CN101937729A - Irradiation processing method and device of electron beam - Google Patents
Irradiation processing method and device of electron beam Download PDFInfo
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Abstract
The invention discloses an irradiation processing method of an electron beam, comprising the following steps of: (a) providing a radiation perspective detecting device (300); (b) detecting by utilizing the radiation perspective detecting device to obtain the information of the quality thickness (dp) of an object (10) to be subjected to irradiation processing; (c) providing an electron beam irradiation processing device (200); (d) regulating the energy (E) of the electron beam of the electron beam irradiation processing device by using a control device (5) to ensure that the energy (E) of the electron beam is matched with the quality thickness (dp) of the object to be subjected to the irradiation processing; and (e) executing electron beam irradiation processing by utilizing the regulated electron beam irradiation processing device. In the technical scheme, the control device carries out relevant energy regulation and/or real-time regulation of scanning width to an electron accelerator according to the relevant measuring results of the quality thickness and the object length obtained by utilizing the radiation perspective detecting device, thereby improving the utilization efficiency and the processing effect of the electron beam.
Description
Technical field
The present invention relates to the irradiation processing field, particularly use electron accelerator to carry out the field of irradiation processing.More particularly, the present invention relates to the method and apparatus of a kind of novel electronic bundle irradiation processing, it has improved the efficient of electron beam irradiation processing.
Background technology
Electron accelerator is a kind ofly to be used for utilizing in a vacuum electromagnetic field that charged particle is accelerated to very high-octane device, and its core component is to make electronics obtain the accelerating tube that quickens.Electron accelerator is as controlled radiographic source device, advantage such as have the energy height in irradiation processing, power is big, efficient is high, processing speed is fast, security performance is good.At present, electron accelerator has been widely used in that macromolecular material preparation, food storage are fresh-keeping, irradiation such as medical supplies radiosterilization, medicine radiation sterilization, the maintenance of commodity irradiation, crystal and pearl are painted and every field such as environmental contaminants irradiation treatment.
Existing irradiation processing system generally includes the control device of the operation of electron accelerator, article transmitting device, radioprotector and control electron accelerator and article transmitting device etc.Particularly, electron accelerator is used to produce the electron beam of certain energy, certain sweep length; Article transmitting device carrying be subjected to the irradiation object with certain speed by the electron beam irradiation zone, make to be subjected to the irradiation object to be subjected to electron beam irradiation to reach predetermined processing purpose; Radioprotector carries out radiation shield to the electron beam irradiation zone; And the operation of various pieces such as control device control electron accelerator and article transmitting device.
In the existing irradiation processing, the utilization ratio of electron beam is the highest can be arrived near 80%, also have quite a few not utilize, its key reason is that the mass thickness d ρ (along the product of thickness direction article average density ρ and thickness d ρ) that is subjected to the irradiation object can not export the restriction that energy can not optimization mates with accelerator.For each irradiation processing system, its best mass thickness is corresponding with the energy of its accelerator, is a definite number.If be subjected to the mass thickness d ρ of irradiation object big, then electron beam is not according to saturating, and irradiation is inhomogeneous, does not reach the radiation treatment effect; If be subjected to the mass thickness d ρ of irradiation object too small, then the electron beam major part has penetrated and has been subjected to the irradiation object, and the utilization ratio of electron beam is not high.
In the prior art, being subjected to the irradiation object all is the whole product of contracting for fixed output quotas with certain packing usually, the mass thickness d ρ of its package interior article can only average estimation usually simply, and lack accurate measurement means, owing to must guarantee the irradiation processing effect, usually be subjected to the THICKNESS CONTROL of irradiation object conservatively littler by 10%～15% than best in quality thickness, so influenced the utilization ratio of electron beam significantly at its mass thickness d ρ.
In addition, owing to be subjected to the irradiation object to what have certain packing, the mass thickness d ρ of its package interior article can only average estimation usually simply, and lacks accurate measurement means, thereby can not differentiate the The Nomenclature Composition and Structure of Complexes of detected article.Thus, can not judge exactly whether detected article are fit to meet electron beam irradiation safety.
