CN101393397B - Method for making liquid light-sensitive resin relief printing plate with groove - Google Patents
Method for making liquid light-sensitive resin relief printing plate with groove Download PDFInfo
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- CN101393397B CN101393397B CN2008102171199A CN200810217119A CN101393397B CN 101393397 B CN101393397 B CN 101393397B CN 2008102171199 A CN2008102171199 A CN 2008102171199A CN 200810217119 A CN200810217119 A CN 200810217119A CN 101393397 B CN101393397 B CN 101393397B
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Abstract
The present invention discloses a method for manufacturing a liquid light-sensitive resin relief printing plate with a groove, which comprises the following steps: coating resin on an exposure machine platform to form a resin layer, and performing back exposure, main exposure, plate development and forming. The method is characterized in that the position on the resin layer needing to be providedwith the groove is covered by a first light screen before the back exposure; the first light screen is removed after finishing the main exposure; and at least one exposure is performed on the area which is covered by the light screen. Compared with the prior art, because the exposure supplementation working procedure is added, grooves with different depths can be formed on the liquid plate through the selection of the exposure supplementation time, thus more than three layers of thicknesses can be formed on the liquid plate.
Description
Technical field
The present invention relates to method for making with the liquid light-sensitive resin relief printing plate of groove.
Background technology
Liquid light-sensitive resin relief printing plate (hereinafter to be referred as the liquid version) is mainly used in PI (PI Coating) printing process that LCD (Liquid CrystalDisplay) the medium and high-grade goods STN of producer (Super Twisted Nematic), color-STN produce.The principal ingredient of its used liquid resin raw material is undersaturated polybutadiene (Polybutadiene), process be with resin-coating on special exposure sources, through the selectivity first curing molding that exposes, and then determine the final size and the performance of product through washing operations such as version, oven dry, optical processing, post-exposure.
Please refer to shown in Fig. 1 to 4, not difficult for the exposure of the common liq version that only has two kinds of thickness, only need finish getting final product according to following operation:
1, resinizes
Exposure bench a slice glass lithography respectively arranged up and down, the glass rear is a ultraviolet source, to make a plate earlier is placed on down on the version glass 10 with the film 11, clean following edition glass 10 surface back illiteracy coverlays 12 and vacuumizes, and allows the coverlay 12 and the film 11 fit tightly with following edition glass 10; With the equipment of resinizing on the exposure machine resin is tiled on the coverlay 12 to form resin bed 13, places 1 passive base film 14 at resin bed 13 tops simultaneously; Subsequently, adjustment of the printing plate glass 15 is put down (please refer to Fig. 1).
2, back of the body exposure
Open the ultraviolet source at adjustment of the printing plate glass 15 rears, the thickness that solidifies is selected the time shutter as required, to form base version district 132 (please refer to Fig. 2).
3, main exposure
After back of the body exposure is finished, open down the ultraviolet source of version glass 10 belows, ultraviolet light carries out selectivity exposure curing (please refer to Fig. 3) by the transmission region of the film 11 to resin bed 13.
4, wash an edition moulding
After main exposure is finished, resin bed 13 is taken off from machine, and the surface coverage film 12 of tearing, with uncured resin flush away,, take face exposure to determine its final hardness (please refer to Fig. 4) at last again with solvent to form graph area 131.
But,, take aforesaid way not realize because of needs form 3 layers even 4 layer thicknesses are arranged on the liquid version for liquid version with groove.The way of prior art is, divides into the place of groove at needs and places raised line, forming physical space, and solidifies the back in exposure and takes out raised line.Yet this method has unhandy defective, and when coating resin, forms bubble easily.
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of method for making of the liquid light-sensitive resin relief printing plate with groove, and it can be at the thickness that forms on the liquid version more than three layers.
For solving the problems of the technologies described above, technical scheme of the present invention is: the method for making that a kind of liquid light-sensitive resin relief printing plate with groove is provided, may further comprise the steps: coating resin is to form resin bed, back of the body exposure, main exposure and to wash an edition moulding on exposure bench, before carrying on the back exposure, the position that need offer groove at described resin bed covers first shadow shield, after main exposure is finished, take off described first shadow shield, and adopt second shadow shield at least once to mend exposure described first shadow shield institute overlay area.
Compared with prior art,,, can make the liquid version form the groove of different depth by to mending the selection of time shutter because the present invention has increased the benefit exposure process, thus can be at the thickness that forms on the liquid version more than three layers.
