CN101788575A - Probe seat with micro-electroforming probes - Google Patents
Probe seat with micro-electroforming probes Download PDFInfo
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- CN101788575A CN101788575A CN200910002588A CN200910002588A CN101788575A CN 101788575 A CN101788575 A CN 101788575A CN 200910002588 A CN200910002588 A CN 200910002588A CN 200910002588 A CN200910002588 A CN 200910002588A CN 101788575 A CN101788575 A CN 101788575A
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- electroforming
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- contact jaw
- probe
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Abstract
The invention discloses a probe seat with micro-electroforming probes, which comprises a body and a bottom cover, wherein the bottom cover is fixedly arranged in a bottom groove on the central part of the body, a plurality of upper perforations with upper necks are formed on the central part of the body in a penetrating mode, and a plurality of lower perforations with lower necks are formed on the bottom cover in a penetrating mode; and the micro-electroforming probes are accommodated in the corresponding upper and lower perforations respectively, and the bent sections of the micro-electroforming probes can provide axial elastic deformation. Because a plurality of micro-electroforming probes are manufactured by micro-electroforming technology, the chip testing quality can be improved, the sizes of the micro-electroforming probes can be shortened, and the micro-electroforming probes are suitable for testing high-frequency chips.
Description
Technical field
The present invention relates to probe base, refer to a kind of probe base that is applicable to especially with micro-electroforming probes.
Background technology
As shown in Figure 1, it is shown as the cut-open view of existing probe, as shown in the figure, test mode to chip 95 to be measured, be after earlier being contacted with the contact 961 of probe 96, be contacted with the pin 951 of chip 95 to be measured to carry out the signal testing of chip 95 to be measured with the probe of probe 9 bunches 91 again with the contact stitch 93 of probe 9.
In Fig. 1, existing probe 9 is with spring 92 probe bunches 91 to be connected in series with contacting stitch 93, and the elastic force by spring 92 make probe bunches 91 with contact pin 951 that stitch 93 is contacted with chip 95 to be measured respectively, and the contact 961 of probe 96 between in order to test.
Because probe bunches 91, spring 92, and contact stitch 93 are three kinds of different parts and being made up, therefore need a sleeve pipe 94 and fix the existing probe 9 of back composition.
Probe 9 before testing since the elastic force of spring 92 make probe bunches 91, and contact stitch 93 be supported in the two ends of sleeve pipe 94 respectively; When probe 9 when testing, probe bunches 91, and contact stitch 93 compression springs 92 respectively.
Under desirable test environment, probe 9 should only have probe bunches 91, spring 92, and the sum total of contact stitch 93 in the resistance value in when test.But in the actual test, spring 92 is because of the compression deflection deformation, and wherein, the helical in spring 92 stage casings contacts with the inner tubal wall of sleeve pipe 94 because of meeting dynamically; In addition, probe 9 is the test because of accumulating over a long period also, and the helical in spring 92 stage casings is contacted because of the inner tubal wall of elastic fatigue with sleeve pipe 94, the resistance value of probe 9 when test is constantly changed, and influence test mass.
In addition, when the chip of test high frequency, requirement to probe 9 is shorter better, because existing probe by probe bunches 91, spring 92, contact stitch 93, and sleeve pipe 94 formed, be subject to spring 92, and hardware such as sleeve pipe 94 on restriction, make probe 9 reach short and small target, real in being difficult for.
Summary of the invention
The present invention is a kind of probe base with micro-electroforming probes, comprising: many micro-electroforming probes, an and probe base.
Many each micro-electroforming probes of micro-electroforming probes comprise contact jaw on, a bending segment, reach contact jaw, bending segment is connected between contact jaw and the following contact jaw, bending segment includes a curved structure at least, curved structure provide contact jaw and following contact jaw each other axially convergence or axial away from elastic deformation.It comprises a body probe base, an and bottom, the central part of body is concaved with an end groove, be installed with bottom in the end groove, the central part of body has provided a plurality of perforation of going up, the perforation top is provided with neck on each, bottom has provided a plurality of perforation down, and it corresponds to a plurality of perforation of going up respectively, each is provided with neck in the perforation below down, many micro-electroforming probes are located in corresponding a plurality of perforation of going up respectively, and in a plurality of perforation down, the last contact jaw of each micro-electroforming probes protrudes out outside the neck, and the following contact jaw of each micro-electroforming probes protrudes out down outside the neck.
