CN101494155A - Quasimolecule discharge lamp - Google Patents
Quasimolecule discharge lamp Download PDFInfo
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- CN101494155A CN101494155A CNA2009100099035A CN200910009903A CN101494155A CN 101494155 A CN101494155 A CN 101494155A CN A2009100099035 A CNA2009100099035 A CN A2009100099035A CN 200910009903 A CN200910009903 A CN 200910009903A CN 101494155 A CN101494155 A CN 101494155A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
- H01J61/18—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent
- H01J61/20—Selection of substances for gas fillings; Specified operating pressure or temperature having a metallic vapour as the principal constituent mercury vapour
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/305—Flat vessels or containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Discharge Lamp (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
Abstract
The invention provides a rare gas halogen excimer discharge lamp, which is ignited and kept at high lighting for a long time under high tube wall loading condition. The excimer discharge lamp is provided with at least one external electrode (10,11) on the outer surface o f a discharge container (2) formed by at least one of sapphire, YAG or monocrystalline yttria, argon gas (Ar) and gas containing fluorin (F) atom are sealed in the discharge container (2), characterized in that the metal impurity concentration contained in the deep area from the inner surface of the discharge container (2) to 100mu m is below 600wtppm.
Description
Technical field
The present invention relates to a kind of employed discharge lamp of ultra violet radiation that utilizes ultraviolet hardening of resin, the surface clean that is used for semiconductor substrate or glass substrate etc., sterilization, photochemical reaction etc., relate in particular to a kind of dielectric barrier discharge that utilizes, obtain the luminous Excimer discharge lamp of quasi-molecule of rare gas and fluorine.
Background technology
Inclosure has the Excimer discharge lamp of rare gas and halogen to have and the diverse radioactive natures of other lamp such as high-pressure mercury-vapor lamp or metal halid lamp, especially can be created in the ultraviolet ray of the wavelength that can't obtain in the lamps such as high-pressure mercury-vapor lamp or metal halid lamp expeditiously.
Excimer discharge lamp can be selected the ultraviolet wavelength that radiates by rare gas and halogen that combination is enclosed.For example, in the combination of argon (Ar) and fluorine (F), can obtain near the ultraviolet ray the 193nm, in the combination of krypton (Kr) and fluorine (F), can obtain near the ultraviolet ray the 248nm, in the combination of xenon (Xe) and fluorine (F), can obtain near the ultraviolet ray of 351nm.Especially, employedly can obtain the ultraviolet ArF Excimer discharge lamp of the wavelength of 193nm in semi-conductive photoetching process, maybe can obtain the ultraviolet KrF Excimer discharge lamp of the wavelength of 248nm, can be used for the attribute testing of photoresistance, the inspection of light shield etc.
In patent documentation 1, disclose the inner surface that a kind of passivation layer with metal oxide covers the discharge vessel that is made of quartz glass, in discharge vessel, enclosed the Excimer discharge lamp of rare gas and halogen.Wherein put down in writing and will enclose the discharge vessel of quartz glass system and when using as the fluorine or chlorine of halogen, halogen atom and ion immediately with quartz glass reaction, produce silicon halide and oxygen, and can not carry out the quasi-molecule discharge, therefore must cover the quartz glass inner surface.
In addition, a kind of Excimer discharge lamp of rare gas and halogen being enclosed the discharge vessel of sapphire system is disclosed in patent documentation 2.
No. 3178162 communique of patent documentation 2 Japan Patents
Record according to patent documentation 1, utilization has the inwall that is covered the discharge vessel of quartz glass system by the oxide of at least one the amorphous structure that forms in metallic aluminium (Al), hafnium (Hf), yttrium (Y) or the scandium (Sc), thereby compare with the lamp that covers, obtain 100 times useful life at least.
But, a kind of Excimer discharge lamp that will combine as the xenon (Xe) of rare gas and fluorine (F) of record in the embodiment of patent documentation 1 as halogen, but be filled in gas and xenon (Xe) and sulphur hexafluoride (SF in the discharge vessel of diameter 20mm, length 20cm
6) mix, being the low pressure of 31mbar (3100Pa), input power also is less 20W.
Under aforesaid start condition, discharge vessel can not form the high temperature more than 200 ℃, the oxide tunicle that covers the inwall of discharge vessel is stablized, but in order to adopt the Excimer discharge lamp of rare gas and halogen in industrial utilization, need stronger light quantity, therefore, the diameter of Excimer discharge lamp is that 20mm, length are 20cm, if can not reach input power is that 40W is above, air pressure is more than the 13000Pa, then can't obtain sufficient light quantity.
