CN101604113B - Projection optical system and light quantity control assembly for same - Google Patents
Projection optical system and light quantity control assembly for same Download PDFInfo
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- CN101604113B CN101604113B CN2008101254298A CN200810125429A CN101604113B CN 101604113 B CN101604113 B CN 101604113B CN 2008101254298 A CN2008101254298 A CN 2008101254298A CN 200810125429 A CN200810125429 A CN 200810125429A CN 101604113 B CN101604113 B CN 101604113B
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- light
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- notch
- projection optical
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Abstract
The invention relates to a projection optical system which comprises a light source, a light homogenizing assembly, a light quantity control assembly, an imaging device and a projecting lens. The light quantity control assembly is arranged on a transmitting path of an illuminating bundle emitted by a light source and positioned between the light source and the light homogenizing assembly; a notch is defined on the light quantity control assembly, the width of the notch changes along the extending direction of the notch, and one light facing side of the light quantity control assembly irradiated by the illuminating bundle is provided with a surface structure for irregularly scattering the illuminating bundle. The invention relates to the projection optical system with longer service life and favorable contrast, and also relates to the light quantity control assembly used for the projection optical system.
Description
Technical field
The present invention relates to a kind of projection optical system, and be used for a fader control assembly of this projection optical system with longer assembly serviceable life and good contrast.
Background technology
With reference to Fig. 1, a known projection optical system 100 comprises a light source 102, a colour wheel (colorwheel) 104, an aperture disc (aperture disk) 106, one optical integration pillar (light integratorrod) 108, one digital micro-mirror device 110, a collector lens 112, a catoptron 114, a relay lens 116, reaches a projection lens 118.Aperture disc 106 is between colour wheel 104 and optical integration pillar 108 and have a notch S.As shown in Figure 2, because being monotonic quantity ground (monotonically) along the bearing of trend of this notch S, the width of notch S changes (notch S width from large to small along clockwise direction as shown).Therefore, when aperture disc 106 is rotated by the drive of step motor 122, can change the area that coincides of a sensitive surface 108a of notch S and optical integration pillar 108, and the light quantity that adjustment light enters optical integration pillar 108, and then control enter at last projection lens 118 light quantity what, when reducing light quantity, can produce darker black, also can increase the brilliant white and the most dark-coloured ratio (improving the light and shade contrast of projection arrangement) of projected picture.
Yet, the material of aperture disc 106 is generally aluminium alloy or stainless steel in the conventional designs, therefore the surface is quite level and smooth bright, when aperture disc 106 rotates to its notch S when being narrow and small opening with respect to optical integration pillar sensitive surface 108a, aperture disc 106 can stop most of former light that should enter optical integration pillar 108, this moment, on the one hand aperture disc 106 caused temperature to rise sharply burning easily because of bearing concentrated illumination, light reflected back light source 102 under aperture disc 106 will stop simultaneously on the other hand causes the obvious rising of lamp temperature and is unfavorable for making the lamp temperature to maintain in its suitable operating temperature range.
Summary of the invention
The invention provides a kind of projection optical system, and be used for a fader control assembly of this projection optical system with preferable assembly serviceable life and good contrast.
According to one embodiment of the invention, a kind of projection optical system comprises a light source, a light uniformization assembly, a fader control assembly, an imaging device and a projection lens.Light source is suitable for sending an illuminating bundle, and the light uniformization arrangement of components is on the bang path of illuminating bundle, so that the illuminating bundle homogenising is become a uniform beam.The fader control arrangement of components is on the bang path of illuminating bundle and between light source and light uniformization assembly, and the fader control assembly has by a side to light of this illumination beam, is formed with a surface structure of this illuminating bundle of irregular scattering in this side to light.The fader control assembly defines the bearing of trend variation of the width of a notch and this notch along this notch, uses to change the light quantity that illuminating bundle enters the light uniformization assembly when the fader control assembly moves or rotates.Imaging device is disposed on the bang path of uniform beam, and so that this uniform beam is converted to an image beam, and projection lens receives and project this image beam.
