CN101555097B - glass data designing system and method - Google Patents
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Abstract
The object of the invention is to realize a glass data designing system which can simultaneously design reticule data and glass data when a small glass faceplate carrying a telephone faceplate is exposed on a big glass foundation plate through a big reticule so as to provide the best solution to cost calculation. The glass data designing system for a flat plate display is characterized by input faceplate unit data, shape of aligning sign data and parameter information including glass unit size and configuration information of each data. The glass data designing system comprises: a reticule data generating mechanism having faceplate reticule data outputting function of outputting faceplate reticule unit data and aligning reticule data outputting function of generating and outputting aligning reticule unit data; and a glass unit data generating mechanism having glass unit data outputting function of generating and outputting glass unit data and technical information outputting function of generating and outputting technical information for generating glass unit data.
Description
Technical field
The present invention relates to be used to make glass data designing system, glass design data method and the program of flat-panel monitor.
Background technology
In the past, when generation is used to make the glass data of flat-panel monitor, at first generated reticule data, and made this reticule data generate the glass data with the array configuration on glass by the panel unit data.That is, the generation of the generation of this reticule data and array configuration data on glass is independently carried out.
But, will be with the portable phone the small-sized flat-panel monitor of representative under the situation through the reticule data exposure on the extensive glass substrate, need prediction in advance to make several flat-panel monitors through exposure irradiation several times.That is, this be because make number increase when making the panel unit rotation make number, or the situation of rectangular reticle or circular reticle under increase various conditions such as making number and difference.
We can say that this is a kind of problem of selection or prediction of top condition.Up to now, still there is not to propose to realize the example of the scheme that manufacturing cost is optimized through relation with parameter control panel unit, reticule data and glass data.
For example, in patent documentation 1, disclose a kind of reticle generation method, it optimize the conditions of exposure of exposure apparatus itself, but this can not realize the optimization of data number to be solved by this invention, can not estimate through changing the condition of exposing beam.
Patent documentation 1: TOHKEMY 2006-332703 communique
The problem that the present invention will solve is to construct a kind of design system; When definite panel unit and glass size; Estimation generates exposure data via reticle with what condition can access optimum solution, and generates the manufacturing data of reticule data and glass data simultaneously.
Talk about optimization problem, famous is linear programming method, in the field of the invention; Because along with the size of reticle and the size of glass become big; The manufacturing number increases, and exposure frequency reduces, thereby has the indefinite characteristic of the desired reciprocal incident of linear programming method.Therefore, if distinguished manufacturing number and exposure frequency, then can estimate prediction fully according to the condition of setting.
And, not only require the estimation prediction, also to generate the manufacturing data simultaneously.In addition, in the present invention, require in graphicalphanumeric display, to confirm.That is, this is because in change during various parameter, needs to confirm as the configuration data on its result's the reticle, array configuration data on glass through figure.
And, in any case owing to all generates or estimate the data by exposure apparatus exposure, thereby need generation or estimate the data that can make.
That is, also need the scope that can make public all the time in the exposure apparatus (also being called stroke) be defined as exposure irradiation unit, and whether checking has got in this scope.And, owing to generate the data that can make, thereby become data file as the input of exposure apparatus.That is, become the data file of action of the exposure apparatus at the position of describing so-called technique information.
Summary of the invention
The objective of the invention is to realize glass data designing system; And glass design data method and the program of using in this system thereof be provided; Utilize this glass data designing system; Will be with the panel of portable phone the little face glass of representative via big reticle under the situation of making public on the big glass substrate, can obtain reticule data and glass data simultaneously, and provide it to make number and exposure frequency, be the optimum solution of estimated cost calculating.
In order to solve above-mentioned problem; Glass for flat panel display data designing system of the present invention has arithmetic processing section, storage part and input/output mechanism, the shape of said arithmetic processing section TIP cell data, the shape that is configured in the peripheral alignment mark data of above-mentioned panel unit data and the parameter information that comprises the configuration information of each data; And comprise: reticule data generates mechanism, and it has output as the panel reticule data output function of the panel reticle cell data of the data of the illumination light mask that disposes above-mentioned panel unit data and output and generate the aligning reticule data output function of aligning reticle cell data of data that the illumination light mask of above-mentioned alignment mark data is disposed in conduct; Generate mechanism with the glass unit data, it has and generates and glass unit data output function and generation and output that the glass unit data of above-mentioned panel unit data and above-mentioned alignment mark data are disposed in output are used to generate the technique information output function of the technique information of glass unit data.
