CN101382614B - Optical filter copy process - Google Patents
Optical filter copy process Download PDFInfo
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- CN101382614B CN101382614B CN2008101509954A CN200810150995A CN101382614B CN 101382614 B CN101382614 B CN 101382614B CN 2008101509954 A CN2008101509954 A CN 2008101509954A CN 200810150995 A CN200810150995 A CN 200810150995A CN 101382614 B CN101382614 B CN 101382614B
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- graphite
- photoresists
- glass
- glass substrate
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- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
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Abstract
The invention discloses an optical filter conversion technique; the technique comprises the following steps: a glass substrate of the optical filter is firstly washed, then sensitive glue is injected into the glass substrate, next, the exposure and development processing is carried out, graphite is coated, the development processing is best etched, a wet film method is adopted when injecting the sensitive glue in the invention, and the relative technique condition of the operation leads the coating of the sensitive glue to be evener, and the quality of the manufactured products is improved. The invention adopts a film-to-film exposure mode and uses relevant technique condition when in operation and light path calibration using lens is not carried out when in exposing, thus having simple technique and reducing the production cost.
Description
Technical field
The invention belongs to display device and make the field, relate to a kind of being used for the motherboard optical filter is reprinted the imprinting manufacturing filter technology method that makes new advances with optical filter.
Background technology
Exposure process is arranged one in the color picture tube manufacture process, and this operation produces evenly distributed graphite black matrix striped by the method for a series of exposure etchings on the screen negative camber of kinescope.And the quality that the graphite black matrix is arranged can directly influence quality and contrast height that the color picture tube image shows.So guaranteeing this operation can finish by high-quality.
In the used equipment of exposure process two important parts are arranged, the one, lens, the 2nd, optical filter.The effect of lens is to make light simulation electronic beam trajectory, carries out light path and is just imitating.The effect of optical filter is to form the different black matrix striped of light sensitivity by the transmittance adjustment to light, and optical filter has very significant effects to the quality and the homogeneous tube taste of the coating of graphite black matrix.
Optical filter uses for a long time, and its lip-deep striped can increase in time the phenomenon that wearing and tearing come off occur, and coating has harmful effect to the graphite black matrix.The present invention is mainly used in the motherboard optical filter and reprints the imprinting manufacturing optical filter that makes new advances.New optical filter almost is the same with former optical filter, can replace original optical filter with it.
Summary of the invention
The objective of the invention is to overcome above-mentioned prior art deficiency, a kind of optical filter copy process method is provided, this technological operation is convenient, and cost is low.
Technical scheme of the present invention is achieved in that
At first the glass of color filter substrate is cleaned: use 5-10 milliliter detergent washing during cleaning earlier, with 5-10 gram strontium oxide strontia glass surface is carried out polishing then, then clean with 5-10 milliliter washing agent again, dry up with the 0.2mp pressure-air with the clean back of a large amount of deionized water rinsings at last;
Glass substrate is carried out photoresists to be injected: take the wet film method to inject when injecting photoresists, before being coated with photoresists, earlier to the pure water of 28-32 degree centigrade of the face spray that will film, substrate is rotated in the surface and forms the layer of even moisture film along the center simultaneously, carrying out photoresists during to 26-28 degree centigrade in surface temperature injects, injection rate IR is the 45-55 milliliter, substrate becomes 160-170 degree angle during injection with surface level, rotate along the glass substrate center simultaneously, rotating speed is 175-185 rev/min, after treating the photoresists injection and evenly being coated in glass baseplate surface, carries out drying, baking temperature is 75 ± 5 degrees centigrade, and the drying rear surface temperature that finishes is controlled at 68 ± 2 degrees centigrade;
3. expose and developing process: the glass substrate that has been coated with photoresists will expose, adopt film that the method for film is exposed, be that the motherboard optical filter has the one side of film to make progress, new filter sheet base plate has face to be placed on the motherboard optical filter downwards, the face of two optical filters sticks together, 30 ± 2 degrees centigrade of exposed temperature: exposure illumination 0.850 ± 0.050mw/cm
