CN101723707A - Preparation method of high-temperature-resistant anti-infrared thermal radiation energy-saving coating - Google Patents
Preparation method of high-temperature-resistant anti-infrared thermal radiation energy-saving coating Download PDFInfo
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- CN101723707A CN101723707A CN200910234322A CN200910234322A CN101723707A CN 101723707 A CN101723707 A CN 101723707A CN 200910234322 A CN200910234322 A CN 200910234322A CN 200910234322 A CN200910234322 A CN 200910234322A CN 101723707 A CN101723707 A CN 101723707A
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- 238000000576 coating method Methods 0.000 title claims abstract description 44
- 239000011248 coating agent Substances 0.000 title claims abstract description 42
- 230000005855 radiation Effects 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000011591 potassium Substances 0.000 claims abstract description 20
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 20
- 239000002002 slurry Substances 0.000 claims abstract description 12
- 238000002310 reflectometry Methods 0.000 claims abstract description 11
- 238000005245 sintering Methods 0.000 claims abstract description 11
- 239000011819 refractory material Substances 0.000 claims abstract description 4
- 238000003756 stirring Methods 0.000 claims abstract description 4
- 239000000835 fiber Substances 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 30
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 claims description 25
- 239000013078 crystal Substances 0.000 claims description 23
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 18
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 159000000003 magnesium salts Chemical class 0.000 claims description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 4
- 239000010980 sapphire Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 3
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 3
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052839 forsterite Inorganic materials 0.000 claims description 3
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 claims description 3
- 239000000395 magnesium oxide Substances 0.000 claims description 3
- 229910052863 mullite Inorganic materials 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 claims 1
- 230000035939 shock Effects 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 10
- 238000012360 testing method Methods 0.000 abstract description 6
- 239000010936 titanium Substances 0.000 abstract description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract description 4
- 239000012774 insulation material Substances 0.000 abstract description 3
- 229910052719 titanium Inorganic materials 0.000 abstract description 3
- 239000002657 fibrous material Substances 0.000 abstract 2
- 238000013112 stability test Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 14
- 238000005265 energy consumption Methods 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- KYNKUCOQLYEJPH-UHFFFAOYSA-N [K][Ti] Chemical compound [K][Ti] KYNKUCOQLYEJPH-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000011449 brick Substances 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- WEUCVIBPSSMHJG-UHFFFAOYSA-N calcium titanate Chemical compound [O-2].[O-2].[O-2].[Ca+2].[Ti+4] WEUCVIBPSSMHJG-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- -1 pottery Substances 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
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Abstract
The invention discloses a preparation method of a high-temperature-resistant anti-infrared thermal radiation energy-saving coating, which comprises the steps of adding inorganic whisker or/and fiber material into sol containing titanium and potassium, uniformly stirring to form slurry, then coating the slurry on the surface of a heat insulation material, a refractory material or a heat insulation material, and sintering at 200-700 ℃ for 0.5-5 h to form a compact coating with the thickness of 0.1-5 mm; wherein the content of the inorganic whisker or/and the fiber material in the slurry is 5-70 wt%. The compact coating with the thickness of 0.1-5 mm prepared by the method has the infrared heat radiation reflectivity of more than 90% at the wavelength of 500-2500 nm within the temperature range of 400-1200 ℃, the thermal shock stability test is carried out at 1000 ℃, and no crack appears after 5 times of tests.
Description
Technical field
The invention belongs to the thermal insulating coating field, be specifically related to a kind of preparation method that can reflect the heat insulating coat of the infrared emanation under the high temperature.
