CN101373342B - Acidic stripping liquid and preparing method thereof - Google Patents

Acidic stripping liquid and preparing method thereof Download PDF

Info

Publication number
CN101373342B
CN101373342B CN200810155128XA CN200810155128A CN101373342B CN 101373342 B CN101373342 B CN 101373342B CN 200810155128X A CN200810155128X A CN 200810155128XA CN 200810155128 A CN200810155128 A CN 200810155128A CN 101373342 B CN101373342 B CN 101373342B
Authority
CN
China
Prior art keywords
weight
concentration
sulfuric acid
stripping liquid
hydrogen peroxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200810155128XA
Other languages
Chinese (zh)
Other versions
CN101373342A (en
Inventor
殷福华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangyin Jianghua Microelectronic Material Co., Ltd.
Original Assignee
Jiangyin Jianghua Microelectronic Material Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangyin Jianghua Microelectronic Material Co Ltd filed Critical Jiangyin Jianghua Microelectronic Material Co Ltd
Priority to CN200810155128XA priority Critical patent/CN101373342B/en
Publication of CN101373342A publication Critical patent/CN101373342A/en
Application granted granted Critical
Publication of CN101373342B publication Critical patent/CN101373342B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The invention relates to an acidic peeling liquid, which is prepared by synthesis after reaction of sulphuric acid and hydrogen dioxide used as raw materials., and is characterized in that ethylene diamine tetraacetic acid with concentration of 0.3-1.0 wt percent is contained in the prepared solution. The invention further relates to a method for preparing the acidity peeling liquid. The invention has the advantages that the stability of products is high, preserves the products for a long time, and is suitable for mass industrial production.

