CN101660117A - Solar selective absorbing coating and preparation method thereof - Google Patents
Solar selective absorbing coating and preparation method thereof Download PDFInfo
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- CN101660117A CN101660117A CN200910176041A CN200910176041A CN101660117A CN 101660117 A CN101660117 A CN 101660117A CN 200910176041 A CN200910176041 A CN 200910176041A CN 200910176041 A CN200910176041 A CN 200910176041A CN 101660117 A CN101660117 A CN 101660117A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
- F24S70/225—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption for spectrally selective absorption
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y02E10/40—Solar thermal energy, e.g. solar towers
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Abstract
The invention discloses a solar selective absorbing coating which mainly consists of an infrared high reflectivity metal layer, a diffusion impervious layer, an absorbing layer and an antireflection layer in sequence; the absorbing layer is composed of a metal-medium composite material film which is expressed as SS-Ox-AlNyOz, the metal-medium composite material film is composed of metal SS molecular group, trace oxide formed by combining SS and O, and medium AlNyOz; and the antireflection layer medium material film is expressed as AlNiOj. The coating of the invention is easy to realize and simple to regulate and control in terms of preparation technique; the coating is suitable to be used in vacuum or air under low and medium temperature environment; the performance of the coating is stable; and the solar absorptance alpha thereof is more than 0.92, and the emissivity ratio thereof is less than or equal to 0.08.
Description
Technical field
The invention belongs to technical field of vacuum plating, disclose a kind of solar selectively absorbing coating and preparation method thereof.
Background technology
Solar selectively absorbing coating mainly is made up of three parts: the most close base material is infrared high reflecting metal layer, outwards is followed successively by absorption layer and anti-reflection layer, and metal level is selected metals such as good conductive metal material such as aluminium, copper, silver for use.Absorption layer is made up of several layers metal-dielectric composite material film, for nano-sized metal particles is distributed in the dielectric material, its optical characteristics can be controlled at the intermediateness of metal and medium, absorption layer subgrade near metal back layer has high specific refractory power and optical extinction coefficient, along with each reduction that absorbs metal content in the subgrade, its specific refractory power and optical extinction coefficient also reduce gradually.Anti-reflection layer adopts low-refraction and low optical extinction coefficient material, reduces as far as possible reflection of light, obtains good selectivity absorptive character.Therefore, prepare the material that a kind of good coating for selective absorption key is to select to have preferable selective solar spectrum.
Patent of invention CN1056159A has described a kind of AlN
xO
yCoating for selective absorption is a negative electrode with single target aluminium, by adjusting N
2And O
2Mixed gas flow changes the content of Al in the thin-film material, this coating solar absorptance α=0.90~0.94, ε=0.07~0.12.This coating as the metal ingredient in the absorption layer, because of the Al atom moves and the generation chemical reaction easily, causes the absorption layer change of component with Al, and the coating optical property decays, and only can use in vacuum environment.
Patent of invention CN1360084A relates to a kind of coating for selective absorption of sunlight spectrum, and this coating is at N
2+ O
2Aluminum-nitrogen-oxygen+titanium-nitrogen-oxygen that sputter forms in the atmosphere-aluminium titanium, anti-reflection layer are aluminum-nitrogen-oxygen+titanium-nitrogen-oxygen film.Titanium target and aluminium target are as its sputtering target material.
DE3522427A1 relates to a kind of solar selectively absorbing coating, and this coating is to utilize magnetron sputtering technique to prepare titanium-nitrogen-oxygen TiNO thin-film material, by regulation and control N
2And O
2Flow regulate metal content in the film, thereby obtain different electricity, physical and chemical performance, applicable to different purposes.Select for use metal titanium to prepare metal in the absorber coatings in this patent of invention, cost is higher relatively.
