in the time of also needn't worrying the reaction of trivalent aluminum compound and amino-organosilanes.
Testing method:
1. print the color test:
Ambient temperature and humidity: 20 ℃, 30%RH uses HP 8250 color inkjet printers to print the 100%CMYK color lump, with test density behind the printed color lump placement 1Hr, contrast color reducing property.Testing tool: EYE-ONE DESIGN.
Machine Type: the original-pack China ink of HP8238 ink type: HP (6 look)
Printing model: superelevation level photo papers print quality: the best
Color mode: color
2. coating apparent mass:
Range estimation or the apparent quality of observation by light microscope coating, particularly ink absorbing layer cracking situation.Use 60 ° of input angle vancometers to measure the specimen page surface gloss.
Embodiment
Embodiment 1:
Under the room temperature, the 36g polymeric aluminum chlorides solution is joined in the 356g deionized water, add the 90g fumed silica then, the high speed shear T25 of company (German IKA) 1 hour (the dispersion impeller linear velocity is greater than 25 meter per seconds), obtain the silicon-dioxide pre-dispersed liquid, slowly add amino-organosilanes liquid again, shear 2Hr and finish modification.Described dispersion has the character shown in the table 1.
Table 1
| Character | Value |
| pH | 5.54 |
| SiO 2Content % | 18 |
| Viscosity mPas | 21 |
| Average particle size particle size nm | 208 |
Embodiment 2
Dispersion and method of modifying are described with embodiment 1, and dispersion has the character shown in the table 2.
Table 2
| Character | Value |
| pH | 5.71 |
| SiO 2Content % | 16 |
| Viscosity mPas | 33 |
| Average particle size particle size nm | 210 |
Embodiment 3
Under the room temperature, 0.9g anhydrous acetic acid aluminium is joined in the 496g deionized water, add 90g fumed silica (M5) then, the high speed shear T25 of company (German IKA) 1 hour (the dispersion impeller linear velocity is greater than 25 meter per seconds), obtain the silicon-dioxide pre-dispersed liquid, add 3-aminopropyltriethoxywerene werene (30% ethanolic soln) then rapidly, shear and finished modification in 2 hours.Described dispersion has the character shown in the table 3.
Table 3
| Character | Value |
| pH | 6.02 |
| SiO 2Content % | 15 |
| Viscosity mPas | 16 |
| Average particle size particle size nm | 232 |
Embodiment 4
Dispersion and method of modifying are with embodiment 1, and described dispersion has the character shown in the table 4.
Table 4
| Character | Value |
| pH | 4.99 |
| SiO 2Content % | 20 |
| Viscosity mPas | 16 |
| Average particle size particle size nm | 182 |
Embodiment 5
Under the room temperature 4.5g Aluminum chloride anhydrous is joined in the 364g deionized water that contains 5g nitric acid (1 mol), add 90g fumed silica (M5) again, the high speed shear T25 of company (German IKA) 1 hour (the dispersion impeller linear velocity is greater than 25 meter per seconds), obtain the silicon-dioxide pre-dispersed liquid, add 3-aminopropyltriethoxywerene werene (30% ethanolic soln) then rapidly, shear and finished modification in 2 hours.Described dispersion has the character shown in the table 5.
Table 5
| Character | Value |
| pH | 4.12 |
| SiO 2Content % | 20 |
| Viscosity mPas | 18 |
| Average particle size particle size nm | 164 |
Embodiment 6
Room temperature is mixed ethanol, polymerize aluminum chloride and hydrochloric acid with deionized water, shear and add 90g fumed silica (M5) down, the high speed shear T25 of company (German IKA) 1 hour (the dispersion impeller linear velocity is greater than 25 meter per seconds), obtain the silicon-dioxide pre-dispersed liquid, slowly add N-ethyl-ammonia isobutyl-Trimethoxy silane then, shear and finished modification in 2 hours.Described dispersion has the character shown in the table 6.
