CN101921996B - Novel spray header device of MOCVD equipment - Google Patents
Novel spray header device of MOCVD equipment Download PDFInfo
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- CN101921996B CN101921996B CN2010102548173A CN201010254817A CN101921996B CN 101921996 B CN101921996 B CN 101921996B CN 2010102548173 A CN2010102548173 A CN 2010102548173A CN 201010254817 A CN201010254817 A CN 201010254817A CN 101921996 B CN101921996 B CN 101921996B
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Abstract
The invention discloses a novel spray header device of MOCVD equipment. The device comprises a gas distribution unit and a closed space surrounded by a spraying chamber; the gas distribution unit comprises a gas inlet end surface and a plurality of gas inlet grouping clapboards; the gas inlet end surface comprises a plurality of gas passing areas and a plurality of gas blocking areas; the gas inlet grouping clapboards divide the gas inlet end surface according to different gas inlet groups; the spraying chamber comprises a gas outlet end surface and a plurality of gas outlet clapboards; a plurality of through gas outlets are formed on the gas outlet end surface; the gas outlet clapboards divide the spraying chamber; the gas passing areas of the gas distribution unit and the gas outlets of the spraying chamber form a plurality of vertically separated gas path units; and a plurality of vertically separated gas path units in the same gas inlet grouping clapboard form a group of vertically separated gas paths. Due to the adoption of the vertically separated gas paths, after the gas flow is completely separated, different gases are alternately fed according to respective channels, the separated conveying of different gases is realized and finally the gases are uniformly mixed in the same space.
Description
Technical field
The present invention relates to a kind of metal organic chemical vapor deposition equipment, especially a kind of MOCVD device spray head unit.
Background technology
Metal organic chemical vapor deposition equipment (Metal Organic Chemical Vapor Deposition is called for short MOCVD) is the key processing equipment of thin-film devices such as preparation high brightness LED, high power laser and HEMT.Component is even, thickness is even, the interface is precipitous is the basic demand of film growth, and the homogeneity that improves film growth is the core missions of MOCVD reactor drum Continual Improvement.A kind of rectilinear reactor drum of main flow adopts spray header closely to spray to reach the raising homogeneity, the purpose of multi-disc growth.Improving an inhomogeneity main method is exactly the structure of improving spray header, independently supplies gas to realize multicomponent gas, near thorough mixing before the substrate, reduces the purpose of the high temperature parasitic deposition on parasitic reaction and the spray header simultaneously to greatest extent.
One denomination of invention is " the big area pectination spray header that is used for metal organic chemical vapor deposition equipment " (Chinese application number: CN200710035447.2A, open day: on February 13rd, 2008), introduced a kind of spray header of big area pectination form; Can realize that III family and group V source gas independently supplies gas from spray header one-piece construction both sides respectively, and above the reaction chamber substrate, evenly spray the method for its realization: adopt house steward's 1,4 air inlets; Arm is supplied gas; Two types of source of the gas arms 3 are staggered, and in the even spray apertures of arranging of homonymy processing, this type device can adopt the rectangle one-piece construction; Also can adopt circular one-piece construction, as shown in Figure 1.The advantage of this invention is: realized sending into two source gas basically and it is isolated spraying into before the reaction chamber each other, mixed when arriving on the substrate side reactor; Its shortcoming is: (1) is although above invention realizes independently supplying gas; But gas arrives each arm end from the house steward joint possibly exist pressure uneven; Make and the flow velocity inequality that goes out gas from each arm holes in spraying finally cause the uneven extension effect that influences of substrate surface air-flow.(2) spray header requirement gas emission direction must be perpendicular to substrate surface, and foregoing invention only is difficult to guarantee to accomplish this point through the structure of tube wall boring.(3) although be two-way gas partitions air inlet remix on current all MOCVD spray header one-piece constructions, not getting rid of under some particular form maybe needs increase the third even more kinds of independent air inlet gas circuit, and foregoing invention is not obviously supported this situation.
