CN101799634B - Multichannel collecting and correcting device of alignment signal of photoetching machine - Google Patents
Multichannel collecting and correcting device of alignment signal of photoetching machine Download PDFInfo
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- CN101799634B CN101799634B CN2010101240964A CN201010124096A CN101799634B CN 101799634 B CN101799634 B CN 101799634B CN 2010101240964 A CN2010101240964 A CN 2010101240964A CN 201010124096 A CN201010124096 A CN 201010124096A CN 101799634 B CN101799634 B CN 101799634B
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Abstract
The invention discloses a multichannel collecting and correcting device of an alignment signal of a photoetching machine, which comprises a photoelectric sensor for converting a modulated light intensity signal into a modulated eclectic current signal; a head amplifier for converting the modulated eclectic current signal into a modulated voltage signal; a variable gain amplifier for adjusting the modulated voltage signal into a set amplitude value; an SS signals correcting device for correcting and outputting SS signals generated by the variable gain amplifier; a band-pass filter for filtrating the AC components and the other interference components in the modulated voltage signal; a demodulator for demodulating the modulated voltage signal with a reference signal; and a low-pass filter for filtrating the modulated frequency components in the signal outputted by the demodulator. The device improves the consistency of the SS signals in each channel, leads the one-off adjustment to be effective for a long term, and simplifies a later stage signals-processing flow path.
Description
Technical field
The present invention relates to a kind of litho machine registration signal multichannel collecting calibrating installation, relate in particular to and a kind ofly can accurately reflect the corresponding relation between input light intensity and the output signal and once adjust permanently effective litho machine registration signal multichannel collecting calibrating installation.
Background technology
In the manufacture process of integrated circuit (IC) or other microdevice, the multilayer mask that will have different mask patterns by lithographic equipment is imaged on the silicon chip that is coated with photoresist under accurately aiming at successively, for example on semi-conductor silicon chip or the LCD plate.The alignment system of lithographic equipment, its major function are to realize mask-silicon chip aligning before the alignment exposure, to satisfy the requirement of alignment precision.At present, the most alignment device that adopts of lithographic equipment is the grating alignment system, and as shown in Figure 1, this grating alignment system comprises: the illuminator 1 that is used to provide exposing light beam; Be used to support the mask platform 4 of mask 3, have mask pattern and the periodic structure that is used for mask registration to aim at grating marker 2 on the mask 3; Be used for the mask pattern on the mask 3 is projected to projection optical system 5 on the silicon chip 6; Be used to support the base station 8 of silicon chip 6, be carved with on the base station 8 and aim at grating marker 10; Be used to drive the motion platform 9 that base station x and y move to linear reciprocation, motion platform 9 is gathered and control by servo motion control system 11 and measuring system IFx and IFy; Be used to provide silicon chip to aim at the illuminator 12 of illumination, silicon chip is aimed at illuminating bundle and is used to project silicon chip grating marker 7 or base station grating marker 10; The collection and the processing module 301 that are used for the alignment light signal; The collection and the processing module 303 that are used for position data; Based on aiming at light intensity signal and position data, determine the registration signal processing module 302 of aligned position.The collection of alignment light signal constitutes silicon chip with the collection of processing module 301, position data with processing module 303, registration signal processing module 302 and sequential isochronous controller (not shown) and aims at collection and disposal system 300.
In the alignment scanning process, a plurality of discrete wavelength illuminating bundles that illuminator 12 provides, shine on silicon chip grating marker 7 or the base station grating marker 10 through Transmission Fibers, diffraction takes place, diffraction light carries about aiming at the structural information of grating marker, through alignment optical imaging system (not shown), on reference grating front surface, form light and dark periodicity hot spot striped.Along with the at the uniform velocity straight line of motion platform moves, driving silicon chip grating marker 7 and base station grating marker 10 moves with uniform velocity together, periodically the hot spot striped will be at the uniform velocity inswept with reference to grating, the collection of alignment light signal and processing module 301 will detect the signal curve of the sinusoidal form with constant cycle, the collection of binding site data and processing module 303, through registration signal processing module 302, can obtain to do the light intensity curve that sinusoidal form changes, thereby determine aligned position with the position.Because the intensity of alignment optical signal is faint, fluctuation is big, be subjected to characteristics such as working environment interference easily, in the process of aiming at light intensity signal collection, for stability and the antijamming capability that improves signal, usually to signal amplify, filtering, and the modulation and demodulation technology of photosignal.In the process that signal is amplified, can obtain the voltage signal of an expression magnification, this voltage signal has also reflected input light intensity signal intensity indirectly simultaneously, be input signal strength signal (hereinafter to be referred as the SS signal), this signal is counted as the characteristic parameter of reflection mark quality and silicon chip reflectivity, and being needs the important parameter considered in the alignment procedures.
