CN101736300A - Magnetic control sputtering target - Google Patents
Magnetic control sputtering target Download PDFInfo
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- CN101736300A CN101736300A CN200810228885A CN200810228885A CN101736300A CN 101736300 A CN101736300 A CN 101736300A CN 200810228885 A CN200810228885 A CN 200810228885A CN 200810228885 A CN200810228885 A CN 200810228885A CN 101736300 A CN101736300 A CN 101736300A
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Abstract
The invention discloses a permanent-magnet magnetic control sputtering target with a round plane, which can sputter magnetic materials and is composed of an outer shield cover, a magnetic steel seat, a pole shoe, an insulating seat, a permanent seat, a target gland bush, inner magnetic steel, outer magnetic steel, a water inlet nozzle, a water outlet nozzle, an attachment bolt, a hermetical rubber, and the like, wherein a thread manual adjustable structure is adopted between the outer shield cover and the permanent seat, the materials of the magnetic steel seat are oxygen-free copper, the inner magnetic steel is arranged at the center of the magnetic steel seat, the periphery of the magnetic steel seat is drilled to form a plurality of pinholes for installing the outer magnetic steel, and target materials are directly laid on the magnetic steel seat and fixed by the target gland bush. The pole shoe is made of permeability materials, when the magnetic control target works, a direct current or radio-frequency power supply is applied to the pole shoe, the water inlet nozzle and the water outlet nozzle are welded by argon arc welding under the pole shoe, cooling water enters from a low place and outflows from a high place, and hermetical seal is realized by the hermetical rubber ring. The materials of the insulating seat are temperature-resistant insulating materials which can be used in vacuum, and are installed between the permanent seat (anode) and the pole shoe (cathode), and an insulating cap has the insulating action between an electriferous screw (cathode) and the permanent seat (anode). The invention has simple structure and low cost.
Description
Technical field
The present invention relates to the filming equipment field, especially a kind of circular flat magnetron sputtering target of permanent magnet that can the sputter magneticsubstance.
Background technology
At present, prepare at home in the plated film field, usually the main flow of magnetron sputtering as sputtering technology, its major cause is exactly " at a high speed ", " low temperature " characteristics of magnetron sputtering, and it can deposit the film of any plating material on any base material.Typical circular plane permanent magnetic target technology that can the sputter nonmagnetic substance is quite ripe, and for can sputter iron, the magnetic controlling target of magnetic material such as nickel, cobalt, generally have two kinds, a kind of is the electromagnetism target, and another kind is the strong magnetic target of circular flat with typical circular plane permanent magnetic target remodeling.
But there are some drawbacks in the electromagnetism target:
1. in galvanization, the magnetic field that hot-wire coil produces is subjected to line voltage, coil turn, coil material and human factor etc. to influence less stable, even the film quality for preparing under identical condition is also not necessarily identical;
2. in the target working process, owing to be subjected to the restriction of structure, often do not reach the magnetic field requirement of anticipation, think constantly to increase electric current and reach the anticipation magneticstrength and but usually blow solenoid;
3. the cost of electromagnetism target is also high a lot of than permanent magnetism target, and except direct supply of needs also needs to join a field power supply, cost approximately is 1.5 times of permanent magnetism target.
With the strong magnetic target of typical circular plane permanent magnetic target remodeling, magnet steel directly steeps in water coolant, and the time has been grown magnet steel and has been easy to demagnetization.
Summary of the invention
In order to solve the problems of the technologies described above, the invention provides a kind of magnet steel and expose below target, water coolant discord magnet steel is the magnetic controlling target that is used for the sputter magneticsubstance of contact directly.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of circular flat magnetron sputtering target of permanent magnet of sputter magneticsubstance, comprise external shield 1, magnet steel seat 2, pole shoe 3, bench insulator 8, permanent seat 6, target gland 13, interior magnet steel 12, outer steel 11, water inlet tap 7, faucet 4, attachment bolt and sealing rubber ring 10,10 ', 10 ", 10 " '; Target 14 is placed directly on the magnet steel seat 2, and is fixing by target gland 13; Magnet steel seat 2 materials are oxygen free copper, and interior magnet steel 12 is put at the center, and periphery bores some apertures puts outer steel 11, and interior magnet steel 12 and outer steel 11 polarity are towards on the contrary; Pole shoe 3 materials are magnetically permeable material, and direct current or radio-frequency power supply are added on the pole shoe 3 during magnetic controlling target work; Welding water inlet tap 7 and faucets 4 below the pole shoe 3, the water coolant low in and high out, by sealing rubber ring 10,10 ', 10 ", 10 " ' realize that sealing directly contacts to guarantee internal-external magnetic steel discord water coolant.
