CN101436069B - On-line checking method of quality and flow controller - Google Patents
On-line checking method of quality and flow controller Download PDFInfo
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- CN101436069B CN101436069B CN2008102274477A CN200810227447A CN101436069B CN 101436069 B CN101436069 B CN 101436069B CN 2008102274477 A CN2008102274477 A CN 2008102274477A CN 200810227447 A CN200810227447 A CN 200810227447A CN 101436069 B CN101436069 B CN 101436069B
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Abstract
The invention discloses an online check method for a mass flow controller, wherein the opening of a pressure control valve or the atmospheric pressure in a reaction chamber corresponds to the flow rate of gas one by one during the checking process, so that the gas with predetermined flow rate can be inputted and the opening of the pressure control valve or the atmospheric pressure in the reaction chamber is measured after the pressure is dynamically stabilized; the gas with the predetermined flow rate is inputted through the mass flow controller to be checked and the opening of the pressure control valve or the atmospheric pressure in the reaction chamber is measured after the pressure is dynamically stabilized again; and the conclusion that whether the mass flow controller to be checked is subjected to zero drift or not can be drawn by comparing the opening or the atmospheric in the two times. The time consumed by the check method is only the time for establishing dynamic pressure equilibrium in the reaction chamber, so that the check method can obviously shorten the breakdown detection time and quickly obtain the detection result, and is favorable for improving the service efficiency of plasma processing equipment.
Description
Technical field
The present invention relates to microelectronics technology, particularly relate to the on-line testing method of the mass flow controller that is used for apparatus for processing plasma.
Background technology
Plasma processing apparatus is the process equipment of being used widely in field of semiconductor manufacture.
Please refer to Fig. 1, Fig. 1 is a kind of structural representation of typical plasma processing apparatus.
Plasma processing apparatus 1 generally includes housing 11, has reaction chamber 12 in the housing 11.The top of reaction chamber 12 and bottom are provided with top crown 13 and bottom crown 14 respectively accordingly; Pending workpiece can be supported in the top of bottom crown 14.Above-mentioned workpiece should comprise wafer and glass substrate, and has other workpieces of identical process principle with both.Hereinafter described the implication of workpiece is identical therewith.
During plasma processing apparatus 1 work, obtain device by vacuum pump group 19 or other vacuum and in reaction chamber 12, make and keep state near vacuum; Pressure control valve 17 and vacuum isolating valve 18 are set between vacuum pump group 19 and the reaction chamber 12.Under state near vacuum, in reaction chamber 12, import gas by gas input device, and between top crown 13 and bottom crown 14 the suitable radio-frequency voltage of input, thereby activate described gas, and then produce and keep plasma environment on the surface of the workpiece that is positioned over bottom crown 14 tops.Owing to have strong etching and a deposit ability, described plasma can with physical-chemical reactions such as described workpiece generation etching or deposit, to obtain needed etching figure or illuvium.The accessory substance of above-mentioned physical-chemical reaction obtains device by described vacuum and extracts out from reaction chamber 12.
In above-mentioned course of reaction, need accurately to determine the flow of gas, all gases is accurately controlled by mass flow controller usually, for example, apparatus for processing plasma 1 among Fig. 1 comprises first mass flow controller 151 and second mass flow controller 152, and both are connected in series first pneumatic valve 161 and second pneumatic valve 162 respectively; Can in reaction chamber, import the accurate gas of proportioning like this.
Yet, after using a period of time, mass flow controller is owing to zero point drift or other deviations may appear in multiple reason, and this can cause the technological process instability, and then influence substrate yield or conversion efficiency, so the verification of mass flow controller is most important.In order not influence normal production, usually, the verification of mass flow controller is mostly online to be carried out.
The method of calibration that has some mass flow controllers in the prior art, for example, publication number provides a kind of method of calibration for the application for a patent for invention prospectus of CN 1851596A, this method at first feeds gas, treat to close the pendulum valve behind the stability of flow of mass flow controller, measure variable quantity and other parameters of air pressure in the reaction chamber then, thereby calculate the actual flow of the gas of importing, again with this actual flow with set throughput ratio, determine finally whether mass flow controller deviations such as zero drift take place.
In order to obtain comparatively accurate measurement result, above-mentioned method of calibration needs a large amount of gas of input in reaction chamber so that air pressure significantly raises.
Along with the volume of reaction chamber in recent years continues to increase, spent time of above-mentioned method of calibration is more and more longer, and therefore the service efficiency of apparatus for processing plasma will constantly reduce.Under the less situation of mass flow controller flow, the problems referred to above are particularly outstanding.
Therefore, how reducing the spent time of mass flow controller checking procedure, is the present technical issues that need to address of those skilled in the art.
Summary of the invention
The on-line testing method that the purpose of this invention is to provide a kind of mass flow controller, the time less that its checking procedure is spent.
