CN101800147A - High-voltage coil fixing device of plasma etcher - Google Patents
High-voltage coil fixing device of plasma etcher Download PDFInfo
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- CN101800147A CN101800147A CN201010114463A CN201010114463A CN101800147A CN 101800147 A CN101800147 A CN 101800147A CN 201010114463 A CN201010114463 A CN 201010114463A CN 201010114463 A CN201010114463 A CN 201010114463A CN 101800147 A CN101800147 A CN 101800147A
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Abstract
The invention relates to a high-voltage coil fixing device of a plasma etcher. A coil skeleton of the device comprises a bottom end connecting ring, upright posts with a groove and a top end connecting ring, wherein more than three upright posts with a groove are uniformly arranged between the bottom end connecting ring and the top end connecting ring; line containing grooves are arranged on each upright post with a groove at equal intervals; the outer side of the upright posts with a groove is provided with a strip pressing plate, and a line pressing groove corresponding to a high-voltage coil is arranged on the strip pressing plate; and the strip pressing plate and the upright posts with a groove are fixedly connected into a whole by bolts. Because the coil skeleton with better rigidity and the strip pressing plate are used to fix the high-voltage coil, the high-voltage coil cannot deform and be separated from the coil skeleton so as to radically eliminate accidents of striking a quartz reaction tube because a winding of the high-voltage coil separates from the coil skeleton, thereby guaranteeing the normal service life of the quartz reaction tube, improving the use reliability of the plasma etcher and saving the production cost.
Description
Technical field:
The present invention relates to plasma etching equipment, relate in particular to the high-tension coil fixture of plasma etching machine.
Background technology:
Solar energy is a kind of radiant energy, and it must just can be transformed to electric energy by means of energy converter.This one or two solar energy converting is the energy converter of electric energy, is exactly the solar cell that people are commonly called as.The P-N knot is the core of crystal silicon solar energy battery, does not have the P-N knot, just can not produce photoelectric current, also just can not become solar cell.Diffusion is a kind of mode of silicon wafer to manufacture P-N knot, yet in diffusion process, the silicon chips periphery surface also has diffusion layer to form.The diffusion layer on silicon chips periphery surface can make the battery upper/lower electrode form short-circuited conducting sleeve, it must be removed.There is any small partial short-circuit on the periphery, the battery parallel resistance descended, so that become waste product.The method of removing peripheral diffusion layer is etching, and the quality of etching effect directly influences the leakage current of finished product battery, and etching is the key factor that influences the power of battery and quality.
At present, existing lithographic method has two kinds, plasma etching and laser ablation.Edge plasma electric insulation etching be the silicon chip after the diffusion is pressed into neat one folded, be fixed in the middle of the teflon plate with special fixture, each silicon chip is spilt beyond the edge, put into plasma etching machine then together, utilize the fluorine ion in the plasma etching machine that silicon chip edge is carried out chemical corrosion, remove the diffusion layer at edge, reach the purpose of insulation etching.At present, in solar cell fabrication process, the plasma etching machine is one of key equipment in the manufacture of solar cells.In plasma etch process, solar battery sheet is in crystal reaction tube, because process gas is setting the electric field that power provides via high-tension coil through radio frequency (RF) power supply, dissociate the plasma of the band positive and negative charge particle composition of portion gas and equivalent, produce the glow discharge phenomenon.Whether the installation of high-tension coil in crystal reaction tube the reliable and stable useful life that not only directly has influence on crystal reaction tube, and have influence on the etching quality of plasma etching machine.In existing etching machine, the fixture of high-tension coil such as Fig. 1, shown in Figure 2, it comprises high-tension coil 1, coil rack 2 and nylon cable tie 3, described coil rack 2 is made up of the smooth column 22 of base 21 and two symmetrical distributions, two smooth columns 22 are fixed on the base 21 symmetrically, high-tension coil 1 usefulness nylon cable tie 3 is fixed on the smooth column 22 of coil rack 2, such fixed structure, the rigidity of coil rack 2 is not high, especially the rigidity between two smooth columns 22 is lower, high-tension coil 1 usefulness nylon cable tie 3 is fixed on the smooth column 22 of coil rack 2 and not only can be out of shape, and the plasma etching machine will constantly discharge the high pressure aura in etching process, nylon cable tie 3 is easy to wear out for a long time in high pressure aura irradiation environment, usually use 6～individual month nylon cable tie 3 the fragility fracture phenomenon will occur, cause high-tension coil 1 to break away from coil rack 2, this phenomenon occurs and not only directly influence crystal reaction tube interior magnetic field intensity and distributing homogeneity, and high-tension coil 1 can collide crystal reaction tube in the process that breaks away from coil rack 2, can cause the crystal reaction tube breakage when serious, cause the plasma etching machine can't operate as normal.
