CN101441373A - Method for restoring wire break of liquid crystal display device - Google Patents

Method for restoring wire break of liquid crystal display device Download PDF

Info

Publication number
CN101441373A
CN101441373A CNA200710170941XA CN200710170941A CN101441373A CN 101441373 A CN101441373 A CN 101441373A CN A200710170941X A CNA200710170941X A CN A200710170941XA CN 200710170941 A CN200710170941 A CN 200710170941A CN 101441373 A CN101441373 A CN 101441373A
Authority
CN
China
Prior art keywords
broken string
conductive layer
liquid crystal
gate line
contact hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA200710170941XA
Other languages
Chinese (zh)
Inventor
秦锋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai SVA NEC Liquid Crystal Display Co Ltd
Original Assignee
Shanghai SVA NEC Liquid Crystal Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai SVA NEC Liquid Crystal Display Co Ltd filed Critical Shanghai SVA NEC Liquid Crystal Display Co Ltd
Priority to CNA200710170941XA priority Critical patent/CN101441373A/en
Publication of CN101441373A publication Critical patent/CN101441373A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Liquid Crystal (AREA)

Abstract

The invention relates to a method for repairing the broken lines of a liquid crystal display device. The liquid crystal display device comprises a plurality of grid lines in parallel with each other, a plurality of data lines which are intersected with the grid lines, a thin film transistor which is connected with a corresponding grid line and a data line through a first contact hole and a second contact hole respectively, and a protective conductive layer which covers the first contact hole and is in contact connection with the grid lines. When the grid lines are broken, the method can be used for repairing the broken lines and comprises the following steps: detecting the position of the broken grid lines through a detection device; and carrying out sedimentation for repairing the conductive layer in the area of the broken grid lines under the protection of protective gas through a sedimentation device. The method adopts the equipment such as a laser CVD for carrying out sedimentation and repairing the conductive layer and is electrically connected with the broken lines through the contact holes after the conductive layer is repaired through sedimentation, thereby improving the rate of fineness of the liquid crystal display device product.

