CN1019419B - Method and apparatus for producing holographic grating - Google Patents
Method and apparatus for producing holographic gratingInfo
- Publication number
- CN1019419B CN1019419B CN 87100754 CN87100754A CN1019419B CN 1019419 B CN1019419 B CN 1019419B CN 87100754 CN87100754 CN 87100754 CN 87100754 A CN87100754 A CN 87100754A CN 1019419 B CN1019419 B CN 1019419B
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- Prior art keywords
- grating
- light beam
- substrate
- plane
- microgroove
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Abstract
A holographic method is used for manufacturing a fine thread pattern for a diffraction grating, and light beams are recorded by one or two beams of astigmatic coherence to obtain unique fine thread patterns so as to replace a method that only concurrent light beams are used. The astigmatism of recorded light used during manufacturing a holographic grating can bring more parameters which can be used during designing the fine thread patterns. Therefore, a non-hyperbolic new track can be formed on a grating substrate, and thereby, astigmation which is usually difficult to eliminate can be eliminated in various optical instruments.
Description
The present invention relates to holographic grating, it is commonly defined as the diffraction grating with the microgroove figure that produces by holography or by recording interference fringe, the above-mentioned interference striped is that two bundle coherent light beams on the photochromics that overlays on the grating substrate form, and the invention still further relates to the optical instrument that above-mentioned holographic grating is installed.
Since the development holographic grating, many improving one's methods proposed for the formation of microgroove figure.In the spectrometer art of using concave grating, the aberration of some fabulous figures to avoid being caused by concave grating proposed.Yet the technology of common manufacturing microgroove figure is based on uses two bundle spheres to propagate on the concurrent light beam.It must cause forming the cross track with hyperboloid of revolution on the grating substrate, because the aberration of vertical direction, higher order aberrations is not further compensated, because should directly eliminate primary aberration as spherical or intelligent shape based on the conventional art on the hyperbolic figure.
Consider plane grating with equidistant parallel lines.It does not have the aberration of self, but in being used in spectrometer, wherein collimating instrument and stadimeter and mostly be concave mirror greatly, and these concave mirrors that are fixed on from Spindle Status can cause aberration.In order to overcome system's aberration, begin to use the holograph of microgroove figure with non-rectilinear and/or non-equidistance.Yet, use the conventional art of concurrent sphere light beam can not eliminate above-mentioned aberration effectively.
As previously mentioned, formed in the process of microgroove figure on the grating substrate by holograph, using the spherical divergence light beam, it does not have astigmatism when party.On the contrary, the present invention proposes, in said process, and at least one intrafascicular at the two bundle coherent lights that are used for recording geometry, use the astigmatism coherent light beam, it is by having two different focuses in grating center and the plane that light beam chief ray path is determined with in the plane perpendicular to above-mentioned plane.By by convex mirror, lens, the optical system of compositions such as diffraction light can produce astigmatic pencil, for example, obtains this astigmatic pencil by the mirror reflects concurrent sphere light beam that the concave surface of being determined by rotation ellipsoid is arranged at it.
In other words, the characteristic of holographic grating of the present invention is to have a microgroove figure that the boundary stripeds by two light beams (being designated as recording light later on) that can interfere mutually of bundle form, the astigmatic pencil that wherein arbitrary bundle or two beam recordings only have two different focuses in the vertical and horizontal plane on the direction of key light footpath.
Among the present invention defined astigmatic pencil with reference to the accompanying drawings A be further explained, the equi-angularly sphere light beam (concurrent light beam) that pointolite (1a) emission is determined by main beam among its figure A (2a), after concave mirror (3a) reflection, Beam Transformation becomes astigmatic pencil, and its sagittal ray (4a) focuses on the sagitta of arc (vertical) focus and (is designated as
), and focusing on meridian (level) accumulation, meridional ray (5a) (is designated as
), wherein these two focuses go up separation in the key light path (6a) of reflection or do not overlap mutually.
Select which kind of astigmatic pencil to be used among the one or two beam recording light, further determining to introduce in vertical and horizontal plane great difference of focus is to select according to the required limiting behaviour of the target grating that will manufacture in the design.Yet the characteristic that each embodiment of the present invention had is, because use the astigmatism recording light, the technical parameter in design microgroove figure has enriched and increased the ability selected to overcome the degree of the aberration that is not compensated.
That is to say that the concurrent with equi-angularly sphere wavefront determines that by two parameters promptly, distance from point source to the grating substrate and pointolite are to the incident angle of grating substrate earlier.By contrast, astigmatic pencil has the twin shaft focussing property for level (son is done) with vertical (sagitta of arc) direction, can be suitable for the aberration on the vertical direction in the compensate for optical instrument.In fact, astigmatic pencil obtains by the spherical mirror off axis reflector, and according to pointolite to catoptron apart from the distance of catoptron to the grating substrate, pointolite is to the incident angle of catoptron, pointolite is determined to the parameters such as curvature of the incident angle of grating substrate and catoptron.Utilize these parameters that increase newly can the remaining aberration of compensate for optical instrument high-order.
The base invention will be illustrated with reference to the accompanying drawings, and further object of the present invention and its advantage will clearly embody in the explanation of back.
In the accompanying drawings:
Fig. 1 has shown how to produce astigmatic pencil in the present invention.Fig. 1 has shown and has been used to write down the traditional planimetric map of microgroove figure on the grating substrate.
Fig. 2 has shown the planimetric map that is used for the of the present invention system of microgroove graphic recording on the grating substrate.
Fig. 3 has shown the planimetric map that is used for another the invention system of microgroove graphic recording on the grating substrate.
Fig. 4 has described the optical channel in the spectrometer, has shown the arrangement of the position of the effective track that comprises grating, incident light and spectrum.
Fig. 5 has described the result of use grating of the present invention with the elimination aberration of comparing of traditional raster.
Fig. 6 has shown the planimetric map of the spectrometer that grating of the present invention is installed.
Fig. 7 has shown the planimetric map that is used for the system of the another invention of record microgroove figure on the grating substrate.
Fig. 8 has shown the planimetric map that is used for the system of another invention of record microgroove figure on the grating substrate.
Fig. 9 and Figure 10 have shown the planimetric map of the spectrometer of the grating that invention is housed.
Figure 11 has shown the planimetric map that is used for the system of another invention of record microgroove figure on the grating substrate.
Figure 12 has described about the grating of invention and other result of traditional grating elimination aberration contrast test.
Figure 13 has shown the planimetric map that is used for the system of another invention of record microgroove figure on the grating substrate.
Figure 14 has shown the planimetric map of the spectrometer of the grating that invention is installed.
For the purpose of convenient the description, with these figure groupings.Particularly, Fig. 1,2,3,4 and 5 is first group, and Fig. 6 and 7 is second group, and Fig. 8,9,10,11 and 12 is the 3rd group, and Figure 13 and Figure 14 are the 4th group.
Be noted that all figure are synoptic diagram but not scale map, but these figure are used for contrasting and explain that the relevant technology of invention is of great use, and showed the enforcement of concrete scheme, yet it is limitation of the present invention that accompanying drawing should not be construed to.
Fig. 1 shows is to produce the process of grating or write down the system of microgroove figure with traditional technology on spheric grating with traditional technology, and wherein 1 is the substrate of waiting to make diffraction grating that is covered with photochromics, the 2, the 3rd, launch the point source of spherical wave coherent laser.As previously mentioned, this sphere light beam has write down on substrate by two hyperboloids and has intersected the border striped that forms.
Used optical maser wavelength is 441.6 millimicrons (nm), and other parameter is:
rc＝0.9896，γ＝-4.764°
rd＝0.9908，δ＝10.101°
Wherein the radius-of-curvature of spheric grating substrate is a unit length.
Embodiment 2
What Fig. 2 showed is the register system that the present invention produces the microgroove figure, wherein the horizontal trajectory of the normal trajectories of spectral line and spectral line intersects or cuts in they midway (being marked as " m " among Fig. 4), wherein 4 is recessed front cover grating substrates, the 5th, the spherical reflector of radius-of-curvature=0.6132, the 6th, horizontal radius is 0.6132, vertically radius is 0.5852 toroidal reflectors, the 7, the 8th, and the laser spots of emission concurrent light beam.Adopt 441.6 millimicrons laser, other recording parameters is:
P
c=1.5819 q
c=0.5923 τ
c=15.000 ° (degree)
P
D＝1.5831 q
D＝0.5923 τ
D＝15.000°
γ＝-4.764°
Further, wherein h and v represent level and vertical focus by catoptron 5,6 laser light reflected bundles.Focus
With
The initial concurrent light beam that separately shows become astigmatic pencil by reflection in catoptron 5 and 6.Wherein the radius-of-curvature of spheric grating substrate 4 is a unit length.
What Fig. 3 showed is to be used for toroid (toroidal) grating (to note, as a comparison, prior figures 2 be the situation of concave spherical surface grating) register system, this grating has basic level and the normal trajectories that equates as shown in Figure 4, and the horizontal trajectory of the grating that forms in the method for their position and Fig. 2 overlaps.Wherein 12 is the toroid grating substrates with 1.000 horizontal radius and vertical radius of 0.944, the 13rd, and the spherical mirror of radius-of-curvature=1.000,14,15th, its parameter of laser point source tool of launching 441.6 millimeters microballoon face light beams is:
P
c＝1.9854 q
c＝0.9957 τ
c＝5.288°
r
D＝0.9908 γ＝-4.764° δ＝10.134°
Further wherein
With
The level and the vertical focus of the light beam after catoptron 13 reflections sent in expression by lasing light emitter 14.The horizontal curvature radius of toroid grating substrate 12 is unit lengths in the tool.
Fig. 4 is used for the position difference by the difference of concave grating (it is the present invention or common) how of spectrum locus in the display light spectrometer, wherein 21 is entrance slits, the 22nd, sphere to be determined or toroid grating, the 23rd, hologram plane or array detector, they should be positioned can be at 350nm(λ
1) to 750nm(λ
2) wavelength coverage in obtain on the position that the minimum with spectrum locus departs from.Other parameter is:
r＝0.9514， r
6′＝0.9707
r
1′＝1.0035， r
7′＝1.1107
r
2′＝1.0104， r
8′＝1.0979
r
3'=0.9953, α=19.268 ° (degree)
r
4′＝1.0092， β
1＝-7.164°
r
5′＝1.0504， β
2＝6.309°
And the horizontal curvature radius of grating (under toroidal situation for approximate value) is 1.000 to be unit length.
Be noted that at this three dotted lines among Fig. 4 represent level and vertical focusing curve, Fig. 1 wherein, three level curves of 2 and 3 grating overlap mutually.The vertical curve of Fig. 3 also overlaps thereon, and the vertical curve of Fig. 1 and Fig. 2 then separates.
Embodiment 5
This embodiment is used for representing to use grating of the present invention and the traditional comparative result of grating aspect the elimination aberration.
Fig. 5 has shown the experimentize degree of viewed aberration of spectrometer shown in Figure 4 of using, the monochromatic light that wherein has different wave length is introduced by the center of entrance slit, and in the reception of the image plane position of Fig. 4 mark, wherein used grating is that the grating of the different recording system manufacturing shown in Fig. 1 (traditional), Fig. 2 (example 1) and Fig. 3 (example 11) has same curvature radius (=200 millimeters) and equal area (40 * 40 square millimeters).
So, the figure of sequence (a) is corresponding to the result of the grating gained of Fig. 1, sequence (b) is corresponding to the result of Fig. 2, similarly, sequence (c) is corresponding to the result of Fig. 3, and wherein observed result is eliminating the sequence as a result (a) that obviously is being superior to the traditional method of use aspect the vertical aberration in using sequence of the present invention (b) and (c).
In the method for the formation grating that relates in the above, it is to be realized by toroidal mirror or spherical mirror from Spindle Status that the light of concurrent is transformed into the divergent wave that is used to write down, but also can adopt other similar catoptron, resemble the thing face of cylinder, ellipsoidal mirror and toroid, sphere or cylindrical lens, also can adopt one side to be covered with the optical element of metal.
The 2nd group
What Fig. 6 showed is the spectrometer that plane grating of the present invention is housed, wherein 31 is entrance slits, the 32nd, concave mirror, the 33rd, grating of the present invention, the 34th, exit slit, these elements wherein are positioned to have on the position of minimum deflection with horizontal focus in from 300 to 900 millimicrons the wavelength coverage, suppose wherein that further radius-of-curvature=the 1.000(of concave mirror 32 is as unit length), the grating constant of grating 33=1/1200 millimeter, its progression that uses is the first order, and other parameter is:
r＝0.7755 D＝0.6204 r′＝0.7064
Q=10 ° (degree) 2K=20 °
What Fig. 7 showed is the register system of making the plane grating of invention, wherein 44 is plane grating substrates, 40, the 41st, the recording light electron gun, the 42nd, radius is 1.000 spherical mirror, the 42nd, the horizontal curvature radius is that 1.000(is as unit length) vertical radius with it is 0.9388 toroidal mirror.The use wavelength is 441.6 millimicrons a laser, and other special parameter is:
P
c＝1.9724 q
c＝0.9767 τ
c＝5.121°
P
D＝2.0799 q
D＝0.9879 τ
D＝4.956°
γ＝33.438° δ＝1.210°
Further, two pairs
With
Level and vertical focus that the point representative is produced by the catoptron 42,43 with identical function shown in the front.
In this embodiment, two catoptrons the 42, the 43rd, concave surface, but this is not a necessary condition.In addition, it also is acceptable using concave mirror on arbitrary position, and the grating substrate can replace the plane with cylinder.
The 3rd group
This embodiment relates to the Gzerny-Turner(Ze Erni-Tener that produces plane grating of the present invention and use method shown in Figure 8 with reference to method shown in Figure 8) structure optical spectroscopy (Fig. 9).
In the situation of Fig. 8, two by with same laser beam (not shown) separately and focus on the writing light beam 52,53 that obtains and interferes on grating substrate 51, wherein reflects respectively at this two-beam on their travel path to become aspheric surface light on concave mirror 54,55.
In the system of Fig. 9, use following parameter: wavelength is 300 millimicrons to 800 millimicrons, and the grating constant in grating 56 centers is 1/16000 millimeter, and collimating apparatus 58 is assumed to the spherical mirror with unit curvature radius length.
Other parameter relevant with Fig. 8 or manufacturing grating is: the recording laser source wavelength is 441.6 millimicrons, and exposure parameter is:
P
c＝0.9898 P
d＝0.9896
q
c＝0.3915 q
d＝0.3907
τ
c＝14.38° τ
d＝15.64°
γ＝20.688° δ＝20.688°
The radius-of-curvature of catoptron 54,55 (R4, R5) equates, R4=R5=1.000.
Other parameter relevant with Fig. 9 or beam splitting system is:
r＝0.4977，D＝0.4298，D′＝0.4325，
r′＝0.4925，θ＝5.53°，k＝29.12°
θ′＝13.44°
Use progression m=-1, the radius-of-curvature of photograph catoptron 59 (R9) is R9=1.013.So, P
c, q
dEqual or approach the radius-of-curvature of collimating apparatus 58 with the radius-of-curvature of concave mirror 54,55.
This embodiment relates to the Seya-Namika structure optical spectroscopy that uses concave grating of the present invention, and being manufactured among Figure 11 of above-mentioned concave grating shows.Figure 12 has shown employing the present invention and traditional grating aberration estimation.
The concave grating of making in this embodiment and using is that radius-of-curvature is 500 millimeters a sphere, and the pitch at the grating center is 600 lines per millimeters.Figure 10 has shown the beam splitting system that comprises this grating, wherein 66 is entrance slit, 67 is exit slit, by entrance slit 66 to the distance (r) at the center 65 of grating 60 is the r=409.8374 millimeter, by grating center 65 to the distance (r ') of exit slit 67 is r '=410.8190 millimeter, the angle (θ) at relative grating center 65 is θ=69.7083 ° between entrance slit and exit slit, and the wavelength of use is 100 to 700 millimicrons.
Figure 11 has shown the arrangement that is used for record microgroove figure when making grating 60, wherein 61 is the concave spherical surface substrate of radius-of-curvature=500 millimicron, supposition subsequently is positioned at the normal (N) at grating center 0 and the plane by normal N, pointolite 62 is on this plane, by distance r=1999.4 millimeter with become a=4.77 ° of angle to determine with normal N, and on the line of supposition with respect to ° angle, opposite side β=11 of point 62 online N another point is arranged, distance is r '=871.4 millimeter, concave spherical mirror 63 is pacified the center 68 that becomes to make mirror and is positioned on foregoing another aspect, another pointolite 64 is positioned on the line of angle (γ) of normal that angle doubles straight line 0 to 68 and 68 places, catoptron center, with center 68(2 γ=16.4 °) go up and constitute reflection, light source leaves distance P=204.9 millimeter at center 68, and used recording light is that wavelength is 457.93 millimicrons a laser.
Figure 12 be on the basis of calculating with the aberration result relatively of the form record of curve map, they are to have detected by the traditional raster generation shown in the grating of the present invention shown in Figure 12 the first half (not have further to proofread and correct) and Figure 12 the latter half after the difference correction at the optical spectroscopy with Figure 10.
The 4th group
Embodiment 10
This embodiment relates to the Litrrow(Littrow of making plane grating of the present invention and using the grating of method manufacturing shown in Figure 13 with reference to method shown in Figure 13) structure optical spectroscopy (Figure 14).
Among Figure 13,71 is the plane grating substrate, 72 and 73 is recording light source, they are by obtaining carrying out beam split with a branch of laser (not shown), with this two the bundle from source 72, the light beam of 73 spherical diffusion reflects with formation aspheric surface light with concave mirror 74,75, and produces interference fringe on substrate 71.
The parameter that is used for the Litrrow structural system of Figure 14 is: wavelength is 200 millimicrons to 800 millimicrons, and the grating constant that is positioned at the center of grating 76 is 1/1800 millimeter, and accurate value device 78 supposition have the unit curvature radius length.
The special parameter of making grating shown in Figure 13 is: the optical maser wavelength of use is 441.6 millimicrons.
P
c＝0.3986 P
d＝0.3912
q
c＝0.8710 q
d＝0.8708
τ
c＝6.188° τ
d＝13.545°
Two concave mirrors 74,75, radius-of-curvature are respectively R4, R5, R4=R5=1.000.
The parameter of the system of Figure 14 is: r=0.4988, D=0.4078, D '=0.4093, γ '=0.4973, θ=4.290 °, 2k=2.405 °, θ '=5.709 °; Using progression is-1, accurate value device 78 radius of curvature R 8, R8=1.000.Shown in, q
c, q
dEqual or approach the radius-of-curvature of collimating apparatus 78 with the radius-of-curvature of concave mirror 74,75.
In the example of Figure 13, two concave mirrors are used for reflecting respectively the light from light source 72 and 73, but in similar register system, and two concave mirrors are always necessary, only can accept the situation with a catoptron in the present invention.In addition, the grating substrate can replace the plane with cylinder or ball face.
As previously mentioned, those persons skilled in the art can and improve and introduce the present invention under the prerequisite that does not deviate from spirit of the present invention different replacements, and in further example, foregoing spectrometer can be spectrophotometer.But this situation is also included within the scope of the present invention.
Claims (2)
1, on substrate, produces the microgroove figure to make the method for holographic grating, it is characterized in that comprising the following steps:
Two bundle coherent light beams are projected on the described substrate, wherein at least one described light beam is that astigmatic pencil and having from axle is orientated, described astigmatic pencil is in grating center and determined plane, light beam chief ray path and perpendicular in the plane below described two different focal lengths being arranged, and described from axle orientation by along one from the direction of principal axis reflection or reflect described light beam and form, thereby make the interference of described two light beams on described substrate, form described holographic grating.
2, make the complete equipment that has the microgroove figure, comprising from grating:
Be used for first coherent light beam is projected the device of first on the substrate;
It is characterized in that:
Second device is used for second coherent light beam is projected described substrate, thus make described first and the interference of the tenth coherent light beam form described microgroove figure making described holographic grating,
A branch of at least in wherein said first and second coherent light beams is orientated for astigmatic pencil and having from axle.Described astigmatic pencil has two different focal lengths in the plane in grating center and determined plane, light beam chief ray path and perpendicular to described plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 87100754 CN1019419B (en) | 1987-02-20 | 1987-02-20 | Method and apparatus for producing holographic grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 87100754 CN1019419B (en) | 1987-02-20 | 1987-02-20 | Method and apparatus for producing holographic grating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN87100754A CN87100754A (en) | 1988-08-31 |
| CN1019419B true CN1019419B (en) | 1992-12-09 |
Family
ID=4813006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 87100754 Expired CN1019419B (en) | 1987-02-20 | 1987-02-20 | Method and apparatus for producing holographic grating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1019419B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100434945C (en) * | 2006-07-07 | 2008-11-19 | 中国科学院长春光学精密机械与物理研究所 | IV type concave holographic grating production process |
| CN103575230B (en) * | 2012-08-09 | 2017-10-31 | 北京智朗芯光科技有限公司 | Optics no color differnece focusing system |
| DE102012217800A1 (en) * | 2012-09-28 | 2014-04-03 | Carl Zeiss Smt Gmbh | Diffractive optical element and measuring method |
| CN104267505B (en) * | 2014-10-13 | 2017-03-15 | 中国电子科技集团公司第四十一研究所 | A kind of wedge postpones the grating of depolarization and rotates light-dividing device and method |
| CN106482832B (en) * | 2015-08-24 | 2021-05-25 | 台湾超微光学股份有限公司 | Spectrometer, monochromator, diffraction grating, manufacturing method of diffraction grating and manufacturing method of master die |
-
1987
- 1987-02-20 CN CN 87100754 patent/CN1019419B/en not_active Expired
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| Publication number | Publication date |
|---|---|
| CN87100754A (en) | 1988-08-31 |
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