CN101353777A - Spherical parts batch plasma based ion injection method and apparatus thereof - Google Patents
Spherical parts batch plasma based ion injection method and apparatus thereof Download PDFInfo
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- CN101353777A CN101353777A CNA2008101371304A CN200810137130A CN101353777A CN 101353777 A CN101353777 A CN 101353777A CN A2008101371304 A CNA2008101371304 A CN A2008101371304A CN 200810137130 A CN200810137130 A CN 200810137130A CN 101353777 A CN101353777 A CN 101353777A
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Abstract
The invention discloses a spherical-component batch plasma-based ion implantation method and a device thereof, relating to a spherical-component plasma-based ion implantation method and a device thereof and aiming at the problem that the plasma-based ion implantation of spherical components which is carried out to spherical components by adopting a device and a method of rotary-workpiece plasma-based ion implantation is uneven and can not realize the uniform treatment effect of the spherical components of the same batch. The method of the invention comprises the following steps: the spherical components are put in a circular groove of an oblique round plate, the rotation of which is controlled by a driving motor and a gear; the rotation of the driving motor is stopped first, a high-voltage pulse power source is turned on, and after time delay by the high-voltage pulse power source, plasma-based ion implantation is carried out to the spherical components; and the starting and stopping of the driving motor and the high-voltage pulse power source are kept synchronously switched. The device of the invention comprises: a synchronous switching controller provides the driving motor and the high-voltage pulse power source with power by No. 1 and No.2 power sources; an output shaft of the driving motor is fixedly provided with a driving gear which is meshed with a driven gear. The device and the method can uniformly implant the surface irons of the spherical components.
Description
Technical field
The present invention relates to a kind of bulb plasma based ion injection method and device thereof, belong to plasma based ion implantttion technique field.
Background technology
The plasma based ion implantttion technique can realize the low-temperature surface modification to precision component, be characterized in not changing the dimensional precision of processed part, and temperature can be controlled at room temperature or a little more than room temperature, and can all surface that be in the plasma environment be injected simultaneously, therefore, this technology can realize batch processing.The ultimate principle of this technology is to form plasma space around workpiece, after the negative high voltage pulse is applied to workpiece, plasma body is subjected to the electric field action on the workpiece, around workpiece, form a positive ion sheath layer, positive ion in the sheath layer is subjected to the effect of electrical forces to be injected into workpiece surface from all directions simultaneously, forms so-called comprehensive ion implantation.But for the complicated shape part, can't form fully uniformly plasma based ion and inject, its major cause has two: first plasma body can cause ion density difference corresponding to workpiece surface different positions place in inhomogeneous in spatial distribution; It two is that the workpiece surface shape can cause that the inhomogeneous of electric field distribution on every side, particularly radius-of-curvature change.Though bulb surface curvature radius is identical, be subjected to the influence of supporter, the electric field on surface is also away from uniform distribution.Usually people adopt the plasma based ion injection device of turning of work piece and method to solve ion implantation uneven problem, above-mentioned described apparatus and method are more effective to the part that rotating shaft is arranged, but for bulb, it is very complicated to form evenly ion implantation rolling scheme, and also has the implantation homogeneity problem.Because what adopt when plasma based ion is injected is pulsed voltage, small beating can cause between workpiece and the supporter and produce electric arc in the rolling process, this electric arc can not be ignored for the damage of the precision component that resembles bearing steel ball one class, therefore on one side ion implantation, on one side the scheme of rotating and infeasible.In addition, above-mentioned described apparatus and method can't realize the purpose with a collection of bulb treatment effect unanimity.
Summary of the invention
The objective of the invention is bulb to be carried out plasma based ion and inject to exist and inject inhomogeneously, and can't realize problem with a collection of bulb treatment effect unanimity for the plasma based ion injection device that solves existing turning of work piece and method.
A kind of bulb batch plasma based ion injection method of the present invention is finished like this: the identical bulb of a plurality of diameter D is placed in the annular groove of inclined plate, the central axis of described inclined plate and the angle α between the vertical direction are 5 °-30 °, the rotation of inclined plate is by drive-motor and transmission mechanism control, the start and stop of described drive-motor and high-voltage pulse power source are by synchronous switch controller control, earlier bulb is applied high-voltage pulse, plasma based ion is carried out on the surface of bulb to be injected, injection length is after the 5-10min, stop to apply high-voltage pulse, start drive-motor simultaneously, the rotation of inclined plate makes the part bulb cross the interior lower-most point of annular groove that is rolled into inclined plate behind the vertex in the annular groove of inclined plate by deadweight, the rolling process of bulb carries out at random, the rotating speed of inclined plate is 1-10rpm/min, the single revolution time is 3-30s, afterwards, stopping drive-motor rotating, open high-voltage pulse power source simultaneously, behind high-voltage pulse power source time-delay 5-10s, beginning that plasma based ion is carried out on the bulb surface injects, the single injection length is 5-10min, the start and stop of drive-motor and high-voltage pulse power source keep switching synchronously, till all bulb surface ions inject evenly.
