CN101551958A - Engraving plate structure and manufacture method thereof - Google Patents

Abstract

The invention discloses an engraving plate structure and a manufacture method thereof. The surface of a glass molding plate is formed with a concentric ring pattern knurling layer of nanometer grade by using a photoresistive layer coated by photoresistive agents and matching with laser development technology, the knurling layer is arranged on a metal layer separated after electrotyping forming to form a master mold, and thus the surface of the master mold has concentric ring patterns; a plastic substrate with a manometer grade concentric ring pattern pre-form layer is made on the surface by injection molding; and the pre-form layer of the plastic substrate is further provided with a color layer with different printing patterns and a reflecting layer for revealing the diffraction effect between the nanometer grade ring patterns and the printing pattern, so that the easily-printed, light, thin, metallic and three-dimensional engraving plate with low cost, pliability and easy attachment is manufactured.

Description

Engraving plate structure and manufacture method thereof

Invention field

The invention relates to a kind of engraving plate structure and manufacture method thereof, and particularly relevant for the engraving plate structure and the manufacture method thereof of a kind of light weight, with low cost and tool metal-like.

Background technology

Present inscription version can be divided into plastics inscription version and two kinds of metal inscription versions, wherein in the processing procedure of metal inscription version, mostly be on metal material, to produce to have relief picture and text with machining or etched mode, add that metal material itself has the characteristic of surface-brightening, so metal inscription version has advantage comparatively attractive in appearance.Yet common cost height of metal inscription version and processing procedure are time-consuming, are difficult for printing again, and general metal inscription version is thick and heavy and flexible poor, so that have the shortcoming that inconvenience is attached at frivolous article or arc article.In addition,, and conveniently be attached at advantage on the various article, only can show the picture and text of plane formula, do not have metal-like again, in appearance than the dull no change of metal inscription version though that plastics inscription version has is light and thin.

Therefore, need to use which kind of material and processing procedure to make the inscription version, just can make its advantage that has metal inscription version and plastics inscription version simultaneously concurrently, real one of the direction inquiring into and research and develop of desiring most ardently for related industry.

Summary of the invention

Because that the made metal of background technology inscription version and plastics inscription version have respectively is expensive, processing procedure is consuming time, thick and heavy, flexible poor, be difficult for printing and reach and do not have a problem of stereoscopic sensation and metal-like, the object of the present invention is to provide a kind of engraving plate structure and manufacture method thereof, with provide have concurrently printing with low cost, easy, tool pliability easily attach, light and thin, and the inscription version that metal-like and stereoscopic sensation advantage are arranged.

Technical scheme of the present invention comprises provides a transparent substrates, this transparent substrates to have a first surface and a second surface, and this first surface has the pre-shape layer of at least one group of intensive line type pattern; This pre-shape layer is made transparent substrates moulding simultaneously with a master mold ejection formation; On the pre-shape layer of this transparent substrates, form chromatograph with at least one color or pattern; On this chromatograph, form at least one reflection horizon; And on this reflection horizon, form at least one first protective seam; This first protective seam is a rete, and after forming this first protective seam, more is included in and forms at least one flatness layer on this first protective seam; Form one second protective seam on the second surface; The formation method of this transparent substrates comprises the following steps: to provide a base plate; Form a patterning rag layer on this base plate, wherein this patterning rag layer has at least one first pattern; On this patterning rag layer, form a metal level; With this metal level from this base plate peel off a master mold, this first pattern transfer is to this metal level; And this master mold carries out ejection formation with light-passing plastic in Jet forming machine, to form this transparent substrates; The method that forms this patterning rag layer on this base plate comprises exposure and laser developing manufacture process, and this exposure manufacture process be with the laser light of wavelength between 0.7 micron to 0.75 micron as exposure light source, this first pattern height of this patterning rag layer is between 60 microns to 110 microns; This metal level is after this base plate is peeled off and utilize this metal level to carry out this metal level being carried out micro image etching procedure before the ejection formation for female film; The method that forms those chromatographs comprise screen painting (silk screen printing) and color version printing (offset printing) at least one of them; The method in this reflection horizon comprise evaporation and sputter one of them; This transparent substrates surface has the pre-shape layer of the intensive line type pattern of many groups, form at least one chromatograph on this pre-shape layer in addition with at least one picture group case or color, on this chromatograph, form at least one reflection horizon in addition, on this reflection horizon, form at least one first protective seam, and this transparent substrates, those chromatographs, this reflection horizon and this first protective seam are to constitute an inscription plate integrated board; And should engrave the plate integrated board and be cut into multi-disc inscription version, wherein respectively should inscription edition have one of them group of those picture group cases respectively; One transparent substrates has a first surface and a second surface, and wherein this first surface has the pre-shape layer of at least one group of intensive line type pattern; At least one chromatograph is disposed on this pre-shape layer of this transparent substrates, and this chromatograph has at least one color or pattern; At least one reflection horizon is disposed on this chromatograph; And at least one first protective seam, be disposed on this reflection horizon.

