CN101789362A - 一种等离子体处理装置及其处理方法 - Google Patents
一种等离子体处理装置及其处理方法 Download PDFInfo
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- CN101789362A CN101789362A CN201010106570A CN201010106570A CN101789362A CN 101789362 A CN101789362 A CN 101789362A CN 201010106570 A CN201010106570 A CN 201010106570A CN 201010106570 A CN201010106570 A CN 201010106570A CN 101789362 A CN101789362 A CN 101789362A
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102376521A (zh) * | 2010-08-11 | 2012-03-14 | 东京毅力科创株式会社 | 等离子体处理装置和等离子体控制方法 |
CN102387655A (zh) * | 2010-09-06 | 2012-03-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 用于等离子体设备的下电极及等离子体设备 |
CN103327723A (zh) * | 2012-03-23 | 2013-09-25 | 中微半导体设备(上海)有限公司 | 一种电容耦合等离子反应器及其控制方法 |
CN103872172A (zh) * | 2012-12-10 | 2014-06-18 | 中微半导体设备(上海)有限公司 | 一种太阳能电池的制绒方法 |
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2010
- 2010-02-05 CN CN2010101065700A patent/CN101789362B/zh active Active
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102376521A (zh) * | 2010-08-11 | 2012-03-14 | 东京毅力科创株式会社 | 等离子体处理装置和等离子体控制方法 |
US8829387B2 (en) | 2010-08-11 | 2014-09-09 | Tokyo Electron Limited | Plasma processing apparatus having hollow electrode on periphery and plasma control method |
CN102376521B (zh) * | 2010-08-11 | 2015-04-22 | 东京毅力科创株式会社 | 等离子体处理装置和等离子体控制方法 |
KR101839414B1 (ko) * | 2010-08-11 | 2018-03-16 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치 및 플라즈마 제어 방법 |
CN102387655A (zh) * | 2010-09-06 | 2012-03-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 用于等离子体设备的下电极及等离子体设备 |
CN102387655B (zh) * | 2010-09-06 | 2015-10-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 用于等离子体设备的下电极及等离子体设备 |
CN103327723A (zh) * | 2012-03-23 | 2013-09-25 | 中微半导体设备(上海)有限公司 | 一种电容耦合等离子反应器及其控制方法 |
CN103872172A (zh) * | 2012-12-10 | 2014-06-18 | 中微半导体设备(上海)有限公司 | 一种太阳能电池的制绒方法 |
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CN101789362B (zh) | 2011-10-05 |
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Denomination of invention: Plasma processing device and processing method thereof Effective date of registration: 20150202 Granted publication date: 20111005 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
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Date of cancellation: 20170809 Granted publication date: 20111005 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
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Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |
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