Table 6
| Character | Value |
| pH | 3.23 |
| SiO 2Content % | 18 |
| Viscosity mPas | 20 |
| Average particle size particle size nm | 177 |
Embodiment 7
Room temperature is mixed ethanol, polymerize aluminum chloride and hydrochloric acid with deionized water, shear and add 90g fumed silica (M5) down, the high speed shear T25 of company (German IKA) 1 hour (the dispersion impeller linear velocity is greater than 25 meter per seconds), obtain the silicon-dioxide pre-dispersed liquid, add N-ethyl-ammonia isobutyl-Trimethoxy silane then rapidly, shear and finished modification in 2 hours.Described dispersion has the character shown in the table 7.
Table 7
| Character | Value |
| pH | 3.55 |
| SiO 2Content % | 19 |
| Viscosity mPas | 24 |
| Average particle size particle size nm | 179 |
Embodiment 8
Except that the 3-aminopropyltriethoxywerene werene replaces with 3-piperazinyl propyl group methyldiethoxysilane, other fully with embodiment 1 the same operation.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 9
Except that the 3-aminopropyltriethoxywerene werene replaces with N-(2-amino-ethyl)-3-TSL 8330, other fully with embodiment 1 the same operation.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 10
Except that the 3-aminopropyltriethoxywerene werene replaces with N-(2-amino-ethyl)-3-aminopropyltriethoxywerene werene, other fully with embodiment 1 the same operation.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 11
Except that the 3-aminopropyltriethoxywerene werene replaces with N-(2-amino-ethyl)-3-aminopropyl methyl dimethoxysilane, other fully with embodiment 1 the same operation.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 12
Except that the 3-aminopropyltriethoxywerene werene replaces with N-(2-amino-ethyl)-3-aminopropyl methyldiethoxysilane, other fully with embodiment 1 the same operation.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 13
Except that N-phenyl-γ-An Bingjisanyiyangjiguiwan replaces with γ-divinyl triammonium base propyl trimethoxy silicane, other fully with embodiment 2 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 14
Except that N-phenyl-γ-An Bingjisanyiyangjiguiwan replaces with γ-divinyl triammonium base propyl-triethoxysilicane, other fully with embodiment 2 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 15
Remove outside (N, N-dimethyl-3-aminopropyl) Trimethoxy silane replaces with the 3-TSL 8330, other fully with embodiment 4 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 16
Remove outside (N, N-dimethyl-3-aminopropyl) Trimethoxy silane replaces with N-phenyl-γ-An Bingjisanjiayangjiguiwan, other fully with embodiment 4 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 17
Remove outside (N, N-dimethyl-3-aminopropyl) Trimethoxy silane replaces with (N, N-dimethyl-3-aminopropyl) triethoxyl silane, other fully with embodiment 4 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.
Embodiment 18
Except that the 3-TSL 8330 replaces with 3-piperazinyl propyl group methyl dimethoxysilane, other fully with embodiment 4 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 19
Except that N-ethyl-ammonia isobutyl-Trimethoxy silane replaces with N-ethyl-ammonia isobutyl-triethoxyl silane, other fully with embodiment 6 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 20
Except that N-ethyl-ammonia isobutyl-Trimethoxy silane replaces with N-ethyl-ammonia isobutyl-triethoxyl silane and 1: 1 mixture of 3-aminopropyltriethoxywerene werene, other fully with embodiment 6 the same operations.Guarantee the consistence of dioxide-containing silica by the content of adjusting water.Described dispersion has the character shown in the table 8.
Embodiment 21
Remove M5 Cab-O-
Outside H300 replaces, other fully with embodiment 2 the same operations.Described dispersion has the character shown in the table 8.
Embodiment 22
Remove M5 Cab-O-
Outside LM150 replaces, other fully with embodiment 2 the same operations.Described dispersion has the character shown in the table 8.