In addition, except detected article can only average the estimation usually simply at the mass thickness d ρ on the thickness direction, on the length direction of detected article, promptly along on the throughput direction of article transmitting device, also exist be subjected to the irradiation object length can not with the sweep length of accelerator can not the optimization coupling problem.Similarly, in order to guarantee the irradiation processing effect, the sweep length of accelerator will be significantly greater than the length of estimating that is subjected to the irradiation object, so similarly influenced the utilization ratio of electron beam significantly.
Summary of the invention
Given this, purpose of the present invention is intended to solve at least one aspect of the above-mentioned problems in the prior art and defective.
One of purpose of the present invention is to provide a kind of electron beam irradiation job operation and device of raising the efficiency, it is by obtaining the relevant information that is subjected to the mass thickness of irradiation processing object, and based on the information of this mass thickness, the mass thickness and the accelerator output optimized energy that are subjected to the irradiation object are mated, thereby improved the utilization ratio of electron beam.
Another object of the present invention is to provide a kind of electron beam irradiation job operation and device of raising the efficiency, it is by obtaining the relevant information that is subjected to the length of irradiation processing object, and based on this length information, the length that is subjected to the irradiation object and the sweep length optimization of accelerator are mated, thereby improved the utilization ratio of electron beam.
According to an aspect of the present invention, it provides a kind of electron beam irradiation method for processing, comprising:
(a) provide radiation perspective pick-up unit;
(b) utilize radiation perspective pick-up unit to detect the detection step of acquisition about the information of the mass thickness (d ρ) that is subjected to the irradiation processing object;
(c) provide the electron beam irradiation processing unit (plant); And
(d) regulate the energy (E) of the electron beam of electron beam irradiation processing unit (plant) by control device, so that the regulating step that the mass thickness (d ρ) of the energy of electron beam (E) and irradiation processing object is complementary; And
(e) utilize the electron beam irradiation processing unit (plant) after regulating to carry out the procedure of processing that electron beam irradiation is processed.
Further, described detection step (b) also comprises and utilizes radiation perspective pick-up unit to obtain step about the information of the length (L) that is subjected to the irradiation processing object; Described regulating step (d) also comprises the sweep length (W) of regulating the electron beam of electron beam irradiation processing unit (plant) by control device, so that the step that is complementary of the length (L) of sweep length of electron beam (W) and irradiation processing object.
Particularly, in described regulating step (d), by the energy (E) of regulating described electron beam, so that the mass thickness (d ρ) of the energy of described electron beam (E) and irradiation processing object satisfies certain functional relation (f), i.e. E=f (d ρ).
More specifically, be higher than the electron beam irradiation processing unit (plant) of 1MeV for energy, if be subjected to irradiation to liking single face irradiation, then funtcional relationship (f) is: E=2.63d ρ+0.32; If be subjected to irradiation to liking two-sided irradiation, then funtcional relationship (f) is: E=1.19d ρ+0.32, and in its Chinese style, the unit of beam energy E is MeV, the unit of article quality thickness d ρ is g/cm2.
In a kind of embodiment, the energy (E) of the electron beam of described electron beam irradiation processing has minimum value Emin and maximal value Emax, if the energy (E) of the electron beam after regulating in the described regulating step (d) does not satisfy Emin≤E≤Emax, then further comprise the step that provides warning by control device.
In technique scheme, the energy (E) of the electron beam of adjusting as needs is greater than Emax, and then control device provides and is subjected to irradiation object quality thickness excessive, and requirement will be subjected to the thickness of irradiation object to be reduced to the information of acceptable scope.
In technique scheme, the energy of the electron beam of Tiao Zhenging (E) is less than Emin if desired, then control device controlling electron beam irradiation processing device is adjusted to Emin with its output beam energy, and provides requirement and will be increased to the information of proper range to the thickness that is subjected to the irradiation object.
In a kind of embodiment, described detection step (b) also comprises: utilize the radiation transmission pick-up unit to obtain the relevant step that is subjected to the fluoroscopy images of irradiation processing object.
According to a further aspect in the invention, it provides a kind of electron beam irradiation system of processing, comprising: the electron beam irradiation processing unit (plant), and it comprises electron accelerator, scans being subjected to the irradiation processing object so that electron beam to be provided; Radiation perspective pick-up unit, it comprises radiation source; Detector array; The signal analysis and processing device is used to obtain about the mass thickness that is subjected to the irradiation processing object and/or the information of length; And control device, it is used to control the operation of described electron beam irradiation processing unit (plant) and described radiation perspective pick-up unit, and energy and/or sweep length to the electron beam of described electron accelerator are regulated, so that the energy of the electron beam of described electron accelerator and/or sweep length and be complementary by the mass thickness of irradiation processing object and/or length.