For solving the problems of the technologies described above, the invention provides a kind of on-line testing method of mass flow controller, be used to judge whether the mass flow controller of apparatus for processing plasma zero drift takes place, and may further comprise the steps:
11) reaction chamber is vacuumized, system conductance in the fixedly position of the pressure control valve of apparatus for processing plasma, and maintenance is constant;
12) in described reaction chamber, feed the gas of predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber, with this pressure as the datum pressure under this flow;
13) by the gas of mass flow controller to be verified input predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber, with this pressure as the actual pressure under this flow; Described actual pressure with record under identical temperature with the datum pressure under the flow;
14) calculate described actual pressure with the difference of the datum pressure under the flow ratio with respect to described datum pressure;
141) judge whether to obtain the ratio of predetermined number; If, turn to step 15), if not, change the position of the pressure control valve of apparatus for processing plasma, and turn to step 12);
The mean value of resulting each ratio is greater than or equal at 5% o'clock, described actual pressure with reach predetermined extent described in the step 15) with the difference of the datum pressure under the flow;
15) judge described actual pressure and whether reach predetermined extent with the difference of the datum pressure under the flow; If, draw mass flow controller to be verified and need calibrate conclusion, if not, drawing mass flow controller to be verified does not need the conclusion of calibrating.
The on-line testing method of the mass flow controller that the invention described above provided, system's conductance is constant in its checking procedure, and the pressure in the reaction chamber is corresponding one by one with gas flow; Therefore can at first in described reaction chamber, feed the gas of predetermined amount of flow, treat that pressure is set up the gaseous tension that can measure after the mobile equilibrium in the reaction chamber and with it as the datum pressure under the above-mentioned flow; Then by the gas of mass flow controller to be verified input predetermined amount of flow, treat that pressure sets up the actual pressure that can measure after the mobile equilibrium in the reaction chamber once more.Because conductance is constant, under temperature-resistant situation, if zero drift or other deviations do not take place mass flow controller to be verified, above-mentioned predetermined pressure should equal above-mentioned actual pressure substantially; Like this, by relatively said reference pressure and above-mentioned actual pressure can draw the conclusion whether mass flow controller to be verified deviations such as zero drift take place.Obviously, the spent time of method of calibration provided by the present invention mainly is the time of build-up pressure mobile equilibrium in reaction chamber; Significantly improving the spent time with the pressure that makes the entire reaction chamber compares; the time of build-up pressure mobile equilibrium obviously will lack a lot, and therefore, the present invention can significantly shorten and shuts down detection time; thereby obtain testing result fast, help the raising of apparatus for processing plasma service efficiency.
In another embodiment, the present invention can record the datum pressure under the multiple flow in advance, need be under a certain flow only need under equal conditions measure actual pressure during the verification mass flow controller, and compare and get final product with datum pressure under this flow that records in advance, can further shorten detection time like this, improve the service efficiency of apparatus for processing plasma.
The present invention also provides a kind of on-line testing method of mass flow controller, is used to judge whether the mass flow controller of apparatus for processing plasma zero drift takes place, and may further comprise the steps:
11) reaction chamber is vacuumized, and pass through the pressure of gas in the pressure control valve fixation reaction chamber of apparatus for processing plasma;
12) in described reaction chamber, feed the gas of predetermined amount of flow, treat to measure after the pressure stability aperture of described pressure control valve, with this aperture as the benchmark aperture under this flow;
13) by the gas of mass flow controller to be verified input predetermined amount of flow, treat to measure after the pressure stability aperture of described pressure control valve, with this aperture as the actual aperture under this flow; Described actual aperture with record under identical temperature with the benchmark aperture under the flow;
14) calculate described actual aperture with the difference of the benchmark aperture under the flow ratio with respect to described benchmark aperture;
15) judge described actual aperture and whether reach predetermined extent with the difference of the benchmark aperture under the flow; If, draw the conclusion that mass flow controller to be verified need be calibrated, if not, drawing mass flow controller to be verified does not need the conclusion of calibrating.
Description of drawings
The on-line testing method of the mass flow controller that the invention described above provides, in its checking procedure in the reaction chamber pressure of gas under the control of pressure-control valve, keep constant, the aperture of pressure-control valve (being the position of pressure-control valve) is one by one corresponding with gas flow. Therefore can pass into the gas of predetermined amount of flow in the described reaction chamber, treat to measure the aperture of described pressure-control valve behind the pressure dynamic stability and with it as the benchmark aperture under the above-mentioned flow; Then by the gas of mass flow controller to be verified input predetermined amount of flow, treat that pressure measures the actual aperture of described pressure-control valve again behind the dynamic stability; Like this, by relatively said reference aperture and above-mentioned actual aperture can draw the conclusion whether mass flow controller to be verified the deviations such as zero drift take place. Obviously, the spent main still time of build-up pressure dynamic equilibrium in reaction chamber of time of the method for calibration that the specific embodiment provides of the invention described above; Significantly improving the spent time with the pressure that makes whole reaction chamber compares; the time of build-up pressure dynamic equilibrium obviously can lack much equally; therefore; the method of calibration that the specific embodiment provides of the invention described above can significantly shorten equally shuts down detection time, realizes obtaining fast testing result, is conducive to the raising of apparatus for processing plasma service efficiency.
In another embodiment, can record in advance the benchmark aperture under the various flow rate, need to be under a certain flow only need under equal conditions measure actual aperture during the verification mass flow controller, and compare and get final product with benchmark aperture under this flow that records in advance, can further shorten detection time like this, improve the service efficiency of apparatus for processing plasma.
