CN101344726B - Stepping arrangement type interference microlithography and device thereof - Google Patents
Stepping arrangement type interference microlithography and device thereof Download PDFInfo
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- CN101344726B CN101344726B CN2007101227807A CN200710122780A CN101344726B CN 101344726 B CN101344726 B CN 101344726B CN 2007101227807 A CN2007101227807 A CN 2007101227807A CN 200710122780 A CN200710122780 A CN 200710122780A CN 101344726 B CN101344726 B CN 101344726B
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Abstract
The invention provides a stepping queuing interference lithography method and a corresponding apparatus used for making cyclical patterns. At least two homology beams of special shapes are controlled to be projected onto a base material to be exposed so as to form interference fringes of a special zone size. Then the positions of the base material to be exposed or the two homology beams of special shapes are controlled through the stepping movement of times so as to form a preset pattern in a large area on the base material to be exposed. The method of the invention can shorten the optical transmission path and the exposure time so as to further reduce the generation of lithography process defects and increase the defect-free rate of the process.
Description
Technical field
The present invention relates to a kind of method and apparatus of interfering little shadow, refer in particular to a kind of the utilization and control the people having the same aspiration and interest light beam of twice given shape at least, make it be projected to one and treat on the exposed substrate to form the interference fringe of specific region size, the mode that moves by most the steppings position of controlling the people having the same aspiration and interest light beam for the treatment of exposed substrate or this twice given shape is with in the method and apparatus of the little shadow of stepping arrangement type interference of a kind of fabrication cycle pattern for the treatment of to form on the exposed substrate large-area predetermined pattern again.
Background technology
The little shadow of optical interference (Interference Lithography) principle is for utilizing various combination forms such as two bundles or multiple tracks light beam line, meet at substrate, can expose on the substrate blocking layer produces periodic interference fringe pattern, so can make periodicity-line, hole, post or other structure plan of sub-micron grade.The method does not need light shield, expensive optical imaging system, and uses short wavelength light source and corresponding suitably resistance agent, can obtain that live width is little, depth of focus long, the practice of specific period pattern.The application of the little shadow of optical interference is also towards the diversity development, for example: can be applicable to the making of Bragg grating (Bragg Grating) etc. in photoelectricity and semiconductor industry.Then can be applicable to aspect the material thermal treatment on the film make crystal grain grow up again and magnetic material on the magnetization of net point, with making of finishing DFB and dbr semiconductor laser and photon crystal structure etc.Above-mentioned many-sided application like this is arranged, and laser light interferes little shadow technology to be desirably in the following application widely that has in the different technologies field.
Recently, along with display pannel, industries such as soft electronic (Flexible Electronics) and solar cell are under the cumulative situation of large scale demand, and it is the inevitable trend of processing procedure development that photovalve miscellaneous must be contained bigger area.In these elements, periodically submicron structure has accounted for many ratios.For example the optical grating construction of one dimension can be applicable to show and is made into polarization element on the science and technology; And the periodic structure of two dimension is suitable for antireflecting application, with the light transmission efficiency of raising display backlight plate or the collection efficiency of solar cell.So large tracts of land and a large amount of periodic structures of quick Fabrication are being played the part of very important role for modern people's livelihood development of science and technology.Present global academia, industrial community all are devoted to large-area periodic structure and are made research and development.
Though traditional optical interferes micro-photographing process can make time micron periodic patterns, is subject to the light path framework so only be confined to the small size making.Prior art is made the Fraunhofer Institute research institution of large tracts of land microstructure such as Germany in Andreas Gombert in the little shadow mode of optical interference, et al., " Large-area origination and replication of microstructures withoptical functions; " SPIE Vol.5454, pp.129,2004 and AndreasGombert, et al., " Some application cases and related manufacturingtechniques for optically functional microstructures on largeareas; " Opt.Eng.43 (11) 2525-2533,2004, in the little shadow technology of disclosed interference, as shown in Figure 1, it is to come the fabrication cycle pattern in the mode of single exposure.This interferes little shadow technology is to utilize LASER Light Source 10 to produce a light beam 100, and this light beam 100 is divided into twice people having the same aspiration and interest light beam 101 and 102 through spectroscope 11 and most catoptrons 12.This twice people having the same aspiration and interest light beam is passing through lens unit 13 respectively to be projected on the base material 14 with photoresistance, makes and forms an interference figure on this base material 14.