Adopt the manual adjustable structure of screw thread between described external shield 1 and the permanent seat 6, can the whole cover of target headband electricity part be got up, prevent discharge according to the thickness up-down adjustment of target.
The heat-resistant insulation material of described bench insulator 8 for using under vacuum plays the insulating effect between permanent seat 6 and the pole shoe 3; Screw 15 ' pass bench insulator 8 to be screwed on the magnet steel seat 2 is pressed on pole shoe 3 between bench insulator 8 and the magnet steel seat 2; All charged during 2 work of pole shoe 3 and magnet steel seat, screw 15 ' also charged, for fear of screw 15 ' and permanent seat 6 between discharge, fill in betweens with insulator cap 5 and play insulating effect; O-ring seal 10 between permanent seat 6 and the bench insulator 8 ' by screw 15 is screwed on the screw cover 9 and compresses.
The present invention is used for the almost adjacent target lower surface of magnetic controlling target magnet steel of sputter magneticsubstance, and the high magnetic flux density that forms at the target upper surface is bigger, can sputter than the thicker ferromagnetic target of strong magnetic target with typical circular plane permanent magnetic target remodeling.Magnet steel discord water coolant directly contacts, and has prolonged the practical life of target.The present invention is simple in structure, and cost is low.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Among the figure: 1. external shield, 2. magnet steel seat, 3. pole shoe, 4. faucet, 5. insulator cap, 6. permanent seat, 7. water inlet tap, 8. bench insulator, 9. screw cover, 10 (10 ', 10 ", 10 " '). sealing rubber ring, 11. outer steel, 12. interior magnet steel, 13. target glands, 14. targets, 15 and 15 '. screw.
Embodiment
Below in conjunction with accompanying drawing structure of the present invention and principle are described in further detail.
As shown in Figure 1, a kind of circular flat magnetron sputtering target of permanent magnet that can the sputter magneticsubstance, comprise external shield 1, magnet steel seat 2, pole shoe 3, bench insulator 8, permanent seat 6, target gland 13, interior magnet steel 12, outer steel 11, water inlet tap 7, faucet 4, attachment bolt and sealing rubber ring 10,10 ', 10 ", 10 " '; Target 14 is placed directly on the magnet steel seat 2, and is fixing by target gland 13; Magnet steel seat 2 materials are oxygen free copper, and interior magnet steel 12 is put at the center, and periphery bores some apertures puts outer steel 11, and interior magnet steel 12 and outer steel 11 polarity are towards on the contrary; Pole shoe 3 materials are magnetically permeable material, and direct current or radio-frequency power supply are added on the pole shoe 3 during magnetic controlling target work; Welding water inlet tap 7 and faucets 4 below the pole shoe 3, the water coolant low in and high out, by sealing rubber ring 10,10 ', 10 ", 10 " ' realize that sealing directly contacts to guarantee internal-external magnetic steel discord water coolant.
Adopt the manual adjustable structure of screw thread between external shield 1 and the permanent seat 6, can the whole cover of target headband electricity part be got up, prevent discharge according to the thickness up-down adjustment of target.Magnet steel seat 2 materials are oxygen free copper, and interior magnet steel 12 is put at the center, and periphery bores some apertures puts outer steel 11, and interior magnet steel and outer steel polarity are towards on the contrary.Target 14 is placed directly on the magnet steel seat 2, and is fixing by target gland 13.Pole shoe 3 is installed in below the magnet steel seat 2, is magnetically permeable material, and direct current or radio-frequency power supply are added on the pole shoe 3 during magnetic controlling target work.Argon arc welding welding water inlet tap 7 and faucet 4 below the pole shoe 3, the water coolant low in and high out is by sealing rubber ring 10 " and 10 " ' realization sealing.The heat-resistant insulation material of bench insulator 8 for using under vacuum plays the insulating effect between permanent seat 6 and the pole shoe 3.Screw 15 ' pass bench insulator 8 to be screwed on the magnet steel seat 2 is pressed on pole shoe 3 between bench insulator 8 and the magnet steel seat 2.All charged during 2 work of pole shoe 3 and magnet steel seat, screw 15 ' also charged, for fear of screw 15 ' and permanent seat 6 between discharge, fill in betweens with insulator cap 5 and play insulating effect.O-ring seal 10 between permanent seat 6 and the bench insulator 8 ' by screw 15 is screwed on the screw cover 9 and compresses.
