CN101439911A - Method for processing pyrophosphate copper plating wastewater - Google Patents
Method for processing pyrophosphate copper plating wastewater Download PDFInfo
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- CN101439911A CN101439911A CNA2008102498529A CN200810249852A CN101439911A CN 101439911 A CN101439911 A CN 101439911A CN A2008102498529 A CNA2008102498529 A CN A2008102498529A CN 200810249852 A CN200810249852 A CN 200810249852A CN 101439911 A CN101439911 A CN 101439911A
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Abstract
The invention provides a method for treating pyrophosphate copper-plated wastewater. The method comprises: a, sending the pyrophosphate copper-plated wastewater into a double-layer filter consisting of granular activated carbon and quartz sand for filtration, wherein the granular activated carbon is between 5 and 20 meshes, the relative density of the quartz sand is between 2.6 and 2.65, and the particle diameter of the quartz sand is between 0.5 and 1.2 millimeters; b, sending the filtered pyrophosphate copper-plated wastewater in the step a into a primary reverse-osmosis device provided with a reverse osmosis membrane for reverse osmosis, and obtaining condensed water and purified water; c, sending the condensed water in the step b into a nanofiltration device provided with a nanofiltration membrane, and sending the condensed water into a copper-plating production circulation system when the condensed water is concentrated into water with Cu<2+> content between 6 and 60 grams per liter or the concentration of pyrophosphoric acid group is between 55 and 420 grams per liter; and d, sending the purified water in the step b into a secondary reverse-osmosis device provided with a reverse osmosis membrane for secondary reverse osmosis, and sending water which is subjected to secondary reverse osmosis into a copper-plating production water wash system. The method is used for treating alkali wastewater during production of electrolytic copper.
Description
Technical field:
The present invention relates to electroplating sewerage and handle, relate to a kind of treatment process of pyrophosphate copper plating wastewater more specifically.
Background technology:
The main method that the processing of electroplating industry waste water is at present extensively adopted has: chemical precipitation method, and electrodip process, methods such as ion exchange resin, wherein chemical precipitation method is divided into neutralization precipitation method and sulphide precipitation again.Electro-deposition method is: earlier waste water is collected in the storage tank by pipeline, through after the simple concentration, by the method for galvanic deposit, extracts the copper in the solution, and remaining waste water is discharged naturally, contain a large amount of phosphorus in this solution.There are the following problems for these traditional technologies: (1) needs heavy dose of chemical substance; (2) eliminated the possibility of the heavy metal ion that directly is recycled; (3) needing the mud of processing to contain a large amount of organism and heavy metal, form new solid pollutant, also is quite difficult during processing, and the waste liquid of discharging causes severe contamination to underground water source and surrounding environment, is detrimental to health.
It is simple, solution-stabilized that pyrophosphate copper plating liquid has a composition, and current efficiency is higher, dispersive ability and covering power are good, and the coating crystallization is careful, and can obtain thicker coating, adoptable processing range broad, nontoxic, do not need exhausting, can obtain the characteristics of the coating of half light behind the adding brightening agent, its shortcoming is: investment is big first, the bath concentration height, cost height, wastewater treatment difficulty.
It is careful that alkaline electro copper facing layer has coating, be difficult for oxidized characteristics in the production process, in electrolysis special equipment, with cupric pyrophosphate electrolytic solution under galvanic effect, galvanic deposit forms the copper layer, carries out three grades of water washing process then, with the surperficial incidental electrolytic solution of thorough removing, so in whole process of production, produced a large amount of alkaline waste waters, contained a large amount of Cu in the alkaline copper plating waste water
2+And pyrophosphate ion, Cu
2+Concentration at 0.02 ~ 4g/L, the pyrophosphate concentration range is 0.08 ~ 46g/L.The method of handling is pyrophosphate copper plating wastewater to be sent into carry out reverse osmosis in the reverse osmosis equipment that is provided with reverse osmosis membrane, gets dense water and pure water; On the one hand dense water is sent in the nanofiltration equipment that is provided with nanofiltration membrane then and is concentrated, treat with concentrated solution be concentrated to plating tank in bath element when just the same, could send copper facing production cycle system again; On the other hand, the pure water that carries out reverse osmosis just can send copper facing to produce water wash system after need soften.In addition, pyrophosphate copper plating wastewater directly send and carries out reverse osmosis in the reverse osmosis equipment, fine particle in the water, suspended substance, glue this etc. impurity easily follow-up reverse osmosis membrane is stopped up, need often clear up and influence the efficient of reverse osmosis.
Strongly basic anion exchange resin is handled pyrophosphate copper plating wastewater, and resin is converted into sulfate type, utilizes the strong affinity ability of vitriol and cupric pyrophosphate, realizes the recovery of cupric pyrophosphate.But this technology is expensive big, and production efficiency is low.