Fig. 1 is a kind of structural representation of typical plasma processing apparatus;
Fig. 2 is the process flow diagram of the on-line testing method of first kind of mass flow controller that embodiment provides of the present invention;
Fig. 3 is the process flow diagram of the on-line testing method of second kind of mass flow controller that embodiment provides of the present invention;
Fig. 4 is the process flow diagram of the on-line testing method of the present invention's mass flow controller that the third embodiment provides;
Fig. 5 is the process flow diagram of the on-line testing method of the 4th kind of mass flow controller that embodiment provides of the present invention;
Fig. 6 is the process flow diagram of the on-line testing method of the 5th kind of mass flow controller that embodiment provides of the present invention;
Fig. 7 is the process flow diagram of the on-line testing method of the 6th kind of mass flow controller that embodiment provides of the present invention.
Embodiment
Core of the present invention provides a kind of on-line testing method of mass flow controller, the time less that its checking procedure is spent.
In order to make those skilled in the art person understand the present invention program better, the present invention is described in further detail below in conjunction with the drawings and specific embodiments.
Please refer to Fig. 2, Fig. 2 is the process flow diagram of the on-line testing method of first kind of mass flow controller that embodiment provides of the present invention.
In first kind of embodiment, the on-line testing method of mass flow controller provided by the present invention comprises the steps:
Step S11:
Obtain device by vacuum pump group 19 or other vacuum reaction chamber 12 is vacuumized, and keep the pump pumping speed constant; Simultaneously, the position of fixation pressure operation valve 17 (specifically can adopt butterfly valve, pendulum valve etc.) makes its aperture keep stable.The voltage rise rate of system can be less than 2mTorr/Min, to improve the accuracy of verification in the measuring process.In case of necessity, should take other measures, constant with the conductance that keeps system.
(CU conductance), is meant under isothermy so-called conductance, and gas is during by certain passage, the ratio of its flow and the average differential pressure of passage both sides.Therefore, when conductance and a side air pressure were constant, the flow of gas and the air pressure of opposite side were linear, so both will form one-to-one relationship.
Step S12:
In reaction chamber 12, feed the gas of predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber 12, with this pressure as the datum pressure under this flow.
Obviously, above-mentioned predetermined amount of flow is known, accurately.For example, can open first pneumatic valve 161 and in reaction chamber 12, import gas, can in reaction chamber 12, accurately import the gas of known mass flow like this by first mass flow controller 151 of operate as normal.
Pressure in the reaction chamber 12 can be stablized in the short period of time, promptly sets up the mobile equilibrium of air pressure.Because the conductance of system is constant, the flow of gas input reaction chamber 12 is corresponding one by one with the air pressure in the reaction chamber 12, therefore above-mentioned predetermined amount of flow will cause a certain specific pressure in reaction chamber 12, can be with this pressure as the datum pressure P under the above-mentioned predetermined amount of flow
S1
Step S13:
Gas by mass flow controller to be verified input predetermined amount of flow (this predetermined amount of flow is identical with predetermined amount of flow among the step S12), treat that pressure stability (setting up mobile equilibrium) back measures the gaseous tension in the reaction chamber 12, with this pressure as the actual pressure P under this flow
1Actual pressure P
1With with the datum pressure P under the flow
S1Under identical temperature, record.
Described mass flow controller to be verified specifically can be second mass flow controller 152; Open second pneumatic valve 162 and close first pneumatic valve 161, can in reaction chamber 12, import the gas of above-mentioned predetermined amount of flow by second mass flow controller 152.Obviously, the gas flow of second mass flow controller, 152 inputs may be inaccurate.
Can rebulid the mobile equilibrium of air pressure in the short period of time, promptly the air pressure in the reaction chamber 12 can be stablized in the short period of time again, measure the pressure of this moment, and with this pressure as the actual pressure P under the above-mentioned predetermined amount of flow
1
As previously mentioned, only the flow of gas input reaction chamber 12 could be corresponding one by one with air pressure in the reaction chamber 12 under temperature-resistant prerequisite, therefore needs assurance actual pressure P
1With datum pressure P
S1Under identical temperature, record.
Step S14:
Calculate actual pressure P
1With with the datum pressure P under the flow
S1Poor (being both absolute values) with respect to datum pressure P
S1Ratio PRB
1
Because the flow of gas input reaction chamber 12 is corresponding one by one with the air pressure in the reaction chamber 12, if second mass flow controller 152 therefore to be verified operate as normal still, the flow of importing gas for twice should be equal or differ less, then actual pressure P
1With with the datum pressure P under the flow
S1Also should equate or differ less; Can grasp whether operate as normal of second mass flow controller 152 to be verified by both deviations.
Step S15:
Judge actual pressure P
1With with the datum pressure P under the flow
S1Whether difference reaches predetermined extent; If draw the conclusion that deviations such as second mass flow controller, 152 generation zero drifts to be verified need be calibrated; If not, drawing second mass flow controller 152 to be verified deviations such as zero drift does not take place does not need the conclusion of calibrating.
Above-mentioned ratio PRB
1Can reflect actual pressure P
1With with the datum pressure P under the flow
S1Poor, therefore, with ratio PRB
1Being controlled at the scope that can tolerate gets final product.