Particularly, above-mentioned electron beam irradiation system of processing also comprises: transmitting device, it is used for conveying and is subjected to the irradiation processing object successively to have an X-rayed pick-up unit and electron beam irradiation processing unit (plant) through overshoot along first direction, detects and the electron beam irradiation process operation to carry out the radiation perspective.
In one embodiment, described electron beam irradiation processing unit (plant) and radiation perspective pick-up unit are centered on by radioprotector respectively, produce signal each other and disturb to prevent it.
In a kind of embodiment, the center of described electron beam irradiation processing unit (plant) and radiation perspective pick-up unit goes out Shu Fangxiang along second direction extension and parallel substantially, and described second direction carries the first direction that is subjected to the irradiation processing object vertical substantially with described transmitting device.
Not specific aspect among the present invention in the technique scheme has following advantage and beneficial effect at least:
The invention provides a kind of electron beam irradiation job operation and device of raising the efficiency, electron beam irradiation system of processing wherein according to the present invention can comprise by the electron accelerator as the electron irradiation processing unit (plant), low energy X ray device as radiation perspective pick-up unit, detector array, the signal analysis and processing device, compositions such as control device, wherein low energy X ray device and electron accelerator can successively be installed on the same article transmitting device, low energy X ray devices etc. are to being subjected to the irradiation object to carry out the measurement of mass thickness and/or article length earlier, control device is according to the measurement result of relevant mass thickness and article length, electron accelerator is carried out corresponding energy adjustment and/or sweep length is adjusted in real time, thereby improve the utilization ratio of electron beam and ensure the irradiation processing effect, and then improved the economic benefit of irradiation processing disposal system.
The method and apparatus of relative prior art, the method according to this invention and installation cost increase few, make and be subjected to irradiation object thickness and length as far as possible near the best in quality thickness and/or the optimum length of electron accelerator, improved the utilization ratio of electron beam and ensured the irradiation processing effect, thereby the economic benefit of irradiation processing disposal system improves.
Further, when measurement result according to relevant mass thickness and article length, when electron accelerator is carried out real-time adjustment that corresponding energy adjustment and sweep length carry out and has exceeded the limit value of the energy adjustment of electron accelerator and sweep length, can point out the staff that the stacking form adjustment that is subjected to the irradiation object is reached best mass thickness and sweep length, thereby maximize the utilization ratio of electron beam and ensure the irradiation processing effect.
In addition, by adopting the electron beam irradiation job operation and the device that are used to raise the efficiency among the present invention, radiation appliance wherein, for example the low energy X ray device is when carrying out mass thickness and linear measure longimetry, the signal analysis and processing device can provide the fluoroscopy images that is subjected to the irradiation object to the further analyzing and processing that detector array obtains signal, thereby make the staff can distinguish whether article conform to sign in the packing case, and then judge and treat whether the article of RADIATION PROCESSING meet electron beam irradiation safety.In addition, the image that radiation image-forming system can also be obtained files, with the updates as irradiation processing system processing processing record.
Description of drawings
With reference to the accompanying drawings the electron beam irradiation job operation and the device of raising the efficiency according to embodiment of the present invention are described, wherein:
Fig. 1 is the schematic cross-section according to the structure of improved electron beam irradiation system of processing of the present invention;
Fig. 2 shows to utilize radiation appliance to carry out the structural representation that radiant image detects to being subjected to the irradiation object;
Fig. 3 shows to utilize the structural representation of the adjusted electron accelerator of information to processed by the irradiation object that obtains according to radiation imaging apparatus; And
Fig. 4 shows the energy range how to adjust electron accelerator and the synoptic diagram of sweep length.
Embodiment
Below by embodiment, and in conjunction with the accompanying drawings, technical scheme of the present invention is described in further detail.In instructions, same or analogous drawing reference numeral is indicated same or analogous parts.Following explanation to embodiment of the present invention is intended to present general inventive concept of the present invention is made an explanation with reference to accompanying drawing, and not should be understood to a kind of restriction of the present invention.