And; In order to solve above-mentioned problem, glass for flat panel display design data method of the present invention is characterised in that, glass for flat panel display design data method; It is characterized in that; Comprise: data input operation, TIP cell data, alignment mark data and the data that comprise parameter information, said parameter information has the configuration information of glass unit size, each data; Reticle unit A data generate operation, generate the data as the partition of a set plate unit A of maximum exposure unit of panel unit according to said panel unit data and said parameter information; Exposure irradiation zone identification operation, the regional configuration of a plurality of exposure irradiation that is identified in a part of utilizing said reticle unit A on the said glass unit size or all makes public; Operation is selected in the exposure irradiation zone, from said a plurality of exposure irradiation zone, selects specific said exposure irradiation zone with exposure area order from big to small from said reticle unit A; The exposure irradiation arrangement step, with selected said exposure irradiation area configurations on glass unit as exposure irradiation; But exposure range inspection operation judges whether the said exposure irradiation zone that is disposed can make public in the mill; The glass unit end exposure is judged operation; But be judged as the said exposure irradiation zone that to make public according to configuration in said exposure irradiation arrangement step and in said exposure range inspection operation, but judge whether the exposure range of the panel unit of said glass unit is all filled up; The repetition operation is selected in exposure irradiation zone, judges at said glass unit end exposure to be judged as in the operation under the situation that said glass unit exposure area is not filled, and returns said exposure irradiation zone once more and selects operation, repeats identical processing; The alignment mark arrangement step generates the data as the irradiation B of the exposure irradiation data of alignment mark according to said alignment mark data and said parameter information, on said glass unit size, disposes with array; Reticle unit B data generate operation, on reticle, generate the data of said irradiation B, and generate reticle unit B data; But alignment mark exposure range inspection operation judges whether the alignment mark that is generated by said reticle unit B data can make public in the mill; The marginal check operation, whether inspection converges on the edge by the specified glass unit of said parameter information through the integral body of each exposure irradiation that said each operation forms on glass unit; With design result output operation, last data that generate of output and the technique information that is used to generate glass unit.
And; In order to solve above-mentioned problem; Glass design data as the glass for flat panel display data designing system with arithmetic processing section, storage part and input/output mechanism is used program, it is characterized in that, makes computingmachine carry out following program: data input operation; TIP cell data, alignment mark data and the data that comprise parameter information, said parameter information has the configuration information of glass unit size, each data; Reticle unit A data generate operation, generate the data as the partition of a set plate unit A of maximum exposure unit of panel unit according to said panel unit data and said parameter information; Exposure irradiation zone identification operation, the regional configuration of a plurality of exposure irradiation that is identified in a part of utilizing said reticle unit A on the said glass unit size or all makes public; Operation is selected in the exposure irradiation zone, from said a plurality of exposure irradiation zone, selects specific said exposure irradiation zone with the descending order in exposure area from said reticle unit A; The exposure irradiation arrangement step is configured in selected said exposure irradiation zone on the glass unit as exposure irradiation; But exposure range inspection operation judges whether the said exposure irradiation zone that is disposed can make public in the mill; The glass unit end exposure is judged operation; But be judged as the said exposure irradiation zone that to make public according to configuration in said exposure irradiation arrangement step and in said exposure range inspection operation, but judge whether the exposure range of the panel unit of said glass unit is all filled up; The repetition operation is selected in exposure irradiation zone, judges at said glass unit end exposure to be judged as in the operation under the situation that said glass unit exposure area is not filled, and returns said exposure irradiation zone once more and selects operation, repeats identical processing; The alignment mark arrangement step generates the data as the irradiation B of the exposure irradiation data of alignment mark according to said alignment mark data and said parameter information, on said glass unit size, disposes with array; Reticle unit B data generate operation, on reticle, generate the data of said irradiation B, and generate reticle unit B data; But alignment mark exposure range inspection operation judges whether the alignment mark that is generated by said reticle unit B data can make public in the mill; The marginal check operation, whether inspection converges on the edge by the specified glass unit of said parameter information through the integral body of each exposure irradiation that said each operation forms on glass unit; With design result output operation, last data that generate of output and the technique information that is used to generate glass unit.
Thus; Utilizing big reticle will be that the small panel of representative is under the situation of making public on the big glass substrate with the portable phone panel; Can carry out the generation of the reticule data of independent processing in the past and the generation of glass data simultaneously; The parameter of rotation that can be through comprising the panel unit data dopes in advance to be made unit price and exposure-processed time, and can carry out creating conditions with the best is the data processing of prerequisite.
In addition, owing to can also calculate the exposure irradiation number of times, thereby can calculate the required time of exposure apparatus, can calculate the cost that utilizes exposure apparatus on glass unit, to make panel unit.
Therefore, can realize a kind of glass data designing system, utilize this glass data designing system to generate and be easy to carry out the manufacturing data that pricing also can obtain optimum solution.And, can be provided at glass design data method and the program thereof used in this system.
Description of drawings
Fig. 1 is the functional block diagram of an embodiment that is used for the glass data designing system of flat-panel monitor of the present invention.
Fig. 2 is the explanatory view of textural element of the import and export of expression embodiment shown in Figure 1.
Fig. 3 is the explanatory view that inserts object lesson in IO key element shown in Figure 2.
Fig. 4 is the chart of detailed content of the parameter information of this embodiment of expression.
The explanatory view of the rotation parameter when Fig. 5 is expression generation reticle unit A and the relation of spacing.
Fig. 6 is the schema of processing sequence of the treatment system of this embodiment of expression.
Fig. 7 is expression generates the data handling procedure of glass unit data via reticle unit A from panel unit a explanatory view.
Fig. 8 is expression generates the reticle unit B data generation operation of reticle unit B via the glass data from alignment mark a explanatory view.
Fig. 9 is the explanatory view of the example of expression reticle type and size.
Figure 10 is the technique information respectively chart of the part of the coordinate of irradiation partly that expression is generated by reticle unit A.
Figure 11 is the explanatory view of the data qualification in the expression exposure irradiation zone that is used to calculate reticle unit A.
Figure 12 is the explanatory view of the computation sequence in the expression exposure irradiation zone of being undertaken by the reticle unit.
Figure 13 is a schema of implementing the program of calculating content shown in Figure 12.
Figure 14 is the figure of expression as an example of the window demonstration of the output pattern data on the display unit.
