CN101819071A - Film thermocouple and manufacturing method thereof - Google Patents
Film thermocouple and manufacturing method thereof Download PDFInfo
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- CN101819071A CN101819071A CN 201010124561 CN201010124561A CN101819071A CN 101819071 A CN101819071 A CN 101819071A CN 201010124561 CN201010124561 CN 201010124561 CN 201010124561 A CN201010124561 A CN 201010124561A CN 101819071 A CN101819071 A CN 101819071A
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Abstract
The invention belongs to the technical field of temperature measurement and in particular relates to a film thermocouple and a manufacturing method thereof. The film thermocouple comprises a thermode A, a thermode B and a connecting lead, wherein a junction of the thermode A and the thermode B is a temperature measuring point; the connecting lead is led out of the thermode A and the thermode B respectively; and the thermode A and the thermode B are molded on a surface of a member to be measured in a mode of vacuum ion sputtering. In addition, the invention also provides the manufacturing method for the film thermocouple. The thermode A and the thermode B which form the thermocouple are generated by directly sputtering on the surface of the member to be measured in the mode of vacuum ion sputtering, so the thermocouple is fixedly and reliably connected with the member to be measured, and is difficult to float and fall, and measurement accuracy is high.
Description
Technical field
The invention belongs to the temperature measurement technology field, be specifically related to a kind of diaphragm type thermopair and manufacture method thereof.
Background technology
Thermopair is the sensitive element of thermel, and its temperature-measurement principle is based on the thermoelectric effect of Seebeck (Seebeck) in 1821 discovery.See also Fig. 1, it is the principle schematic of thermocouple temperature measurement.Among the figure, two kinds of different conductor A and B link together, and constitute a closed-loop path, and two contacts that link to each other between conductor A and the conductor B are respectively point for measuring temperature 1 and reference point 2.Wherein, conductor A, B is called thermode, and point for measuring temperature 1 normally welds together, and places the thermometric field to be used to experience dut temperature during measurement, and 2 of reference point keep temperature constant, with as a reference.
When the temperature of point for measuring temperature 1 and reference point 2 not simultaneously, will produce thermopower in the loop, this phenomenon just is called thermoelectric effect.This thermopower is called the Seebeck thermoelectromotive force, is called for short " thermopower ", is designated as E
ABAnd thermopair is realized thermometric by measuring this thermopower.
At present, the temperature survey for metal structure surface is directly thermopair to be welded on metal structure surface to carry out.For the temperature survey on nonmetal structure surface, the normal employing is welded on thermopair on the sheet metal, and the method that again sheet metal is sticked on the nonmetal structure surface is carried out.Because sheet metal and nonmetal structure material coefficient of thermal expansion difference of coefficients are bigger, in the thermometric process through regular meeting floating sky of sheet metal even obscission appear, so less reliable, measuring accuracy is lower.
Summary of the invention
Purpose of the present invention: in order to solve prior art nonmetal structure surface temperature measurement less reliable, the problem that measuring accuracy is lower, the invention provides a kind of thermometric process and be difficult for taking place to float empty and coming off, reliability is preferable, the film thermocouple that measuring accuracy is higher.
In addition, the present invention also provides a kind of manufacture method of film thermocouple.
Technical scheme of the present invention: a kind of film thermocouple, it comprises thermode A, thermode B and is connected lead-in wire, wherein, the junction of described thermode A and thermode B is a point for measuring temperature, described connection lead-in wire is drawn from thermode A and thermode B respectively, and it is characterized in that: described thermode A and thermode B are molded over component surface to be measured by the mode of vacuum ion sputtering.
Described film thermocouple advances one and comprises nonmetal film, and described thermode A and thermode B are molded over the nonmetal film surface by the mode of vacuum ion sputtering, and this nonmetal film is bonded in component surface to be measured.
The thickness of described thermode A and thermode B is between 8～12 microns.