Summary of the invention:
Purpose of the present invention is intended to overcome the deficiencies in the prior art, and a kind of difficult obstruction reverse osmosis membrane is provided, and technology is simple, cost is low, efficient is high, the Cu that contains in the dense water after reverse osmosis
2+Can send copper facing production cycle system with pyrophosphate ion when big concentration range, the pure water after reverse osmosis can directly send copper facing to produce the treatment process of the pyrophosphate copper plating wastewater of water wash system.
Purpose of the present invention can realize by following technical measures:
The treatment process of this pyrophosphate copper plating wastewater is carried out as follows:
A. pyrophosphate copper plating wastewater is sent the Two-layer filter of forming by granulated active carbon and quartz sand to filter; Described granulated active carbon is the 5-20 order, and described quartz sand relative density is 2.6-2.65, particle diameter is 0.5-1.2mm;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under 0.5-2.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to be concentrated into Cu under 0.5-2.5MPa condition at normal temperature and intake pressure
2+Content is that 6-60g/L or pyrophosphate concentration are 55-420g/L, and the high density concentrated solution with concentrating and separating directly adds in the pyrophosphate copper plating production cycle system then;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under 0.5-2.5MPa condition at normal temperature and pressure, and the water after reverse osmosis once more send copper facing to produce water wash system.
Purpose of the present invention also can realize by following technical measures:
The water conductivity of d step after reverse osmosis once more is 1-200 μ s/cm.
Prior art is that the alkaline waste water in the production of alkaline pyrophosphate salt electrolytic copper is directly advanced the film treatment facility; the present invention send more medium filter earlier with alkaline waste water; fine particle in the waste water; suspended substance; this grade of glue impurity is by these a certain size; the particulate matter of shape is retained down; by backwash the impurity flushed zone on the particle is gone out strainer to restore one's working ability again; more medium filter can be removed the impurity and the suspended substance of big particle diameter; in case follow-up reverse osmosis membrane is by fine particle; suspended substance; this grade of glue impurity stops up; increase the processing speed of film, more medium filter also plays the effect of protective membrane simultaneously.
The present invention separates plating bath and pure water by reverse osmosis membrane, plating bath further is concentrated into the Cu that contains with nanofiltration membrane again
2+Can send copper facing production cycle system with pyrophosphate ion when big concentration range; Pure water is further handled direct backwater by reverse osmosis membrane washes system, and need through after softening again backwater wash system.
The present invention has saved the traditional chemical precipitation and the method for ion exchange resin, adopt nanofiltration, reverse-osmosis treated pyrophosphate copper plating wastewater, moisture content more than 92% in the waste water is separated, the pure water that obtains is directly used in rinse water in the production, remaining spendable high density plating bath directly returns coating bath, waste water is normally used entirely, and whole technology has realized the zero release of waste water, no matter at production cost, or all produced significant effect in environmental protection.Simultaneously, technology of the present invention is simple, invests little, floor space is little, both can save the electroplating industry water resources, can make full use of heavy metal again, eliminate the production cost of pollution on the environment and reduction electroplating industry, realize the cleaner production of electroplating industry, have important social and economic benefit.
Embodiment:
Embodiment 1:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 5 orders and quartz sand relative density are 2.65, particle diameter is that the Two-layer filter that 0.5mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 0.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to be concentrated into Cu under the 2.5MPa condition at normal temperature and intake pressure
2+Content send copper facing production cycle system during for 6g/L;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 0.5MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 200 μ s/cm, and then send copper facing to produce water wash system.
Embodiment 2:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 20 orders and quartz sand relative density are 2.6, particle diameter is that the Two-layer filter that 1.2mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 2.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to be concentrated into Cu under the 0.5MPa condition at normal temperature and intake pressure
2+Content send copper facing production cycle system during for 60g/L;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 2.5MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 1 μ s/cm, and then send copper facing to produce water wash system.
Embodiment 3:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 12 orders and quartz sand relative density are 2.62, particle diameter is that the Two-layer filter that 0.8mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 1.2MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to be concentrated into Cu under the 1.5MPa condition at normal temperature and intake pressure
2+Content send copper facing production cycle system during for 30g/L;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 1.5MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 100 μ s/cm, and then send copper facing to produce water wash system.
Embodiment 4:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 5 orders and quartz sand relative density are 2.65, particle diameter is that the Two-layer filter that 0.5mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 0.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to send copper facing production cycle system when being concentrated into pyrophosphate concentration for 420g/L under the 2.5MPa condition at normal temperature and intake pressure;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 0.5MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 200 μ s/cm, and then send copper facing to produce water wash system.
Embodiment 5:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 20 orders and quartz sand relative density are 2.6, particle diameter is that the Two-layer filter that 1.2mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 2.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to send copper facing production cycle system when being concentrated into pyrophosphate concentration for 55g/L under the 0.5MPa condition at normal temperature and intake pressure;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 2.5MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 1 μ s/cm, and then send copper facing to produce water wash system.
