CN101382734A - Method for making nano lens array - Google Patents
Method for making nano lens array Download PDFInfo
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- CN101382734A CN101382734A CNA2008102246937A CN200810224693A CN101382734A CN 101382734 A CN101382734 A CN 101382734A CN A2008102246937 A CNA2008102246937 A CN A2008102246937A CN 200810224693 A CN200810224693 A CN 200810224693A CN 101382734 A CN101382734 A CN 101382734A
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Abstract
The invention relates to a nano lens array preparation method, pertaining to the technical field of micro nano machining; the preparation method is characterized in that firstly a substrate is selected and a hydrophilization processing is carried out to the substrate; and then a self-assembly method is used for arranging nanospheres on the substrate; a transmission technology is used for transmitting the shape of the nanospheres onto the substrate to form the nano lens. The preparation method overcomes the defects of high production costs, long processing circle and the like of the nano lens in the prior art; the preparation method is characterized by no complex equipment, no mask, low cost, high efficiency, simple technology, and the like; simultaneously, the method also has the advantages of controllable caliber, arrangement method, vector height and duty ratio, thereby providing a simple new method with practicality for the production of the nano lens array.
Description
Technical field
The present invention relates to a kind of micro-nano process technology method, the method for lens arra is received in particularly a kind of making.
Background technology
Nano lens has a wide range of applications in novel micro nanometer ray machine electric system, as high density integrated electro systems such as bio-sensing, chemical sensitisation, big data quantity storages, its preparation method is the gordian technique that research is at present still needed and solved, the method that adopts has e-beam direct write lithography, focused ion beam lithography, interference lithography etc. at present, but all there are shortcomings such as cost height, process-cycle length in prior art.
On the other hand, because the nanoscale microballoon has small-size effect, surface effect and quantum size effect, have responses such as temperature, pH, electric field and magnetic field, extensively the delivery system of medical diagnosis, medicine etc. causes chemistry and biomedical worker's very big interest.The method of tradition synthetic high polymer microballoon has emulsion polymerization, precipitation polymerization, seeding polymerization, dispersin polymerization etc., also has the preparation for processing of various nano-glass balls simultaneously.Nano-particle material has the stable morphology structure, and the consistance of its size easy to control and particle.At present, nano-particle material has become the important component part of nano material.Utilize the nanosphere self-assembling technique to obtain broad research in recent years, it is a kind of inexpensive and have a technology of parallel processing capability.Its main technique be will have the micelle of identical size and shape (normally spherical) be arranged on the treated smooth substrate with excellent hydrophilic, generally speaking, these micelles are random arrangement on substrate surface, but controlled condition suitably, then these micelles can form array by self assembling process on substrate.Utilize nanosphere as mask then, plating in it arranges the space utilizes Lift-Off technology to remove nanosphere again, obtains metal nanoparticle at last.The nano particle that present this method is made has been widely used in the biochemistry detection technology.If can utilize at present ripe relatively Nano microsphere to realize the preparation of nano lens, will provide a convenience, approach cheaply.
Summary of the invention
The problem to be solved in the present invention is: overcome shortcomings such as prior art nano lens cost of manufacture height, process-cycle length, make full use of ripe relatively at present self-assembling technique, utilize the nanometer spheres as template, realize the nano lens making by transmitting.
The technical solution adopted for the present invention to solve the technical problems is: a kind of method for preparing nano lens array is characterized in that: at first select substrate, and it is carried out hydrophilicity-imparting treatment; In substrate, arrange nanosphere by the method for self assembly then; Again by the transmission technology, the shape of nanosphere is delivered to form in the substrate receives lens.
Described substrate is quartzy or K9 or silicon or zinc selenide or germanium material.
Described nanosphere is glass bead or silicon microballoon or polystyrene microsphere or polymer microballoon.
Described transmission technology is that reactive ion etching or inductively coupled plasma etching or wet etching technique carry out face shape and transmit, and is implemented in the shaping of the nano lens on the different base.