Summary of the invention:
In order to overcome existing plasma etching machine, the invention provides a kind of high-tension coil fixture of plasma etching machine owing to the fixing unreliable deficiency of bringing of high-tension coil.Adopt the high-tension coil fixture of this structure, it is firmly fixing that high-tension coil is able to, the accident of having avoided damaging crystal reaction tube because of high-tension coil is loosening takes place, thereby has prolonged the useful life of crystal reaction tube, has improved the dependability of plasma etching machine.
The technical solution adopted in the present invention is:
The high-tension coil fixture of described plasma etching machine, comprise high-tension coil and coil rack, it is characterized in that: described coil rack comprises the bottom connecting ring, trough of belt column and top connecting ring, between bottom connecting ring and top connecting ring, be provided with three above trough of belt columns equably, every trough of belt column equal intervals be provided with the appearance wire casing, the winding inner ring of high-tension coil overlays in the appearance wire casing on the trough of belt column, be provided with the strip pressing plate in the outside of trough of belt column, on the strip pressing plate, be provided with and the corresponding pressuring line groove of high-tension coil, link into an integrated entity by screw between strip pressing plate and the trough of belt column.
Further, between bottom connecting ring and top connecting ring, be provided with 3 trough of belt columns equably.
Further, the material of described coil rack and strip pressing plate is the material of high temperature resistant anti-light radiation.
Further, the material of described high temperature resistant anti-light radiation is pottery or bakelite.
Coil rack and strip pressing plate fix high-tension coil preferably because the present invention has adopted rigidity, the winding of high-tension coil places the appearance wire casing of trough of belt column, and compress by the pressuring line groove on the strip pressing plate, and fix with screw between trough of belt column and the strip pressing plate, in use, high-tension coil neither can be out of shape, and also can not break away from coil rack, magnetic field intensity in the crystal reaction tube is not only stable, and is evenly distributed; Strip pressing plate and trough of belt column all adopt the material of high temperature resistant anti-light radiation, so just prolonged the useful life of whole high-tension coil fixture, the accident of fundamentally having eliminated the winding disengaging coil rack of high-tension coil and having clashed into crystal reaction tube, crystal reaction tube can be not damaged because of bump, guaranteed the normal useful life of crystal reaction tube, thereby improved the dependability of plasma etching machine, saved production cost.It has overcome the shortcoming that exists with the nylon cable tie fixed coil in the existing high-tension coil fixture.
Description of drawings:
Fig. 1 and Fig. 2 are the fixture structure schematic diagrames of existing high-tension coil;
Wherein, Fig. 2 is the vertical view of Fig. 1;
Fig. 3 and Fig. 4 are structural representations of the present invention;
Wherein, Fig. 4 is the A-A cutaway view of Fig. 3;
Fig. 5 is the structural representation of coil rack and strip pressing plate among the present invention.
Among the figure: the 1-high-tension coil; The 2-coil rack; The 21-base; The smooth column of 22-; 23-bottom connecting ring; 24-trough of belt column; 25-top connecting ring; 26-holds wire casing; The 3-nylon cable tie; 4-strip pressing plate; The 41-pressuring line groove; The 5-screw.
Embodiment:
Describe concrete mode of the present invention in detail below in conjunction with accompanying drawing:
The high-tension coil fixture of described plasma etching machine, as Fig. 3～shown in Figure 5, it comprises high-tension coil 1 and coil rack 2, described coil rack 2 comprises bottom connecting ring 23, trough of belt column 24 and top connecting ring 25, between bottom connecting ring 23 and top connecting ring 25, be provided with three trough of belt columns 24 equably, every trough of belt column 24 equal intervals be provided with and hold wire casing 26, the winding inner ring of high-tension coil 1 overlays in the appearance wire casing 26 on trough of belt column 24, be provided with strip pressing plate 4 in the outside of trough of belt column 24, on strip pressing plate 4, be provided with and high-tension coil 1 corresponding pressuring line groove 41, fixedlyed connected by screw 5 between strip pressing plate 4 and the trough of belt column 24 and be integral, the material of described coil rack 2 and strip pressing plate 4 is pottery or bakelite.