Table 8
Comparative example 1
Under the room temperature 3.96g Wickenol CPS 325 is dissolved in the 353g deionized water, and under vigorous stirring, adds 3.96g N-(2-amino-ethyl)-3-TSL 8330.15 minutes reaction times (forming reaction product) by Wickenol CPS 325 and amino-organosilanes afterwards, under the vigorous stirring of high shear rate, short run ground adds 90g fumed silica (Cab-O-
-5, can be available from Cabot Corporation, Billerica, USA).Then, use the rotor-stator agitator that dispersion was stirred 2 hours.Described dispersion has the character shown in the table 9.
Table 9
| Character | Value |
| pH | 4.82 |
| SiO 2Content % | 20 |
| Viscosity mPas | 48 |
| Average particle size particle size nm | 281 |
Comparative example 2
Under the room temperature, under the vigorous stirring of high shear rate with 90g fumed silica (Cab-O-
-5, can be available from Cabot Corporation, Billerica, USA) join to short run in the 357g water, the high speed shear T25 of company (German IKA) 1 hour (the dispersion impeller linear velocity is greater than 25 meter per seconds), obtain the silicon-dioxide pre-dispersed liquid, add the 3-aminopropyltriethoxywerene werene then rapidly, use the rotor-stator agitator that dispersion was stirred 2 hours.Result's described dispersion generation gel and can't form liquid.
Comparative example 3
Described dispersion has the character shown in the table 10.
Table 10
| Character | Value |
| pH | 6.52 |
| SiO 2Content % | 18.8 |
| Viscosity mPas | 354 |
| Average particle size particle size nm | 193 |
Coating fluid 1
Under 45 ℃ temperature, dispersion 500g among the embodiment 1 adds linking agent borax 7.5g, stirring and dissolving, add polyvinyl alcohol solution (10% aqueous solution again, PVA240, Japanese Kuraray company) 225g mixes, and adds tensio-active agent L7604 (trade(brand)name again, make by Ke Nika company) 1.46g, stir.At last, use deionized water that coating solution is diluted to the final weight of 750g, make coating fluid 1, coating fluid is at 45 ℃ of insulations down, static froth breaking.
Line rod coating machine, under 45 ℃ temperature, with this coating fluid with 140g/m
2Be applied on the RC paper substrate.Then, with coated carrier under 65 ℃ temperature dry 60 minutes.1m
2The coating carrier comprise the fumed silica of 16.8g dry weight.
Formed ink absorbing layer glossiness 28 (60 ° of input angles), surface do not have the cracking zero defect.HP 8250 six color ink jet printer prints, blotting speed is fast, and color rendition colour density value sees Table 11.
Coating fluid 2
Under 45 ℃ temperature, dispersion 450.92g in the comparative example 1 adds linking agent borax 3.6g, stirring and dissolving, add polyvinyl alcohol solution (10% aqueous solution again, PVA 240, Japanese Kuraray company) 225g mixes, and adds tensio-active agent L7604 (trade(brand)name again, make by Ke Nika company) 1.46g, stir.At last, use deionized water that coating solution is diluted to the final weight of 750g, make coating fluid 2, coating fluid is at 45 ℃ of insulations down, static froth breaking.
Line rod coating machine, under 45 ℃ temperature, with this coating fluid with 140g/m
2Be applied on the RC paper substrate.Then, with coated carrier under 65 ℃ temperature dry 60 minutes.1m
2The coating carrier comprise the fumed silica of 16.8g dry weight.
Formed ink absorbing layer glossiness 25 (60 ° of input angles), surface have a large amount of little glue points, a small amount of crackle.HP 8250 six color ink jet printer prints, blotting speed is fast, and color rendition colour density value sees Table 11.
Coating fluid 3
Under 45 ℃ temperature, dispersion 478.5g in the comparative example 3 adds linking agent borax 7.5g, stirring and dissolving, add polyvinyl alcohol solution (10% aqueous solution again, PVA 240, Japanese Kuraray company) 225g mixes, and adds tensio-active agent L7604 (trade(brand)name again, make by Ke Nika company) 1.46g, stir.At last, use deionized water that coating solution is diluted to the final weight of 750g, make coating fluid 3, coating fluid is at 45 ℃ of insulations down, static froth breaking.