Background technology
Along with China's rapid economy development, demand for energy increases day by day, and energy shortage has become the important restraining factors of Economic development.Industrial Stoves are the main energy consumption equipment in the industrial production, the energy that annual quantity consumed is huge.Especially in the heat-processed in metallurgy, building materials, pottery, glass, chemical industry and dynamo-electric enterprise, the energy consumption of industrial furnace can account for 40~70% of total energy consumption
[1]By the end of 2007, about 120,000 of the total all types of industries stove of China, a year total power consumption reaches 2.5 hundred million tce, accounts for 1/4 of national total energy consumption, accounts for 60% of industrial total energy consumption.Though China's industrial furnace technology has had significant progress since reform and opening-up, but the energy utilization aggregate level of industrial furnace is not high, only be equivalent to developed country's level of 50~sixties, the thermo-efficiency of industrial furnace is on average less than 30%, and the thermo-efficiency average out to of industrial furnace more than 50% in the world
[2]
When Industrial Stoves temperature during greater than 400 ℃, based on infrared radiation heat transfer.And the infra-red heat reflectance coating has high reflectance to the infrared band in the radiation, can suppress the rising of coatingsurface temperature and reduce the coverture internal temperature simultaneously, thereby play heat insulation and energy-conserving action.
Potassium titanate is at first by the high temperature resistant heat insulation material of NASA(The National Aeronautics and Space Administration) (NASA) as the Saturn rocket nozzle
[3-4], wherein use the silicon sol of very high share, and the silicon sol infrared reflectance is low, can weaken potassium titanate to thermal-radiating reflecting effect.By accompanying drawing 1
[4]As can be seen, the infrared reflectance (curve A) of the lagging material of the infrared reflectance (curve B) of the lagging material of patent USA:US3296060 invention and patent USA:US3551266 invention begins to descend at the wave band of 1200nm~2200nm.HughGulledge studies show that when potassium titanate fiber being made thickness and be the pad of 2.54mm, is 91.6% to the reflectivity of wavelength 900~2400nm.To make the special retort furnace of lagging material with potassium titanate fiber compares with the standard retort furnace of making lagging material with refractory brick, as long as the result shows the thickness of the standard of using retort furnace lagging material 1/3, make the special retort furnace of lagging material of potassium titanate fiber and just can save about 2/3 cumulative volume, from 21 ℃ of times that are warmed up to 1000 ℃ are 1/6 of standard retort furnaces, the energy that consumes 1038 ℃ of whens insulation has only about 1/2 of standard retort furnace
[5]But the potassium titanate fiber of more than using requires the length must be greater than 0.5mm, otherwise is difficult to be shaped.Yet this class potassium titanate macrofiber need be at molybdate (M
2MoO
4) fused salt or tungstate (M
2WO
4) could generate in the fused salt
[6], because molybdate (M
2MoO
4), tungstate (M
2WO
4) cost an arm and a leg, the potassium titanate macrofiber price of being produced is above 100,000 yuan/ton; And the potassium titanate price of domestic production at present is lower than 50,000 yuan/ton, and length only has 10~100 μ m
[7-8], be unfavorable for being shaped, thereby restricted its industrial applications aspect heat insulation.
Patent CN1995250A discloses a kind of thermostable heat-isolating coating
[9], this coating is matrix with the silicone resin, the life-time service temperature can not satisfy the high temperature requirement of general industry kiln for having only 600 ℃.
The colloidal sol that contains titanium, potassium element can be pure potassium titanate by the thermal treatment growth in situ when titanium potassium compares for certain value.Money Tsing-Hua University etc. are with Ti (n-OC
4H
9)
4And CH
3COOK is a presoma, has prepared the colloidal sol of different titanium potassium ratios according to the titanium potassium ratio in the different potassium titanate molecular compositions.TiO
2/ K
2O=2, the Ti (n-OC of 4,6 (mol ratios)
4H
9)
4-CH
3COOK colloidal sol by filming, can obtain serial potassium titanate film through Overheating Treatment
[10-12]But the potassium titanate film thickness that this method makes only has 300nm, degree of crystallinity and intensity all lower, is used as electrode materials; If use as heat insulating coat, because thickness is too thin, then infrared reflectance is low, has only 20%; If directly make the coating that thickness surpasses 100 μ m with potassium titanate colloidal sol, carry out the thermal shock resistance check at 1000 ℃, after 1 test, just ftracture, peel off, can not use.
