Background technology
Because Global climate change trend, weather environmental protection subject under discussion is suggested.Compare the wire spiral heating element, reliable, energy-conservation because of using posistor safety, so in the warm-air drier heating unit, use at present.
At present the posistor that uses of warm-air drier with (Pb, Ba) TiO3 is a principal crystalline phase, through lead displacement barium, its switch temperature is at 200-300 ℃.The method of manufacture of this posistor is to use ball mill or disperse ball mill mixing, through press filtration, light-burned ball milling; Add the tackiness agent granulating and forming again; In air, after sintering pottery under 1200-1400 ℃, the coating electrode forms thermistor chip then.Its grain size is not easy controlled, and compactness is lower, under severe environment, loses efficacy easily.
Owing to consider the security of this type warm-air drier; Heat generating components is sealed among the Al pipe; In ME, also need use organic glue, the heating thermistor chip is in thermal extremes and the extremely low state of oxygen pressure during energising, so high to the reliability requirement of thermistor.The thermistor chip security of domestic production at present is unsatisfactory.
Summary of the invention
The objective of the invention is to above-mentioned present situation, it is high to aim to provide a kind of proof voltage ability, and ceramic structure is fine and close, can hinder ion migration, can press high-temperature thermistor and the method for manufacture thereof that can stablize use under the extremely low state at thermal extremes and oxygen.
The implementation of the object of the invention is that high-temperature thermistor is with 50-85%mol barium titanate, 2-39mol lead titanate, 1-7mol calcium titanate; The 1-10mol strontium titanate is a staple, contains 0.12-0.13mol semiconductor element, glass substance: the 1-2mol silicon oxide; The 1mol titanium oxide, the 0.2mol aluminum oxide receives the main classes material: 0.08%mol Manganse Dioxide; 0.09mol Natural manganese dioxide, wherein the semiconductor element is one or more in niobium oxides, yttrium oxide, the weisspiessglanz.
The method of manufacture of high-temperature thermistor is got 2-39mol lead titanate, 1-7mol calcium titanate, and the 1-10mol strontium titanate is a staple, contains 0.12-0.13mol semiconductor element, 1-2mol silicon oxide; 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide and 0.09mol Natural manganese dioxide add the water mixing in ball mill levigate, and discharging is dry; 1050 ℃ of pre-burnings 2 hours, and broken in ball mill again, and adding powder weight ratio is 8% PVA binder solution; The tabletting machine moulding is passed through in granulation, and becomes the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets the high-temperature thermistor product.
The present invention has increased sintering potential barrier through adding the Mg element in sintering process, make crystal grain tiny evenly, has improved the proof voltage ability; Because Ba
2+Radius 1.42, and Mg
2+Radius be 0.72, through the position of Mg displacement Ba, make ceramic structure fine and close more, in abominable atmosphere, can hinder ion migration, can press extremely low state to stablize use down at thermal extremes and oxygen.Be assemblied in the Al pipe of sealing, under the extremely low severe environment of oxygen partial pressure, it is withstand voltage to stand 500V.
Embodiment
High-temperature thermistor of the present invention is by barium titanate, lead titanate, calcium titanate, strontium titanate, semiconductor element, silicon oxide, and titanium oxide, titanium oxide, aluminum oxide, Manganse Dioxide and Natural manganese dioxide are formed.The semiconductor element is one or more in niobium oxides, yttrium oxide and the weisspiessglanz.
Method of manufacture is that above-mentioned barium titanate, lead titanate etc. are added water mill in ball mill thin, and discharging is dry, and is light-burned 2 hours, broken in the ball mill; Add the PVA binder solution, granulation, the tabletting machine moulding, burning till is that semiconductor is ceramic; Through abrasive disc, spray Al electrode gets product.
Enumerate the specific embodiment of the invention below:
Example 1, get 85mol barium titanate, 7mol lead titanate, 7mol calcium titanate, 1mol strontium titanate, 0.13mol niobium oxides, 2.1mol silicon oxide, 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide and 0.01mol Natural manganese dioxide add water and mix levigate in ball mill; Discharging is dry, 1050 ℃ light-burned 2 hours, and broken in ball mill again; Adding powder weight ratio is 8% PVA binder solution, and granulation is through the tabletting machine moulding; And became the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
Example 2, get 85mol barium titanate, 7%mol lead titanate, 6mol calcium titanate, 2mol strontium titanate, 0.13%mol niobium oxides, 2.1%mol silicon oxide, 1%mol titanium oxide, 0.2%mol aluminum oxide, 0.08%mol Manganse Dioxide and 0.04%mol Natural manganese dioxide add water and mix levigate in ball mill; Discharging is dry, 1050 ℃ light-burned 2 hours, and broken in ball mill again; Adding powder weight ratio is 8% PVA binder solution, and granulation is through the tabletting machine moulding; And became the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
Example 3, get 85mol barium titanate, 7mol lead titanate, 5mol calcium titanate, 3mol strontium titanate, 0.13mol niobium oxides, 2.1mol silicon oxide, 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide and 0.09mol Natural manganese dioxide add water and mix levigate in ball mill; Discharging is dry, 1050 ℃ light-burned 2 hours, and broken in ball mill again; The PVA binder solution of adding 8%, granulation is through the tabletting machine moulding; And became the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
Comparative example 1, get 85mol barium titanate, 7mol lead titanate, 7mol calcium titanate, 1mol strontium titanate, 0.13mol niobium oxides, 2.1mol silicon oxide, 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide add water and mix levigate in ball mill; Discharging is dry, 1050 ℃ light-burned 2 hours, and broken in ball mill again; The PVA binder solution of adding 8%, granulation is through the tabletting machine moulding; And became the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
With routine 1-example 3 making methods, the semiconductor element is used the 0.12%mol weisspiessglanz instead, gets routine 4-example 6
Comparative example 2, get 57mol barium titanate, 35mol lead titanate, 3mol calcium titanate, 5mol strontium titanate, 0.12mol weisspiessglanz, 2.1mol silicon oxide, 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide add water and mix levigate in ball mill; Discharging is dry, 1050 ℃ light-burned 2 hours, and broken in ball mill again; Adding powder weight ratio is 8% PVA binder solution, and granulation is through the tabletting machine moulding; And became the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
With routine 1-example 3 making methods, the semiconductor element is used the 0.15%mol yttrium oxide instead, gets routine 7-example 9
Comparative example 3, get 50mol barium titanate, 39mol lead titanate, 1mol calcium titanate, 10mol strontium titanate, 0.15mol yttrium oxide, 2.1mol silicon oxide, 1mol titanium oxide, 0.2mol aluminum oxide, 0.08mol Manganse Dioxide add water and mix levigate in ball mill; Discharging is dry, 1050 ℃ light-burned 2 hours, and broken in ball mill again; Adding powder weight ratio is 8% PVA binder solution, and granulation is through the tabletting machine moulding; And became the semiconductor pottery in 30 minutes at 1290 ℃ of sintering; Through abrasive disc, spray Al electrode gets 32 * 12 * 2.4mm thermistor chip product.
The applicant's use-case 1-example 9 has been done constituent content and performance comparison test with existing comparative example 1-comparative example 3 (getting 32 * 12 * 2.4mm thermistor chip product with traditional method), and test-results sees the following form:
Visible from last table, through the posistor that the present invention makes, under severe environment, the proof voltage ability has strengthened greatly, thereby has improved safety.