Line rod coating machine, under 45 ℃ temperature, with this coating fluid with 140g/m
2Be applied on the RC paper substrate.Then, with coated carrier under 65 ℃ temperature dry 60 minutes.1m
2The coating carrier comprise the fumed silica of 16.8g dry weight.
Formed ink absorbing layer glossiness 16 (60 ° of input angles), there is severe crack on the surface.HP 8250 six color ink jet printer prints, blotting speed is fast, and color rendition colour density value sees Table 11.
Table 11
| C | M | Y | K | |
| Coating fluid 1 | 1.00 | 1.60 | 1.59 | 1.35 |
| Coating fluid 2 | 1.01 | 1.52 | 1.59 | 1.24 |
| Coating fluid 3 | 0.98 | 1.55 | 1.58 | 1.28 |
From above result, the coating fluid splitting resistance of the dispersion gained of employing the present invention preparation is good, ink absorbing layer colour density value height, and color reducibility is good.The dispersion preparation method of comparative example 1 with amino-organosilanes and trivalent aluminium salt reaction, disperses modification with reaction product with silicon-dioxide earlier, and the coating fluid splitting resistance of dispersions obtained preparation is poor, and the ink absorbing layer colour density is lower than preparation method of the present invention.Comparative example 3 causes coating that serious cracking takes place because the amino-organosilanes add-on is excessive, may be too high relevant with dispersion and coating fluid viscosity.
Claims (10)
1. the preparation method of a cationization silica dispersion is characterized in that: silicon-dioxide is scattered in the solution with trivalent aluminum compound earlier, forms predispersion, adopts at least a amino-organosilanes to add dispersion then and carries out surface modification.
2. the preparation method of cationization silica dispersion according to claim 1 is characterized in that: described trivalent aluminum compound is the mixture of one or more arbitrary proportions of aluminum chloride, aluminum nitrate, aluminum acetate, al formate, Wickenol CPS 325, nitric hydrate aluminium, polymerize aluminum chloride or polymerization aluminum nitrate.
3. the preparation method of cationization silica dispersion according to claim 1 is characterized in that: described amino-organosilanes has the formula of following formula (1):
R wherein
1, R
2, R
3The alkyl that contains 1 to 6 carbon atom of representing hydrogen, hydroxyl independently, do not replace or replacing, the aryl that does not replace or replace, the alkoxyl group that contains 1 to 6 carbon atom that does not replace or replace or the aryloxy that does not replace or replace, condition is R
1, R
2, R
3At least contain an alkoxy base that contains 1 to 6 carbon atom that does not replace or replace; R
4Expression contains one primary, the second month in a season or the amino substituent organic moiety of uncle at least.
4. the preparation method of cationization silica dispersion according to claim 1, it is characterized in that: described amino-organosilanes is selected from the 3-TSL 8330, the 3-aminopropyltriethoxywerene werene, N-phenyl-γ-An Bingjisanjiayangjiguiwan, N-phenyl-γ-An Bingjisanyiyangjiguiwan, (N, N-dimethyl-3-aminopropyl) Trimethoxy silane, (N, N-dimethyl-3-aminopropyl) triethoxyl silane, N-ethyl-ammonia isobutyl-Trimethoxy silane, N-ethyl-ammonia isobutyl-triethoxyl silane, 3-piperazinyl propyl group methyl dimethoxysilane, 3-piperazinyl propyl group methyldiethoxysilane, N-(2-amino-ethyl)-3-TSL 8330, N-(2-amino-ethyl)-3-aminopropyltriethoxywerene werene, N-(2-amino-ethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-amino-ethyl)-3-aminopropyl methyldiethoxysilane, the mixture of one or more arbitrary proportions of γ-divinyl triammonium base propyl trimethoxy silicane or γ-divinyl triammonium base propyl-triethoxysilicane.
5. the preparation method of cationization silica dispersion according to claim 1 is characterized in that: the amount of described trivalent aluminum compound is 1 to 10 weight % with respect to the amount of silicon-dioxide.
