CN101403799A - Low-pass filter substrate for digital camera with 700 Mega or above image element, and preparation method thereof - Google Patents
Low-pass filter substrate for digital camera with 700 Mega or above image element, and preparation method thereof Download PDFInfo
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- CN101403799A CN101403799A CNA2008101222386A CN200810122238A CN101403799A CN 101403799 A CN101403799 A CN 101403799A CN A2008101222386 A CNA2008101222386 A CN A2008101222386A CN 200810122238 A CN200810122238 A CN 200810122238A CN 101403799 A CN101403799 A CN 101403799A
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Abstract
The invention discloses a low pass filter substrate used for digital cameras with high resolution of more than 7million and a preparation method thereof. The substrate is made from the following raw materials with the weight percentage: 40-50 parts of P2O5, 15-20 parts of Al2O3, 20-25 parts of Na2O, 1-3 parts of Li2O, 5-8 parts of BaO, 1-5 parts of MGO, 2-6 parts of ZnO, 1-5 parts of B2O3, 1-3 parts of CuO and 0-1 part of Ce2O3. The preparation method comprises the following steps: firstly, the raw materials of Al2O3, Na2O, Li2O, Bao, MgO, ZnO, B2O3, CuO and Ce2O3 with the above-mentioned weight percentage are put together into a batcher and well mixed, then, P2O5 is added into the batcher and well mixed; after that, pre-reaction is preformed by adding water that weighs 0.5-5 percents of the total weight of the raw materials as a catalyst to produce a reaction material; afterward, the reaction material is added into a silica pot and melted under high temperature, the melting temperature is 1,200-1,300 DGE C and the purifying time under high temperature is 5-6 hours; glass after being annealed is cut, frosted and polished to obtain a product with needed shape and thickness, thereby obtaining a low pass filter substrate used for digital cameras with high resolution of more than 7 million.
Description
Technical field
The present invention relates to a kind of optical glass, relate in particular to high pixel 7,000,000 above low-pass filter substrate for digital camera and preparation methods.
Background technology
Along with the unusual fast development of world's photoelectron industry, in digital camera (Digital Camera), Digital Video (Digital Video Camera), the senior camera system of CCTV, the imaging requirements of all kinds of safety monitoring systems etc. also is increased sharply.The imaging picture element of still frame has been brought up to present up to more than 1,000 ten thousand picture elements from originally tens thousand of.Entered ordinary people's life, the mobile phone of band photograph/camera function has also reached more than 3,000,000 picture elements.Along with improving constantly that the imaging picture element requires, original not for the problems such as image defects that people paid attention to, gradually become people can't accept, thereby become the technology focus that this field needs to be resolved hurrily.
Up to the present, thus generally come the beam split requirement is satisfied in the selection of light by plated film.But the repeated multiple times of incident light in rete penetrates and reflects in the light path of finishing imaging requirements, because the dizzy phenomenon of the picture that the part parasitic light causes can't solve.Some are present in extremely small nano level surface imperfection on the optics in the light path and are also carried out high power by the photoelectric conversion part CCD/CMOS of very-high performance etc. and amplify, influencing into image quality, is the maximum difficult point problem that needs to be resolved hurrily at present in the present high picture element imaging system.
Coloured optical glass is widely used in various fields such as photographic equipment, scientific research, metallurgy, Medical Instruments, the production scientific and technological content is higher, production technology and prescription are complicated, the associated production enterprise of advanced country in the world has monopolized this production technology substantially, and carry out strict technical know-how and blockade, make the technology of the relevant optics glass production enterprise of China comparatively weak.
Summary of the invention
The objective of the invention is from phosphate is matrix, admixture bivalent cupric ion and quadrivalent cerium ion, effectively solve difficult problems such as the easy crystallization of phosphate glass, thereby a kind of high pixel 7,000,000 above low-pass filter substrate for digital camera and preparation methods be provided.