Yet the method for Fig. 1 must have sizable space on making, just can make through the formed pointolite spherical wave of spatial filter be transmitted to enough distances (its paper use 21 meters long light path), expand and restraint into the almost plane ripple.In addition, thus since the power of distance unit area extremely a little less than, (a few hours approximately) could be accumulated enough exposure doses and make photoresistance sensitization moulding to need the quite long time shutter.Therefore whole environment must strictly be controlled between exposure period, avoids any disturbance, to keep the degree of stability (such as all optical element thermogrades, air draught control, humiture, mechanical vibration etc.) of exposure system.
In addition, as United States Patent (USP) U.S.Pat.No.6,882, No. 477 disclosed scan-type optical interference modes are elder generation's interference exposures by small size, utilize the mode of scanning to depict the large tracts of land periodic structure with similar mechanical line drawing machine again.Owing to the interference fringe scanning of small size will be become the large tracts of land periodic structure, the method needs the continuous positioning control of the long stroke of high precision, and process time is also quite tediously long.In addition, because light intensity is Gaussian distribution (Gaussian Beam), the most of scanning area (nearly 60% repeats) in that joint need repeat to coincide and aim at last time just can make the intensity of whole each striped be close to identical.
Other looks into the optical interference method for photolithography that No. 20070023692 open case of United States Patent (USP) disclosed, it is to utilize the pre-exposure method to produce an interim photoresist layer contraposition window on a transparent substrates (as glass Glass, quartzy Quartz) in advance, overlaps into the large tracts of land interference fringe by the contraposition mechanism multiexposure, multiple exposure under the transparent substrates again.This method is used circular Gaussian beam, thus the multiple exposure that coincides of palpus, because of area size, the number of times of intersection area differs, thus to fully evenly reach the distribution of exposure dose (Dosage) and be not easy and the photoresist selectivity of pre-exposure few.This method is owing to be to utilize transparent substrates, and compared to the normal silicon base of using of semiconductor industry, its application facet will be limited to.
Summary of the invention
The object of the invention provides a kind of stepping arrangement type interference method for photolithography and device thereof of fabrication cycle pattern, it is to utilize to control the people having the same aspiration and interest light beam of twice given shape at least, make it be projected to one and treat the interference fringe of exposed substrate with formation specific region size, and by change the cycle size of interference fringe by the incident angle of adjusting people having the same aspiration and interest light beam.
The invention provides a kind of stepping arrangement type interference method for photolithography and device thereof of fabrication cycle pattern, it is to control the position for the treatment of exposed substrate or people having the same aspiration and interest light beam with in treating to form large-area predetermined pattern on the exposed substrate by the mode that is moved by stepping, to shorten the processing procedure time and to reduce environment, for example: because of exposure wild effects such as optical element thermograde, air draught control, humiture, mechanical vibration, to the influence of processing procedure degree of stability.
The invention provides a kind of stepping arrangement type interference method for photolithography and device thereof of fabrication cycle pattern, it is in conjunction with beam shaping, intensity non-uniformity with Gaussian beam, convert the equally distributed light beam of spatial-intensity to, on base material, to form a small size interference figure, be step units with a small size interference figure zone again, seeing through most times steppings moves and exposes, and via the control of displacement accurately, the zone that makes the interference figure of small size engage in twos overlaps to form large-area exposing patterns.
The invention provides a kind of stepping arrangement type interference method for photolithography and device thereof of fabrication cycle pattern, it is that the periodic patterns exposure that can utilize at least four road people having the same aspiration and interest light beams to carry out multiple beam two-dimension periodic design producing and drum elements is made, to increase the processing procedure diversity.
In one embodiment, the invention provides a kind of stepping arrangement type interference method for photolithography of fabrication cycle pattern, include the following step: (a) provide at least the people having the same aspiration and interest light beam and of twice given shape to treat exposed substrate; (b) make this twice given shape people having the same aspiration and interest light beam at least, expose to this simultaneously and treat the exposed substrate surface, form a specific interference figure block to treat the exposed substrate surface in this; (c) adjust exposure position next time with step-by-step system; And (d) repeat this step (b) to (c) most times, make this treat to be formed with on the exposed substrate surface predetermined pattern.