Can make for the 20nm-8000nm nano lens performance period for the 20nm-8000nm Nano microsphere by selecting diameter.
The bore of described nano lens ball can be identical with the bore of nanosphere, also can be different.
Can obtain the different nano lens of relief depth by control etching time, etch rate, the relief depth of described nano lens 0 and D/2 between adjustable, D is the lens cycle.
Can realize that by arranging of nanosphere of control the described hexagon of receiving lens is arranged or quadrilateral is arranged or annular is arranged.
The advantage that the present invention is compared with prior art had is: this method has does not need complex apparatus, do not need distinguishing features such as mask plate, cost is low, efficient is high, technology is simple, also have nano lens bore, arrangement mode, rise, the controlled advantage of dutycycle simultaneously, for the making of nano lens array provides a kind of simple and practical new method.
Description of drawings
Fig. 1 is that the present invention adopts nanosphere to make the principle schematic that the mask plate etching forms nano lens;
Fig. 2 is the making process flow diagram of nano lens in the embodiment of the invention 1; Fig. 2 a selects substrate and carries out pretreated synoptic diagram; Fig. 2 b is that nanosphere is arranged in the synoptic diagram on the substrate; Fig. 2 c is the synoptic diagram that forms nano lens by etching;
Fig. 3 is the cycle 400nm of the shorter made of etching time in the embodiment of the invention 1, and relief depth 100nm receives lens; Fig. 3 a is for receiving lens embossment profile synoptic diagram, Fig. 3 b be produce receive lens SEM photo;
Fig. 4 is the long formed cycle 400nm of etching time in the embodiment of the invention 1, and relief depth 200nm receives lens; Fig. 4 a is for receiving lens embossment profile synoptic diagram; Fig. 4 b be produce receive lens SEM photo;
Fig. 5 adopts the nanosphere of diameter 8000nm to realize diameter 6000nm in the embodiment of the invention 2, the infrared nano lens of relief depth 3000nm is made;
Fig. 6 is the cycle 200nm that realizes in the embodiment of the invention 3, and the lens of receiving of relief depth 50nm are made synoptic diagram;
Fig. 7 be make in the embodiment of the invention 4 that quadrilateral arranges receive lens SEM photo;
Fig. 8 be the annular of making in the embodiment of the invention 5 arrange receive the lens synoptic diagram.
Embodiment
Introduce the present invention in detail below in conjunction with the drawings and the specific embodiments.
Fig. 1 makes the method principle schematic of nano lens array for the present invention; At first select substrate 1, and it is carried out hydrophilicity-imparting treatment; In substrate, arrange nanosphere 2 by the method for self assembly then; Again by the transmission technology, the shape of nanosphere 2 is delivered to form in the substrate receives lens 3.
Present embodiment is substrate to melt quartz, makes diameter 400nm, and relief depth is respectively the nano lens array of 100nm and 200nm.
At first adopt and melt quartz, with chemical method substrate is carried out hydrophilicity-imparting treatment, shown in Fig. 2 a as substrate; Be 3% with concentration then, diameter is that the monodisperse polystyrene nanosphere hydrosol 0.5 μ l of 400nm is uniformly coated on glass basic surface, and solvent is slowly evaporated, and colloidal spheres is self-assembled into array, shown in Fig. 2 b; Adopt reactive ion etching RIE p-poly-phenyl ethene nanosphere self assembly layer to carry out etching, realize the making of required lens, shown in Fig. 2 c; Select 1:1 etch rate ratio for use, regulate the flow of etching power and reflective power and etching gas, the quartzy etch rate of control is at 20nm/min, through after 5 minutes etchings, forms cycle 400nm, and relief depth 100nm receives lens; Fig. 3 a made receive lens embossment profile synoptic diagram, Fig. 3 b be made receive lens SEM photo; Be stabilized under the situation of 20nm/min etching at etch rate 10 minutes, form cycle 400nm, relief depth 200nm receives lens; That produces receives lens embossment profile synoptic diagram shown in Fig. 4 a; It receives lens SEM photo shown in Fig. 4 b, because etching time is longer than the lens time of receiving of relief depth shallow (being 100nm), this surfaceness of receiving lens obviously wants big.