A kind of manufacture method of film thermocouple, it comprises the steps:
Step 1: provide and install target and A group mask, wherein, described target is the standard hot electrode material;
Step 2: clean member point for measuring temperature to be measured position, and member to be measured is installed;
Step 3: vacuumize and toast, when vacuum is extracted into 10
-3During Pa, heated baking to 150 ℃～250 ℃, and keep air pressure not to be higher than 3.0 * 10
-3Pa;
Step 4: aura cleans, filling with inert gas to 0.5～2.0 * 10
-3Pa opens ion and cleans power supply, and voltage is progressively adjusted from 1000V～2000V scope, aura is cleaned by weak strengthen gradually, occurs aura clearly in the vacuum chamber, and whole aura cleaning process kept 8～12 minutes approximately;
Step 5: sputter coating on member to be measured, start shielding power supply and grid bias power supply, reduce the inert gas quantity delivered, make vacuum tightness reach 8 * 10
-2Pa, grid bias power supply voltage is progressively heightened to 60～100V from zero V, and shielding power supply voltage is progressively heightened to 500～700V from zero V, current settings is at 3～5A, keep the sputter coating process 10～20 minutes, and made coating film thickness reach 8～12 microns, form thermode A;
Step 6: cool off after 10～20 minutes, filling with inert gas reduces vacuum tightness to 1～3 * 10
-1Pa stopped after 5 minutes, charged into atmosphere;
Step 7: take out member to be measured, A is organized mask be replaced by B group mask, and repeating step 2 forms thermode B to step 6, and secondary plates between the film existence as the interface point of point for measuring temperature;
Step 8: on thermode A and thermode B, lead-in wire is set respectively.
Beneficial effect of the present invention: the present invention forms thermode A and thermode B by the vacuum ion sputtering method at nonmetal film or component surface to be measured, and described thermode A and thermode B intersect the formation thermopair, can realize the measurement to temperature.Because thermopair of the present invention is to form by vacuum ion sputtering, so the reliability height, has avoided the caused floating sky of difference or the problem that comes off owing to thermal expansivity, measuring accuracy is higher, has bigger actual application value.
Description of drawings
Fig. 1 is the principle schematic of thermocouple temperature measurement;
Fig. 2 is the structural representation of film thermocouple first embodiment of the present invention;
Wherein, 1-point for measuring temperature, 2-reference point, 3-member to be measured, 4-thermode A, 5-thermode B, 6-extension line.
Embodiment
The present invention is described in further detail below by embodiment:
See also Fig. 2, it is the structural representation of film thermocouple first embodiment of the present invention.Described film thermocouple comprises thermode A4, thermode B5 and a pair of extension line 6.Wherein, described thermode A4 and thermode B5 are two kinds of standard hot electrode materials, and the two mode by vacuum ion sputtering directly is created on the surface of member 3 to be measured.And described thermode A4 and thermode B5 join the formation thermopair mutually, and the junction overlaps and closely contact, and the interface point of the two is a point for measuring temperature 1.Simultaneously, extension line 6 is drawn from thermode A4 and thermode B5 respectively.During actual measurement, generally with zero degree as the reference point, thermopair reference point employing mode commonly used has two kinds, a kind of is that extension line 6 is inserted in the ice chest, with zero degree as the reference point.Another kind is that extension line 6 is connected with a measurement module, and room temperature is revised room temperature by measurement module as the reference point, and revising the back reference point still is zero degree.
Because film thermocouple generates thermode A4 and the thermode B5 that constitutes thermopair by mode direct sputter on member to be measured 3 surfaces of vacuum ion sputtering, therefore is connected reliably tight between thermopair and the member to be measured, be difficult for floating sky and come off, measuring accuracy is higher.The manufacture method of described film thermocouple is provided below, and it comprises following processing step:
1. make target, mask, jig;
2. installation target;
3. clean member point for measuring temperature to be measured position, remove greasy dirt;
4. member to be measured is installed;
5. A group mask is installed;
6. vacuumize, toast, the vacuum tightness indication reaches 10
-3Pa starts well heater, heats, and the baking Control of Voltage is in 160V, and temperature to 200 ℃ is closed well heater, and vacuum tightness should be better than 3.0 * 10
-3Pa;
7. aura cleans
7.1 fill Ar gas to 0.5～2.0 * 10
-3Pa;
Clean power supply 7.2 open ion, progressively heighten voltage, make to occur aura clearly in the vacuum chamber, aura cleans generally and is transferred gradually by force by weak;
7.3 aura cleaned 10 minutes, closed to clean power supply;
8. sputter coating
8.1 start shielding power supply, grid bias power supply;
8.2 reduce Ar gas quantity delivered, make vacuum tightness reach 8 * 10
-2Pa;
8.3 grid bias power supply voltage is progressively heightened to 80V from zero V;
8.4 shielding power supply voltage is progressively heightened to the 600V from zero V, current settings is at 3～5A;
8.5 the sputter coating process continued to carry out 10～20 minutes, made coating film thickness be about 10 microns;
8.6 after cooling off 10～20 minutes, fill Ar gas and reduce vacuum tightness to 1～3 * 10
-1Pa stops then after 5 minutes and charges into atmosphere;
9. the taking-up workpiece is replaced by B group mask;
10. repeat the 6-8.6 process;
11. the visual examination behind the plated film.