Figure 15 is the explanatory view of relation of rotation parameter and spacing of representing only to have specified the physical dimension of panel unit.
Figure 16 is the figure of the panel unit shape data with the physical dimension of only having specified panel unit when being configured on the glass unit.
Figure 17 is the chart that the spreadsheet calculations formula of obtaining number of the panel unit on the glass unit is calculated in expression.
Embodiment
Below, utilize accompanying drawing to specify the present invention.Fig. 1 is the functional block diagram of an embodiment that is used for the glass data designing system 10 of flat-panel monitor of the present invention.
Program as main has (1) data entry program, (2) reticle unit A data generator, (3) exposure irradiation zone recognizer, (4) exposure irradiation zone select procedure, (5) exposure irradiation configurator, (6) but exposure range test routine, (7) panel unit end exposure determining program, (8) exposure irradiation zone select repetitive routine, (9) alignment mark configurator, (10) reticle unit B data generator, (11) but alignment mark exposure range test routine, (12) marginal check program, (13) design result written-out program.
The detailed content of these programs of literary composition explanation in the back.In addition, in this embodiment, as input-output unit, appended display unit 13, key board unit 15, mouse apparatus 14 and as each device of the file storage apparatus of storing mechanism 12 as textural element.
Fig. 2 is the explanatory view of textural element of the import and export of this embodiment of expression.
The information of being imported is panel unit data, alignment mark data and parameter information.After above-mentioned information temporarily is stored in the input block territory 122 of storing mechanism 12, in as the arithmetic processing section 11 of the treatment system of this embodiment, use.
The reticle unit A data of panel unit are disposed in the panel reticule data output function 111a output that reticule data through arithmetic processing section 11 generates mechanism 111, and dispose the reticle unit B data of alignment mark through aiming at reticule data output function 111b output.
And; The glass unit data of panel unit and alignment mark are disposed in the glass unit data output function 112a output that generates mechanism 112 through the glass unit data, are used to make the technique information data of the exposure-processed data of glass unit through technique information output function 112b output conduct.
Above-mentioned output data is exported through display unit 13 take-off equipments such as grade after temporarily being stored in the output data zone 123 of storing mechanism 12.
Open graphic system exchange standard) the panel unit data are usually with GDSII or OASIS (The Open Artwork SystemInterchange Standard: standard data input such as.The alignment mark data provide as DB, but still provide with standard format forms such as GDSII or OASIS usually.The data of reticle unit A or B and glass unit are also exported with standard format forms such as GDSII or OASIS.
Fig. 3 is the explanatory view that in the input/output structure key element of Fig. 2, inserts object lesson.In order to understand content shown in Figure 2 easily, here this figure is the concrete figure that embeds with the example of literal " F " symbol panel unit data.Shown on reticle unit A and glass unit, panel unit is assumed to the small panel as the portable phone panel.Such small panel disposes a plurality ofly on reticle unit A with array, and on glass unit, dispose a plurality of with array.
Alignment mark is configured in the left and right sides periphery of panel unit, and above-mentioned panel unit disposes with array in glass unit.As the data configuration on the basis of alignment mark on reticle B.
Technique information is the file that records the exposure irradiation data relevant with the reticle unit B with the reticle unit A that constitutes glass unit.Exposure apparatus reads technique information, carries out exposure-processed, and on glass substrate, the data that are equivalent to glass unit is carried out exposure-processed.Therefore, on glass unit shown in Figure 3, illustrate the data that can obtain by the result of exposure-processed.
Fig. 4 representes the detailed content of the parameter information of this embodiment.
(1) panel unit is set unit title and the X spacing and the Y spacing that comprise the gap when being configured on the reticle unit.Here, X spacing and Y spacing can be recorded and narrated with rectangle (rectangle) by standard datas such as GDSII or OASIS through the shape of width and height, but in this case, also need the value in gap.Here, the gap that sets that in X spacing and Y spacing, comprises is reflected to the reticle unit, and the result also is reflected to glass unit.
(2) Configuration Type is represented the rotation of panel unit on reticle.Under the situation that is not having rotation, panel unit does not rotate, but directly is configured on the reticle and becomes reticle unit A.Under the situation of having specified rotation, panel unit after dextrorotation turn 90 degrees is configured on the reticle and becomes reticle unit A.
(3) the glass unit unit title representing to be generated and the size of glass substrate.About the size of substrate, the size that actual exposure is handled must be littler than it, and its edge is in following setting.
(4) the glass unit edge is the edge that the size of corresponding aforesaid substrate is defined as the substrate correspondence as the size of exposure-processed data generation.Four kinds of tops, bottom, the left side, the right have been specified.
(5) about reticle type and size, the shape of reticle is represented rectangle or circle, and stipulates its size by width and height or radius.
(6) but exposure range also is known as stroke, be used to the scope of representing that the exposure-processed device can mechanically make public, by width with highly stipulate.
(7) alignment mark unit, according to the specified configuration of exposure during alignment mark about the panel unit group, by comprise and left and right sides panel unit between the gap the X spacing and comprise and up and down the Y spacing in the gap between the alignment mark stipulate.
The figure of the rotation parameter when Fig. 5 is expression generation reticle unit A and the relation of spacing.It is the example of the correlation parameter of the rotation represented with the Configuration Type of Fig. 4 (2).X spacing shown in Fig. 3 (1) and Y spacing are used to represent postrotational situation, and be different with this example.
Then, the processing sequence of the treatment system of this embodiment of expression in the schema of Fig. 6.
