CN101441982A - Chamber lining and plasma processing apparatus - Google Patents
Chamber lining and plasma processing apparatus Download PDFInfo
- Publication number
- CN101441982A CN101441982A CNA200710177739XA CN200710177739A CN101441982A CN 101441982 A CN101441982 A CN 101441982A CN A200710177739X A CNA200710177739X A CN A200710177739XA CN 200710177739 A CN200710177739 A CN 200710177739A CN 101441982 A CN101441982 A CN 101441982A
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- Prior art keywords
- cavity inner
- inner lining
- barrel
- reaction chamber
- plasma
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Abstract
The invention discloses an inner cavity liner and a plasma machining device. The cylindrical wall of the inner cavity liner is contracted to low periphery from up to down. The lower part of the cylindrical wall can be contracted in a bias line or an arc shape; the middle part of the cylindrical wall can also be contracted in a bias line or an arc shape; the contracting part on the cylindrical wall is provided with a plurality of exhaust through holes; the upper periphery of the inner cavity liner is connected with the side wall of the reaction cavity of the plasma machining device; and the lower periphery of the inner cavity liner is connected with a static chuck or an exhaust ring. The device can achieve the function of protecting inner wall of the reaction cavity, limit flowing area of the plasma, and achieve the function of improving plasma performance.
Description
Technical field
The present invention relates to a kind of semiconductor processing equipment parts, relate in particular to a kind of cavity inner lining and plasma arc processing apparatus.
Background technology
In field of semiconductor processing, semiconductor chip need carry out plasma process in the reaction chamber of plasma arc processing apparatus, as etching, vapor phase deposition etc.Therefore need apply radio frequency to reaction chamber, make the process gas that enters in the reaction chamber be excited into plasma, and then carry out semiconductor machining.
Because the wall composition material of reaction chamber is generally aluminium, although surface treatment (being generally anodized) has been done on the surface of reaction chamber wall, still can by with reaction chamber in plasma react, cause the damage of equipment part or the deposition of polymer.
As shown in Figure 1, in the prior art, be to increase a liner 2 in the inside of reaction chamber 1; come the inwall of protective reaction chamber 1; liner 2 is cylindrical, is provided with air exhaust loop 4 between the lower edge of liner 2 and the electrostatic chuck 3, and air exhaust loop 4 is used to discharge the product behind the reaction chamber internal reaction.
There is following shortcoming at least in above-mentioned prior art: liner 2 can only play the effect of protective reaction chamber 1 inwall, can not play the effect of the performance of improving plasma.
Summary of the invention
The purpose of this invention is to provide and a kind ofly can play the protective reaction chamber inner wall, can improve the cavity inner lining and the plasma arc processing apparatus of plasma properties again.
The objective of the invention is to be achieved through the following technical solutions:
Cavity inner lining of the present invention, this cavity inner lining is a tubular, comprises barrel, described barrel is contracted to lower edge from top to bottom gradually.
Plasma arc processing apparatus of the present invention is provided with above-mentioned cavity inner lining in the reaction chamber of this plasma processing unit (plant), the upper limb of described cavity inner lining is connected with the sidewall of described reaction chamber, and the barrel of described cavity inner lining is contracted to lower edge from top to bottom gradually.
As seen from the above technical solution provided by the invention; cavity inner lining of the present invention and plasma arc processing apparatus; because barrel is contracted to lower edge from top to bottom gradually; after being provided with this cavity inner lining in the reaction chamber; cavity inner lining can play the effect of protective reaction chamber inner wall; flow region that again can the plasma confinement body plays the effect that improves plasma properties.
Description of drawings
Fig. 1 is the structural representation of liner of the prior art and reaction chamber;
Fig. 2 is the structural representation of the specific embodiment one of cavity inner lining of the present invention and reaction chamber;
Fig. 3 is the structural representation of the specific embodiment two of cavity inner lining of the present invention and reaction chamber;
Fig. 4 is the structural representation of the specific embodiment three of cavity inner lining of the present invention and reaction chamber.
Embodiment
Cavity inner lining of the present invention, its preferable embodiment be, this cavity inner lining is a tubular, comprises barrel, and barrel is contracted to lower edge from top to bottom gradually.
Specific embodiment one as shown in Figure 2, the bottom of the barrel of this cavity inner lining 5 can be camber line shape, is contracted to lower edge gradually.
Specific embodiment two as shown in Figure 3, the bottom of the barrel of this cavity inner lining 5 also can be oblique line shape, is contracted to lower edge gradually.
As required, the bottom of the barrel of cavity inner lining 5 also can be other shape, is contracted to lower edge gradually.
Specific embodiment three as shown in Figure 4, the barrel of this cavity inner lining 5 also can be from the middle part or the middle and upper part begin to shrink, with the level and smooth connection of contraction of barrel bottom, be contracted to lower edge gradually then.
Equally, the contraction of barrel middle part or middle and upper part also can be that oblique line shape shrinks, camber line shape is shunk, or the contraction of other shape.
On the contraction position of barrel, can have a plurality of through holes 6, be used for exhaust.Needs during according to concrete the application also can not opened the hole.