In another embodiment, the invention provides a kind of stepping arrangement type interference micro-image device of fabrication cycle pattern, comprising: a shaping luminescence unit, it is to produce the people having the same aspiration and interest light beam of twice given shape at least; One load bearing unit, it is to provide carrying one to treat exposed substrate, with receive this at least the people having the same aspiration and interest light beam of twice given shape to produce a specific interference figure block; And a driver element, it is to connect by chance mutually with this load bearing unit, this driver element can provide a driving force to make this load bearing unit produce stepping and move.
Description of drawings
Fig. 1 is the interference micro-image device synoptic diagram of prior art;
Fig. 2 is the stepping arrangement type interference method for photolithography embodiment schematic flow sheet of fabrication cycle pattern of the present invention;
Fig. 3 (A) and Fig. 3 (B) are given shape embodiment synoptic diagram of the present invention;
Fig. 4 (A) and Fig. 4 (B) are the exposed substrate synoptic diagram for the treatment of of the present invention;
Fig. 5 (A) is the stepping arrangement type interference micro-image device first embodiment synoptic diagram of fabrication cycle pattern of the present invention;
Fig. 5 (B) is for through treating the exposed substrate synoptic diagram behind most step printings;
Fig. 5 (C) is another embodiment synoptic diagram of exposure area of the present invention;
Fig. 6 (A) to Fig. 6 (D) be exposing patterns synoptic diagram of the present invention;
Fig. 7 (A) is the stepping arrangement type interference micro-image device second embodiment synoptic diagram of fabrication cycle pattern of the present invention;
Fig. 7 (B) is for treating the exposed substrate synoptic diagram through the cylindrical shape behind most inferior step printings.
Fig. 8 utilizes the people having the same aspiration and interest light beam of the above given shape in four roads in treating to form large tracts of land periodic patterns synoptic diagram on the exposed substrate;
Fig. 9 (A) is to utilize the large tracts of land periodicity two-dimensional pattern synoptic diagram that is produced more than four roads with Fig. 9 (B);
Figure 10 is another embodiment schematic flow sheet of stepping arrangement type interference method for photolithography of fabrication cycle pattern of the present invention.
The 10-LASER Light Source
The 100-light beam
101,102-people having the same aspiration and interest light beam
The 11-spectroscope
The 12-catoptron
The 13-lens unit
The 14-base material
2-interferes method for photolithography
20～22-step
3-interferes micro-image device
The 30-control module
31-shaping luminescence unit
The 310-light beam generator
The 311-beam shaping
The 312-spectrophotometric unit
32,36-load bearing unit
33,37-driver element
The 34-catoptron
The 35-adjusting gear
40,41,42,43-large tracts of land predetermined pattern
6-interferes method for photolithography
60～64-step
7a, 7b-two-dimensional and periodic figure
80-treats exposed substrate
The 800-substrate
801-treats the exposing material layer
81-treats exposed substrate
The 810-cylindrical substrate
811-treats the exposing material layer
The 90-light beam
91-shaping light beam
92,92a, 93,93a-people having the same aspiration and interest light beam
950,951,952,953,954-interference figure block
96-stepping path
970,971-interval region
Embodiment
See also shown in Figure 2ly, this figure is the stepping arrangement type interference method for photolithography embodiment schematic flow sheet of fabrication cycle pattern of the present invention.This interference method for photolithography 2 is to include the following step: at first carry out step 20, provide at least the people having the same aspiration and interest light beam and of twice given shape to treat exposed substrate.See also shown in Fig. 3 (A), aforementioned so-called given shape can be a polygon, for example: and triangle, quadrilateral or hexagon etc., but not as limit.In addition, shown in Fig. 3 (B), this given shape also can have at least one arc-shaped side edges.See also shown in Fig. 4 (A) and Fig. 4 (B), this figure is a synoptic diagram of the present invention to be exposed.In Fig. 3 (A), this treats that exposed substrate 80 can be flat panel substrates; In Fig. 3 (B), this treats the base material of exposed substrate 81 for having cambered surface, for example cylinder base material.This treats that the material of exposed substrate 80 and 81 may be selected to be materials such as wafer substrate class, glass baseplate class, plastics class, metal species, flexible polymer base material class or belt class.
