CN101355005A - Electron beam generating apparatus for generating flat-plate shape plasma - Google Patents
Electron beam generating apparatus for generating flat-plate shape plasma Download PDFInfo
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- CN101355005A CN101355005A CNA2008102230271A CN200810223027A CN101355005A CN 101355005 A CN101355005 A CN 101355005A CN A2008102230271 A CNA2008102230271 A CN A2008102230271A CN 200810223027 A CN200810223027 A CN 200810223027A CN 101355005 A CN101355005 A CN 101355005A
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- 238000010894 electron beam technology Methods 0.000 title claims abstract description 57
- 238000000605 extraction Methods 0.000 claims description 21
- 238000009413 insulation Methods 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 210000002381 plasma Anatomy 0.000 description 42
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000002784 hot electron Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
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- 238000004088 simulation Methods 0.000 description 1
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Abstract
The invention provides an electron beam generating device used for generating a flat plasma body, belonging to the technical field of electron beam formation. The electron beam generating device is characterized by comprising an insulating board and a grid mesh above the insulating board, wherein the insulating board is provided with an electrode array and a filament array which are formed by an electrode and a filament respectively; under the action of a grid mesh power supply, a first electron beam is formed between the grid mesh and a thermionic electrode; the plasma body is generated close to the grid mesh; under the action of a drawout electrode power supply, electrons in the plasma body are accelerated to form a second electron beam, and are transmitted into the electron beam input end of a flat plasma generator from a narrow slit in the middle of the drawout electrode. Under the action of a transverse magnetic field, the flat plasma body is formed along the incidence direction of the second electron beam. The electron beam generating device can generate a thermoelectron beam with large adjustability in section shape, position and parameter to be used for generating the flat plasma body.
Description
Technical field
The invention belongs to a kind of electron beam generating apparatus that is used to produce flat-plate shape plasma.
Background technology
Can on the ad-hoc location in space, produce plasma very important scientific meaning is arranged with definite shape.We can come the plasma of virtual space with it, research electromagnetic wave and the interaction principle of plasma and the behavior that electromagnetic wave is propagated in the plasma of different parameters, and this has significant values in fields such as Aero-Space, communication, national defence.
The method that produces plasma at low pressure (a few handkerchief to one hundred handkerchiefs) down generally includes direct-current discharge, interchange and radio frequency discharge, microwave discharge etc.They all are to add hot electron by generating an electromagnetic field in the space, and high energy electron and background gas molecular collision make its ionization and form plasma.Their total characteristics comprise:
The plasma disperse is in existing the space of electromagnetic field.Because air pressure is low, the mean free path of electronics is long, and plasma is difficult for forming border clearly.
If will make plasma present certain shape, generally need electrode and wall (conduction with non-conductive) to retrain, be difficult in free space and realize.The existence of wall influences electromagnetic wave propagation, and therefore the experimental study to microwave and plasma interaction causes difficulty.
The present invention adopts electron beam to produce flat-plate shape plasma.Electron beam with certain energy is injected in hypobaric background gas under the constraint in magnetic field, ionization by collision by electronics and gas molecule or atom forms plasma near the electron beam propagation path, be very suitable for the research of microwave and plasma interaction.Electron beam generating apparatus claimed structure wherein is simple, and controllability is good, is the critical component that produces flat-plate shape plasma.
Summary of the invention
The object of the present invention is to provide an electron beam generating apparatus that uses the hot cathode array to produce flat-plate shape plasma.
The invention is characterized in: institute's beam electrons bundle generating means contains: aperture plate, filament, insulation board, electrode, aperture plate power supply, extraction pole and extraction pole power supply, wherein: described insulation board, electrod-array that described electrode constitutes and the filament array that is made of the described filament that is installed between two adjacent described electrodes are installed, on two described electrodes that connecting described filament, pass to DC power supply; Described aperture plate is installed in the top of described insulation board; Described aperture plate power cathode and described electrod-array altogether, anodal and described aperture plate links to each other, thereby forms first electron beam between described aperture plate and described filament array, and then forms plasma near described aperture plate; Described extraction pole, there is narrow slit the centre, described extraction pole is positioned at described aperture plate top, this extraction pole connects the positive pole of described extraction pole power supply, and the negative pole of described extraction pole power supply links to each other with the positive pole of described aperture plate with described aperture plate power supply simultaneously, draws from described narrow slit thereby form second electron beam after making described electron beam generating apparatus with the electron bunch in the described plasma.Described electrod-array and filament array have formed an orthohexagonal hot cathode jointly.Described electron beam generating apparatus is connected to a flat-plate shape plasma generator, makes the output port of described second electron beam aim at the electron beam input port of described flat-plate shape plasma generator.