Disclosed engraving plate structure of the present invention and manufacture method thereof are as above, and the difference between the prior art is that the present invention is the photoresist layer of the surface of elder generation on a glass template with the photoresist coating, and how to form the rag layer of the intensive line type pattern of rice grade through the development etching, then giving electrotyping forming on the surface of this rag layer goes out a metal mother, and utilize this master mold to carry out ejection formation, with how the pattern of rice grade is replicated on the plastic base, makes plastic base how have the pre-shape layer of the intensive line type of rice grade.Follow-up formation in addition in the pre-shape layer of plastic base again has the chromatograph of pattern more than a group and forms the reflection horizon, to show because of the intensive line type of light at these patterns and pre-shape layer changes, produce diffraction and cause dazzle color effect.See through above-mentioned means, the invention has the advantages that can the processing procedure time short, easily printing, tool pliability easily attach, light and thin and plastic material with low cost, produce inscription version with metal-like and stereo pattern.

For making purpose of the present invention, technical characterictic and other effect that further understanding be arranged, cooperate diagram to be described in detail as follows:

Description of drawings

Figure 1A to Fig. 1 C is the manufacturing process diagrammatic cross-section of inscription version of the present invention in first embodiment.

Fig. 2 A to Fig. 2 E is a transparent substrates of the present invention manufacturing process diagrammatic cross-section in one embodiment.

Fig. 3 is an inscription version of the present invention diagrammatic cross-section in a second embodiment.

Fig. 4 is the diagrammatic cross-section of inscription version of the present invention in the 3rd embodiment.

Fig. 5 is the diagrammatic cross-section of inscription version integrated board of the present invention in the 4th embodiment.

Fig. 6 is an inscription version integrated board of the present invention diagrammatic cross-section in a second embodiment.

Fig. 7 is the diagrammatic cross-section of inscription version integrated board of the present invention in the 3rd embodiment.

[primary clustering symbol description]

100 inscription versions

101 base plates

102 patterning rag layers

102a first pattern

103 metal levels

104 transparent plastics

105 nozzles

110 transparent substrates

112 first surfaces

113 patterns

114 second surfaces

120 chromatographs

130 reflection horizon

140a first protective seam

140b second protective seam

150 flatness layers

160 gums

170 hyaline membranes

501 inscription version integrated boards

510 transparent substrates

512 first surfaces

514 second surfaces

The h height

Embodiment

Below will cooperate graphic and embodiment describes embodiments of the present invention in detail, so as to the present invention how the application technology means implementation procedure that solves technical matters and reach the technology effect can fully understand and implement according to this.

