CN101436455A - Low-voltage piezoresistor based on nickle zinc oxidation film - Google Patents
Low-voltage piezoresistor based on nickle zinc oxidation film Download PDFInfo
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- CN101436455A CN101436455A CNA2008101634437A CN200810163443A CN101436455A CN 101436455 A CN101436455 A CN 101436455A CN A2008101634437 A CNA2008101634437 A CN A2008101634437A CN 200810163443 A CN200810163443 A CN 200810163443A CN 101436455 A CN101436455 A CN 101436455A
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- zinc oxide
- oxide film
- nickel
- piezoresistor
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Abstract
The invention discloses a low voltage piezoresistor based on a nickel-zinc oxide film, which mainly comprises an insulating substrate, a metal film lower electrode, the nickel-zinc oxide film, and a metal film upper electrode, wherein the molecular formula of the nickel-zinc oxide film is NixZn1-xO, and the numeric area of x is between 0.01 and 0.33. With the invention, the low voltage piezoresistor the threshold voltage of which is between 3.3 and 4.45 volts can be manufactured. When the range of the x in the nickel-zinc oxide NixZn1-xO is between 0.01 and 0.33, the threshold voltage and the nickel content of a corresponding piezoresistor have a simple linear relation, thus in the process of manufacturing the low voltage piezoresistor, the threshold voltage of the piezoresistor can be controlled by controlling the nickel content x, so as to overcome the shortage that the threshold voltage cannot be set at will in the process of manufacturing the low voltage piezoresistor.
Description
Technical field
The present invention relates to a kind of electronic component, relate in particular to a kind of low voltage varistor that is used for Low-voltage Electronic circuit and electric prospection based on metal-oxide film.
Background technology
Zinc oxide varistor is a kind of poly semiconductor ceramic component based on zinc oxide, has that discharge capacity is big, response speed is fast, no afterflow, advantage such as nonpolarity.But at present the threshold voltage of commercial piezo-resistance is generally all more than 5V, and threshold voltage can not regulate continuously, and for example the 0402 matrix formula varistor of AVX Corp. has only specifications such as 5.6V, 9V, 14V and 18V.Along with the continuous development of semiconductor integrated circuit technique, the size of the chip of integrated circuit is more and more littler at present, and operating voltage is also more and more lower, so the utmost point needs the low and continuously adjustable low-voltage piezoresistor of threshold voltage.
As everyone knows, relating to parameters such as the pressure sensitive quality of varistor and the crystal particle crystal boundary potential barrier in the varistor layer, energy gap.In general, the number of dies of varistor layer thickness direction is many more, and then the crystal boundary of thickness direction is also many more, so threshold voltage is just high more.By technology controlling and process, make varistor layer in thickness direction, have only a crystal grain in principle, so just can obtain and a lowest threshold voltage V that crystal grain is corresponding
MinBy a plurality of such varistor stacks, can make threshold voltage and V
MinBecome the varistor of multiple.The applicant has made this low-voltage piezoresistor, and has applied for a patent, but can only make threshold voltage in this way is lowest threshold voltage V
MinThe varistor of integral multiple.
Summary of the invention
The objective of the invention is at the deficiencies in the prior art, a kind of low-voltage piezoresistor based on the nickel zinc oxide film is provided.
The objective of the invention is to be achieved through the following technical solutions: a kind of low-voltage piezoresistor based on the nickel zinc oxide film, it mainly is made up of dielectric substrate, metallic film bottom electrode, nickel zinc oxide film and metallic film top electrode.Wherein, the molecular formula of nickel zinc oxide film film is Ni
xZn
1-xO, the span of x is 0.01-0.33.The thickness range of described nickel zinc oxide film is 10-1000nm; Described dielectric substrate can be glass or pottery; The metal material that described metallic film bottom electrode and metallic film top electrode can conduct electricity very well for aluminium, copper, gold, silver, platinum etc.
The invention has the beneficial effects as follows: utilize the present invention can make threshold voltage and be in low-voltage piezoresistor between the 3.3-4.45 volt.As nickel zinc oxide Ni
xZn
1-xThe scope of x among the O is between the 0.01-0.33 time, the threshold voltage and the nickel content of corresponding varistor have simple linear relationship, therefore when making low-voltage piezoresistor, can solve the deficiency that threshold voltage can not be set arbitrarily when making low-voltage piezoresistor thus by the threshold voltage of control nickel content x may command varistor.
Description of drawings
Fig. 1 is the structural representation that the present invention is based on the low-voltage piezoresistor of nickel zinc oxide film;
Fig. 2 the present invention is based on the threshold voltage of low-voltage piezoresistor of nickel zinc oxide film with the situation of change schematic diagram of content of magnesium;
Fig. 3 is the actual I-V performance plot that the present invention is based on the low-voltage piezoresistor of nickel zinc oxide film.
Embodiment
Principle of the present invention is: form nickel zinc oxide Ni by mix nickel in zinc oxide
xZn
1-xO obtains the adjustable low-voltage piezoresistor of threshold voltage.Can increase energy gap owing to mix nickel in the zinc oxide, therefore might obtain higher threshold voltage by increasing energy gap.