Further, referring to Fig. 1, this electron beam irradiation system of processing 100 also comprises: transmitting device 6, it is used for conveying and is subjected to irradiation processing object 10 along predetermined direction, the horizontal direction among Fig. 1 for example, successively, detect and the electron beam irradiation process operation to carry out the radiation perspective through overshoot perspective pick-up unit 300 and electron beam irradiation processing unit (plant) 200.
In the embodiment in the present invention, radiation source 2 is the low energy X ray radiation source, but the present invention is not limited to this, for example also can be gamma ray projector or isotope source.Referring to Fig. 1, low energy X ray device 300 and electron accelerator 1 are according to the transmission direction 11 that is subjected to irradiation object 10, horizontal direction for example shown in Figure 1 successively is installed in same article transmitting device 6 tops, and detector array 3 is installed in the corresponding position of transmitting device 6 belows and low energy X ray device 300.Particularly, as shown in Figure 2, detector array 3 is made up of a series of minimonitors unit 31, and for example each detector all links to each other with signal analysis and processing device 4 by signal link 32.
Referring to Fig. 1, in one embodiment, electron beam irradiation processing unit (plant) 200 and radiation perspective pick-up unit 300 are centered on by radioprotector 7 respectively, produce signal each other and disturb to prevent it.Particularly, as shown in Figure 1, radioprotector 7 is installed in the outside of transmitting device 6, electron accelerator 1, low energy X ray device 300, detector array 3, be used for electron beam 8 radiation of screening electron accelerator 1 generation respectively and X ray 9 radiation that low energy X ray device 300 produces, and prevent that electron beam 8 and X ray that electron accelerator 1 produces from directly arriving detector array 3.
Further, signal analysis and processing device 4 is installed in radioprotector 7 outsides, link to each other with control device 5 with detector array 3 respectively, it obtains the signal that the X ray damping capacity of detected object 10 is crossed in relevant transmission from detector array 3, send control device 5 to after handling by analysis, the work and the operation of the whole electron beam irradiation system of processing 100 of control device 5 controls.The center of electron beam irradiation processing unit (plant) 200 and radiation perspective pick-up unit 300 goes out that Shu Fangxiang vertical direction in Fig. 1 is extended and is parallel substantially, and this goes out Shu Fangxiang and carries throughput direction 11 cardinal principles that are subjected to irradiation processing object 10 vertical with described transmitting device 6.
The low energy X ray perspective imaging mainly is that the fluoroscopy images that obtains article is a purpose in the prior art, its ultimate principle is as follows: the X ray of x-ray source emission penetrates when being examined article, different material is inconsistent to the absorptivity of X ray, after unabsorbed X ray is detected the device collection, can convert strong and weak different electric signal to, this electric signal is gathered and handled, can convert digital signal to obtain the exact image of relevant detected article.The present invention is a principle of utilizing this technology, is fundamental purpose with mass thickness information and the width data of exporting article, and image information is as auxiliary file function.The operation of the low energy X ray according to the embodiment of the present invention being had an X-rayed pick-up unit 300 below in conjunction with Fig. 2 describes.
Referring to Fig. 2, low energy X ray device 300 produces the low energy X ray 9 of certain intensity, and low energy X ray 9 penetrates and is subjected to irradiation object 10 and arrives detector array 3.Low energy X ray 9 is weakened and is decayed penetrating when being subjected to irradiation object 10 its intensity, the degree of its decay is relevant promptly with the mass thickness d ρ that is subjected to irradiation object 10: be subjected to the mass thickness d ρ of irradiation object big more, then the low energy X ray decay is many more, arrival is subjected to the X ray of corresponding detector cells 31 in the detector array 3 of irradiation object 10 belows just few more, and the signal of detector output is also low more; On the contrary, if be subjected to the mass thickness d ρ of irradiation object 10 more little, the signal of then corresponding detector 31 outputs is big more, at the fringe region that blocked by irradiation object 10, and the signal maximum of corresponding detector 31 outputs.Each detector 31 signal of detector array 3 are delivered to signal analysis and processing device 4, can obtain reflecting information and the data that are subjected to irradiation object 10 fine structures with handling by analysis, comprise the mass thickness d ρ of the article of each detector 31 top position, the width L of article etc., further processing can obtain to be subjected to the meticulous fluoroscopy images of irradiation object.