Plasma arc processing apparatus of the present invention, its preferable embodiment is, as Fig. 2, Fig. 3, shown in Figure 4, be provided with above-mentioned cavity inner lining 5 in the reaction chamber 1 of this plasma processing unit (plant), the upper limb of cavity inner lining 5 is connected with the sidewall of reaction chamber 1, and the barrel of cavity inner lining 5 is contracted to lower edge from top to bottom gradually.
Be provided with electrostatic chuck 3 in the reaction chamber 1, the lower edge of cavity inner lining 5 can directly be connected with electrostatic chuck 3, and at this moment, the contraction position of the barrel of cavity inner lining 5 has a plurality of through holes 6, is used for exhaust.
Also can be provided with air exhaust loop in the reaction chamber 1, the lower edge of cavity inner lining 5 at first is connected with air exhaust loop, then, air exhaust loop is connected with electrostatic chuck again, and in this case, the contraction position of the barrel of cavity inner lining 5 is according to the needs of technology, can not open the hole, by the air exhaust loop exhaust; Also can have a plurality of through holes 6, be used for auxiliary exhaust.
Cavity inner lining of the present invention and plasma arc processing apparatus; lower part is the inner lining structure of skewed or arc shaped; owing to shunk the space; can play the effect of protective reaction cavity inner lining; can play the effect that focuses on plasma again; the plasma density that particularly can make the substrate top of being etched with the plane of substrate parallel in the uniformity more that becomes; this is because the cavity inner lining structure itself has certain electromagnetic shielding action; the structural change meeting of itself has influence on the effecting reaction regional space of plasma, and the density distribution of article on plasma body exerts an influence.The present invention has utilized this " focusing " effect of liner just.In addition because the merosystolic project organization of cavity inner lining, can on the constriction of whole inner lining structure, design the through hole of bleeding, make the effect of the layout generation three-dimensional of the structure of bleeding, further improved the etching result, make the etching in centre and edge on the substrate after the figure uniformity more consistent.
The present invention improves and optimizates the cavity inner lining structure, can effectively improve plasma properties, the particularly uniformity of plasma zone of action, has optimized the etching performance of plasma arc processing apparatus.
The above; only for the preferable embodiment of the present invention, but protection scope of the present invention is not limited thereto, and anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; the variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.
Claims (9)
1, a kind of cavity inner lining is characterized in that, this cavity inner lining is a tubular, comprises barrel, and described barrel is contracted to lower edge from top to bottom gradually.
2, cavity inner lining according to claim 1 is characterized in that, the bottom of described barrel is an oblique line shape.
3, cavity inner lining according to claim 1 is characterized in that, the bottom of described barrel is a camber line shape.
According to claim 2 or 3 described cavity inner linings, it is characterized in that 4, the middle part of described barrel is an oblique line shape.
According to claim 2 or 3 described cavity inner linings, it is characterized in that 5, the middle part of described barrel is a camber line shape.
6, cavity inner lining according to claim 1 is characterized in that, the contraction position of described barrel has a plurality of through holes.
7, a kind of plasma arc processing apparatus, it is characterized in that, be provided with each described cavity inner lining of claim 1 to 7 in the reaction chamber of this plasma processing unit (plant), the upper limb of described cavity inner lining is connected with the sidewall of described reaction chamber, and the barrel of described cavity inner lining is contracted to lower edge from top to bottom gradually.
8, chamber plasma arc processing apparatus according to claim 8 is characterized in that, is provided with electrostatic chuck in the described reaction chamber, and the lower edge of described cavity inner lining is connected with described electrostatic chuck, and the contraction position of described barrel has a plurality of through holes.
9, chamber plasma arc processing apparatus according to claim 8 is characterized in that, is provided with air exhaust loop in the described reaction chamber, and the lower edge of described cavity inner lining is connected with described air exhaust loop.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200710177739XA CN101441982A (en) | 2007-11-20 | 2007-11-20 | Chamber lining and plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200710177739XA CN101441982A (en) | 2007-11-20 | 2007-11-20 | Chamber lining and plasma processing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101441982A true CN101441982A (en) | 2009-05-27 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA200710177739XA Pending CN101441982A (en) | 2007-11-20 | 2007-11-20 | Chamber lining and plasma processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101441982A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101985746A (en) * | 2009-07-28 | 2011-03-16 | 丽佳达普株式会社 | Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber |
| US10569617B2 (en) | 2016-08-12 | 2020-02-25 | Samsung Electronics Co., Ltd. | Outdoor unit for air conditioner |
-
2007
- 2007-11-20 CN CNA200710177739XA patent/CN101441982A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101985746A (en) * | 2009-07-28 | 2011-03-16 | 丽佳达普株式会社 | Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber |
| US8876974B2 (en) | 2009-07-28 | 2014-11-04 | Ligadp Co., Ltd. | Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber |
| US10569617B2 (en) | 2016-08-12 | 2020-02-25 | Samsung Electronics Co., Ltd. | Outdoor unit for air conditioner |
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| PB01 | Publication | ||
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| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20090527 |