In as Chinese patent 200810035115.9 disclosed a kind of silicon chip registration signal collections and disposal system, there is inconsistency between different signal sampling channels; And because the influence of other factors such as noise makes that there is some difference between the SS signal and the value of setting.At present usually according to the linear relationship between SS signal and the input light intensity, with two different input signals (for example dark signal Dark signal and test signal Test signal) the SS signal is calibrated between gain region, and set up relation between input signal strength and the SS signal.Demarcated these two values and just can accurately calculate the pairing input light intensity of SS signal later on according to the linear relationship of gain with the input light intensity.Because the inconsistency of intensity collection equipment needs often to use software approach calibration SS signal in the practical application.
Summary of the invention
At the problems referred to above of the prior art, the object of the present invention is to provide a kind of litho machine registration signal multichannel collecting calibrating installation, realize the hardware calibration of registration signal multichannel collecting by this device, improve the consistance of each passage SS signal, and once adjusting can be permanently effective, simplifies the later stage signal processing flow.
To achieve these goals, the invention provides a kind of litho machine registration signal multichannel collecting calibrating installation, comprising: photoelectric sensor is used for the light intensity signal through ovennodulation is converted to modulated current signal; Prime amplifier is used for modulated current signal is converted to modulated voltage signal; Variable gain amplifier is used for modulated voltage signal is adjusted to the setting amplitude; SS signal calibration device is used to calibrate SS signal that variable gain amplifier produces and with its output; Bandpass filter is used for the flip-flop of filtering modulated voltage signal and other interference component; Detuner carries out demodulation with reference signal to modulated voltage signal; Low-pass filter is used for the modulating frequency composition of the signal of filtering detuner output.
According to a preferred implementation of the present invention, SS signal calibration device is adjusted the direct current biasing and the ratio of SS signal, wherein by adjusting that direct current biasing is eliminated because the SS signal errors that leakage current and circuit noise produced, eliminate inconsistency between each signal sampling channel by resize ratio.
Variable gain amplifier can be adjusted circuit by variable gain operational amplifier, modulated voltage signal effective value testing circuit, gain control signal generative circuit and interface signal amplitude and form.
It is the bandwidth-limited circuit of frequency modulating signal that bandpass filter can adopt centre frequency, non-modulation frequency content and flip-flop in the filtering modulated voltage signal.
Detuner can carry out multiplying with modulated voltage signal and reference signal, thereby separates frequency modulating signal and envelope signal frequency in the modulated voltage signal.
Low-pass filter can filtering twice modulating frequency composition in the signal of detuner output, and keep the envelope signal frequency content.
According to litho machine registration signal multichannel collecting calibrating installation of the present invention, can accurately reflect the corresponding relation between input light intensity and the output signal, eliminate noise and each passage inconsistency to detecting the influence that the input light intensity is brought, saved the process of the SS signal that collects being carried out software calibration.
Description of drawings
Fig. 1 is a litho machine alignment system synoptic diagram;
Fig. 2 is a registration signal production process synoptic diagram;
Fig. 3 is a litho machine registration signal multichannel collecting calibrating installation structural representation according to one preferred embodiment of the present invention;
Fig. 4 shows SS signal and the relation of importing light intensity;
Fig. 5 is a SS signal calibration device hardware circuit synoptic diagram according to one preferred embodiment of the present invention;
Fig. 6 is according to SS signal calibration process flow diagram of the present invention.
Embodiment
Below, further describe according to a preferred embodiment of the invention in conjunction with the accompanying drawings.
