CN101701340A - Method for reclaiming tin alloys from ITO scrap materials - Google Patents
Method for reclaiming tin alloys from ITO scrap materials Download PDFInfo
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- CN101701340A CN101701340A CN200910238428A CN200910238428A CN101701340A CN 101701340 A CN101701340 A CN 101701340A CN 200910238428 A CN200910238428 A CN 200910238428A CN 200910238428 A CN200910238428 A CN 200910238428A CN 101701340 A CN101701340 A CN 101701340A
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- Prior art keywords
- ito
- indium
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- materials
- waste material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Abstract
The invention relates to a method for reclaiming tin alloys from ITO target scrap materials such as used ITO sputtering target materials or ITO leftover materials generated during manufacturing ITO target materials, etc. The invention electrolyzes the ITO scrap materials to reclaim tin alloys, particularly to reclaim tin alloys by using ITO scrap materials as cathode to directly electrolyze. The electrolyzing process can be performed in an electrochemical device which can realize macroscopically separate cathode and anode reactions. The method is simple and the reclaiming rate is high.
Description
Technical field
Reclaim the method for indium metal tin the ITO target waste materials such as ITO scrap stock that produce when the present invention relates to from used ITO (indium tin oxide) sputtering target material or manufacturing ITO target.
Background technology
In recent years, along with information industry, electronic industry, flat pannel display industry, functional glass etc. develop rapidly, demand as the used ITO target of nesa coating in this technology is increasing, because therefore the utilization ratio of these targets ability about 30% will produce the waste and old target of a large amount of ITO.In addition, when preparation ITO target, there are scrap stock, cutting powder also can produce waste material.The content of Indium sesquioxide is about 90% in the general ITO target, because the ITO sputtering target material uses high purity material, particularly the price of indium is also expensive, therefore from this waste material, reclaim indium metal usually, perhaps reclaim indium metal tin simultaneously, and then be used for electrorefining indium metal or direct prepared by co-precipitation ITO powder.
From the ITO waste material, reclaim the method that the method for extracting indium metal, tin comprises wet-process refining combinations such as acid-soluble method, ion exchange method, solvent extration at present.
For example, Japanese Patent Japanese kokai publication hei 3-82720 discloses following method: after the ITO waste material is cleaned and pulverizes, be dissolved in the mineral acid, after the isolated in form of tin with the halogenation hydrochlorate, reduce processing with hydrochloric acid or aqueous nitric acid, then this pH value of aqueous solution is adjusted to 2～5, other metal ion is reduced into is difficult for sedimentary material, thereby isolate the indium composition in the aqueous solution, but there is the also not too gratifying problem of refining procedure complexity, refining effect in this technology.
In addition, recovery method as the high purity indium, Japanese kokai publication hei 3-91838 discloses following technology: with impurity-removing method in the In behind the nitric acid dissolve ITO waste target, the Sn acid solution is tin to be oxidized to the stannic acid gelatinous precipitate separate with indium, but because of not separating the metallic impurity of removing other simultaneously, the back also will adopt alkylphosphonic acid carboxylic acid lipid extraction agent and institute's acids extraction agent to carry out three extractions and secondary back extraction, technological process is longer, the reagent costliness, and cost is also higher.
In addition, 200780039677.1 1 kinds of methods that reclaim indium metal of number of patent application are the ITO waste material to be carried out electrolysis as anode reclaim indium, the electrolyzer that separates with barrier film or ion-exchange membrane carries out electrolysis to the ITO waste material, then anolyte is temporarily extracted out, remove the tin ion that contains in the anolyte by neutralisation or substitution method etc., this solution of tin cathode side of removing of packing into once more that contains is carried out electrolysis, thereby can optionally reclaim indium metal.Also there are the characteristics of complex procedures in this method.
Also having technical process is that useless target is reduced into indium stannum alloy, promptly is reduced into indium stannum alloy with carbon or following useless target of hydrogen high temperature, utilizes the difference of indium, tin oxidation one reduction standard potential, by twice electrorefining, directly reclaims indium metal.This method energy consumption height is because at reduction phase, the volatilization of indium tin makes the rate of recovery low.
Summary of the invention
In order to address the above problem, the invention provides the method for high efficiente callback indium metal tin alloy a kind of ITO target waste materials such as ITO scrap stock that produce from used ITO sputtering target material or when making.
The object of the present invention is achieved like this:
The present invention carries out electrolysis with the ITO waste material and reclaims the indium metal tin alloy, particularly the ITO waste material is directly carried out electrolysis as negative electrode and obtains indium stannum alloy.
As the required electrolytic solution of electrolysis, mainly use NaCl, NaNO among the present invention
3, KCl, NH
4Cl, NH
4NO
3, KNO
3And electrolyte solution such as combination.These electrolyte solutions have no particular limits except requiring to have certain conductive capability, being difficult for introducing other metallic impurity.
The raw material that the present invention adopts is that the ITO waste material comprises the corner that produces in the used target of sputter coating, the target production process, waste cut materials etc.
Electrolytic process of the present invention can carry out in any electrochemical device that can realize separately carrying out on the cathode and anode reaction macroscopic view.For example, can use graphite or stainless steel in plastic containers, to feed direct current and carry out electrolysis,, on negative electrode, just have indium stannum alloy and generate through after the suitable electrolysis time with the ITO waste material as negative electrode as anode.
