CN101531449A - Method for controlling airflow, temperature and cleanliness of glass substrate forming area - Google Patents
Method for controlling airflow, temperature and cleanliness of glass substrate forming area Download PDFInfo
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- CN101531449A CN101531449A CN200910021790A CN200910021790A CN101531449A CN 101531449 A CN101531449 A CN 101531449A CN 200910021790 A CN200910021790 A CN 200910021790A CN 200910021790 A CN200910021790 A CN 200910021790A CN 101531449 A CN101531449 A CN 101531449A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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Abstract
The invention discloses a method for controlling airflow, temperature and cleanliness of a glass substrate forming area, which comprises the following steps: arranging a furnace body, controlling the airflow outside the furnace body, controlling the airflow in the furnace body, controlling the temperature and controlling the cleanliness. The method can improve the stability of production lines for glass substrates of flat-panel liquid crystal displays, the rate of finished products and the quality of the glass substrates of the flat-panel liquid crystal displays.
Description
Technical field:
The invention belongs to liquid-crystal display and make the field, relate to a kind of flow controlling method of air of forming area.
Background technology:
The production task of forming area is the glass melt with liquid, be formed on through specific molding device have stable thickness in the certain specification scope, enough width, less stress and reach the work in-process sheet glass of certain surface finish.The forming area major equipment comprises the retort furnace that moulding is used, and the shaping area that typing is used eliminates stress and the equipment such as annealing furnace of warpage.In order to improve the good article rate of products production, increase the stability of production line, just the ambient stable of forming area need be got off.
In the prior art, the temperature difference is big between the distinct device in the forming area, flow perturbation inside and outside the equipment is big, cleanliness factor is poor, temperature instability, cleanliness factor difference and air-flow instability have reduced the quality of glass melt moulding, improve production cost, reduced the yield rate of glass base plate of flat liquid crystal display, caused the production line of whole glass base plate of flat liquid crystal display can not steady operation simultaneously.
Summary of the invention:
The objective of the invention is to overcome the shortcoming of above-mentioned prior art, the control method of a kind of glass substrate forming area air-flow, temperature and cleanliness factor be provided, may further comprise the steps:
(1) arranges body of heater: in the four floor body spaces that Stall 1, second floor 2, the 3rd buildings 3 and the 4th buildings 4 are formed, retort furnace 8, shaping area 7, annealing furnace one district 6 and annealing furnace two districts 5 are set from top to bottom;
(2) control body of heater outer gas stream: the 4th buildings 4 adopt the top air-supply, make the 4th buildings 4 space air pressure than the big 0.001-0.05 of the 3rd buildings 3 a space air pressure standard atmospheric pressure, the 3rd buildings 3 use the sidewalls air-supply, make the 3rd buildings 3 space air pressure than the big 0.001-0.05 of second floor 2 a space air pressure standard atmospheric pressure, the air-supply of second floor 2 sidewalls, Stall 1 outside exhausting, make second floor 2 space air pressure than the big 0.05-0.1 of Stall 1 a space air pressure standard atmospheric pressure; Such the 4th buildings 4 space air pressure maintain 1.1 standard atmospheric pressures, and the 3rd buildings 3 space air pressure maintain 1.05 standard atmospheric pressures, and second floor 2 space air pressure maintain 1 standard atmospheric pressure, and Stall 1 space air pressure maintains 0.9 standard atmospheric pressure; Air-flow in the four floor body spaces from top to bottom flows;
(3) control body of heater internal gas flow: retort furnace baffle plate 15 is set on retort furnace 8 stops gas stream in the stove up, at shaping area 7 shaping area baffle plate 11 being set stops gas stream in the stove up, annealing furnace one district's baffle plate 10 and annealing furnace one district's take off roll 14 are set in annealing furnace one district 6 stops gas stream in the stove up, annealing furnace two district's baffle plates 9 and annealing furnace two district's take off roll 13 are set in annealing furnace two districts 5 stops gas stream in the stove up, 5 outer setting stove outer baffles 12 stop gas stream in the stove up in annealing furnace two districts, wherein shaping area baffle plate 11 is fixed on shaping area 7 inside, annealing furnace one district's baffle plate 10, annealing furnace two district's baffle plates 9 and stove outer baffle 12 can be movable; Air pressure in the space that retort furnace 8, shaping area 7, annealing furnace one district 6 and annealing furnace two districts 5 form is kept stable;
(4) controlled temperature:, keep the homo(io)thermism of four floor body spaces by the temperature of Temperature-controlled appliance (air-conditioning) control four floor body spaces;
(5) control cleanliness factor:, keep the cleanliness factor of four floor body spaces by the cleanliness factor of dust removal installation (dedusting air-conditioning or suction cleaner) control four floor body spaces.
Adopt method of the present invention, can improve the stability of glass base plate of flat liquid crystal display production line, the yield rate of raising glass base plate of flat liquid crystal display, improve the quality of glass base plate of flat liquid crystal display.