Figure 1A to Fig. 1 C is the manufacturing process diagrammatic cross-section of inscription version of the present invention in first embodiment.Please refer to Figure 1A, transparent substrates 110 at first is provided, wherein the first surface 112 of transparent substrates 110 is the pre-shape layers 113 with intensive microgroove pattern, and the pre-shape layer 113 of intensive microgroove pattern can comprise literal (as manufacturer's name or ProductName) or image (as trade mark) or decorative pattern or other optical grains at least one of them.The material that constitutes transparent substrates 110 for example is the good polymeric material of light transmission, as polystyrene (polystyrene, PS), cyclic olefine copolymer (cyclic olefincopolymer, mCOC) or polycarbonate (polycarbonate, PC) etc.And transparent substrates 110 for example is to see through injection molding manufacture procedure to form.Below will the flow process that form transparent substrates 110 be described in detail in detail for embodiment.

Fig. 2 A to Fig. 2 E is transparent substrates 110 an of the present invention manufacturing process diagrammatic cross-section in this embodiment.Please refer to Fig. 2 A, at first on base plate 101, form patterning laser and carve layer 102 with first pattern 102a, wherein base plate 101 for example is a glass template, and the method that formation patterning laser is carved layer 102, for example be on base plate 101, to form the photoresist layer that one deck forms with the photoresist coating earlier, through exposing and developing manufacture process, can form patterning rag layer 102 again.Wherein, the light source that is used in the exposure manufacture process of this photoresist layer for example is the laser light of wavelength between 0.7 micron to 0.75 micron, so that how to etch the first pattern 102a of rice grade on rag layer 102.Specifically, present embodiment employed light source in exposure manufacture process is that wavelength is 0.74 micron a laser light, and the height h of the first pattern 102a of patterning rag layer 102 for example is between 60 microns to 110 microns.

Please refer to Fig. 2 B, after finishing patterning rag layer 102, then promptly is to form metal level 103 on patterning rag layer 102.In the present embodiment, metal level 103 can see through evaporation (evaporating) processing procedure, sputter (sputtering) processing procedure, plating or electroforming (electroplating) processing procedure and finishes.Afterwards, metal level 103 is peeled off from base plate 101, shown in Fig. 2 C.At this moment, be that transfer printing has the opposite pattern of the first pattern 102a with patterning rag layer 102 on the metal level 103.

It should be noted that after from base plate 101, metal level 103 being stripped down, can also carry out little shadow and etch process with laser beam or other light source to metal level 103 once more, so that on metal level 103, form other pattern once more.The follow-up metal level 103 that utilizes again is as master mold and insert in the Jet forming machine, and light-passing plastic 104 is inserted Jet forming machine, by light-passing plastic 104 ejection formations of nozzle 105 with molten, shown in Fig. 2 D.The transparent substrates that be Figure 1A 110 of light-passing plastic 104 hardened formings on metal level 103 (female film) afterwards is shown in Fig. 2 E.Wherein, the pre-shape layer 113 of the intensive microgroove pattern that had of the first surface 112 of transparent substrates 110 promptly is the pattern transfer from the metal level 103.That is to say that the pre-shape layer 113 of intensive microgroove pattern can comprise the first pattern 102a on the patterning rag layer 102, also can include at the pattern of metal level 103 being peeled off back little shadow that is carried out and etch process generation from base plate 101.

Please continue with reference to Figure 1A, the method that forms chromatograph 120 for example is screen painting (silk screen printing) or color version printing (offset printing).Though it should be noted that only to show single chromatograph 120 among the figure, it is not that haveing the knack of this skill person can be voluntarily according to the required number of plies that decides chromatograph 120 of reality in order to qualification the present invention.And, in embodiment, can be to form institute's nonferrous layer 120 through a screen painting processing procedure or a color version printing process in the lump with multilayer chromatograph 120, also can be to form different chromatograph 120 with different printing process respectively; This chromatograph 120 also can cooperate different designs, in with one deck, form different pattern and decorative pattern, also can be and cooperate the intensive microgroove on the pre-shape layer 113 and process lines on the master mold in addition, make the different cooperations between lines and pattern before and after forming, produce various solid and interesting visual impression receptor.