Be specifically described below in conjunction with 3 pairs of operations of accompanying drawing according to the electron beam irradiation processing unit (plant) 200 in the specific embodiment of the invention.Referring to Fig. 3, electron accelerator 1 is the main equipment of electron beam irradiation processing unit (plant) 200, and it is used to produce the electron beam 8 of irradiation processing, and the ENERGY E and the sweep length W of output electron beam 8 can adjust usually within the specific limits, and its work is controlled by control device 5.In this embodiment, control device 5 is controlling electron beam irradiation processing device 200 both, also controls the operation of radiation perspective pick-up unit 300 simultaneously.As long as control device 5 can be realized the operation of above-mentioned two aspects on the function, its concrete form for example adopts the form of control module single or multiple combinations or discrete unrestricted.
For the electron beam 8 that electron accelerator 1 is produced maximizes the use, usually its ENERGY E be subjected to the mass thickness d ρ of irradiation object 10 to form certain matching relationship, make to be subjected to each degree of depth of irradiation object 10 all to be subjected to irradiation, and electron beam can not penetrate the formation waste in a large number.If the energy of electron beam is too high, then there are a large amount of electron beams 8 to penetrate and are subjected to irradiation object 10, form waste; If the energy of electron beam 8 is low excessively, then electron beam 8 can not be penetrated into the bigger position of the article degree of depth, and article can not obtain even irradiation, and the irradiation processing effect does not reach requirement.The ENERGY E of electron accelerator will be mated with the mass thickness d ρ that is subjected to the irradiation object, but he can only adjust in certain scope usually, have maximum adjustable ENERGY E max, and the restriction of minimum adjustable ENERGY E min, i.e. the electron beam of electron accelerator generation meets following requirement:
Wherein E=f (d ρ) represents beam energy E and the funtcional relationship that is subjected to irradiation object quality thickness d ρ.Particularly, be higher than the electron beam irradiation system of 1MeV for energy, if be subjected to the irradiation object if single face irradiation, then:
E＝2.63dρ+0.32；
Be subjected to the irradiation object if two-sided irradiation, then:
E＝1.19dρ+0.32；
In the formula, the unit of beam energy E is MeV, and the unit of article quality thickness d ρ is g/cm2.
For the electron beam 8 that electron accelerator 1 is produced obtains maximum utilization, need the sweep length W of electron beam 8 consistent with the developed width L that is subjected to the irradiation object usually, so promptly can not exist because the electron beam scanning width W is narrow irradiation less than the zone, the waste that also can not produce electron beam 8 because the electron beam scanning width W is excessive.
Below in conjunction with accompanying drawing 4, describe carrying out beam energy E and the self-adjusting structure of sweep length W and operation according to the information that is subjected to irradiation object 10 according to realization in the specific embodiment of the invention.Referring to Fig. 4, electron accelerator 1 is made up of accelerator control device 12, electron gun power supply 13, electron gun 14, pulse power supply 15, microwave power source 16, accelerating tube 17, scanning power supply 18, sweeping magnet 19 and scan box 20 etc.Its principle of work is as follows: electron gun 14 produces electronic beam current 8 and enters accelerating tube 17 under the effect of electron gun power supply 13.Meanwhile, the pulse power that pulse power supply 15 produces drives microwave power source 16 and produces microwave power, and microwave power enters accelerating tube 17, and electron beam is subjected to microwave power effect formation high energy electron line 8 and enters scan box 20 in accelerating tube 17.Electronic beam current 8 is subjected to sweeping magnet 19 in scan box 20 effect is scanned into fan-shaped distribution and finally draws.
Detect the information of acquisition according to radiation perspective pick-up unit 300 about the mass thickness d ρ that is subjected to irradiation processing object 10, in the time need adjusting to the energy of electron beam 8, control device 5 sends to accelerator control device 12 with the instruction of energy adjustment, the output power of accelerator control device 12 gating pulse power sources 15.When pulse power changed, microwave power also changed accordingly, and in accelerating tube 17, because the variation of microwave power, electronic beam current 8 is also changed by the action effect of microwave power, and the ENERGY E that finally shows as electron beam changes.