Electron beam generating apparatus described in the invention is simple in structure, and controllable parameters is good, and is easy to adjust.Use it can under low pressure, produce flat-plate shape plasma, and the plasma parameter that is produced also have excellent controllability with definite shape.Therefore, can simulate various space plasmas, be used to study the reflection and the absorption of plasma, have important use to be worth in fields such as Aero-Space, communication, national defence various frequency microwaves with it.
Description of drawings
Fig. 1, hot cathode array electronic bundle generating means structure and schematic diagram.Among the figure: 1, aperture plate; 2, filament; 3, insulation board; 4, electrode; 5, aperture plate power supply; 6, extraction pole power supply; 7, plasma; 8, extraction pole; 9, electron beam 2; 10, electron beam 1.
Fig. 2, hot cathode filament array of figure.Among the figure: 2, filament; 3, insulation board; 4, electrode.
The generation schematic diagram of Fig. 3, flat-plate shape plasma.Among the figure: 11, electron beam generating apparatus; 9, electron beam 2; 71,72, plasma; 12, background gas; 13, magnetic field.
Embodiment
The present invention is further described below in conjunction with accompanying drawing.
The structure of electron beam generating apparatus and principle sketch are as shown in Figure 1.Installing electrodes array on an aluminium oxide ceramics insulation board.Between two adjacent electrodes, filament is installed, is formed filament array.The shape of electrod-array and filament array determines as required, and influences the shape of formed electron beam 1.Aperture plate shape anode and the extraction pole that narrow slit is arranged are installed above hot cathode.Under certain low pressure, use the DC power supply heat filament, make its heat of emission electronics, hot electron is applied in the electric field acceleration between aperture plate anode and negative electrode then, to aperture plate motion and formation electron beam 1.The cross sectional shape of electron beam 1 is by the decision of hot cathode array, and electron density and energy are then by filament temperature and the decision of aperture plate voltage.If extraction pole is making alive not, then can form one deck plasma near the space aperture plate, the shape of plasma is identical with electron beam 1 shape, and the distance between air pressure, aperture plate voltage and aperture plate and filament array is depended in the position that occurs in the space.If apply the direct voltage that is higher than aperture plate voltage on extraction pole, then the electronics in the plasma can be drawn out, and passes the narrow slit on aperture plate and the extraction pole, and the electron beam 2 of formation and narrow slit shape approximation is injected in the background gas.
This method with hot cathode array generation electron beam is simple in structure, and the parameter adjustability is big.Particularly the shape of electron beam 1 and uniformity can be regulated by shape, enable possition and the filament temperature of control filament array.Fig. 2 is the electrode and the filament array structural representation of hot cathode array used in the present invention.Between each electrode of the electrod-array that is the regular hexagon distribution, filament is installed, is formed hot cathode filament array by shown in the figure.If make the temperature of all filaments all identical, then will near aperture plate, produce uniform plasma with hexagonal cross-section.By the electric current or the temperature of each filament in the array of controls, then can regulate the shape and the even shape of plasma, conveniently carry out the simulation of different parameters plasma.
Fig. 3 is the schematic diagram that produces flat-plate shape plasma with this electron beam generating apparatus.Electron beam generating apparatus produces the electron beam with definite shape, injects then in hypobaric background gas.High energy electron and gas molecule collision make gas molecule or atomic ionization, thereby produce flat-plate shape plasma near the propagation path of electron beam.Because electron beam has directivity, therefore be easy to make plasma have specific shape by the cross sectional shape of controlling electron beam.For preventing to disperse when electron beam is in entering background gas, can on electron beam path, apply and come about beam electrons along the D.C. magnetic field of beam direction.Parameters such as the electron temperature of plasma, electron density, shape can realize by the parameter (density of electron beam, electron energy, shape etc.) and the background gas air pressure of controlling electron beam.