Description of drawings:
Fig. 1 is a structural representation of the present invention;
Wherein: 1 is Stall, and 2 is second floor, and 3 is the 3rd buildings, 4 is the 4th buildings, and 5 is annealing furnace two districts, and 6 is annealing furnace one district, 7 is shaping area, and 8 is retort furnace, and 9 is annealing furnace two district's baffle plates, 10 is annealing furnace one district's baffle plate, 11 is the shaping area baffle plate, and 12 is the stove outer baffle, and 13 is annealing furnace two district's take off roll, 14 is annealing furnace one district's take off roll, and 15 is the retort furnace baffle plate.
(5) embodiment:
Below in conjunction with accompanying drawing the present invention is done and to describe in further detail:
Referring to Fig. 1, the control method of a kind of glass substrate forming area air-flow, temperature and cleanliness factor may further comprise the steps:
(1) arranges body of heater: in the four floor body spaces that Stall 1, second floor 2, the 3rd buildings 3 and the 4th buildings 4 are formed, retort furnace 8, shaping area 7, annealing furnace one district 6 and annealing furnace two districts 5 are set from top to bottom;
(2) control body of heater outer gas stream: the 4th buildings 4 adopt the top air-supply, make the 4th buildings 4 space air pressure than the big 0.001-0.05 of the 3rd buildings 3 a space air pressure standard atmospheric pressure, the 3rd buildings 3 use the sidewalls air-supply, make the 3rd buildings 3 space air pressure than the big 0.001-0.05 of second floor 2 a space air pressure standard atmospheric pressure, the air-supply of second floor 2 sidewalls, Stall 1 outside exhausting, make second floor 2 space air pressure than the big 0.05-0.1 of Stall 1 a space air pressure standard atmospheric pressure; Such the 4th buildings 4 space air pressure maintain 1.1 standard atmospheric pressures, and the 3rd buildings 3 space air pressure maintain 1.05 standard atmospheric pressures, and second floor 2 space air pressure maintain 1 standard atmospheric pressure, and Stall 1 space air pressure maintains 0.9 standard atmospheric pressure; Air-flow in the four floor body spaces from top to bottom flows;
(3) control body of heater internal gas flow: retort furnace baffle plate 15 is set on retort furnace 8 stops gas stream in the stove up, at shaping area 7 shaping area baffle plate 11 being set stops gas stream in the stove up, annealing furnace one district's baffle plate 10 and annealing furnace one district's take off roll 14 are set in annealing furnace one district 6 stops gas stream in the stove up, annealing furnace two district's baffle plates 9 and annealing furnace two district's take off roll 13 are set in annealing furnace two districts 5 stops gas stream in the stove up, 5 outer setting stove outer baffles 12 stop gas stream in the stove up in annealing furnace two districts, wherein shaping area baffle plate 11 is fixed on shaping area 7 inside, annealing furnace one district's baffle plate 10, annealing furnace two district's baffle plates 9 and stove outer baffle 12 can be movable; Air pressure in the space that retort furnace 8, shaping area 7, annealing furnace one district 6 and annealing furnace two districts 5 form is kept stable;
(4) controlled temperature:, keep the homo(io)thermism of four floor body spaces by the temperature of Temperature-controlled appliance (air-conditioning) control four floor body spaces;
(5) control cleanliness factor:, keep the cleanliness factor of four floor body spaces by the cleanliness factor of dust removal installation (dedusting air-conditioning) control four floor body spaces.
Above content is to further describing that the present invention did in conjunction with concrete preferred implementation; can not assert that the specific embodiment of the present invention only limits to this; for the general technical staff of the technical field of the invention; without departing from the inventive concept of the premise; can also make some simple deduction or replace, all should be considered as belonging to the present invention and determine scope of patent protection by claims of being submitted to.
Claims (2)
1, the control method of a kind of glass substrate forming area air-flow, temperature and cleanliness factor is characterized in that, this method may further comprise the steps:
(1) arranges body of heater: in the four floor body spaces that Stall (1), second floor (2), the 3rd buildings (3) He Silou (4) form, retort furnace (8), shaping area (7), annealing furnace one district (6) and annealing furnace two districts (5) are set from top to bottom;
(2) control body of heater outer gas stream: the 4th buildings (4) are adopted the top air-supply, are made space, the 4th buildings (4) air pressure than the big 0.001-0.05 of the 3rd buildings (a 3) space air pressure standard atmospheric pressure, the 3rd buildings (3) use the sidewall air-supply, make space, the 3rd buildings (3) air pressure than the big 0.001-0.05 of second floor (a 2) space air pressure standard atmospheric pressure, the air-supply of second floor (2) sidewall, the outside exhausting of Stall (1), make second floor (2) space air pressure than the big 0.05-0.1 of Stall (a 1) space air pressure standard atmospheric pressure;
(3) control body of heater internal gas flow: retort furnace baffle plate 15 is set on retort furnace (8) stops gas stream in the stove up, at shaping area (7) shaping area baffle plate (11) being set stops gas stream in the stove up, annealing furnace one district's baffle plate (10) and annealing furnace one district's take off roll (14) are set in annealing furnace one district (6) stops gas stream in the stove up, annealing furnace two district's baffle plates (9) and annealing furnace two district's take off roll (13) are set in annealing furnace two districts (5) stops gas stream in the stove up, stop gas stream in the stove up at annealing furnace two districts (5) outer setting stove outer baffles (12), wherein shaping area baffle plate (11) is fixed on shaping area (7) inside, annealing furnace one district's baffle plate (10), annealing furnace two district's baffle plates (9) and stove outer baffle (12) can be movable; Air pressure in the space that retort furnace (8), shaping area (7), annealing furnace one district (6) and annealing furnace two districts (5) form is kept stable;
(4) controlled temperature: control the temperature of four floor body spaces by Temperature-controlled appliance, keep the homo(io)thermism of four floor body spaces;
(5) control cleanliness factor: control the cleanliness factor of four floor body spaces by dust removal installation, keep the cleanliness factor of four floor body spaces.