Detect the information of acquisition according to radiation perspective pick-up unit 300 about the length L that is subjected to irradiation processing object 10, in the time need adjusting to the sweep length W of electron beam 8, control device 5 sends to accelerator control device 12 with sweep length adjustment instruction, accelerator control device 12 gated sweep power supplys 18, the output current of scanning power supply 18 is supplied with the sweeping magnet (not shown).When scanning power supply 18 output currents changed, the scanning magnetic field that sweeping magnet produces is respective change also, thereby had adjusted the sweep length W of electron beam, and sweep length W is directly proportional with the output current of scanning power supply 18 usually.
Further, article transmitting device 6 mainly be the carrying be subjected to irradiation object 10 with certain speed by transmission surveyed area and irradiation processing zone, it moves controlled device 5 controls, and control device 5 is according to can transmitting device 6 be adjusted in the transmission speed in irradiation processing zone by conditions such as the type of irradiation object 10 and the dosage of needs irradiation require.
Referring to Fig. 1, radioprotector 7 mainly is that the electron beam 8 to the electron beam irradiation zone, the X ray 9 of transmission surveyed area carry out radiation protection, except that the safety that ensures radioprotector outside staff, can also prevent effectively that electron beam 8 and the subsidiary X ray that produces that electron accelerator 1 produces from shining directly into detector array 3, thereby eliminate the influence of the radiation of electron accelerator 1 generation low energy X ray pick-up unit 300.
Below in conjunction with accompanying drawing 1-4 to describing according to the electron beam irradiation job operation in the specific embodiment of the invention.Referring to Fig. 1, the electron beam irradiation method for processing according to the present invention comprises step: radiation perspective pick-up unit 300 is provided; Utilize radiation perspective pick-up unit 300 to detect the information of acquisition about the mass thickness d ρ that is subjected to irradiation processing object 10; Electron beam irradiation processing unit (plant) 200 is provided; And pass through the ENERGY E that control device 5 is regulated the electron beam 8 of electron beam irradiation processing unit (plant)s 200, so that the mass thickness d ρ of the ENERGY E of electron beam and irradiation processing object 10 is complementary; And utilize the electron beam irradiation processing unit (plant) 200 after regulating to carry out electron beam irradiation processing.
Particularly, after the staff starts total system by control device 5, carried to enter radioprotector 7 inside by transmitting device 6 by irradiation object 10, pass through the perspective surveyed area with certain speed, control device 5 control low energy X ray devices 300 produce low energy X ray during this time, low energy X ray penetrates and is subjected to irradiation object 10 to arrive detector array 3, detector array 3 sends signal analysis and processing device 4 to according to the strong and weak different signal of how many generations that each detector 31 absorbs X ray, will be subjected to the mass thickness d ρ of irradiation object 10 to send control device 5 to after 4 pairs of signals of signal analysis and processing device are handled by analysis.Additionally, utilize radiation perspective pick-up unit 300, this system also obtains the information about the length L that is subjected to irradiation processing object 10.Further, utilize radiation perspective pick-up unit 300, this system also obtains about being subjected to the meticulous fluoroscopy images information of irradiation processing object 10.Control device 5 is according to the meticulous fluoroscopy images information that is subjected to irradiation object 10, provide the fluoroscopy images that is subjected to irradiation object 10 to the staff, be convenient to the staff and distinguish whether article conform to sign in the packing case, whether meet electron beam irradiation safety, and can be with picture archiving replenishing as irradiation processing system processing processing record.
Further, control device 5 is according to being subjected to the mass thickness d ρ of irradiation object 10 and/or width L to control electron accelerator 1 in real time, allow the ENERGY E and the d ρ of its output electron beam 8 be complementary, the width W and the item width L of output electron beam are complementary, promptly so that the mass thickness d ρ of the ENERGY E of described electron beam and irradiation processing object satisfies aforesaid funtcional relationship f, i.e. E=f (d ρ).
In the aforesaid operations process, control device 5 has been realized the optimum utilization of electron beam 8 efficient by the output beam energy E of electron accelerator 1 and the real-time adjustment of sweep length W are controlled.As previously mentioned, the ENERGY E of the electron beam of described electron beam irradiation processing has minimum value Emin and maximal value Emax, if be subjected to the thickness of irradiation object 10 improper, beam energy E is adjusted exceeded scope, the ENERGY E of the electron beam after promptly regulating does not satisfy Emin≤E≤Emax, control device 5 also can provide alarm signal and cue as previously described, with the treatment effeciency that improves the irradiation processing system and ensure the irradiation processing effect.