Claims (3)
1. the circular flat magnetron sputtering target of the permanent magnet of a sputter magneticsubstance comprises external shield (1), magnet steel seat (2), pole shoe (3), bench insulator (8), permanent seat (6), target gland (13), interior magnet steel (12), outer steel (11), water inlet tap (7), faucet (4), attachment bolt and sealing rubber ring (10,10 ', 10 ", 10 " '); It is characterized in that: target (14) is placed directly on the magnet steel seat (2), and is fixing by target gland (13); Magnet steel seat (2) material is an oxygen free copper, and interior magnet steel (12) is put at the center, and periphery bores some apertures puts outer steel (11), and interior magnet steel (12) and outer steel (11) polarity are towards on the contrary; Pole shoe (3) material is a magnetically permeable material, and direct current or radio-frequency power supply are added on the pole shoe (3) during magnetic controlling target work; Welding water inlet tap (7) and faucet (4) below the pole shoe (3), the water coolant low in and high out realizes that by sealing rubber ring (10,10 ', 10 ", 10 " ') sealing directly contacts to guarantee the internal-external magnetic steel water coolant of getting along well.
2. according to the described sputtering target of claim 1, it is characterized in that: adopt the manual adjustable structure of screw thread between external shield (1) and the permanent seat (6), can the whole cover of target headband electricity part be got up, prevent discharge according to the thickness up-down adjustment of target.
3. according to the described sputtering target of claim 1, it is characterized in that: the heat-resistant insulation material of bench insulator (8) for using under vacuum, play the insulating effect between permanent seat (6) and the pole shoe (3); Screw (15 ') passes bench insulator (8) and is screwed on the magnet steel seat (2), and pole shoe (3) is pressed between bench insulator (8) and the magnet steel seat (2); All charged when pole shoe (3) and magnet steel seat (2) work, screw (15 ') is also charged, for fear of discharge between screw (15 ') and the permanent seat (6), plays insulating effect with insulator cap (5) plug between; O-ring seal (10 ') between permanent seat (6) and the bench insulator (8) is screwed on the screw cover (9) by screw (15) and compresses.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102288855A CN101736300B (en) | 2008-11-19 | 2008-11-19 | Magnetic control sputtering target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102288855A CN101736300B (en) | 2008-11-19 | 2008-11-19 | Magnetic control sputtering target |
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| Publication Number | Publication Date |
|---|---|
| CN101736300A true CN101736300A (en) | 2010-06-16 |
| CN101736300B CN101736300B (en) | 2012-04-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2008102288855A Active CN101736300B (en) | 2008-11-19 | 2008-11-19 | Magnetic control sputtering target |
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Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102164450A (en) * | 2010-12-23 | 2011-08-24 | 中国原子能科学研究院 | Swinging tritium-titanium target device |
| CN102296274A (en) * | 2011-08-18 | 2011-12-28 | 北京镨玛泰克真空科技有限公司 | Shielding device for cathode arc metal ion source |
| CN102330061A (en) * | 2011-09-19 | 2012-01-25 | 衡阳市真空机电设备有限公司 | Magnetic water separation type planar magnetron sputtering target |
| CN102796979A (en) * | 2012-07-31 | 2012-11-28 | 江苏银盛电缆科技有限公司 | Assistant for tinning copper-clad aluminum-magnesium alloy |
| CN102864426A (en) * | 2012-09-27 | 2013-01-09 | 中国科学院长春光学精密机械与物理研究所 | Circular magnetron sputtering device |
| CN103388124A (en) * | 2012-05-10 | 2013-11-13 | 三星显示有限公司 | Sputter device and method for depositing thin film using the same |
| CN103938165A (en) * | 2013-01-23 | 2014-07-23 | 上海北玻镀膜技术工业有限公司 | Novel cathode magnetic steel |
| CN103952673A (en) * | 2014-04-01 | 2014-07-30 | 中国电子科技集团公司第四十八研究所 | Cooling water entrance and exit structure used for multi-station sputtering target in vacuum chamber |
| CN104046949A (en) * | 2014-05-27 | 2014-09-17 | 江西沃格光电股份有限公司 | Magnetron sputtering device and sputtering cathode thereof |
| CN104404463A (en) * | 2014-11-14 | 2015-03-11 | 河海大学 | Planar magnetron sputtering target |