Description of drawings
Fig. 1 is the principle of work synoptic diagram of operation of resinizing in the prior art;
Fig. 2 is the principle of work synoptic diagram of main exposure operation in the prior art;
Fig. 3 is the principle of work synoptic diagram that is exposed operation in the prior art;
Fig. 4 is the side-looking sectional structure synoptic diagram that adopts the liquid light-sensitive resin relief printing plate with two kinds of thickness that prior art makes;
Fig. 5 is the resinize principle of work synoptic diagram of operation of a preferred embodiment of the present invention;
Fig. 6 is the principle of work synoptic diagram of a preferred embodiment of the present invention back of the body exposure process;
Fig. 7 is the principle of work synoptic diagram of a preferred embodiment of the present invention main exposure operation;
Fig. 8 is the principle of work synoptic diagram that a preferred embodiment of the present invention is mended exposure process;
Fig. 9 is the side-looking sectional structure synoptic diagram that adopts the liquid light-sensitive resin relief printing plate with three kinds of thickness that a preferred embodiment of the present invention makes.
Embodiment
In order to make the technical problem to be solved in the present invention, technical scheme and beneficial effect clearer,, the present invention is further elaborated below in conjunction with drawings and Examples.Should be appreciated that specific embodiment described herein only in order to explanation the present invention, and be not used in qualification the present invention.
Please refer to Fig. 5 to 9, the method for making of the liquid light-sensitive resin relief printing plate of present embodiment band groove, may further comprise the steps: coating resin is to form resin bed 23, back of the body exposure, main exposure and to wash an edition moulding on exposure bench, before carrying on the back exposure, the position that need offer groove at described resin bed covers first shadow shield 26, after main exposure is finished, take off described first shadow shield 26, and exposure is at least once mended in 26 overlay areas of described first shadow shield.Like this,,, can make the liquid version form the groove of different depth by to mending the selection of time shutter because present embodiment has increased the benefit exposure process, thus can be at the thickness that forms on the liquid version more than three layers.Below respectively above steps is described in detail respectively.
1, resinizes
Exposure bench a slice glass lithography respectively arranged up and down, the glass rear is a ultraviolet source, to make a plate earlier is placed on down on the version glass 20 with the film 21, clean following edition glass 20 surface back illiteracy coverlays 22 and vacuumizes, and allows the coverlay 22 and the film 21 fit tightly with following edition glass 20; With the equipment of resinizing on the exposure machine resin is tiled on the coverlay 22 to form resin bed 23, places 1 passive base film 24 at resin bed 23 tops simultaneously; Resin bed 23 need to form the groove position directly over, place and first shadow shield 26 of groove same widths and fixing.Subsequently, adjustment of the printing plate glass 25 is put down (please refer to Fig. 5).
2, back of the body exposure
Open the ultraviolet source at adjustment of the printing plate glass 25 rears, the thickness that solidifies is selected the time shutter as required, to form base version district 232 (please refer to Fig. 6).
3, main exposure
After back of the body exposure is finished, open down the ultraviolet source of version glass 20 belows, ultraviolet light carries out selectivity exposure curing (please refer to Fig. 7) by the transmission region of the film 21 to resin bed 23.
4, mend exposure
When only needing the formation threeply to spend, need once mend exposure to 26 overlay areas of described first shadow shield whole, specific practice is to adopt second shadow shield 27 to cover the zone of described resin bed 23 except that described needs are offered the position of groove, adopts ultraviolet light once to mend exposure (please refer to Fig. 8) then.
When needs form four layer thicknesses, 26 overlay areas of described first shadow shield whole are carried out twice benefit exposure respectively, the benefit when its specific practice and above-mentioned formation threeply are spent is exposed similar.When needs formed more multi-layered thickness, the rest may be inferred.
Described first, second shadow shield 26,27 is made of light-proof material, and as the black scraps of paper, black film film etc. entirely, its thickness is no more than 0.1 millimeter and is advisable.In the present embodiment, described first, second shadow shield 26,27 is complete black film film.
5, wash an edition moulding
After exposure is finished, resin bed 13 is taken off from machine, and the surface coverage film 22 of tearing, with uncured resin flush away,, take face exposure to determine its final hardness (please refer to Fig. 9) at last again with solvent with formation graph area 231.
The above only is preferred embodiment of the present invention, not in order to restriction the present invention, all any modifications of being done within the spirit and principles in the present invention, is equal to and replaces and improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. method for making with the liquid light-sensitive resin relief printing plate of groove, may further comprise the steps: coating resin is to form resin bed, back of the body exposure, main exposure and to wash an edition moulding on exposure bench, it is characterized in that, before carrying on the back exposure, the position that need offer groove at described resin bed covers first shadow shield, after main exposure is finished, take off described first shadow shield, and adopt second shadow shield at least once to mend exposure described first shadow shield institute overlay area.
2. the method for making of the liquid light-sensitive resin relief printing plate of band groove as claimed in claim 1 is characterized in that, described first shadow shield institute overlay area whole are once mended exposure.
3. the method for making of the liquid light-sensitive resin relief printing plate of band groove as claimed in claim 2, it is characterized in that, adopt second shadow shield to cover the zone of described resin bed except that described needs are offered the position of groove, adopt ultraviolet light once to mend exposure then.
4. the method for making of the liquid light-sensitive resin relief printing plate of band groove as claimed in claim 1 is characterized in that, described first shadow shield institute overlay area whole is carried out twice respectively abovely mend exposure.