Because many micro-electroforming probes are that galvanoplastics is made, therefore need not with the fixing upward contact jaw of sleeve pipe, bending segment, reach contact jaw down, the resistance value of its electroforming probes when test is fixed, and can improve the quality of test; Because many micro-electroforming probes are that galvanoplastics is made, therefore can shorten the size of micro-electroforming probes and can be applicable to the chip testing of high frequency.
Wherein, the last contact jaw of each micro-electroforming probes can include at least one thorn sour jujube.The curved structure of each micro-electroforming probes bending segment is a jagged line body, and it is triangle jaggies body, half round saw tooth trace body or circular arc jaggies body ... all can.
In addition, many micro-electroforming probes can be made in the following manner: be coated with a photoresist layer on a substrate; See through exposure, development and etching mode and on photoresist layer, leave a plurality of probe openings with above-mentioned probe external form; See through little electroforming process with electroplating deposition in a plurality of probe openings and form many micro-electroforming probes; Remove photoresist layer and substrate and take off many micro-electroforming probes.
Moreover the last contact jaw of each micro-electroforming probes can also be provided with a shoulder, and the shoulder correspondence is resisted against neck.The following contact jaw of each micro-electroforming probes also is provided with a shoulder, and the shoulder correspondence is resisted against down neck.Wherein, probe base also comprises a chip locating rack, and the chip locating rack is fixedly arranged on the probe base top.Bore a hole on each of probe base, reach to bore a hole under each and be the square perforation.
Description of drawings
Fig. 1 is the cut-open view of existing probe.
Fig. 2 is the stereographic map that the present invention has probe base one preferred embodiment of micro-electroforming probes.
Fig. 3 is the cut-open view that the present invention has probe base one preferred embodiment of micro-electroforming probes.
Fig. 4 is the synoptic diagram of micro-electroforming probes second preferred embodiment of the present invention.
Fig. 5～Fig. 8 is the present invention makes micro-electroforming probes with little galvanoplastics a process flow diagram.
Fig. 9 is that micro-electroforming probes of the present invention is attached to the synoptic diagram on the substrate.
[main element symbol description]
Contact jaw 11 thorn sour jujubes 111 on the micro-electroforming probes 1
Following contact jaw 13 shoulders 131 probe bases 2
Neck 214 bottoms 22 in the last perforation 212
Under the neck 224 chip locating racks 23 of boring a hole 222 times
Chip 3 pins 31 substrates 4 to be measured
Contact 961
Embodiment
Please consult Fig. 2 jointly, reach Fig. 3, Fig. 2 is the stereographic map that the present invention has probe base one preferred embodiment of micro-electroforming probes, and Fig. 3 is the cut-open view that the present invention has probe base one preferred embodiment of micro-electroforming probes.
As shown in the figure, a kind of probe base with micro-electroforming probes comprises many micro-electroforming probes 1, a probe base 2.
Wherein, each micro-electroforming probes 1 in many micro-electroforming probes 1 comprises contact jaw 11 on, a bending segment 12, reaches contact jaw 13, bending segment 12 is connected between contact jaw 11 and the following contact jaw 13, bending segment 12 includes the curved structure 121 of a bent radial at least, curved structure 121 provide contact jaw 11 and following contact jaw 13 each other axially convergence or axial away from elastic deformation.
As Fig. 2, and shown in Figure 3, the curved structure 121 of each micro-electroforming probes 1 bending segment 12 is a jagged line body, and it is a triangle jaggies body in present embodiment.
See also Fig. 4, it is the synoptic diagram of micro-electroforming probes second preferred embodiment of the present invention, the structure of a present embodiment and a last embodiment is roughly the same, it is a half round saw tooth trace body that the thought difference is in the curved structure 61 of present embodiment micro-electroforming probes 6, and the line style of curved structure is not limited to the above certainly.