Another piece denomination of invention is the USP (application number: US2009/0098276A1 of " Multi-GAS Straight Channel Showerhead "; Open day: on April 16th, 2009) be the most general spray header form of present MOCVD equipment; Fig. 2 has expressed its constructional feature; III family and group V source gas get into the first air inlet overall channel 144 and the second air inlet overall channel 145 of spray header device 104 respectively from inlet mouth 131 and 132; Through first bypass passage 142 and second bypass passage 143, finally get into hybrid channel 150, spray to substrate the back of giving vent to anger.This apparatus features is: (1) gas distribution channel is the horizontal stratification straight channel, is connected with the jet chamber to adopt the metal hollow pipe, and welding is adopted in the junction of open tube and induction trunk, guarantees independently transporting of two-way reactant gases; (2) alternate between the gas channels in the jet chamber have a parallel with it water-cooling channel, in order to cool air injection gas, improves temperature homogeneity.(3) the staggered dense arrangement of the alternate water-cooling channel of jet hole of spray equipment bottom is mentioned in its scheme near the reaction wall place, and jet hole adopts macropore or intensive hole unstable to prevent the boundary current field, influences the sedimentary quality of peripheral substrate.(4) this patent also proposes when the spray equipment bear subregion and accomplishes, and promptly only accomplishes a kind of injection of gas in zone, and the method that the zone is divided can adopt radially to be cut apart or concentric-ring pattern is cut apart.More than the relative merits of invention are: advantage: realized sending into two source gas basically and it is isolated spraying into before the reaction chamber each other, mixed when arriving on the substrate side reactor; Shortcoming: (1) device receives the restriction of horizontal stratified charge passage; Connection between the passage can only be adopted the metal hollow sealing of tube; But the aperture of jet chamber is thousands of, and quantity increases with area and increase sharply, and requires the point of poling welding too many; Too intensive, existing weldprocedure is difficult to guarantee that it is indeformable and air tight.In case gas leakage integral body is arranged just scraps.(2) water-cooling channel and gas passage are parallel to each other, certainly will occupying device perpendicular to the injection useful area of air flow line, reduced the homogeneity that whole regional gas stream sprays.(3) utilize the flow velocity that improves sparging gases near the macropore or the intensive hole at reaction wall place, this part gas packet contains reactant gases, certainly will cause the reactant gases air consumption to increase, and simultaneously alternate water-cooling channel is difficult to guarantee the stability and the homogeneity in peripheral flow field.
Summary of the invention
To the problems referred to above; The present invention adopts the vertical design philosophy of separating of gas circuit; Gas with various was by passage alternate intervals air inlet separately after air-flow was separated completion; Realized the isolation conveying of gas with various and finally realized uniform mixing, avoided thousands of intensive metal hollow pipes of welding, adopted simple complete processing to realize at the same space.
In order to realize the foregoing invention purpose, the present invention has adopted following technical scheme:
A kind of MOCVD equipment novel spray header device is characterized in that, said spray header device comprises that a gas distribution member and a jet chamber enclose formation one enclosed space, wherein:
Said gas distribution member comprises an air inlet end face and some air inlet grouping dividing plates, and said inlet end face comprises some gases through district and some gas barriers district, and said air inlet grouping dividing plate cuts off said air inlet end face according to the various inlet group each other;
Said jet chamber comprises give vent to anger end face and some dividing plates of giving vent to anger, and offers some perforation production wells on the said end face of giving vent to anger, and the said dividing plate of giving vent to anger is separated said jet chamber;
Wherein, the gas of said gas distribution member constitutes some vertical separation gas circuits unit through the district with the production well of said jet chamber, and the some vertical separation gas circuit unit in the said same air inlet grouping dividing plate constitutes one group and vertically separates gas circuit.
Reasonablely be, said gas distribution member and said jet chamber comprise first ring part and second ring part that periphery is closed respectively, and said air inlet end face, the end face of giving vent to anger are respectively a Closed End of said first, second ring part.
Reasonablely be, the some openings of alternative are arranged on the said air inlet end face, said opening portion forms said gas through the district, and said not opening portion forms said gas barrier district, and said air inlet grouping dividing plate and the said dividing plate of giving vent to anger are straight plate.