Description

The restorative procedure of the broken string of liquid crystal indicator
Technical field
The present invention relates to a kind of restorative procedure of broken string of liquid crystal indicator.
Background technology
Traditional CRT monitor relies on the phosphor powder on the cathode-ray tube (CRT) emitting electrons bump screen to come display image, but the principle of liquid crystal display is then different fully.Usually, liquid crystal indicator (LCD) has (also claiming color membrane substrates) and infrabasal plate (also claiming array base palte), have each other certain intervals and mutually over against, be formed on two substrates a plurality of electrodes mutually over against, liquid crystal is clipped between upper substrate and the infrabasal plate, voltage is applied on the liquid crystal by the electrode on the substrate, thus then according to the voltage that acted on change the arrangement display image of liquid crystal molecule, because liquid crystal indicator is not launched light as mentioned above, it needs light source to come display image.Therefore, liquid crystal indicator has the backlight that is positioned at the liquid crystal panel back, thereby controls from backlight quantity of incident light display image according to the arrangement of liquid crystal molecule.Accompany glass substrate, colored filter, electrode, liquid crystal layer and thin film transistor (TFT) between two polaroids, liquid crystal molecule is the material with refractive index and dielectric constant anisotropy.The light process that backlight sends is polaroid down, becomes the polarized light with certain polarization direction.Institute's making alive between the transistor controls electrode, and this voltage acts on the polarization direction that liquid crystal is controlled polarized light, polarized light forms monochromatic polarized light after seeing through corresponding color film chromatograph, if polarized light can penetrate the upper strata polaroid, then demonstrates corresponding color; Electric field intensity difference, the deflection angle of liquid crystal molecule are also different, and the light intensity that sees through is different, and the brightness of demonstration is also different, and the combination of the different light intensity by three kinds of colors of RGB shows motley image.
The LCD device comprises color membrane substrates and array base palte, and is formed at liquid crystal layer between this color membrane substrates and the array base palte by the method for dripping.The array base palte plate comprises: many select liness, and these select liness are arranged along first direction with fixed intervals; Many data lines, these data lines are arranged along the second direction perpendicular to first direction with fixed intervals; A plurality of pixel electrodes are arranged in by in the pixel region that select lines and data line were limited that intersects with matrix structure: and a plurality of thin film transistor (TFT), these thin film transistor (TFT)s can offer the data of select lines and signal is passed to pixel electrode from data line.Color membrane substrates comprises: black matrix" (BM:black matrix), this black matrix prevent that light from sending from the part except pixel region of first substrate; The color film of RGB is used for display color light, and public electrode, is used to form to show required electric field.The thick sept of the box of maintenance is arranged between the glass substrate of fitting mutually.
In the manufacture process of actual product, breaking, bad to have accounted for overall bad proportion very big.For the yields that improves production is normally repaired the lead of poor flow.In the array processes process, by after finishing each conductor layer, open a way the measurement aspect the short circuit of different checkout equipments, bad with timely discovery, in time repair, owing to finish measurement and the reparation that metal level carries out just, thereby can obtain reasonable conducting efficient and reliability result.Above-mentioned restorative procedure is generally the cutting and the laser CVD (ChemicalVapor Deposition, chemical vapor deposition) of laser.By to the metal of part or conductive pattern cutting can repair part because the short circuit that kish or conducting objects cause can connect the lead that disconnects by the part being carried out laser CVD, to repair this broken string.
Above-mentioned broken string reparation is after metal carbonyl conducting layer forms, and dielectric film does not carry out before forming as yet, and the metal that laser CVD forms directly is covered in conductive line surfaces, thereby reasonable contact performance is arranged.But above-mentioned restorative procedure can't be suitable for after conductive line surfaces forms dielectric film, and in engineering, exist sizable broken string omission probability, in case after covering dielectric film, find to have broken string, then can only rely on particular design and subsequent technique to come broken string is repaired.Be simply described as follows at the mode of in array side the broken string of finishing the dielectric film covering being repaired at present: at first find out array side and finished the place that the broken string of dielectric film covering takes place, next utilizes superlaser that the dielectric film of broken string place both sides metal top is hit, to remove the dielectric film on surface, spill conductive layer, make original lead conducting that disconnects by laser CVD at the surface coverage metal conductive film then.But having, the method that laser from top to bottom hits the conductive layer conducting medium is at high temperature reacted with environmental gas easily can at high temperature be gasified easily or the inequality of being heated is splashed and caused conducting medium to lack and influence shortcoming such as contact performance.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of restorative procedure of broken string of liquid crystal indicator, and the restorative procedure of this broken string is connected with the reparation conductive layer by the protection conductive layer, and the lead that prevents broken string is damaged by laser.
For achieving the above object, the invention provides a kind of restorative procedure of broken string of liquid crystal indicator, this liquid crystal indicator comprises many gate lines that are parallel to each other, many data lines with those gate line cross arrangements, respectively by one first contact hole, one second contact hole and a corresponding gate line, the thin film transistor (TFT) that one data line connects, be positioned at and cover a protection conductive layer on first contact hole, this protection conductive layer is connected with described gate line contact, when broken string takes place in described gate line, its substantive distinguishing features is that its method that gate line is repaired may further comprise the steps: the position that detects the broken string generation of gate line by checkout equipment; Under the protection of blanket gas, a deposit of repairing conductive layer is carried out in gate line broken string zone by depositing device.
Preferably, described reparation conductive layer covers the broken string place until transistorized first contact hole in adjacent both sides, broken string place, and these two first contact holes fill up described reparation conductive layer.
Preferably, described depositing device is a laser chemical vapor deposition equipment.
Preferably, described gate line is formed on the glass substrate, and one first insulation course covers this gate line.
Preferably, the material of described reparation conductive layer is the tungsten metal.