Suppose in the lamp of patent documentation 1 record, improve and enclose pressure, then the temperature of discharge vessel rises, and the tunicle of fluorine and discharge vessel inner surface reacts, or sees through the incomplete part of tunicle, fluorine and quartz glass react, therefore luminous efficiency can reduce, or when wanting to improve input voltage in order to improve lamp power, because electron temperature rises, between internal electrode and luminous tube inwall, can produce sputtering phenomenon, the phenomenon that tunicle is peeled off might take place.When tunicle was peeled off, halogens such as fluorine or chlorine can consume with quartz glass reaction, and measurable luminous intensity to lamp can reduce rapidly.
On the other hand, at patent documentation 2 embodiment of Excimer discharge lamp who rare gas and halogen is enclosed the discharge vessel of sapphire system is disclosed.
The Excimer discharge lamp of the lamp formation shown in Figure 3 of patent documentation 2 has been made in trials such as this case inventor, uses the argon (Ar) and fluoride (SF of patent documentation 1 record
6) as enclosing gas.That is, use sapphire pipe cylindraceous, attempt having made the ArF Excimer discharge lamp that pair of external electrodes is provided in tube axial direction along tube wall as discharge vessel.But, with as industrial required 2W/cm
2High tube wall load condition (input power is with respect to the ratio of electrode area) light a lamp after, after lighting a lamp only 10 hours, the radiation of the emission wavelength 193nm of argon-fluorine promptly can be eliminated.In patent documentation 1, be mentioned to the barrier effect that in the discharge vessel that the crystalline by aluminium oxide constitutes, can't detect for fluorine, and the result that above-mentioned situation is it to be met.
Summary of the invention
Purpose of the present invention can be lit a lamp lamp under high tube wall load condition and keeps high light quantity being provided a kind of, and the rare gas halogen Excimer discharge lamp of start for a long time.
The present invention adopts scheme as follows for solving above-mentioned problem.
The 1st scheme is a kind of Excimer discharge lamp, at outer surface at least one outer electrode is set by at least one discharge vessel that constitutes in sapphire, YAG or the monocrystalline yittrium oxide, enclose argon (Ar) and the gas that contains fluorine (F) atom in described discharge vessel, it is characterized in that: by the concentration of metallic impurities that depth areas comprised till inner surface to the 100 μ m of described discharge vessel is below the 600wtppm.
The 2nd scheme is in the Excimer discharge lamp of the 1st scheme, and described discharge vessel constitutes tubulose, and enclosing in this discharge vessel has argon (Ar), sulphur hexafluoride (SF
6) and helium (He) or neon (Ne), at the outer surface of described discharge vessel, at least one outer electrode being set along tube axial direction, described discharge vessel strides across complete cycle and has the outer surface part that outer electrode is not set in the both end sides of described discharge vessel.
The 3rd scheme is in the Excimer discharge lamp of the 1st scheme, and described discharge vessel constitutes roughly rectangular-shaped, and enclosing in this discharge vessel has argon (Ar), sulphur hexafluoride (SF
6) and helium (He) or neon (Ne), at the outer surface of described discharge vessel, at least one outer electrode being set along long side direction, described discharge vessel strides across complete cycle and has the outer surface part that outer electrode is not set described discharge vessel distolateral.
The 4th scheme is in the Excimer discharge lamp of the 2nd scheme or the 3rd scheme, and the molar concentration that described neon (Ne) accounts for full inclosure gas is more than 90%, below 99.5%.
The 5th scheme is in the Excimer discharge lamp of the 2nd scheme or the 3rd scheme, and the molar concentration that described helium (He) accounts for full inclosure gas is more than 90%, below 99.5%.
The invention effect
By the present invention, except discharge vessel uses the such plasma-resistance height of sapphire, YAG, yittrium oxide with good heat conductivity and has the monocrystal material of materials with high melting point of light transmission, owing to reduce the concentration of metallic impurities of the inner surface area of discharge vessel, so the chance that halogen contacts with metal impurities tails off, thereby can be suppressed at the reaction of the halogen of discharge vessel internal face, can prevent the ultraviolet luminous intensity decay that quasi-molecule is luminous.
In addition,,, at least one outer electrode is set, in discharge vessel, encloses argon (Ar) and sulphur hexafluoride (SF along tube axial direction or long side direction at the outer surface of discharge vessel when its structure is to have tubulose or roughly rectangular-shaped discharge vessel
6), discharge vessel strides across complete cycle and has the outer surface portion timesharing that electrode is not set in its container end portion side, when enclosing helium (He) or neon (Ne), owing to have the pyroconductivity that is higher than argon (Ar), therefore the heat of being sent by the discharge part in the discharge vessel is understood bamboo telegraph to discharge part zone in addition, therefore gas temperature in the discharge vessel can be remained lowlyer, can prevent that the luminous efficiency of lamp from reducing.