Please refer to Figure 1B, after forming chromatograph 120 on the first surface 112 of transparent substrates 110, then on chromatograph 120, form reflection horizon 130, the method that wherein forms reflection horizon 130 for example is that metal material is formed on the chromatograph 120 through evaporation processing procedure or sputter process, and the material in reflection horizon 130 can be aluminium, copper, gold, silver, nickel or other alloying metal, but is not limited thereto.What deserves to be mentioned is, owing to reflection horizon 130 are first surface 112 tops that are formed at transparent substrates 110 according to the pre-shape layer 113 of the intensive microgroove pattern of the first surface 112 of transparent substrates 110, therefore the diffraction effect of light on 113 on the pre-shape layer of the intensive microgroove pattern of first surface 112 can be displayed, and then make the pre-shape layer 113 of these intensive microgroove patterns have stereoscopic sensation, cooperate the pattern on the chromatograph 120, to present changeable style.

Please refer to Fig. 1 C, 130 form one deck first protective seam 140a at least in the reflection horizon, promptly finish the making of inscription version 100 this moment.Wherein, the method that forms the first protective seam 140a for example is that sclerosis glue is coated on the reflection horizon 130.In the present embodiment, the first protective seam 140a for example is disposed on the reflection horizon 130, and in order to make the surperficial smooth-going smooth of inscription version 100, can also form one deck flatness layer 150 on the first protective seam 140a.Wherein, flatness layer 150 for example is to see through printing ink to spray the formed ink lay of processing procedure, is filled and led up the convex-concave surface of the first protective seam 140a by the bigger ink molecules of particle with this.

Except forming the first protective seam 140a on the reflection horizon 130, present embodiment can also form at least one second protective seam 140b simultaneously on the second surface 114 of transparent substrates 110.Wherein, the processing procedure of the second protective seam 140b for example is identical with the first protective seam 140a with material.Hence one can see that, and the first protective seam 140a can also strengthen the skin hardness of inscription version 100 simultaneously with the second protective seam 140b except can protecting reflection horizon 130, impaired to prevent inscription version 100 surfaces from suffering the external force scratch.

Inscription version 100 with Fig. 1 C, extraneous light is that the second surface 114 from transparent substrates 110 is incident in the inscription version 100, and after producing diffraction between the pre-shape layer 113 of the intensive microgroove pattern of transparent substrates 110, by reflection horizon 130 its second surface 114 from transparent substrates 110 is reflected again, and then make the beholder can watch the pre-shape layer 113 of the relief intensive microgroove pattern of tool.

Specifically, in other embodiments of the invention, more can utilize the material that is mixed with admixture to form to have the second protective seam 140b of special grains or pattern.Thus, the beholder can see special grains or pattern in the second protective seam 140b in the pattern of watching inscription version 100 above the second protective seam 140b, and this special grains or pattern can be in order to as the false proof bases for estimation of inscription version 100.

Below engraving plate structure of the present invention will be described.Please refer to Fig. 1 C, inscription version 100 comprises transparent substrates 110, at least one chromatograph 120, at least one reflection horizon 130, at least one first protective seam 140a and at least one second protective seam 140b.Wherein, transparent substrates 110 has first surface 112 and second surface 114, and its first surface 112 has the pre-shape layer 113 of at least one group of intensive microgroove pattern.Chromatograph 120 is to be disposed on the first surface 112 of transparent substrates 110, and it can be screen painting layer or color version printed layers.In other embodiments, inscription version 100 can comprise multilayer chromatograph 120, and these chromatographs can be to see through identical printing process to form, and also can be to form through different printing process, and the present invention is not limited it.