Another technical scheme of the present invention provides a kind of restorative procedure of broken string of liquid crystal indicator, this liquid crystal indicator comprises many gate lines that are parallel to each other, many data lines with those gate line cross arrangements, respectively by one first contact hole, one second contact hole and a corresponding gate line, the thin film transistor (TFT) that one data line connects, be positioned at and cover a protection conductive layer on second contact hole, this protection conductive layer is connected with described data line contact, when broken string takes place in described data line, its substantive distinguishing features is that its method that data line is repaired may further comprise the steps: the position that detects the broken string generation of data line by checkout equipment; Under the protection of blanket gas, a deposit of repairing conductive layer is carried out in the broken data wire zone by depositing device.
Preferably, described reparation conductive layer covers the broken string place until transistorized second contact hole in adjacent both sides, broken string place, and these two second contact holes fill up described reparation conductive layer.
Preferably, described depositing device is a laser chemical vapor deposition equipment.
Preferably, described gate line is formed on the glass substrate, and one first insulation course covers this gate line.
Preferably, the material of described reparation conductive layer is the tungsten metal.
The present invention is owing to adopted above-mentioned technical scheme, make it compared with prior art, have following advantage and good effect: restorative procedure of the present invention is in place that data line or gate line need break and repair, adopt equipment deposit reparation conductive layers such as laser CVD, utilize the reparation conductive layer of this deposit disconnection portion to be electrically connected by contact hole, thereby the part that has broken can be reconnected, play repair, improve the yield of liquid crystal indicator product.
Description of drawings
The liquid crystal indicator synoptic diagram of broken string takes place in Fig. 1 for gate line;
Fig. 2 is the cut-open view along a-a ' direction among Fig. 1;
The liquid crystal indicator synoptic diagram of Fig. 3 for the gate line broken string is repaired;
Fig. 4 is the cut-open view along b-b ' direction among Fig. 3;
Fig. 5 is the cut-open view along c-c ' direction among Fig. 3;
The liquid crystal indicator synoptic diagram of broken string takes place in Fig. 6 for data line;
Fig. 7 is the cut-open view along d-d ' direction among Fig. 6;
Fig. 8 is the cut-open view along e-e ' direction among Fig. 6.
Embodiment
Be described in further detail below with reference to the restorative procedure of accompanying drawing the broken string of liquid crystal indicator of the present invention.
The liquid crystal indicator synoptic diagram of broken string takes place in Fig. 1 for gate line; As shown in Figure 1, this liquid crystal indicator comprises many gate lines that are parallel to each other 1, data line 3 with gate line 1 cross arrangement, a pixel electrode PX who surrounds by a gate line 1 and a data line 3, a thin film transistor (TFT) T (the Thin Film Transistor that a corresponding pixel electrode PX forms, TFT), this thin film transistor (TFT) T is connected with gate line 1, data line 3 by first contact hole 9, second contact hole 8 respectively, has a groove 7 in the thin film transistor (TFT) T.Fig. 2 is the cut-open view along a-a ' direction among Fig. 1; as seen from Figure 2; gate line 1 is formed on the glass substrate 12; one first insulation course 13 covers this gate line 1; this thin film transistor (TFT) T is formed on first insulation course 13; one second insulation course 14 covers this thin film transistor (TFT) T; this thin film transistor (TFT) T is connected with pixel electrode PX by the 3rd contact hole 10; data line 3 and active layer 11 are connected with conductive layer on second contact hole 8; cover a protection conductive layer 5 on first contact hole 9 and second contact hole 8, this protection conductive layer 5 is connected with gate line 1 contact.
The liquid crystal indicator synoptic diagram of Fig. 3 for the gate line broken string is repaired; Fig. 4 is the cut-open view along b-b ' direction among Fig. 3; Fig. 5 is the cut-open view along c-c ' direction among Fig. 3; As Fig. 3, Fig. 4, shown in Figure 5, when broken string takes place in a place 101 of gate line 1, can repair the gate line 1 of broken string by following restorative procedure: at first pass through checkout equipment, the GX-3 equipment that testing apparatus PS5000, the OHT that produces as SIMADZU produces etc. detect the position that the broken string of gate line takes place; By laser chemical vapor deposition (ChemicalVapour Deposition; CVD) equipment is repaired the deposit of conductive layer 102 to the zone of breaking under the protection of blanket gas; it is metal material that conductive layer 102 is repaired in general this deposit; and it is the most general with the tungsten metal; this is repaired conductive layer 102 and covers first contact hole 9 of broken string place until adjacent both sides transistor T; fill up reparation conductive layer 102 at these two first contact hole 9 positions and make gate line 1 and this reparation conductive layer 102 be conducted, thereby the gate line 1 leap broken string place that broken string takes place passes through to repair conductive layer 102 conducting again.
The liquid crystal indicator synoptic diagram of broken string takes place in Fig. 6 for data line, as shown in Figure 6, the liquid crystal indicator that this liquid crystal indicator and Fig. 1 show is similar, and its main difference part is: data line 3 breaks at a place 101 in the liquid crystal indicator that Fig. 6 shows.Fig. 7 is the cut-open view along d-d ' direction among Fig. 6, Fig. 8 is the cut-open view along e-e ' direction among Fig. 6, as Fig. 7, shown in Figure 8, restorative procedure of the present invention is repaired data line by following steps: at first pass through checkout equipment, the GX-3 equipment that testing apparatus PS5000, the OHT that produces as SIMADZU produces etc. detect the position that the broken string of data line 3 takes place; By laser chemical vapor deposition (Chemical Vapour Deposition; CVD) equipment is repaired the deposit of conductive layer 102 to the broken string zone of data line 3 under the protection of blanket gas; it is metal material that conductive layer 102 is repaired in general this deposit; and it is the most general with the tungsten metal; this reparation conductive layer 102 covers second contact hole 8 of broken string place adjacent both sides transistor T; fill up reparation conductive layer 102 at these two second contact hole 8 positions and make data line 3 and this reparation conductive layer 102 be conducted, thereby the data line 3 leap broken string places that broken string takes place pass through to repair conductive layer 102 conducting again.
Restorative procedure of the present invention is in place that data line or gate line need break and repair, adopt equipment deposit reparation conductive layers such as laser CVD, utilize the reparation conductive layer of this deposit disconnection portion to be electrically connected by contact hole, thereby the part that has broken can be reconnected, play repair, improve the yield of liquid crystal indicator product.
That more than introduces only is based on preferred embodiment of the present invention, can not limit scope of the present invention with this.Any device of the present invention or method are done replacement, the combination, discrete of step well know in the art, and the invention process step is done well know in the art being equal to change or replace and all do not exceed exposure of the present invention and protection domain.