Description of drawings
Fig. 1 is the profile seen by the profile view of the tubular axis of the Excimer discharge lamp of the invention by the 1st execution mode and by the profile of watching perpendicular to the cross section A-A of tubular axis.
Fig. 2 is the chart that expression neon (Ne) accounts for the relation of the molar concentration of full inclosure gas and luminous efficiency.
Fig. 3 is the chart that expression helium (He) accounts for the relation of the molar concentration of full inclosure gas and luminous efficiency.
Fig. 4 is the result's of expression comparative experiments 1 a table.
Fig. 5 is the result's of expression comparative experiments 2 a table.
Fig. 6 reaches the profile of being watched by cross section A-A by the profile that the profile view of the long side direction of the Excimer discharge lamp of the invention that is parallel to the 2nd execution mode is seen.
Embodiment
Utilize Fig. 1 to Fig. 5, an embodiment of the invention are described.
Fig. 1 (a) is the profile of being seen by the profile view of the tubular axis of the Excimer discharge lamp of the invention by present embodiment, and Fig. 1 (b) is by the profile of watching perpendicular to the cross section A-A of the tubular axis of the Excimer discharge lamp shown in Fig. 1 (a).
Shown in above-mentioned figure, the discharge vessel 2 of this Excimer discharge lamp 1 is a straight tube-like, has light transmission for the ultraviolet ray of 150～400nm, and the material that is made of the arbitrary monocrystalline that absorbs in the less sapphire of fluorine ion, YAG, the monocrystalline yittrium oxide constitutes.In addition, in discharge vessel 2, enclose argon (Ar) and the higher sulphur hexafluoride (SF of chemical stability
6), as luminous gas, and to enclose the molar concentration account for full inclosure gas be helium (He) or neon (Ne) more than 90%, below 99.5%, as buffer gas.When Excimer discharge lamp 1 was lit a lamp, luminous gas formed argon ion and fluorine ion.Wherein, as discharge vessel, compare with YAG or yittrium oxide, sapphire light transmission is more excellent, also can determine to use EFG method (Edge-defined Film-fedGrowth Method, edge limited silicon fiml growth) therefore sheet material, the production method of tubing carry out industrial production easily, comparatively preferred.
Usually owing to all make discharge vessel 2, therefore contain molybdenum (Mo), iron (Fe), chromium transition metal such as (Cr) as metal impurities via the manufacturing step that uses metallic crucible as any of the monocrystalline of the sapphire of material, YAG, monocrystalline yittrium oxide.As the material of discharge vessel 2, carried out illustration to using sapphire situation, at the inner surface of discharge vessel 2, exist because molybdenum (Mo), iron (Fe), the chromium metal impurities such as (Cr) that the exclusive phenomenon that takes place during the atomic arrangement of monocrystalline when growing up is emanated.When having above-mentioned metal impurities, SF when discharge
6Be divided into F
2With S, F
2React with metal impurities and produce metal halide, can reduce, cause short-life reason by the light beam of the 193nm that Excimer discharge lamp radiated.Through chemico-analytic result, judge these metal impurities and extremely roughly emanate till the degree of depth of 100 number+μ m by the inner surface of discharge vessel 2.In addition, what is called is meant by the meaning of the degree of depth of inner surface to the 100 μ m of discharge vessel 2, metal impurities during the sapphire crystalline growth are because segregation and the main degree of depth that exists, and when lighting a lamp because lamp hole temperature rising etc., can be in the distance of the inner surface of tube diffusion.
Therefore, in the present invention, the inner surface of discharge vessel 2 is carried out the chemical etching processing with phosphoric acid or sulfuric acid, and forming by the molybdenum (Mo) in the scope till inner surface to the 100 μ m of discharge vessel 2, iron (Fe), chromium metal impurities summation concentration such as (Cr) is the following state of 600ppm.Wherein, except chemical etching, also can be by mechanical lapping, the concentration of metallic impurities on surface is formed state below the 50ppm.In addition, in the manufacturing process of lamp, generally speaking in order to be adsorbed on the moisture removal of container inner wall for discharge vessel, for example in vacuum furnace or dry air stove, carry out dried, but in lamp of the present invention, preferably for example under the abundant high temperature more than 500 ℃, heat-treat, thus the preferred amount of moisture that as far as possible reduces discharge vessel 2 inwalls.