The preferred of current density suitably regulated according to the kind of raw material, and the adjusting factor only is a production efficiency; In addition, electrolysis temperature also has no particular limits, and generally is chosen at 0～100 ℃ and carries out electrolysis, and current efficiency reduces when being lower than 0 ℃, otherwise the evaporation of electrolytic solution increased when electrolysis temperature surpassed 100 ℃, and more satisfactory electrolysis temperature is at 20～50 ℃
Advantage of the present invention: the present invention utilizes electrolytic process to reclaim the method for indium tin in useless ITO target or the ITO target processing scrap stock, only ITO waste material negative electrode is carried out the catholyte reduction, therefore is extremely simple method.But do not adopt the example of this method in the prior art, the indium tin of recovery can directly utilize in the regeneration of ITO sintered compact target.
Embodiment
Embodiment 1
With the used ITO of 2kg (Indium sesquioxide-stannic oxide) waste material as raw material.Composition in this target is: Indium sesquioxide (In
2O
3) be weight 90%, all the other are stannic oxide (SnO
2).This raw material as negative electrode, is carried out electrolysis in temperature is 25 ℃, the NaCl solution of 1mol/L, behind the certain hour, the ITO waste material on the negative electrode all becomes indium stannum alloy as a result.
Thus, can from the waste material of ITO, reclaim the about 1.70kg of indium stannum alloy.
Embodiment 2
The same with embodiment 1, with the 2kg scrap stock as raw material.As negative electrode, is 50 ℃, the KNO of 2mol/L in temperature with this raw material
3Carry out electrolysis in the solution, behind the certain hour, the ITO waste material on the negative electrode all becomes indium stannum alloy as a result.
Thus, can from the waste material of ITO, reclaim the about 1.68kg of indium stannum alloy.
The ITO waste materials such as ITO leftover pieces that the present invention produces when using indium-tin-oxide (ITO) sputtering target or manufacturing, only it is carried out electrolysis as negative electrode, therefore, can extremely simply high efficiente callback indium metal tin, obtaining the high purity metal indium by further electrorefining then recycles, perhaps directly preparing the ITO powder after the dissolving of this alloy, this method has a remarkable advantage industrial.
Claims (2)
1. method that from the ITO waste material, reclaims indium stannum alloy, described method is the ITO waste material to be carried out electrolysis reclaim the indium metal tin alloy, it is characterized in that: described method is carried out electrolysis with the ITO waste material as negative electrode.
2. a kind of method that reclaims indium stannum alloy from the ITO waste material according to claim 1, it is characterized in that: the electrolytic temperature of described method is 20 to 50 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910238428A CN101701340A (en) | 2009-11-20 | 2009-11-20 | Method for reclaiming tin alloys from ITO scrap materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910238428A CN101701340A (en) | 2009-11-20 | 2009-11-20 | Method for reclaiming tin alloys from ITO scrap materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101701340A true CN101701340A (en) | 2010-05-05 |
Family
ID=42156264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910238428A Pending CN101701340A (en) | 2009-11-20 | 2009-11-20 | Method for reclaiming tin alloys from ITO scrap materials |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101701340A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102031375A (en) * | 2010-10-12 | 2011-04-27 | 友达光电股份有限公司 | Indium tin oxide thin film recycling method and substrate recycling method |
| CN105366709B (en) * | 2015-10-15 | 2017-03-22 | 中国船舶重工集团公司第七二五研究所 | Method for effectively recycling indium and tin oxide (ITO) waste targets |
| CN111809050A (en) * | 2020-05-25 | 2020-10-23 | 先导薄膜材料有限公司 | Method for recycling ITO waste target |
| CN114808036A (en) * | 2022-04-21 | 2022-07-29 | 柳州华锡有色设计研究院有限责任公司 | Method for recovering high-purity tin-indium alloy from ITO target waste |
-
2009
- 2009-11-20 CN CN200910238428A patent/CN101701340A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102031375A (en) * | 2010-10-12 | 2011-04-27 | 友达光电股份有限公司 | Indium tin oxide thin film recycling method and substrate recycling method |
| CN102031375B (en) * | 2010-10-12 | 2012-09-19 | 友达光电股份有限公司 | Indium tin oxide thin film recycling method and substrate recycling method |
| CN105366709B (en) * | 2015-10-15 | 2017-03-22 | 中国船舶重工集团公司第七二五研究所 | Method for effectively recycling indium and tin oxide (ITO) waste targets |
| CN111809050A (en) * | 2020-05-25 | 2020-10-23 | 先导薄膜材料有限公司 | Method for recycling ITO waste target |
| CN114808036A (en) * | 2022-04-21 | 2022-07-29 | 柳州华锡有色设计研究院有限责任公司 | Method for recovering high-purity tin-indium alloy from ITO target waste |
| CN114808036B (en) * | 2022-04-21 | 2023-12-05 | 柳州华锡有色设计研究院有限责任公司 | Method for recycling high-purity tin-indium alloy from ITO target scrap |
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Open date: 20100505 |