(1) at first, in step S101, TIP unit, alignment mark, parameter information (data input operation).Here, alignment mark is preserved as DB usually.
(2) then, in step S102, according to panel unit and parameter information, the panel reticule data output function 111a that generates mechanism 111 through reticule data generates reticle unit A data (reticle A data generate operation).
(3) here; In step S103; Owing on reticle unit A, be formed with a plurality of panel units, thereby the numerical value of glass unit size is carried out with the division is the numerical operation of main body, the exposure irradiation zone on the identification reticle unit A (exposure irradiation zone identification operation).Usually discern a plurality of exposure irradiation zone (describing in detail below) here.Here, the exposure irradiation zone of being identified for example is four kinds of AA/AB/AC/AD.The generation in this exposure irradiation zone is undertaken by the exposure irradiation data systematic function 112f that the glass unit data generate mechanism 112.
(4) then, in step S104, select an exposure irradiation zone, select exposure irradiation zone AA (operation is selected in the exposure irradiation zone) here.
(5) in step S105, on glass unit, dispose (exposure irradiation arrangement step) as exposure irradiation.Usually form the array configuration.Center with respect to glass unit is configured with positive and negative X value, Y value.
(6) then, in step S106, but according to specifying by the specified exposure range of parameter, the exposure irradiation zone AA that inspection is disposed whether can on manufacturing installation, make public (but exposure range inspection operation).The glass unit data output function 112a that generates mechanism 112 through the glass unit data outputs on the glass unit.
(7) then, in step S107, but judge whether the exposure range of the panel unit on the glass unit is all filled up (the glass unit end exposure is judged operation).
But under the situation that the exposure range of the panel unit on the glass unit is not all filled up; Return step S104 once more, also to exposure irradiation zone AB, AC, AD the carries out processing (exposure irradiation zone select repetition operation) identical with the situation of exposure irradiation zone AA.
In this process, of the back literary composition, the number computing function 112c that generates mechanism 112 through the glass unit data calculates the number that is configured in the panel unit on the glass unit, and 112d calculates exposure frequency through the exposure frequency computing function.
(8) but under the situation that the exposure range of the panel unit on the glass unit is all filled up; Get into step S108; Utilization is by alignment mark data and the specified alignment mark irradiation of parameter value, with alignment mark exposure irradiation data (it is called irradiation B) with respect to the central value of glass unit with array configuration (alignment mark arrangement step).
(9) then,, utilize reticule data to generate the aligning reticule data output function 111b of mechanism 111, on reticle, generate the data of shining B, generate reticle unit B data (reticle unit B data generate operation) at step S109.
(10) then, at step S110, but also the alignment mark that is generated by reticle unit B data is carried out the inspection (but alignment mark exposure range inspection operation) of exposure range.
(11) and; At step S111; With respect to the integral body in each the exposure irradiation zone that on glass unit, forms like this, the remainder computing function 112f that generates mechanism 112 through the glass unit data carries out the marginal check (marginal check operation) by the specified glass unit of parameter.
(12) last, in step S112, output is generated the data of the glass unit data output function 112a generation of mechanism 112 by the glass unit data.The technique information output function 112b that generates mechanism 112 through the glass unit data here, has also exported the technique information (design result output operation) of each exposure irradiation configuration data of recording when generating glass unit etc.
Wherein, each operation of more than enumerating can be stored in the program that the package 121 in the storing mechanism 12 comprised and realizes through being carried out by arithmetic processing section 11.
The program corresponding with each operation, but but there are the data entry program shown in the technical scheme 11, reticle unit A data generator, exposure irradiation zone recognizer, exposure irradiation zone select procedure, exposure irradiation configurator exposure range test routine, glass unit end exposure determining program, exposure irradiation zone to select repetitive routine, alignment mark configurator, reticle unit B data generator, alignment mark exposure range test routine, marginal check program and design result written-out program.
Fig. 7 is that expression utilizes panel reticule data output function 111a that reticule data generates mechanism 111 via the explanatory view that is generated the data handling procedure of glass unit data by panel unit abc designated parameters and the reticle unit A that is generated.
At first, generate reticle unit A according to configuration condition by panel unit abc designated parameters.On reticle unit A, form a plurality of panel units here.
Then, with the size of specified glass unit size, at first calculate the exposure frequency of exposure irradiation zone AA shown in Figure 7 divided by the panel unit group that on the reticle unit A that is generated, forms.
Then, also carry out identical division arithmetic, obtain exposure irradiation zone AB for the remainder on the glass unit that obtains through the division arithmetic result.Obtain exposure irradiation zone AC and AD identically.From such irradiation area that exposes completely, utilization is carried out the resulting remainder of division arithmetic successively and is calculated the exposure irradiation zone of zonule and discern (detailed content that these method of calculation described in literary composition in the back).
Here, the generation in a plurality of exposure irradiation zone is carried out through the exposure irradiation data systematic function 112e that the glass unit data generate mechanism 112, and the calculating of the exposure frequency in each exposure irradiation zone is carried out through exposure frequency computing function 112d.
Thus; To each exposure irradiation area marking title; The technique information output function 112b that generates mechanism 112 through the glass unit data generates and the output technique information, and wherein above-mentioned technique information has been put down in writing the generation operation of utilizing the glass unit that allocation position puts down in writing apart from the X value of center of glass and Y value.
Above-mentioned allocation position has been specified apart from the allocation position at glass unit center usually.