In the manufacture method of thermopair of the present invention, target is the standard hot electrode material, and the installation of the making of target, mask, jig and target is provided with reference to conventional vacuum sputter mode and gets final product.According to member temperature-measuring range to be measured, can select the thermocouple material of different calibration number.International Electrotechnical Commission has recommended 7 kinds of standardized thermocouples in 1975 to countries in the world, i.e. the thermopair of 7 kinds of calibration number, and every kind of thermopair all is made up of two kinds of thermode materials A, B.The thermopair of this seven kinds of calibration number can be produced on component surface to be measured by the method for sputter, is that concrete technological parameter is slightly different.Therefore according to the difference of thermocouple material, can there be certain difference in each parameter in the thermopair manufacture method of the present invention, is not limited to 200 ℃ as baking temperature, can adjust in 150 ℃～250 ℃ according to material character difference.When aura cleans, be not limited to charge into argon gas, can also be other inert gas, and the aura scavenging period was not limited to 10 minutes, can do up and down at 10 minutes slightly to float, clean as the aura that can keep 8～12 minutes.Grid bias power supply voltage can progressively be heightened to 60～100V from zero V, and shielding power supply voltage is progressively heightened to 500～700V from zero V, and the thermode thickness that is plated also can change in 8～12 micrometer ranges.
In addition, the frame mode of film thermocouple second embodiment of the present invention is similar with first embodiment, just also comprises a nonmetal film.And in the present embodiment, the thermode A of film thermocouple and thermode B all are created on the nonmetal film by the mode of vacuum ion sputtering, during actual the use, have the nonmetal film of thermopair to be glued to component surface to be measured described sputter again.Because the nonmetal film and the nonmetal structure material coefficient of thermal expansion difference of coefficients of film thermocouple are little, therefore thermometric process film thermocouple is difficult for taking place floating sky and obscission, reliability is preferable, and this film thermocouple volume is less, the precision height, install simply,, can conveniently realize the temperature survey on various nonmetal structures surface by sticking on the nonmetal structure surface.
The present invention forms thermode A and thermode B by the vacuum ion sputtering method at nonmetal film or component surface to be measured in sum, described thermode A and thermode B intersect the formation thermopair, thereby realize measurement to temperature, avoided because the caused floating sky of difference or the problem that comes off of thermal expansivity, has the reliability height, the characteristics that measuring accuracy is high.
Claims (4)
1. film thermocouple, it comprises thermode A, thermode B and is connected lead-in wire, wherein, the junction of described thermode A and thermode B is a point for measuring temperature, described connection lead-in wire is drawn from thermode A and thermode B respectively, and it is characterized in that: described thermode A and thermode B are molded over component surface to be measured by the mode of vacuum ion sputtering.
2. film thermocouple according to claim 1 is characterized in that: also comprise nonmetal film, described thermode A and thermode B are molded over the nonmetal film surface by the mode of vacuum ion sputtering, and this nonmetal film is bonded in component surface to be measured.
3. film thermocouple according to claim 2 is characterized in that: the thickness of described thermode A and thermode B is between 8～12 microns.