Description

A kind of acidic stripping liquid and preparation method thereof
One, technical field
The present invention relates to a kind of stripper, relate in particular to a kind of acidic stripping liquid and preparation method thereof.
Two, technical background
The light processing procedure that is used for integrated circuit technology and semiconductor technology removes dry method and removes photoresist/and crosslinked residue after the etching and the acidic stripping liquid of sidewall high molecular polymer are colourless transparent liquid, 290 ℃ of boiling points, density (20 ℃) is 1.82 ± 0.01g/ml, uses the product percent of pass and the quality that can effectively improve producer behind this product.At present acidic stripping liquid is that raw material reacts synthetic and makes with sulfuric acid and hydrogen peroxide; There is following shortcoming in this acidic stripping liquid: because the synthetic reaction of sulfuric acid and hydrogen peroxide is reversible reaction, and the acidic stripping liquid activity height, the poor stability that make, the holding time of its product is just short, makes the acidic stripping liquid can only now-making-now-using; Otherwise the acidic stripping liquid that makes is along with the growth of holding time, its effective constituent can reduce because of backward reaction, thereby effect is peeled off in influence, thereby the detachment rate of product is descended greatly and inhomogeneous, can't reach the effect of peeling off fully thus, thereby the production of producer is used in influence.
Three, technology contents
At above-mentioned shortcoming, the object of the present invention is to provide long acidic stripping liquid of a kind of good stability and holding time.
Technology contents of the present invention is, a kind of acidic stripping liquid, and it is that raw material reacts synthetic and makes by sulfuric acid and hydrogen peroxide; It is characterized in that containing in the solution that makes ethylenediamine tetraacetic acid (EDTA), its concentration is 0.3~1.0 weight %.
In above-mentioned acidic stripping liquid, peroxosulphuric concentration is 8.5~10.3 weight %, and sulfuric acid concentration is 85.0~95.0 weight %, concentration of hydrogen peroxide 0.5~1.0 weight %.
Another object of the present invention is to improve the preparation method of above-mentioned acidic stripping liquid.
Technology contents of the present invention is, a kind of preparation method of acidic stripping liquid, and it comprises the steps:
(1), adding concentration earlier in reactor is sulfuric acid and the EDTA of 98 weight %, the addition of EDTA is 0.08~0.12% of a sulfuric acid weight, under agitation slowly add the hydrogen peroxide that concentration is 31 weight %, and control temperature of reaction at 45~55 ℃, the hydrogen peroxide of its adding and the volume ratio of sulfuric acid are 1:3~5;
(2), add hydrogen peroxide and at normal temperatures temperature control, under agitation add 0.25~1.0% EDTA of sulfuric acid weight again, make it suppress backward reaction;
(3), the above-mentioned solution that makes is filtered through the filtrator of 0.5 μ m, particle diameter is greater than harmful particle of 0.5 μ m in the solution to remove, and acidic stripping liquid gets product.
The acidic stripping liquid that the present invention produces has added stabilizing agent EDTA on the basis of original technology, the principle of work of stabilizing agent: because metallic ion has the effect of catalytic decomposition to superoxide, the feasible peroxosulphuric instability that makes of minor metallic element in the product, after adding stabilizing agent EDTA, because EDTA energy complexing and separating metal ion, metallics can't directly be contacted with peroxosulphuric, thereby improve the stability of product, make it under the impregnable prerequisite of result of use, improve the degree of stability of product, make that product is the longest can be preserved 6 months, avoided this product now-making-now-using of former technology, this method can be applicable to large-scale production.
The present invention adopts in system peroxosulphuric processing procedure and adds stabilizing agent at twice, plays catalytic action for the first time, plays stabilization for the second time.
The advantage that the present invention is compared with prior art had is:
1, the stability of product is improved, and product can obtain preserving in the long period.
2, the effect of peeling off of product is not subjected to very big the influence after preserving the long period, and the present invention is suitable for large-scale industrial production.
Four, specific embodiment
The invention is further illustrated by the following examples, but be not limited to for embodiment.
Concentration is the sulfuric acid of 98 weight %, electron level, its index such as table 1
Classification Electron level is in %
Content (H 2SO 4),% 97.0±1.0
Colourity (Hazen), max 10
Ignition residue, max 5000
Chloride (Cl), max 200
Nitrate (NO 3),max 200
Ammonium salt (NH 4),max 1000
Reduction potassium permanganate material is (with SO 2Meter), max 2000
Arsenic (As), max 10
Copper (Cu), max 100
Iron (Fe), max 100
Plumbous (Pb), max 100
Sodium (Na), max 500
Particle 〉=1.0 μ m, max 25
Table 1
Concentration is the hydrogen peroxide of 31 weight %, electron level, its index such as table 2
Classification Electron level is in %
Content (H 2O 2),% 31.0±1.0
Colourity (Hazen), max 10
Free acid is (with H +The mmol/100g meter), max 0.06
Evaporation residue, max 10000
Chloride (Cl), max 500
Nitrogen compound (N), max 4000
Phosphate (PO 4),max 2000
Sulfate (SO 4),max 2000
Arsenic (As), max 50
Copper (Cu), max 20
Iron (Fe), max 100
Plumbous (Pb), max 20
Nickel (Ni), max 20
Sodium (Na), max 500
Particle 〉=1.0 μ m, max 25
Table 2
EDTA, electron level, solid, its content 99.0%, Shanghai three little Industrial Co., Ltd.s produce.
In example 1, the sulfuric acid adding reactor, add EDTA150g, add the 20L hydrogen peroxide in cooling with under stirring, and control temperature of reaction below 50 ℃ with 80L content 98%; After adding, hydrogen peroxide is cooled to the EDTA that adds 400g under the normal temperature, stir after 20 minutes, the potpourri that the makes filtrator through 0.5 μ m is filtered, to remove in the potpourri particle diameter greater than harmful particle of 0.5 μ m, promptly get acidic stripping liquid, its EDTA concentration is 0.33 weight %.
In example 2, the sulfuric acid adding reactor, add EDTA150g, add the 20L hydrogen peroxide in cooling with under stirring, and control temperature of reaction below 50 ℃ with 80L content 98%; After adding, hydrogen peroxide is cooled to the EDTA that adds 550g under the normal temperature, stir after 20 minutes, the potpourri that the makes filtrator through 0.5 μ m is filtered, to remove in the potpourri particle diameter greater than harmful particle of 0.5 μ m, promptly get acidic stripping liquid, its EDTA concentration is 0.42 weight %.
In example 3, the sulfuric acid adding reactor, add EDTA150g, add the 20L hydrogen peroxide in cooling with under stirring, and control temperature of reaction below 50 ℃ with 80L content 98%; After adding, hydrogen peroxide is cooled to the EDTA that adds 1000g under the normal temperature, stir after 20 minutes, the potpourri that the makes filtrator through 0.5 μ m is filtered, to remove in the potpourri particle diameter greater than harmful particle of 0.5 μ m, promptly get acidic stripping liquid, its EDTA concentration is 0.68 weight %.
In example 4, the sulfuric acid adding reactor, add EDTA150g, add the 20L hydrogen peroxide in cooling with under stirring, and control temperature of reaction below 50 ℃ with 80L content 98%; After adding, hydrogen peroxide is cooled to the EDTA that adds 1400g under the normal temperature, stir after 20 minutes, the potpourri that the makes filtrator through 0.5 μ m is filtered, to remove in the potpourri particle diameter greater than harmful particle of 0.5 μ m, promptly get acidic stripping liquid, its EDTA concentration is EDTA concentration 0.92 weight %.
The physical index data such as the table 3 of example 1~4:
Figure G200810155128XD00051