2Time shutter is 3 ± 0.5 seconds, arrived partially hardened attached to glass baseplate surface by illumination behind the end exposure, carry out development treatment then, pressure with 0.18-0.22MP has face spray developing water to clean to glass substrate, not by illumination to photoresists parts will be washed off, the composition of developing water is 42 ± 2 degrees centigrade a pure water, carries out drying after same development is finished, and temperature is controlled at 50 ± 3 degrees centigrade;
4. graphite applying, etching and developing process: the glass substrate of finishing the photoresists development carries out graphite applying, the glass substrate horizontal positioned, there is face downward, graphite liquid sprays the injection face from bottom to top, glass substrate evenly spreads graphite along the central shaft rotation simultaneously, surface temperature was at 43 degrees centigrade when graphite injected, after finishing, graphite applying carries out drying, temperature range is 63 ± 2 degrees centigrade, after solidifying, graphite liquid stops drying, surface temperature control is at 58 degrees centigrade, base plate glass after the graphite applying drying finished is put into etching liquid immediately and is carried out etching, and the photoresists of sclerosis attached to glass baseplate surface are eroded, and the graphite that applies on the related photoresists also can and then come off, the glass surface directly graphite of coating then can stay, etching time is between 75 seconds～90 seconds, and etching liquid adopts sodium hypochlorite and the water of volume ratio 1:1 formulated, and the etching back that finishes is cleaned with the developing water of pressure 1.0mp the intact residuals afterwards of etching is rinsed out;
At last the graphite striped on the glass substrate is shaped fully carrying out primary drying 50-60 degree centigrade, so far optical filter turns over to scribe fully and finishes.
Adopt the wet film method to inject when photoresists of the present invention inject, and the associated process conditions of this operation makes that the coating of photoresists can be more even, the quality that manufactures a product gets a promotion.
Take the Exposure mode of film to film when the present invention exposes, and the associated process conditions the time used of operation, and do not adopt light conducting path lens to proofread and correct during exposure, technology is simple, reduces production costs.
Embodiment
Embodiment 1:
1, the glass of color filter substrate is cleaned: glass substrate is the optical glass that thickness is 1.3mm, to clean it earlier before turning over quarter, use earlier detergent washing during cleaning, first during cleaning with 5 milliliters of detergent washings, with 5 gram strontium oxide strontias glass surface is carried out polishing then, then clean with 5 milliliters of washing agent again, dry up with the 0.2mp pressure-air with the clean back of a large amount of deionized water rinsings at last;
2. glass substrate being carried out photoresists injects.Take the wet film method to inject when injecting photoresists, be coated with photoresists before, to the pure water of 30 degrees centigrade of the face sprays that will film, substrate is rotated in the surface and forms the layer of even moisture film along the center simultaneously earlier.Carry out photoresists and inject when surface temperature to 27 degree centigrade, according to required optical filter size difference, injection rate IR is also different.Substrate becomes 165 degree angles during injection with surface level, and along the rotation of glass substrate center, rotating speed is 180 rev/mins simultaneously.Because the existing even moisture film of one deck of substrate surface, so photoresists can evenly spread along moisture film, the final light-sensitive surface that forms also can compare evenly.After treating the photoresists injection and evenly being coated in glass baseplate surface, carry out drying, temperature increase is too not fast when dry, avoids base plate glass to burst.The drying rear surface temperature that finishes is controlled at about 68 degrees centigrade.
3. expose and developing process.The glass substrate that has been coated with photoresists will expose, light by stopping of graphite black matrix striped on the motherboard optical filter be mapped on the new glass of color filter substrate with photoresists react form and the motherboard optical filter on the same photoresists striped of graphite striped.The error that occurs because light path increases in order to reduce adopts film that the method for film is exposed, and promptly the motherboard optical filter has the one side of film to make progress, and new filter sheet base plate has face to be placed on the motherboard optical filter downwards.The face of two optical filters sticks together.Process conditions are 30 degrees centigrade of 1. exposed temperature during exposure: 2. exposure illumination 0.850mw/cm
23. the time shutter is 3 seconds.Behind the end exposure by illumination to partially hardened attached to glass baseplate surface, carry out development treatment then, have face spray developing water to clean with the pressure of 0.2MP to glass substrate, not by illumination to the photoresists part will be washed off.The composition of developing water is 42 degrees centigrade a pure water.Carry out drying after same development is finished, temperature is controlled at about 50 degrees centigrade.