Return shown in Figure 2ly, after the step 20, proceed step 21, make this twice given shape people having the same aspiration and interest light beam at least, expose to this simultaneously and treat the exposed substrate surface, form a specific interference figure block to treat the exposed substrate surface in this.Then carry out step 22, adjust exposure position next time with step-by-step system.Can select to move this with step-by-step system as for the mode of stepping adjustment exposure position treats exposed substrate or moves this people having the same aspiration and interest light beam of twice given shape at least with step-by-step system.And then get back to step 21, and make this twice given shape people having the same aspiration and interest light beam at least, expose to this simultaneously and treat the exposed substrate surface, treat that in this exposed substrate surface forms another specific interference figure block and previous pattern block is adjacent.See through the repeatable operation of step 21, to treat the forming pattern that large tracts of land has specific period on the exposed substrate surface in this to step 22.
Next the device of said method is implemented in explanation.See also shown in Fig. 5 (A), this figure is the stepping arrangement type interference micro-image device first embodiment synoptic diagram of fabrication cycle pattern of the present invention.This interference micro-image device 3 has a shaping luminescence unit 31, a load bearing unit 32 and a driver element 33.This shaping luminescence unit 31, it is to produce the people having the same aspiration and interest light beam of twice given shape at least.This shaping luminescence unit 31 has a light beam generator 310, a beam shaping 311 and a spectrophotometric unit 312.This light beam generator 310, it is to produce a light beam 90, in the present embodiment, this light beam generator 310 is a LASER Light Source generator.This beam shaping 311, the function that has even light intensity distributions and enlarge the shaping light beam, it is to receive this light beam 90, and this light beam 90 is modulated into a shaping light beam 91.Because the light beam that this light beam generator 310 is produced is to belong to Gaussian beam, that is the distribution of its intensity presents Gaussian distribution, so intensity is also inhomogeneous, therefore can pass through by this beam shaping 311, earlier with the intensity distributions homogenising of this light beam, and then enlarge this uniform strength distribution light beam forming an expanded light beam, and this expanded light beam is modulated into this shaping light beam.The formed shape of this shaping light beam Fig. 3 (A) and Fig. 3 (B) as described above is described, does not give unnecessary details at this.This spectrophotometric unit 312, it is can be with these shaping light beam 91 beam split to form the people having the same aspiration and interest light beam 92 and 93 of twice given shape.
This load bearing unit 32, it is a side that is arranged at this shaping luminescence unit 31, and can provide carrying one to treat exposed substrate 80.In the present embodiment, this load bearing unit is a mobile platform; This treats that exposed substrate 80 has a substrate 800, is to be formed with one deck to treat exposing material layer 801 on it.This driver element 33, it is to connect with this load bearing unit 32 is even mutually, this driver element 33 can provide a driving force to make this load bearing unit 32 produce steppings and move.In the present embodiment, this driver element 33 is a step motor, but not as limit, it is to drive the displacement movement that this load bearing unit 32 carries out three dimensions.This spectrophotometric unit 312 and this are treated also to be provided with most pieces catoptron 34 between the exposed substrate 80, and it is to be arranged at respectively on the adjusting gear 35 that can adjust the anglec of rotation and position.By by this adjusting gear 35, make the people having the same aspiration and interest light beam 92 and 93 of this twice given shape be projected to this angle for the treatment of exposed substrate 80 and can receive control and change, and then change the cycle size of interference fringe.
This shaping luminescence unit 31, load bearing unit 32, driver element 33 and this adjusting gear 35 are to connect with a control module 30 is even mutually respectively, to receive the corresponding action of signal generation that this control module 30 is produced.Next the action of this interference micro-image device 3 is described, this control module 30 passes through to produce the people having the same aspiration and interest light beam 92 and 93 of twice given shapes by this shaping luminescence unit 31 of signal controlling, and sends the position that signal makes this driver element 33 adjust the position of these load bearing units 32 and control these adjusting gear 35 adjustment catoptrons.Then, make this twice given shape people having the same aspiration and interest light beam 92 and 93, expose to this simultaneously and treat the exposed substrate 80 lip-deep exposing material layers 801 for the treatment of, form a specific interference figure block to treat exposing material layer 801 surface in this.