The batch plasma based ion implantation apparatus of a kind of bulb of the present invention comprises vacuum chamber, plasma producing apparatus, high-voltage pulse power source, stationary work-table, transmission mechanism, drive-motor, cushion block and electrode; Described ion implantation apparatus also comprises power supply No. one, No. two power supplys, synchronous switch controller and inclined plate, described transmission mechanism is by driving toothed gear, follower gear and thrust block are formed, a control output end of described synchronous switch controller is connected with the controlled end of a power supply, another control output end of switch controller is connected with the controlled end of No. two power supplys synchronously, a described power supply provides power supply to drive-motor, No. two power supply provides power supply to high-voltage pulse power source, the bottom face that vacuum chamber is passed in the upper end of described drive-motor output shaft is contained in the vacuum chamber, be contained on the drive-motor output shaft in the vacuum chamber and be fixed with driving toothed gear, described driving toothed gear and the follower gear engagement that is obliquely installed, be fixed with the inclined plate identical on the upper surface of described follower gear with its vergence direction, be provided with thrust block between the lower surface of follower gear and the stationary work-table, described thrust block is spacing with the cushion block that is arranged on the stationary work-table by the lower surface of follower gear, the output electrode of high-voltage pulse power source is switched on to stationary work-table, described plasma producing apparatus introduce vacuum chamber partly be arranged in the vacuum chamber and be positioned at inclined plate directly over.
The present invention has following beneficial effect: one, method of the present invention is that bulb is placed in the inclined plate with certain inclination angle, utilize the geneva motion of inclined plate, adjust the position of bulb, make its stochastic distribution, thereby reach the ion that whole bulb surface energy evenly receives injection.The geneva motion of inclined plate and high-voltage pulse power source start to be realized synchronously, prevents to beat the arc phenomenon because bulb rolls to cause.Two, device of the present invention can realize the spherical work-piece of different size evenly ion implantation, and guarantee the spherical work-piece surface not because moment arc-over and ablating, guarantee the dimensional precision of accurate bulb, increase substantially the work-ing life of part.Three, apparatus and method of the present invention can be carried out plasma based ion to bulb and evenly injected, and can realize the purpose with a collection of bulb treatment effect unanimity.
Description of drawings
Fig. 1 is the pilot circuit figure of synchronous switch controller 6 of the present invention, Fig. 2 is the one-piece construction front view of ion implantation apparatus of the present invention, Fig. 3 front view that to be inclined plate 2 be assembled together with thrust block 1, cushion block 12 and stationary work-table 10, Fig. 4 are that the A of Fig. 3 is to view.
Embodiment
Embodiment one: present embodiment is described in conjunction with Fig. 2～Fig. 4, the ion injection method of present embodiment is finished like this: the bulb 1 that a plurality of diameter D are identical is placed in the annular groove 3 of inclined plate 2, the central axis of described inclined plate 2 and the angle α between the vertical direction are 5 °-30 °, the rotation of inclined plate 2 is by drive-motor 11 and transmission mechanism control, the start and stop of described drive-motor 11 and high-voltage pulse power source 5 are by synchronous switch controller 6 controls, earlier bulb 1 is applied high-voltage pulse, plasma based ion is carried out on the surface of bulb 1 to be injected, injection length is after the 5-10min, stop to apply high-voltage pulse, start drive-motor 11 simultaneously, the rotation of inclined plate 2 makes part bulb 1 cross behind the vertex in the annular groove 3 of inclined plate 2 the interior lower-most point of annular groove 3 that is rolled into inclined plate 2 by deadweight, the rolling process of bulb 1 carries out at random, the rotating speed of inclined plate 2 is 1-10rpm/min, the single revolution time is 3-30s, afterwards, stopping drive-motor 11 rotates, open high-voltage pulse power source 5 simultaneously, behind high-voltage pulse power source 5 time-delay 5-10s, beginning that plasma based ion is carried out on bulb 1 surface injects, the single injection length is 5-10min, the start and stop of drive-motor 11 and high-voltage pulse power source 5 keep switching synchronously, till all bulb 1 surface ions inject evenly.