4. graphite applying, etching and developing process.The glass substrate of finishing the photoresists development carries out graphite applying, the glass substrate horizontal positioned has face downward, and graphite liquid sprays the injection face from bottom to top, glass substrate evenly spreads graphite along the central shaft rotation simultaneously, and surface temperature was at 43 degrees centigrade when graphite injected.Carry out drying after graphite applying finishes, stop drying after graphite liquid solidifies, surface temperature control is at 58 degrees centigrade.Base plate glass after the graphite applying drying finished is put into etching liquid immediately and is carried out etching, and the photoresists of sclerosis attached to glass baseplate surface are eroded, and the graphite that applies on the related photoresists also can and then come off.The glass surface directly graphite of coating then can stay.Etching time is between 75 seconds.Etching liquid adopts sodium hypochlorite and the water of volume ratio 1:1 formulated.Etching time inadequately then photoresists can all do not etched away, overlong time then can also can etch away the graphite of glass baseplate surface.The etching back that finishes is cleaned with the developing water of pressure 1.0mp the intact back residuals of etching is rinsed out.At last the graphite striped on the glass substrate is shaped fully carrying out primary drying, so far optical filter turns over to scribe fully and finishes.
Embodiment 2:
1. the glass of color filter substrate is cleaned: glass substrate is the optical glass that thickness is 1.6mm, to clean it earlier before turning over quarter, first during cleaning with 10 milliliters of detergent washings, with 10 gram strontium oxide strontias glass surface is carried out polishing then, then clean with 10 milliliters of washing agent again, dry up with the 0.2mp pressure-air with the clean back of a large amount of deionized water rinsings at last;
2, glass substrate is carried out photoresists to be injected: take the wet film method to inject when injecting photoresists, before being coated with photoresists, earlier to the pure water of 32 degrees centigrade of the face sprays that will film, substrate is rotated in the surface and forms the layer of even moisture film along the center simultaneously, carrying out photoresists when surface temperature to 28 degree centigrade injects, injection rate IR is 55 milliliters, substrate becomes 170 degree angles during injection with surface level, rotate along the glass substrate center simultaneously, rotating speed is 185 rev/mins, after treating the photoresists injection and evenly being coated in glass baseplate surface, carries out drying, baking temperature is 75 degrees centigrade, and the drying rear surface temperature that finishes is controlled at 70 degrees centigrade;
3. expose and developing process: the glass substrate that has been coated with photoresists will expose, adopt film that the method for film is exposed, be that the motherboard optical filter has the one side of film to make progress, new filter sheet base plate has face to be placed on the motherboard optical filter downwards, the face of two optical filters sticks together, 31 degrees centigrade of exposed temperature: exposure illumination 0.850 ± 0.050mw/cm
2Time shutter is 3 ± 0.5 seconds, arrived partially hardened attached to glass baseplate surface by illumination behind the end exposure, carry out development treatment then, pressure with 0.20MP has face spray developing water to clean to glass substrate, not by illumination to photoresists parts will be washed off, the composition of developing water is 42 degrees centigrade a pure water, carries out drying after same development is finished, and temperature is controlled at 52 degrees centigrade;
4. graphite applying, etching and developing process: the glass substrate of finishing the photoresists development carries out graphite applying, the glass substrate horizontal positioned, there is face downward, graphite liquid sprays the injection face from bottom to top, glass substrate evenly spreads graphite along the central shaft rotation simultaneously, surface temperature was at 43 degrees centigrade when graphite injected, after finishing, graphite applying carries out drying, temperature range is 65 degrees centigrade, after solidifying, graphite liquid stops drying, surface temperature control is at 58 degrees centigrade, base plate glass after the graphite applying drying finished is put into etching liquid immediately and is carried out etching, and the photoresists of sclerosis attached to glass baseplate surface are eroded, and the graphite that applies on the related photoresists also can and then come off, the glass surface directly graphite of coating then can stay, etching time is between 90 seconds, and etching liquid adopts sodium hypochlorite and the water of volume ratio 1:1 formulated, and the etching back that finishes is cleaned with the developing water of pressure 1.0mp the intact residuals afterwards of etching is rinsed out;
At last the graphite striped on the glass substrate is shaped fully carrying out 55 degrees centigrade of primary dryings, so far optical filter turns over to scribe fully and finishes.
