CN101937729A - Method and device for electron beam irradiation processing - Google Patents

Abstract

The invention discloses a method for electron beam irradiation processing, comprising: (a) providing a radiation perspective detection device (300); (b) using the radiation perspective detection device to detect and obtain the quality of an irradiated processing object (10) The detection step of the information of the thickness (dρ); (c) providing the electron beam irradiation processing device (200); and (d) adjusting the energy (E) of the electron beam of the electron beam irradiation processing device by the control device (5), an adjustment step of matching the energy (E) of the electron beam to the mass thickness (dρ) of the irradiated processing object; and (e) a processing step of performing electron beam irradiation processing using the adjusted electron beam irradiation processing device. By adopting the above technical solution, the control device adjusts the corresponding energy of the electron accelerator and/or adjusts the scanning width in real time according to the measurement results of the mass thickness and the length of the object obtained by the radiation perspective detection device, so as to improve the utilization efficiency of the electron beam and Processing effect.

Description

Method and device for electron beam irradiation processing

technical field

The invention relates to the field of radiation processing, especially the field of radiation processing using electron accelerators. More specifically, the present invention relates to a novel method and device for electron beam irradiation processing, which improves the efficiency of electron beam irradiation processing.

Background technique

An electron accelerator is a device used to accelerate charged particles to very high energies by using an electromagnetic field in a vacuum. Its core component is an accelerating tube that accelerates electrons. As a controllable ray source device, the electron accelerator has the advantages of high energy, high power, high efficiency, fast processing speed, and good safety performance in irradiation processing. At present, electron accelerators have been widely used in various fields such as preparation of polymer materials, food storage and preservation, radiation disinfection of medical supplies, radiation sterilization of drugs, radiation maintenance of commodities, radiation coloring of crystals and pearls, and radiation treatment of environmental pollutants.

Existing irradiation processing systems generally include an electron accelerator, an object conveying device, a radiation protection device, and a control device for controlling the operation of the electron accelerator and the object conveying device. Specifically, the electron accelerator is used to generate an electron beam with a certain energy and a certain scanning width; the object conveying device carries the irradiated object through the electron beam radiation area at a certain speed, so that the irradiated object is irradiated by the electron beam to achieve the predetermined processing Purpose: the radiation protection device performs radiation shielding on the electron beam radiation area; and the control device controls the operation of various parts such as the electron accelerator and the item transmission device.

In the existing irradiation processing, the utilization efficiency of the electron beam can be up to nearly 80%, and a considerable part cannot be used. The key reason is that the mass thickness dρ of the irradiated object (the average density ρ of the object along the thickness direction and the thickness dρ The product of ) cannot be optimally matched with the accelerator output energy. For each irradiation processing system, its optimal mass thickness corresponds to the energy of its accelerator, which is a definite number. If the mass thickness dρ of the irradiated object is too large, the electron beam will not be able to penetrate, the irradiation will be uneven, and the irradiation treatment effect will not be achieved; if the mass thickness dρ of the irradiated object is too small, most of the electron beam will pass through Through the irradiated object, the utilization efficiency of the electron beam is not high.

In the prior art, the irradiated objects are usually packaged products with a certain package, and the mass thickness dρ of the items inside the package can only be estimated simply on the average, and there is a lack of accurate measurement methods. As a result, the thickness of the object to be irradiated is usually controlled so that its mass thickness dρ is conservatively smaller than the optimal mass thickness by 10% to 15%, so the utilization efficiency of the electron beam is greatly affected.

In addition, for irradiated objects with a certain package, the mass thickness dρ of the items inside the package can only be estimated simply on average, and there is a lack of accurate measurement means, so that the composition and structure of the tested items cannot be identified. Therefore, it is also impossible to accurately determine whether the inspected item is suitable for complying with electron beam irradiation safety.

In addition, in addition to the mass thickness dρ of the inspected article in the thickness direction, which can only be estimated simply by average, there are also irradiated objects in the length direction of the inspected article, that is, along the conveying direction of the article conveying device The problem that the length of the sensor cannot be optimally matched to the scan width of the accelerator. Similarly, in order to ensure the irradiation processing effect, the scanning width of the accelerator will be larger than the estimated length of the irradiated object, so the utilization efficiency of the electron beam is also greatly affected.