Reasonablely be; To divide some annular regions in said air inlet end face central point some fan sections that are the center of circle; The some openings of alternative are arranged in said annular region, and said opening portion forms said gas through the district, and said not opening portion forms said gas barrier district; Said air inlet division plate is for being the toroidal membrane in the center of circle with air inlet end face central point, and the said dividing plate of giving vent to anger is for being the radially dividing plate in the center of circle with the said end face central point of giving vent to anger.
Reasonablely be; With said air inlet end face central point is in the some same circle ring area in the center of circle; Opening portion and opening portion are not arranged respectively; Said opening portion forms said gas through the district, and said not opening portion forms the gas barrier district, and the said dividing plate of giving vent to anger is for being the toroidal membrane in the center of circle with the said end face central point of giving vent to anger.
Reasonable is that the end face center of giving vent to anger of said jet chamber is provided with one the 3rd ring part, the said inwall of dividing plate from the 3rd ring part periphery wall radial extension to said second ring part of giving vent to anger.
Reasonable is that the said dividing plate of giving vent to anger comprises straight plate, serration plate wavy plate perhaps.
Reasonablely be, said jet chamber comprises a shirt rim gas curtain, and said shirt rim gas curtain is embedded the hole, some shirt rims between the outside in said second ring part.
Reasonable is that the said production well of said jet chamber is provided with a water-cooling channel between any two.
Description of drawings
Below, with reference to accompanying drawing, for those skilled in the art that, from the detailed description to the inventive method, above-mentioned and other purposes of the present invention, feature and advantage will be obvious.
Fig. 1 is the structural representation of a Chinese invention patent application case in the prior art;
Fig. 2 is the structural representation of U.S. application for a patent for invention case in the prior art;
Fig. 3 a～3c is the spray header device first example structure synoptic diagram of the present invention, and wherein 3a is the substructure synoptic diagram of its gas distribution member, and Fig. 3 b is the structure iron of jet chamber, and Fig. 3 c is the spray header device synoptic diagram after Fig. 3 a, the 3b combination;
Fig. 4 a～4c is the spray header device second example structure synoptic diagram of the present invention, and wherein Fig. 4 a is the substructure synoptic diagram of gas distribution member, and Fig. 4 b is the structure iron of jet chamber, and Fig. 4 c is the spray header device synoptic diagram after Fig. 4 a, the 4b combination;
Fig. 5 a～5b is that aforementioned second embodiment is applied in two kinds of different fashionable synoptic diagram of being gone into gas by gas distribution member;
Fig. 6 a～6c is a kind of deformed configurations of Fig. 5 a and 5b, and wherein, Fig. 6 c is a kind of distressed structure of Fig. 4 b, and Fig. 6 a is that this structure applications is gone into the gas synoptic diagram two kinds of different fashionable gas distribution member with 6b;
Fig. 7 a～7b is the structural representation of spray header device the 3rd embodiment of the present invention;
Fig. 8 is a kind of distressed structure synoptic diagram of Fig. 3 b;
Fig. 9 is a kind of distressed structure synoptic diagram of Fig. 6 c;
Figure 10 is the A-A sectional view of Fig. 3 b;
Figure 11 is the another kind of A-A sectional view of Fig. 3 b;
Figure 12 is with the external structure synoptic diagram after gas distribution member and the jet chamber's combination;
Figure 13 is the jet chamber's structural representation that has shirt rim gas curtain structure;
Figure 14 is the B-B cross-sectional schematic of Figure 13;
Figure 15 is the synoptic diagram at interval of the concentric-ring pattern shown in Fig. 7 a and the 7b;
Figure 16 is a kind of distressed structure of gas distribution member among Fig. 3 c;
Figure 17 (a) is the spray header longitudinal sectional view that has added water-cooling structure;
Figure 17 (b) is the A-A sectional view of Figure 17 (a);
Figure 18 is the sectional view of spray header device of the present invention.