Summary of the invention
Because when temperature during greater than 400 ℃, the radiative transfer mode is taken heat transfer type as the leading factor, the objective of the invention is fully to satisfy both high temperature resistant (400~1200 ℃) in order to overcome existing anti-infrared thermal radiation coating, the shortcoming that again ir radiation is had high-reflectivity provides a kind of preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating.The thickness that this method makes be the dense coating of 0.1~5mm in 400 ℃~1200 ℃ temperature ranges, the infrared emanation reflectivity of wavelength 500~2500nm greater than 90%, is carried out the thermal shock resistance check at 1000 ℃, after 5 tests, flawless occurs.
Purpose of the present invention can reach by following measure:
A kind of preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating, with inorganic crystal whisker or/and filamentary material join in the colloidal sol of titaniferous, potassium element, stir, form slurry, then slurry is coated on the surface of lagging material, refractory materials or lagging material, at 200 ℃~700 ℃ following sintering 0.5~5h, forming thickness is the dense coating (growth in situ) of 0.1~5mm; Wherein inorganic crystal whisker is or/and the content of filamentary material in slurry is 5~70wt%.
Dense coating of the present invention in 400 ℃~1200 ℃ temperature ranges, to the infrared emanation reflectivity of wavelength 500~2500nm greater than 90%.This coating is carried out the thermal shock resistance check at 1000 ℃, and after 5 tests, flawless occurs.
Wherein inorganic crystal whisker is selected from TiO
2Whisker, crystal whisker of hexa potassium titanate, eight potassium titanate crystal whiskers, NaFeTiO
4In whisker, sodium hexatitanate whisker, calcium titanate whisker, aluminium titanates whisker, magnesium salt whisker or the silicon carbide whisker one or more; The length of inorganic crystal whisker is 10~100 μ m.
Filamentary material is selected from sapphire whisker, silicon oxide fibre, magnesia fibers, beryllium oxide fibre, chromic oxide fiber, Zirconium oxide fibre, boron fibre, aluminum silicate fiber, high aluminum fiber, mullite fiber, forsterite fiber, SiO
2-CaO-MgO series fiber or Al
2O
3In-CaO the series fiber one or more; The length of filamentary material is 0.1~2mm.
The colloidal sol of titaniferous, potassium element, existing report in the document, the amount of its titaniferous, potassium element is with TiO
2, K
2The O meter, mol ratio is TiO
2: K
2O=8~2: 1, preferred molar ratio is TiO
2: K
2O=2,4,6 or 8: 1.
Beneficial effect of the present invention:
1, the coating that makes of the present invention has unique high-reflectivity to 400 ℃~1200 ℃ high temperature heat radiation, to the infrared emanation reflectivity of wavelength 500~2500nm greater than 90%.Because the energy in the burner hearth is high-grade energy when fire box temperature is higher than 400 ℃, this coating can directly be applied to inboard wall of burner hearth also can be applied to the refractory brick surface to save high-grade heat energy; Make stove reach hot stable state sooner, be beneficial to the sintering quality that improves product in the stove;
2, this coating life-time service temperature can be up to 1000 ℃, and instantaneous use temperature can reach 1200 ℃;
3, inorganic crystal whisker of this coating or filamentary material can make the enhancing of coating adhesivity, thickness is adjustable, and cracking resistance ability and properties of infrared reflection significantly improve, long service life.Carry out the thermal shock resistance check at 1000 ℃, still flawless occurs after 5 tests, satisfies industry standard YB/T 134-1998;
4, present method has the advantage of easy construction, for narrow space or the difficult corner that arrives good suitability is arranged, and can be used in combination performance advantage separately with other refractory materialss;
5, the potassium titanate of this coating, acid-alkali-corrosive-resisting, the intensity height can use in the stove of acid or alkaline atmosphere;
6, the thickness of this coating, performance high temperature resistant, high-reflectivity enable to adapt to fully industrial application.