Contents of the invention

In view of this, the purpose of the present invention is to solve at least one aspect of the above-mentioned problems and deficiencies in the prior art.

One of the objects of the present invention is to provide an electron beam irradiation processing method and device with improved efficiency, which obtains information about the mass thickness of the irradiated processing object, and based on the information of the mass thickness, makes the irradiated object The thickness of the mass is optimally matched with the output energy of the accelerator, thereby improving the utilization efficiency of the electron beam.

Another object of the present invention is to provide an electron beam irradiation processing method and device with improved efficiency, which obtains information about the length of the irradiated processing object, and based on the length information, makes the length of the irradiated object and The scan width of the accelerator is optimally matched, thereby improving the utilization efficiency of the electron beam.

According to one aspect of the present invention, it provides a method for electron beam irradiation processing, comprising:

(a) provide radiographic detection devices;

(b) The detection step of obtaining information about the mass thickness (dρ) of the irradiated processed object through detection by means of a radioscopic detection device;

(c) provide electron beam irradiation processing equipment; and

(d) adjusting the energy (E) of the electron beam of the electron beam irradiation processing device by the control device, so that the energy (E) of the electron beam matches the mass thickness (dρ) of the irradiated processing object; and

(e) A processing step of performing electron beam irradiation processing using the adjusted electron beam irradiation processing apparatus.

Further, the detection step (b) also includes the step of obtaining information about the length (L) of the irradiated processing object by using a radioscopic detection device; the adjustment step (d) also includes a step of adjusting the electron beam radiation Irradiate the scanning width (W) of the electron beam of the processing device, so that the scanning width (W) of the electron beam matches the length (L) of the irradiated processing object.

Specifically, in the adjusting step (d), the energy (E) of the electron beam is adjusted so that the energy (E) of the electron beam and the mass thickness (dρ) of the irradiated processing object meet a certain Functional relationship (f), ie E=f(dρ).

More specifically, for an electron beam irradiation processing device with an energy higher than 1 MeV, if the irradiated object is irradiated on one side, the functional relationship (f) is: E=2.63dρ+0.32; if the irradiated object is double-sided For surface irradiation, the functional relationship (f) is: E=1.19dρ+0.32, where the unit of electron beam energy E is MeV, and the unit of item mass thickness dρ is g/cm2.

In a specific embodiment, the energy (E) of the electron beam processed by the electron beam irradiation has a minimum value Emin and a maximum value Emax, if the energy (E) of the electron beam adjusted in the adjusting step (d) ) does not satisfy Emin≤E≤Emax, it further includes the step of giving an alarm through the control device.

In the above-mentioned technical scheme, if the energy (E) of the electron beam to be adjusted is greater than Emax, the control device gives that the mass thickness of the irradiated object is too large, and requires the thickness of the irradiated object to be reduced to an acceptable range. Prompt information.

In the above technical scheme, if the energy (E) of the electron beam that needs to be adjusted is less than Emin, the control device controls the electron beam irradiation processing device to adjust the output electron beam energy to Emin, and gives the requirement that the irradiated object The prompt message for increasing the thickness to the appropriate range.

In a specific implementation manner, the detection step (b) further includes: using a radiation transmission detection device to obtain a perspective image of the irradiated processing object.

According to another aspect of the present invention, it provides an electron beam irradiation processing system, comprising: an electron beam irradiation processing device, which includes an electron accelerator, to provide electron beams to scan an irradiated processing object; a radiation perspective detection device , which includes a radiation source; a detector array; a signal analysis and processing device for obtaining information about the mass thickness and/or length of an irradiated processing object; and a control device for controlling said electron beam irradiation processing device and the operation of the radiation perspective detection device, and adjust the energy and/or scan width of the electron beam of the electron accelerator, so that the energy and/or scan width of the electron beam of the electron accelerator are consistent with the irradiated processing Object mass thickness and/or length match.

Specifically, the above-mentioned electron beam irradiation processing system further includes: a conveying device, which is used to transport the irradiated processing object successively through the radiation perspective detection device and the electron beam irradiation processing device along the first direction, so as to perform radiation perspective detection and electron beam irradiation processing. Beam irradiation processing operations.