The high-voltage pulse power source 5 of present embodiment is a prior art, can be that May 25, publication number in 1994 are that the associated components that is called in the application for a patent for invention of " metal plasma source ion injection method and device " of CN 1087131A, name is identical with patent disclosure day also.
Embodiment two: in conjunction with Fig. 3 and Fig. 4 present embodiment is described, the diameter D of the bulb 1 of present embodiment is 3-50mm, can carry out surface ion to the bulb 1 of different diameter and inject processing.Other method steps is identical with embodiment one.
Embodiment three: in conjunction with Fig. 3 and Fig. 4 present embodiment is described, the central axis of the inclined plate 2 of present embodiment and the angle α between the vertical direction are 5 °-30 °, can guarantee that bulb 1 surface ion injects uniformity.Other method steps is identical with embodiment one.
Embodiment four: present embodiment is described in conjunction with Fig. 2～Fig. 4, the maximum cross-section area of the bulb 1 in the annular groove that is placed on inclined plate 23 of present embodiment accounts for below 3/4 of annular groove 3 floorages of inclined plate 2, is beneficial to the uniform ion injection is carried out on the surface of bulb 1.Other method steps is identical with embodiment one.
Embodiment five: present embodiment is described in conjunction with Fig. 1, the synchronous switch controller 6 of present embodiment is made up of 3 JS14S time relays and pilot circuit, utilize two groups of delayed contacts of JS14S to realize time-delay control, its control process is: the working hour t1 that high-voltage pulse power source 5 is set is by 1 control of very first time relay J, drive-motor 11 rotation time t2 are controlled by second time relay J2, the start-up time delay t3 of high-voltage pulse power source 5 is controlled by the 3rd time relay J3, and ion implantation having a rest by following interprocedual carried out:
One, power turn-on switch Q, the pilot circuit power connection, one of them normally closed contact J1-1 of very first time relay J 1 is in closure state, the relay K1 of high-voltage pulse power source 5 connects, apply high-voltage pulse, very first time relay J 1 is connected, and injection length simultaneously picks up counting; Two, when the time is t1, one of them normally closed contact J1-1 of very first time relay J 1 becomes open circuit by closure, the relay K1 of high-voltage pulse power source 5 disconnects, stop to apply high-voltage pulse, the normally opened contact J1-2 closure of very first time relay J 1, the relay K2 of drive-motor 11 connects, and stationary work-table 10 rotates, second time relay J2 connects simultaneously, and rotation time picks up counting; Three, when second time relay J2 timing during to t2, the normally closed contact J2-1 of second time relay J2 changes open circuit into by closure, and drive-motor 11 stops operating, simultaneously the normally opened contact J2-2 closure of second time relay J2, connect the 3rd time relay J3, the time-delay timing begins; When the 3rd time relay J3 timing during to t3, the normally closed contact J3-1 of the 3rd time relay J3 disconnects, the pilot circuit power reset, and said process restarts; Four, power cutoff switch Q, control process finishes.
Embodiment six: in conjunction with Fig. 2～Fig. 4 present embodiment is described, the batch plasma based ion implantation apparatus of the bulb of present embodiment comprises vacuum chamber 7, plasma producing apparatus 8, high-voltage pulse power source 5, stationary work-table 10, transmission mechanism, drive-motor 11, cushion block 12 and electrode 13; Described ion implantation apparatus also comprises power supply 14 No. one, No. two power supplys 15, synchronous switch controller 6 and inclined plate 2, described transmission mechanism is by driving toothed gear 16, follower gear 17 and thrust block 18 are formed, a control output end of described synchronous switch controller 6 is connected with the controlled end of a power supply 14, another control output end of switch controller 6 is connected with the controlled end of No. two power supplys 15 synchronously, a described power supply 14 provides power supply for drive-motor 11, No. two power supply 15 provides power supply for high-voltage pulse power source 5, be contained on the drive-motor output shaft 19 in the vacuum chamber 7 and be fixed with driving toothed gear 16, described driving toothed gear 16 and follower gear 17 engagements that are obliquely installed, be fixed with the inclined plate identical 2 on the upper surface of described follower gear 17 with its vergence direction, be provided with thrust block 18 between the lower surface of follower gear 17 and the stationary work-table 10, described thrust block 18 is spacing with the cushion block 12 that is arranged on the stationary work-table 10 by the lower surface of follower gear 17, the output electrode 13 of high-voltage pulse power source 5 gives stationary work-table 10 energisings, described plasma producing apparatus 8 introduce vacuum chambers partly be arranged in the vacuum chamber 7 and be positioned at inclined plate 2 directly over.The plasma producing apparatus 8 of present embodiment, high-voltage pulse power source 5 and stationary work-table 10 are prior art, can be that May 25, publication number in 1994 are that the associated components that is called in the application for a patent for invention of " metal plasma source ion injection method and device " of CN 1087131A, name is identical with patent disclosure day also.During work, 8 energisings of article on plasma body generating unit, and by 6 pairs of high-voltage pulse power sources 5 of synchronous switch controller and drive-motor 11 switching switching synchronously.