Present embodiment is substrate with the zinc selenide, makes diameter 6000nm, the nano lens array of relief depth 3000nm; At first adopt zinc selenide as substrate, substrate is carried out hydrophilicity-imparting treatment with chemical method; Be 1% with concentration then, the polystyrene DVB copolymerized particle suspension silicon microballoon 1.5 μ l of diameter 8000nm are uniformly coated on substrate surface, and solvent is slowly evaporated, and colloidal spheres is self-assembled into array; Adopt inductively coupled plasma etching ICP that polymer microballoon self assembly layer is carried out etching, the etch rate ratio is controlled at 300nm/min, by the 10min etching, realize the making of required lens, receive the lens synoptic diagram as shown in Figure 5, receive lens diameter 6000nm, relief depth 3000nm.
Embodiment 3
Present embodiment is substrate with silicon, makes diameter 200nm, the nano lens array of relief depth 50nm.Employing silicon is substrate, with chemical method substrate is carried out hydrophilicity-imparting treatment; With concentration is 1%, and diameter is that the monodisperse polystyrene nanosphere hydrosol 0.5 μ l of 200nm is uniformly coated on substrate surface self assembly formation array; Adopt the HF solution of 5% concentration that it is carried out wet etching, obtain the lens of receiving as shown in Figure 6 behind the 3min.
Embodiment 4
Present embodiment is substrate with germanium, makes diameter 3000nm, the nano lens array of relief depth 1000nm.Employing germanium is substrate, with chemical method substrate is carried out hydrophilicity-imparting treatment; With concentration is 1%, and diameter is that the borosilicate glass ball hydrosol 2.5 μ l of 3000nm are uniformly coated on substrate surface self assembly formation array.By in substrate, forming the microballoon array that quadrilateral is arranged, adopt reactive ion etching RIE etching, etch rate was than etching under the situation that is controlled at 50nm/min 20 minutes, and the quadrilateral of formation is arranged and is received lens SEM photo as shown in Figure 7.
Embodiment 5
Present embodiment is substrate with K9, makes diameter 800nm, the nano lens array of relief depth 300nm.Employing K9 is a substrate, with chemical method substrate is carried out hydrophilicity-imparting treatment, with concentration is 5%, diameter is that the monodisperse polystyrene nanosphere hydrosol 2.5 μ l of 800nm are uniformly coated on substrate surface, realize that the nanosphere that annular is arranged arranges, the method that adopts wet etching again is delivered to substrate surface with the embossment profile of nanosphere; Adopt the HF solution of 2% concentration that it is carried out wet etching, obtain behind the 20min lens arrange synoptic diagram as shown in Figure 8 receive lens.
Claims (8)
1, a kind of method for preparing nano lens array is characterized in that: at first select substrate, and it is carried out hydrophilicity-imparting treatment; In substrate, arrange nanosphere by the method for self assembly then; Again by the transmission technology, the shape of nanosphere is delivered to form in the substrate receives lens.
2, a kind of method for preparing nano lens array according to claim 1 is characterized in that: described substrate is quartzy or K9 or silicon or zinc selenide or germanium material.
3, a kind of method for preparing nano lens array according to claim 1 is characterized in that: described nanosphere is glass bead or silicon microballoon or polystyrene microsphere or polymer microballoon.
4, a kind of method for preparing nano lens array according to claim 1, it is characterized in that: described transmission technology is that reactive ion etching RIE or inductively coupled plasma etching ICP or wet etching technique carry out face shape and transmit, and is implemented in the shaping of the nano lens on the different base.