In one embodiment, the electron beam irradiation processing device and the radiation perspective detection device are respectively surrounded by radiation protection devices to prevent signal interference between them.

In a specific embodiment, the central beam output direction of the electron beam irradiation processing device and the radiation fluoroscopy detection device extends along a second direction and is substantially parallel, and the second direction is the same as the transmission device transporting the irradiated processing The first direction of the object is substantially vertical.

An unspecified aspect of the above-mentioned technical solutions in the present invention has at least the following advantages and beneficial effects:

The present invention provides an electron beam irradiation processing method and device with improved efficiency, wherein the electron beam irradiation processing system according to the present invention may include an electron accelerator as an electron irradiation processing device, and a low-energy X-ray as a radiation perspective detection device. X-ray device, detector array, signal analysis and processing device, control device, etc., in which the low-energy X-ray device and the electron accelerator can be installed on the same item transmission device successively, and the low-energy X-ray device first performs the mass thickness measurement of the irradiated object. /or the measurement of the length of the item, the control device adjusts the corresponding energy of the electron accelerator and/or adjusts the scanning width in real time according to the measurement results of the relevant mass thickness and the length of the item, so as to improve the utilization efficiency of the electron beam and ensure the irradiation processing effect , thus improving the economic benefits of the irradiation processing system.

Compared with the methods and devices of the prior art, the cost of the method and device of the present invention is not much increased, the thickness and length of the irradiated object are as close as possible to the optimum quality thickness and/or optimum length of the electron accelerator, and the electron beam is improved. The utilization efficiency of the radiation processing system can be improved and the radiation processing effect can be guaranteed, so that the economic benefits of the radiation processing system can be improved.

Further, when the corresponding energy adjustment and real-time adjustment of the scanning width of the electron accelerator according to the measurement results of the mass thickness and the length of the article exceed the limits of the energy adjustment and scanning width of the electron accelerator, the staff can be prompted to correct The stacking method of the irradiated objects is adjusted to achieve the best mass thickness and scanning width, so as to maximize the utilization efficiency of the electron beam and ensure the irradiation processing effect.

In addition, by adopting the electron beam irradiation processing method and device for improving efficiency in the present invention, wherein the radiation device, such as a low-energy X-ray device, is measuring the mass thickness and length, the signal analysis and processing device acquires the detector array Further analysis and processing of the signal can give a perspective image of the irradiated object, so that the staff can identify whether the items in the packing box are consistent with the logo, and then judge whether the items to be irradiated are safe for electron beam irradiation. In addition, the images acquired by the radiation imaging system can also be archived as supplementary information for the processing records of the radiation processing system.

Description of drawings

The electron beam irradiation processing method and device for improving efficiency according to the embodiments of the present invention will be described below with reference to the accompanying drawings, wherein:

Fig. 1 is a schematic cross-sectional view of the structure of an improved electron beam irradiation processing system according to the present invention;

Fig. 2 is a structural schematic diagram showing the radiation imaging detection of the irradiated object by using the radiation device;

Fig. 3 is a schematic diagram showing the structure of processing an irradiated object by using an electron accelerator adjusted according to information obtained by a radiation imaging device; and

Fig. 4 is a schematic diagram showing how to adjust the energy range and scan width of the electron accelerator.

Detailed ways

The technical solutions of the present invention will be further specifically described below through the embodiments and in conjunction with the accompanying drawings. In the specification, the same or similar reference numerals designate the same or similar components. The following description of the embodiments of the present invention with reference to the accompanying drawings is intended to explain the general inventive concept of the present invention, but should not be construed as a limitation of the present invention.

Accompanying drawing 1 has shown a kind of electron beam irradiation processing method and the specific arrangement scheme of device of improving efficiency. Referring to FIG. 1 , an electron beam irradiation processing system 100 according to an embodiment of the present invention includes: an electron beam irradiation processing device 200 including an electron accelerator 1 to provide an electron beam 8 to scan an irradiated processing object 10 Radiation perspective detection device 300, which includes radiation source 2; Detector array 3; Signal analysis and processing device 4, used to obtain information about the mass thickness dp and/or length L of the irradiated processing object 10; and control device 5 , which is used to control the operation of the electron beam irradiation processing device 200 and the radiation perspective detection device 300, and adjust the energy E and/or scan width W of the electron beam of the electron accelerator 1, so that all The energy E and/or scan width W of the electron beam of the electron accelerator 1 is matched with the mass thickness dρ and/or length L of the irradiated processing object.