Shown in Fig. 1 (a), the both ends open of the tube axial direction of discharge vessel 2 is provided with the lid member 3,4 as the metallic cover piece of cup-shaped at its two ends.The material of lid member 3,4 for example is a nickel (Ni).Consider thermal diffusivity, lid member 3,4 is the most suitable with metal material, if but thermal diffusivity is out of question, then also can be potteries such as aluminium oxide.Packing matcrial 5,6 between discharge vessel 2 and lid member 3,4, discharge vessel 2 combines and is sealed with lid member 3,4 thus.As the material of encapsulant 5,6, can use for example by the wlding of silver with alloy (Ag-Cu alloy) formation of copper.Be provided with gas pipe arrangement 7 at the 2nd lid member 4, after by gas pipe arrangement 7 inner space 8 of discharge vessel 2 being carried out exhaust and reduced pressure, enclose argon (Ar) and the high sulphur hexafluoride (SF of chemical stability as luminous gas
6) and as the helium (He) or the neon (Ne) of buffer gas.After enclosing above-mentioned gas, gas pipe arrangement 7 utilizes formation sealings 9 such as crimping, forms airtight construction thus.
At the outer surface of discharge vessel 2, so that the mode that pair of external electrodes 10,11 is electrically separated each other is configured, and the mode of extending with the tube axial direction along discharge vessel 2 is provided with.In addition, outer electrode 10,11 also separates setting with encapsulant 5,6 and lid member 3,4. Outer electrode 10,11 for example forms by the outer surface of copper (Cu) being made paste and being coated on discharge vessel 2, or by binding agent etc., tabular for example aluminium is bonded in the outer surface of discharge vessel 2 and forms.An end of the long side direction of electrode 10,11 externally is electrically connected with lead-in wire 12,13 by for example wlding 14,15 etc.Constituting along the face beeline of 10,11 of outer electrodes is longer than the beeline across the discharge space of 10,11 of outer electrodes.This is the structure that discharge only takes place in order to form at discharge space.
When Excimer discharge lamp 1 was lit a lamp, when applying voltage between pair of external electrodes 10,11, across discharge vessel 2, externally 10,11 at electrode discharged.At luminous gas is argon (Ar) and sulphur hexafluoride (SF
6) time, above-mentioned gas is ionized, and forms argon ion and fluorine ion, forms by the excimer molecule that argon-fluorine constituted, from the light of discharge vessel 2 radiation 193nm wavelength.
On the tube axial direction of discharge vessel 2, outer electrode 10,11 is located at the position away from encapsulant 5,6 and lid member 3,4, thus in the inner space 8 of discharge vessel 2, can not discharge by the end of the outer electrode 10,11 of the scope of the L1 that the is positioned at tube axial direction range L 2 till the encapsulant 5,6.Promptly, discharge vessel 2 strides across complete cycle and has the outer surface part that is not provided with outer electrode 10,11 in the both end sides of discharge vessel 2, therefore compare with the pairing inner space of the scope of L1, the pairing inner space of the scope of L2 temperature is lower, becomes cooled region.Therefore, enclose as sulphur hexafluoride (SF when inner space 8 at discharge vessel 2
6) and so on the higher gas of chemical stability during as luminous gas, in the zone of the L2 of the tube axial direction of the discharge vessel 2 that does not discharge, the reaction of the sulphur hexafluoride before the ionization can take place can get back to because of the fluorine ion of discharge ionization.Thus, in the inner space 8 of discharge vessel 2, by between the end of the outer electrode 10,11 of the scope of the L1 of tube axial direction is till the encapsulant 5,6, be suppressed with contacting of fluorine ion, can suppress to constitute encapsulant 5,6 or the material of lid member 3,4 and the reaction of fluorine ion.
Below explanation is used for avoiding the relation of distance and the distance of cooling usefulness of the insulation usefulness of creeping discharge.In metallic cover piece as lid member 3,4, do not react in order to make halogen and crown cap (metalcap), must make discharge can not touch crown cap.Its condition is to make outer electrode 10,11 and longer than the distance in the discharge gas of 10,11 of outer electrodes (discharging gap (discharge gap)) as the distance of the lid member 3,4 of crown cap.In discharge vessel 2, enclose sulphur hexafluoride (SF is arranged
6) situation under because sulphur hexafluoride (SF
6) insulating properties that had, can uprise in order to the stable voltage of discharge that keeps.When driving with higher voltage, having not is discharge for discharge gas, but 10,11 danger that produce creeping discharge of electrode externally.Therefore, though not taking place, creeping discharge in discharge gas, stably keep the less degree of discharge conditions needed ground to depend on sulphur hexafluoride (SF
6) concentration, the discharge air pressure, but when the total head 100Torr (13330Pa) that can obtain practical quasi-molecule light luminous efficiency is above, reach than discharging gap (beeline of 10,11 discharge space across between outer electrode) is long by making along the face beeline.