Summary of the invention
The objective of the invention is defective at above-mentioned prior art, a kind of solar selectively absorbing coating and preparation method are provided, the present invention's coating is easy to aspect preparation technology realize and regulate and control simply that be applicable in the vacuum or air under the medium and low temperature envrionment conditions, coating performance is stable.
The technical scheme taked of the present invention is to achieve these goals: a kind of solar selectively absorbing coating, mainly form successively by infrared high reflecting metal layer, diffusion impervious layer, absorption layer, antireflection layer, described absorption layer is made of the metal-dielectric composite material film, and described metal-dielectric composite material film is expressed as SS-O with formula
x-AlN
yO
z, described metal-dielectric composite material film table combines the small amounts thing that forms, and medium A lN by metal SS molecular grouping, SS with O
yO
zForm.
Described antireflection layer dielectric material film is expressed as AlN with formula
iO
j
The molar content of each material is in the described metal-dielectric matrix material: Al is 22~35 moles of %, and N is 15~33 moles of %, and O is 16~55 moles of %, and Fe is 6~16 moles of %, and Cr is 1~4 mole of %, and all the other are Ni and impurity component.
The material of described diffusion impervious layer can be selected arbitrarily, as Al or AlN, is used to stop atoms metal mutual diffusion and migration mutually between infrared high reflection layer metal and the absorption layer, and preferred thickness is 20~25nm.
Described infrared high reflecting metal layer adopts has the metallic film material of low emission than ε, and as aluminium, copper, silver etc., its thickness is 100~300nm.
Described dielectric material film AlN
iO
jIn the molar content of each material be: Al is 48~55 moles of %, and N is 6~20 moles of %, and O is 25~41 moles of %.
The thickness of described antireflection layer dielectric material film AlNiOj is 40~80nm.
Described absorption layer is made up of the absorption layer subgrade of 2~4 different metal content, and the thickness of described absorption layer is 70~160nm.
It is stainless target that the metallic substance of described metal-dielectric matrix material prepares required target.Be preferably the austenitic stainless steel target.1Cr18Ni9Ti for example, its main component and weight percent are respectively Cr≤17%~19%, Ni≤8.0%~11.0%, C≤0.12%, Si≤1.00%, Mn≤2.00%, P≤0.035%, S≤0.030%, all the other are saved as branch for Fe and idol.
Another technical scheme provided by the invention is the method for preparing solar selectively absorbing coating, may further comprise the steps:
(1) the infrared high reflecting metal layer of deposition on base material: base material is a glass or through the metallic surface of polished finish;
(2) deposition diffusion impervious layer: as Al or AlN;
(3) deposition absorption layer: absorption layer is 2~4 layers of absorption subgrade structure with different metal content; In the sputter gas argon gas, feed nitrogen oxygen atmosphere, nitrogen oxygen mol ratio was a negative electrode with aluminium target and stainless steel target between 100: 0~80: 20, adopted vacuum coating technology, reactive sputter-deposition metal-dielectric composite material film; The sputter simultaneously of aluminium target and stainless steel target, the sputter of aluminium target response generates medium A lN
yO
z, the sputter of stainless steel target generates metal SS molecular grouping, by the inlet and the amount of oxygen in gas mixture of control nitrogen oxygen atmosphere, makes the sputter that reacts of stainless steel target part generate a spot of SS oxide compound; Reduce along direction by adjusting the sputtering power of stainless steel cathode, make the metal content that absorbs in the subgrade away from base material;
(4) deposition antireflection layer: nitrogen and oxygen with 100: 0~80: 20 blended atmosphere of mol ratio in, be negative electrode with the metallic aluminium, employing vacuum coating technology reactive sputter-deposition AlN
iO
jFilm.
The invention has the beneficial effects as follows: the present invention's coating is easy to aspect preparation technology realize and regulate and control simply that be applicable in the vacuum or air under the medium and low temperature envrionment conditions, coating performance is stable.The solar absorptance of coating is greater than 0.92, and coating emission ratio is smaller or equal to 0.08.