Hold above-mentionedly, reflection horizon 130 is disposed on the chromatograph 120, so that the diffraction effect of light on 113 on the pre-shape layer of the intensive microgroove pattern of the first surface 112 of transparent substrates 110 displayed.Wherein, the thickness in reflection horizon 130 for example is 55 rice how.The first protective seam 140a is disposed on the reflection horizon 130, in order to protection reflection horizon 130, and simultaneously with the second surface 114 of transparent substrates 110 on the second protective seam 140b increase the skin hardness of inscription version 100.Wherein, the material of the first protective seam 140a and the second protective seam 140b for example is a sclerosis glue.

In the present embodiment, on the first protective seam 140a, more dispose flatness layer 150, so that inscription version 100 is surperficial smooth-going smooth.Wherein, flatness layer 150 for example is to see through printing ink to spray the made ink lay of processing procedure.

For convenience inscription version of the present invention is attached on the product miscellaneous, the present invention can also go up formation gum 160 in the first protective seam 140a, as shown in Figure 3 in a second embodiment after finishing the inscription version 100 shown in Fig. 1 C.On the other hand, the present invention also can form a hyaline membrane 170 (as shown in Figure 4) on the second protective seam 140b in the 3rd embodiment, so that further protect inscription version 110.

Though the processing procedure that above is the single inscription version of act is that example is done explanation, it is not in order to limit the present invention.The disclosed method of the present invention also is applicable in the processing procedure of producing the inscription version in batches, below will be for the embodiment explanation.

Fig. 5 is the diagrammatic cross-section of the inscription version integrated board of the present invention in the 4th embodiment.Please be simultaneously with reference to Fig. 1 C and Fig. 5; the different size and shape that is inscription version 100 in employed transparent substrates 110 size and shapes of the foregoing description that is in of present embodiment and previous embodiment; employed transparent substrates 510 sizes of present embodiment then are to hold the size of multi-disc inscription version 100 simultaneously; so that on transparent substrates, 510 utilize above-mentioned processing procedure to make at least one chromatograph 120; at least one reflection horizon 130; at least one first protective seam 140a and at least one second protective seam 140b; thereby after forming inscription version integrated board 501 shown in Figure 5, be cut into the inscription version 100 of multi-disc shown in Fig. 1 C.Wherein, the first surface 512 of transparent substrates 510 be have many groups can be by literal and the image pre-shape layer 113 of one of them intensive microgroove pattern of forming at least, and many groups of intensive microgroove patterns on these pre-shape layers 113 can be identical patterns, also can be different patterns.In the process of cutting inscription version integrated board 501, promptly be to cut, so that the every inscription version 100 that cuts out all has the pre-shape layer 113 of one group of complete intensive microgroove pattern according to the position of the intensive microgroove pattern of each pre-shape layer 113 and the inscription version shape desiring to make.

What deserves to be mentioned is; as desire in batches that processing procedure production has the inscription version (as shown in Figure 3) of gum or has the inscription version (as shown in Figure 4) of hyaline membrane; then need on the first protective seam 140a, to form earlier gum 160 (as shown in Figure 6); or on the second protective seam 140b, form hyaline membrane 170 (as shown in Figure 7); again inscription version integrated board 501 is cut afterwards, promptly can be made into and Fig. 3 and identical inscription version shown in Figure 4.

Above-mentioned in addition metal level 103 is except multiple base plate 101 lines of carving by glass template form; and can process in addition and have different lines or pattern; and make pre-shape layer 113 have compound different pattern or the lines of many groups; and other each layer; all different design can be arranged as chromatograph 120 and reflection horizon 130; also can do different colorant cooperations and the processing on the surface pattern in the first protective seam 140a and the second protective seam 140b in addition, the cooperation that can reach multi-level different grain patterns changes.