Embodiment
In this embodiment part; The applicant has introduced three kinds of main embodiment form and distressed structures thereof; Need to prove; Figure 18 has reflected the sectional structure chart of the spray header device under the various embodiment situation, when each embodiment is introduced, all can scheme with reference to this (applicant Figure 18 has been adopted first embodiment label) for simplicity.
First embodiment of the invention shown in accompanying drawing 3a～3c is the board-like spray header sparging unit of a kind of straight parallel, concrete shape be configured to:
This sparging unit by gas distribution member 30 and jet chamber about in the of 31 two portions form; Wherein gas distribution member 30 is shown in Fig. 3 a; This unit has the first closed ring part 300 of periphery; The sealing of one end face of this first ring part 300 forms inlet end face 310, offers some parallel open on this air inlet end face 310, and opening portion and opening portion are not alternately arranged and constituted gas barrier district 3021 and gas through district 3022.In the opposite side of air inlet end face 310, some air inlet grouping dividing plates are divided into some air inlet groups with first ring part 300, by air inlet grouping dividing plate 308,309 air inlet end face 310 are divided into three air inlet groups 301 like present embodiment; 302; 303, like this in every air inlet group 301,302; In 303, there are some gas barriers district 3021 and the parallel interval of gas to distribute respectively through district 3022.
With the structure of the jet chamber 31 of this gas distribution member 30 combinations shown in Fig. 3 b; Comprise second ring part 310 that equates in fact with aforementioned first ring part 300; Be that effective jet face mapping equates; The one end face sealing of second ring part 310 forms outlet side face 320; On the end face 320 of giving vent to anger, evenly offer some production wells 321 of perforation, the equal dividing plate 311 of giving vent to anger of spacing in twos is set in the opposite side of end face 320 of giving vent to anger, some dividing plates 311 of giving vent to anger are with being divided into some parallel spaces in second ring part 310.The dividing plate 311 of giving vent to anger in the present embodiment is board-like for straight parallel, but can be other geometrical shapies, includes but not limited to shapes such as arc, zig-zag.
Provided the synoptic diagram after Fig. 3 a and the 3b combination like Fig. 3 c; Gas in the gas distribution member 30 is formed vertical separation gas circuit unit 314 through district 3022 with corresponding jet chamber's 31 interior production wells that connect 321, and the vertical separation gas circuit unit 314 in the same air inlet group constitutes one group and vertically separates gas circuit 313.In use, gas distribution member 30 and jet chamber 31 are combined into the structure of Figure 12, wherein; Three air inlet group 301,302,303 respectively corresponding three admission pieces 3011; 3031 and 3041, by the vertical separation gas circuit unit 314 of admission piece entering gas distribution member 30, because air inlet grouping dividing plate 308 with jet chamber's 31 combinations; 309 separation; So the vertical separation gas circuit unit 314 shown in Fig. 3 c constitutes three groups and vertically separates gas circuit 313, specifically; Be respectively to organize the gas of gas on the air inlet end face 301 of allocation units 30 through distinguishing dividing plate 311 zone at interval of giving vent to anger of 3022 entering jet chambers 31, again by the production well that connects on the end face 320 of giving vent to anger in the jet chamber 31 321 ejections.In addition, also illustrate water-in 3051 and water outlet 3061.
In the present embodiment, because being divided into 3 groups by two board-like air inlets separation dividing plates 308,309 of straight parallel, air inlet end face 310 vertically separates gas circuit 313, so present embodiment is applicable to 2 kinds of gas air inlet blended situation.For example, a kind of is NH3, and a kind of is H2 or the N2 that carries TMGa, and wherein air inlet group 301 feeds gas of the same race with 303 liang of vertical separation gas circuits of group, and certain, this scheme can be further designed to 3 tunnel 3 kinds of gases, even more kinds of gases of multichannel more.
In addition, it is the situation of circular arc plate that Figure 16 has provided air inlet separation dividing plate 308,309, has realized vertical separation gas circuit equally.
The circle that gas distribution member 30 in the present embodiment and first, second ring part cross section of jet chamber 31 are standards is not limited thereto, and also can be other shapes that comprise ellipse, the sealing of square uniform cross section.