5. the method for making of the liquid light-sensitive resin relief printing plate of band groove as claimed in claim 3 is characterized in that, described first, second shadow shield is made of light-proof material.
6. the method for making of the liquid light-sensitive resin relief printing plate of band groove as claimed in claim 5 is characterized in that, described first, second shadow shield is complete black film film.
7. as the method for making of the liquid light-sensitive resin relief printing plate of claim 5 or 6 described band grooves, it is characterized in that the thickness of described first, second shadow shield is no more than 0.1 millimeter.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2008102171199A CN101393397B (en) | 2008-10-28 | 2008-10-28 | Method for making liquid light-sensitive resin relief printing plate with groove |
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| CN2008102171199A CN101393397B (en) | 2008-10-28 | 2008-10-28 | Method for making liquid light-sensitive resin relief printing plate with groove |
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| CN101393397A CN101393397A (en) | 2009-03-25 |
| CN101393397B true CN101393397B (en) | 2011-03-09 |
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| CN104777100A (en) * | 2015-04-24 | 2015-07-15 | 王丹凤 | Preparation method of micro liquid pool |
| CN104777101A (en) * | 2015-04-24 | 2015-07-15 | 王丹凤 | Method for observing cells |
| US10625334B2 (en) * | 2017-04-11 | 2020-04-21 | Macdermid Graphics Solutions, Llc | Method of producing a relief image from a liquid photopolymer resin |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5753417A (en) * | 1996-06-10 | 1998-05-19 | Sharp Microelectronics Technology, Inc. | Multiple exposure masking system for forming multi-level resist profiles |
| US5976763A (en) * | 1997-03-05 | 1999-11-02 | Roberts; David H. | Highly sensitive water-developable photoreactive resin compositions and printing plates prepared therefrom |
| CN1287631A (en) * | 1998-09-04 | 2001-03-14 | 保利飞龙科技公司 | Solid-capped liquid photopolymer printing elements |
| JP2002116315A (en) * | 2000-10-11 | 2002-04-19 | Canon Inc | Manufacturing method for micro optical element |
| CN1369066A (en) * | 1999-08-26 | 2002-09-11 | 麦克德米德图像技术有限公司 | Methods for enhancing images on relief image printing plates |
| CN101019073A (en) * | 2004-05-25 | 2007-08-15 | 麦克德米德印刷方案股份有限公司 | Method for pre-exposing relief image printing plate |
-
2008
- 2008-10-28 CN CN2008102171199A patent/CN101393397B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5753417A (en) * | 1996-06-10 | 1998-05-19 | Sharp Microelectronics Technology, Inc. | Multiple exposure masking system for forming multi-level resist profiles |
| US5976763A (en) * | 1997-03-05 | 1999-11-02 | Roberts; David H. | Highly sensitive water-developable photoreactive resin compositions and printing plates prepared therefrom |
| CN1287631A (en) * | 1998-09-04 | 2001-03-14 | 保利飞龙科技公司 | Solid-capped liquid photopolymer printing elements |
| CN1369066A (en) * | 1999-08-26 | 2002-09-11 | 麦克德米德图像技术有限公司 | Methods for enhancing images on relief image printing plates |
| JP2002116315A (en) * | 2000-10-11 | 2002-04-19 | Canon Inc | Manufacturing method for micro optical element |
| CN101019073A (en) * | 2004-05-25 | 2007-08-15 | 麦克德米德印刷方案股份有限公司 | Method for pre-exposing relief image printing plate |
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| CN101393397A (en) | 2009-03-25 |
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Address after: Two road high tech Industrial Zone in Shenzhen city Guangdong province 518057 North Song Ping Lang mountain No. 8 Patentee after: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Address before: Two road high tech Industrial Zone in Shenzhen city Guangdong province 518057 North Song Ping Lang mountain No. 8 Patentee before: Qingyi Precision Mask Making (Shenzhen) Co., Ltd. |
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Denomination of invention: Method for making liquid light-sensitive resin relief printing plate with groove Effective date of registration: 20131023 Granted publication date: 20110309 Pledgee: Shenzhen SME credit financing guarantee Group Co., Ltd. Pledgor: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Registration number: 2013990000769 |
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Date of cancellation: 20150616 Granted publication date: 20110309 Pledgee: Shenzhen SME credit financing guarantee Group Co., Ltd. Pledgor: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Registration number: 2013990000769 |
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Denomination of invention: Method for making liquid light-sensitive resin relief printing plate with groove Effective date of registration: 20150623 Granted publication date: 20110309 Pledgee: Shenzhen SME credit financing guarantee Group Co., Ltd. Pledgor: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Registration number: 2015990000498 |
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Date of cancellation: 20160607 Granted publication date: 20110309 Pledgee: Shenzhen SME credit financing guarantee Group Co., Ltd. Pledgor: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Registration number: 2015990000498 |
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