For example, as ratio PRB
1Less than thinking actual pressure P at 5% o'clock
1With with the datum pressure P under the flow
S1Difference do not reach predetermined extent as yet, zero drift or other deviations do not appear in second mass flow controller 152 as yet, need not calibrate; And when ratio PRB1 is greater than or equal to 5%, can think actual pressure P
1With with the datum pressure P under the flow
S1Difference reached predetermined extent, zero drift or other deviations have taken place in second mass flow controller 152, need calibrate.Certainly, can set ratio PRB flexibly
1The reference mark, this reference mark is not limited to 5%; Can set ratio PRB according to actual needs
1The maximal value that can tolerate.
Constant by keeping system's conductance, the on-line testing method of mass flow controller provided by the present invention is set up relation one to one between gas flow and parameter that certain can be measured fast (air pressure of reflection chamber 12 during mobile equilibrium), thereby whether has unacceptable deviation between the actual flow by the detection of the above-mentioned parameter that can measure fast being judged gas and the setting flow.Because the spent time of on-line testing method of mass flow controller provided by the present invention mainly is the time of build-up pressure mobile equilibrium in reaction chamber 12; Significantly improving the spent time with the pressure that makes entire reaction chamber 12 compares; the time of build-up pressure mobile equilibrium obviously will lack a lot; therefore; the present invention can significantly shorten and shuts down detection time; thereby obtain testing result fast, help the raising of apparatus for processing plasma 1 service efficiency.
Please refer to Fig. 3, Fig. 3 is the process flow diagram of the on-line testing method of second kind of mass flow controller that embodiment provides of the present invention.
Can improve the on-line testing method of mass flow controller shown in Figure 2.
For example, in order to improve the accuracy of verification, can repeatedly change the position of pressure control valve 17, under a plurality of positions mass flow controller 152 be carried out verification, comprehensive then each time check results draws final conclusion.Particularly, the on-line testing method of second kind of mass flow controller that embodiment provides of the present invention comprises the steps:
Step S21: reaction chamber 12 is vacuumized, and system conductance in the fixedly position of the pressure control valve 17 of apparatus for processing plasma 1, and maintenance is constant.
Step S22: in reaction chamber 12, feed the gas of predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber, with this pressure as the datum pressure P under the above-mentioned flow
S1
Step S23: by the gas of mass flow controller to be verified input predetermined amount of flow (this predetermined amount of flow is identical with predetermined amount of flow among the step S22), treat to measure after the pressure stability gaseous tension in the reaction chamber, with this pressure as the actual pressure P under the described predetermined amount of flow
1Actual pressure P
1With with the datum pressure P under the flow
S1Under identical temperature, record.
Step S24: calculate actual pressure P
1With with the datum pressure P under the flow
S1Difference with respect to datum pressure P
S1Ratio PRB
1
Step S25: the ratio that judges whether to obtain predetermined number; If, turn to step S27, if not, turn to step S26.
Can set the predetermined number (being the number of pressure control valve 17 positions) of above-mentioned ratio according to actual conditions.
Step S26: reset the position of pressure control valve 17, turn to step S22 then.
Can obtain the datum pressure P under another pressure control valve 17 positions like this
S2(perhaps P
S3... P
SN), actual pressure P
2(perhaps P
3... P
N), and both differences and datum pressure P
S2Ratio PRB
2(perhaps PRB
3... PRB
N).Wherein, N is the natural number greater than 3.
Step S27: when actual pressure when reaching predetermined extent with the difference of the datum pressure flow under, draw the conclusion of second mass flow controller, 152 generation zero drifts to be verified; Otherwise, draw the conclusion that zero drift does not take place second mass flow controller 152 to be verified.
In this embodiment, work as PRB
1... PRB
NMean value less than thinking that actual pressure and difference with the datum pressure under the flow did not reach predetermined extent as yet at 5% o'clock, deviations such as zero drift do not take place in second mass flow controller 152 as yet; And PRB
1... PRB
NMean value be greater than or equal at 5% o'clock, can think actual pressure with reached predetermined extent with the difference of the datum pressure under the flow, deviations such as zero drift have taken place in second mass flow controller 152, need calibrate.Like this, the accuracy of check results is higher.
Please refer to Fig. 4, Fig. 4 is the process flow diagram of the on-line testing method of the present invention's mass flow controller that the third embodiment provides.
The on-line testing method of the present invention's mass flow controller that the third embodiment provides is the improvement of being done on the basis of first kind or second kind embodiment, below only be described in detail in improved plan on the basis of first kind of embodiment, this scheme specifically comprises the steps:
Step S31: reaction chamber 12 is vacuumized, and system conductance in the fixedly position of the pressure control valve 17 of apparatus for processing plasma, and maintenance is constant.
Step S32: in reaction chamber 12, feed the gas of predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber 12, with this pressure as the datum pressure P under this flow
S
Step S33: judgment standard pressure P
SWhether the scope of pairing flow satisfies pre-provisioning request, if, then turn to step S34, if not, then turn to step S35.
Whether satisfy pre-provisioning request and mainly consider the range ability of mass flow controller, usually can be in range ability the datum pressure P under each important flow
SAfter all recording, think that just pre-provisioning request is met.Certainly, this point can be grasped relatively neatly according to actual conditions.
Step S35: change the flow of gas, and turn to step S32.
When pre-provisioning request is not met (is datum pressure P
SNumber less, the flow of part outbalance does not have corresponding datum pressure P
S) time, change the flow of air-flow, and measure the datum pressure P under this flow
SAll have and a datum pressure P until each important flow
SCorresponding with it.