5, the described a kind of method for preparing nano lens array of claim 1 is characterized in that: can make for the 20nm-8000nm nano lens performance period for the 20nm-8000nm Nano microsphere by selecting diameter.
6, the described a kind of method for preparing nano lens array of claim 1, it is characterized in that: the bore of described nano lens ball can be identical with the bore of nanosphere, also can be different.
7, the described a kind of method for preparing nano lens array of claim 1, it is characterized in that: can obtain the different nano lens of relief depth by control etching time, etch rate, the relief depth of nano lens 0 and D/2 between adjustable, D is for receiving the lens cycle.
8, the described a kind of method for preparing nano lens array of claim 1 is characterized in that: can realize that by arranging of nanosphere of control the described hexagon of receiving lens is arranged or quadrilateral is arranged or annular is arranged.
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| Application Number | Priority Date | Filing Date | Title |
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| CNA2008102246937A CN101382734A (en) | 2008-10-23 | 2008-10-23 | Method for making nano lens array |
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| CNA2008102246937A CN101382734A (en) | 2008-10-23 | 2008-10-23 | Method for making nano lens array |
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| CN101382734A true CN101382734A (en) | 2009-03-11 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102259832A (en) * | 2010-05-27 | 2011-11-30 | 清华大学 | Preparation method of three-dimensional nano structure array |
| CN103367558A (en) * | 2012-03-29 | 2013-10-23 | 山东浪潮华光光电子股份有限公司 | Spherical photoresist mask and preparation method thereof |
| CN104555910A (en) * | 2014-12-31 | 2015-04-29 | 吉林大学 | Method for preparing thin film ordered microstructure based on a reaction ion beam etching technology |
| CN103367558B (en) * | 2012-03-29 | 2016-11-30 | 山东浪潮华光光电子股份有限公司 | A kind of method preparing spherical photoresist mask |
| CN107797268A (en) * | 2017-12-01 | 2018-03-13 | 中北大学 | A kind of electrowetting regulation and control manufacturing process of complete anti-reflection embedded nano combined lens |
| CN113687454A (en) * | 2021-08-30 | 2021-11-23 | 北京理工大学 | Micro-lens array processing method |
-
2008
- 2008-10-23 CN CNA2008102246937A patent/CN101382734A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102259832A (en) * | 2010-05-27 | 2011-11-30 | 清华大学 | Preparation method of three-dimensional nano structure array |
| US8501020B2 (en) | 2010-05-27 | 2013-08-06 | Tsinghua University | Method for making three-dimensional nano-structure array |
| CN103367558A (en) * | 2012-03-29 | 2013-10-23 | 山东浪潮华光光电子股份有限公司 | Spherical photoresist mask and preparation method thereof |
| CN103367558B (en) * | 2012-03-29 | 2016-11-30 | 山东浪潮华光光电子股份有限公司 | A kind of method preparing spherical photoresist mask |
| CN104555910A (en) * | 2014-12-31 | 2015-04-29 | 吉林大学 | Method for preparing thin film ordered microstructure based on a reaction ion beam etching technology |
| CN104555910B (en) * | 2014-12-31 | 2016-05-18 | 吉林大学 | A kind of method of preparing film ordered micro structure based on reactive ion beam etching technique |
| CN107797268A (en) * | 2017-12-01 | 2018-03-13 | 中北大学 | A kind of electrowetting regulation and control manufacturing process of complete anti-reflection embedded nano combined lens |
| CN107797268B (en) * | 2017-12-01 | 2020-01-21 | 中北大学 | Electrowetting regulation and forming method of full anti-reflection embedded nano composite lens |
| CN113687454A (en) * | 2021-08-30 | 2021-11-23 | 北京理工大学 | Micro-lens array processing method |
| CN113687454B (en) * | 2021-08-30 | 2023-02-28 | 北京理工大学 | Micro-lens array processing method |
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Open date: 20090311 |