And, the implication on the size of the glass unit that expression is explained by Fig. 4 (3) and Fig. 4 (4) in Fig. 7 and the top at glass unit edge, bottom, the right, the left side.After generating glass unit, from the width of glass unit and the zone after highly deducting the edge on each limit be the actual scope that allows to exist the glass unit data.Above-mentioned glass unit edge carries out computing through the remainder computing function 112f that the glass unit data generate mechanism 112.
Fig. 8 is expression generates mechanism 111 through reticule data aligning reticule data output function 111b; On glass unit, form B exposure irradiation zone according to the alignment mark data, the reticle unit B data that generate the reticle unit B then generate the explanatory view of operation.In the configuration in irradiation B zone, stipulate through the parameter shown in Fig. 4 (7).
About alignment mark, at first generate the data in the glass unit after, generate the reticle unit B of necessary alignment mark.This be because, because alignment mark is by the stockization, and exist multiple, thereby data generate be fit in the operation be to confirm to construct the alignment mark of glass unit on the indicating meter after regeneration reticle unit B.
Also represent X spacing and Y spacing here, as the alignment mark parameter shown in Fig. 4 (7).
The reticle type shown in Fig. 9 presentation graphs 4 (5) and the example of size.
Rectangle and circle are arranged in the reticle type.Expression width and height are represented radius in circle in rectangle.The reticle type that is used to make flat-panel monitor is not limited to circle, and rectangle is also arranged.This is that rectangular situation is more manageable because in the management of reticle itself.
If in certain area the panel unit of the maximum numbers of configuration, then circle is the most suitable, but in fact about up and down outstanding panel unit in exposure irradiation is handled, be difficult for using, thereby in most cases rectangle just is enough to.This is because glass shape is a rectangle, and this point and silicon chip are that the semiconductor exposure of circle is different.
Figure 10 is the technique information respectively chart of the part of the coordinate of irradiation partly that expression is generated by reticle unit A.
AA, AB, AC, AD are the regional title of exposure irradiation that is generated, and record separately X value and Y value apart from the glass unit center therein.This is the part with character file output.
In this document, record and narrate irradiation B exposure information by the irradiation title with apart from the X value and the Y value of center of glass equally as the alignment mark data.The technique information of here describing records the exposure irradiation number of times, can calculate the required time of exposure thus.Can calculate the exposure apparatus cost of each panel unit that can obtain from glass unit thus.
Figure 11 is an explanatory view of representing to be used for the data qualification of calculation exposure irradiation area about reticle unit A.Importantly, fix reticle size and glass size here, through the parameter appointment.
Behind definite the two numerical value, according to how making the panel unit rotation generate reticle unit A, how extract out cost and exposure-processed time (result can calculate cost) that concentrated exposure irradiation zone calculates each panel.
Glass size in most cases is fixed in the mill, can the exposure-processed time which kind of degree to change to confirm best reticle size with when changing the reticle cell size.
In general, when glass size and reticle size were big, manufacturing unit price and exposure-processed time all reduced.Therefore; Here; Comprise making panel unit rotation and generating the unitary situation of reticle, can confirm to make the unitary cost of reticle (it depends on the size of reticle) and exposure-processed time (it also depends on the size of reticle) and by the cost (it depends on the size of glass) of each panel unit of glass manufacturing.
Figure 12 is the explanatory view of the computation sequence in the expression exposure irradiation zone of being undertaken by the reticle unit.Here, expression is an exposure irradiation data computing order through the segment set cooperation that remainder calculates the panel unit that will on reticle unit A, form.
At first, the size (here for also comprising the size in gap, X spacing shown in Fig. 3 (1) and Y spacing) of establishing panel unit is X0, Y0, and the maximum of the unitary panel unit set of reticle is of a size of X1, Y1, and the size of glass unit is X2, Y2.
At first, confirming of exposure irradiation group confirmed from big beginning for the first time, uses (X2, Y2) divided by (X1, Y1) then.As a result, confirm to organize number of times Xkaisu1 and the Ykaisu1 that makes public with (X1, Y1), and, confirm remainder Xamari1 and Yamair1.Confirm exposure irradiation thus, this exposure irradiation title is confirmed as AA, confirm that AA partly gathers and multiplicity.
Then, the exposure irradiation zone is deducted the part (X1-X0) of a panel unit and carry out division arithmetic and calculate Xamari2 with respect to Xamari1.The division arithmetic result is Xkaisu2, and it confirms the exposure irradiation zone AB as the next section set as the multiplicity to exposure irradiation AB.Wherein, because 2 (n-1) >=n, thereby Xkaisu n (n>2 positive integer) is always 1 or 0.
If carry out identical processing along the Y direction, then can calculate zone and the multiplicity of part set AC, calculate zone and the multiplicity of exposure irradiation AD, the unitary sum of reticle on the glass unit at last.When calculating multiplicity, use the glass unit data to generate the exposure frequency computing function 112d of mechanism 112.
When calculating section set and multiplicity, also calculate X coordinate and Y coordinate simultaneously here, apart from center of glass.And multiplicity also can be 1 time.
Judge whether the exposure irradiation zone sets up, the condition that under invalid situation, is displaced downwardly to less exposure irradiation zone is: the numerical value that is equivalent to XkaisuM or YkaisuN is zero.
X remainder and Y remainder all ratio panels unit are final termination condition for a short time.In the calculating of remainder, use the glass unit data to generate the remainder computing function 112f of mechanism 112.And behind definite exposure irradiation zone, the number computing function 112c that generates mechanism 112 through the glass unit data calculates the unitary sum of the reticle that on glass unit, forms.