Above-mentioned steps S31, step S32, step S33, step S35 can finish in advance, thereby obtain the datum pressure P under each important flow in advance
SNeed be under a certain flow during verification second mass flow controller 152, begin to get final product from step S34.
Step S34: by second mass flow controller, 152 input predetermined amount of flow to be verified
(the datum pressure P under this flow
SIn step S32, obtain) gas, treat to measure after the pressure stability gaseous tension in the reaction chamber 12, with this pressure as the actual pressure P under this flow
XActual pressure P
XWith with the datum pressure P under the flow
SUnder identical temperature, record.
Step S36: calculate actual pressure P
XWith with the datum pressure P under the flow
SDifference with respect to datum pressure P
SRatio PRB
X
Step S37:
As actual pressure P
XWith with the datum pressure P under the flow
SDifference when reaching predetermined extent, draw the conclusion that zero drifts or other deviations take place second mass flow controller 152 to be verified; Otherwise, draw the conclusion that zero drift or other deviations do not take place second mass flow controller 152 to be verified.
Can pass through above-mentioned ratio PRB
XReflection actual pressure P
XWith with the datum pressure P under the flow
SPoor, concrete deterministic process can be with reference to first kind of embodiment, this paper repeats no more.
The third embodiment of the present invention measures a series of datum pressure P under each important flow in the range ability in advance
S, like this, need be under certain particular flow rate during verification, only need in reaction chamber 12, to import the gas of above-mentioned particular flow rate, and measure the actual pressure P of this moment by second mass flow controller 152 to be verified
X, then at a series of datum pressure P
SIn search datum pressure P corresponding to above-mentioned particular flow rate
S, with this datum pressure P
SWith actual pressure P
XCompare, thereby can draw the verification conclusion.Obviously, this method of calibration only need record a series of datum pressure P under each important flow in advance
S, after this under certain particular flow rate, only need record the actual pressure P under this flow during verification
XCan be by calculating the verification conclusion, checking procedure only expends the time that pressure is set up a mobile equilibrium, and this has obviously further improved verification efficient, and then has further shortened checking time, improved the service efficiency of apparatus for processing plasma.
Please refer to Fig. 5, Fig. 5 is the process flow diagram of the on-line testing method of the 4th kind of mass flow controller that embodiment provides of the present invention.
In the 4th kind of embodiment, the on-line testing method of mass flow controller provided by the present invention comprises the steps:
Step S41:
Obtain device by vacuum pump group 19 or other vacuum reaction chamber 12 is vacuumized, and keep the pump pumping speed constant; Simultaneously, be that reaction chamber 12 is set fixed pressure by pressure control valve 17.The voltage rise rate of system can be less than 2mTorr/Min, to improve the accuracy of verification in the measuring process.
Because the pressure of reaction chamber 12 must immobilize, therefore the aperture (position of pressure control valve 17) of pressure control valve 17 must be adjusted when importing the gas of through-current capacity not in reaction chamber 12, and is constant with the pressure of keeping in the reaction chamber 12.Also promptly, the flow of the aperture of pressure control valve 17 and gas can be set up relation one to one.
Step S42:
In reaction chamber 12, feed the gas of predetermined amount of flow, treat the aperture of gaging pressure operation valve 17 after the pressure stability, with this aperture as the benchmark aperture under the above-mentioned flow.
Obviously, above-mentioned predetermined amount of flow is known, accurately.For example, can open first pneumatic valve 161 and in reaction chamber 12, import gas, can in reaction chamber 12, accurately import the gas of known mass flow like this by first mass flow controller 151 of operate as normal.
Pressure in the reaction chamber 12 can be stablized in the short period of time, promptly sets up the mobile equilibrium of air pressure.Because the aperture of pressure control valve 17 and the flow of gas have relation one to one, therefore above-mentioned predetermined amount of flow will make a certain specific aperture of having of pressure control valve 17, can be with this aperture as the benchmark aperture T under the above-mentioned predetermined amount of flow
S1
Step S43:
Gas by mass flow controller to be verified input predetermined amount of flow (this predetermined amount of flow is identical with predetermined amount of flow among the step S42), treat the aperture of pressure stability (setting up mobile equilibrium) back gaging pressure operation valve 17, with this aperture as the actual aperture T under this flow
1Actual aperture T
1With with the benchmark aperture T under the flow
S1Under identical temperature, record.
Described mass flow controller to be verified specifically can be second mass flow controller 152; Open second pneumatic valve 162 and close first pneumatic valve 161, can in reaction chamber 12, import the gas of above-mentioned predetermined amount of flow by second mass flow controller 152.Obviously, the gas flow of second mass flow controller, 152 inputs may be inaccurate.
Can rebulid the mobile equilibrium of air pressure in the short period of time, promptly the air pressure in the reaction chamber 12 can be stablized in the short period of time again, measure the aperture of pressure control valve 17 this moment, and with this aperture as the actual aperture T under the above-mentioned predetermined amount of flow
1
Step S44:
Calculate actual aperture T
1With with the benchmark aperture T under the flow
S1Poor (being both absolute values) with respect to benchmark aperture T
S1Ratio PRB
1
Because the flow of gas input reaction chamber 12 is corresponding one by one with the aperture of pressure control valve 17, if second mass flow controller 152 therefore to be verified operate as normal still, the flow of importing gas for twice should be equal or differ less, then actual aperture T
1With with the benchmark aperture T under the flow
S1Also should equate or differ less; Can grasp whether operate as normal of second mass flow controller 152 to be verified by both deviations.