Particularly, the ENERGY E of the electron beam of adjusting as needs 8 is greater than Emax, and then control device 5 provides and is subjected to irradiation object 10 mass thickness d ρ excessive, and requirement will be subjected to the thickness of irradiation object 10 to be reduced to the information of acceptable scope.The energy (E) of the electron beam 8 of Tiao Zhenging is less than Emin if desired, then control device 5 controlling electron beam irradiation processing devices 200 are adjusted to Emin with its output electron beam 8 energy, and provide requirement and will be increased to proper range to the thickness that is subjected to irradiation object 10 to satisfy the information of above-mentioned funtcional relationship f.Particularly, the ENERGY E that control device 5 provides present electron beam 8 to the staff has more than needed, can suitably stack being subjected to irradiation object 10, to improve the cue of electron beam 8 utilization ratios.
Similarly, when the length L that is subjected to irradiation object 10 that obtains based on radiation perspective pick-up unit 300 is regulated the sweep length W of electron accelerator 1, when the sweep length W of Tiao Jieing is greater than the limit value of electron accelerator 1 sweep length W if desired, provide corresponding alerting signal, and can point out the work staff to carry out suitable pile, so that dropped in the limits of accelerator 1 sweep length W by the length L of irradiation object 10.
In the aforesaid operations process, control device 5 is according to being subjected to the type of irradiation object 10 and the dosage of needs irradiation to require control transmission device 6, allow its carrying be subjected to irradiation object 10 to pass through the electron beam irradiation zone, make to be subjected to irradiation object 10 to finish both irradiation processings of provisioning request with certain speed.
From technique scheme of the present invention as can be seen, carry out the measurement of mass thickness d ρ and/or article length L by low energy X ray device 300 grades earlier to being subjected to irradiation object 10, control device 5 is according to the measurement result of relevant mass thickness d ρ and article length L, electron accelerator 1 carried out corresponding energy is adjusted E and/or sweep length W adjusts in real time, thereby improve the utilization ratio of electron beam 8 and ensure the irradiation processing effect, and then improved the economic benefit of irradiation processing disposal system.
The method and apparatus of relative prior art, the method according to this invention and installation cost increase few, make and be subjected to irradiation object 10 mass thickness d ρ and length L as far as possible near the best in quality thickness and/or the optimum length of electron accelerator 1, improved the utilization ratio of electron beam 8 and ensured the irradiation processing effect, thereby the economic benefit of irradiation processing disposal system improves.
Further, when measurement result according to relevant mass thickness d ρ and article length L, electron accelerator 1 is carried out corresponding energy when adjusting real-time adjustment that E and sweep length W carry out and having exceeded the limit value of the ENERGY E of electron accelerator 1 and sweep length W, can point out the staff that the stacking form adjustment that is subjected to irradiation object 10 is reached best mass thickness d ρ and sweep length W, thereby maximize the utilization ratio of electron beam 8 and ensure the irradiation processing effect.
In addition, by adopting the electron beam irradiation job operation and the device that are used to raise the efficiency among the present invention, radiation appliance wherein, for example low energy X ray device 300 is when carrying out the measurement of mass thickness d ρ and length L, the further analyzing and processing that 4 pairs of detector arrays 3 of signal analysis and processing device obtain signal can provide the fluoroscopy images that is subjected to irradiation object 10, thereby make the staff can distinguish whether article conform to sign in the packing case, and then judge and treat whether the article 10 of RADIATION PROCESSING meet electron beam irradiation safety.In addition, the image that radiation image-forming system can also be obtained files, with the updates as irradiation processing system processing processing record.
Though some embodiment of general plotting of the present invention are shown and illustrate, those skilled in the art will appreciate that, under the situation of principle that does not deviate from this present general inventive concept and spirit, can make a change these embodiment, scope of the present invention limits with claim and their equivalent.