Second embodiment of the invention shown in accompanying drawing 4a～4c is a kind of structural representation of radial separations formula spray header sparging unit.Be than the first embodiment something in common; First ring part 400 that remains by an air inlet end face 401 sealings constitutes gas distribution member 40; By one give vent to anger end face 411 sealing second ring part 410 constitute jet chamber 41, offer the production well 412 of some perforations on the end face 411 of giving vent to anger.And difference is, vertically separates the unitary separation of gas circuit and distinguishes to some extent.Specifically, be that the center of circle is divided into some fan sections with the end face central point on the air inlet end face 401 of gas distribution member 40.Thereby still to be the center of circle with the central point be provided with two different air inlet grouping toroidal membranes 408 and 409 of radius at the opposite side of the end face 411 of giving vent to anger is divided into some annular regions.Described before fan section is at the inner opening that divides of these annular regions, and part is opening not, and the open annular district constitutes gas barrier district 4012 thereby make not, and the open annular district constitutes gas through district 4011.The gas barrier district 4012 and the gas that form thus radially and are circumferentially alternately being arranged through distinguishing 4011.Corresponding therewith, in second ring part 410 of jet chamber 41, on the end face 411 of giving vent to anger, be that the center of circle radially is provided with some dividing plates 413 with the end face central point.
A kind of variant embodiment of jet chamber 41 does, cancellation give vent to anger end face 411 and on production well 412, the spatial channel ejection that gas is directly cut apart from dividing plate 413.
Fig. 4 c has provided the synoptic diagram of grouped element 40 with jet chamber's 41 combinations, and air inlet end face 401 is corresponding with the fanned partition on the end face 411 of giving vent to anger.Thus, the gas in the gas distribution member 40 is formed vertical separation gas circuit unit through district 4011 with corresponding jet chamber's 41 interior production wells that connect 412, and the vertical separation gas circuit unit in the same air inlet group constitutes one group and vertically separates gas circuit.
Fig. 5 a and 5b are respectively that jet chamber shown in Fig. 4 b is applied to two kinds of principle schematic under the various inlet.The former is the air inlet synoptic diagram that NH3, two kinds of gases of TMGa separate through the carrier gas of H2 or N2, owing to there is carrier gas to separate, makes the other two kinds of gases gas passage in that mixing can not take place and makes NH3; Two kinds of gases of TMGa do not mix behind the ejection jet chamber; (Atomic LayerEpitaxy is called for short ALE, is also referred to as ald sometimes to form atomic layer epitaxy; Be Atomic Layer Depostion, be called for short ALD) crystal growth mode.The latter is the air inlet synoptic diagram that NH3, two kinds of air inlets of TMGa do not have carrier gas to separate, and can be used for general CVD and includes but not limited to MOCVD (Metal Organic ChemicalVapor Deposition), PECVD (Plasma Enhanced Chemical Vapor Deposition), HVPE (Hydride Vapor Phase Epitaxy) etc.
Fig. 6 c is the another kind of variant embodiment structural representation of Fig. 4 b, and Fig. 6 a, 6b are applied to the principle schematic under two kinds of various inlet of jet chamber shown in Fig. 6 c.Fig. 6 c is than the difference of Fig. 4 b, in the jet chamber 41 give vent to anger end face central vertical one the 3rd ring part 405 is set, the some dividing plates 413 that radially are provided with are from the inwall 414 of periphery wall radial extension to the second ring part 410 of the 3rd ring part 405.The zone of vertical separation gas circuit cell distribution between the 3rd ring part 405 and second ring part 410 that forms thus, and can pass to carrier gas in the 3rd ring part 405 or be used to place surveying instrument perhaps as outlet passageway.