Here, the order that moves down is for make up directions X and the Y direction is carried out successively.Its result can consider to be chosen in the rectangle set of the panel unit in the rectangular combination that reticle unit A goes up the whole adjacency that form.And, utilize division arithmetic and remainder to be illustrated here, repeat the processing that subtraction also can be equal to fully.Like this, through extracting bigger exposure irradiation zone in the set of the panel unit that on reticle unit A, forms out, have the effect that exposure-processed time of making in the exposure apparatus shortens, can be described as very important regional extraction method.
Figure 13 is the programflow chart of aforementioned calculation content.
In this program, obtain the exposure irradiation of reticle unit A and partly gather and multiplicity AMN.Particular content is: big or small X1, the Y1 of A begin from the reticle unit, and the multiplicity towards directions X of establishing in the size of X1 is M, and the multiplicity towards the Y direction in the Y1 size is N, carry out initial value and start, and dwindle the exposure area successively.
Dwindling of exposure area, for glass unit be zone with remainder part as object, be that zone with the part that deducts a panel unit is as object for the reticle unit.M and N are multiplicity, are the multiplicity for the maximum reticle unit area of this moment.Therefore, also can be M=1, N=1.
After confirming zone and multiplicity M and N, glassy zone deducts by the part of exposure area (rewriting of X2, Y2), and the reticle unit area also deducts a panel unit partly (rewriting of X1, Y1), calculates.Importantly, when the exposure irradiation of confirming reticle unit A is partly gathered with multiplicity AMN, it is disposed with array according to the configuration coordinate apart from center of glass.
Here, final remaining remainder in uniformly distributing up and down, is disposed with array according to the coordinate apart from center of glass.About this processing, also identical for the irradiation B in the alignment mark data.When using program shown in Figure 13 like this, the exposure irradiation number of times can be calculated, the required time of exposure can also be calculated.
Figure 13 is described in more detail.
At first, in step S201, confirm on the glass unit size, whether enough to process panel unit (X0>X2, Y0>Y2).
Then, in step S202, utilize X1, the Y1 of reticle unit A, calculate the maximum number of repetitions M and maximum number of repetitions N highly of the width of this reticle unit A.
And,, obtain exposure frequency T=MN according to maximum number of repetitions M that in step S203, obtains and N.Then in step S204, the irradiation number of times W of width is set at W=M.The processing of this moment is carried out through the exposure frequency computing function 112d that the glass unit data generate mechanism 112.
Then, in step S205,, X2 is replaced to the remainder of width as X2=(X2-X1*M).The processing of this moment is carried out through the remainder computing function 112f that the glass unit data generate mechanism 112.
Then, in step S206,, X1 is deducted the part of the width that is equivalent to a panel unit as X1=(X1-X0).At this moment, judge that in step S207 whether X1 is greater than 0.Owing to become 0 or 0 when following, can not continue the width that reduces to shine, thereby this entering deducts step S212 highly.
Then, greater than 0 o'clock, whether the remainder X2 that judges width at step S208 was greater than the width X1 of irradiation current at X1.
X2 is during greater than X1; In step S209; The remainder X2 of width is reduced irradiating width X1, X2=(X2-X1), the irradiation number of times W with width in step S210 increases by 1; In step S211, maximum exposure is shone the amount that number of times T increases the irradiation times N that is equivalent to current short transverse, return step S206.In step S208, when the remainder X2 of width is big unlike the width X1 of irradiation current, directly return step S206.
Repeat step, become below 0 or 0 until the remainder X2 of width from step S206 to step S211.
The remainder X2 of width becomes 0 or 0 when following, at step S212, as Y=(Y2-Y1*N), height Y2 is replaced with the remainder of height.Then in step S213, whether the unitary height Y0 of ratio panels is little to judge the remainder Y2 of this height.Under its little situation, get into step S219.
Under its big situation, in step S214,, Y1 is deducted the amount of the height that is equivalent to a panel unit as Y1=(Y1-Y0).At this moment, judge that in step S215 whether Y1 is greater than 0.Owing to become 0 or 0 when following, can not continue the width that reduces to shine, thereby finish behind the entering step S219.
Then, at Y1 greater than 0 o'clock, at the remainder Y2 of step S216 decision height whether greater than the height Y1 of irradiation current.
When bigger than it, in step S217, as Y2=(Y2-Y1), the remainder Y2 minimizing irradiation height Y1 with height shines the amount that number of times T increases the irradiation number of times W that is equivalent to current width with maximum exposure in step S218, return step S214.In step S216, the remainder Y2 of height directly returns step S214 when big unlike the height Y1 of irradiation current.
In step S215; When Y1 becomes 0 or 0 when following; Or in step S201, step S213, being entering step S219 under the situation of " being ", final remaining remainder part is finished each exposure irradiation area configurations by uniformly distributing up and down in the position apart from center of glass.
Carrying out above-mentioned a series of process result is that final exposure frequency is added among the T.
Figure 14 representes the example that the window as graph data on the display unit 13 of this embodiment shows.Above-mentioned demonstration is carried out through the data presentation function 113a of IO member 113.
Here, there are 2 kinds in window, totally 4.That is, the graphical window of standard datas such as showing GDSII or OASIS and the dialog box of display parameter are arranged as kind.As graphical window, display panel unit data, reticle unit A/B data, glass unit.