On the other hand, for cooling discharge container 2, the distance of promptly covering member 3,4 and outer electrode 10,11 as the metal cover members of radiating part is nearer more for favourable.
Therefore, the reduction of the halogen quantity that the reaction because of halogen and metal cover members causes can not take place, and creeping discharge does not take place and the required important document of stable maintenance discharge is: discharging gap≤along the distance between face beeline and discharging gap＜outer electrode and metal cover members.
To be expression account for the chart of the relation of the molar concentration of full inclosure gas and luminous efficiency as the neon (Ne) of buffer gas to Fig. 2.
This chart is that expression uses argon (Ar) as helping luminous rare gas, uses SF
6As fluorine-containing gas, use Ne as buffer gas, total head is 100,200,400Torr, quasi-molecule luminous (193nm) efficient (relative value) the when molar concentration that makes neon (Ne) account for argon (Ar) and the summation of neon (Ne) changes.
As shown in the drawing, illumination is fully stable is that the ratio of neon (Ne) is the zone more than 90%, but in the zone of the ratio high (more than 99.5%) of neon (Ne), luminous efficiency reduces situation and becomes remarkable.
To be expression account for the chart of the relation of the molar concentration of full inclosure gas and luminous efficiency as the helium (He) of buffer gas to Fig. 3.
This chart is that expression uses argon (Ar) as helping luminous rare gas, uses SF
6As fluorine-containing gas, use Ne as buffer gas, total head is 100,200,400Torr, quasi-molecule luminous (193nm) efficient (relative value) the when molar concentration that makes helium (He) account for argon (Ar) and the summation of helium (He) changes.
As shown in the drawing, illumination is fully stable is that the ratio of helium (He) is the zone more than 90%, but in the zone of the ratio high (more than 99.5%) of helium (He), luminous efficiency reduces situation and becomes remarkable.
Below represent embodiment in order to the Excimer discharge lamp of the present invention that carries out comparative experiments described later.
(1) specification of discharge vessel: material: monocrystalline sapphire; Shape: cylindrical shape; Wall thickness: 1mm; Length: 200mm; Diameter: 10mm; Apart from the average concentration of metallic impurities in the degree of depth of discharge vessel inner surface 100 μ m: below the 200wtppm
(2) specification of electrode: material: silver (printing paste material); Shape: relative axisymmetrically with respect to columnar discharge vessel; Length: 140mm; Width: 2mm; Separating distance across between the electrode of discharge space: 10mm
(3) specification of lid member: material: nickel; Distance between lid member and outer electrode: 30mm
(4) specification of encapsulant: material: Ag-Cu alloy (silver soldering material)
(5) specification of inclosure gas: Ar:1.58 * 10
3Pa, SF
6: 1.6 * 10
1Pa, Ne:7.84 * 10
4Pa, total head 8.0 * 10
4Pa
(6) condition of lighting a lamp: the pulse voltage that applies 3kV (0-Peak), 70kHz
(7) be below the 600wtppm by the concentration of metallic impurities till discharge vessel inner surface to the 100 μ m.As implementation for this reason, if be sapphire pipe, promptly carry out chemical etching, or carry out dry-etching or machine cut by ion beam with fluoric acid.
(8) mensuration of impurity concentration is to put into the mixed liquor of phosphoric acid 62%, sulfuric acid 38% in sapphire pipe, and the two ends of sapphire pipe with Teflon (テ Off ロ Application, registered trade mark) rubber belt sealing, were being placed about 5 hours under the state of the microwave oven that places connection.Afterwards, withdrawal liquid is utilized ICP (inductance coupling plasma emissioning spectral analysis), and (calibration curve method) carries out quantitative analysis with calibration curve.
Wherein, in the above description sapphire pipe is narrated, but, even be YAG or monocrystalline yittrium oxide, emanate this point and sapphire of metal impurities is common problem when crystalline growth, even using under YAG or the situation of monocrystalline yittrium oxide, also must remove the metal impurities of inner surface as discharge vessel.
(comparative experiments 1)
Divide from each and make 3: the inner surface that will have the discharge vessel of shape shown in Figure 1 carries out chemical etching, will be made as by the concentration of metallic impurities that depth areas comprised till discharge vessel inner surface to the 100 μ m below the 600wtppm by ArF Excimer discharge lamp that sapphire pipe constituted; And behind crystalline growth, the inner surface that will not have a discharge vessel of shape shown in Figure 1 carry out chemical etching by the ArF Excimer discharge lamp that sapphire pipe constituted, change tube load, the temporal variation of the luminous intensity of investigation 193nm.