Description of drawings
Fig. 1 is the solar selectively absorbing coating structural representation;
Fig. 2 is the vacuum chamber synoptic diagram of coating equipment.
Fig. 3 is AlN
iO
jRete XPS composes entirely.
Fig. 4 is the narrow spectrum of full spectrum of SS-Ox-AlNyOz rete XPS and Fe2p.
Fig. 5 is Cu/Al/SS
1-O
X1-AlN
Y1O
Z1/ SS
2-O
X2-AlN
Y2O
Z2/ AlN
iO
jThe observed value of coating for selective absorption reflection comparison value.
Fig. 6 Cu/Al/SS
1-O
X1-AlN
Y1O
Z1/ SS
2-O
X2-AlN
Y2O
Z2/ SS
3-O
X3-AlN
Y3O
Z3/ SS
4-O
X4-AlN
Y4O
Z4/ AlN
iO
jThe observed value of coating for selective absorption reflection comparison value.
Referring to Fig. 1, on base material or workpiece 6, deposit successively infrared high reflecting metal layer 1, diffusion barrier layer 2, absorb layer 3 With subtract reflecting layer 4.
Referring to Fig. 3 and Fig. 4, adopt x-ray photoelectron power spectrum (XPS) to analyze in anti-reflection layer and the absorption subgrade thin-film material Chemical composition and content.
Embodiment
The invention will be further described below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
On Glass tubing, deposit Cu/Al/SS
1-O
X1-AlN
Y1O
Z1/ SS
2-O
X2-AlN
Y2O
Z2/ AlN
iO
jCoating for selective absorption:
In cylindrical magnetron sputtering coating equipment vacuum chamber shown in Figure 2, workpiece 6 is a Glass tubing, can rotation and revolution, and when vacuum tightness reaches 10
-3During Pa, charge into pure argon from argon inlet pipe 7, operating pressure is at 0.20Pa, and Cu target 11 d.c. sputterings deposit the Cu metal level, and power is 16KW, and 6 minutes time, testing its thickness with the Dektak 6M step instrument of U.S. Veeco company is 150nm; Then d.c. sputtering Al target, depositing Al film be as diffusion impervious layer, power 12KW, and 30 seconds time, testing the Al film thickness with Dektak 6M step instrument is 22nm; Then adjust argon flow amount, making operating pressure is 0.40Pa, is approximately 97: 3, N according to nitrogen oxygen mol ratio
2Flow is 129SCCM, O
2Flow is 4SCCM, fills in the vacuum chamber from another tracheae 8 behind thorough mixing; Al target 9 d.c. sputtering power are 12KW, SS target 10 d.c. sputtering power 8.5KW, and sputter 5 minutes, deposition first absorbs subgrade SS
1-O
X1-AlN
Y1O
Z1, testing its thickness with Dektak 6M step instrument is thickness 45nm; Then adjusting the N2 flow is 104SCCM, and the O2 flow is 3.2SCCM, and Al target sputtering power is constant, and the SS target power output is 4kw, sputter 7 minutes, and deposition second absorbs subgrade SS
2-O
X2-AlN
Y2O
Z2, testing its thickness with Dektak 6M step instrument is 65nm.At last at N
2Flow is 84SCCM, O
2Flow is 2.6SCCM, and pressure is in the atmosphere of 0.40Pa, Al target sputtering sedimentation AlN
iO
jDielectric film, power 10KW, the time is 15 minutes, testing its thickness with Dektak 6M step instrument is 65nm.The SS target is selected 1Cr18Ni9Ti for use, and its main component and weight percent are respectively Cr≤17%~19%, Ni≤8.0%~11.0%, and C≤0.12%, Si≤1.00%, Mn≤2.00%, P≤0.035%, S≤0.030%, all the other are Fe and the even branch that is saved as.