As shown in Figure 1, the low-voltage piezoresistor based on the nickel zinc oxide film of the present invention mainly is made up of dielectric substrate 4, metallic film bottom electrode 3, nickel zinc oxide film 2 and metallic film top electrode 1.Wherein, the molecular formula of nickel zinc oxide film film can be written as Ni
xZn
1-xO, wherein the span of x is 0.01-0.33, thickness range is 10-1000nm.Dielectric substrate 1 can be glass or pottery.The metal material that metallic film bottom electrode 3 and metallic film top electrode 1 can conduct electricity very well for aluminium, copper, gold, silver, platinum etc.
Fig. 2 is the graph of a relation of actual threshold voltage that records and nickel content x.To the measured data match, get nickel content x and threshold voltage V
ThBetween have a linear relationship:
V
Th＝3.30+4.11x。
Describe the present invention in detail according to specific embodiment below, it is more obvious that purpose of the present invention and effect will become.
Embodiment 1
Utilize earlier thermal evaporation deposition one deck platinum film as bottom electrode on glass substrate, with reactive magnetron sputtering method deposition one deck nickel/zinc is than the nickel zinc oxide film that is 0.01, the reusable heat evaporation deposits one deck platinum film as top electrode again.Recording its threshold voltage by the I-V curve is 3.30 volts, sees Fig. 3 curve (a).
Embodiment 2
On glass substrate, utilize earlier magnetron sputtering method deposition one deck gold thin film as bottom electrode, deposit one deck nickel/zinc than the nickel zinc oxide film that is 0.05 with sol-gal process again, deposit one deck gold thin film as top electrode with magnetron sputtering method again.Recording its threshold voltage by the I-V curve is 3.40 volts, sees Fig. 3 curve (b).
On glass substrate, utilize earlier magnetron sputtering method deposition layer of copper film as bottom electrode, deposit one deck nickel/zinc than the nickel zinc oxide film that is 0.10 with pulsed laser deposition again, deposit the layer of copper film as top electrode with magnetron sputtering method again.Recording its threshold voltage by the I-V curve is 3.61 volts, sees Fig. 3 curve (c).
Embodiment 4
On glass substrate, utilize earlier magnetron sputtering method deposition layer of aluminum film as bottom electrode, deposit one deck nickel/zinc than the nickel zinc oxide film that is 0.23 with sol-gal process again, deposit the layer of aluminum film as top electrode with magnetron sputtering method again.Recording its threshold voltage by the I-V curve is 4.07 volts, sees Fig. 3 curve (d).
Embodiment 5
On glass substrate, utilize earlier magnetron sputtering method deposition one deck silver film as bottom electrode, deposit one deck nickel/zinc than the nickel zinc oxide film that is 0.49 with sol-gal process again, deposit one deck silver film as top electrode with magnetron sputtering method again.Recording its threshold voltage by the I-V curve is 4.60 volts, sees Fig. 3 curve (e).
The foregoing description is used for the present invention that explains, rather than limits the invention, and in the protection range of spirit of the present invention and claim, any modification and change to the present invention makes all fall into protection scope of the present invention.
Claims (4)
1. the low-voltage piezoresistor based on the nickel zinc oxide film is characterized in that, it mainly is made up of dielectric substrate, metallic film bottom electrode, nickel zinc oxide film and metallic film top electrode.Wherein, the molecular formula of nickel zinc oxide film film is Ni
xZn
1-xO, the span of x is 0.01-0.33.
2. according to the described low-voltage piezoresistor of claim 1, it is characterized in that the thickness range of described nickel zinc oxide film is 10-1000nm based on the nickel zinc oxide film.
3. according to the described low-voltage piezoresistor of claim 1, it is characterized in that described dielectric substrate can be glass or pottery based on the nickel zinc oxide film.
4. according to the described low-voltage piezoresistor of claim 1, it is characterized in that the metal material that described metallic film bottom electrode and metallic film top electrode can conduct electricity very well for aluminium, copper, gold, silver, platinum etc. based on the nickel zinc oxide film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008101634437A CN101436455A (en) | 2008-12-22 | 2008-12-22 | Low-voltage piezoresistor based on nickle zinc oxidation film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008101634437A CN101436455A (en) | 2008-12-22 | 2008-12-22 | Low-voltage piezoresistor based on nickle zinc oxidation film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101436455A true CN101436455A (en) | 2009-05-20 |
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ID=40710844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2008101634437A Pending CN101436455A (en) | 2008-12-22 | 2008-12-22 | Low-voltage piezoresistor based on nickle zinc oxidation film |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018209562A1 (en) * | 2017-05-16 | 2018-11-22 | Dongguan Littelfuse Electronics Co., Ltd. | Base metal electrodes for metal oxide varistor |
-
2008
- 2008-12-22 CN CNA2008101634437A patent/CN101436455A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018209562A1 (en) * | 2017-05-16 | 2018-11-22 | Dongguan Littelfuse Electronics Co., Ltd. | Base metal electrodes for metal oxide varistor |
| US10839993B2 (en) | 2017-05-16 | 2020-11-17 | Dongguan Littelfuse Electronics Company Limited | Base metal electrodes for metal oxide varistor |
| US11177057B2 (en) | 2017-05-16 | 2021-11-16 | Dongguan Littelfuse Electronics, Co., Ltd | Base metal electrodes for metal oxide varistor |
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| PB01 | Publication | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
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Open date: 20090520 |