See also Fig. 5～Fig. 8, it is the present invention makes micro-electroforming probes with little galvanoplastics a process flow diagram.As shown in the figure, many micro-electroforming probes 1 are to make in the following manner:
It is the first step of little electroforming as shown in Figure 5, be coating one photoresist layer 5 on a substrate 4, wherein substrate 4 be the best with reusable.It is second step of little electroforming as shown in Figure 6, see through exposure, development and etching mode on photoresist layer 5, leave have above-mentioned probe external form a plurality of probe openings 51 with mold as little electroforming.
The third step that in Fig. 7, shows little electroforming, it is that the described substrate 4 of second step is inserted in the electrolytic solution of electrolytic tank, substrate 4 is connect negative electrode with battery, will intend the plating rod and connect anode with battery, see through the redox reaction of chemistry, little electroforming process goes out to intend the metallic ion of plating rod with electroplating deposition on the substrate 4 in a plurality of probe openings 51, after after a while and form many micro-electroforming probes 1; Wherein, metal bar can be selected copper, silver or its alloy for use, can certainly add second phase in electroplating process, with strengthening probe structure and oxidation resistant characteristic.
Please consult Fig. 8 simultaneously, reach Fig. 9, Fig. 9 is that micro-electroforming probes of the present invention is attached to the synoptic diagram on the substrate.Fig. 9 is shown as the partial view of substrate 4, and generally speaking substrate 4 is circular substrates, and at every turn electroforming probes 1 quantity of coming out in 4 electroforming of substrate in the mode of little electroforming is according to the size of substrate 4 sizes, can reach the many of up to a hundred even thousands of.As Fig. 8, and shown in Figure 9, in the 4th step of Fig. 8, remove photoresist layer 5 with substrate 4 and take off the technology that many micro-electroforming probes 1 are promptly finished little electroforming.
Please consult Fig. 2 simultaneously, reach Fig. 3, it comprises a body 21, an and bottom 22 one probe base 2, the central part 210 of body 21 is concaved with an end groove 211, be installed with bottom 22 in the end groove 211, the central part 210 of body 21 has provided a plurality of perforation 212 of going up, perforation 212 tops are provided with neck 214 on each, and bottom 22 has provided a plurality of down perforation 222, and it corresponds to a plurality of perforation 212 of going up respectively, and each is provided with neck 224 in perforation 222 belows down.
Many micro-electroforming probes 1 are located in corresponding a plurality of upward perforation 212 respectively, reach in a plurality of perforation 222 down, the last contact jaw 11 of each micro-electroforming probes 1 also is provided with a shoulder 112, shoulder 112 correspondences are resisted against neck 214, the following contact jaw 13 of each micro-electroforming probes 1 also is provided with a shoulder 131, and shoulder 131 correspondences are resisted against down neck 224.
As Fig. 2, because each micro-electroforming probes 1 is the probe that is deposited out with little galvanoplastics, therefore each micro-electroforming probes 1 is square probe, thereby perforation 212 on each of probe base 2, and each down perforation 222 be the square perforation, can be piercing in perforation 212, and bore a hole 222 down to cooperate micro-electroforming probes 1; In addition, perforation 212 on each of probe base 2, and each down perforation 222 can laser or lithographic technique finish the square perforation.
As Fig. 3, the last contact jaw 11 of each micro-electroforming probes 1 protrudes out outside the neck 214, and the following contact jaw 13 of each micro-electroforming probes 1 protrudes out down outside the neck 224.
In Fig. 2, and Fig. 3 in, probe base 2 also comprises a chip locating rack 23, and chip locating rack 23 is fixedly arranged on probe base 2 tops, is positioned on the probe base 2 so that guide chip 3 to be measured, and the pin 31 of chip 3 is electrically contacted with the last contact jaw 11 of micro-electroforming probes 1, in order to test.As Fig. 3, and Fig. 9, the last contact jaw 11 of each micro-electroforming probes 1 includes three and stings sour jujubes 111, and it is beneficial to and pierces through the oxide layer on the pin 31 and electroforming probes 1 is electrically contacted effectively with the pin 31 of chip 3 when the pin 31 of contact chip 3.
