CN101628782A - High-purity silica pot and production method thereof - Google Patents

High-purity silica pot and production method thereof Download PDF

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Publication number
CN101628782A
CN101628782A CN 200910101334 CN200910101334A CN101628782A CN 101628782 A CN101628782 A CN 101628782A CN 200910101334 CN200910101334 CN 200910101334 CN 200910101334 A CN200910101334 A CN 200910101334A CN 101628782 A CN101628782 A CN 101628782A
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particle diameter
purity silica
manufacture method
silica pot
slurry
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CN101628782B (en
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陈新源
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Silicon Compounds (AREA)

Abstract

The invention discloses a high-purity silica pot and a production method thereof, which is mainly used for oxides or metals sintered by highly acid intermediate products, especially used in sintering zirconium chemicals. The production method comprises the following steps: selecting fused quartz crystals with different grain specifications as main raw materials, wherein SiO2 is greater than 99.7 percent; proportioning 30-40percent of grain with diameter of 0.381mm, 10-15percent of grain with diameter of 0.173mm and 60-45percent of grain with diameter of 0.0065mm by weight percent; adding a binding agent and de-ionized water to prepare size; casting the size after the ball grinding by a ball grinder into a gypsum pattern; and sintering the size after demoulding and baking in an automatic push-type oil kiln to obtain a finished silica pot.