Embodiment seven: in conjunction with Fig. 3 and Fig. 4 present embodiment is described, the central axis of the inclined plate 2 of present embodiment and the angle α between the vertical direction are 5 °-30 °, can guarantee that bulb 1 surface ion injects uniformity.Other composition and annexation are identical with embodiment six.
Embodiment eight: present embodiment is described in conjunction with Fig. 2～Fig. 4, the diameter D1 of the inclined plate 2 of present embodiment can guarantee that less than the introducing vacuum chamber section diameter D2 of plasma producing apparatus 8 all bulbs 1 can both obtain the injection of plasma body.Other composition and annexation are identical with embodiment six.
Embodiment nine: present embodiment is described in conjunction with Fig. 3 and Fig. 4, the central position of the upper surface of the inclined plate 2 of present embodiment is provided with right cylinder 20, be provided with annular groove 3 between the outer 21 of described right cylinder 20 and inclined plate 2, the bottom face of described annular groove 3 is provided with a plurality of square holes 22, the height H 1 of the outer 21 of inclined plate 2 and the height H 2 of right cylinder 20 are equal to 2/3 bulb diameter D, can guarantee that bulb 1 moves in the annular groove 3 of inclined plate 2, when inclined plate 2 stops operating, can be by 22 location of the square hole on annular groove 3 bottom faces.Other composition and annexation are identical with embodiment six or seven.
Embodiment ten: present embodiment is described in conjunction with Fig. 3 and Fig. 4, the diameter of the right cylinder 20 of present embodiment is 80-100mm, the length of side of each square hole 22 equals the diameter D of 1/10-1/5 bulb 1, the spacing of adjacent two square holes 22 equals the diameter D of 1/3-1/2 bulb 1, can guarantee that bulb 1 location is firm.Other composition and annexation are identical with embodiment nine.
Embodiment 11: in conjunction with Fig. 3 and Fig. 4 present embodiment is described, the diameter D3 of the annular groove 3 of the inclined plate 2 of present embodiment is 80-100mm, can guarantee that bulb 1 has enough big space in the annular groove 3 of inclined plate 2.Other composition and annexation are identical with embodiment ten.
Embodiment 12: present embodiment is described in conjunction with Fig. 1, the synchronous switch controller 6 of present embodiment is made up of 3 JS14S time relays and pilot circuit, utilize two groups of delayed contacts of JS14S to realize time-delay control, its control process is: the working hour t1 that high-voltage pulse power source 5 is set is by 1 control of very first time relay J, drive-motor 11 rotation time t2 are controlled by second time relay J2, the start-up time delay t3 of high-voltage pulse power source 5 is controlled by the 3rd time relay J3, and ion implantation having a rest by following interprocedual carried out:
One, power turn-on switch Q, the pilot circuit power connection, one of them normally closed contact J1-1 of very first time relay J 1 is in closure state, the relay K1 of high-voltage pulse power source 5 connects, apply high-voltage pulse, very first time relay J 1 is connected, and injection length simultaneously picks up counting; Two, when the time is t1, one of them normally closed contact J1-1 of very first time relay J 1 becomes open circuit by closure, the relay K1 of high-voltage pulse power source 5 disconnects, stop to apply high-voltage pulse, the normally opened contact J1-2 closure of very first time relay J 1, the relay K2 of drive-motor 11 connects, and stationary work-table 10 rotates, second time relay J2 connects simultaneously, and rotation time picks up counting; Three, when second time relay J2 timing during to t2, the normally closed contact J2-1 of second time relay J2 changes open circuit into by closure, and drive-motor 11 stops operating, simultaneously the normally opened contact J2-2 closure of second time relay J2, connect the 3rd time relay J3, the time-delay timing begins; When the 3rd time relay J3 timing during to t3, the normally closed contact J3-1 of the 3rd time relay J3 disconnects, the pilot circuit power reset, and said process restarts; Four, power cutoff switch Q, control process finishes.