The invention is not restricted to above-mentioned embodiment, in the scope that does not change purport of the present invention, can consider various variation.
For example, in above-mentioned embodiment, obtained the design data that comprises the unitary exposure irradiation number of times of actual use reticle.But, the most important thing is in the pricing, confirm on glass unit, can obtain several panel units.For this reason, as variation, can consider only directly to obtain the example of the panel unit number that can obtain on the glass unit through simple computation.
Figure 15, Figure 16, Figure 17 represent only of the present invention more simple second embodiment of display panel unit profile.Owing to the most important thing is to confirm on glass unit, can obtain several panel units in the pricing, thereby effectively use commercially available electrical form software to extract the part of foregoing invention embodiment out and implement, confirm best panel unit shape and rotation in advance.
Figure 15 is the explanatory view of the relation of rotation parameter and spacing when representing the unitary physical dimension of given panel only, representes non-rotary situation and revolves situation about turning 90 degrees.In this case, do not need the unitary concrete content-data of panel.Accurate description as the panel unit shape data, only needs X spacing and Y spacing.Only specify " not rotating " or " revolve and turn 90 degrees " to get final product as parameter on this basis.
Figure 16 is the figure when being configured in the panel unit shape data on the glass unit, is illustrated on the glass unit and can disposes several panel units.
And Figure 17 is the spreadsheet formulas of obtaining number that in example shown in Figure 16, only calculates the panel unit on the glass unit.Here, suitable division arithmetic based on the panel unit shape.
X spacing when needing panel unit not rotate at least and Y spacing, there is the value at the width rotate/revolve the indication that turn 90 degrees, glass unit and height, glass unit edge as parameter.Utilize above-mentioned numeric representation not have the situation of rotation and the number that obtains of revolving under the situation about turning 90 degrees to calculate.Utilize commercially available electrical form software can easily construct out the calculation formula of expression here.As a result, the designer can handle confirming in advance to obtain on the basis of number.
First embodiment according to the invention described above provides a kind of glass for flat panel display data designing system; Be used to design the glass for flat panel display data; It is characterized in that; Comprise: storing mechanism, the shape of TIP cell data, be configured in above-mentioned panel unit data periphery the alignment mark data shape and comprise glass unit size and above-mentioned each data configuration information parameter information and store; Reticule data generates mechanism 111, and it has output as the panel reticule data output function 111a of the panel reticle cell data of the data of the illumination light mask of the above-mentioned panel unit data of configuration and generation and the output aligning reticule data output function 111b as the aligning reticle cell data of the data of the illumination light mask that disposes above-mentioned alignment mark data; Generate mechanism 112 with the glass unit data, it has and generates and the glass unit data output function 112a of the glass unit data of output above-mentioned panel unit data of configuration and above-mentioned alignment mark data and generation and output are used to generate the technique information output function 112b of the technique information of glass unit data.The shape of panel unit data, the shape and the parameter information that comprises the configuration information of glass unit size and above-mentioned each data that are configured in the alignment mark data of above-mentioned panel unit data periphery are stored in the storing mechanism.
Therefore; Through the generation of the reticule data of carrying out simultaneously independently handling and the generation of glass data in the past; Can dope in advance according to the parameter of the rotation that comprises the panel unit data and make unit price and exposure-processed time, can carry out creating conditions with the best is the data processing of prerequisite.In addition, owing to can also calculate the exposure irradiation number of times, thereby can calculate the required time of exposure apparatus, thus can calculate the cost that utilizes exposure apparatus on glass unit, to make panel unit.
In addition; Can obtain following effect second embodiment of the invention: can construct out following design system; It only specifies X spacing and Y spacing as the panel unit shape in the configuration gap that comprises panel unit according to parameter; Even there is not the real data of panel unit, also can estimate above-mentioned top condition.This simple and easy estimating system if ignore graphing capability, then utilizes commercially available electrical form instrument can realize that the effect that the present invention creates conditions to optimization is remarkable.
Claims (10)
1. a glass for flat panel display data designing system that designs the glass data that flat-panel monitor uses is characterized in that,
The shape of said glass for flat panel display data designing system TIP cell data, the shape that is configured in the peripheral alignment mark data of said panel unit data and the parameter information that comprises the configuration information of glass unit size and each data;
And comprise: reticule data generates mechanism, and it has: output is as the panel reticule data output function of the panel reticle cell data of the data of the illumination light mask that disposes said panel unit data; With generate and output as the aligning reticule data output function of the aligning reticle cell data of the data of the illumination light mask that disposes said alignment mark data; And
The glass unit data generate mechanism, and it has: the glass unit data output function that generates and export the glass unit data that dispose said panel unit data and said alignment mark data; With generate and output is used to generate the technique information output function of the technique information of glass unit data.
2. glass for flat panel display data designing system as claimed in claim 1 is characterized in that, said glass unit data generate the shape and the size that disposes the glass unit of a plurality of these panel unit data that mechanism imports said panel unit data;
And having the number computing function that the calculation formula utilized calculates the number of the said panel unit data that can on said glass unit, obtain, said calculation formula comprises the computational item of the numerical value of the size of using the panel unit that is located at the set that also will dispose said panel unit data on the said glass unit divided by the numerical value of panel unit data shape at least.
3. according to claim 1 or claim 2 glass for flat panel display data designing system; It is characterized in that; Said glass unit data generate mechanism except the size of importing said panel unit data shape and said glass unit, also generate the size that mechanism imports said panel reticle cell data from said reticule data;
Said glass unit data generate mechanism and have the exposure frequency computing function that calculates the exposure irradiation number of times according to the said panel reticle cell data that disposes said panel unit data shape.