Step S45:
Judge actual aperture T
1With with the benchmark aperture T under the flow
S1Difference whether reach predetermined extent; If draw the conclusion that deviations such as second mass flow controller, 152 generation zero drifts to be verified need be calibrated; If not, drawing second mass flow controller 152 to be verified deviations such as zero drift does not take place does not need the conclusion of calibrating.
Above-mentioned ratio PRB
1Can reflect actual aperture T
1With with the benchmark aperture T under the flow
S1Poor, therefore, with ratio PRB
1Being controlled at the scope that can tolerate gets final product.
For example, as ratio PRB
1Less than thinking actual aperture T at 5% o'clock
1With with under the flow
Benchmark aperture T
S1Difference do not reach predetermined extent as yet, deviations such as zero drift do not take place in second mass flow controller 152 as yet; And as ratio PRB
1Be greater than or equal at 5% o'clock, can think actual aperture T
1With with the benchmark aperture T under the flow
S1Difference reached predetermined extent, deviations such as zero drift have taken place in second mass flow controller 152, need calibrate.
Certainly, can set ratio PRB flexibly
1The reference mark, this reference mark is not limited to 5%; Can set ratio PRB according to actual needs
1The maximal value that can tolerate.
The on-line testing method of mass flow controller provided by the present invention is set up relation one to one between gas flow and parameter (aperture of pressure control valve 17 during mobile equilibrium) that certain can be measured fast, thereby whether has unacceptable deviation between the actual flow by the detection of the above-mentioned parameter that can measure fast being judged gas and the setting flow.Because the spent time of on-line testing method of mass flow controller provided by the present invention mainly is the time of build-up pressure mobile equilibrium in reaction chamber 12; Significantly improving the spent time with the pressure that makes entire reaction chamber 12 compares; the time of build-up pressure mobile equilibrium obviously will lack a lot, and therefore, the present invention can significantly shorten and shuts down detection time; thereby obtain testing result fast, help the raising of apparatus for processing plasma service efficiency.
Please refer to Fig. 6, Fig. 6 is the process flow diagram of the on-line testing method of the 5th kind of mass flow controller that embodiment provides of the present invention.
Can improve the on-line testing method of mass flow controller shown in Figure 5.
For example, in order to improve the accuracy of verification, can be repeatedly reset air pressure in the reaction chamber 12 by pressure control valve 17, under the reaction chamber air pressure mass flow controller 152 is carried out verification in many, comprehensively each time check results draws final conclusion then.Particularly, the on-line testing method of the 5th kind of mass flow controller that embodiment provides of the present invention comprises the steps:
Step S51: reaction chamber 12 is vacuumized, by the air pressure in the pressure control valve 17 fixation reaction chambers 12.
Step S52: in reaction chamber 12, feed the gas of predetermined amount of flow, treat the aperture of gaging pressure operation valve 17 after the pressure stability, with this aperture as the benchmark aperture T under the above-mentioned flow
S1
Step S53: by the gas of mass flow controller to be verified input predetermined amount of flow (this predetermined amount of flow is identical with predetermined amount of flow among the step S52), treat the aperture of gaging pressure operation valve 17 after the pressure stability, with this aperture as the actual aperture T under the described predetermined amount of flow
1Actual aperture T
1With with the datum pressure P under the flow
S1Under identical temperature, record.
Step S54: calculate actual aperture T
1With with the benchmark aperture T under the flow
S1Difference with respect to benchmark aperture T
S1Ratio PRB
1
Step S55: the ratio that judges whether to obtain predetermined number; If, turn to step S57, if not, turn to step S56.
Can set the predetermined number (being the number of pressure in the reaction chamber 12) of above-mentioned ratio according to actual conditions.
Step S56: reset air pressure in the reaction chamber 12 by pressure control valve 17, turn to step S52 then.
Can obtain the benchmark aperture T under another air pressure like this
S2(perhaps T
S3... T
SN), actual aperture T
2(perhaps T
3... T
N), and both differences and benchmark aperture T
S2Ratio PRB
2(perhaps PRB
3... PRB
N).Wherein, N is the natural number greater than 3.
Step S57: when actual aperture when reaching predetermined extent with the difference of the benchmark aperture flow under, draw the conclusion of deviations such as second mass flow controller, 152 generation zero drifts to be verified; Otherwise, draw the conclusion that deviations such as zero drift do not take place second mass flow controller 152 to be verified.
In this embodiment, work as PRB
1... PRB
NMean value less than thinking that actual aperture and difference with the benchmark aperture under the flow did not reach predetermined extent as yet at 5% o'clock, deviations such as zero drift do not take place in second mass flow controller 152 as yet; And PRB
1... PRB
NMean value be greater than or equal at 5% o'clock, can think actual aperture with reached predetermined extent with the difference of the benchmark aperture under the flow, deviations such as zero drift have taken place in second mass flow controller 152, need calibrate.Like this, the accuracy of check results is higher.
Please refer to Fig. 7, Fig. 7 is the process flow diagram of the on-line testing method of the 6th kind of mass flow controller that embodiment provides of the present invention.