Embodiment 6:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 10 orders and quartz sand relative density are 2.62, particle diameter is that the Two-layer filter that 0.8mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 1.0MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to send copper facing production cycle system when being concentrated into pyrophosphate concentration for 180g/L under the 1.5MPa condition at normal temperature and intake pressure;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 1.0MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 70 μ s/cm, and then send copper facing to produce water wash system.
Embodiment 7:
A. the alkaline copper plating waste water that contains cupric ion and pyrophosphate ion in the production of alkaline pyrophosphate salt electrolytic copper being sent into by granulated active carbon is that 15 orders and quartz sand relative density are 2.63, particle diameter is that the Two-layer filter that 1.0mm forms is filtered;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under the 1.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to send copper facing production cycle system when being concentrated into pyrophosphate concentration for 300g/L under the 1.0MPa condition at normal temperature and intake pressure;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under the 1.5MPa condition at normal temperature and pressure, and the water conductivity after reverse osmosis once more is 140 μ s/cm, and then send copper facing to produce water wash system.
Claims (2)
1, a kind of treatment process of pyrophosphate copper plating wastewater is characterized in that this method carries out as follows:
A. pyrophosphate copper plating wastewater is sent the Two-layer filter of forming by granulated active carbon and quartz sand to filter; Described granulated active carbon is the 5-20 order, and described quartz sand relative density is 2.6-2.65, particle diameter is 0.5-1.2mm;
B. a step being sent in the first-stage reverse osmosis equipment that is provided with reverse osmosis membrane through filtering pyrophosphate copper plating wastewater, is to carry out reverse osmosis under 0.5-2.5MPa condition at normal temperature and intake pressure, gets dense water and pure water;
C. the dense water of b step being sent in the nanofiltration equipment that is provided with nanofiltration membrane, is to be concentrated into Cu under 0.5-2.5MPa condition at normal temperature and intake pressure
2+Content is that 6-60g/L or pyrophosphate concentration are sent copper facing production cycle system during for 55-420g/L;
D. the pure water of b step being sent in the two-pass reverse osmosis equipment that is provided with reverse osmosis membrane, is to carry out reverse osmosis once more under 0.5-2.5MPa condition at normal temperature and pressure, and the water after reverse osmosis once more send copper facing to produce water wash system.
2, the treatment process of a kind of pyrophosphate copper plating wastewater according to claim 1 is characterized in that the water conductivity of d step after reverse osmosis once more is 1-200 μ s/cm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2008102498529A CN101439911B (en) | 2008-12-30 | 2008-12-30 | Method for processing pyrophosphate copper plating wastewater |
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| CN2008102498529A CN101439911B (en) | 2008-12-30 | 2008-12-30 | Method for processing pyrophosphate copper plating wastewater |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103910451A (en) * | 2014-03-20 | 2014-07-09 | 苏州腾纳环保科技有限公司 | High-efficiency water purification equipment |
| CN104108812A (en) * | 2014-07-03 | 2014-10-22 | 苏州联科纳米净化科技有限公司 | Treating method for copper pyrophosphate electroplating wastewater |
| CN105967416A (en) * | 2016-05-18 | 2016-09-28 | 上海交通大学 | Plating piece rinsing wastewater on-line recycling method |
-
2008
- 2008-12-30 CN CN2008102498529A patent/CN101439911B/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103910451A (en) * | 2014-03-20 | 2014-07-09 | 苏州腾纳环保科技有限公司 | High-efficiency water purification equipment |
| CN104108812A (en) * | 2014-07-03 | 2014-10-22 | 苏州联科纳米净化科技有限公司 | Treating method for copper pyrophosphate electroplating wastewater |
| CN104108812B (en) * | 2014-07-03 | 2017-01-11 | 苏州联科纳米净化科技有限公司 | Treating method for copper pyrophosphate electroplating wastewater |
| CN105967416A (en) * | 2016-05-18 | 2016-09-28 | 上海交通大学 | Plating piece rinsing wastewater on-line recycling method |
| WO2017197803A1 (en) * | 2016-05-18 | 2017-11-23 | 上海交通大学 | Method for in-line resource reclamation of plating rinsing wastewater |
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| CN101439911B (en) | 2010-11-03 |
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Address after: Yuxing Road Flyover District of Ji'nan city in Shandong province 250119 New Material Industrial Park No. 517 Patentee after: Tiannuo Photoelectric Material Co., Ltd. Address before: Tianchen Avenue high tech Zone of Ji'nan City, Shandong province 250101 No. 1251 Building No. 3 room 103 Patentee before: Shandong Tiannuo Photovoltaic Material Co., Ltd. |