Fig. 4 is the result's of expression comparative experiments 1 a table.As shown in the drawing, to compare with the Excimer lamp 4,5,6 of not implementing chemical etching as can be known, the light output life-span of having implemented the Excimer lamp 1,2,3 of chemical etching at the inner surface of discharge vessel is greatly improved.
(comparative experiments 2)
Preparation will have the inner surface of the discharge vessel of shape shown in Figure 1 inserts the mixed liquor of phosphoric acid 62%, sulfuric acid 38% and puts into microwave oven, 5 hours, 4 hours, 3 hours, the 2 hours cleaned ArF Excimer discharge lamps 7,8,9,10 of respectively hanging oneself, and the inner surface of discharge vessel with shape shown in Figure 1 is not carried out the ArF Excimer discharge lamp 11,12 of clean.For the ArF Excimer discharge lamp of preparing 7～12, investigation is kept characteristic by the light beam of the 193nm of ArF Excimer discharge lamp radiation.Be meant the ratio that the light beam of (to lighting a lamp the time that lamp requires) is kept when initially being made as under 100% the situation through 400 hours with lighting a lamp at this so-called light beam sustainment rate.
Fig. 5 is the result's of expression comparative experiments 2 a table.As shown in the drawing, shown in ArF Excimer discharge lamp 7, during through 400 hours, though have the lamp that light beam rises, but at time point through 400 hours, be for reaching the life-span (replacing period), therefore will being called the upper limit of concentration of metallic impurities below 70% by the concentration of metallic impurities 600wtppm that depth areas comprised till discharge vessel inner surface to the 100 μ m.Metallic contaminants from surface concentration is high more, and beam attenuation is big more can be thought because the minimizing of fluorine.
Then, use Fig. 6 that the 2nd execution mode of the present invention is described.
Fig. 6 (a) is the profile of being seen by the profile view of the long side direction of the Excimer discharge lamp of the invention that is parallel to present embodiment, and Fig. 6 (b) is a profile of being watched the Excimer discharge lamp of Fig. 6 (a) by cross section A-A.
Shown in above-mentioned figure, the discharge vessel 22 of this Excimer discharge lamp 21 is roughly rectangular-shaped, ultraviolet ray for 150～400nm has light transmission, and the material that is made of the arbitrary monocrystalline that absorbs in the less sapphire of fluorine ion, YAG, the monocrystalline yittrium oxide constitutes.In addition, in discharge vessel 22, enclose argon (Ar) and the high sulphur hexafluoride (SF of chemical stability
6) as luminous gas, and to enclose the molar concentration account for full inclosure gas be that helium (He) more than 90%, below 99.5% or neon (Ne) are as buffer gas.When Excimer discharge lamp 1 was lit a lamp, luminous gas formed argon ion and fluorine ion.
The inner surface of discharge vessel 22 is carried out chemical etching with phosphoric acid or sulfuric acid handle, forming by molybdenum (Mo), iron (Fe), chromium (Cr) the metal impurities summation concentration of etc.ing in the scope of inner surface to the 100 μ m of discharge vessel 22 is state below the 600ppm.Wherein, except chemical etching,, also the concentration of metallic impurities on surface can be formed the state below the 50ppm by mechanical lapping.
Shown in Fig. 6 (a), the end in the long side direction of discharge vessel 22 is open, is provided as the lid member 23 of the metallic cover piece of cup-shaped at this place.The material of lid member 23 for example is a Kovar alloy (kovar).Lid member 23 is if consider thermal diffusivity, and is the most suitable with metal material, if but thermal diffusivity is out of question, then also can be potteries such as aluminium oxide.Fill the encapsulant 24 that for example is made of the Ag-Cu alloy between discharge vessel 22 and lid member 23, discharge vessel 22 combines and is sealed with lid member 23 thus.As the material of encapsulant 24, use for example by the wlding of silver with alloy (Ag-Cu alloy) formation of copper.Be provided with gas pipe arrangement 25 at lid on the member 23, after by gas pipe arrangement 25 inner space 26 of discharge vessel 22 being carried out exhaust and reduced pressure, enclose argon (Ar) and the high sulphur hexafluoride (SF of chemical stability as luminous gas
6), and as the helium (He) or the neon (Ne) of buffer gas.After enclosing above-mentioned gas, gas pipe arrangement 25 utilizes formation sealings 27 such as crimping, becomes airtight construction thus.