Claims (10)
1, a kind of bulb batch plasma based ion injection method, it is characterized in that: described ion injection method is finished like this: the bulb (1) that a plurality of diameter D are identical is placed in the annular groove (3) of inclined plate (2), the central axis of described inclined plate (2) and the angle α between the vertical direction are 5 °-30 °, the rotation of inclined plate (2) is by drive-motor (11) and transmission mechanism control, the start and stop of described drive-motor (11) and high-voltage pulse power source (5) are by synchronous switch controller (6) control, earlier bulb (1) is applied high-voltage pulse, plasma based ion is carried out on the surface of bulb (1) to be injected, injection length is after the 5-10min, stop to apply high-voltage pulse, start drive-motor (11) simultaneously, the rotation of inclined plate (2) makes part bulb (1) cross the interior lower-most point of annular groove (3) that is rolled into inclined plate (2) behind the vertex in the annular groove (3) of inclined plate (2) by deadweight, the rolling process of bulb (1) carries out at random, the rotating speed of inclined plate (2) is 1-10rpm/min, the single revolution time is 3-30s, afterwards, stopping drive-motor (11) rotates, open high-voltage pulse power source (5) simultaneously, behind high-voltage pulse power source (5) time-delay 5-10s, beginning that plasma based ion is carried out on bulb (1) surface injects, the single injection length is 5-10min, the start and stop of drive-motor (11) and high-voltage pulse power source (5) keep switching synchronously, till all bulbs (1) surface ion injects evenly.
2, a kind of bulb batch plasma based ion injection method according to claim 1, it is characterized in that: the diameter D of described bulb (1) is 3-50mm.
3, a kind of bulb batch plasma based ion injection method according to claim 1 is characterized in that: the central axis of described inclined plate (2) and the angle α between the vertical direction are 5 °-30 °.
4, a kind of bulb batch plasma based ion injection method according to claim 1 is characterized in that: the maximum cross-section area of the bulb (1) in the described annular groove (3) that is placed on inclined plate (2) accounts for below 3/4 of annular groove (3) floorage of inclined plate (2).
5, a kind of batch plasma based ion implantation apparatus of bulb of realizing the described method of claim 1, described ion implantation apparatus comprises vacuum chamber (7), plasma producing apparatus (8), high-voltage pulse power source (5), stationary work-table (10), transmission mechanism, drive-motor (11), cushion block (12) and electrode (13); It is characterized in that: described ion implantation apparatus also comprises a power supply (14), No. two power supplys (15), synchronous switch controller (6) and inclined plate (2), described transmission mechanism is by driving toothed gear (16), follower gear (17) and thrust block (18) are formed, a control output end of described synchronous switch controller (6) is connected with the controlled end of a power supply (14), another control output end of switch controller (6) is connected with the controlled end of No. two power supplys (15) synchronously, a described power supply (14) provides power supply for drive-motor (11), No. two power supplys (15) provide power supply for high-voltage pulse power source (5), the bottom face that vacuum chamber (7) is passed in the upper end of described drive-motor output shaft (19) is contained in the vacuum chamber (7), be contained on the drive-motor output shaft (19) in the vacuum chamber (7) and be fixed with driving toothed gear (16), described driving toothed gear (16) and follower gear (17) engagement that is obliquely installed, be fixed with the inclined plate identical (2) on the upper surface of described follower gear (17) with its vergence direction, be provided with thrust block (18) between the lower surface of follower gear (17) and the stationary work-table (10), described thrust block (18) is spacing with the cushion block (12) that is arranged on the stationary work-table (10) by the lower surface of follower gear (17), the output electrode (13) of high-voltage pulse power source (5) is given stationary work-table (10) energising, described plasma producing apparatus (8) introduce vacuum chamber partly be arranged in the vacuum chamber (7) and be positioned at inclined plate (2) directly over.
6, the batch plasma based ion implantation apparatus of a kind of bulb according to claim 5 is characterized in that: the central axis of described inclined plate (2) and the angle α between the vertical direction are 5 °-30 °.