4. according to claim 1 or claim 2 glass for flat panel display data designing system is characterized in that, but size and the exposure range of specifying the size of reticle, said glass unit are as said parameter information.
5. according to claim 1 or claim 2 glass for flat panel display data designing system is characterized in that,
Said glass unit data generate mechanism and have exposure irradiation data systematic function, utilize dispose by said reticule data generate the said panel unit data that mechanism generates said panel reticle cell data a part or all generate the exposure irradiation data that comprise at least 2 panel unit data on the said panel reticle cell data.
6. according to claim 1 or claim 2 glass for flat panel display data designing system; It is characterized in that; Said glass unit data generate mechanism and have the remainder computing function; Divided by the size corresponding, obtain the zone that is equivalent to remainder on the glass unit with the zone that is equivalent to said glass unit size with the single exposure irradiation area.
7. according to claim 1 or claim 2 glass for flat panel display data designing system is characterized in that, records the XY coordinate of said exposure irradiation data in the said technique information.
8. according to claim 1 or claim 2 glass for flat panel display data designing system; It is characterized in that; In graphics device, possess the IO member, said IO member has the data presentation function that shows said panel unit data, said panel reticle cell data and said glass unit data.
9. according to claim 1 or claim 2 glass for flat panel display data designing system is characterized in that,
Said glass for flat panel display data designing system also comprises storing mechanism, arithmetic processing section and input/output mechanism;
The content of storing in the said storing mechanism comprises: through the package of said arithmetic processing section execution; The input data that constitute by shape that is input to the said panel unit data shape of said arithmetic processing section, said alignment mark data and said parameter information; With the output data that constitutes by said reticule data, said glass unit data and said technique information.
10. a glass for flat panel display design data method is characterized in that, comprising:
Data input operation, TIP cell data, alignment mark data and the data that comprise parameter information, said parameter information has the configuration information of glass unit size and each data;
Reticle unit A data generate operation, generate the data as the partition of a set plate unit A of maximum exposure unit of panel unit according to said panel unit data and said parameter information;
Exposure irradiation zone identification operation, the regional configuration of a plurality of exposure irradiation that is identified in a part of utilizing said reticle unit A on the said glass unit size or all makes public;
Operation is selected in the exposure irradiation zone, from said a plurality of exposure irradiation zone, selects specific said exposure irradiation zone with exposure area order from big to small from said reticle unit A;
The exposure irradiation arrangement step, with selected said exposure irradiation area configurations on glass unit as exposure irradiation;
But exposure range inspection operation judges whether the said exposure irradiation zone that is disposed can make public in the mill;
The glass unit end exposure is judged operation; But be judged as the said exposure irradiation zone that to make public according to configuration in said exposure irradiation arrangement step and in said exposure range inspection operation, but judge whether the exposure range of the panel unit of said glass unit is all filled up;
The repetition operation is selected in exposure irradiation zone, judges at said glass unit end exposure to be judged as in the operation under the situation that said glass unit exposure area is not filled, and returns said exposure irradiation zone once more and selects operation, repeats identical processing;
The alignment mark arrangement step generates the data as the irradiation B of the exposure irradiation data of alignment mark according to said alignment mark data and said parameter information, on said glass unit size, disposes with array;
Reticle unit B data generate operation, on reticle, generate the data of said irradiation B, and generate reticle unit B data;
But alignment mark exposure range inspection operation judges whether the alignment mark that is generated by said reticle unit B data can make public in the mill;
The marginal check operation, whether inspection converges on the edge by the specified glass unit of said parameter information through the integral body of each exposure irradiation that each operation forms on glass unit; With
Design result output operation, last data that generate of output and the technique information that is used to generate glass unit.
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| JP2008-102667 | 2008-04-10 | ||
| JP2008102667A JP2009251521A (en) | 2008-04-10 | 2008-04-10 | Glass data designing system, method and program |
| JP2008102667 | 2008-04-10 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050134822A1 (en) * | 2003-12-19 | 2005-06-23 | Asml Masktools B.V. | Optimized polarization illumination |
| CN101006555A (en) * | 2004-08-19 | 2007-07-25 | 株式会社尼康 | Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device |
| CN101134638A (en) * | 2006-08-28 | 2008-03-05 | 塔工程有限公司 | Substrate pattern input system, pattern forming method and recording medium |
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| JPH0927445A (en) * | 1995-07-13 | 1997-01-28 | Nikon Corp | Shot map preparing method |
| JP2006337910A (en) * | 2005-06-06 | 2006-12-14 | Sharp Corp | Reticle |
| JP2007003993A (en) * | 2005-06-27 | 2007-01-11 | Denso Corp | Data generating device |
| JP2007103711A (en) * | 2005-10-05 | 2007-04-19 | Toshiba Matsushita Display Technology Co Ltd | Pattern simulating method, its program, medium having stored program, and its apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050134822A1 (en) * | 2003-12-19 | 2005-06-23 | Asml Masktools B.V. | Optimized polarization illumination |
| CN101006555A (en) * | 2004-08-19 | 2007-07-25 | 株式会社尼康 | Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device |
| CN101134638A (en) * | 2006-08-28 | 2008-03-05 | 塔工程有限公司 | Substrate pattern input system, pattern forming method and recording medium |
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| CN101555097A (en) | 2009-10-14 |
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