Use X-ray photoelectron spectroscopic analysis AlN
iO
jThe molar content of each material of film is seen Fig. 3, and the result is: Al is 54 moles of %, and N is 16 moles of %, and O is 30 moles of %.Use X-ray photoelectron spectroscopic analysis SS
2-O
x-AlN
Y2O
Z2The molar content of each material is seen Fig. 4 in the film, and the result is: Al is 24 moles of %, and N is 17 moles of %, and O is 46 moles of %, and Fe is 10 moles of %, and Cr is 2 moles of %, and Ni is 1 mole of %, and all the other are impurity component.
Use UV3101PC, UV-VIS-NIR spectrophotometer (0.3-2.6um), the reflection comparison value of shoot the sun energy coating for selective absorption in 0.3-2.6um solar energy spectral limit, the results are shown in Figure 5, calculate solar absorptance α=0.95, use TJ270-30 infrared spectrophotometer (2.5-25um), measure the reflection comparison value R of solar selectively absorbing coating in the 2.5-25um infrared range of spectrum of preparation, calculate the coating emission than ε=0.06.
With the polishing stainless steel substrates as base material, the deposition Cu/Al/SS
1-O
X1-AlN
Y1O
Z1/ SS
2-O
X2-AlN
Y2O
Z2/ SS
3-O
X3-AlN
Y3O
Z3/ SS
4-O
X4-AlN
Y4O
Z4/ AlN
iO
jCoating for selective absorption:
In the cylindrical magnetron sputtering coating equipment vacuum chamber as shown in Figure 2, the base material stainless steel substrates is fixed on the workpiece 6, when vacuum tightness reaches 10
-3During Pa, charge into pure argon from argon inlet pipe 7, operating pressure is at 0.20Pa, and Cu target 11 d.c. sputterings deposit the Cu metal level, 6 minutes time, and power 16KW, testing its thickness with Dektak 6M step instrument is 150nm; Follow Al target d.c. sputtering depositing Al film as diffusion impervious layer, power 12KW, 30 seconds time, testing its thickness with Dektak 6M step instrument is 22nm; Adjust argon flow amount then and make operating pressure keep 0.40Pa, be approximately 85: 15, N according to nitrogen oxygen mol ratio
2Flow is 68SCCM, O
2Flow is 12SCCM.Behind thorough mixing, fill in the vacuum chamber from another tracheae 8, Al target 9 d.c. sputtering power 16KW, SS target 10 d.c. sputtering power 8.4KW, 2 minutes depositions first of sputter absorb subgrade SS
1-O
X1-AlN
Y1O
Z1, thickness is 28nm with the test of Dektak 6M step instrument; Then adjust N
2Flow is 62SCCM, O
2Flow is 10.9SCCM, and the SS target power output is 6.1kw, and sputtering sedimentation second absorbs subgrade SS
2-O
X2-AlN
Y2O
Z2, the time is 3 minutes, testing its thickness with Dektak 6M step instrument is 32nm.Then adjust N
2Flow is 57SCCM, O
2Flow is 10SCCM, and the SS target power output is 4.3kw, and sputtering time is 4 minutes and 40 seconds, deposits the 3rd and absorbs subgrade SS
3-O
X3-AlN
Y3O
Z3, thickness 36nm.Adjust N then
2Flow is 45SCCM, O
2Flow is 7.9SCCM, and the SS target power output is 2.5kw, 5 minutes time, deposits the 4th and absorbs subgrade SS
4-O
X4-AlN
Y4O
Z4, be 22nm with Dektak 6M step instrument test thickness.At last at N
2Flow is 855SCCM, O
2Flow is 15SCCM, Al target sputtering power 16KW, 12 minutes time, depositing Al N
iO
jDeielectric-coating, thickness is 62nm with the test of Dektak 6M step instrument.The SS target is selected austenitic stainless steel for use.