Claims (2)

1. acidic stripping liquid, it is that raw material reacts synthetic and makes by sulfuric acid and hydrogen peroxide; It is characterized in that containing ethylenediamine tetraacetic acid in the solution that makes, its concentration is 0.3~1.0 weight %; Peroxosulphuric concentration is 8.5~10.3 weight % in the acidic stripping liquid, and sulfuric acid concentration is 85.0~95.0 weight %, concentration of hydrogen peroxide 0.5~1.0 weight %.
2. the preparation method of acidic stripping liquid according to claim 1, it comprises the steps:
(1), adding concentration earlier in reactor is sulfuric acid and the EDTA of 98 weight %, the addition of EDTA is 0.08~0.12% of a sulfuric acid weight, under agitation slowly add the hydrogen peroxide that concentration is 31 weight %, and control temperature of reaction at 45~55 ℃, the hydrogen peroxide of its adding and the volume ratio of sulfuric acid are 1: 3~5;
(2), add hydrogen peroxide and at normal temperatures temperature control, under agitation add 0.25~1.0% EDTA of sulfuric acid weight again, make it suppress backward reaction;
(3), the above-mentioned solution that makes is filtered through the filtrator of 0.5 μ m, particle diameter is greater than harmful particle of 0.5 μ m in the solution to remove, and acidic stripping liquid gets product.
CN200810155128XA 2008-10-23 2008-10-23 Acidic stripping liquid and preparing method thereof Active CN101373342B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200810155128XA CN101373342B (en) 2008-10-23 2008-10-23 Acidic stripping liquid and preparing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200810155128XA CN101373342B (en) 2008-10-23 2008-10-23 Acidic stripping liquid and preparing method thereof

Publications (2)

Publication Number Publication Date
CN101373342A CN101373342A (en) 2009-02-25
CN101373342B true CN101373342B (en) 2011-03-02

Family

ID=40447563

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200810155128XA Active CN101373342B (en) 2008-10-23 2008-10-23 Acidic stripping liquid and preparing method thereof

Country Status (1)

Country Link
CN (1) CN101373342B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102402138A (en) * 2011-11-18 2012-04-04 深圳市华星光电技术有限公司 Method for manufacturing small-distance conducting wires

