CN101768104B - Method for producing light stabilizer sebacic acid (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) diester - Google Patents
Method for producing light stabilizer sebacic acid (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) diester Download PDFInfo
- Publication number
- CN101768104B CN101768104B CN2010100172029A CN201010017202A CN101768104B CN 101768104 B CN101768104 B CN 101768104B CN 2010100172029 A CN2010100172029 A CN 2010100172029A CN 201010017202 A CN201010017202 A CN 201010017202A CN 101768104 B CN101768104 B CN 101768104B
- Authority
- CN
- China
- Prior art keywords
- pentamethyl
- piperidyl
- sebacic acid
- catalyzer
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 title claims abstract description 51
- -1 1, 2, 2, 6, 6-pentamethyl-4-piperidyl Chemical group 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000004611 light stabiliser Substances 0.000 title abstract description 3
- 150000005690 diesters Chemical class 0.000 title abstract 4
- ALOUNLDAKADEEB-UHFFFAOYSA-N dimethyl sebacate Chemical compound COC(=O)CCCCCCCCC(=O)OC ALOUNLDAKADEEB-UHFFFAOYSA-N 0.000 claims abstract description 38
- 238000006243 chemical reaction Methods 0.000 claims abstract description 25
- 229940014772 dimethyl sebacate Drugs 0.000 claims abstract description 19
- 239000002904 solvent Substances 0.000 claims abstract description 13
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 11
- 230000035484 reaction time Effects 0.000 claims abstract description 10
- NWHNXXMYEICZAT-UHFFFAOYSA-N 1,2,2,6,6-pentamethylpiperidin-4-ol Chemical class CN1C(C)(C)CC(O)CC1(C)C NWHNXXMYEICZAT-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 150000002148 esters Chemical class 0.000 claims description 20
- 238000001556 precipitation Methods 0.000 claims description 8
- 238000005809 transesterification reaction Methods 0.000 claims description 7
- 239000012044 organic layer Substances 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 abstract description 4
- 238000005265 energy consumption Methods 0.000 abstract description 2
- 238000003912 environmental pollution Methods 0.000 abstract description 2
- 238000000746 purification Methods 0.000 abstract description 2
- 238000000926 separation method Methods 0.000 abstract description 2
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 230000002194 synthesizing effect Effects 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000012074 organic phase Substances 0.000 description 12
- 238000009835 boiling Methods 0.000 description 7
- 238000012544 monitoring process Methods 0.000 description 6
- 238000010792 warming Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- XULIXFLCVXWHRF-UHFFFAOYSA-N 1,2,2,6,6-pentamethylpiperidine Chemical class CN1C(C)(C)CCCC1(C)C XULIXFLCVXWHRF-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920002943 EPDM rubber Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- OSYQOBUUFRGFNG-UHFFFAOYSA-N Sebacic acid monomethyl ester Chemical class COC(=O)CCCCCCCCC(O)=O OSYQOBUUFRGFNG-UHFFFAOYSA-N 0.000 description 1
- 229920002877 acrylic styrene acrylonitrile Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- YHEPZZFDBQOSSN-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate;1-o-methyl 10-o-(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound COC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1.C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 YHEPZZFDBQOSSN-UHFFFAOYSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 229920005669 high impact polystyrene Polymers 0.000 description 1
- 239000004797 high-impact polystyrene Substances 0.000 description 1
- 239000004434 industrial solvent Substances 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 230000003019 stabilising effect Effects 0.000 description 1
- 229920000638 styrene acrylonitrile Polymers 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
Landscapes
- Hydrogenated Pyridines (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010100172029A CN101768104B (en) | 2010-01-04 | 2010-01-04 | Method for producing light stabilizer sebacic acid (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) diester |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010100172029A CN101768104B (en) | 2010-01-04 | 2010-01-04 | Method for producing light stabilizer sebacic acid (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) diester |
Publications (2)
Publication Number | Publication Date |
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CN101768104A CN101768104A (en) | 2010-07-07 |
CN101768104B true CN101768104B (en) | 2012-07-25 |
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CN2010100172029A Expired - Fee Related CN101768104B (en) | 2010-01-04 | 2010-01-04 | Method for producing light stabilizer sebacic acid (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) diester |
Country Status (1)
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CN (1) | CN101768104B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102016212379A1 (en) | 2016-07-07 | 2018-01-11 | Evonik Degussa Gmbh | Process for the preparation of an N-methyl-substituted triacetoneamine compound |
CN110396060A (en) * | 2019-07-12 | 2019-11-01 | 西安工业大学 | A kind of light stabilizer and preparation method thereof containing double hindered piperidine bases |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4021432A (en) * | 1971-11-30 | 1977-05-03 | Ciba-Geigy Corporation | Piperidine derivatives |
CN1347937A (en) * | 2000-10-09 | 2002-05-08 | 奇钛科技有限公司 | Composition containing piperidine derivative |
-
2010
- 2010-01-04 CN CN2010100172029A patent/CN101768104B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4021432A (en) * | 1971-11-30 | 1977-05-03 | Ciba-Geigy Corporation | Piperidine derivatives |
CN1347937A (en) * | 2000-10-09 | 2002-05-08 | 奇钛科技有限公司 | Composition containing piperidine derivative |
Non-Patent Citations (6)
Title |
---|
􀦞 |
􁟤 |
􁟤􀦞.《中国博士学位论文》.2009,33-38. * |
.《中国博士学位论文》.2009,33-38. |
刘军生.受阻胺类光稳定剂Tinuvin765的合成工艺研究.《广州化工》.2009,第37卷(第3期),136-138. * |
邓义.受阻胺类光稳定剂的设计、合成及表征􀧜 * |
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CN101768104A (en) | 2010-07-07 |
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Owner name: JIANG RONGBO Free format text: FORMER OWNER: NANTONG HUIKANG INTERNATIONAL ENTERPRISE CO., LTD. Effective date: 20140519 |
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Free format text: CORRECT: ADDRESS; FROM: 226009 NANTONG, JIANGSU PROVINCE TO: 226600 NANTONG, JIANGSU PROVINCE |
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Effective date of registration: 20140519 Address after: Ten Haian County, Jiangsu Province, the town of grand duke in the village of the Group No. 16, No., No. 226600 Patentee after: Jiang Rongbo Address before: 226009 No. 9, Xing Xing Road, Nantong economic and Technological Development Zone, Jiangsu, China Patentee before: Nantong Huikang International Enterprise Co., Ltd. |
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Owner name: WANG YINGFENG Effective date: 20150123 |
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Effective date of registration: 20150123 Address after: Ten Haian County, Jiangsu Province, the town of grand duke in the village of the Group No. 16, No., No. 226600 Patentee after: Jiang Rongbo Patentee after: Wang Yingfeng Address before: Ten Haian County, Jiangsu Province, the town of grand duke in the village of the Group No. 16, No., No. 226600 Patentee before: Jiang Rongbo |
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Effective date of registration: 20170331 Address after: 226299 Jiangsu Development Zone, Nantong business outsourcing center, block D, floor 3 Patentee after: Nantong Huikang International Trade Co. Ltd. Address before: Ten Haian County, Jiangsu Province, the town of grand duke in the village of the Group No. 16, No., No. 226600 Patentee before: Jiang Rongbo Patentee before: Wang Yingfeng |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120725 Termination date: 20190104 |
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