Third embodiment of the invention shown in accompanying drawing 7a～7b is a kind of structural representation of concentric-ring pattern spray header sparging unit; Be than the first embodiment something in common; Comprise and remain the gas distribution member 70 that first ring part 700 by an air inlet end face 701 sealing constitutes; By one give vent to anger end face 711 sealing the jet chamber 71 that constitutes of second ring part 710, offer the production well 712 of some perforations on the end face 711 of giving vent to anger.Being than the first embodiment difference, is that some annulus are divided in the center of circle with its central point on the air inlet end face 701.Through the dividing plate of vertically laying is set the donut on the air inlet end face 701 is radially divided, not open area formation gas barrier district 7012 is arranged on the donut, the open area forms gas through district 7011.Above air inlet end face 701.Corresponding therewith, in second ring part 710 of jet chamber 71, be that the center of circle is provided with some toroidal membranes 713 with the central point of the end face 711 of giving vent to anger.Thus, the gas in the gas distribution member 70 is formed vertical separation gas circuit unit through district 7011 with corresponding jet chamber's 71 interior production wells that connect 712, and the vertical separation gas circuit unit in the same air inlet group constitutes one group and vertically separates gas circuit.
Illustrated the concentric-ring pattern spray header sparging unit of Fig. 7 a, 7b to pass to jet chamber's situation schematic diagram of gas A, B, C by the different annular district in conjunction with Figure 15.Usually, III family or V family gas get into from the top of these donut clearance spaces, flow out from the below.Generally speaking, two adjacent donuts pass through III family or V family gas at interval respectively, but also can arrange the gas of the donut clearance space of specific quantity and specific position through particular types according to actual needs.Wherein a kind of arrangement is under certain conditions for avoiding the pre-reaction of III family and V family gas, in the carrier gas (like H2 or N2) that is used at interval circulate of each III family and V family channel interval intermediary, but also nonessential.
A kind of variations of jet chamber 71 is the spatial channel ejection that the production well 712 that cancellation is given vent to anger end face 711 and upward arranged, gas are directly separated from dividing plate 713.
Fig. 8 is based on a kind of distressed structure of Fig. 3 b, specifically is that the dividing plate 811 that in the end face 320 of giving vent to anger, forms is zigzag fashion or wavy (but being not limited to these shapes).
Fig. 9 is the vertical view of the distressed structure of jet chamber 91 shown in Fig. 6 c.The central zone of this jet chamber 91 is provided with the 3rd ring part 914, and zig-zag or waviness dividing plate 913 are from the internal perisporium of periphery wall radial extension to the second ring part 910 of the 3rd ring part 914.Cooperate the band center cellular type sparging unit that forms thus, the center can pass to carrier gas or be used to place surveying instrument or be used as outlet passageway.
Figure 11 provides is the A-A sectional view of end face of giving vent to anger in the jet chamber among Fig. 3 b, and wherein the 321 some parallel outlet passageways that dividing plate 311 forms of giving vent to anger of serving as reasons wherein have production well 321 in the instance of Figure 11, and production well 321 diameters are less than the spacing of parallel channels.Generally speaking, aperture is matrix distribution equalizing structure or radiation distribution equalizing structure, but and nonessential.
Figure 10 then is a kind of section of simplifying modification structures of Figure 11, in this modification, cancelled give vent to anger end face and on the production well arranged, spray in the passage that gas is directly formed by the dividing plate 311 of giving vent to anger.
What Figure 12 provided is the external structure of combination back spray header device.Introduce in conjunction with aforementioned first embodiment is existing.
Figure 13 and Figure 14 have provided based on Fig. 4 b and have radially improved structure in the jet chamber of partition type spray header; Difference is the structure that has adopted a band shirt rim gas curtain; Specifically be; On second ring part 410, be embedded hole, some shirt rims 416, through the effect of this hole, shirt rim 416 realization shirt rim gas curtains (using carrier gas H2 or N2 usually) injection.
Figure 17 (a) and (b) in, illustrated the production well 171 of 17 lower ends to adopt the synoptic diagram of water-cooling channel 172 vertical alternate layouts between any two, the ⊙ symbolic representation posticum among Figure 17 (a) wherein, another symbolic representation prosopyle in the jet chamber.