The on-line testing method of the 6th kind of mass flow controller that embodiment provides of the present invention is the improvement of being done on the basis of the 4th kind or the 5th kind embodiment, below only be described in detail in improved plan on the basis of the 4th kind of embodiment, this scheme specifically comprises the steps:
Step S61: reaction chamber 12 is vacuumized, by the air pressure in the pressure control valve 17 fixation reaction chambers 12.
Step S62: in reaction chamber 12, feed the gas of predetermined amount of flow, treat the aperture of gaging pressure operation valve 17 after the pressure stability, with this aperture as the benchmark aperture T under the above-mentioned flow
S
Step S63: judgment standard aperture T
SWhether the scope of pairing flow satisfies pre-provisioning request, if, then turn to step S64, if not, then turn to step S65.
Whether satisfy pre-provisioning request and mainly consider the range ability of mass flow controller, usually can the datum pressure under each important flow all records in range ability after, think that just pre-provisioning request is met.Certainly, this point can be grasped relatively neatly according to actual conditions.
Step S65: change the pressure of gas in the reaction chamber 12, and turn to step S62.
When pre-provisioning request is not met (is benchmark aperture T
SNumber less, the flow of part outbalance does not have corresponding benchmark aperture T
S) time, change the pressure of gas in the reaction chamber 12, and measure the benchmark aperture T under this flow
SAll have and a benchmark aperture T until each important flow
SCorresponding with it.
Above-mentioned steps S61, step S62, step S63, step S65 can finish in advance, thereby obtain the benchmark aperture T under each important flow in advance
SNeed be under a certain flow during verification second mass flow controller 152, begin to get final product from step S64.
Step S64: by second mass flow controller, 152 input predetermined amount of flow (the benchmark aperture T under this flow to be verified
SIn step S62, obtain) gas, treat the aperture of gaging pressure operation valve 17 after the pressure stability, with this aperture as the actual aperture T under the described predetermined amount of flow
XActual aperture T
XWith with the benchmark aperture T under the flow
SUnder identical temperature, record.
Step S66: calculate actual aperture T
XWith with the benchmark aperture T under the flow
SDifference with respect to benchmark aperture T
SRatio PRB
X
Step S67:
As actual aperture T
XWith with the benchmark aperture T under the flow
SDifference when reaching predetermined extent, draw the conclusion that deviations such as zero drifts take place second mass flow controller 152 to be verified; Otherwise, draw the conclusion that deviations such as zero drift do not take place second mass flow controller 152 to be verified.
Can pass through above-mentioned ratio PRB
XReflect actual aperture T
XWith with the benchmark aperture T under the flow
SPoor, concrete deterministic process can be with reference to the 4th kind of embodiment, this paper repeats no more.
The 6th kind of embodiment of the present invention measures a series of benchmark aperture T under each important flow in the range ability in advance
S, like this, need be under certain particular flow rate during verification, only need in reaction chamber 12, to import the gas of above-mentioned particular flow rate, and measure the actual aperture T of this moment by second mass flow controller 152 to be verified
X, then at a series of benchmark aperture T
SIn search benchmark aperture T corresponding to above-mentioned particular flow rate
S, with this benchmark aperture T
SWith actual aperture T
XCompare, thereby can draw the verification conclusion.Obviously, this method of calibration only need record a series of benchmark aperture T under each important flow in advance
S, after this under certain particular flow rate, only need record the actual aperture T under this flow during verification
XCan be by calculating the verification conclusion, checking procedure only expends the time that pressure is set up a mobile equilibrium, and this has obviously further improved verification efficient, and then has further shortened checking time, improved the service efficiency of apparatus for processing plasma.
In addition, it needs to be noted, the present invention first to the common inventive concept of the 6th kind of on-line testing method that embodiment provided is: set up relation one to one in gas flow and parameter that certain can be measured fast (during mobile equilibrium in the reaction chamber 12 when the pressure of gas or mobile equilibrium the aperture of pressure control valve 17), thereby the actual flow by the detection of the above-mentioned parameter that can measure fast being judged gas and set between the flow whether have unacceptable deviation, and then realize fast detecting.Therefore, obviously has unicity between claims of the present invention technical scheme required for protection.
More than the on-line testing method of mass flow controller provided by the present invention is described in detail.Used specific case herein principle of the present invention and embodiment are set forth, the explanation of above embodiment just is used for helping to understand method of the present invention and core concept thereof.Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention, can also carry out some improvement and modification to the present invention, these improvement and modification also fall in the protection domain of claim of the present invention.
Claims (8)
1. the on-line testing method of a mass flow controller is used to judge whether the mass flow controller of apparatus for processing plasma zero drift takes place, and may further comprise the steps:
11) reaction chamber of article on plasma body treatment facility vacuumizes, the position of fixation pressure operation valve, and keep system's conductance constant;
12) in described reaction chamber, feed the gas of predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber, with this pressure as the datum pressure under this flow;
13) by the gas of mass flow controller to be verified input predetermined amount of flow, treat to measure after the pressure stability gaseous tension in the reaction chamber, with this pressure as the actual pressure under this flow; Described actual pressure with record under identical temperature with the datum pressure under the flow;
14) calculate described actual pressure with the difference of the datum pressure under the flow ratio with respect to described datum pressure;
141) judge whether to obtain the ratio of predetermined number; If, turn to step 15), if not, change the position of the pressure control valve of apparatus for processing plasma, and turn to step 12);
The mean value of resulting each ratio is greater than or equal at 5% o'clock, described actual pressure with reach predetermined extent described in the step 15) with the difference of the datum pressure under the flow;
15) judge described actual pressure and whether reach predetermined extent with the difference of the datum pressure under the flow; If, draw the conclusion that mass flow controller to be verified need be calibrated, if not, drawing mass flow controller to be verified does not need the conclusion of calibrating.