At the outer surface of discharge vessel 22, a pair of tabular outer electrode 28 and the electrically configuration discretely mutually of netted outer electrode 29 that for example constitutes by gold (Au), and the mode of extending with the long side direction along discharge vessel 22 is provided with.In addition, outer electrode 28,29 is provided with away from encapsulant 24 and lid member 23.Externally an end of the long side direction of electrode 28,29 is electrically connected with lead-in wire 30,31 by wlding 32,33 for example etc.Constituting along the face beeline of 28,29 of outer electrodes is longer than the beeline across the discharge space of 28,29 of outer electrodes.This is the structure that discharge only takes place in order to form at discharge space.
When Excimer discharge lamp 21 is lit a lamp, if between pair of external electrodes 28,29, apply voltage, can be across discharge vessel 22 and externally 28,29 at electrode discharge.At luminous gas is argon (Ar) and sulphur hexafluoride (SF
6) situation under, above-mentioned gas is ionized, and forms argon ion and fluorine ion, forms by the excimer molecule that argon-fluorine constituted, by the light of the wavelength of discharge vessel 2 radiation 193nm.
On the long side direction of discharge vessel 22, outer electrode 28,29 is located on the position away from encapsulant 24 and lid member 23, thus in the inner space 26 of discharge vessel 22, do not discharge by the end of the outer electrode 28,29 of the scope of the L3 that the is positioned at long side direction range L 4 till the encapsulant 424.That is, discharge vessel 22 strides across complete cycle and distolaterally has a surface portion that is not provided with outer electrode 28,29 at one of discharge vessel 22, therefore, compares with the pairing inner space of the scope of L3, and the pairing inner space of the scope of L4 temperature is lower, becomes cooled region.Therefore, enclose just like sulphur hexafluoride (SF when inner space 26 at discharge vessel 22
6) and so on the higher gas of chemical stability during as luminous gas, in the zone of the L4 of the long side direction of the discharge vessel 22 that discharge does not take place, the reaction of the sulphur hexafluoride before the ionization can take place to get back to because of the fluorine ion of discharge ionization.Thus, in the inner space 26 of discharge vessel 22, by between the end of the outer electrode 28,29 of the scope of the L3 of long side direction is till the encapsulant 24, be suppressed with contacting of fluorine ion, can suppress to constitute encapsulant 24 or the material of lid member 23 and the reaction of fluorine ion.The reaction that can not take place because of halogen and metal cover members causes halogen quantity to reduce, and creeping discharge can not take place and the required important document of stable maintenance discharge is: discharging gap (across the beeline of the discharge space of 28,29 of outer electrodes)≤and along the distance between face beeline and discharging gap (across the beeline of the discharge space of 28,29 of outer electrodes)＜outer electrode and metal cover members.
In addition, in the Excimer discharge lamp 21 of present embodiment, as shown in Figure 2, illumination is fully stable is that the ratio of neon (Ne) is the zone more than 90%, but in the zone of the ratio high (more than 99.5%) of neon (Ne), luminous efficiency reduces situation and becomes remarkable, in addition, as shown in Figure 3, illumination is fully stable is that the ratio of helium (He) is the zone more than 90%, but in the zone of the ratio high (more than 99.5%) of helium (He), luminous efficiency reduces situation and becomes remarkable.
In addition, in the Excimer discharge lamp 21 of present embodiment, the experimental result that comes to the same thing that also can obtain Yu in comparative experiments 1 and comparative experiments 2, obtain.
Claims (5)
1. Excimer discharge lamp, at outer surface at least one outer electrode is set by at least one discharge vessel that constitutes in sapphire, YAG or the monocrystalline yittrium oxide, in described discharge vessel, enclose argon (Ar) and the gas that contains fluorine (F) atom, it is characterized in that:
By the concentration of metallic impurities that depth areas comprised till inner surface to the 100 μ m of described discharge vessel is below the 600wtppm.
2. Excimer discharge lamp according to claim 1 is characterized in that,
Described discharge vessel constitutes tubulose, and enclosing in this discharge vessel has argon (Ar), sulphur hexafluoride (SF
6) and helium (He) or neon (Ne),
At the outer surface of described discharge vessel, along tube axial direction at least one outer electrode is set, described discharge vessel strides across complete cycle and has the outer surface part that outer electrode is not set in the both end sides of described discharge vessel.
3. Excimer discharge lamp according to claim 1 is characterized in that described discharge vessel constitutes roughly rectangular-shaped, and enclosing in this discharge vessel has argon (Ar), sulphur hexafluoride (SF
6) and helium (He) or neon (Ne), at the outer surface of described discharge vessel, at least one outer electrode being set along long side direction, described discharge vessel strides across complete cycle and has the outer surface part that outer electrode is not set described discharge vessel distolateral.