In sum, the present invention compares with spray header design in the past, has following innovative point:
(1) gas distribution member adopts vertical the separation (promptly in a plane, it to be divided into some unit; These unit are along extending perpendicular to this planar direction; Air flow line is identical with unitary bearing of trend), gas with various had been realized the isolation conveying of gas with various and has finally been realized uniform mixing at the same space by passage alternate intervals air inlet separately after air-flow was separated completion; Avoid thousands of intensive metal hollow pipes of welding, adopted simple complete processing to realize.Division plate shape in the gas distribution member is restriction not, can be multiple shapes such as straight-plate-type, circular arc type, zigzag system;
(2) jet chamber can adopt multiple modes such as spaced radial separation, concentric-ring pattern separation, board-like separation to the separation of induction trunk, and the shape of division plate is not limited, and can be multiple shapes such as straight-plate-type, circular arc type, zigzag system;
(3) water-cooling project of proposition of the present invention and the vertical alternate layout of air-flow; Under the prerequisite that keeps the temperature control stability, uniformity; Increased spray area, before avoiding in the document water-cooling channel occupy the shortcoming of spray area, increase substantially homogeneity; Realized the aperture all standing of spray equipment bottom, and be uniformly distributed with fully;
(4) increase carrier gas H2 or N2 autonomous channel near the reaction wall place, passage is arranged along excircle, forms shirt rim gas curtain structure, has improved the distribution in flow field, edge greatly, improves the sedimentary quality of edge substrate.
(5) the autonomous channel number can freely dispose, and except that arranging conventional two-way gas passage (like III and V family or II and VI family), also can increase gas passage quantity (as isolating the carrier gas H of usefulness
2Or N
2) needs (like the ALE extension) to adapt to special extensional mode;
(6) the plate-like construction spray header, spaced radial air inlet spray header, the vertical spray header of concentric circular type that propose, principle is similar, but can widen the application category of this type spray header device according to the kind choose reasonable of the concrete structure and the source of the gas of reactor drum.
The front provides the description to preferred embodiment, so that any technician in this area can use or utilize the present invention.Various modifications to these embodiment are conspicuous to those skilled in the art, can be applied to other embodiment to total principle described here and not use creativeness.Thereby, the embodiment shown in the present invention will be not limited to here, and the wide region of principle that should disclose and new feature according to meeting here.
Claims (9)
1. a MOCVD device spray head unit is characterized in that, said spray header device comprises that a gas distribution member and a jet chamber enclose formation one enclosed space, wherein:
Said gas distribution member comprises an air inlet end face and some air inlet grouping dividing plates, and said inlet end face comprises some gases through district and some gas barriers district, and said air inlet grouping dividing plate cuts off said air inlet end face according to the various inlet group each other;
Said jet chamber comprises give vent to anger end face and some dividing plates of giving vent to anger, and offers some perforation production wells on the said end face of giving vent to anger, and the said dividing plate of giving vent to anger is separated said jet chamber;
Wherein, the gas of said gas distribution member constitutes some vertical separation gas circuits unit through the district with the production well of said jet chamber, and the some vertical separation gas circuit unit in the said same air inlet grouping dividing plate constitutes one group and vertically separates gas circuit.
2. MOCVD device spray head unit according to claim 1 is characterized in that,
Said gas distribution member and said jet chamber comprise first ring part and second ring part that periphery is closed respectively, and said air inlet end face, the end face of giving vent to anger are respectively a Closed End of said first, second ring part.
3. MOCVD device spray head unit according to claim 2 is characterized in that,
The some openings of alternative are arranged on the said air inlet end face, and said opening portion forms said gas through the district, and opening portion does not form said gas barrier district, and said air inlet grouping dividing plate and the said dividing plate of giving vent to anger are straight plate.
4. MOCVD device spray head unit according to claim 2 is characterized in that,
To divide some annular regions in said air inlet end face central point some fan sections that are the center of circle; The some openings of alternative are arranged in said annular region; Said opening portion forms said gas through the district; Opening portion does not form said gas barrier district, and the air inlet division plate is for being the toroidal membrane in the center of circle with air inlet end face central point, and the said dividing plate of giving vent to anger is for being the radially dividing plate in the center of circle with the said end face central point of giving vent to anger.