Because many micro-electroforming probes 1 are made for galvanoplastics, therefore need not with the fixing upward contact jaw 11 of sleeve pipe, bending segment 12, reach contact jaw 13 down, the resistance value of its electroforming probes 1 when test is fixed, and can improve the quality of test; Because many micro-electroforming probes 1 make for galvanoplastics, so can shorten the size of micro-electroforming probes 1 and can be applicable to the chip testing of high frequency.
The foregoing description only is to give an example for convenience of description, and the interest field that the present invention advocated should be as the criterion so that claim is described certainly, but not only limits to the foregoing description.
Claims (8)
1. probe base with micro-electroforming probes is characterized in that comprising:
Many micro-electroforming probes, each micro-electroforming probes comprises contact jaw on, a bending segment, reaches contact jaw, this bending segment is connected on this between the contact jaw and this time contact jaw, this bending segment includes a curved structure at least, this curved structure provide contact jaw and this time contact jaw on this each other axially convergence or axially away from elastic deformation; And
One probe base, it comprises a body, an and bottom, the central part of this body is concaved with an end groove, be installed with this bottom in this end groove, this central part of this body has provided a plurality of perforation of going up, the perforation top is provided with neck on each, this bottom has provided a plurality of perforation down, and it corresponds to this a plurality of upward perforation respectively, each is provided with neck in the perforation below down, these many micro-electroforming probes are located in corresponding this a plurality of going up respectively and bore a hole, and in these a plurality of perforation down, the contact jaw of should going up of each micro-electroforming probes protrudes out on this outside neck, and this of each micro-electroforming probes time contact jaw protrudes out outside this time neck.
2. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, the contact jaw of should going up of each micro-electroforming probes comprises at least one thorn sour jujube.
3. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, this curved structure of each micro-electroforming probes bending segment is a jagged line body.
4. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, these many micro-electroforming probes are made in the following manner:
Be coated with a photoresist layer on a substrate;
See through exposure, development and etching mode and on this photoresist layer, leave a plurality of probe openings with above-mentioned probe external form;
See through little electroforming process with electroplating deposition in these a plurality of probe openings and these many micro-electroforming probes of formation; And
Remove this photoresist layer and this substrate and take off this many micro-electroforming probes.
5. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, the contact jaw of should going up of each micro-electroforming probes also is provided with a shoulder, and this shoulder correspondence is resisted against neck on this.
6. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, this of each micro-electroforming probes time contact jaw also is provided with a shoulder, and this shoulder correspondence is resisted against this time neck.
7. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, this probe base also comprises a chip locating rack, and this chip locating rack is fixedly arranged on this probe base top.
8. have the probe base of micro-electroforming probes according to claim 1, it is characterized in that, perforation on each of this probe base, and each down perforation be the square perforation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910002588A CN101788575A (en) | 2009-01-23 | 2009-01-23 | Probe seat with micro-electroforming probes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910002588A CN101788575A (en) | 2009-01-23 | 2009-01-23 | Probe seat with micro-electroforming probes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101788575A true CN101788575A (en) | 2010-07-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910002588A Pending CN101788575A (en) | 2009-01-23 | 2009-01-23 | Probe seat with micro-electroforming probes |
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| Country | Link |
|---|---|
| CN (1) | CN101788575A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108226703A (en) * | 2016-12-22 | 2018-06-29 | 蓝思科技（长沙）有限公司 | A kind of wrist-watch cover board loop circuit is without scuffing detection device |
| CN112162115A (en) * | 2020-09-04 | 2021-01-01 | 杭州探真纳米科技有限公司 | Manufacturing method of large-aspect-ratio diamond tip AFM probe |
-
2009
- 2009-01-23 CN CN200910002588A patent/CN101788575A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108226703A (en) * | 2016-12-22 | 2018-06-29 | 蓝思科技（长沙）有限公司 | A kind of wrist-watch cover board loop circuit is without scuffing detection device |
| CN112162115A (en) * | 2020-09-04 | 2021-01-01 | 杭州探真纳米科技有限公司 | Manufacturing method of large-aspect-ratio diamond tip AFM probe |
| CN112162115B (en) * | 2020-09-04 | 2024-02-13 | 杭州探真纳米科技有限公司 | Manufacturing method of large-aspect-ratio diamond needle tip AFM probe |
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Open date: 20100728 |