| CN104532202A (en) * | 2015-01-22 | 2015-04-22 | 钢铁研究总院 | Middle and low-vacuum magnetron sputtering target cathode |
| CN108578913A (en) * | 2018-04-20 | 2018-09-28 | 上海联影医疗科技有限公司 | A kind of X-ray target assembly and radiotherapy apparatus |
| CN109778127A (en) * | 2017-11-13 | 2019-05-21 | 佳能特机株式会社 | Sputtering equipment |
| CN114369803A (en) * | 2021-12-29 | 2022-04-19 | 上海子创镀膜技术有限公司 | Novel co-sputtering biplane magnetic control target |
| CN114959614A (en) * | 2022-06-20 | 2022-08-30 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering target electrode connecting device |
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| CN1439740A (en) * | 2002-05-22 | 2003-09-03 | 甘肃工业大学 | Planar magnetic control sputtering cathode with double-faced sputter |
| ATE395447T1 (en) * | 2004-06-22 | 2008-05-15 | Applied Materials Gmbh & Co Kg | SPUTTING CATODE FOR COATING PROCESSES |
| CN1944707A (en) * | 2006-09-27 | 2007-04-11 | 中国科学院上海光学精密机械研究所 | Permanent magnet gun target device of magnetron sputtering coating machine |
| CN201296778Y (en) * | 2008-11-19 | 2009-08-26 | 中国科学院沈阳科学仪器研制中心有限公司 | Magnetic controlled target for sputtering magnetic material |
-
2008
- 2008-11-19 CN CN2008102288855A patent/CN101736300B/en active Active
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102164450A (en) * | 2010-12-23 | 2011-08-24 | 中国原子能科学研究院 | Swinging tritium-titanium target device |
| CN102164450B (en) * | 2010-12-23 | 2012-08-08 | 中国原子能科学研究院 | Swinging tritium-titanium target device |
| CN102296274A (en) * | 2011-08-18 | 2011-12-28 | 北京镨玛泰克真空科技有限公司 | Shielding device for cathode arc metal ion source |
| CN102296274B (en) * | 2011-08-18 | 2013-11-27 | 北京镨玛泰克真空科技有限公司 | Shielding device for cathode arc metal ion source |
| CN102330061A (en) * | 2011-09-19 | 2012-01-25 | 衡阳市真空机电设备有限公司 | Magnetic water separation type planar magnetron sputtering target |
| CN103388124A (en) * | 2012-05-10 | 2013-11-13 | 三星显示有限公司 | Sputter device and method for depositing thin film using the same |
| CN102796979A (en) * | 2012-07-31 | 2012-11-28 | 江苏银盛电缆科技有限公司 | Assistant for tinning copper-clad aluminum-magnesium alloy |
| CN102864426A (en) * | 2012-09-27 | 2013-01-09 | 中国科学院长春光学精密机械与物理研究所 | Circular magnetron sputtering device |
| CN102864426B (en) * | 2012-09-27 | 2014-07-09 | 中国科学院长春光学精密机械与物理研究所 | Circular magnetron sputtering device |
| CN103938165A (en) * | 2013-01-23 | 2014-07-23 | 上海北玻镀膜技术工业有限公司 | Novel cathode magnetic steel |
| CN103952673A (en) * | 2014-04-01 | 2014-07-30 | 中国电子科技集团公司第四十八研究所 | Cooling water entrance and exit structure used for multi-station sputtering target in vacuum chamber |
| CN103952673B (en) * | 2014-04-01 | 2016-05-18 | 中国电子科技集团公司第四十八研究所 | A kind of turnover of the cooling water for multistation sputtering target in vacuum chamber structure |
| CN104046949A (en) * | 2014-05-27 | 2014-09-17 | 江西沃格光电股份有限公司 | Magnetron sputtering device and sputtering cathode thereof |
| CN104046949B (en) * | 2014-05-27 | 2017-01-04 | 江西沃格光电股份有限公司 | Magnetic control sputtering device and sputter cathode thereof |
| CN104404463A (en) * | 2014-11-14 | 2015-03-11 | 河海大学 | Planar magnetron sputtering target |
| CN104532202A (en) * | 2015-01-22 | 2015-04-22 | 钢铁研究总院 | Middle and low-vacuum magnetron sputtering target cathode |
| CN109778127A (en) * | 2017-11-13 | 2019-05-21 | 佳能特机株式会社 | Sputtering equipment |
| CN109778127B (en) * | 2017-11-13 | 2022-10-21 | 佳能特机株式会社 | Sputtering device |
| CN108578913A (en) * | 2018-04-20 | 2018-09-28 | 上海联影医疗科技有限公司 | A kind of X-ray target assembly and radiotherapy apparatus |
| CN114369803A (en) * | 2021-12-29 | 2022-04-19 | 上海子创镀膜技术有限公司 | Novel co-sputtering biplane magnetic control target |
| CN114959614A (en) * | 2022-06-20 | 2022-08-30 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering target electrode connecting device |
| CN114959614B (en) * | 2022-06-20 | 2024-02-23 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering target electrode connecting device |
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| CN101736300B (en) | 2012-04-11 |
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Address after: Hunnan Shenyang 110168 Liaoning province Xinyuan street, No. 1 Patentee after: Shenyang Scientific Apparatus Co., Ltd. of Chinese Academy of Sciences Address before: Hunnan Shenyang 110168 Liaoning province Xinyuan street, No. 1 Patentee before: Shenyang Scientific Instrument Research & Mfg. Center Co., Ltd., C.A.S |