Claims (7)

1. the restorative procedure of the broken string of a liquid crystal indicator; this liquid crystal indicator comprises many gate lines that are parallel to each other; many data lines with those gate line cross arrangements; respectively by one first contact hole, one second contact hole and a corresponding gate line, the thin film transistor (TFT) that a data line connects; be positioned at and cover a protection conductive layer on first contact hole; this protection conductive layer is connected with described gate line contact; when broken string takes place in described gate line; it is characterized in that its method that described gate line is repaired may further comprise the steps:
Detect the position of the broken string generation of described gate line by checkout equipment;
Under the protection of blanket gas, a deposit of repairing conductive layer is carried out in described gate line broken string zone by depositing device.
2. the restorative procedure of the broken string of liquid crystal indicator as claimed in claim 1 is characterized in that, described reparation conductive layer covers the broken string place until transistorized first contact hole in adjacent both sides, broken string place, and these two first contact holes fill up described reparation conductive layer.
3. the restorative procedure of the broken string of a liquid crystal indicator; this liquid crystal indicator comprises many gate lines that are parallel to each other; many data lines with those gate line cross arrangements; respectively by one first contact hole, one second contact hole and a corresponding gate line, the thin film transistor (TFT) that a data line connects; be positioned at and cover a protection conductive layer on second contact hole; this protection conductive layer is connected with described data line contact; when broken string takes place in described data line; it is characterized in that its method that data line is repaired may further comprise the steps:
Detect the position of the broken string generation of described data line by checkout equipment;
Under the protection of blanket gas, a deposit of repairing conductive layer is carried out in described broken data wire zone by depositing device.
4. the restorative procedure of the broken string of liquid crystal indicator as claimed in claim 3 is characterized in that, described reparation conductive layer covers the broken string place until transistorized second contact hole in adjacent both sides, broken string place, and these two second contact holes fill up described reparation conductive layer.
5. as the restorative procedure of the broken string of claim 1 or 3 described liquid crystal indicators, it is characterized in that described depositing device is a laser chemical vapor deposition equipment.
6. as the restorative procedure of the broken string of claim 1 or 3 described liquid crystal indicators, it is characterized in that described gate line is formed on the glass substrate, one first insulation course covers this gate line.
7. as the restorative procedure of the broken string of claim 1 or 3 described liquid crystal indicators, it is characterized in that the material of described reparation conductive layer is the tungsten metal.
CNA200710170941XA 2007-11-23 2007-11-23 Method for restoring wire break of liquid crystal display device Pending CN101441373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNA200710170941XA CN101441373A (en) 2007-11-23 2007-11-23 Method for restoring wire break of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNA200710170941XA CN101441373A (en) 2007-11-23 2007-11-23 Method for restoring wire break of liquid crystal display device

Publications (1)

Publication Number Publication Date
CN101441373A true CN101441373A (en) 2009-05-27

Family

ID=40725863

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA200710170941XA Pending CN101441373A (en) 2007-11-23 2007-11-23 Method for restoring wire break of liquid crystal display device

Country Status (1)