Description of drawings
Fig. 1 is to be the infrared reflectance graphic representation of the lagging material of solvent with the silicon sol.
B is the infrared external reflection rate curve of the lagging material of US3296060 among the figure, and A is the infrared external reflection rate curve of the lagging material of US3551266.
Fig. 2 is the infrared reflectance collection of illustrative plates of embodiment 1 gained coating.
Embodiment
Embodiment 1:
The crystal whisker of hexa potassium titanate of whisker length 10~50 μ m is joined in the colloidal sol of titaniferous, potassium element, and titanium, potassium element content are with TiO
2, K
2The O meter, TiO
2: K
2O=6: 1 (mol ratio), stir, form slurry, the content of whisker is 40wt% in the slurry; Slurry is coated on traditional refractory surface, and at 500 ℃ of sintering 0.5h, forming thickness is the coating of 2mm.With lambda 950 type ultraviolet-visible spectrophotometers coating is tested at the reflectivity of wavelength 300~2500nm, the result as shown in Figure 2, this coating to the reflectivity of wavelength 500~2500nm greater than 96%, and also undamped in whole wavelength region, and the infrared reflectance (curve A) of the lagging material of the infrared reflectance (curve B) of the lagging material that patent USA:US3296060 invents in the accompanying drawing 1 and patent USA:US3551266 invention begins to descend at the wave band of 1200nm~2200nm.The result shows that heat insulating coat effect of the present invention is better than the material in the accompanying drawing 1.Coating of the present invention is carried out the thermal shock resistance check at 1000 ℃, after 15 tests, hair line occurs.
Other embodiment press the method for embodiment 1, and each routine raw material composition, calcining system and final coating performance are as shown in table 1.
Comparative Examples is pressed the method for embodiment 1, and each routine raw material composition, calcining system and final coating performance are as shown in table 2.
Table 1
Other embodiment | Inorganic crystal whisker or filamentary material (wt%) | Titaniferous, potassium colloidal sol TiO 2??/K 2O | Sintering temperature and time | Coat-thickness mm | |
1000 ℃ of thermal shock resistances, inferior |
Embodiment 2 | Aluminum silicate fiber 5% (0.1~1 mm) | ??8 | ??600℃??1h | ??0.1 | ??91% | ??6 |
Embodiment 3 | ??TiO 2Whisker 15% (10~20 μ m); Calcium titanate whisker 20% (20~50 μ m) | ??2 | ??700℃??5h | ??3 | ??96% | ??8 |
Other embodiment | Inorganic crystal whisker or filamentary material (wt%) | Titaniferous, potassium colloidal sol TiO 2??/K 2O | Sintering temperature and time | Coat-thickness mm | |
1000 ℃ of thermal shock resistances, inferior |
Embodiment 4 | ??NaFeTiO 4Whisker 10% (10~50 μ m); Magnesia fibers 15% (0.5~1.5mm) | ??4 | ??200℃??3h | ??5 | ??97% | ??9 |
Embodiment 5 | Sapphire whisker 10% (0.1~2mm); Silicon oxide fibre 10% (0.1~0.5mm); Boron fibre 20% (1~2mm) | ??5.5 | ??400℃??3h | ??2.5 | ??94% | ??9 |
Embodiment 6 | Sodium hexatitanate whisker 25% (40~100 μ m); Mullite fiber 20% (0.5~1mm); Al 2O 3-CaO series fiber 5% (0.1~1mm) | ??5 | ??500℃??2h | ??2 | ??95% | ??10 |