Fig. 2 shows registration signal production process synoptic diagram.Be pointed out that,, utilize optical signal modulator that the laser signal amplitude is modulated usually in order to improve the signal to noise ratio (S/N ratio) in signal transmission, detection and the transfer process.With reference to Fig. 2, the illumination beam after the modulation produces periodically hot spot striped 305 through image-forming module to alignment mark.In the alignment scanning process, periodically hot spot striped 305 is at the uniform velocity inswept with reference to grating 306 with the motion of work stage for this, is transferred on the photoelectric sensor through detection optical fiber 307, obtains light intensity signal curve 308.
Fig. 3 shows the structural representation of litho machine registration signal multichannel collecting calibrating installation 310 according to one preferred embodiment of the present invention.Litho machine registration signal multichannel collecting calibrating installation 310 mainly comprises photoelectric sensor 311, prime amplifier 312, variable gain amplifier 313, SS calibrating device (being input signal strength signal calibration device) 314, bandpass filter 315, detuner 316 and low-pass filter 317.Purpose is gathers and demodulation light intensity curve 308, and obtains the light intensity value of input light intensity curve.Photoelectric sensor 311 is used for the light intensity signal through ovennodulation is converted to modulated current signal, prime amplifier 312 is used for modulated current signal is converted to modulated voltage signal, variable gain amplifier 313 is used for modulated voltage signal is adjusted to the setting amplitude, SS calibrating device 314 is used to calibrate SS signal that variable gain amplifier 313 produced and with its output, bandpass filter 315 is used for flip-flop and other interference component of filtering modulated voltage signal, detuner 316 usefulness reference signals are carried out demodulation to modulated voltage signal, and low-pass filter 317 is used for the modulating frequency composition of the signal of filtering detuner output.
With reference to Fig. 4, between gain region in, between input light intensity and the output SS signal linear relationship is arranged, because through calibration, when test signal is imported, there be error in straight line 321 between SS signal and the circuit design value without initial point.Straight line 322 shows SS signal and the expectation corresponding relation of importing light intensity.
Fig. 5 shows the hardware circuit synoptic diagram of SS signal calibration device according to one preferred embodiment of the present invention.As shown in Figure 5, SS signal calibration device 314 comprises: amplifier AMP, the SS signal that the negative input end of this amplifier AMP receives from variable gain amplifier 313 via first resistor R 1; Second resistor R 2 and the 3rd resistor R 3 are connected between the negative input end and output terminal of amplifier AMP, and wherein the 3rd resistor R 3 is an adjustable resistor; Be connected in series in the 4th, the 5th and the 6th resistor R 4-R6 between positive and negative power supply V+ and the V-, wherein the 5th resistor R 5 is an adjustable resistor, and the adjustable terminals of the 5th resistor R 5 are connected to the positive input terminal of amplifier AMP.
Wherein, by adjusting the amplitude that the 5th resistor R 5 can change the SS signal, by adjusting SS signal that the 3rd resistor R 3 can change final output and proportionate relationship from the SS signal of variable gain amplifier 313.In other words, SS signal calibration device 314 is adjusted the direct current biasing and the ratio of SS signal, wherein by adjusting that direct current biasing can be eliminated because the SS signal errors that leakage current and circuit noise produced, can eliminate inconsistency between each signal sampling channel by resize ratio.
Fig. 6 shows SS signal calibration flow process.Getting two different input signals in gain margin calibrates the SS signal.At first turn-off input signal, adjust variable gain amplifier 313 and make the satisfied amplitude of setting of output signal, the SS signal that record this moment may be non-vanishing, and this has just produced error with zero state of importing.This moment, to make the SS signal be zero by adjusting the 5th resistor R 5, and expression input light intensity is zero.Select another specific input light intensity value (such as, the maximal value of input range) then between gain region, adjust variable gain amplifier 313 and output signal is satisfied set amplitude, adjust the 3rd resistor R 3 this moment makes the SS signal reach setting value.Use identical input signal to adjust the SS signal of different signal pickup assemblies, can eliminate the inconsistency between the different acquisition device.
Described in this instructions is preferred specific embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art are under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment, all should be within as the scope of the present invention that claim defined.
Claims (6)
1. a litho machine registration signal multichannel collecting calibrating installation is characterized in that, comprising:
Photoelectric sensor is used for the light intensity signal through ovennodulation is converted to modulated current signal;
Prime amplifier is used for described modulated current signal is converted to modulated voltage signal;
Variable gain amplifier is used for described modulated voltage signal is adjusted to the setting amplitude;
Input signal strength signal calibration device is used to calibrate input signal strength signal that described variable gain amplifier produces and with its output, described input signal strength signal calibration device comprises:
Amplifier, the negative input end of this amplifier is via the input signal strength signal of first resistor reception from described variable gain amplifier;
Second resistor and the 3rd resistor are connected between the negative input end and output terminal of this amplifier, and wherein the 3rd resistor is an adjustable resistor;
Be connected in series in the 4th, the 5th and the 6th resistor between the positive and negative power supply, wherein the 5th resistor is an adjustable resistor, and the adjustable terminals of the 5th resistor are connected to the positive input terminal of this amplifier;
Bandpass filter is used for the flip-flop of the described modulated voltage signal of filtering and other interference component;
Detuner carries out demodulation with reference signal to described modulated voltage signal;
Low-pass filter is used for the modulating frequency composition of the signal of the described detuner of filtering output.
2. litho machine registration signal multichannel collecting calibrating installation as claimed in claim 1, it is characterized in that, described input signal strength signal calibration device is adjusted the direct current biasing and the ratio of input signal strength signal, wherein by adjusting that direct current biasing is eliminated because the input signal strength signal errors that leakage current and circuit noise produced, eliminate inconsistency between each signal sampling channel by resize ratio.
3. litho machine registration signal multichannel collecting calibrating installation as claimed in claim 1, it is characterized in that described variable gain amplifier is adjusted circuit by variable gain operational amplifier, modulated voltage signal effective value testing circuit, gain control signal generative circuit and interface signal amplitude and formed.
4. litho machine registration signal multichannel collecting calibrating installation as claimed in claim 1, it is characterized in that, it is the bandwidth-limited circuit of frequency modulating signal that described bandpass filter adopts centre frequency, non-modulation frequency content and flip-flop in the described modulated voltage signal of filtering.
5. litho machine registration signal multichannel collecting calibrating installation as claimed in claim 1, it is characterized in that, described detuner carries out multiplying with described modulated voltage signal and described reference signal, thereby separates frequency modulating signal and envelope signal frequency in the described modulated voltage signal.
6. litho machine registration signal multichannel collecting calibrating installation as claimed in claim 1 is characterized in that, the twice modulating frequency composition of described low pass filter filters out in the signal of described detuner output, and keep the envelope signal frequency content.
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| CN102540780B (en) * | 2010-12-28 | 2015-09-30 | 上海微电子装备有限公司 | For registration signal disposal system and the aligning signal processing method of lithographic equipment |
| CN108132452A (en) * | 2018-02-06 | 2018-06-08 | 苏州硬木智能科技有限公司 | It is a kind of for the detection calibration plate of signal acquiring board and its calibration and test method |
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| CN101482704A (en) * | 2008-12-10 | 2009-07-15 | 上海微电子装备有限公司 | Alignment light intensity signal collection and demodulation apparatus |
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| US4571712A (en) * | 1984-07-06 | 1986-02-18 | Storage Technology Partners Ii | Beam alignment signal processing |
| CN101246314B (en) * | 2008-03-25 | 2010-06-02 | 上海微电子装备有限公司 | Silicon slice alignment signal processing method |
| CN101374124B (en) * | 2008-09-27 | 2011-11-30 | 上海微电子装备有限公司 | Channel gain digital equalizing self-adapting calibration system and method |
| CN101487985B (en) * | 2009-02-18 | 2011-06-29 | 上海微电子装备有限公司 | Alignment mark search system used for photo-etching equipment and its alignment mark search method |
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| CN101482704A (en) * | 2008-12-10 | 2009-07-15 | 上海微电子装备有限公司 | Alignment light intensity signal collection and demodulation apparatus |
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| 杨兴平，程建瑞.微光信号探测对准技术.《电子工业专用设备》.2006,(第9期),全文. * |
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Address after: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Co-patentee after: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Co-patentee before: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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