High pixel 7,000,000 above low-pass filter substrate for digital camera, the percentage by weight of its raw material consists of:
| P 2O 5 | Al 2O 3 | Na 2O | Li 2O | Bao | Mgo | Zno | B 2O 3 | Cuo | Ce 2o 3 |
| 40-50 | 15-20 | 20-25 | 1-3 | 5-8 | 1-5 | 2-6 | 1-5 | 1-3 | 0-1 |
The preparation method of high pixel 7,000,000 above low-pass filter substrate for digital camera is characterized in that may further comprise the steps: earlier will be by above-mentioned percentage by weight raw material A l
2O
3, Na
2O, Li
2O, Bao, Mgo, Zno, B
2O
3, Cuo and Ce
2o
3Put into batcher together, after mixing, add P again
2O
5Mixing together; The water that adds raw material gross weight 0.5-5% ratio again carries out pre-reaction as catalyzer and becomes reaction material; Then reaction material is added to the silica crucible the inside and carries out high temperature melting, glass melting temperature 1200-1300 ℃, high temperature clarification 5-6 hour; Glass-cutting, frosted, polishing after the annealing are made the product of required external form and thickness, obtain high pixel 7,000,000 above low-pass filter substrate for digital camera.
The present invention who adopts above-mentioned prescription and technology to form has special spectrum and selects the absorbability function, makes can't be absorbed by material itself by the parasitic light that plated film solved originally to become heat energy.Fundamentally reach and prevent CCD/CMOS etc. because phenomenons such as false colour that pixel separation causes and ripples, reduce the influence to the CCD/CMOS imaging such as infrared light.The made all kinds of superhigh precision complementary color glass ultrathin sections of material are widely used in each association area such as camera, video camera, mobile phone cam, projector, senior scanner, senior microscopic system thus.
The present invention has following characteristics:
1, with phosphate be matrix, admixture bivalent cupric ion and quadrivalent cerium ion, prepare and be applicable to 7,000,000 above pixel low-pass filter substrate for digital camera, alternative import fluorphosphate glass;
2, on the aluminophosphates glass baseplate, add metal oxide such as barium zinc, develop the phosphate low-pass filtering substrate of high stability;
3, develop the technology of preparing of aluminophosphates glass material, established and founded and aftertreatment controlled condition, effectively solved difficult problems such as the easy crystallization of phosphate glass.
Embodiment
The invention will be further described below in conjunction with embodiment.
Following table is four embodiment of the present invention, material rate prescription (percentage by weight %)
In the prescription, employed is the high purity raw material shown in the last table.
The preparation method of the high pixel 7,000,000 above low-pass filter substrate for digital camera of embodiment 1 is: earlier number percentage by weight raw material A l in 1 by embodiment in the last table
2O
3, Na
2O, Li
2O, Bao, Mgo, Zno, B
2O
3, Cuo and Ce
2o
3Put into batcher together, after mixing, again and P
2O
5Mixing together; The water that adds raw material gross weight 0.6% ratio again carries out pre-reaction as catalyzer and becomes reaction material; Then reaction material is added to the silica crucible the inside and carries out high temperature melting, 1250 ℃ of glass melting temperatures, high temperature clarification 5 hours; Glass-cutting, frosted, polishing after the annealing are made the product of required external form and thickness, obtain high pixel 7,000,000 above low-pass filter substrate for digital camera of the present invention.
The preparation method of embodiment 2, embodiment 3 in the last table and the high pixel 7,000,000 above low-pass filter substrate for digital camera of embodiment 4 is: the raw materials by weight percent Al that will go up embodiment reference numeral in the table earlier
2O
3, Na
2O, Li
2O, Bao, Mgo, Zno, B
2O
3, Cuo and Ce
2o
3Put into batcher together, artificial and mechanical two steps of branch add P after being mixed and sparing again
2O
5Mixing together; The water that adds raw material gross weight 0.5-5% ratio again carries out pre-reaction as catalyzer and becomes reaction material; Then reaction material is added to the silica crucible the inside and carries out high temperature melting, glass melting temperature 1200-1300 ℃, high temperature clarification 5-6 hour; Glass-cutting, frosted, polishing after the annealing are made the product of required external form and thickness, obtain high pixel 7,000,000 above low-pass filter substrate for digital camera of the present invention.