Embodiment 7 | Beryllium oxide fibre 10% (0.4~0.8mm); Silicon carbide whisker 5% (10~50 μ m); Eight potassium titanate crystal whiskers 20% (10~100 μ m) | ??7 | ??610℃??1.5h | ??1.5 | ??93% | ??15 |
Embodiment 8 | Zirconium oxide fibre 15% (0.5~2mm); Aluminium titanates whisker 5% (10~50 μ m); Forsterite fiber 10% (0.1~1.5mm) | ??6 | ??450℃??3h | ??4.5 | ??97% | ??10 |
Other embodiment | Inorganic crystal whisker or filamentary material (wt%) | Titaniferous, potassium colloidal sol TiO 2??/K 2O | Sintering temperature and time | Coat-thickness mm | |
1000 ℃ of thermal shock resistances, inferior |
Embodiment 9 | Chromic oxide fiber 15% (0.1~1mm); Magnesium salt whisker 6% (50~100 μ m); High aluminum fiber 14% (0.4~1.2mm); SiO 2-CaO-MgO series fiber 35% (1~1.5mm) | ??3 | ??350℃??4h | ??0.8 | ??93% | ??12 |
Table 2
Comparative example | Inorganic crystal whisker or filamentary material (wt%) | Titaniferous, potassium colloidal sol TiO 2/K 2O | Sintering temperature and time | Coat-thickness mm | |
1000 ℃ of thermal shock resistances, inferior |
Comparative example 1 | ??0 | ??6 | ??600℃??2h | ??0.0003 | ??18% | ??1 |
Comparative example 2 | Sodium hexatitanate whisker 3% (5~20 μ m) | ??2 | ??700℃??5h | ??0.5 | ??70% | ??3 |
Comparative example 3 | ??NaFeTiO 4Whisker 10% (10~20 μ m); Sapphire whisker 10% (2~4mm) | ??4 | ??200℃??3h | ??0.05 | ??78% | ??4 |
Comparative example | Inorganic crystal whisker or filamentary material (wt%) | Titaniferous, potassium colloidal sol TiO 2/K 2O | Sintering temperature and time | Coat-thickness mm | |
1000 ℃ of thermal shock resistances, inferior |
Comparative example 4 | Magnesium salt whisker 10% (80~120 μ m) silicon oxide fibre 10% (50~100 μ m) boron fibre 20% (0.1~1mm) | ??5.5 | ??100℃??3h | ??2.5 | ??60% | ??2 |
In the Comparative Examples, comparative example 1 is the six potassium titanate nano thin-films of making according to reported method in the reference [12]; Inorganic crystal whisker content is lower than the Schwellenwert 5% of requirement of the present invention in the comparative example 2; The Schwellenwert 0.1mm that the thickness of comparative example 3 coatings requires less than the present invention; The sintering temperature of comparative example 4 is lower than 200 ℃ of the Schwellenwerts that the present invention requires.Do as one likes can comparative result as can be seen, the infrared reflectance of comparative example floating coat and heat-shock resistance all are lower than embodiment's.
Reference
[1] Lin Yulian, Liu Shengqiu. the refractory materials and the energy [M]. Beijing: metallurgical industry press, 1993.
[2] Zhao Yu, Hu Jiang. the industrial furnace power-saving technology is inquired into. scientific and technological information exploitation and economy, 2002.12 (3).
[3]Vaughn?F.Seitzinger,Fayettevllle,Tenn.Unfired?Ceramic?Flame?Resistant?Insulation?andMethod?of?Making?the?Same[P].USA:US3296060,Jan.3,1967.
[4]James?E.Webb.Ceramic?Insulation?for?Radiant?Heating?Environments?and?Method?ofPreparing?the?Same[P].USA:US3551266,Dec.29,1970.
[5]Hugh?Gulledge.Fibrous?Potassium?Titanate-A?New?High?Temperature?InsulatingMaterial[J].Ind.Eng.Chem.,1960,52(2),117~118.