Then, this control module 30 is controlled this driver element 33 again and is adjusted this load bearing unit 32 to next exposure position with step-by-step system.When load bearing unit 32 moved to next exposure position, the people having the same aspiration and interest light beam 92 of this twice given shape and 93 can treat that exposed substrate 80 exposes to this, to form the state of Fig. 5 (B).Wherein, the pattern the when pattern when interference figure block 950 exposed for the first time, interference figure block 951 exposed for the second time, the route that on behalf of stepping, label 96 move.In order to control the precision of interference figure.See through step-by-step movement and move the position that exposed substrate is treated in control, make that the part in the interference figure zone of formation is connected mutually with the part of previous interference figure subsequently, to form large tracts of land and to have periodic pattern.
See also shown in Fig. 5 (C), this figure is another embodiment synoptic diagram of exposure area of the present invention.Has interval region between adjacent in the present embodiment interference figure block.With the embodiment among Fig. 5 (C), formed interference figure block 952 and 953 have interval region 970 on the substrate 800; Interference figure block 952 and 953 and interference figure block 954 between have interval region 971.In the present embodiment, this interference figure block is a two-dimensional periodic structure.The pattern that this large tracts of land with interval region has a specific period can be applied to various different processing procedures or product is used required.For example, for example: photon crystal wave-guide (Photonic crystal waveguide), conductive paths, biological micro-/ nano runner etc.With photon crystal wave-guide, this interval region 970 and 971 can be waveguide region, and 952,953 and 954 of this interference figure blocks are photonic crystal region.
To shown in Fig. 6 (D), this figure is an exposing patterns synoptic diagram of the present invention as Fig. 6 (A).By the specific interference figure block that forms by difform people having the same aspiration and interest light beam, see through most step-by-step movements adjustment exposure positions again and the interference figure block is spliced mutually the large tracts of land predetermined pattern 40,41,42 and 43 that forms to make.Because the pattern area size that forms is by the beam area that overlaps, that is the people having the same aspiration and interest light beam 92 among Fig. 5 (A) and 93 size decide, and therefore can once finish several centimetres squares or more large-area micron regular pattern.Be step units with this given shape interference region again, carry out the stepping moving exposure and engage.Via each exposure, and, can be woven into the specific periodic patterns of large tracts of land at last via the control of platform displacement.
See also shown in Fig. 7 (A), this figure is the stepping arrangement type interference micro-image device second embodiment synoptic diagram of fabrication cycle pattern of the present invention.Basically element is identical with Fig. 5 (A) in the present embodiment, and different is that the exposed substrate 81 for the treatment of that this load bearing unit 36 is carried is a cylinder base material, and it is to have a cylindrical substrate 810 to be formed with on it and to treat exposing material layer 811.In addition, this driver element 37 is a step motor, but not as limit, and it is can drive this to treat that exposed substrate 81 rotates and drive the displacement movement that this load bearing unit 36 carries out three dimensions.See through stepping and move the position of control exposure, make this treat to form large-area interference figure on the exposing material 81, shown in Fig. 7 (B).
See also shown in Figure 8ly, this figure utilizes the people having the same aspiration and interest light beam of given shapes of most groups in treating to form large tracts of land periodic patterns synoptic diagram on the exposed substrate.Device in the present embodiment is to utilize the device of Fig. 5 (A) or Fig. 7 (A) to implement, different is, the interference micro-image device of Fig. 5 (A) or Fig. 7 (A) has the shaping luminescence unit of most groups, interfere little shadow exposure with people having the same aspiration and interest light source 92,93,92a and the 93a that produces the given shape more than four roads, to produce meticulous two-dimensional and periodic pattern 7a and 7b (shown in Fig. 9 (A) and Fig. 9 (B)) in the large tracts of land scope.For example, this two-dimensional and periodic pattern be can produce and periodic line, hole, post or other species structure pattern can be.In addition, this people having the same aspiration and interest light source 92 and 93 s' angle theta 1 and the angle theta 2 between people having the same aspiration and interest light source 92a and 93a can be adjusted into identical angle or different angles by the adjusting gear 35 by Fig. 5 (A) or Fig. 7 (A).
