Summary of the invention
The objective of the invention is at above-mentioned present situation, aim to provide a kind of proof voltage ability height, the ceramic structure densification can hinder ion migration, can press high-temperature thermistor and the manufacture method thereof that can stablize use under the extremely low state at thermal extremes and oxygen.
The implementation of the object of the invention is, high-temperature thermistor, with 50-85%mol barium titanate, 2-39mol lead titanate, 1-7mol calcium titanate, the 1-10mol strontium titanate is a main component, contains 0.12-0.13mol semiconductor element, glass substance: 1-2mol silicon oxide, the 1mol titanium oxide, the 0.2mol aluminum oxide is subjected to the main classes material: 0.08%mol Manganse Dioxide, 0.09mol magnesium oxide, wherein the semiconductor element is one or more in niobium oxides, yttrium oxide, the weisspiessglanz.
The manufacture method of high-temperature thermistor, get the 2-39mol lead titanate, the 1-7mol calcium titanate, the 1-10mol strontium titanate is a main component, contain 0.12-0.13mol semiconductor element, the 1-2mol silicon oxide, 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide and 0.09mol magnesium oxide add water and mix levigate in ball mill, the discharging drying, 1050 ℃ of pre-burnings 2 hours, and broken in ball mill again, and adding powder weight ratio is 8% PVA binder solution, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets the high-temperature thermistor product.
The present invention has increased sintering potential barrier by adding the Mg element in sintering process, make crystal grain tiny evenly, has improved the proof voltage ability; Because Ba
2+Radius 1.42, and Mg
2+Radius be 0.72, by the position of Mg displacement Ba, make ceramic structure fine and close more, in abominable atmosphere, can hinder ion migration, can press stable use the under the extremely low state at thermal extremes and oxygen.Be assemblied in the Al pipe of sealing, under the extremely low severe environment of oxygen partial pressure, it is withstand voltage to stand 500V.
Embodiment
High-temperature thermistor of the present invention is by barium titanate, lead titanate, calcium titanate, strontium titanate, semiconductor element, silicon oxide, and titanium oxide, titanium oxide, aluminum oxide, Manganse Dioxide and magnesium oxide are formed.The semiconductor element is one or more in niobium oxides, yttrium oxide and the weisspiessglanz.
Manufacture method is that above-mentioned barium titanate, lead titanate etc. are added water mill in ball mill thin, and the discharging drying is light-burned 2 hours, broken in the ball mill, add the PVA binder solution, granulation, the tabletting machine moulding is burnt till and is the semiconductor pottery, through abrasive disc, spray Al electrode gets product.
Enumerate the specific embodiment of the invention below:
Example 1, get the 85mol barium titanate, the 7mol lead titanate, the 7mol calcium titanate, the 1mol strontium titanate, 0.13mol niobium oxides, 2.1mol silicon oxide, the 1mol titanium oxide, 0.2mol aluminum oxide, mix levigate 0.08mol Manganse Dioxide and 0.01mol magnesium oxide add water in ball mill, the discharging drying, light-burned 2 hours at 1050 ℃, and it is broken in ball mill again, adding powder weight ratio is 8% PVA binder solution, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
Example 2, get the 85mol barium titanate, the 7%mol lead titanate, the 6mol calcium titanate, the 2mol strontium titanate, the 0.13%mol niobium oxides, the 2.1%mol silicon oxide, the 1%mol titanium oxide, the 0.2%mol aluminum oxide, 0.08%mol Manganse Dioxide and 0.04%mol magnesium oxide add water and mix levigate in ball mill, the discharging drying, light-burned 2 hours at 1050 ℃, and it is broken in ball mill again, adding powder weight ratio is 8% PVA binder solution, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
Example 3, get 85mol barium titanate, 7mol lead titanate, 5mol calcium titanate, 3mol strontium titanate, 0.13mol niobium oxides, 2.1mol silicon oxide, the 1mol titanium oxide, mix levigate 0.2mol aluminum oxide, 0.08mol Manganse Dioxide and 0.09mol magnesium oxide add water in ball mill, the discharging drying, light-burned 2 hours at 1050 ℃, and it is broken in ball mill again, the PVA binder solution of adding 8%, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
Comparative example 1, get 85mol barium titanate, 7mol lead titanate, 7mol calcium titanate, 1mol strontium titanate, 0.13mol niobium oxides, 2.1mol silicon oxide, the 1mol titanium oxide, mix levigate 0.2mol aluminum oxide, 0.08mol Manganse Dioxide add water in ball mill, the discharging drying, light-burned 2 hours at 1050 ℃, and it is broken in ball mill again, the PVA binder solution of adding 8%, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
With routine 1-example 3 making methods, the semiconductor element is used the 0.12%mol weisspiessglanz instead, gets routine 4-example 6
Comparative example 2, get 57mol barium titanate, 35mol lead titanate, 3mol calcium titanate, 5mol strontium titanate, 0.12mol weisspiessglanz, 2.1mol silicon oxide, the 1mol titanium oxide, mix levigate 0.2mol aluminum oxide, 0.08mol Manganse Dioxide add water in ball mill, the discharging drying, light-burned 2 hours at 1050 ℃, and it is broken in ball mill again, adding powder weight ratio is 8% PVA binder solution, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
With routine 1-example 3 making methods, the semiconductor element is used the 0.15%mol yttrium oxide instead, gets routine 7-example 9
Comparative example 3, get 50mol barium titanate, 39mol lead titanate, 1mol calcium titanate, 10mol strontium titanate, 0.15mol yttrium oxide, 2.1mol silicon oxide, the 1mol titanium oxide, mix levigate 0.2mol aluminum oxide, 0.08mol Manganse Dioxide add water in ball mill, the discharging drying, light-burned 2 hours at 1050 ℃, and it is broken in ball mill again, adding powder weight ratio is 8% PVA binder solution, granulation, pass through the tabletting machine moulding, and became the semiconductor pottery in 30 minutes, through abrasive disc at 1290 ℃ of sintering, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
The applicant's use-case 1-example 9 has been done constituent content and performance comparison test with existing comparative example 1-comparative example 3 (getting 32 * 12 * 2.4mm thermistor chip product with traditional method), and test-results sees the following form:
From last table as seen, by the posistor that the present invention makes, under severe environment, the proof voltage ability has strengthened greatly, thereby has improved reliability.