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1288589A (en) * 1998-11-12 2001-03-21 夏普株式会社 Novel detergent and cleaning method using it
CN1815363A (en) * 2006-03-01 2006-08-09 中国科学院上海微系统与信息技术研究所 Wet-method etching liquid for making phase change storage and its wet-method etching process
CN1896314A (en) * 2005-07-11 2007-01-17 佛山市顺德区汉达精密电子科技有限公司 Stabilized decoating liquid
CN101093363A (en) * 2006-06-23 2007-12-26 天津晶岭电子材料科技有限公司 Cleaning liquid in use for removing photoresist on integrate circuit
CN101171551A (en) * 2005-05-06 2008-04-30 马林克罗特贝克公司 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1288589A (en) * 1998-11-12 2001-03-21 夏普株式会社 Novel detergent and cleaning method using it
CN101171551A (en) * 2005-05-06 2008-04-30 马林克罗特贝克公司 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
CN1896314A (en) * 2005-07-11 2007-01-17 佛山市顺德区汉达精密电子科技有限公司 Stabilized decoating liquid
CN1815363A (en) * 2006-03-01 2006-08-09 中国科学院上海微系统与信息技术研究所 Wet-method etching liquid for making phase change storage and its wet-method etching process
CN101093363A (en) * 2006-06-23 2007-12-26 天津晶岭电子材料科技有限公司 Cleaning liquid in use for removing photoresist on integrate circuit

Also Published As

Publication number Publication date
CN101373342A (en) 2009-02-25

Similar Documents

Publication Publication Date Title
JP7154861B2 (en) Methods for the synthesis of copper/copper oxide nanocrystals
EP3312142B1 (en) A preparation method of graphene from graphene oxide based on mixed acid system
US20080105085A1 (en) Method Of Production Of High Purity Silver Particles
CN103395780A (en) Method for reducing manganese content in graphene oxide
CN102090393A (en) Stable peroxyacetic acid disinfectant
DE102014207396A1 (en) Stabilized nitrogen-containing shell-coated lithium metal impressions and methods of making the same
EP3932905B1 (en) Method for purifying waste n-methyl-2-pyrrolidone mixture solution
CN101373342B (en) Acidic stripping liquid and preparing method thereof
CN102658002A (en) Method for absorbing and purifying hydrogen sulfide with EDTA (ethylene diamine tetraacetic acid) chelated iron copper compound system
CN114031105B (en) Treatment method of copper-containing etching waste liquid
KR102068477B1 (en) Method for purifying hydrogen peroxide solution using anion exchange resin and cation exchange resin
CN110683564B (en) Lithium hexafluorophosphate-containing mixture crystal and application thereof
KR100713662B1 (en) Manufacturing Process of Sphere Shape Silver Powder from Silver Scrap
JPS6365602B2 (en)
CN110980777B (en) Method for preparing purification additive and purification additive prepared by the method
CN1887861A (en) Prepn of alkyl amidopropyldimethyl amine oxide surfactant
CN102730759A (en) A preparing method for an ultra-pure ammonium tungstate
US2585185A (en) Process for production of copper powder having an average particle size of two microns
JPH0288424A (en) Method for purifying arsine
CN110562947A (en) Cationic metal impurity removing agent and application thereof
CN115487792A (en) Preparation method of magnetic activated carbon
US4149875A (en) Purification of nickel and cobalt metal powders by a caustic wash
CN105712463B (en) A kind of method of hydrazine hydrate in conversion waste water
JP2013036053A (en) Method for producing metal composite ultrafine particle
CN104591098A (en) Method for preparing novel sodium percarbonate

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: JIANGYIN JIANGHUA MICROELECTRONICS MATERIALS CO.,

Free format text: FORMER OWNER: YIN FUHUA

Effective date: 20110105

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 214423 NO.18, SHANQUAN ROAD, DEVELOPMENT ZONE, SANFANG LANE, ZHOUZHUANG TOWN, JIANGYIN CITY, JIANGSU PROVINCE TO: 214423 NO.18, SHANQUAN ROAD, DEVELOPMENT ZONE, SANFANGXIANG, ZHOUZHUANG TOWN, JIANGYIN CITY

TA01 Transfer of patent application right

Effective date of registration: 20110105

Address after: 214423 Jiangyin City Development Zone Zhouzhuang spring Sanfangxiang Town Road No. 18

Applicant after: Jiangyin Jianghua Microelectronic Material Co., Ltd.

Address before: 214423 Jiangsu province Jiangyin City Development Zone Zhouzhuang spring Sanfangxiang Town Road No. 18

Applicant before: Yin Fuhua

C14 Grant of patent or utility model
GR01 Patent grant