Same light modulation more than Fig. 8 utilizes four roads formed the mode of two-dimensional and periodic pattern originally, also can utilize the device of Fig. 5 (A) or Fig. 7 (A), cooperating the load bearing unit 32 or 36 that can carry out rotational motion, produced the two-dimensional and periodic pattern.See also shown in Figure 10ly, this figure is another embodiment schematic flow sheet of stepping arrangement type interference method for photolithography of fabrication cycle pattern of the present invention.Interference micro-image device with Fig. 5 (A) is done explanation, and this method 6 is to include the following step: at first carry out step 60, provide at least the people having the same aspiration and interest light beam and of twice given shape to treat exposed substrate.This given shape and treat that the feature of exposed substrate do not give unnecessary details at this as previously mentioned.
After the step 60, proceed step 61, make this twice given shape people having the same aspiration and interest light beam at least, expose to this simultaneously and treat the exposed substrate surface.Carry out step 62 then, make this load bearing unit 32 be rotated motion and treat exposed substrate 80 rotations one angle to drive this, this angle is 90 degree in the present embodiment, but not as limit.Next, carry out step 63 and make this twice given shape people having the same aspiration and interest light beam at least, expose to this simultaneously and treat the exposed substrate surface, form this specific interference figure block to treat the exposed substrate surface in this, wherein this specific interference figure block is a two-dimentional interference figure block.Carry out step 64 at last, control this load bearing unit and carry out step motion, this is treated that exposed substrate is adjusted to next one position to be exposed.Carry out step 61 so repeatedly to step 64, can treat to form on the exposed substrate large tracts of land periodicity interference figure in this with two dimensional character.
The above only is preferred embodiment of the present invention, can not with the restriction scope of the invention.Promptly the equalization of doing according to claim of the present invention generally changes and modifies, and will not lose main idea of the present invention place, does not also break away from the spirit and scope of the present invention, and the former capital should be considered as further enforcement situation of the present invention.Comprehensively above-mentioned, interference method for photolithography provided by the invention and device thereof, can be fast and large tracts of land form periodic patterns.Therefore can satisfy the demand of industry, and then improve the competitive power of this industry.Feature of the present invention and advantage thereof are as follows:
1. according to interference method for photolithography of the present invention and device thereof, compared to other technology (as: the little shadow of electron beam directly write or diamond cutter delineation) all is that the striped of a lot of is portrayed one by one, mode that this law is carried in the interference region area, can produce hundreds of simultaneously even or thousands of striped, the portrayal that is equal to once just has thousands of roads striped to produce, and will be a special and efficient technology.
2. according to interference method for photolithography of the present invention and device thereof, be to belong to of short duration exposure system of moment.Can improve long light path single exposure or scan-type and interfere the shortcoming of the long-time continuous formula exposure of exposure method, exempt because of exposure wild effects such as optical element thermograde, air draught control, humiture, mechanical vibration.
3. according to interference method for photolithography of the present invention and device thereof, can be used on the seamless combination in conjunction with beam shaping.With the intensity non-uniformity of Gaussian beam, convert the equally distributed light beam of spatial-intensity to, and use its action in the local seamless combination of small size, be its uniqueness.
4. according to interference method for photolithography of the present invention and device thereof, utilizing mobile platform is step units with a small size interference region, each exposure, and via displacement control accurately, make the regional interface that engages in twos be connected, can make large tracts of land periodicity submicron structure uniformly.
5. according to interference method for photolithography of the present invention and device thereof, also can carry out the periodic patterns exposure of multiple beam two-dimension periodic design producing and drum elements etc. and make processing procedure elasticity height.
Claims (11)
1. the stepping arrangement type interference method for photolithography of a fabrication cycle pattern is characterized in that comprising the following steps:
(a) provide one to treat exposed substrate and provide the people having the same aspiration and interest light beam of twice given shape at least with a shaping luminescence unit, wherein this shaping luminescence unit has a light beam generator, and it produces a light beam; One beam shaping, it is the intensity distributions homogenising of this light beam, and then enlarges this uniform strength distribution light beam forming an expanded light beam, and this expanded light beam is modulated into the shaping light beam; And a spectrophotometric unit, its with this shaping light beam beam split to form this people having the same aspiration and interest light beam of twice given shape at least;
(b) make this people having the same aspiration and interest light beam of twice given shape at least, expose to this simultaneously and treat the exposed substrate surface, treat that in this exposed substrate surface forms a specific interference figure block;
(c) adjust exposure position next time with step-by-step system; And
(d) repeat this step (b) to (c) most times, the part of the interference figure block that forms subsequently is connected mutually, with the part of a preceding interference figure block to treat being formed with a large-area predetermined pattern on the exposed substrate surface in this.