Country Link
CN (1) CN101441373A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103744201A (en) * 2013-12-31 2014-04-23 深圳市华星光电技术有限公司 Liquid crystal display panel repair method and repair system
US9297074B2 (en) 2013-12-31 2016-03-29 Shenzhen China Star Optoelectronics Technology Co., Ltd Liquid crystal display panel repairing method and repairing system
CN107342231A (en) * 2016-11-25 2017-11-10 南京华东电子信息科技股份有限公司 A kind of grid method for repairing disconnected lines of thin film transistor (TFT)
US10002917B2 (en) 2016-03-17 2018-06-19 Boe Technology Group Co., Ltd. Circuit and method for repairing signal line disconnection and display panel
WO2020077742A1 (en) * 2018-10-15 2020-04-23 深圳市华星光电半导体显示技术有限公司 Repair method for broken lines of tft array substrate
CN111309173A (en) * 2019-12-20 2020-06-19 京东方科技集团股份有限公司 Touch electrode, touch display panel and touch display device
CN112635204A (en) * 2020-12-23 2021-04-09 重庆新原港科技发展有限公司 Application of electric conduction optimization protective agent in improving insulation performance of electrical equipment
CN112795907A (en) * 2020-12-24 2021-05-14 深圳市华星光电半导体显示技术有限公司 Broken line repairing device and debugging method thereof
WO2022227291A1 (en) * 2021-04-28 2022-11-03 Tcl华星光电技术有限公司 Display panel and manufacturing method therefor, and display apparatus
WO2023225893A1 (en) * 2022-05-25 2023-11-30 京东方科技集团股份有限公司 Array substrate and display device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103744201A (en) * 2013-12-31 2014-04-23 深圳市华星光电技术有限公司 Liquid crystal display panel repair method and repair system
WO2015100796A1 (en) * 2013-12-31 2015-07-09 深圳市华星光电技术有限公司 Liquid crystal display panel repairing method and repairing system
US9297074B2 (en) 2013-12-31 2016-03-29 Shenzhen China Star Optoelectronics Technology Co., Ltd Liquid crystal display panel repairing method and repairing system
US10002917B2 (en) 2016-03-17 2018-06-19 Boe Technology Group Co., Ltd. Circuit and method for repairing signal line disconnection and display panel
CN107342231A (en) * 2016-11-25 2017-11-10 南京华东电子信息科技股份有限公司 A kind of grid method for repairing disconnected lines of thin film transistor (TFT)
WO2020077742A1 (en) * 2018-10-15 2020-04-23 深圳市华星光电半导体显示技术有限公司 Repair method for broken lines of tft array substrate
CN111309173A (en) * 2019-12-20 2020-06-19 京东方科技集团股份有限公司 Touch electrode, touch display panel and touch display device
CN111309173B (en) * 2019-12-20 2024-04-09 京东方科技集团股份有限公司 Touch electrode, touch display panel and touch display device
CN112635204A (en) * 2020-12-23 2021-04-09 重庆新原港科技发展有限公司 Application of electric conduction optimization protective agent in improving insulation performance of electrical equipment
CN112795907A (en) * 2020-12-24 2021-05-14 深圳市华星光电半导体显示技术有限公司 Broken line repairing device and debugging method thereof
WO2022227291A1 (en) * 2021-04-28 2022-11-03 Tcl华星光电技术有限公司 Display panel and manufacturing method therefor, and display apparatus
WO2023225893A1 (en) * 2022-05-25 2023-11-30 京东方科技集团股份有限公司 Array substrate and display device

Similar Documents

Publication Publication Date Title
CN101441373A (en) Method for restoring wire break of liquid crystal display device
CN101441372B (en) Electrostatic discharge protection device of LCD device and manufacturing method thereof
CN100374949C (en) Liquid crystal display device and manufacturing method thereof
CN101833200B (en) Horizontal electric field type liquid crystal display device and manufacturing method thereof
CN102338943B (en) Array substrate, liquid crystal display panel, liquid crystal display and manufacturing and detecting method
CN101995700B (en) Liquid crystal panel and manufacturing method thereof
CN102621749B (en) Liquid crystal display
CN109471279B (en) Array substrate and liquid crystal display panel
US7995156B2 (en) Method of manufacturing a display substrate using a laser to remove test lines from the substrate without cutting the substrate
KR20070002147A (en) Test process for liquid crystal display device
KR102078807B1 (en) Liquid crystal display
CN101424840A (en) Method for repairing LCD device
US7830484B2 (en) TFT array substrate for inspection and method for inspection using the same
CN109839767A (en) A kind of array substrate, display panel and display device
CN103969853A (en) Array substrate, detecting method and detecting device of array substrate
KR101473842B1 (en) Method for repairing defect cell of liquid crystal display panel
CN100454556C (en) Repairing structure and active component array substrate
KR101107708B1 (en) Substrate for Thin Film Transistor Array in Liquid Crystal Display Device
CN100383633C (en) Liquid-crystal display device and method of evaluating the same
JPH075481A (en) Liquid crystal display panel and its inspecting method
CN101441335A (en) Method for restoring wire break of liquid crystal display device
CN103576365B (en) Liquid crystal display device
CN101236953B (en) Thin film transistor array base plate and its making method
CN108519705A (en) Array substrate and display panel
US7497755B2 (en) Apparatus for testing electroluminescent display

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20090527