[6]Fujiki?Yoshinori;Sakane?Kouji.Manufacture?of?Fibrous?Alkali?Metal?Titanate[P].Japan:JP56022632(A),1981-03-03.
[7] Feng Xin, Yang Zhuhong, Lu Xiaohua etc. the manufacture method of crystal whisker of hexa potassium titanate [P]. Chinese patent: ZL00112275.4,2004-03-17.
[8] Lu Xiaohua, sudden and violent peaceful clock, Feng Xin etc. the manufacture method of crystal whisker of hexa potassium titanate and fiber [P]. Chinese patent: ZL99114005.2,2002-06-19.
[9] flood is known, Zhu Changlin. thermostable heat-isolating coating and preparation method [P]. and Chinese patent: CN1995250A, 2007-07-11.
[10] money Tsing-Hua University. the preparation of smooth two potassium titanate films and gas-phase photocatalysis activity [J] thereof. functional materials, 2007,38 (7): 1067-1070.
[11] money Tsing-Hua University, Bai Yang, Zhou Xuefeng etc. sol-gel method prepares four of the nanometer planeness sour potassium film [J] of admiring. Journal of Inorganic Materials, 2007,22 (4): 749-753.
[12]QIAN?Qing-hua,LIU?Chang,HU?Yu-yan,et?al.Preparation?and?PhotoelectrochemicalPerformance?of?Potassium?Hexatitanate?Nanofilm[J].The?Chinese?Journal?of?ProcessEngineering,2007,7(5):1022-1028.
Claims (8)
1. the preparation method of a high-temperature resistant anti-infrared thermal radiation energy-saving coating, it is characterized in that inorganic crystal whisker or/and filamentary material joins in the colloidal sol of titaniferous, potassium element, stir, form slurry, then slurry is coated on the surface of lagging material, refractory materials or lagging material, at 200 ℃~700 ℃ following sintering 0.5~5h, forming thickness is the dense coating of 0.1~5mm; Wherein inorganic crystal whisker is or/and the content of filamentary material in slurry is 5~70wt%.
2. the preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating according to claim 1 is characterized in that described dense coating in 400 ℃~1200 ℃ temperature ranges, to the infrared emanation reflectivity of wavelength 500~2500nm greater than 90%.
3. the preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating according to claim 1 is characterized in that described inorganic crystal whisker is selected from TiO
2Whisker, crystal whisker of hexa potassium titanate, eight potassium titanate crystal whiskers, NaFeTiO
4In whisker, sodium hexatitanate whisker, calcium titanate whisker, aluminium titanates whisker, magnesium salt whisker or the silicon carbide whisker one or more.
4. according to the preparation method of claim 1 or 3 described high-temperature resistant anti-infrared thermal radiation energy-saving coatings, the length that it is characterized in that described inorganic crystal whisker is 10~100 μ m.
5. the preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating according to claim 1 is characterized in that described filamentary material is selected from sapphire whisker, silicon oxide fibre, magnesia fibers, beryllium oxide fibre, chromic oxide fiber, Zirconium oxide fibre, boron fibre, aluminum silicate fiber, high aluminum fiber, mullite fiber, forsterite fiber, SiO
2-CaO-MgO series fiber or Al
2O
3In-CaO the series fiber one or more.
6. the preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating according to claim 1 or 5, the length that it is characterized in that described filamentary material is 0.1~2mm.
7. the preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating according to claim 1 is characterized in that in the colloidal sol of described titaniferous, potassium element, the amount of titaniferous, potassium element is with TiO
2, K
2The O meter, its mol ratio is TiO
2: K
2O=8~2: 1.
8. the preparation method of high-temperature resistant anti-infrared thermal radiation energy-saving coating according to claim 7 is characterized in that in the colloidal sol of described titaniferous, potassium element, the amount of titaniferous, potassium element is with TiO
2, K
2The O meter, its mol ratio is TiO
2: K
2O=2,4,6 or 8: 1.
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