Implementation process: system is in the background gas of certain air pressure.Open DC power supply then,, make filament heat of emission electronics to the filament heating.On aperture plate, apply certain positive voltage, quicken hot electron and make it obtain energy, and motion forms electron beam 1 to the aperture plate place.Like this, high energy electron makes background gas ionization, produces the plasma of definite shape near aperture plate.By parameters such as control filament temperature, enable possition, aperture plate voltage, background gas air pressure, can regulate the parameters such as density, temperature, uniformity, shape of plasma.On extraction pole, apply certain voltage, electronics is pulled out from plasma, form electron beam 2, under magnetically confined, inject in the background gas, form flat-plate shape plasma.
Claims (3)
1. be used to produce the electron beam generating apparatus of flat-plate shape plasma, it is characterized in that, described electron beam generating apparatus contains: aperture plate, filament, insulation board, electrode, aperture plate power supply, extraction pole and extraction pole power supply, wherein:
Described insulation board is equipped with electrod-array that described electrode constitutes and the filament array that is made of the described filament that is installed between two adjacent described electrodes, is connecting described filament at two and is getting on the described electrode and pass to DC power supply;
Described aperture plate is installed in the top of described insulation board;
Described aperture plate power cathode and described electrod-array altogether, anodal and described aperture plate links to each other, thereby forms first electron beam between described aperture plate and described filament array, and then forms plasma near described aperture plate;
Described extraction pole, there is narrow slit the centre, described extraction pole is positioned at described aperture plate top, this extraction pole connects the positive pole of described extraction pole power supply, and the negative pole of described extraction pole power supply links to each other with the positive pole of described aperture plate with described aperture plate power supply simultaneously, draws from described narrow slit thereby form second electron beam after making described electron beam generating apparatus with the electron bunch in the described plasma.
2. the electron beam generating apparatus that is used to produce flat-plate shape plasma according to claim 1 is characterized in that: described electrod-array and filament array have formed an orthohexagonal hot cathode jointly.
3. the electron beam generating apparatus that is used to produce flat-plate shape plasma according to claim 1, it is characterized in that: described electron beam generating apparatus is connected to a flat-plate shape plasma generator, makes the output port of described second electron beam aim at the electron beam input port of described flat-plate shape plasma generator.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2008102230271A CN100552867C (en) | 2008-09-26 | 2008-09-26 | Be used to produce the electron beam generating apparatus of flat-plate shape plasma |
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| CNB2008102230271A CN100552867C (en) | 2008-09-26 | 2008-09-26 | Be used to produce the electron beam generating apparatus of flat-plate shape plasma |
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| CN101355005A true CN101355005A (en) | 2009-01-28 |
| CN100552867C CN100552867C (en) | 2009-10-21 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102642913A (en) * | 2012-04-28 | 2012-08-22 | 清华大学 | Atmospheric pressure liquid membrane type bubble discharge plasma reaction device |
| CN103262220A (en) * | 2010-12-16 | 2013-08-21 | 日立造船株式会社 | Ozone and plasma generation using electron beam technology |
| CN105321784A (en) * | 2014-07-16 | 2016-02-10 | 中国科学院空间科学与应用研究中心 | Electron beam current source device and method for providing electron beam current based on same |
| CN105704902A (en) * | 2014-11-27 | 2016-06-22 | 中国科学院空间科学与应用研究中心 | Combined magnetic confinement linear hollow cathode discharge device |
-
2008
- 2008-09-26 CN CNB2008102230271A patent/CN100552867C/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103262220A (en) * | 2010-12-16 | 2013-08-21 | 日立造船株式会社 | Ozone and plasma generation using electron beam technology |
| CN102642913A (en) * | 2012-04-28 | 2012-08-22 | 清华大学 | Atmospheric pressure liquid membrane type bubble discharge plasma reaction device |
| CN102642913B (en) * | 2012-04-28 | 2013-07-03 | 清华大学 | Atmospheric pressure liquid membrane type bubble discharge plasma reaction device |
| CN105321784A (en) * | 2014-07-16 | 2016-02-10 | 中国科学院空间科学与应用研究中心 | Electron beam current source device and method for providing electron beam current based on same |
| CN105704902A (en) * | 2014-11-27 | 2016-06-22 | 中国科学院空间科学与应用研究中心 | Combined magnetic confinement linear hollow cathode discharge device |
| CN105704902B (en) * | 2014-11-27 | 2018-02-16 | 中国科学院空间科学与应用研究中心 | A kind of combined magnetic constrains linear hollow cathode discharge device |
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| CN100552867C (en) | 2009-10-21 |
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