Another embodiment of the present invention provides a kind of fader control assembly that is used for projection optical system.The fader control assembly has by a side to light of an illumination beam, a surface structure that on this side to light, has this illuminating bundle of irregular scattering, and this fader control assembly define allow this illuminating bundle by and be incident to a notch of a light-receiving module.The width of this notch changes along the bearing of trend of this notch, uses to change the light quantity that this illuminating bundle is incident to this light-receiving module when this fader control assembly moves or rotates.
Design based on above-mentioned each embodiment, when side to light has the surface structure of irregular scattering light, the irregular relatively surface structure of illuminating bundle of irradiation side to light forms in disorder incident angle, the luminous energy that so can effectively disperse and reduce illuminating bundle concentrates on the aperture disc, makes fader control assembly itself be not easy to be burnt.On the other hand, irregular surface structure can cause the reflected light of the in disorder distribution of reflection angle on the side to light, so can reduce by the light quantity in the fader control assembly reflected back light source, reduces the adverse effect that it causes the lamp temperature rise.
Other purpose of the present invention and advantage can be further understood from the disclosed technical characterictic of the present invention.For above and other objects of the present invention, feature and advantage can be become apparent, embodiment cited below particularly and conjunction with figs. are described in detail below.
Description of drawings
Fig. 1 is for showing the exploded view of a known projection optical system;
Fig. 2 is a synoptic diagram, shows the position relation as the relative optical integration pillar of aperture disc notch in the conventional designs of Fig. 1;
Fig. 3 is for showing the exploded view according to the projection optical system of one embodiment of the invention;
Fig. 4 is for showing the enlarged diagram according to the aperture disc of one embodiment of the invention;
Fig. 5 is the synoptic diagram of explanation according to the aperture disc design effect of one embodiment of the invention;
Fig. 6 is for showing the enlarged diagram according to the aperture disc of another embodiment of the present invention.
[primary clustering symbol description]
10 projection optical systems
12 light sources
14 colour wheels
16 aperture discs
16a aperture disc side to light
18 optical integration pillars
18a optical integration pillar sensitive surface
22 digital micro-mirror devices
24 collector lenses
26 catoptrons
28 relay lenss
32 projection lens
34 step motor
42 little processing structures
100 projection optical systems
102 light sources
104 colour wheels
106 aperture discs
108 optical integration pillars
108a optical integration pillar sensitive surface
110 digital micro-mirror devices
112 collector lenses
114 catoptrons
116 relay lenss
118 projection lens
122 step motor
The I illuminating bundle
The R reflected light
The S notch
Sa notch outward flange
Sb notch inward flange
Embodiment
About aforementioned and other technology contents, characteristics and effect of the present invention, in the following detailed description that cooperates with reference to graphic embodiment, can clearly present.The direction term of being mentioned in following examples, for example: upper and lower, left and right, front or rear etc. only are directions with reference to the accompanying drawings.Therefore, the direction term of use is to be used for illustrating not to be to be used for limiting the present invention.
Fig. 3 is for showing the exploded view according to the projection optical system 10 of one embodiment of the invention.With reference to Fig. 3, projection optical system 10 comprises a light source 12, a colour wheel (color wheel) 14, one aperture disc (aperturedisk) 16, an optical integration pillar (light integrator rod) 18, one imaging device (digital micro-mirror device 22), a collector lens (condenser lens) 24, one catoptron 26, a relay lens (relay lens) 28, reaches a projection lens (projection lens) 32.Though imaging device is a digital micro-mirror device 22 in the present embodiment, also can be reflective liquid crystal light valve or other reflective imaging device.