Description

A kind of high-purity silica pot and manufacture method thereof
Technical field
The present invention relates to the fire-resistant kiln furnitures of smelting industry, particularly a kind of high-purity silica pot and manufacture method thereof.
Background technology
On metallurgical and chemical industry, smelt oxide compound, add dilute hydrochloric acid as zircon sand and after high temperature dissolves, can extract the high-purity mangesium oxide zirconium, owing to contain highly acid corrosive liquid in intermediates or the raw material, must be by pyrolytic decomposition, therefore need a kind of anti-high temperature more than 1200 ℃, corrosion-resistant, not breaking again simultaneously has the flexible crucible.It is Al that present smelting oxide compound has the Stainless Steel Disc of employing, major ingredient 2O 3High alumina matter crucible and vitreous silica crucible.Through application in practice, Stainless Steel Disc is at high temperature not acidproof not alkaline-resisting yet, and bring ferrous contaminants into to product easily, high alumina matter crucible is met acid corrosion easily, easily delamination and break while foreign matter content height, especially iron at high temperature, have a strong impact on quality product, can not be used for the agglomerating high purity product.Though the transparent glass quartz crucible can stand high temperature, corrosion resistant test.But smooth transparent silica glass, there is not void content, it is easy of the very thick film of the bonding one deck of slick glass surface in sintering process to add the tart oxide compound, along with agglomerating continues, oxide skin thickens, because the two-layer coefficient of expansion differs greatly, poor heat stability is just broken easily in sintering process like this.Reduce and eliminate the formation of this layer mucous membrane, will be after each sintering, with manually removing, labour intensity is big, and does not clean up, and still assembles tired mucous layer.
Summary of the invention
At prior art exist not corrosion-resistant, easily break, shortcoming such as pollution effect quality product easily, a kind of high-purity silica pot and manufacture method thereof have been invented, be mainly used in highly acid intermediates and sinter oxide compound or metal into, particularly in the zirconium chemicals sintering, use.
The characteristics of a kind of high-purity silica pot of the present invention and manufacture method thereof: adopt SiO 2>99.7% fused quartz, the pure white crystal that does not contain other impurity is a main raw material, the high-purity silica pot blank has high void content, crucible fills tart chemical industry intermediates in the sintering melted state with do and can not break because of thermal expansion produces when solid like this, and the price of product is than low 5~6 times of transparent quartz crucible.Finished product crucible volume density: 1.90 gram per centimeters 3, apparent porosity :≤20%, compressive strength: 450 kilograms per centimeter 2The finished product crucible has that thermal expansivity is little, Heat stability is good, high temperature resistant, acidproof and chlorine erosion, intensity height, long advantage of life-span.
In order to realize above purpose, a kind of high-purity silica pot of the present invention and manufacture method thereof, the technical scheme of taking is: select three kinds of variable grain specification SiO for use 2>99.7% fused quartz crystal is a main raw material, by weight percentage with the ratio proportioning of particle diameter Φ 0.381mm 30%-40%, Φ 0.173mm10%-15%, Φ 0.0065mm 60%-45%, the particle diameter permissible error all is ± 10%, other adds interpolation wedding agent lactic acid 0.2%-0.25%, deionization pure water 15% is mixed with slurry, slurry is cast to behind the ball mill ball milling in the prefabricated plaster mould, and the demoulding, oven dry back are sintering the quartz crucible finished product in the push-plate type oil kiln automatically.
The ratio proportioning effect of variable grain of the present invention is: the fabrication yield that helps the different shapes quartz crucible.
The effect of adding wedding agent lactic acid is: emulsification, in conjunction with the slurry of three kinds of variable grain specification quartz crystal raw materials and deionization pure water, raising cast quartz crucible blank strength.
The effect of deionization pure water is: the fused quartz crystal raw material is mixed with slurry, and inclusion-free influences the high-purity silica pot quality again.
Embodiment
With embodiment a kind of high-purity silica pot of the present invention and manufacture method thereof are described further below.
Example one:
Make smelting high-purity zirconium white cylindrical quartz crucible: select SiO for use 2>99.7% fused quartz crystal is a main raw material, by weight percentage with particle diameter Φ 0.381mm 30%-34%, Φ 0.173mm 10%-15%, the ratio proportioning of Φ 0.0065mm 60%-51%, the particle diameter permissible error all is ± 10%, other adds interpolation wedding agent lactic acid 0.2%-0.25%, deionization pure water 15% is mixed with slurry, slurry places the ball mill ball milling, sized mixing 2 hours, the slip of sizing mixing is cast in the preprepared cylindrical plaster mould, the crucible base seasoning demoulding in 3 hours after casting is good, qualified crucible base is seated in 120 ℃ of drying rooms and dried by the fire 48 hours again, the quartz crucible base of oven dry is in automatic push-plate type oil kiln, through following 1 hour Fast Sintering finished product of 1150 ℃ of-1170 ℃ of temperature, the finished product quartz crucible is through packing with packing case carton after the assay was approved.
Example two:
Make smelting high-purity zirconium white rectangular parallelepiped quartz crucible: select SiO for use 2>99.7% fused quartz crystal is a main raw material, by weight percentage with particle diameter Φ 0.381mm 32%-36%, Φ 0.173mm 10%-15%, the ratio proportioning of Φ 0.0065mm 58%-49%, the particle diameter permissible error all is ± 10%, other adds interpolation wedding agent lactic acid 0.2%-0.25%, deionization pure water 15% is mixed with slurry, slurry places the ball mill ball milling, sized mixing 2 hours, the slip of sizing mixing is cast in the preprepared rectangular parallelepiped plaster mould, the crucible base seasoning demoulding in 3 hours after casting is good, qualified crucible base is put in 120 ℃ of drying rooms and was dried by the fire 48 hours again, the quartz crucible base of oven dry is in automatic push-plate type oil kiln, through following 1 hour Fast Sintering finished product of 1150 ℃ of-1170 ℃ of temperature, the finished product quartz crucible is through packing with packing case carton after the assay was approved.
Example three:
Make the fan-shaped quartz crucible of smelting high-purity zirconium white: select SiO for use 2>99.7% fused quartz crystal is a main raw material, by weight percentage with particle diameter Φ 0.381mm 35%-40%, particle 0.173mm 10%-15%, the ratio proportioning of particle 0.0065mm 55%-45%, the particle diameter permissible error all is ± 10%, other adds interpolation wedding agent lactic acid 0.2%-0.25%, deionization pure water 15% is mixed with slurry, slurry places the ball mill ball milling, sized mixing 2 hours, the slip of sizing mixing is cast in the preprepared fan-shaped plaster mould, the crucible base seasoning demoulding in 3 hours after casting is good, qualified crucible base is put in 120 ℃ of drying rooms and was dried by the fire 48 hours again, the quartz crucible base of oven dry is in automatic push-plate type oil kiln, through following 1 hour Fast Sintering finished product of 1150 ℃ of-1170 ℃ of temperature, the finished product quartz crucible is through packing with packing case carton after the assay was approved.

Claims (5)