4. according to claim 2 or 3 described Excimer discharge lamps, wherein, the molar concentration that described neon (Ne) accounts for full inclosure gas is more than 90%, below 99.5%.
5. according to claim 2 or 3 described Excimer discharge lamps, wherein, the molar concentration that described helium (He) accounts for full inclosure gas is more than 90%, below 99.5%.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008011341A JP4569636B2 (en) | 2008-01-22 | 2008-01-22 | Excimer discharge lamp |
| JP2008011341 | 2008-01-22 | ||
| JP2008-011341 | 2008-01-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101494155A true CN101494155A (en) | 2009-07-29 |
| CN101494155B CN101494155B (en) | 2012-01-04 |
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ID=40924680
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009100099035A Expired - Fee Related CN101494155B (en) | 2008-01-22 | 2009-01-22 | Quasimolecule discharge lamp |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4569636B2 (en) |
| KR (1) | KR101031381B1 (en) |
| CN (1) | CN101494155B (en) |
| TW (1) | TW200933691A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102847691A (en) * | 2011-06-27 | 2013-01-02 | 株式会社杰士汤浅国际 | Ultraviolet irradiation device |
| CN111916337A (en) * | 2019-05-09 | 2020-11-10 | 崇翌科技股份有限公司 | Excimer lamp |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5316079B2 (en) * | 2009-02-26 | 2013-10-16 | ウシオ電機株式会社 | Excimer discharge lamp |
| JP2011034779A (en) * | 2009-07-31 | 2011-02-17 | Ushio Inc | Rare gas-halogen excimer lamp |
| JP2011065761A (en) * | 2009-09-15 | 2011-03-31 | Harison Toshiba Lighting Corp | Metal halide lamp |
| JP2011090924A (en) * | 2009-10-23 | 2011-05-06 | Ushio Inc | Excimer lamp |
| JP4835885B2 (en) * | 2009-11-06 | 2011-12-14 | ウシオ電機株式会社 | Excimer lamp |
| JP6272361B2 (en) * | 2014-01-30 | 2018-01-31 | 京セラ株式会社 | Plasma cylinder, plasma apparatus, gas laser apparatus, and method of manufacturing plasma cylinder |
| JP2016081695A (en) * | 2014-10-16 | 2016-05-16 | ウシオ電機株式会社 | Excimer discharge lamp |
| JP2016195019A (en) * | 2015-03-31 | 2016-11-17 | 株式会社Ｇｓユアサ | Discharge lamp |
| CN112997271B (en) * | 2018-11-13 | 2022-04-26 | 优志旺电机株式会社 | Excimer lamp light source device and excimer lamp lighting method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH031436A (en) * | 1988-10-04 | 1991-01-08 | Minoru Obara | High efficiency excimer discharge lamp |
| JP3178162B2 (en) * | 1993-04-28 | 2001-06-18 | ウシオ電機株式会社 | Dielectric barrier discharge lamp |
| JP2005222905A (en) | 2004-02-09 | 2005-08-18 | Japan Storage Battery Co Ltd | Excimer lamp |
| JP4475167B2 (en) * | 2005-05-10 | 2010-06-09 | ウシオ電機株式会社 | Flash lamp and flash lamp device |
| JP4475171B2 (en) | 2005-05-18 | 2010-06-09 | ウシオ電機株式会社 | Flash lamp |
-
2008
- 2008-01-22 JP JP2008011341A patent/JP4569636B2/en not_active Expired - Fee Related
- 2008-11-03 TW TW097142360A patent/TW200933691A/en not_active IP Right Cessation
- 2008-11-24 KR KR1020080116652A patent/KR101031381B1/en not_active IP Right Cessation
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2009
- 2009-01-22 CN CN2009100099035A patent/CN101494155B/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102847691A (en) * | 2011-06-27 | 2013-01-02 | 株式会社杰士汤浅国际 | Ultraviolet irradiation device |
| CN111916337A (en) * | 2019-05-09 | 2020-11-10 | 崇翌科技股份有限公司 | Excimer lamp |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101494155B (en) | 2012-01-04 |
| KR20090080887A (en) | 2009-07-27 |
| TW200933691A (en) | 2009-08-01 |
| KR101031381B1 (en) | 2011-04-26 |
| JP4569636B2 (en) | 2010-10-27 |
| JP2009176459A (en) | 2009-08-06 |
| TWI348178B (en) | 2011-09-01 |
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