With reference to Fig. 4, aperture disc 16 between colour wheel 14 and optical integration pillar 18 has a notch (slot) S, in one embodiment, notch S profile is roughly defined by a vortex filament type outward flange Sa and a vortex filament type inward flange Sb, and wherein at least one vortex filament has the characteristic of radius linear change with rotation of vortex filament, the width that makes notch S is monotonic quantity ground (monotonically) along the length of this notch S to be changed, and notch S width for example shown in Figure 4 from large to small along clockwise direction.Therefore, when aperture disc 16 is rotated by the drive of step motor for example shown in Figure 5 34, can change the area that coincides of a sensitive surface 18a of notch S and optical integration pillar 18, and the light quantity that the illuminating bundle I that adjusts light source 12 enters optical integration pillar 18, and then control enter at last projection lens 32 light quantity what, when reducing light quantity, can produce darker black, also can increase the brilliant white and the most dark-coloured ratio (improving the light and shade contrast of projection arrangement) of projected picture.According to the design of present embodiment, aperture disc 16 is become a uneven surface by the side to light 16a that light source 12 shines via surface treatment.For example, can adopt the surface treatment mode of blasting treatment (sand blasting), make side to light 16a become a rough sandblast face.As shown in Figure 5, when side to light 16a is a uneven surface, because of making illuminating bundle I, this irregular surface structure exposes to side to light 16a with in disorder incident angle, and in the back formation diffusion that is reflected, the luminous energy that so can effectively disperse and reduce illuminating bundle I concentrates on the aperture disc 16, makes aperture disc 16 itself be not easy to be burnt.On the other hand, side to light 16a goes up the reflected light R that irregular surface structure can cause the in disorder distribution of reflection angle, so can reduce by the light quantity in the aperture disc 16 reflected back light sources 12, reduces the adverse effect that it causes the lamp temperature rise.Moreover, the foregoing description that notch S profile is roughly defined by a vortex filament type outward flange Sa and a vortex filament type inward flange Sb, only the usefulness for illustration does not limit.Notch S also can have other profile, only must reach what the effect of light quantity that control enters projection lens 32 at last and get final product.In addition, aperture disc 16 does not only limit for a kind of illustrative fader control assembly, other is formed with the structure of notch S, if can reach by self move or rotate and change both coincide effects of area of notch S and optical integration pillar 18, all can apply to design of the present invention.
With reference to Fig. 6, in one embodiment, can form little processing structure 42 of a large amount of for example grooves or salient point and so on the side to light 16a of aperture disc 16, can obtain the effect that scattering is incident to the illuminating bundle I on it equally, make aperture disc 16 itself be not easy to be burnt and reduce the adverse effect that it causes the lamp temperature rise.Therefore, by aforesaid different embodiment as can be known, only must reach scattering and arrive at the effect of the illuminating bundle I of side to light 16a and get final product, the surface structure form that is formed on the side to light 16a does not limit fully.
Though the present invention discloses as above with preferred embodiment; right its is not in order to qualification the present invention, any those skilled in the art, without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking the accompanying Claim person of defining.In addition, arbitrary embodiment of the present invention or claim must not reached the disclosed whole purposes of the present invention or advantage or characteristics.In addition, summary part and title only are the usefulness that is used for assisting the patent document search, are not to be used for limiting interest field of the present invention.
Claims (20)
1. projection optical system comprises:
One light source is suitable for sending an illuminating bundle;
One light uniformization assembly is disposed on the bang path of this illuminating bundle, so that this illuminating bundle homogenising is become a uniform beam;
One fader control assembly, be disposed on the bang path of this illuminating bundle and between this light source and this light uniformization assembly, this fader control assembly has by a side to light of this illumination beam, this side to light is formed with a surface structure of this illuminating bundle of irregular scattering, and this fader control assembly defines a notch, the width of this notch changes along the bearing of trend of this notch, allow described illuminating bundle by and be incident on the described light uniformization assembly, use and when this fader control assembly moves or rotates, change the light quantity that this illuminating bundle enters this light uniformization assembly;
One imaging device is disposed on the bang path of this uniform beam, so that this uniform beam is converted to an image beam; And
One projection lens receives and projects this image beam.
2. projection optical system as claimed in claim 1, the wherein area that coincides that moves or rotate a sensitive surface that changes this notch and this light uniformization assembly of this fader control assembly.
3. projection optical system as claimed in claim 1, wherein this fader control assembly is an aperture disc.
4. projection optical system as claimed in claim 1, wherein the profile of this notch is defined by a vortex filament type outward flange and a vortex filament type inward flange.
5. projection optical system as claimed in claim 1 also comprises a color generation component, is configured on the bang path of this illuminating bundle and between this light source and this aperture disc.
6. projection optical system as claimed in claim 5, wherein this color generation component is a colour wheel.