5. MOCVD device spray head unit according to claim 2 is characterized in that,
With said air inlet end face central point is in the some same circle ring area in the center of circle; Opening portion and opening portion are not arranged respectively; Said opening portion forms said gas through the district; Said not opening portion forms the gas barrier district, and the said dividing plate of giving vent to anger is for being the toroidal membrane in the center of circle with the said end face central point of giving vent to anger.
6. MOCVD device spray head unit according to claim 3 is characterized in that,
The end face center of giving vent to anger of said jet chamber is provided with one the 3rd ring part, the said inwall of dividing plate from the 3rd ring part periphery wall radial extension to said second ring part of giving vent to anger.
7. according to claim 3 or 6 described MOCVD device spray head units, it is characterized in that,
The said dividing plate of giving vent to anger comprises straight plate, serration plate or wavy plate.
8. according to claim 3 or 4 or 5 or 6 described MOCVD device spray head units, it is characterized in that said jet chamber comprises a shirt rim gas curtain, said shirt rim gas curtain comprises the hole, some shirt rims that is embedded in said second ring part between the outside.
9. MOCVD device spray head unit according to claim 8 is characterized in that,
The said production well of said jet chamber is provided with a water-cooling channel between any two.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010102548173A CN101921996B (en) | 2010-08-17 | 2010-08-17 | Novel spray header device of MOCVD equipment |
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| CN2010102548173A CN101921996B (en) | 2010-08-17 | 2010-08-17 | Novel spray header device of MOCVD equipment |
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| CN101921996A CN101921996A (en) | 2010-12-22 |
| CN101921996B true CN101921996B (en) | 2012-02-15 |
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| CN102953050B (en) * | 2011-08-26 | 2014-06-18 | 杭州士兰明芯科技有限公司 | Large-diameter sprayer of MOCVD (metal organic chemical vapor deposition) reactor |
| KR102067002B1 (en) * | 2013-05-08 | 2020-01-16 | 주성엔지니어링(주) | A gas supplying apparatus |
| CN103952685B (en) * | 2014-04-14 | 2016-01-20 | 南昌大学 | The MOCVD of indium-gallium-aluminum-nitrogen material component and doping energy independent assortment grows gas circuit and method |
| CN105420691A (en) * | 2015-11-19 | 2016-03-23 | 广州市威时强光电科技发展有限公司 | MOCVD equipment spray head and vapour reaction control method thereof |
| CN105803424A (en) * | 2016-03-24 | 2016-07-27 | 广东省中科宏微半导体设备有限公司 | Thin film growth cavity and thin film growth device |
| TWI689618B (en) * | 2018-10-04 | 2020-04-01 | 漢民科技股份有限公司 | Gas injector device used for semiconductor equipment |
| CN113508189B (en) * | 2019-11-27 | 2023-07-28 | 东莞市中镓半导体科技有限公司 | Linear spray head for GaN material growth |
| CN117529583A (en) * | 2021-06-25 | 2024-02-06 | 华为技术有限公司 | Reaction device, growth device and growth equipment |
| CN113549900B (en) * | 2021-07-22 | 2022-06-10 | 东北大学 | Spraying plate structure of MOCVD equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1292092C (en) * | 2004-04-01 | 2006-12-27 | 南昌大学 | Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device |
| CN101122012A (en) * | 2007-07-27 | 2008-02-13 | 中国电子科技集团公司第四十八研究所 | Large-area pectinate spraying head used for metal organic chemical gas phase deposition device |
| US7976631B2 (en) * | 2007-10-16 | 2011-07-12 | Applied Materials, Inc. | Multi-gas straight channel showerhead |
| KR20090078538A (en) * | 2008-01-15 | 2009-07-20 | 삼성전기주식회사 | Showerhead and chemical vapor deposition apparatus having the same |
| CN201785486U (en) * | 2010-08-17 | 2011-04-06 | 彭继忠 | Novel spray header device of MOCVD equipment |
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