CN101281259A - Anti-reflective coating with low resistance function and using penetrable conductive layer as outermost layer - Google Patents

Abstract

An anti-reflective coating with low resistance function and using a transparent conductive layer as the outermost layer, wherein the material of the anti-reflective coating is a transparent surface conductive layer, the light reflectivity of the transparent surface conductive layer is lower than 0.5%, the impedance of the anti-reflective coating is between 0.5 Ω and 0.7 Ω per square meter, and the transmittance of the anti-reflective coating is 55% to 70%.

Description

Anti-reflection coating with low-resistance function and outermost transparent conductive layer

technical field

The invention relates to an anti-reflection coating with low resistance function and a penetrable conductive layer as the outermost layer, especially a coating structure with high anti-reflection properties.

Background technique

Usually, on the plastic substrate (plastic substrate), glass substrate (glass substrate) or plastic net plate (plastic web) of liquid crystal display or plasma display, all can add an anti-reflection coating structure, so there are many coating structures has been made public.

U.S. Patent No. 4,921,760 discloses a multilayer antireflection coating with good adhesion between ceria and synthetic resin. The multilayer system includes CeO ₂ , Al ₂ O ₃ , ZrO ₂ , SiO ₂ , TiO ₂ and Ta ₂ O ₅ , all the film layers of the multi-layer system are oxides, the multi-layer system includes thin layers of three to five layers, in one embodiment, the total thickness of the five-layer structure is about 3580 Angstrom, the material of the surface layer of the multi-layer system is SiO ₂ , which has a low refractive index, when the wavelength is 550 nm, the refractive index is 1.46.

U.S. Patent No. 5,105,310 discloses a multilayer anti-reflective coating that is configured on a coaxial coating machine using a reactive sputtering method. The multilayer system includes TiO ₂ , SiO ₂ , ZnO, ZrO ₂ , and Ta ₂ O ₅ , all the film layers of the multi-layer system are oxides, the multi-layer system includes four to six thin layers, in one embodiment, the total thickness of the six-layer structure is about 4700 Angstroms, The material of the surface layer of the multilayer system is SiO ₂ , which has a low refractive index, and the refractive index is 1.46 when the wavelength is 550 nm.

U.S. Patents US5,091,244 and US5,407,733 disclose a new type of conductive light-attenuating anti-reflection coating, which is mainly composed of specific transition metal nitrides, thereby providing a conductive, light-attenuating , anti-reflective surface, the multilayer system includes TiN, NbN, SnO ₂ , SiO ₂ , Al ₂ O ₃ and Nb ₂ O ₅ , all thin film layers of the multilayer system are nitrides and oxides, the multilayer The system includes three to four thin layers. In one embodiment, the total thickness of the four-layer structure is about 1610 angstroms. The visible light transmittance of the four-layer system is less than 50%. The surface layer of the multi-layer system has a The substance is SiO ₂ , which has a low refractive index of 1.46 at a wavelength of 550 nm.

U.S. Patent No. 5,147,125 discloses a multilayer antireflection coating using zinc oxide to resist ultraviolet rays with a wavelength of less than 380nm. The multilayer system includes TiO ₂ , SiO ₂ , ZnO and MgF ₂ . All of the multilayer systems The thin film layer is oxide and fluoride, and the multi-layer system includes four to six layers of thin layers. In one embodiment, the total thickness of the five-layer structure is about 7350 Angstroms. The material of the surface layer of the multi-layer system is MgF ₂ has a low refractive index, when the wavelength is 550nm, the refractive index is 1.38.

U.S. Patent No. 5,170,291 discloses a four-layer system with an optical effect and a high anti-reflection effect. The multi-layer system can be formed by pyrolysis, plasma supported chemical vapor arrangement, sputtering or chemical arrangement. The multi-layer system includes SiO ₂ , TiO ₂ , Al ₂ O ₃ , ZnS, MgO, and Bi ₂ O ₃ . In one embodiment, the total thickness of the four-layer structure is about 2480 angstroms. The material of the surface layer of the multi-layer system It is SiO ₂ , which has a low refractive index. When the wavelength is 550nm, the refractive index is 1.46.

U.S. Patent No. 5,216,542 discloses a five-layer coating with high anti-reflection effect. The multi-layer system includes a mucous layer with a thickness of 1 nm consisting of Ni, Cr or NiCr, and the remaining four layers are composed of SnO ₂ , ZrO ₂ , ZnO, Ta ₂ O ₅ , NiO, CrO ₂ , TiO ₂ , Sb ₂ O ₃ , In ₂ O ₃ , Al ₂ O ₃ , SiO ₂ , TiN and ZrNn, in one embodiment, the five The total thickness of the layer structure is about 2337 angstroms. The visible light transmittance of the five-layer system is lower than 30%. The material of the surface layer of the multilayer system is SiO ₂ , which has a low refractive index. When the wavelength is 550nm, The refractive index is 1.46.

U.S. Patent No. 5,541,770 discloses a light-attenuating anti-reflection coating with a conductive layer, which is a multi-layer system of four to five layers, including metals with high refractive index for light absorption, such as Cr, Mo and W, etc. etc., are used as the light effect film of the multilayer system, and the other three to four layers are TiO ₂ , ITO, Al ₂ O ₃ , SiO ₂ and TiN, except for one metal layer is used as the multilayer system In addition to the light effect film, the main materials of the multilayer system are oxides and nitrides. In one embodiment, the total thickness of the five-layer structure is about 1495 angstroms, and the visible light transmittance of the multilayer system is lower than 60%, the material of the surface layer of the multilayer system is SiO, which has a low refractive index, when the wavelength is 550nm, the refractive index is 1.46.

U.S. Patent No. 5,362,552 discloses a six-layer anti-reflection coating with three layers of conductive metal oxides. The multi-layer system includes SiO ₂ , ITO, Nb ₂ O ₅ and Ta ₂ O ₅ . The coating includes a Conductive metal oxides with a total thickness up to the wavelength of visible light. In one embodiment, the materials and thicknesses of the two main layers of the six-layer structure are SiO ₂ , 854 angstroms and ITO, 1975 angstroms. The surface layer of the multilayer system The substance is SiO ₂ , which has a low refractive index of 1.46 at a wavelength of 550 nm.

U.S. Patent No. 5,579,162 discloses a four-layer anti-reflection coating for temperature-sensitive substrates (such as plastics), one of which is a metal oxide sputtered by DC reactive sputtering, which can be quickly disposed on the substrate , and will not transfer a large amount of heat to the substrate, the multi-layer system includes SnO ₂ , SiO ₂ and ITO, in one embodiment, the material and thickness of the two main layers of the four-layer structure are SnO ₂ , 763 angstroms, respectively and SiO ₂ , 940 angstroms. The material of the surface layer of the multilayer system is SiO ₂ , which has a low refractive index. When the wavelength is 550 nm, the refractive index is 1.46.

U.S. Pat. Nos. 5,728,456 and 5,783,049 disclose an improved method for disposing anti-reflective coatings on a plastic film, the multilayer film is coated with a roller coating using a sputtering process, the multilayer The layer system includes ITO, _SiO2 and a thin lubricating layer, which is a soluble fluoropolymer. In one embodiment, the total thickness of the six-layer structure is about 2630 Angstroms. The material of the surface layer of the multi-layer system is SiO ₂ has a low refractive index, when the wavelength is 550nm, the refractive index is 1.46.

The material of the thin surface layer of the optical multilayer system disclosed above is SiO ₂ or MgF ₂ , which has a low refractive index. When the wavelength is 550 nm, the refractive index is 1.46 and 1.38, respectively.

Existing multilayer systems of anti-reflection optical coatings all utilize a general principle that the surface layer of the optical coating has a low refractive index, such as SiO ₂ with a refractive index of 1.46, or MgF ₂ with a refractive index of 1.38. However, when the anti-reflection coating is used in the display industry, such as computer screens with antistatic effects or low-reflection glass for liquid crystal displays or plasma displays, there will be some bottlenecks in the mass production process. The reason is that the conductive layer of the optical coating structure is fired from an insulating layer (such as SiO ₂ or MgF ₂ ).

该SiO₂的物质特性为高密度、具有惰性和具有良好的绝缘性，在运用传统的抗反射涂层于显示器工业的过程中，电性接触由外部的SiO₂层所隔离的该烧制的ITO层是非常困难的，在使一金属接触该ITO层的接地过程中，需要使用一超声波焊接工艺去打破该SiO₂层，以确保锡球与该ITO层产生良好接触，此工艺为大量生产抗反射涂层的瓶颈。The basic design rule for an anti-reflection coating is that the first layer arranged on the surface of a substrate consists of a substance with a high refractive index (denoted H), followed by a layer of a substance with a low refractive index (denoted H). Be the second layer of L), therefore, the rule of the multilayer structure of existing anti-reflection coating is HLHL or HLHLHL, the material with high refractive index (H) is ITO and the material of low refractive index (L) is SiO ₂ as an example, the four-layer structure is Glass/ITO/SiO ₂ /ITO/SiO ₂ . Since ITO is a transparent conductive substance, the conductivity of the coating of the multilayer structure is less than 100Ω per square meter, and when the conductive coating is connected to the ground, it can be used for electromagnetic interference (EMI) frequency barrier or electrostatic discharge . However, the problem is that the surface substance of this existing optical multilayer structure is SiO ₂ , and its thickness is 1000

The material properties of the _SiO2 are high density, inert and have good insulating properties. During the application of traditional anti-reflective coatings in the display industry, the electrical contact is isolated by the outer _SiO2 layer. The ITO layer is very difficult. In the process of grounding a metal to the ITO layer, an ultrasonic welding process is required to break the _SiO2 layer to ensure good contact between the solder balls and the ITO layer. This process is for mass production Bottleneck for anti-reflective coatings.

On the other hand, the ultrasonic welding process generates fine contaminants due to liquid tin and ultrasonic exposure energy. In addition, the ultrasonic welding process will also produce non-permanent contact resistance on each production line, because the ultrasonic welding process cannot ensure that the insulating layer can be broken uniformly at the same depth to obtain a uniform contact resistance.

The above disadvantages reduce the yield and reliability of the process using existing anti-electromagnetic interference and anti-reflection coatings.

Contents of the invention

The main purpose of the present invention is to provide an anti-reflection coating with low resistance function and a penetrable conductive layer as the outermost layer. The coating includes eight oxide layers, and the material of the surface layer is a penetrable The transparent conductive layer has a high refractive index ranging from 1.9 to 2.2.

Another object of the present invention is to provide an anti-reflective coating with a low resistance function and a penetrable conductive layer as the outermost layer. The process for mass production of the oxide film is reliable, and the low resistance light Attenuation and anti-reflection coatings can be used in industries such as semiconductors, optical heads, liquid crystal displays, cathode ray tubes, architectural glass, touch sensors, screen filters, and plastic stencil coatings.

Another object of the present invention is to provide an anti-reflection coating with a low resistance function and a penetrable conductive layer as the outermost layer. The multilayer structure of the anti-reflection coating is HL(HL) ₆ H, Consisting of eight oxide layers, the surface material of the coating is a penetrable conductive layer with a high refractive index between 1.9 and 2.2.

Another object of the present invention is to provide a kind of anti-reflection coating with low resistance function and with a penetrable conductive layer as the outermost layer, the material of the surface layer of the anti-reflection coating is a penetrable surface conductive layer, the light reflectance of the penetrable surface conductive layer is lower than 0.5%, the resistance of the anti-reflection coating is between 0.5Ω and 0.7Ω per square meter, and the transmittance is 55% to 70%.

Due to the good electrical conductivity of the surface layer, the anti-reflective coating with low resistance and a penetrable conductive layer as the outermost layer can reduce the workload required for the grounding process and increase the yield and yield of mass production. reliability, it can be applied to glass substrates or plastic substrates of liquid crystal displays or plasma displays.

In one embodiment, the anti-reflection coating with a low resistance function and a penetrable conductive layer as the outermost layer includes 15 layers, the first layer, the second layer, the third layer, ... and the fifteenth layer Layers are arranged on the substrate in sequence, and each layer will be described by physical thickness or optical thickness. Optical thickness is the mathematical product of layer thickness and refractive index. In the present invention, the design wavelength is 520nm.

The first layer (or called the surface layer) is composed of a penetrable conductive oxide substance, the oxide is SnO:Sb, which only absorbs very little visible light. When the wavelength is 520nm, the refractive index of the surface layer Between 1.9 and 2.2, while the physical thickness is 20nm to 40nm.

The second layer is a thin metal layer, which is made of silver, which only absorbs little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm.

The third layer is made of oxide, which is SnO:Sb, which only absorbs very little visible light. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 30nm. 80nm.

The fourth layer is a thin metal layer, which is made of silver, which only absorbs little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm.

The fifth layer is made of oxide, which is SnO:Sb, which only absorbs little visible light. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm.

The sixth layer is a thin metal layer, which is made of silver, which only absorbs little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm.

The seventh layer is made of oxide, which is SnO:Sb, which only absorbs little visible light. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm.

The eighth layer is a thin metal layer, which is made of silver, which only absorbs little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm.

The ninth layer is made of oxide, which is SnO:Sb, which only absorbs little visible light. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm.

The tenth layer is a thin metal layer, which is made of silver, which only absorbs little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm.

The eleventh layer is made of oxide, which is SnO:Sb, which only absorbs very little visible light. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm.

The twelfth layer is a thin metal layer, which is made of silver, which only absorbs very little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm. .

The thirteenth layer is made of oxide, which is SnO:Sb, which only absorbs very little visible light. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm.

The fourteenth layer is a thin metal layer, which is made of silver, which only absorbs a small amount of visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 12nm.

The fifteenth layer (or the innermost layer) is made of oxide, which is TiO ₂ , which does not absorb visible light. When the wavelength is 520nm, the refractive index of this layer is between 2.2 and 2.4, and the physical The thickness is 20nm to 40nm.

The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

Description of drawings

Fig. 1 is the schematic diagram of the anti-reflection coating with low resistance function and the outermost layer with the penetrable conductive layer of the present invention;

FIG. 2 is a graph of wavelength versus reflectance of an anti-reflection coating with a low-resistance function and with a penetrable conductive layer as the outermost layer of the present invention.

Among them, reference signs:

1 - first floor

2 - second floor

3 - third floor

4 - the fourth floor

5 - fifth floor

6- the sixth floor

7 - the seventh floor

8 - the eighth floor

9 - ninth floor

10-Tenth floor

11-Eleventh floor

12- the twelfth floor

13-thirteenth floor

14-Fourteenth floor

15- the fifteenth floor

16 - front surface

17-Substrate

18 - Direction of viewing

Detailed ways

The present invention is a 15-layer anti-reflection coating based on oxide, each layer will be described by the physical thickness or optical thickness in nm, and the wavelength of visible light is 520nm.

As shown in Figure 1, the substrate 17 is made of glass, plastic or other transparent substances. The front surface 16 of the substrate 17 is the side of the substrate 17 facing the observer. 15 contacts the front surface 16 of the substrate 17, the fourteenth layer 14 is placed on the fifteenth layer 15, followed by the thirteenth layer 13, the twelfth layer 12, the eleventh layer 11, the tenth layer 10, The ninth floor 9, the eighth floor 8, the seventh floor 7, the sixth floor 6, the fifth floor 5, the fourth floor 4, the third floor 3, the second floor 2 and the first floor 1. Wherein the first layer 1 is also called the surface layer or the outermost layer, thereby constituting the 15-layer coating structure of the present invention.

The first layer 1 (or surface layer) is a SnO:Sb layer, which only absorbs very little visible light. When the wavelength is 520nm, the refractive index of this surface layer is between 1.9 and 2.2, and the physical thickness is 20nm to 40nm. The second layer 2 is a silver layer, which only absorbs little visible light, has a refractive index between 0.1 and 0.5 when the wavelength is 520 nm, and a physical thickness of 8 nm to 12 nm. The third layer 3 is a SnO:Sb layer, which has a refractive index between 1.9 and 2.2 at a wavelength of 520 nm and a physical thickness of 30 nm to 80 nm. The fourth layer 4 is a silver layer with a refractive index between 0.1 and 0.5 at a wavelength of 520 nm and a physical thickness of 8 nm to 12 nm. The fifth layer 5 is a SnO:Sb layer, which has a refractive index between 1.9 and 2.2 when the wavelength is 520 nm, and a physical thickness of 30 nm to 80 nm. The sixth layer 6 is a silver layer with a refractive index between 0.1 and 0.5 at a wavelength of 520 nm and a physical thickness of 8 nm to 12 nm. The seventh layer 7 is a SnO:Sb layer. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm. The eighth layer 8 is a silver layer with a refractive index between 0.1 and 0.5 at a wavelength of 520 nm and a physical thickness of 8 nm to 12 nm. The ninth layer 9 is a SnO:Sb layer. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm. The tenth layer 10 is a silver layer with a refractive index between 0.1 and 0.5 when the wavelength is 520 nm, and a physical thickness of 8 nm to 12 nm. The eleventh layer 11 is a SnO:Sb layer. When the wavelength is 520nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30nm to 80nm. The twelfth layer 12 is a silver layer with a refractive index between 0.1 and 0.5 when the wavelength is 520 nm, and a physical thickness of 8 nm to 12 nm. The thirteenth layer 13 is a SnO:Sb layer. When the wavelength is 520 nm, the refractive index of this layer is between 1.9 and 2.2, and the physical thickness is 30 nm to 80 nm. The fourteenth layer 14 is a thin metal layer, which is made of silver, which only absorbs little visible light. When the wavelength is 520nm, its refractive index is between 0.1 and 0.5, and its physical thickness is 8nm to 8nm. 12nm. The fifteenth layer 15 is a TiO ₂ layer, which does not absorb visible light, has a refractive index between 2.2 and 2.4 at a wavelength of 520 nm, and a physical thickness of 20 nm to 40 nm.

In a preferred embodiment, the thickness of the first layer 1 is 35nm, the thickness of the second layer 2 is 10nm, the thickness of the third layer 3 is 75nm, the thickness of the fourth layer 4 is 10nm, the fifth layer 5 The thickness of the sixth layer 6 is 10 nm, the thickness of the seventh layer 7 is 55 nm, the thickness of the eighth layer 8 is 10 nm, the thickness of the ninth layer 9 is 55 nm, and the thickness of the tenth layer 10 is 10 nm. The eleventh layer 11 has a thickness of 70 nm, the twelfth layer 12 has a thickness of 10 nm, the thirteenth layer 13 has a thickness of 70 nm, the fourteenth layer 14 has a thickness of 10 nm, and the fifteenth layer 15 has a thickness of 33 nm.

The first to fifteenth layers of the coating structure of the present invention may be formed by evaporation or sputtering processes in a coaxial or roller-to-roller vacuum system. Under a total pressure of 3m Torr (m=mini=0.001), in the presence of sputtering gas Ar and a small partial pressure of water, DC or pulsed DC magnetron sputtering can be used to arrange SnO:Sb to form the first 1st, 3rd, 5th, 7th, 9th, 11th and 13th floors. Under a total pressure of 4m Torr, in the presence of sputtering gas Ar, DC or pulsed DC magnetron sputtering can be used to arrange silver to form the second, fourth, sixth, eighth, tenth, twelveth and fourteenth layer. Under a total pressure of 2 m Torr, in the presence of mixed Ar and H ₂ O sputtering gases, an AC reactive sputtering method can be used to arrange Ti to form the fifteenth layer 15 of TiO ₂ . The distance between the cathode of the magnetron and the substrate is 15 cm, and a heating device is used, and the temperature of the substrate is controlled between 100°C and 300°C.

Certainly, the coating structure of the present invention is not limited to 15 layers, as long as the design principle of HL(HL) _n H is complied with, similar effects can be achieved.

Fig. 2 is the curve graph of the wavelength versus reflectance of the anti-reflection coating with the low resistance function and the outermost layer with the penetrable conductive layer of the present invention, the reflectance is expressed in percentage, and the visible light wavelength 400nm is shown in the figure From the figure to 700nm spectrum, it can be seen from the figure that the reflectivity between the wavelength of 460nm and 600nm is lower than 0.5%, which is better than the existing coating structure based on the design principle of HLHL.

Due to the formation of the ITO coating, the impedance of the conductive surface layer is between 0.5Ω and 0.7Ω per square meter. On a glass film or plastic film, when the corresponding visible light wavelength ranges from 400nm to 700nm, its reflection spectrum It is a flat and wide area, so it can be seen that the coating is a high conductivity, light attenuation anti-reflection coating with good surface conductivity. Furthermore, when the coating structure of the present invention is deployed using the roller-to-roller vacuum arrangement method, its production cost is low and it is suitable for mass production.

On the other hand, the coating structure of the present invention has high conductivity, so when it is applied to the manufacture of plasma displays, it has the advantages of electromagnetic interference barrier, low reflection of optical viewing angle, high surface hardness scratch resistance, moderate light attenuation effect, etc. . For example, the surface resistance of the coating structure of the present invention is between 0.5Ω and 0.7Ω per square meter, and has sufficient hardness to pass the scratch resistance test of military standard MIL-C-48497.

The present invention can achieve the following effects. In the existing coating system, the problem that the permeable conductive layer is separated by the insulating silicon dioxide layer is solved. The present invention provides a coating structure with fifteen layers of SnO:Sb on the surface, and its refractive index is between 1.9 and 2.2.

Since the surface layer of the anti-reflection coating is conductive, a few simple methods can make the coating of the present invention have good electrical contact, and the coating of the present invention can be applied to screen filters of plasma displays.

In the application of the screen filter, the traditional grounding manufacturing method using ultrasonic welding process that will produce fine tin point contamination will be replaced, and the final process of anti-reflection coating assembled on the screen filter will be simplified. The problem of uneven electrical contact between the ITO layer and the solder will be solved to improve the yield of the grounding process. In addition, the coating structure can also be applied as a base coating for the plasma display and liquid crystal display industries.

The fifteen-layer coating structure of the present invention consists of a conductive substance as its surface layer, which can be used simply and economically on glass or plastic film substrates with low impedance functions.

Certainly, the present invention also can have other multiple embodiments, without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and deformations according to the present invention, but these corresponding Changes and deformations should belong to the scope of protection of the appended claims of the present invention.

Claims (15)

1. A kind of anti-reflection coating with low resistance function and with penetrable conductive layer as the outermost layer, it is characterized in that, comprises: a substrate; A fifteenth layer, disposed on a front surface of the substrate, is composed of a high refractive index oxide with a physical thickness between 20nm and 40nm; a fourteenth layer disposed on the fifteenth layer, which is composed of a metal substance with a low refractive index, and has a physical thickness between 8nm and 12nm; a thirteenth layer disposed on the fourteenth layer, which is composed of a high refractive index oxide and has a physical thickness between 30nm and 80nm; a twelfth layer disposed on the thirteenth layer, which is made of a metal substance with a low refractive index and has a physical thickness between 8nm and 12nm; an eleventh layer disposed on the twelfth layer, which is composed of a high refractive index oxide and has a physical thickness between 30nm and 80nm; a tenth layer, disposed on the eleventh layer, made of a metal substance with a low refractive index, with a physical thickness between 8nm and 12nm; a ninth layer disposed on the tenth layer, which is composed of a high refractive index oxide with a physical thickness between 30nm and 80nm; an eighth layer disposed on the ninth layer, which is made of a metal substance with a low refractive index, with a physical thickness between 8nm and 12nm; a seventh layer disposed on the eighth layer, which is composed of a high refractive index oxide with a physical thickness between 30nm and 80nm; a sixth layer disposed on the seventh layer, which is composed of a metal substance with a low refractive index, with a physical thickness between 8nm and 12nm; a fifth layer disposed on the sixth layer, which is composed of a high refractive index oxide and has a physical thickness between 30nm and 80nm; a fourth layer disposed on the fifth layer, which is composed of a metal substance with a low refractive index, and has a physical thickness between 8nm and 12nm; a third layer disposed on the fourth layer, which is composed of a high refractive index oxide and has a physical thickness between 30nm and 80nm; A second layer, disposed on the third layer, is composed of a low refractive index metal substance with a physical thickness between 8nm and 12nm; and a first layer disposed on the second layer, which is composed of a high refractive index oxide and has a physical thickness between 20nm and 40nm; Wherein the first layer, the third layer, the fifth layer, the seventh layer, the ninth layer, the eleventh layer and the thirteenth layer are made of SnO:Sb, the second layer, the fourth layer, the sixth layer The eighth, tenth, twelfth, and fourteenth layers are made of silver, and the fifteenth layer is made of TiO ₂ . 2. The anti-reflective coating with low resistance function and having a penetrable conductive layer as the outermost layer as claimed in claim 1, wherein the substrate is a plastic film. 3. The anti-reflection coating with low resistance function and having a penetrable conductive layer as the outermost layer as claimed in claim 1, wherein the substrate is a glass. 4. The anti-reflective coating with low resistance function as claimed in claim 1 and taking the penetrable conductive layer as the outermost layer, it is characterized in that the first layer, the third layer, the fifth layer, the seventh layer The refractive index of the oxide of the layer, the ninth layer, the eleventh layer and the thirteenth layer is between 1.9 and 2.2, and the second layer, the fourth layer, the sixth layer, the eighth layer, the tenth layer, The refractive index of the metal substance in the twelfth layer and the fourteenth layer is between 0.1 and 0.5, and the refractive index of the oxide in the fifteenth layer is between 2.2 and 2.4. 5. The anti-reflective coating with low resistance function as claimed in claim 1 and taking the penetrable conductive layer as the outermost layer, it is characterized in that the first layer, the third layer, the fifth layer, the seventh layer The oxides of layer, ninth layer, eleventh layer and thirteenth layer are formed by direct current or pulsed direct current magnetron sputtering method, and the second layer, fourth layer, sixth layer, eighth layer, The metal substance of the tenth, twelfth and fourteenth layers is formed by DC or pulsed DC magnetron sputtering, and the oxide of the fifteenth layer is formed by AC reactive sputtering. 6. The anti-reflective coating with low resistance function and with a penetrable conductive layer as the outermost layer as claimed in claim 1, wherein the first to fifteenth layers are formed by coaxial or roller Formed by evaporation or sputtering processes on roller vacuum systems. 7. The anti-reflection coating with low resistance function as claimed in claim 1 and with a penetrable conductive layer as the outermost layer, wherein the coating is the basic coating of a plasma display or a liquid crystal display. 8. A kind of anti-reflection coating with low resistance function and with penetrable conductive layer as the outermost layer, it is characterized in that, comprising: a substrate; a fifth layer composed of a high refractive index oxide and disposed on the substrate; a plurality of fourth layers composed of a metal substance with a low refractive index; a plurality of third layers composed of a high refractive index oxide; a second layer made of a metal substance with a low refractive index; a first layer composed of a high refractive index oxide; Wherein, the plurality of fourth layers and the plurality of third layers are interleavedly stacked and arranged on the fifth layer, followed by the second layer and the first layer, the first layer and the plurality of layers The third layer is composed of SnO:Sb, the second layer and the fourth layers are composed of silver, and the fifth layer is composed of _TiO2 . 9. The anti-reflective coating with low resistance function as claimed in claim 8 and with the penetrable conductive layer as the outermost layer, wherein the physical thickness of the fifth layer is between 20nm and 40nm, the The physical thickness of the fourth layer is between 8nm and 12nm, the physical thickness of the third layer is between 30nm and 80nm, the physical thickness of the second layer is between 8nm and 12nm, the physical thickness of the first layer is between Between 20nm and 40nm. 10. The anti-reflective coating with low resistance function and having a penetrable conductive layer as the outermost layer as claimed in claim 8, wherein the substrate is a plastic film. 11. The anti-reflection coating with low resistance function and having a penetrable conductive layer as the outermost layer as claimed in claim 8, wherein the substrate is a glass. 12. The anti-reflective coating with low resistance function as claimed in claim 8 and with a penetrable conductive layer as the outermost layer, wherein the oxides of the first layer and the plurality of third layers are The refractive index is between 1.9 and 2.2, the refractive index of the metal substance of the second layer and the plurality of fourth layers is between 0.1 and 0.5, and the refractive index of the oxide of the fifth layer is between 2.2 and 2.4 between. 13. The anti-reflection coating with low resistance function as claimed in claim 8 and with a penetrable conductive layer as the outermost layer, wherein the oxides of the first layer and the plurality of third layers are made of Formed by direct current or pulsed direct current magnetron sputtering method, the metal substances of the second layer and the plurality of fourth layers are formed by direct current or pulsed direct current magnetron sputtering method, and the oxide of the fifth layer is formed by alternating current formed by reactive sputtering. 14. The anti-reflection coating with low resistance function and with a penetrable conductive layer as the outermost layer as claimed in claim 8, wherein the first to fifth layers are formed by coaxial or roller pairs Formed by evaporation or sputtering process of roller vacuum system. 15. The anti-reflection coating with low resistance function and with a penetrable conductive layer as the outermost layer as claimed in claim 8, characterized in that, the coating is a basic coating of a plasma display or a liquid crystal display.

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