7, the batch plasma based ion implantation apparatus of a kind of bulb according to claim 5 is characterized in that: the diameter D1 of described inclined plate (2) introduces the diameter D2 of vacuum chamber part less than plasma producing apparatus (8).
8, according to claim 5 or the batch plasma based ion implantation apparatus of 6 described a kind of bulbs, it is characterized in that: the central position of the upper surface of described inclined plate (2) is provided with right cylinder (20), be provided with annular groove (3) between the outer (21) of described right cylinder (20) and inclined plate 2, the bottom face of described annular groove (3) is provided with a plurality of square holes (22), and the height H 1 of the outer (21) of inclined plate (2) and the height H 2 of right cylinder (20) are equal to 2/3 bulb diameter D.
9, the batch plasma based ion implantation apparatus of a kind of bulb according to claim 8, it is characterized in that: the diameter of described right cylinder (20) is 80-100mm, the length of side of each square hole (22) equals the diameter D of 1/10-1/5 bulb (1), and the spacing of adjacent two square holes (22) equals the diameter D of 1/3-1/2 bulb (1).
10, the batch plasma based ion implantation apparatus of a kind of bulb according to claim 8 is characterized in that: the diameter D3 of the annular groove (3) of described inclined plate (2) is 80-100mm.
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| CN2008101371304A CN101353777B (en) | 2008-09-17 | 2008-09-17 | Spherical parts batch plasma based ion injection method and apparatus thereof |
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| CN2008101371304A CN101353777B (en) | 2008-09-17 | 2008-09-17 | Spherical parts batch plasma based ion injection method and apparatus thereof |
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| CN103822532A (en) * | 2014-02-26 | 2014-05-28 | 中国科学院等离子体物理研究所 | Multi-lithium-ball-projectile accurate automatic supply system special for plasma fracturing protecting |
| CN104379803A (en) * | 2012-04-16 | 2015-02-25 | 铁姆肯公司 | Method and table assembly for applying coatings to spherical components |
| CN105349958A (en) * | 2015-11-23 | 2016-02-24 | 哈尔滨工业大学 | Device and method for depositing modified coating on surface of precision ball |
| CN105671489A (en) * | 2016-03-25 | 2016-06-15 | 沈阳大学 | Device for preparing structure-controllable functional film |
| CN108300972A (en) * | 2018-01-22 | 2018-07-20 | 哈尔滨工业大学 | A kind of precision ball surface prepares the device and method of deposition modified coating |
| CN113151785A (en) * | 2020-01-22 | 2021-07-23 | 中国工程物理研究院激光聚变研究中心 | Film preparation assembly, film preparation method and application thereof |
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2008
- 2008-09-17 CN CN2008101371304A patent/CN101353777B/en not_active Expired - Fee Related
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| CN104379803A (en) * | 2012-04-16 | 2015-02-25 | 铁姆肯公司 | Method and table assembly for applying coatings to spherical components |
| CN104379803B (en) * | 2012-04-16 | 2016-11-09 | 铁姆肯公司 | For applying a layer to the method on spherical component and table assembly |
| US9543127B2 (en) | 2012-04-16 | 2017-01-10 | The Timken Company | Method and table assembly for applying coatings to spherical components |
| CN103822532A (en) * | 2014-02-26 | 2014-05-28 | 中国科学院等离子体物理研究所 | Multi-lithium-ball-projectile accurate automatic supply system special for plasma fracturing protecting |
| CN103822532B (en) * | 2014-02-26 | 2015-07-01 | 中国科学院等离子体物理研究所 | Multi-lithium-ball-projectile accurate automatic supply system special for plasma fracturing protecting |
| CN105349958A (en) * | 2015-11-23 | 2016-02-24 | 哈尔滨工业大学 | Device and method for depositing modified coating on surface of precision ball |
| CN105671489A (en) * | 2016-03-25 | 2016-06-15 | 沈阳大学 | Device for preparing structure-controllable functional film |
| CN108300972A (en) * | 2018-01-22 | 2018-07-20 | 哈尔滨工业大学 | A kind of precision ball surface prepares the device and method of deposition modified coating |
| CN113151785A (en) * | 2020-01-22 | 2021-07-23 | 中国工程物理研究院激光聚变研究中心 | Film preparation assembly, film preparation method and application thereof |
| CN113151785B (en) * | 2020-01-22 | 2022-02-08 | 中国工程物理研究院激光聚变研究中心 | Film preparation assembly, film preparation method and application thereof |
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