6. the preparation method of cationization silica dispersion according to claim 1 is characterized in that: the amount of described amino-organosilanes is 5 to 20 weight % with respect to the amount of silicon-dioxide.
7. the preparation method of cationization silica dispersion according to claim 1 is characterized in that: described silicon-dioxide is fumed silica.
8. the preparation method of cationization silica dispersion according to claim 7 is characterized in that: the primary particle diameter of described fumed silica is 1-100nm.
9. the preparation method of cationization silica dispersion according to claim 7 is characterized in that: the aggregate particle size of described fumed silica is between the 100-500nm.
10. the preparation method of cationization silica dispersion according to claim 7 is characterized in that: the specific surface area BET of described fumed silica is 90-400m
2Between/the g.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102586283A CN101942230A (en) | 2010-08-20 | 2010-08-20 | Preparation method of cationized silicon dioxide dispersion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102586283A CN101942230A (en) | 2010-08-20 | 2010-08-20 | Preparation method of cationized silicon dioxide dispersion |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101942230A true CN101942230A (en) | 2011-01-12 |
Family
ID=43434442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102586283A Pending CN101942230A (en) | 2010-08-20 | 2010-08-20 | Preparation method of cationized silicon dioxide dispersion |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101942230A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102816458A (en) * | 2012-09-17 | 2012-12-12 | 张家港楚人新材料科技有限公司 | Nano silicon dioxide dispersion and preparation method thereof |
| CN103897520A (en) * | 2012-12-27 | 2014-07-02 | 青岛佳艺影像新材料技术有限公司 | Method for preparing coating liquid for preventing fracture of ink absorption layer |
| CN103897517A (en) * | 2012-12-27 | 2014-07-02 | 青岛佳艺影像新材料技术有限公司 | Preparation method of front-spraying backlit inkjet film coating liquid |
| CN103897519A (en) * | 2012-12-27 | 2014-07-02 | 青岛佳艺影像新材料技术有限公司 | Method for preparing coating liquid for preventing fracture of ink absorption layer from metal chloride |
| CN104066886A (en) * | 2012-02-10 | 2014-09-24 | 惠普发展公司，有限责任合伙企业 | Composition and method for treating media |
| CN104745145A (en) * | 2013-12-26 | 2015-07-01 | 安集微电子（上海）有限公司 | Preparation method and use of modified silica particles |
| CN106986348A (en) * | 2017-05-04 | 2017-07-28 | 无锡恒诚硅业有限公司 | A kind of white carbon of low hydroxy radical content and preparation method thereof |
| CN109071238A (en) * | 2016-03-30 | 2018-12-21 | 福吉米株式会社 | The manufacturing method of cation-modified silica and cation-modified silica dispersion |
| TWI784987B (en) * | 2016-11-22 | 2022-12-01 | 德商巴斯夫塗料有限責任公司 | Optical coating having a low refractive index, process for manufacturing the same, and use thereof |
| CN116396650A (en) * | 2023-02-21 | 2023-07-07 | 吉安天晟新材料有限公司 | Ink-absorbing coating |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277476B1 (en) * | 1998-07-31 | 2001-08-21 | Eastman Kodak Company | Matched ink/receiver set containing colloidal inorganic particles |
| US6773771B1 (en) * | 1999-04-27 | 2004-08-10 | Mitsubishi Paper Mills Limited | Ink-jet recording sheet |
| EP1559750A2 (en) * | 2004-01-30 | 2005-08-03 | Hewlett-Packard Development Company, L.P. | Surface modification of silica in an aqueous environment |
| US20050266180A1 (en) * | 2004-05-26 | 2005-12-01 | Yubai Bi | Ink-jet recording medium for dye-or pigment-based ink-jet inks |