Claims (1)
1. optical filter copy process method is characterized in that step is as follows:
1) the glass of color filter substrate is cleaned: use 5-10 milliliter detergent washing during cleaning earlier, with 5-10 gram strontium oxide strontia glass surface is carried out polishing then, then clean with 5-10 milliliter washing agent again, dry up with the 0.2mp pressure-air with the clean back of a large amount of deionized water rinsings at last;
2) glass substrate being carried out photoresists injects: take the wet film method to inject when injecting photoresists, before being coated with photoresists, earlier to the pure water of 28-32 degree centigrade of the face spray that will film, substrate is rotated in the surface and forms the layer of even moisture film along the center simultaneously, carrying out photoresists during to 26-28 degree centigrade in surface temperature injects, injection rate IR is the 45-55 milliliter, substrate becomes 160-170 degree angle during injection with surface level, rotate along the glass substrate center simultaneously, rotating speed is 175-185 rev/min, after treating the photoresists injection and evenly being coated in glass baseplate surface, carries out drying, baking temperature is 75 ± 5 degrees centigrade, and the drying rear surface temperature that finishes is controlled at 68 ± 2 degrees centigrade;
3) exposure and developing process: the glass substrate that has been coated with photoresists will expose, adopt film that the method for film is exposed, be that the motherboard optical filter has the one side of film to make progress, new filter sheet base plate has face to be placed on the motherboard optical filter downwards, the face of two optical filters sticks together, 30 ± 2 degrees centigrade of exposed temperature: exposure illumination 0.850 ± 0.050mw/cm
2Time shutter is 3 ± 0.5 seconds, arrived partially hardened attached to glass baseplate surface by illumination behind the end exposure, carry out development treatment then, pressure with 0.18-0.22mp has face spray developing water to clean to glass substrate, not by illumination to photoresists parts will be washed off, the composition of developing water is 42 ± 2 degrees centigrade a pure water, carries out drying after same development is finished, and temperature is controlled at 50 ± 3 degrees centigrade;
4) graphite applying, etching and developing process: the glass substrate of finishing the photoresists development carries out graphite applying, the glass substrate horizontal positioned, there is face downward, graphite liquid sprays the injection face from bottom to top, glass substrate evenly spreads graphite along the central shaft rotation simultaneously, surface temperature was at 43 degrees centigrade when graphite injected, after finishing, graphite applying carries out drying, temperature range is 63 ± 2 degrees centigrade, after solidifying, graphite liquid stops drying, surface temperature control is at 58 degrees centigrade, base plate glass after the graphite applying drying finished is put into etching liquid immediately and is carried out etching, and the photoresists of sclerosis attached to glass baseplate surface are eroded, and the graphite that applies on the related photoresists also can and then come off, the glass surface directly graphite of coating then can stay, etching time is between 75 seconds～90 seconds, and etching liquid adopts 1: 1 sodium hypochlorite of volume ratio and water formulated, and the etching back that finishes is cleaned with the developing water of pressure 1.0mp the intact residuals afterwards of etching is rinsed out;
Last carry out primary drying 50-60 degree centigrade again the graphite striped on the glass substrate is shaped fully, so far optical filter turns over to scribe fully and finishes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101509954A CN101382614B (en) | 2008-09-16 | 2008-09-16 | Optical filter copy process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101509954A CN101382614B (en) | 2008-09-16 | 2008-09-16 | Optical filter copy process |
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| Publication Number | Publication Date |
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| CN101382614A CN101382614A (en) | 2009-03-11 |
| CN101382614B true CN101382614B (en) | 2010-09-08 |
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| CN2008101509954A Expired - Fee Related CN101382614B (en) | 2008-09-16 | 2008-09-16 | Optical filter copy process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102632460A (en) * | 2012-04-18 | 2012-08-15 | 邓耀辉 | Manufacturing method for cover glass lens |
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Granted publication date: 20100908 Termination date: 20130916 |