7. projection optical system as claimed in claim 1, wherein this light uniformization assembly is an optical integration pillar.
8. projection optical system as claimed in claim 1, wherein this imaging device is a digital micro-mirror device or a reflective liquid crystal light valve.
9. projection optical system as claimed in claim 1 also comprises a catoptron and a relay lens on the bang path that is disposed at this uniform beam, so that this uniform beam is passed to this imaging device.
10. projection optical system as claimed in claim 1, wherein this surface structure of this side to light comprises a sandblast structure.
11. projection optical system as claimed in claim 1, wherein this surface structure of this side to light comprises a plurality of little processing structures.
12. projection optical system as claimed in claim 11, wherein these a plurality of little processing structures are a plurality of grooves or a plurality of salient point.
13. projection optical system as claimed in claim 1, wherein the width of this notch is the variation of monotonic quantity ground along the bearing of trend of this notch.
14. fader control assembly that is used for projection optical system, it has by a side to light of an illumination beam, this side to light is formed with a surface structure of this illuminating bundle of irregular scattering, and this fader control assembly define allow this illuminating bundle by and be incident to a notch of a light-receiving module, the width of this notch changes along the bearing of trend of this notch, uses to change the light quantity that this illuminating bundle is incident to this light-receiving module when this fader control assembly moves or rotates.
15. fader control assembly as claimed in claim 14, wherein this fader control assembly is an aperture disc.
16. fader control assembly as claimed in claim 14, wherein the profile of this notch is defined by a vortex filament type outward flange and a vortex filament type inward flange.
17. fader control assembly as claimed in claim 14, wherein this surface structure of this side to light comprises a sandblast structure.
18. fader control assembly as claimed in claim 14, wherein this surface structure of this side to light comprises a plurality of little processing structures.
19. fader control assembly as claimed in claim 18, wherein these a plurality of little processing structures are a plurality of grooves or a plurality of salient point.
20. fader control assembly as claimed in claim 14, wherein the width of this notch is the variation of monotonic quantity ground along the bearing of trend of this notch.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101254298A CN101604113B (en) | 2008-06-13 | 2008-06-13 | Projection optical system and light quantity control assembly for same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101254298A CN101604113B (en) | 2008-06-13 | 2008-06-13 | Projection optical system and light quantity control assembly for same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101604113A CN101604113A (en) | 2009-12-16 |
| CN101604113B true CN101604113B (en) | 2011-03-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101254298A Expired - Fee Related CN101604113B (en) | 2008-06-13 | 2008-06-13 | Projection optical system and light quantity control assembly for same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101604113B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI498593B (en) * | 2012-11-06 | 2015-09-01 | Ind Tech Res Inst | Projection lens, projection device and optically-induced microparticle device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1098536A2 (en) * | 1999-11-05 | 2001-05-09 | Texas Instruments Incorporated | Colour recapture for projection systems |
| JP2003222822A (en) * | 2002-01-31 | 2003-08-08 | Tamron Co Ltd | Projection device |
| CN1624524A (en) * | 2003-09-08 | 2005-06-08 | 三星电子株式会社 | Illuminator |
| JP2005292358A (en) * | 2004-03-31 | 2005-10-20 | Fujinon Corp | Projection-type image display device |
| CN1991561A (en) * | 2005-12-29 | 2007-07-04 | 精工爱普生株式会社 | Optical diaphragm, projector, correction parameter correction device and method |
-
2008
- 2008-06-13 CN CN2008101254298A patent/CN101604113B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1098536A2 (en) * | 1999-11-05 | 2001-05-09 | Texas Instruments Incorporated | Colour recapture for projection systems |
| JP2003222822A (en) * | 2002-01-31 | 2003-08-08 | Tamron Co Ltd | Projection device |
| CN1624524A (en) * | 2003-09-08 | 2005-06-08 | 三星电子株式会社 | Illuminator |
| JP2005292358A (en) * | 2004-03-31 | 2005-10-20 | Fujinon Corp | Projection-type image display device |
| CN1991561A (en) * | 2005-12-29 | 2007-07-04 | 精工爱普生株式会社 | Optical diaphragm, projector, correction parameter correction device and method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101604113A (en) | 2009-12-16 |
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