4. the manufacture method of a film thermocouple is characterized in that, comprises the steps:
Step 1: provide and install target and A group mask, wherein, described target is the standard hot electrode material;
Step 2: clean member point for measuring temperature to be measured position, and member to be measured is installed;
Step 3: vacuumize and toast, when vacuum is extracted into 10
-3During Pa, heated baking to 150 ℃～250 ℃, and keep air pressure not to be higher than 3.0 * 10
-3Pa;
Step 4: aura cleans, filling with inert gas to 0.5～2.0 * 10
-3Pa opens ion and cleans power supply, and voltage is progressively adjusted from 1000V～2000V scope, aura is cleaned by weak strengthen gradually, occurs aura clearly in the vacuum chamber, and whole aura cleaning process kept 8～12 minutes approximately;
Step 5: sputter coating on member to be measured, start shielding power supply and grid bias power supply, reduce the inert gas quantity delivered, make vacuum tightness reach 8 * 10
-2Pa, grid bias power supply voltage is progressively heightened to 60～100V from zero V, and shielding power supply voltage is progressively heightened to 500～700V from zero V, current settings is at 3～5A, keep the sputter coating process 10～20 minutes, and made coating film thickness reach 8～12 microns, form thermode A;
Step 6: cool off after 10～20 minutes, filling with inert gas reduces vacuum tightness to 1～3 * 10
-1Pa stops and charges into atmosphere after 5 minutes;
Step 7: take out member to be measured, A is organized mask be replaced by B group mask, and repeating step 2 forms thermode B to step 6, and secondary plates between the film existence as the interface point of point for measuring temperature;
Step 8: on thermode A and thermode B, lead-in wire is set respectively.
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| CN2010101245614A CN101819071B (en) | 2010-03-16 | 2010-03-16 | Manufacturing method of film thermocouple |
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|---|---|---|---|
| CN2010101245614A CN101819071B (en) | 2010-03-16 | 2010-03-16 | Manufacturing method of film thermocouple |
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| CN101819071B CN101819071B (en) | 2011-12-21 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102116680A (en) * | 2011-02-18 | 2011-07-06 | 北京工业大学 | Insertion sheet for measuring internal temperature distribution of fuel cell |
| CN102944321A (en) * | 2012-12-07 | 2013-02-27 | 重庆材料研究院 | Preparation method of high-precision thick-film type thermocouple group for measuring micro-distance temperature difference |
| CN105743416A (en) * | 2016-03-18 | 2016-07-06 | 杭州威衡科技有限公司 | Motor energy consumption testing and energy conservation control system |
| CN107101735A (en) * | 2017-06-13 | 2017-08-29 | 北京卫星环境工程研究所 | For the sheet film thermocouple temperature measurement system of measurement surface transient temperature and application |
| CN111829680A (en) * | 2019-04-23 | 2020-10-27 | 北京振兴计量测试研究所 | Surface pyrometry method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101324472A (en) * | 2008-07-14 | 2008-12-17 | 大连理工大学 | Method for manufacturing embedded type multi-layer compound film cutting temperature sensor |
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2010
- 2010-03-16 CN CN2010101245614A patent/CN101819071B/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101324472A (en) * | 2008-07-14 | 2008-12-17 | 大连理工大学 | Method for manufacturing embedded type multi-layer compound film cutting temperature sensor |
Non-Patent Citations (2)
| Title |
|---|
| 《低温与特气》 19931231 徐文等 一种用于低温下瞬态测温的薄膜热偶技术 第36-39页 1-4 , 第1期 2 * |
| 《工程热物理学报》 19891130 陈汉平等 非金属表面温度测量的薄膜热电偶技术 第430-432页 第10卷, 第4期 2 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102116680A (en) * | 2011-02-18 | 2011-07-06 | 北京工业大学 | Insertion sheet for measuring internal temperature distribution of fuel cell |
| CN102116680B (en) * | 2011-02-18 | 2012-07-11 | 北京工业大学 | Insertion sheet for measuring internal temperature distribution of fuel cell |
| CN102944321A (en) * | 2012-12-07 | 2013-02-27 | 重庆材料研究院 | Preparation method of high-precision thick-film type thermocouple group for measuring micro-distance temperature difference |
| CN102944321B (en) * | 2012-12-07 | 2014-07-16 | 重庆材料研究院 | Preparation method of high-precision thick-film type thermocouple group for measuring micro-distance temperature difference |
| CN105743416A (en) * | 2016-03-18 | 2016-07-06 | 杭州威衡科技有限公司 | Motor energy consumption testing and energy conservation control system |
| CN107101735A (en) * | 2017-06-13 | 2017-08-29 | 北京卫星环境工程研究所 | For the sheet film thermocouple temperature measurement system of measurement surface transient temperature and application |
| CN111829680A (en) * | 2019-04-23 | 2020-10-27 | 北京振兴计量测试研究所 | Surface pyrometry method |
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| CN101819071B (en) | 2011-12-21 |
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