Use UV3101PC, UV-VIS-NIR spectrophotometer (0.3~2.6 μ m), the reflection comparison value of shoot the sun energy coating for selective absorption in 0.3-2.6um solar spectrum scope, the results are shown in Figure 6, calculate solar absorptance α=0.960, use TJ270-30 infrared spectrophotometer (2.5~25 μ m), measure the reflection comparison value R of coating in 2.5~25 μ m infrared range of spectrum, calculate the coating emission than ε=0.08.
Above-described embodiment, the present invention embodiment a kind of more preferably just, the common variation that those skilled in the art carries out in the technical solution of the present invention scope and replacing all should be included in protection scope of the present invention.
Claims (10)
1. solar selectively absorbing coating, mainly form successively by infrared high reflecting metal layer, diffusion impervious layer, absorption layer, antireflection layer, it is characterized in that: described absorption layer is made of the metal-dielectric composite material film, and described metal-dielectric composite material film is expressed as SS-O with formula
x-AlN
yO
z, described metal-dielectric composite material film combines the small amounts thing that forms, and medium A lN by metal SS molecular grouping, SS with O
yO
zForm.
2. solar selectively absorbing coating according to claim 1 is characterized in that: described antireflection layer dielectric material film is expressed as AlN with formula
iO
j
3. solar selectively absorbing coating according to claim 1, it is characterized in that: the molar content of each material is in the described metal-dielectric matrix material: Al is 22~35 moles of %, N is 15~33 moles of %, O is 16~55 moles of %, Fe is 6~16 moles of %, Cr is 1~4 mole of %, and all the other are Ni and impurity component.
4. solar selectively absorbing coating according to claim 1 is characterized in that: the material of described diffusion impervious layer is Al or AlN, and its thickness is 20~25nm.
5. solar selectively absorbing coating according to claim 1 is characterized in that: described infrared high reflecting metal layer adopts has metallic film material Cu or the Al of low emission than ε, and its thickness is 100~300nm.
6. solar selectively absorbing coating according to claim 2 is characterized in that: described dielectric material film AlN
iO
jIn the molar content of each material be: Al is 48~55 moles of %, and N is 6~20 moles of %, and O is 25~41 moles of %.
7. solar selectively absorbing coating according to claim 6 is characterized in that: described antireflection layer dielectric material film AlN
iO
jThickness be 40~80nm.
8. according to each described solar selectively absorbing coating of claim 1 to 7, it is characterized in that: described absorption layer is made up of the absorption layer subgrade of 2~4 different metal content, and the thickness of described absorption layer is 70~160nm.
9. it is the austenitic stainless steel target that solar selectively absorbing coating according to claim 8, the metallic substance of described metal-dielectric matrix material prepare required target.
10. prepare the method for the described solar selectively absorbing coating of claim 6, comprise the steps:
(1) the infrared high reflecting metal layer of deposition on base material: base material is a glass or through the metallic surface of polished finish;
(2) deposition diffusion impervious layer: as Al or AlN;
(3) deposition absorption layer: absorption layer is 2~4 layers of absorption subgrade structure with different metal content; In the sputter gas argon gas, feed nitrogen oxygen atmosphere, nitrogen oxygen mol ratio was a negative electrode with aluminium target and stainless steel target between 100: 0~80: 20, adopted vacuum coating technology, reactive sputter-deposition metal-dielectric composite material film; The sputter simultaneously of aluminium target and stainless steel target, the sputter of aluminium target response generates medium A lN
yO
z, the sputter of stainless steel target generates metal SS molecular grouping, by the inlet and the amount of oxygen in gas mixture of control nitrogen oxygen atmosphere, makes the sputter that reacts of stainless steel target part generate a spot of SS oxide compound; Reduce along direction by adjusting the sputtering power of stainless steel cathode, make the metal content that absorbs in the subgrade away from base material;
(4) deposition antireflection layer: nitrogen and oxygen with 100: 0~80: 20 blended atmosphere of mol ratio in, be negative electrode with the metallic aluminium, employing vacuum coating technology reactive sputter-deposition AlN
iO
jFilm.
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