In sum, as can be known the difference between the present invention and the background technology be the present invention be earlier on the glass template laser develop and how to etch the intensive line type pattern of rice grade, then the electroforming metal layer is become a master mold, and in Jet forming machine, carry out ejection formation in the surface that this master mold has an intensive line type pattern, with how the pattern of rice grade is replicated on the plastic base, make plastic base how have the pre-shape layer of rice grade line type pattern, on the pre-shape layer of plastic base, form chromatograph and reflection horizon again, in these patterns, produce the color effect of dazzling that diffraction causes to show because of light.By above-mentioned means, the present invention not only can shorten the time of the required cost of inscription version processing procedure, more can print easily, the tool pliability easily attaches, light and thin and plastic material with low cost, produces the inscription version with metal-like and stereo pattern.

Claims (10)

1. One kind engrave the version manufacture method, it is characterized in that this method comprises the following steps:

   One transparent substrates is provided, and this transparent substrates has a first surface and a second surface, and this first surface has the pre-shape layer of at least one group of intensive line type pattern;

   This pre-shape layer is made transparent substrates moulding simultaneously with a master mold ejection formation;

   On the pre-shape layer of this transparent substrates, form chromatograph with at least one color or pattern;

   On this chromatograph, form at least one reflection horizon; And

   On this reflection horizon, form at least one first protective seam.
2. 2. the manufacture method of inscription version according to claim 1 is characterized in that this first protective seam is a rete, and after forming this first protective seam, more is included in and forms at least one flatness layer on this first protective seam.
3. 3. the manufacture method of inscription version according to claim 2 is characterized in that forming one second protective seam on this second surface of this transparent substrates.
4. 4. the manufacture method of inscription version according to claim 1 is characterized in that the formation method of this transparent substrates comprises the following steps:

   One base plate is provided;

   Form a patterning rag layer on this base plate, wherein this patterning rag layer has at least one first pattern;

   On this patterning rag layer, form a metal level;

   With this metal level from this base plate peel off a master mold, this first pattern transfer is to this metal level; And

   This master mold carries out ejection formation with light-passing plastic in Jet forming machine, to form this transparent substrates.
5. 5. the manufacture method of inscription version according to claim 4, it is characterized in that the method that forms this patterning rag layer on this base plate comprises exposure and laser developing manufacture process, and this exposure manufacture process be with the laser light of wavelength between 0.7 micron to 0.75 micron as exposure light source, this first pattern height of this patterning rag layer is between 60 microns to 110 microns.
6. 6. the manufacture method of inscription version according to claim 4 is characterized in that this metal level after this base plate is peeled off and utilize this metal level to carry out this metal level being carried out micro image etching procedure before the ejection formation for female film.
7. 7. the manufacture method of inscription version according to claim 4, the method that it is characterized in that forming those chromatographs comprise screen painting (silk screen printing) and color version printing (offset printing) at least one of them.
8. 8. the manufacture method of inscription version according to claim 1, the method that it is characterized in that this reflection horizon comprise evaporation and sputter one of them.
9. 9. the manufacture method of inscription version according to claim 1, it is characterized in that this transparent substrates surface has the pre-shape layer of the intensive line type pattern of many groups, form at least one chromatograph on this pre-shape layer in addition with at least one picture group case or color, on this chromatograph, form at least one reflection horizon in addition, on this reflection horizon, form at least one first protective seam, and this transparent substrates, those chromatographs, this reflection horizon and this first protective seam are to constitute an inscription plate integrated board; And

   The plate integrated board of should engraving is cut into multi-disc inscription version, wherein respectively should inscription edition has one of them group of those picture group cases respectively.
10. 10. engraving plate structure is characterized in that comprising:

    One transparent substrates has a first surface and a second surface, and wherein this first surface has the pre-shape layer of at least one group of intensive line type pattern;

    At least one chromatograph is disposed on this pre-shape layer of this transparent substrates, and this chromatograph has at least one color or pattern;

    At least one reflection horizon is disposed on this chromatograph; And

    At least one first protective seam is disposed on this reflection horizon.

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