2, the control method of a kind of glass substrate forming area air-flow according to claim 1, temperature and cleanliness factor, it is characterized in that: space, the 4th buildings (4) air pressure maintains 1.1 standard atmospheric pressures in the step 1, space, the 3rd buildings (3) air pressure maintains 1.05 standard atmospheric pressures, second floor (2) space air pressure maintains 1 standard atmospheric pressure, and Stall (1) space air pressure maintains 0.9 standard atmospheric pressure; Air-flow in the four floor body spaces from top to bottom flows.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2009100217900A CN101531449B (en) | 2009-03-31 | 2009-03-31 | Method for controlling airflow, temperature and cleanliness of glass substrate forming area |
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| CN2009100217900A CN101531449B (en) | 2009-03-31 | 2009-03-31 | Method for controlling airflow, temperature and cleanliness of glass substrate forming area |
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| CN101531449A true CN101531449A (en) | 2009-09-16 |
| CN101531449B CN101531449B (en) | 2011-05-11 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105948460A (en) * | 2016-06-02 | 2016-09-21 | 郑州旭飞光电科技有限公司 | Production method of liquid crystal glass substrate |
| CN106841010A (en) * | 2016-12-30 | 2017-06-13 | 陕西彩虹电子玻璃有限公司 | Cleanliness factor measurement apparatus and method in a kind of cover-plate glass annealing of substrates stove |
| CN108609836A (en) * | 2018-05-11 | 2018-10-02 | 彩虹集团有限公司 | A kind of TFT substrate glass producing line hot junction equipment current converter and change of current method |
| CN110746095A (en) * | 2019-09-29 | 2020-02-04 | 彩虹显示器件股份有限公司 | Substrate glass production forming equipment with refined temperature adjustment function |
| CN112829091A (en) * | 2021-01-08 | 2021-05-25 | 芜湖东旭光电科技有限公司 | Method and apparatus for processing glass substrate |
| CN114791229A (en) * | 2022-03-30 | 2022-07-26 | 彩虹显示器件股份有限公司 | System and method for detecting inflow airflow at fire hole of glass forming annealing furnace |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101229953B (en) * | 2007-06-13 | 2010-05-19 | 河南安彩高科股份有限公司 | Annealing method for ultra-thin flat glass |
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2009
- 2009-03-31 CN CN2009100217900A patent/CN101531449B/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105948460A (en) * | 2016-06-02 | 2016-09-21 | 郑州旭飞光电科技有限公司 | Production method of liquid crystal glass substrate |
| CN105948460B (en) * | 2016-06-02 | 2018-06-26 | 郑州旭飞光电科技有限公司 | A kind of production method of liquid crystal glass base |
| CN106841010A (en) * | 2016-12-30 | 2017-06-13 | 陕西彩虹电子玻璃有限公司 | Cleanliness factor measurement apparatus and method in a kind of cover-plate glass annealing of substrates stove |
| CN108609836A (en) * | 2018-05-11 | 2018-10-02 | 彩虹集团有限公司 | A kind of TFT substrate glass producing line hot junction equipment current converter and change of current method |
| CN110746095A (en) * | 2019-09-29 | 2020-02-04 | 彩虹显示器件股份有限公司 | Substrate glass production forming equipment with refined temperature adjustment function |
| CN110746095B (en) * | 2019-09-29 | 2022-07-22 | 彩虹显示器件股份有限公司 | Substrate glass production forming equipment with refined temperature adjustment function |
| CN112829091A (en) * | 2021-01-08 | 2021-05-25 | 芜湖东旭光电科技有限公司 | Method and apparatus for processing glass substrate |
| CN114791229A (en) * | 2022-03-30 | 2022-07-26 | 彩虹显示器件股份有限公司 | System and method for detecting inflow airflow at fire hole of glass forming annealing furnace |
| CN114791229B (en) * | 2022-03-30 | 2024-05-14 | 彩虹显示器件股份有限公司 | System and method for detecting inflow air flow of furnace mouth of glass forming annealing furnace |
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| CN101531449B (en) | 2011-05-11 |
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Effective date of registration: 20160309 Address after: 712021 Rainbow Road, Shaanxi, Xianyang, No. 1 Patentee after: IRICO Group Corp. Address before: 712021 Rainbow Road, Shaanxi, Xianyang, No. 1 Patentee before: Shaanxi Caihong Electronic Glass Co., Ltd. |