Claims (4)
1. the high-tension coil fixture of a plasma etching machine, comprise high-tension coil (1) and coil rack (2), it is characterized in that: described coil rack (2) comprises bottom connecting ring (23), trough of belt column (24) and top connecting ring (25), between bottom connecting ring (23) and top connecting ring (25), be provided with three above trough of belt columns (24) equably, every trough of belt column (24) equal intervals be provided with and hold wire casing (26), the winding inner ring of high-tension coil (1) overlays in the appearance wire casing (26) on trough of belt column (24), be provided with strip pressing plate (4) in the outside of trough of belt column (24), on strip pressing plate (4), be provided with and the corresponding pressuring line groove of high-tension coil (1) (41), fixedly connected by screw (5) between strip pressing plate (4) and the trough of belt column (24) and be integral.
2. according to the high-tension coil fixture of the described plasma etching machine of claim 1, it is characterized in that: between bottom connecting ring (23) and top connecting ring (25), be provided with three trough of belt columns (24) equably.
3. according to the high-tension coil fixture of the described plasma etching machine of claim 1, it is characterized in that: the material of described coil rack (2) and strip pressing plate (4) is the material of high temperature resistant anti-light radiation.
4. according to the high-tension coil fixture of the described plasma etching machine of claim 3, it is characterized in that: the material of described high temperature resistant anti-light radiation is pottery or bakelite.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010114463A CN101800147A (en) | 2010-02-26 | 2010-02-26 | High-voltage coil fixing device of plasma etcher |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010114463A CN101800147A (en) | 2010-02-26 | 2010-02-26 | High-voltage coil fixing device of plasma etcher |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101800147A true CN101800147A (en) | 2010-08-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010114463A Pending CN101800147A (en) | 2010-02-26 | 2010-02-26 | High-voltage coil fixing device of plasma etcher |
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| CN (1) | CN101800147A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030213799A1 (en) * | 2002-03-27 | 2003-11-20 | Takaaki Tanaka | Induction heating roller apparatus and image formation apparatus |
| CN201113337Y (en) * | 2007-08-17 | 2008-09-10 | 熊昌发 | Fixture block type ceramic wire clamp for stringing |
| CN201194232Y (en) * | 2008-05-21 | 2009-02-11 | 深圳市捷佳伟创微电子设备有限公司 | Plasma body etching machine |
| CN201369222Y (en) * | 2009-03-23 | 2009-12-23 | 佛山市南海展晴玩具有限公司 | High-voltage coil framework of electronic transformer |
| CN201623173U (en) * | 2010-02-26 | 2010-11-03 | 常州亿晶光电科技有限公司 | High-tension coil fixing device of plasma etcher |
-
2010
- 2010-02-26 CN CN201010114463A patent/CN101800147A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030213799A1 (en) * | 2002-03-27 | 2003-11-20 | Takaaki Tanaka | Induction heating roller apparatus and image formation apparatus |
| CN201113337Y (en) * | 2007-08-17 | 2008-09-10 | 熊昌发 | Fixture block type ceramic wire clamp for stringing |
| CN201194232Y (en) * | 2008-05-21 | 2009-02-11 | 深圳市捷佳伟创微电子设备有限公司 | Plasma body etching machine |
| CN201369222Y (en) * | 2009-03-23 | 2009-12-23 | 佛山市南海展晴玩具有限公司 | High-voltage coil framework of electronic transformer |
| CN201623173U (en) * | 2010-02-26 | 2010-11-03 | 常州亿晶光电科技有限公司 | High-tension coil fixing device of plasma etcher |
Non-Patent Citations (3)
| Title |
|---|
| 张文锦: "《机电基础实践》", 30 September 2002, 机械工业出版社, article "酚醛塑料", pages: 34 * |
| 得克萨斯大学: "《基础电工学》", 31 July 1981, 石油工业出版社, article "电阻器", pages: 77 * |
| 朱余钊: "《电子材料与元件》", 31 July 1999, 电子科技大学出版社, article "陶瓷", pages: 24 * |
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Application publication date: 20100811 |