Claims (11)
1. electron beam irradiation method for processing comprises:
(a) provide radiation perspective pick-up unit;
(b) utilize radiation perspective pick-up unit to detect the detection step of acquisition about the information of the mass thickness (d ρ) that is subjected to the irradiation processing object;
(c) provide the electron beam irradiation processing unit (plant); And
(d) regulate the energy (E) of the electron beam of electron beam irradiation processing unit (plant) by control device, so that the regulating step that the mass thickness (d ρ) of the energy of electron beam (E) and irradiation processing object is complementary; And
(e) utilize the electron beam irradiation processing unit (plant) after regulating to carry out the procedure of processing that electron beam irradiation is processed.
2. electron beam irradiation method for processing according to claim 1 is characterized in that:
Described detection step (b) also comprises utilizes radiation perspective pick-up unit to obtain step about the information of the length (L) that is subjected to the irradiation processing object;
Described regulating step (d) also comprises the sweep length (W) of regulating the electron beam of electron beam irradiation processing unit (plant) by control device, so that the step that is complementary of the length (L) of sweep length of electron beam (W) and irradiation processing object.
3. electron beam irradiation method for processing according to claim 1 and 2 is characterized in that:
In described regulating step (d), by the energy (E) of regulating described electron beam, so that the mass thickness (d ρ) of the energy of described electron beam (E) and irradiation processing object satisfies certain functional relation (f), i.e. E=f (d ρ).
4. electron beam irradiation method for processing according to claim 3 is characterized in that:
The energy (E) of the electron beam of described electron beam irradiation processing has minimum value Emin and maximal value Emax, if the energy (E) of the electron beam after regulating in the described regulating step (d) does not satisfy Emin≤E≤Emax, then further comprise the step that provides warning by control device.
5. electron beam irradiation method for processing according to claim 4 is characterized in that:
The energy (E) of the electron beam of adjusting as needs is greater than Emax, and then control device provides and is subjected to irradiation object quality thickness excessive, and requirement will be subjected to the thickness of irradiation object to be reduced to the step of the information of acceptable scope.
6. electron beam irradiation method for processing according to claim 5 is characterized in that:
The energy of the electron beam of Tiao Zhenging (E) is less than Emin if desired, and then control device controlling electron beam irradiation processing device is adjusted to Emin with its output beam energy, and provides requirement and will be increased to the information of proper range to the thickness that is subjected to the irradiation object.
7. electron beam irradiation method for processing according to claim 1 and 2 is characterized in that described detection step (b) also comprises:
Utilize the radiation transmission pick-up unit to obtain the relevant step that is subjected to the fluoroscopy images of irradiation processing object.
8. electron beam irradiation system of processing comprises:
The electron beam irradiation processing unit (plant), it comprises electron accelerator (1), scans being subjected to the irradiation processing object so that electron beam (8) to be provided;
Radiation perspective pick-up unit, it comprises radiation source (2); Detector array (3); Signal analysis and processing device (4) is used to obtain about the mass thickness (d ρ) that is subjected to the irradiation processing object and/or the information of length (L); And
Control device (5), it is used to control the operation of described electron beam irradiation processing unit (plant) and described radiation perspective pick-up unit, and energy (E) and/or sweep length (W) to the electron beam of described electron accelerator (1) are regulated so that the energy (E) of the electron beam of described electron accelerator (1) and/or sweep length (W) be complementary by the mass thickness (d ρ) and/or the length (L) of irradiation processing object.
9. electron beam irradiation system of processing according to claim 8 is characterized in that also comprising:
Transmitting device (6), it is used for conveying and is subjected to the irradiation processing object successively to have an X-rayed pick-up unit and electron beam irradiation processing unit (plant) through overshoot along first direction, detects and the electron beam irradiation process operation to carry out the radiation perspective.
10. it is characterized in that according to Claim 8 or 9 described electron beam irradiation systems of processing:
Described electron beam irradiation processing unit (plant) and radiation perspective pick-up unit are centered on by radioprotector (7) respectively, produce signal each other and disturb to prevent it.
11. electron beam irradiation system of processing according to claim 9 is characterized in that:
The center of described electron beam irradiation processing unit (plant) and radiation perspective pick-up unit goes out Shu Fangxiang along second direction extension and parallel substantially, and described second direction carries the first direction that is subjected to the irradiation processing object vertical substantially with described transmitting device.
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