2. the on-line testing method of mass flow controller as claimed in claim 1 is characterized in that, further may further comprise the steps between described step 12) and the step 13):
121) whether the scope of judging the pairing gas flow of each datum pressure satisfies pre-provisioning request; If, turn to step 13), if not, change the predetermined amount of flow of gas, and turn to step 12).
3. the on-line testing method of mass flow controller as claimed in claim 2 is characterized in that, the voltage rise rate of system is less than 2mTorr/Min in the measuring process.
4. the on-line testing method of a mass flow controller is used to judge whether the mass flow controller of apparatus for processing plasma zero drift takes place, and may further comprise the steps:
11) reaction chamber of article on plasma body treatment facility vacuumizes, and passes through the pressure of gas in the pressure control valve fixation reaction chamber;
12) in described reaction chamber, feed the gas of predetermined amount of flow, treat to measure after the pressure stability aperture of described pressure control valve, with this aperture as the benchmark aperture under this flow;
13) by the gas of mass flow controller to be verified input predetermined amount of flow, treat to measure after the pressure stability aperture of described pressure control valve, with this aperture as the actual aperture under this flow; Described actual aperture with record under identical temperature with the benchmark aperture under the flow;
14) calculate described actual aperture with the difference of the benchmark aperture under the flow ratio with respect to described benchmark aperture;
15) judge described actual aperture and whether reach predetermined extent with the difference of the benchmark aperture under the flow; If, draw mass flow controller to be verified and need calibrate conclusion, if not, drawing mass flow controller to be verified does not need the conclusion of calibrating.
5. the on-line testing method of mass flow controller as claimed in claim 4 is characterized in that, described ratio is greater than or equal at 5% o'clock, described actual aperture with reach predetermined extent described in the step 15) with the difference of the benchmark aperture under the flow.
6. the on-line testing method of mass flow controller as claimed in claim 5 is characterized in that, further may further comprise the steps between described step 14) and the step 15):
141) judge whether to obtain the ratio of predetermined number; If, turn to step 15), if not, change the pressure of gas in the described reaction chamber, and turn to step 12);
The mean value of resulting each ratio is greater than or equal at 5% o'clock, described actual aperture with reach predetermined extent described in the step 15) with the difference of the benchmark aperture under the flow.
7. as the on-line testing method of each described mass flow controller of claim 4 to 6, it is characterized in that, further may further comprise the steps between described step 12) and the step 13):
121) whether the scope of judging the pairing gas flow of each datum pressure satisfies pre-provisioning request; If, turn to step 13), if not, change the predetermined amount of flow of gas, and turn to step 12).
8. the on-line testing method of mass flow controller as claimed in claim 7 is characterized in that, the voltage rise rate of system is less than 2mTorr/Min in the measuring process.
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| CN101839963B (en) * | 2010-05-27 | 2012-07-11 | 江南大学 | Quick action emergency valve automatic checkout system |
| US9644796B2 (en) | 2011-09-29 | 2017-05-09 | Applied Materials, Inc. | Methods for in-situ calibration of a flow controller |
| US9772629B2 (en) | 2011-09-29 | 2017-09-26 | Applied Materials, Inc. | Methods for monitoring a flow controller coupled to a process chamber |
| US10222359B2 (en) * | 2013-06-28 | 2019-03-05 | Provtagaren Ab | Method for verifying correct function of sampling equipment |
| CN104678985B (en) * | 2013-12-03 | 2018-10-09 | 无锡华润华晶微电子有限公司 | A kind of device and method of verification mass flow controller |
| CN104750125B (en) * | 2013-12-31 | 2017-10-24 | 北京北方华创微电子装备有限公司 | The calibration method and device of a kind of mass flow controller |
| CN106814762A (en) * | 2016-12-28 | 2017-06-09 | 武汉新芯集成电路制造有限公司 | Boiler tube detection means and detection method under a kind of low-pressure state |
| CN108121370B (en) * | 2017-12-23 | 2020-06-02 | 东北大学 | Measurement and control method and measurement and control system for gas flow in vacuum environment |
| CN113061872B (en) * | 2020-01-02 | 2023-06-23 | 长鑫存储技术有限公司 | Flow calibration system and method and air supply system |
| CN111579172B (en) * | 2020-05-18 | 2022-04-26 | 中国科学院微电子研究所 | Reaction chamber leakage monitoring method and device and semiconductor equipment system |
| CN112695297B (en) * | 2020-11-24 | 2022-12-09 | 北京北方华创微电子装备有限公司 | Method for controlling chamber pressure in semiconductor process |
| CN112899663B (en) * | 2021-01-15 | 2022-12-02 | 长鑫存储技术有限公司 | Detection method and detection device of gas transmission equipment and gas transmission equipment |
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Address after: No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone, 100176 Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100016 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |