CN101281263A - High clear digital imaging system filtering device and process thereof - Google Patents
High clear digital imaging system filtering device and process thereof Download PDFInfo
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- CN101281263A CN101281263A CNA2007100692017A CN200710069201A CN101281263A CN 101281263 A CN101281263 A CN 101281263A CN A2007100692017 A CNA2007100692017 A CN A2007100692017A CN 200710069201 A CN200710069201 A CN 200710069201A CN 101281263 A CN101281263 A CN 101281263A
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Abstract
The invention relates to a high-definition digital imaging system filtering device and preparing technique thereof, which includes two opposition substrates, namely a first substrate and a second substrate, the external lateral surfaces of the first substrate and a second substrate are respectively plated with a first film and a second film. An infrared-stopping glass and a quarter-wave plate are provided between the first substrate and the substrate. The preparing technique includes the following steps: a, substrate preparation; b, film coating; and assembling. Thereby the invention has the following advantages: 1, reasonable design, having anti-reflection, filtering and static elimination functions, and having a module group structure conform to the development of the single inverse digital camera; 2, implementing the combination of the IR film and ITO conductive film, which not only has infrared-stopping function but also can eliminate static affect; 3, stabilized performance and long service life of the entire product, and being not liable to cause scratching; 4, simple preparing technique process, high finished product rate and reduced use-cost.
Description
Technical field
The present invention relates to the filtering device field, especially relate to a kind of high clear digital imaging system filtering device and production technology thereof.
Background technology
Along with developing rapidly of opto-electronics, the application of single anti-digital camera more and more widely.High clear digital imaging system filtering device is the core building block of the anti-digital camera lens of list system, it mainly is the matched well of utilizing high clear digital imaging system filtering device and ccd imaging sensor, effectively suppress to be higher than the light wave of ccd image sensor spatial frequency by causing Moire fringe, and effectively suppress infrared waves, make clear picture and stable, and, improved the angular effect of high clear digital imaging system filtering device by structural design, promoted image quality.
At present, the production run of high clear digital imaging system filtering device is comparatively complicated, and the performance of product also is difficult to be protected, and the cutoff filter that it adopted only has the IR-cut function.By retrieval, patent about the production aspect of optical filter is reported to some extent, for example, Chinese patent literature discloses the patent of a kind of cutoff filter and preparation method thereof (application number: CN 200310112093.9), cutoff filter, it comprises a base layer and a rete, this rete is formed at this base layer surface, it comprises one first rete and one second rete, this first rete is formed at arbitrary surface of base layer, this second rete is formed at certain zone, middle part, surface of first rete, and the first rete filter wavelength scope is greater than the second rete filter wavelength scope.Its preparation method may further comprise the steps: a base layer is provided; This base layer is placed coating apparatus, form one first rete in its arbitrary surface; One catch tool is provided, and its surface offers plurality of holes; This catch tool is placed on this first rete, on first rete, plate second rete of some spaces; This base layer is cut into cutoff filter with catch tool hole similar number.The cutoff filter of above-mentioned use in filtering device only has the function of infrared filtering.But in actual use, cutoff filter also needs to eliminate static, and for this reason, accessory that just need and eliminate static is used.This has brought very big inconvenience with regard to the use of giving cutoff filter, and it is big not only to take up room, and has also correspondingly increased use cost.
In order to make optical filter possess more function, someone has applied for optical filter for display by name, the patent of display device and the manufacture method thereof (patent No.: CN018004419.0), this optical filter can be bonded on the scope face, comprise the functional hyaline layer that is arranged on air side and has preventing property of reflection and/or anti-dazzle property, be arranged on the transparent bonding layer that the display side is used for boning on video screen, the macromolecule membrane that is provided with as matrix between functional hyaline layer and transparent bonding layer is provided with transparency conducting layer between macromolecule membrane and transparent bonding layer.Though this invention makes optical filter possess the function of conduction, but the field of its use and cutoff filter are very different, and this optical filter does not have the function that IR-cut filters, mainly be that there is obviously difference in both on concrete structure and performance for the spectrum of shielding electromagnetic wave and correction visible light.This optical filter also is not suitable for high clear digital imaging system filtering device and production technology, and the process of preparation is comparatively complicated, and manufacturing cost height, resulting product are not suitable for the anti-digital camera of list of high-resolution yet.
Summary of the invention
The present invention mainly is that the structural design of solution product existing in prior technology is reasonable inadequately, and performance is difficult to meet the requirement of single anti-digital camera, the technical matters that the cost of manufacturing is high; Provide a kind of reasonable in design, compact conformation, properties of product are high and stable, can meet the user demand of the anti-digital camera of list of high-resolution, the high clear digital imaging system filtering device that manufacturing cost is lower.
It is the manufacturing process complexity that solves product existing in prior technology that the present invention also has a purpose, and operation easier is big, the technical matters that yield rate is not high; Provide a kind of manufacturing process simple, easy to implement, the production technology of the high clear digital imaging system filtering device that yield rate is high.
Above-mentioned technical matters of the present invention is mainly solved by following technical proposals: high clear digital imaging system filtering device, comprise two opposed substrates, i.e. first substrate and second substrate, lateral surface at first substrate and second substrate is coated with first rete and second rete respectively, it is characterized in that, also be provided with an IR-cut glass and a quarter wave plate between described first substrate and second substrate, the first above-mentioned substrate, IR-cut glass, quarter wave plate and second substrate cohere successively; And the first above-mentioned rete is to be composited by the transparent ITO rete that is used for by the IR rete of infrared light and be used to remove static, and the IR rete is made of at least one tunic, and the ITO rete is made of at least one tunic; The second above-mentioned rete is the AR rete that is used to improve light penetration.
The present invention creatively will be used for by the IR rete of infrared light and the transparent ITO rete that is used to remove static is compounded in same substrate, make its function that had both had infrared cut of light, have the function of electrostatic prevention again.And, owing to be compounded on the same substrate, need not to cooperate in addition the mechanism of eliminating static, use more flexibly, reliably, greatly reduce cost, make one-piece construction more compact.The ITO rete is transparent, to light pass through can not impact.Because IR rete and ITO rete are combined into one structural strength height, stable work in work.The present invention can with high pixel CCD/CMOS imaging sensor matched well.
As preferably, described IR rete directly adheres to mutually with first substrate, and described ITO rete is attached on the IR rete, and described IR rete is made of two-layer above film.The number of plies of the film in IR rete and the ITO rete and the thickness of every tunic are according to the needs of actual product and fixed.
For rete is protected, prevent to scratch, as preferably, can also be coated with the layer protecting film layer on the described ITO rete.
As preferably, described first substrate and second substrate by grind and polishing after optics crystal make, surface smoothness is better than 20 μ m.
As preferably, the equal and opposite in direction of described first substrate and second substrate.The thickness of substrate can design according to product needed.
As preferably, the size of described IR-cut glass and first substrate and second substrate adapt.The thickness of IR-cut glass can design according to product needed.
As preferably, described quarter wave plate by grind and polishing after optics crystal make, its size adapts with first substrate and second substrate.
Above-mentioned high clear digital imaging system filtering device is to come out by following explained hereafter: the high clear digital imaging system filtering device production technology is characterized in that it comprises the steps:
A. prepare substrate: the growth structure characteristic according to artificial optical crystal, cut out substrate, be made into first substrate, second substrate and quarter wave plate, carry out ultrasonic cleaning then;
B. plated film: the substrate after will cleaning is placed on respectively in the filming equipment, and one deck is used for IR film by infrared light at least on the one side elder generation evaporation of first substrate, then on the evaporation of IR film surface at least one deck be used to remove the transparent ITO film of static; AR rete on an evaporation of second substrate;
C. assembling: first substrate, IR-cut glass, quarter wave plate and second substrate are assembled gummed successively.
The present invention adopts the mode of evaporation, is adhering to IR rete and ITO rete on first substrate successively.In evaporate process, can determine the quantity of the thickness and the rete of rete as required.
In the present invention, if substrate is the higher glass of smooth finish, then can directly carry out ultrasonic cleaning; If the smooth finish of glass is not high, perhaps is crystal material, then to carry out twin grinding and polishing to its surface, carry out ultrasonic cleaning then.
As preferably, in above-mentioned operation b, the protective film that can also be used to protect at ITO film surface evaporation last layer.
As preferably, in above-mentioned operation c, each parts cleaned with ultrasonic earlier before assembling, and each parts also will carry out ultra-violet curing after assembling is finished.
Therefore, the present invention has following advantage: 1. reasonable in design, simple in structure, the multichip devices combination has function anti-reflection, that filter, eliminate static, meets the modular structure of single anti-digital camera development.2. on same optical filter, realize the combination of IR film and ITO conducting film, not only had the IR-cut function, also had electrostatic-proof function simultaneously.3. the stable performance of entire product, compact conformation, long service life, optical filter is difficult for causing scuffing.4. production process is simple, and is easy to implement, the yield rate height, and reduced use cost.
Description of drawings
Accompanying drawing 1 is a kind of main TV structure synoptic diagram of the present invention;
Accompanying drawing 2 is a kind of side-looking structural representations of the present invention;
Accompanying drawing 3 is partial enlarged drawings of B portion among Fig. 2;
Accompanying drawing 4 is a kind of technological process of production sketches of the present invention.
Among the figure, first substrate 1, the first rete 1a, IR rete 11, ITO rete 12, protective film 13, second substrate 2, the second rete 2a, IR-cut glass 3, quarter wave plate 4, optics effective coverage A.
Embodiment
Below by embodiment, and in conjunction with the accompanying drawings, technical scheme of the present invention is described in further detail.
Embodiment:
As depicted in figs. 1 and 2, high clear digital imaging system filtering device is made of parts such as first substrate 1, the first rete 1a, second substrate 2, the second rete 2a, IR-cut glass 3, quarter wave plates 4.A portion among Fig. 1 is the optics effective coverage.
As shown in Figure 2, first substrate 1 and second substrate 2 are opposed mutually, at the lateral surface difference evaporation first rete 1a and the second rete 2a of first substrate 1 and second substrate 2.Also be provided with an IR-cut glass 3 and a quarter wave plate 4 between first substrate 1 and second substrate 2, the first above-mentioned substrate 1, IR-cut glass 3, quarter wave plate 4 and second substrate 2 cohere successively.
As shown in Figure 3, the first above-mentioned rete 1a is composited by the transparent ITO rete 12 that is used for by the IR rete 11 of infrared light and be used to remove static, and IR rete 11 is made of at least one tunic, and ITO rete 12 is made of at least one tunic.The second above-mentioned rete 2a is the AR rete that is used to improve light penetration.More particularly, IR rete 11 directly adheres to mutually with first substrate 1, and ITO rete 12 is attached on the IR rete 11, and described IR rete 11 is made of two-layer above film.On ITO rete 12, also be attached with layer protecting film layer 13.This protective film 13 adopts the diaphragm of present widespread usage, and its composition and the mode of adhering to and prior art are roughly the same.
In the present embodiment, first substrate 1 and second substrate 2 are made by the optics crystal after grinding and polishing, and surface smoothness is better than 15 μ m.And the equal and opposite in direction of first substrate 1 and second substrate 2, its thickness are 0.726mm.The size of IR-cut glass 3 and first substrate 1 and second substrate 2 adapt, and its thickness is 0.60mm.Quarter wave plate 4 is made by the large stretch of optics crystal after grinding and polishing, and its size also adapts with first substrate 1 and second substrate 2, and its thickness is 0.3mm.
Above-mentioned high clear digital imaging system filtering device makes by following production technology, it is characterized in that, it comprises the steps: that a. prepares substrate: according to the growth structure characteristic of artificial optical crystal, cut out substrate, and its surface carried out twin grinding and polishing, be made into first substrate, second substrate and quarter wave plate, carry out ultrasonic cleaning then; B. plated film: the substrate after will cleaning is placed on respectively in the filming equipment, and one deck is used for IR film by infrared light at least on the one side elder generation evaporation of first substrate, then on the evaporation of IR film surface at least one deck be used to remove the transparent ITO film of static; AR rete on an evaporation of second substrate; C. assembling: first substrate, IR-cut glass, quarter wave plate and second substrate are assembled gummed successively.In above-mentioned operation b, the protective film that can also be used to protect at ITO film surface evaporation last layer.In above-mentioned operation c, each parts cleaned with ultrasonic earlier before assembling, and each parts also will carry out ultra-violet curing after assembling is finished.
Present embodiment can reach following technical indicator, also can design filtering device according to different situations certainly:
The A:(finished product) transmitance:
Centre wavelength transmitance=50%
λ=640 ± 10nm long wavelength side, λ=390 ± 15nm short wavelength side
Wavelength sees through filter=20%, λ=655 ± 10nm long wavelength side
λ=420nm～440nm transmitance＞75%
λ=450nm～570nm transmitance＞85%
λ=600nm 83%＞transmitance＞74%
λ=700nm～1000nm transmitance＜1%
B. pin hole, cut, idea＜20 μ m
C. permanance:
Hot and humid+65 ℃, 95%RH 500 hours
High temperature preserve+85 ℃ 500 hours
Cryopreservation-40 ℃ 500 hours
Thermal shock-40 ℃～+ 85 ℃ of 10 repetitive cycling
50 repetitive cycling of mechanicalness 4.9N
Specific embodiment described herein only is that the present invention's spirit is illustrated.The technician of the technical field of the invention can make various modifications or replenishes or adopt similar mode to substitute described specific embodiment, but can't depart from spirit of the present invention or surmount the defined scope of appended claims.
Although this paper has used terms such as first substrate 1, the first rete 1a, IR rete 11, ITO rete 12, protective film 13, second substrate 2, the second rete 2a, IR-cut glass 3, quarter wave plate 4, optics effective coverage A morely, do not get rid of the possibility of using other term.Using these terms only is in order to describe and explain essence of the present invention more easily; They are construed to any additional restriction all is contrary with spirit of the present invention.
Claims (10)
1. high clear digital imaging system filtering device, comprise two opposed substrates, i.e. first substrate (1) and second substrate (2), lateral surface at first substrate (1) and second substrate (2) is respectively with first rete (1a) and second rete (2a), it is characterized in that, also be provided with an IR-cut glass (3) and a quarter wave plate (4) between described first substrate (1) and second substrate (2), above-mentioned first substrate (1), IR-cut glass (3), quarter wave plate (4) and second substrate (2) cohere successively; And above-mentioned first rete (1a) is to be composited by the transparent ITO rete (12) that is used for by the IR rete (11) of infrared light and be used to remove static, and IR rete (11) is made of at least one tunic, and ITO rete (12) is made of at least one tunic; Above-mentioned second rete (2a) is for being used to improve the AR rete of light penetration.
2. high clear digital imaging system filtering device according to claim 1, it is characterized in that, described IR rete (11) directly adheres to mutually with first substrate (1), and described ITO rete (12) is attached on the IR rete (11), and described IR rete (11) is made of two-layer above film.
3. high clear digital imaging system filtering device according to claim 2 is characterized in that, can also be attached with layer protecting film layer (13) on the described ITO rete (12).
4. according to claim 1 or 2 or 3 described high clear digital imaging system filtering devices, it is characterized in that described first substrate (1) and second substrate (2) are made by the optics crystal after grinding and polishing, surface smoothness is better than 20 μ m.
5. high clear digital imaging system filtering device according to claim 4 is characterized in that, the equal and opposite in direction of described first substrate (1) and second substrate (2).
6. according to claim 1 or 2 or 3 described high clear digital imaging system filtering devices, it is characterized in that the size of described IR-cut glass (3) and first substrate (1) and second substrate (2) adapt.
7. according to claim 1 or 2 or 3 described high clear digital imaging system filtering devices, it is characterized in that described quarter wave plate (4) is made by the optics crystal after grinding and polishing, its size adapts with first substrate (1) and second substrate (2).
8. a high clear digital imaging system filtering device production technology is characterized in that it comprises the steps:
A. prepare substrate: the growth structure characteristic according to artificial optical crystal, cut out substrate, be made into first substrate, second substrate and quarter wave plate, carry out ultrasonic cleaning then;
B. plated film: the substrate after will cleaning is placed on respectively in the filming equipment, and one deck is used for IR film by infrared light at least on the one side elder generation evaporation of first substrate, then on the evaporation of IR film surface at least one deck be used to remove the transparent ITO film of static; AR rete on an evaporation of second substrate;
C. assembling: first substrate, IR-cut glass, quarter wave plate and second substrate are assembled gummed successively.
9. high clear digital imaging system filtering device production technology according to claim 8 is characterized in that, in above-mentioned operation b, and the protective film that can also be used to protect at ITO film surface attachment last layer.
10. high clear digital imaging system filtering device production technology according to claim 9 is characterized in that, in above-mentioned operation c, each parts are before assembling, clean with ultrasonic earlier, each parts also will carry out ultra-violet curing after assembling is finished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007100692017A CN101281263A (en) | 2007-06-06 | 2007-06-06 | High clear digital imaging system filtering device and process thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007100692017A CN101281263A (en) | 2007-06-06 | 2007-06-06 | High clear digital imaging system filtering device and process thereof |
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| CN101281263A true CN101281263A (en) | 2008-10-08 |
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| CNA2007100692017A Pending CN101281263A (en) | 2007-06-06 | 2007-06-06 | High clear digital imaging system filtering device and process thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104977638A (en) * | 2015-06-19 | 2015-10-14 | 江苏苏创光学器材有限公司 | Method for preparing infrared cut-off filter |
| CN104977639A (en) * | 2015-06-19 | 2015-10-14 | 江苏苏创光学器材有限公司 | Method for preparing infrared cut-off filter |
| CN105203459A (en) * | 2015-10-23 | 2015-12-30 | 无锡溥汇机械科技有限公司 | Filter plate for hematology analyzer |
| CN106094241A (en) * | 2016-06-22 | 2016-11-09 | 温岭市现代晶体有限公司 | Crystal cloth of coating-type optical low-pass filter and manufacture method |
-
2007
- 2007-06-06 CN CNA2007100692017A patent/CN101281263A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104977638A (en) * | 2015-06-19 | 2015-10-14 | 江苏苏创光学器材有限公司 | Method for preparing infrared cut-off filter |
| CN104977639A (en) * | 2015-06-19 | 2015-10-14 | 江苏苏创光学器材有限公司 | Method for preparing infrared cut-off filter |
| CN104977638B (en) * | 2015-06-19 | 2017-11-21 | 江苏苏创光学器材有限公司 | The preparation method of cutoff filter |
| CN105203459A (en) * | 2015-10-23 | 2015-12-30 | 无锡溥汇机械科技有限公司 | Filter plate for hematology analyzer |
| CN106094241A (en) * | 2016-06-22 | 2016-11-09 | 温岭市现代晶体有限公司 | Crystal cloth of coating-type optical low-pass filter and manufacture method |
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Open date: 20081008 |