| JP2006001028A (en) * | 2004-06-15 | 2006-01-05 | Oji Paper Co Ltd | Inkjet recording body |
| US20060083870A1 (en) * | 2004-10-20 | 2006-04-20 | Tienteh Chen | Ink-jet media coatings including expoxy-functionalized inorganic particulates and amine-functionalized inorganic particulates |
| US20060246239A1 (en) * | 2005-04-29 | 2006-11-02 | Tienteh Chen | Porous inkjet recording material |
| CN101035868A (en) * | 2004-10-13 | 2007-09-12 | 依福德成像瑞士有限公司 | Recording sheet for ink jet printing |
| US20080182045A1 (en) * | 2007-01-30 | 2008-07-31 | Silke Courtenay | Inkjet recording media |
| WO2009094023A1 (en) * | 2008-01-23 | 2009-07-30 | Hewlett-Packard Development Company, L.P. | Dual treated silica, methods of making dual treated silica, and inkjet recording materials |
| WO2009096922A1 (en) * | 2008-01-31 | 2009-08-06 | Hewlett-Packard Development Company, L.P. | High quality porous ink-jet media |
| JP2009209025A (en) * | 2008-03-06 | 2009-09-17 | Oji Paper Co Ltd | Composite fine particle, method for producing the same and inkjet recording body using the same |
| CN101687422A (en) * | 2007-04-30 | 2010-03-31 | 惠普发展公司，有限责任合伙企业 | Multi-layered porous ink-jet recording media |
-
2010
- 2010-08-20 CN CN2010102586283A patent/CN101942230A/en active Pending
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277476B1 (en) * | 1998-07-31 | 2001-08-21 | Eastman Kodak Company | Matched ink/receiver set containing colloidal inorganic particles |
| US6773771B1 (en) * | 1999-04-27 | 2004-08-10 | Mitsubishi Paper Mills Limited | Ink-jet recording sheet |
| EP1559750A2 (en) * | 2004-01-30 | 2005-08-03 | Hewlett-Packard Development Company, L.P. | Surface modification of silica in an aqueous environment |
| US20050266180A1 (en) * | 2004-05-26 | 2005-12-01 | Yubai Bi | Ink-jet recording medium for dye-or pigment-based ink-jet inks |
| JP2006001028A (en) * | 2004-06-15 | 2006-01-05 | Oji Paper Co Ltd | Inkjet recording body |
| CN101035868A (en) * | 2004-10-13 | 2007-09-12 | 依福德成像瑞士有限公司 | Recording sheet for ink jet printing |
| US20060083870A1 (en) * | 2004-10-20 | 2006-04-20 | Tienteh Chen | Ink-jet media coatings including expoxy-functionalized inorganic particulates and amine-functionalized inorganic particulates |
| US20060246239A1 (en) * | 2005-04-29 | 2006-11-02 | Tienteh Chen | Porous inkjet recording material |
| US20080182045A1 (en) * | 2007-01-30 | 2008-07-31 | Silke Courtenay | Inkjet recording media |
| CN101687422A (en) * | 2007-04-30 | 2010-03-31 | 惠普发展公司，有限责任合伙企业 | Multi-layered porous ink-jet recording media |
| WO2009094023A1 (en) * | 2008-01-23 | 2009-07-30 | Hewlett-Packard Development Company, L.P. | Dual treated silica, methods of making dual treated silica, and inkjet recording materials |
| WO2009096922A1 (en) * | 2008-01-31 | 2009-08-06 | Hewlett-Packard Development Company, L.P. | High quality porous ink-jet media |
| JP2009209025A (en) * | 2008-03-06 | 2009-09-17 | Oji Paper Co Ltd | Composite fine particle, method for producing the same and inkjet recording body using the same |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104066886A (en) * | 2012-02-10 | 2014-09-24 | 惠普发展公司，有限责任合伙企业 | Composition and method for treating media |
| CN104066886B (en) * | 2012-02-10 | 2016-12-07 | 惠普发展公司，有限责任合伙企业 | For processing compositions and the method for medium |
| US9732472B2 (en) | 2012-02-10 | 2017-08-15 | Hewlett-Packard Development Company, L.P. | Composition and method for treating media |
| CN102816458A (en) * | 2012-09-17 | 2012-12-12 | 张家港楚人新材料科技有限公司 | Nano silicon dioxide dispersion and preparation method thereof |