2. the stepping arrangement type interference method for photolithography of fabrication cycle pattern as claimed in claim 1 is characterized in that: this given shape be chosen as a polygon and have at least one arc-shaped side edges one of them.
3. the stepping arrangement type interference method for photolithography of fabrication cycle pattern as claimed in claim 1, it is characterized in that: this treats that exposed substrate is chosen as the base material that a flat panel substrates or has cambered surface, and this treat the material of exposed substrate be chosen as wafer substrate class, glass baseplate class, plastics class, metal species, flexible polymer base material class and belt class material one of them.
4. the stepping arrangement type interference method for photolithography of fabrication cycle pattern as claimed in claim 1 is characterized in that: adjust this at least the people having the same aspiration and interest light beam irradiates of twice given shape treat the incident angle of exposed substrate to this.
5. the stepping arrangement type interference method for photolithography of fabrication cycle pattern as claimed in claim 1 is characterized in that: this step (c) be chosen as with step-by-step system adjust this position for the treatment of exposed substrate and with step-by-step system adjust this at least the people having the same aspiration and interest light beam of twice given shape irradiation position one of them.
6. the stepping arrangement type interference method for photolithography of fabrication cycle pattern as claimed in claim 1 is characterized in that: this step (b) also comprises the following steps:
(b1) make this people having the same aspiration and interest light beam of twice given shape at least, expose to this simultaneously and treat the exposed substrate surface;
(b2) rotation and mobile this are treated exposed substrate to a location; And
(b3) make this people having the same aspiration and interest light beam of twice given shape at least, expose to this simultaneously and treat the exposed substrate surface, form this specific interference figure block to treat the exposed substrate surface in this, wherein this specific interference figure block is a two-dimentional interference figure block.
7. the stepping arrangement type interference micro-image device of a fabrication cycle pattern is characterized in that comprising:
One shaping luminescence unit, it produces the people having the same aspiration and interest light beam of twice given shape at least, and wherein this shaping luminescence unit has a light beam generator, and it produces a light beam; One beam shaping, it is the intensity distributions homogenising of this light beam, and then enlarges this uniform strength distribution light beam forming an expanded light beam, and this expanded light beam is modulated into the shaping light beam; And a spectrophotometric unit, its with this shaping light beam beam split to form this people having the same aspiration and interest light beam of twice given shape at least;
One load bearing unit, it provides carrying one to treat exposed substrate, with receive this at least the people having the same aspiration and interest light beam of twice given shape to produce a specific interference figure block; And
One driver element, it is to connect by chance mutually with this load bearing unit, this driver element provides a driving force to make this load bearing unit produce stepping and moves, control is moved in stepping by this driver element, the part of the specific interference figure block that forms subsequently is connected mutually, on this band exposed substrate surface, to be formed with a large-area predetermined pattern with the part of previous specific interference figure block.
8. the stepping arrangement type interference micro-image device of fabrication cycle pattern as claimed in claim 7 is characterized in that: this given shape be chosen as a polygon and have at least one arc-shaped side edges one of them.
9. the stepping arrangement type interference micro-image device of fabrication cycle pattern as claimed in claim 7, it is characterized in that: this treats that exposed substrate is to be chosen as the base material that a flat panel substrates or has cambered surface, and this treat the material of exposed substrate be chosen as wafer substrate class, glass baseplate class, plastics class, metal species, flexible polymer base material class and belt class material one of them.
10. the stepping arrangement type interference micro-image device of fabrication cycle pattern as claimed in claim 7 is characterized in that: this shaping luminescence unit has more an adjusting gear and treats the incident angle of exposed substrate with the people having the same aspiration and interest light beam irradiates of adjusting this given shape to this.
11. the drying stepping arrangement type of making periodic patterns as claimed in claim 7 relates to micro-image device, it is characterized in that: this load bearing unit carries out a rotational motion.
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| CN113009609A (en) * | 2021-03-01 | 2021-06-22 | 苏州大学 | Volume grating calibration assembly, volume grating preparation device, calibration method and exposure method |
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| CN101344726A (en) | 2009-01-14 |
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