1, a kind of high-purity silica pot and manufacture method thereof is characterized in that: select three kinds of variable grain specification SiO for use 2>99.7% fused quartz crystal is a main raw material, by weight percentage with the ratio proportioning of particle diameter Φ 0.381mm30%-40%, Φ 0.173mm 10%-15%, Φ 0.0065mm 60%-45%, other adds interpolation wedding agent lactic acid, the deionization pure water is mixed with slurry, slurry is cast in the plaster mould behind the ball mill ball milling, sinters the quartz crucible finished product into after the demoulding, the oven dry.
2, a kind of high-purity silica pot as claimed in claim 1 and manufacture method thereof is characterized in that: select SiO for use 2>99.7% fused quartz crystal is a main raw material, and with the ratio proportioning of particle diameter Φ 0.381mm30%-34%, Φ 0.173mm 10%-15%, Φ 0.0065mm 60%-51%, the particle diameter permissible error all is ± 10% by weight percentage.
3, a kind of high-purity silica pot as claimed in claim 1 and manufacture method thereof, it is characterized in that: with the ratio proportioning of particle diameter Φ 0.381mm 32%-36%, Φ 0.173mm 10%-15%, Φ 0.0065mm 58%-49%, the particle diameter permissible error all is ± 10% by weight percentage.
4, a kind of high-purity silica pot as claimed in claim 1 and manufacture method thereof, it is characterized in that: with the ratio proportioning of particle diameter Φ 0.381mm 35%-40%, particle 0.173mm 10%-15%, particle 0.0065mm55%-45%, the particle diameter permissible error all is ± 10% by weight percentage.
5, as claim 1 or 2 or 3 or 4 described a kind of high-purity silica pot and manufacture method thereof, it is characterized in that: other adds interpolation wedding agent lactic acid 0.2%-0.25%, deionization pure water 15% is mixed with slurry, slurry places the ball mill ball milling, sized mixing 2 hours, the slip of sizing mixing is cast in the preprepared plaster mould, the crucible base seasoning demoulding in 3 hours after casting is good, qualified crucible base is seated in 120 ℃ of drying rooms and dried by the fire 48 hours again, the quartz crucible base of oven dry is in automatic push-plate type oil kiln, through following 1 hour Fast Sintering finished product of 1150 ℃ of-1170 ℃ of temperature.
CN 200910101334 2009-07-29 2009-07-29 High-purity silica pot and production method thereof Expired - Fee Related CN101628782B (en)

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CN101628782B CN101628782B (en) 2011-04-06

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101988214A (en) * 2010-12-09 2011-03-23 江苏润弛太阳能材料科技有限公司 Preparation method of fused silica crucible for polycrystalline silicon ingot casting
CN102031488A (en) * 2010-12-23 2011-04-27 福建福晶科技股份有限公司 Crucible for increasing film damage threshold
CN102153271A (en) * 2010-12-09 2011-08-17 江苏润弛太阳能材料科技有限公司 Fused quartz crucible for polysilicon ingots
CN102180657A (en) * 2011-01-31 2011-09-14 圣戈班石英(锦州)有限公司 Preparation method of quartz ceramic gate plate and cover plate slurry for glass kiln
CN102219359A (en) * 2011-04-06 2011-10-19 中材江苏太阳能新材料有限公司 Method for forming large-size fused quartz ceramic crucible
CN103359918A (en) * 2012-04-01 2013-10-23 比亚迪股份有限公司 Crucible and preparation method thereof
JP2013249218A (en) * 2012-05-30 2013-12-12 Mitsubishi Materials Corp Synthetic amorphous silica powder and method of producing the same
CN103663938A (en) * 2012-09-21 2014-03-26 玉田县前进汽车悬架有限公司 Method for manufacturing induction furnace crucible by taking boric acid as additive

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101988214A (en) * 2010-12-09 2011-03-23 江苏润弛太阳能材料科技有限公司 Preparation method of fused silica crucible for polycrystalline silicon ingot casting
CN102153271A (en) * 2010-12-09 2011-08-17 江苏润弛太阳能材料科技有限公司 Fused quartz crucible for polysilicon ingots
CN102031488A (en) * 2010-12-23 2011-04-27 福建福晶科技股份有限公司 Crucible for increasing film damage threshold
CN102180657A (en) * 2011-01-31 2011-09-14 圣戈班石英(锦州)有限公司 Preparation method of quartz ceramic gate plate and cover plate slurry for glass kiln
CN102180657B (en) * 2011-01-31 2013-09-04 圣戈班石英(锦州)有限公司 Preparation method of quartz ceramic gate plate and cover plate slurry for glass kiln
CN102219359A (en) * 2011-04-06 2011-10-19 中材江苏太阳能新材料有限公司 Method for forming large-size fused quartz ceramic crucible
CN103359918A (en) * 2012-04-01 2013-10-23 比亚迪股份有限公司 Crucible and preparation method thereof
CN103359918B (en) * 2012-04-01 2015-07-22 比亚迪股份有限公司 Crucible and preparation method thereof
JP2013249218A (en) * 2012-05-30 2013-12-12 Mitsubishi Materials Corp Synthetic amorphous silica powder and method of producing the same
CN103663938A (en) * 2012-09-21 2014-03-26 玉田县前进汽车悬架有限公司 Method for manufacturing induction furnace crucible by taking boric acid as additive

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