High pixel 7,000,000 above low-pass filter substrate for digital camera made from above-mentioned four prescriptions and technology after testing, its every performance is as shown in the table:
The optical property of this product is suitable with Japanese HOYA product, and partly index is better than external like product, and alternative imported materials and items for country saves a large amount of foreign exchanges, can promote Products Development processes such as China's digital camera.
Claims (4)
1, high pixel 7,000,000 above low-pass filter substrate for digital camera, it is characterized in that: the percentage by weight of its raw material consists of:
2, the preparation method of high pixel 7,000,000 above low-pass filter substrate for digital camera according to claim 1 is characterized in that may further comprise the steps: earlier will be by the percentage by weight raw material A l in the claim 1
2O
3, Na
2O, Li
2O, Bao, Mgo, Zno, B
2O
3, Cuo and Ce
2o
3Put into batcher together, after mixing, again and P
2O
5Mixing together; The water that adds raw material gross weight 0.5-5% ratio again carries out pre-reaction as catalyzer and becomes reaction material; Then reaction material is added to the silica crucible the inside and carries out high temperature melting, glass melting temperature 1200-1300 ℃, high temperature clarification 5-6 hour; Glass-cutting, frosted, polishing after the annealing are made the product of required external form and thickness, obtain high pixel 7,000,000 above low-pass filter substrate for digital camera.
3, according to the described high pixel 7,000,000 above low-pass filter substrate for digital camera of claim 1, it is characterized in that: the percentage by weight of its raw material consists of:
4, the preparation method of high pixel 7,000,000 above low-pass filter substrate for digital camera according to claim 3 is characterized in that may further comprise the steps: earlier will be by the percentage by weight raw material A l in the claim 3
2O
3, Na
2O, Li
2O, Bao, Mgo, Zno, B
2O
3, Cuo and Ce
2o
3Put into batcher together, after mixing, again and P
2O
5Mixing together; The water that adds raw material gross weight 0.6% ratio again carries out pre-reaction as catalyzer and becomes reaction material; Then reaction material is added to the silica crucible the inside and carries out high temperature melting, 1250 ℃ of glass melting temperatures, high temperature clarification 5 hours; Glass-cutting, frosted, polishing after the annealing are made the product of required external form and thickness, obtain high pixel 7,000,000 above low-pass filter substrate for digital camera.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101222386A CN101403799B (en) | 2008-11-13 | 2008-11-13 | Low-pass filter substrate for digital camera with 700 Mega or above image element, and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101222386A CN101403799B (en) | 2008-11-13 | 2008-11-13 | Low-pass filter substrate for digital camera with 700 Mega or above image element, and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101403799A true CN101403799A (en) | 2009-04-08 |
| CN101403799B CN101403799B (en) | 2010-08-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101222386A Expired - Fee Related CN101403799B (en) | 2008-11-13 | 2008-11-13 | Low-pass filter substrate for digital camera with 700 Mega or above image element, and preparation method thereof |
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| CN (1) | CN101403799B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102192736A (en) * | 2010-03-03 | 2011-09-21 | 中国船舶重工集团公司第七○七研究所 | Optimization method for sensor output data of ship comprehensive control system |
| CN102849920A (en) * | 2011-07-04 | 2013-01-02 | 湖北新华光信息材料有限公司 | Optical glass melting method and optical glass melting device used for method |
-
2008
- 2008-11-13 CN CN2008101222386A patent/CN101403799B/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102192736A (en) * | 2010-03-03 | 2011-09-21 | 中国船舶重工集团公司第七○七研究所 | Optimization method for sensor output data of ship comprehensive control system |
| CN102849920A (en) * | 2011-07-04 | 2013-01-02 | 湖北新华光信息材料有限公司 | Optical glass melting method and optical glass melting device used for method |
| CN102849920B (en) * | 2011-07-04 | 2015-04-08 | 湖北新华光信息材料有限公司 | Optical glass melting method and optical glass melting device used for method |
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| Publication number | Publication date |
|---|---|
| CN101403799B (en) | 2010-08-25 |
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Granted publication date: 20100825 Termination date: 20121113 |