Further, referring to FIG. 1, the electron beam irradiation processing system 100 also includes: a transport device 6, which is used to transport the irradiated processing object 10 along a predetermined direction, such as the horizontal direction in FIG. 300 and electron beam irradiation processing device 200 to perform radiographic inspection and electron beam irradiation processing operations.

In a specific embodiment of the present invention, the radiation source 2 is a low-energy X-ray radiation source, but the present invention is not limited thereto, for example, it may also be a γ-ray source or an isotope source. Referring to Fig. 1, the low-energy X-ray device 300 and the electron accelerator 1 are successively installed above the same object conveying device 6 according to the conveying direction 11 of the irradiated object 10, for example, the horizontal direction shown in Fig. 1 , and the detector array 3 is installed on the conveying device The position below 6 corresponds to the low-energy X-ray device 300. Specifically, as shown in FIG. 2 , the detector array 3 is composed of a series of small detector units 31 , for example, each detector is connected to the signal analysis and processing device 4 through a signal connection line 32 .

Referring to FIG. 1 , in one embodiment, the electron beam irradiation processing device 200 and the radiation perspective detection device 300 are respectively surrounded by radiation protection devices 7 to prevent signal interference between them. Specifically, as shown in Figure 1, the radiation protection device 7 is installed on the outside of the transmission device 6, the electron accelerator 1, the low-energy X-ray device 300, and the detector array 3, and is used to shield the electron beam 8 radiation and The X-ray 9 generated by the low-energy X-ray device 300 radiates and prevents the electron beam 8 and X-ray generated by the electron accelerator 1 from directly reaching the detector array 3 .

Further, the signal analysis and processing device 4 is installed on the outside of the radiation protection device 7 and is respectively connected to the detector array 3 and the control device 5, and it obtains signals about the attenuation of X-rays transmitted through the detected object 10 from the detector array 3, After analysis and processing, it is sent to the control device 5, and the control device 5 controls the work and operation of the entire electron beam irradiation processing system 100. The central beam output direction of the electron beam irradiation processing device 200 and the radiation perspective detection device 300 generally extends along the vertical direction in FIG. 11 is roughly vertical.

In the prior art, low-energy X-ray fluoroscopic imaging is mainly for the purpose of obtaining the fluoroscopic image of the object. The basic principle is as follows: when the X-ray emitted by the X-ray source penetrates the object to be inspected, the absorption rate of X-ray by different substances is inconsistent, and there is no After the absorbed X-rays are collected by the detector, they will be converted into electrical signals with different strengths. The electrical signals are collected and processed, and can be converted into digital signals to obtain accurate images of the detected items. The present invention utilizes the principle of this technology to output the mass thickness information and width data of the article as the main purpose, and the image information as the auxiliary archiving function. The operation of the low-energy X-ray fluoroscopy detection device 300 according to the embodiment of the present invention will be described below with reference to FIG. 2 .

Referring to FIG. 2 , the low-energy X-ray device 300 generates low-energy X-rays 9 of a certain intensity, and the low-energy X-rays 9 penetrate the irradiated object 10 and reach the detector array 3 . When the low-energy X-ray 9 penetrates the irradiated object 10, its intensity is weakened and attenuated, and the degree of attenuation is related to the mass thickness dρ of the irradiated object 10. The more X-rays are attenuated, the less X-rays that reach the corresponding detector unit 31 in the detector array 3 below the irradiated object 10, and the lower the output signal of the detector; on the contrary, if the quality of the irradiated object 10 The smaller the thickness dρ is, the larger the signal output by the detector 31 is, and the signal output by the detector 31 is the largest in the edge area not shielded by the irradiated object 10 . The signal of each detector 31 of the detector array 3 is sent to the signal analysis and processing device 4, and after analysis and processing, information and data reflecting the fine structure of the irradiated object 10 can be obtained, including the quality of the items above each detector 31 Thickness dρ, width L of the item, etc., further processing can obtain a fine perspective image of the irradiated object.

The operation of the electron beam irradiation processing device 200 according to the specific embodiment of the present invention will be described in detail below with reference to FIG. 3 . Referring to Fig. 3, the electron accelerator 1 is the main equipment of the electron beam irradiation processing device 200, which is used to generate the electron beam 8 for irradiation processing, and the energy E and scanning width W of the output electron beam 8 can usually be adjusted within a certain range, Its work is controlled by the control device 5 . In this embodiment, the control device 5 not only controls the electron beam irradiation processing device 200 , but also controls the operation of the radiation fluoroscopy detection device 300 . As long as the control device 5 can functionally realize the operations of the above two aspects, its specific form, such as the form of single or multiple combined or separate control units, is not limited.

In order to maximize the utilization of the electron beam 8 produced by the electron accelerator 1, usually its energy E forms a certain matching relationship with the mass thickness dρ of the irradiated object 10, so that each depth of the irradiated object 10 is irradiated, And the electron beam will not penetrate a large amount to form waste. If the energy of the electron beam is too high, a large amount of electron beams 8 will penetrate the irradiated object 10, which will cause waste; Uniform irradiation cannot be obtained, and the irradiation processing effect cannot meet the requirements. The energy E of the electron accelerator should match the mass thickness dρ of the irradiated object, but it can usually only be adjusted within a certain range, with the limitation of the maximum adjustable energy Emax and the minimum adjustable energy Emin, that is, the electron accelerator produces Electron beams meet the following requirements:

$\left\{\begin{array}{c}\mathrm{<span\; class="notranslate">\; E.</span>}<span\; class="notranslate">\; =</span>\mathrm{<span\; class="notranslate">\; f</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; d\&rho;</span>}<span\; class="notranslate">\; )</span>\\ \mathrm{<span\; class="notranslate">\; E.</span>}\mathrm{<span\; class="notranslate">\; min</span>}<span\; class="notranslate">\; \&le;</span>\mathrm{<span\; class="notranslate">\; E.</span>}<span\; class="notranslate">\; \&le;</span>\mathrm{<span\; class="notranslate">\; E.</span>}\mathrm{<span\; class="notranslate">\; max</span>}\end{array}\right.$

Where E=f(dρ) represents the functional relationship between the electron beam energy E and the mass thickness dρ of the irradiated object. Specifically, for an electron beam irradiation system with an energy higher than 1MeV, if the irradiated object is irradiated on one side, then:

E=2.63dρ+0.32;

If the irradiated object is irradiated on both sides, then:

E=1.19dρ+0.32;

In the formula, the unit of electron beam energy E is MeV, and the unit of item mass thickness dρ is g/cm2.

In order to obtain the maximum utilization of the electron beam 8 produced by the electron accelerator 1, the scan width W of the electron beam 8 is generally consistent with the actual width L of the irradiated object, so that there will be no radiation due to the too narrow scan width W of the electron beam. In areas that cannot be irradiated, the electron beam 8 will not be wasted because the electron beam scanning width W is too large.

The structure and operation of realizing the automatic adjustment of electron beam energy E and scan width W according to the information of the irradiated object 10 according to the specific embodiment of the present invention will be described below with reference to FIG. 4 . 4, the electron accelerator 1 is composed of an accelerator control device 12, an electron gun power supply 13, an electron gun 14, a pulse power source 15, a microwave power source 16, an accelerating tube 17, a scanning power supply 18, a scanning magnet 19, and a scanning box 20. Its working principle is as follows: the electron gun 14 generates an electron beam 8 under the action of the electron gun power supply 13 and enters the accelerating tube 17 . At the same time, the pulse power generated by the pulse power source 15 drives the microwave power source 16 to generate microwave power, and the microwave power enters the accelerating tube 17, and the electron beam in the accelerating tube 17 is subjected to the microwave power to form a high-energy electron beam 8 and enters the scanning box 20 . The electron beam 8 is scanned in a fan-shaped distribution under the action of the scanning magnet 19 in the scanning box 20 and finally drawn out.

The information about the mass thickness dρ of the irradiated processing object 10 is obtained through detection by the radiation perspective detection device 300. When the energy of the electron beam 8 needs to be adjusted, the control device 5 sends an energy adjustment instruction to the accelerator control device 12, The accelerator control device 12 controls the output power of the pulse power source 15 . When the pulse power changes, the microwave power also changes accordingly. In the accelerating tube 17, due to the change of the microwave power, the effect of the microwave power on the electron beam 8 also changes, and finally the energy E of the electron beam changes. .

Information about the length L of the irradiated processing object 10 is obtained through detection by the radiation perspective detection device 300. When the scanning width W of the electron beam 8 needs to be adjusted, the control device 5 sends a scanning width adjustment command to the accelerator control device 12 , the accelerator control device 12 controls the scanning power supply 18, and the output current of the scanning power supply 18 is supplied to the scanning magnet (not shown in the figure). When the output current of the scanning power supply 18 changes, the scanning magnetic field generated by the scanning magnet also changes accordingly, thereby adjusting the scanning width W of the electron beam. Usually, the scanning width W is proportional to the output current of the scanning power supply 18 .

Furthermore, the article conveying device 6 mainly carries the irradiated object 10 through the transmission detection area and the irradiation processing area at a certain speed, and its operation is controlled by the control device 5. The control device 5 according to the type of the irradiated object 10 and the Conditions such as radiation dose requirements can adjust the transmission speed of the transmission device 6 in the irradiation processing area.

Referring to Fig. 1, the radiation protection device 7 mainly protects the electron beam 8 in the electron beam irradiation area and the X-ray 9 in the transmission detection area. In addition to ensuring the safety of the staff outside the radiation protection device, it can also effectively prevent the electron beam The electron beam 8 generated by the accelerator 1 and the accompanying X-rays directly irradiate the detector array 3 , thereby eliminating the influence of the radiation generated by the electron accelerator 1 on the low-energy X-ray detection device 300 .

The electron beam irradiation processing method according to the specific embodiment of the present invention will be described below with reference to the accompanying drawings 1-4. Referring to FIG. 1 , the method for electron beam irradiation processing according to the present invention includes the steps of: providing a radiation perspective detection device 300; using the radiation perspective detection device 300 to perform detection to obtain information about the mass thickness dρ of an irradiated processing object 10; providing electronic The beam irradiation processing device 200; and the energy E of the electron beam 8 of the electron beam irradiation processing device 200 is adjusted by the control device 5, so that the energy E of the electron beam matches the mass thickness dp of the irradiated processing object 10; and using The adjusted electron beam irradiation processing apparatus 200 performs electron beam irradiation processing.

Specifically, after the staff starts the whole system through the control device 5, the irradiated object 10 is carried by the transmission device 6 to enter the radiation protection device 7, and passes through the perspective detection area at a certain speed, during which the control device 5 controls the low-energy X-ray device 300 generates low-energy X-rays, and the low-energy X-rays penetrate the irradiated object 10 to reach the detector array 3, and the detector array 3 generates signals with different strengths according to the amount of X-rays absorbed by each detector 31 and sends them to the signal analysis and processing device 4, The signal analysis and processing device 4 transmits the mass thickness dρ of the irradiated object 10 to the control device 5 after analyzing and processing the signal. Additionally, the system also obtains information on the length L of the irradiated processing object 10 using the radioscopic detection device 300 . Furthermore, by using the radiation perspective detection device 300 , the system also obtains fine perspective image information about the irradiated processing object 10 . According to the fine perspective image information of the irradiated object 10, the control device 5 provides the staff with the perspective image of the irradiated object 10, so that the staff can identify whether the items in the packing box are consistent with the logo and whether they are safe for electron beam irradiation. And the image archive can be used as a supplement to the processing records of the irradiation processing system.

Further, the control device 5 controls the electron accelerator 1 in real time according to the mass thickness dρ and/or width L of the irradiated object 10, so that the energy E of the output electron beam 8 matches dρ, and the width W of the output electron beam is equal to the width of the object. Matching L means that the energy E of the electron beam and the mass thickness dρ of the irradiated processing object satisfy the aforementioned functional relationship f, that is, E=f(dρ).

During the above operation process, the control device 5 realizes the optimal utilization of the efficiency of the electron beam 8 through the real-time adjustment and control of the output electron beam energy E and scan width W of the electron accelerator 1 . As mentioned above, the electron beam energy E of the electron beam irradiation process has a minimum value Emin and a maximum value Emax. If the thickness of the irradiated object 10 is not suitable, the adjustment of the electron beam energy E exceeds the range, that is, the adjustment If the energy E of the final electron beam does not satisfy Emin≤E≤Emax, the control device 5 will also give an alarm signal and a prompt signal as mentioned above, so as to improve the processing efficiency of the irradiation processing system and ensure the irradiation processing effect.

Specifically, if the energy E of the electron beam 8 that needs to be adjusted is greater than Emax, the control device 5 gives that the mass thickness dρ of the irradiated object 10 is too large, and requires reducing the thickness of the irradiated object 10 to an acceptable range. Prompt information. If the energy (E) of the electron beam 8 that needs to be adjusted is less than Emin, then the control device 5 controls the electron beam irradiation processing device 200 to adjust the energy of its output electron beam 8 to Emin, and provides a requirement to control the energy of the irradiated object 10 Thickness is increased to an appropriate range to meet the above functional relationship f hint information. Specifically, the control device 5 gives the worker a prompt signal that the energy E of the electron beam 8 is surplus, and that the irradiated objects 10 can be properly stacked to improve the utilization efficiency of the electron beam 8 .

Similarly, when the scan width W of the electron accelerator 1 is adjusted based on the length L of the irradiated object 10 obtained by the radiation perspective detection device 300, if the adjusted scan width W is greater than the limit value of the scan width W of the electron accelerator 1 , give a corresponding alarm signal, and prompt the staff to perform proper stacking, so that the length L of the irradiated object 10 falls within the limit range of the scanning width W of the accelerator 1 .

During the above-mentioned operation process, the control device 5 controls the transport device 6 according to the type of the irradiated object 10 and the required irradiation dose, so that it carries the irradiated object 10 through the electron beam irradiation area at a certain speed, so that the irradiated object 10 passes through the electron beam irradiation area. The irradiation object 10 completes the prescribed irradiation processing.

It can be seen from the above-mentioned technical solutions of the present invention that the irradiated object 10 is first measured with the mass thickness dρ and/or the item length L by the low-energy X-ray device 300, etc., and the control device 5 is based on the relevant mass thickness dρ and item length L According to the measurement results of the electron accelerator 1, the corresponding energy adjustment E and/or the scan width W are adjusted in real time, thereby improving the utilization efficiency of the electron beam 8 and ensuring the irradiation processing effect, thereby improving the economic benefits of the irradiation processing system .

Compared with the methods and devices in the prior art, the cost of the method and device according to the present invention does not increase much, so that the mass thickness dp and length L of the irradiated object 10 are as close as possible to the optimum mass thickness and/or optimum length of the electron accelerator 1 , improving the utilization efficiency of the electron beam 8 and ensuring the radiation processing effect, thereby improving the economic benefits of the radiation processing system.

Furthermore, when the corresponding energy adjustment E and the real-time adjustment of the scanning width W of the electron accelerator 1 according to the measurement results of the mass thickness dρ and the item length L exceed the limits of the energy E and scanning width W of the electron accelerator 1 , the staff can be prompted to adjust the stacking method of the irradiated object 10 to achieve the best mass thickness dρ and scanning width W, so as to maximize the utilization efficiency of the electron beam 8 and ensure the irradiation processing effect.

In addition, by adopting the electron beam irradiation processing method and device for improving efficiency in the present invention, wherein the radiation device, such as the low-energy X-ray device 300, measures the mass thickness dρ and the length L, the signal analysis and processing device 4 pairs The further analysis and processing of the signals acquired by the detector array 3 can give a perspective image of the irradiated object 10, so that the staff can identify whether the items in the packing box conform to the logo, and then judge whether the items 10 to be processed by radiation conform to the requirements of the electron beam radiation. Take safety photos. In addition, the images acquired by the radiation imaging system can also be archived as supplementary information for the processing records of the radiation processing system.

While certain embodiments of the present general inventive concept have been shown and described, those of ordinary skill in the art will appreciate that changes may be made to these embodiments without departing from the principles and spirit of the present general inventive concept. The scope is defined by the claims and their equivalents.

Claims (11)

1. A method for electron beam irradiation processing, comprising: (a) provide radiographic detection devices; (b) The detection step of obtaining information about the mass thickness (dρ) of the irradiated processed object through detection by means of a radioscopic detection device; (c) provide electron beam irradiation processing equipment; and (d) adjusting the energy (E) of the electron beam of the electron beam irradiation processing device by the control device, so that the energy (E) of the electron beam matches the mass thickness (dρ) of the irradiated processing object; and (e) A processing step of performing electron beam irradiation processing using the adjusted electron beam irradiation processing apparatus. 2. The method for electron beam irradiation processing according to claim 1, characterized in that: The detection step (b) further includes the step of obtaining information about the length (L) of the irradiated processing object by using a radioscopic detection device; The adjustment step (d) also includes adjusting the scanning width (W) of the electron beam of the electron beam irradiation processing device through the control device, so that the scanning width (W) of the electron beam is equal to the length (L) of the irradiated processing object matching steps. 3. The method for electron beam irradiation processing according to claim 1 or 2, characterized in that: In the adjusting step (d), the energy (E) of the electron beam is adjusted so that the energy (E) of the electron beam and the mass thickness (dρ) of the irradiated processing object satisfy a certain functional relationship ( f), namely E=f(dρ). 4. The method for electron beam irradiation processing according to claim 3, characterized in that: The energy (E) of the electron beam processed by the electron beam irradiation has a minimum value Emin and a maximum value Emax, if the energy (E) of the electron beam adjusted in the adjustment step (d) does not satisfy Emin≤E≤Emax , it further includes the step of giving an alarm through the control device. 5. The method for electron beam irradiation processing according to claim 4, characterized in that: If the energy (E) of the electron beam to be adjusted is greater than Emax, the control device gives a prompt message that the mass thickness of the irradiated object is too large and requires reducing the thickness of the irradiated object to an acceptable range. 6. The method for electron beam irradiation processing according to claim 5, characterized in that: If the energy (E) of the electron beam to be adjusted is less than Emin, the control device controls the electron beam irradiation processing device to adjust the output electron beam energy to Emin, and gives a request to increase the thickness of the irradiated object to an appropriate range prompt information. 7. The method for electron beam irradiation processing according to claim 1 or 2, characterized in that the detection step (b) further comprises: A step of obtaining a perspective image of an irradiated processing object by using a radiation transmission detection device. 8. An electron beam irradiation processing system, comprising: An electron beam irradiation processing device, which includes an electron accelerator (1) to provide an electron beam (8) to scan an irradiated processing object; Radiation perspective detection device, which includes a radiation source (2); a detector array (3); a signal analysis and processing device (4), used to obtain the mass thickness (dρ) and/or length (L) of an irradiated processing object information; and A control device (5), which is used to control the operation of the electron beam irradiation processing device and the radiation perspective detection device, and to control the energy (E) and/or scan width of the electron beam of the electron accelerator (1) (W) is adjusted so that the energy (E) and/or scan width (W) of the electron beam of the electron accelerator (1) is consistent with the mass thickness (dρ) and/or length (L) of the irradiated processing object match. 9. The electron beam irradiation processing system according to claim 8, further comprising: A conveying device (6), which is used to transport the irradiated processing object successively through the radiation perspective detection device and the electron beam irradiation processing device along the first direction, so as to perform radiation perspective detection and electron beam irradiation processing operations. 10. The electron beam irradiation processing system according to claim 8 or 9, characterized in that: The electron beam irradiation processing device and the radiation perspective detection device are respectively surrounded by radiation protection devices (7) to prevent signal interference between them. 11. The electron beam irradiation processing system according to claim 9, characterized in that: The central beam output direction of the electron beam irradiation processing device and the radiation perspective detection device extends along a second direction and is generally parallel, and the second direction is generally perpendicular to the first direction in which the transport device transports the irradiated processing object.

Images