| CN103897520A (en) * | 2012-12-27 | 2014-07-02 | 青岛佳艺影像新材料技术有限公司 | Method for preparing coating liquid for preventing fracture of ink absorption layer |
| CN103897517A (en) * | 2012-12-27 | 2014-07-02 | 青岛佳艺影像新材料技术有限公司 | Preparation method of front-spraying backlit inkjet film coating liquid |
| CN103897519A (en) * | 2012-12-27 | 2014-07-02 | 青岛佳艺影像新材料技术有限公司 | Method for preparing coating liquid for preventing fracture of ink absorption layer from metal chloride |
| CN104745145A (en) * | 2013-12-26 | 2015-07-01 | 安集微电子（上海）有限公司 | Preparation method and use of modified silica particles |
| CN109071238A (en) * | 2016-03-30 | 2018-12-21 | 福吉米株式会社 | The manufacturing method of cation-modified silica and cation-modified silica dispersion |
| TWI784987B (en) * | 2016-11-22 | 2022-12-01 | 德商巴斯夫塗料有限責任公司 | Optical coating having a low refractive index, process for manufacturing the same, and use thereof |
| CN106986348A (en) * | 2017-05-04 | 2017-07-28 | 无锡恒诚硅业有限公司 | A kind of white carbon of low hydroxy radical content and preparation method thereof |
| CN116396650A (en) * | 2023-02-21 | 2023-07-07 | 吉安天晟新材料有限公司 | Ink-absorbing coating |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101942230A (en) | Preparation method of cationized silicon dioxide dispersion | |
| TW354804B (en) | ||
| JP2010501651A (en) | Aluminum oxide dispersion, coating composition and ink absorbing medium | |
| TWI321581B (en) | Coating composition comprising colloidal silica and glossy ink jet recording sheets prepared therefrom | |
| JP2003238826A (en) | Stable water-based dispersion containing particle of silicon dioxide/mixed oxide including aluminum oxide and titanium oxide obtained by flame hydrolysis, manufacturing method thereof, brushing paint to form ink absorbent layer, manufacturing method thereof, ink absorbent medium, and manufacturing method thereof | |
| JP2001512776A (en) | Modified carbon products for inks and coatings with free radicals | |
| KR20010074689A (en) | Formulation suitable for ink receptive coatings | |
| JP2003342515A (en) | Dispersion, coating and recording medium | |
| CN102958619B (en) | Methods for producing dispersion containing silicon dioxide particles and cationization agent | |
| JP2015000954A (en) | Inkjet ink | |
| JP4631016B2 (en) | Surface-treated cured amino resin particles and method for producing the same | |
| CN103897537B (en) | Delustring Weak solvent phase paper coating composition | |
| JP4136196B2 (en) | Recording medium, image forming method using the recording medium, and manufacturing method of the recording medium | |
| JPH11321086A (en) | Ink jet recording medium | |
| CN101544142A (en) | An alumina ink-jet coating and a manufacturing method thereof | |
| JP2001207104A (en) | Water-based pigment dispersion and water-based recording liquid | |
| WO2008041342A1 (en) | Recording sheet for ink jet printing | |
| JP6140854B2 (en) | Inkjet ink | |
| JP2005255457A (en) | Silica minute particle dispersion and its manufacturing method | |
| JP3898495B2 (en) | Ink-receiving layer forming coating liquid and recording sheet with ink-receiving layer | |
| JP2023067432A (en) | Ink composition for offset printing, and metal printed matter | |
| JP4279228B2 (en) | Method for producing coating liquid for ink jet recording paper | |
| JP2002144715A (en) | Ink jet recording medium and coating liquid | |
| US8686067B2 (en) | Method of making a dispersion of polymer binder-encapsulated silica pigments and coated media including such dispersion | |
| JP2002144703A (en) | Ink jet recording medium and coating liquid |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110112 |